JPH08187069A - High-pressure device - Google Patents
High-pressure deviceInfo
- Publication number
- JPH08187069A JPH08187069A JP353895A JP353895A JPH08187069A JP H08187069 A JPH08187069 A JP H08187069A JP 353895 A JP353895 A JP 353895A JP 353895 A JP353895 A JP 353895A JP H08187069 A JPH08187069 A JP H08187069A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- medium
- processing chamber
- container
- pressure medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、高圧な等方圧加圧と熱
的作用の共存下で加圧処理して、食品の殺菌、変性、酵
素反応の制御などを行う高圧処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-pressure processing apparatus for carrying out pressure treatment under the coexistence of high-pressure isotropic pressure and thermal action to perform sterilization, denaturation and control of enzyme reaction of food.
【０００２】[0002]
【従来の技術】近年、食品への高圧利用の有用性が注目
され、殺菌、変性、酵素反応の制御など広範な領域での
応用技術の開発が進められており、すでに特定食品で
は、高圧処理による殺菌や変性が実用化されている。ま
た、その一方で、プラス側あるいはマイナス側に制御さ
れた熱を関与させて、つまり高圧な等方圧加圧と熱的作
用の共存下で処理することで、その適用範囲を拡大する
試みが進められている。2. Description of the Related Art In recent years, attention has been paid to the usefulness of using high pressure for foods, and development of application technology in a wide range of fields such as sterilization, denaturation and control of enzyme reaction has been advanced. Sterilization and denaturation have been put to practical use. On the other hand, on the other hand, there is an attempt to expand the range of application by involving heat controlled on the positive side or the negative side, that is, by processing in the coexistence of high-pressure isotropic pressure and thermal action. It is being advanced.
【０００３】そして、このような状況のもとで、実生産
および研究に適用されている代表的な高圧処理装置とし
ては、その概要構成の説明図である〔図７〕の (a)図に
示すピストン加圧式のものと、同 (b)図に示す外部増圧
式のものとがある。(a)図に示すピストン加圧式の高圧
処理装置は、下開口部に下蓋(21a) を配し、内部に処理
室(22)を有する筒状の高圧容器(21)と、図示省略の加圧
手段により高圧容器(21)の上開口部から処理室(22)内に
向けて圧下させられる加圧ピストン(23)と、高圧容器(2
1)の外周上に周設されたジャケット(24)と、このジャケ
ット(24)に接続された熱媒供給装置(25)とを備えてな
る。この装置では、高圧容器(21)の処理室(22)に圧媒
(L) を充填すると共に加圧ピストン(23)を圧下させて該
圧媒(L) を加圧し、その処理室(22)に装入された被処理
物(M) を、高圧に加圧された圧媒(L) を介する等方圧下
で加圧処理する。一方、ジャケット(24)には熱媒供給装
置(25)から熱媒(H) が循環供給され、これによって高圧
容器(21)内の圧媒(L) の温度を制御して、等方加圧され
る被処理物(M)を所定温度に保持する。Under these circumstances, a typical high-pressure processing apparatus applied to actual production and research is shown in FIG. There are the piston pressurization type shown in the figure and the external boosting type shown in the same figure (b). The piston pressurization type high-pressure processing apparatus shown in (a) is a cylindrical high-pressure vessel (21) having a lower lid (21a) at the lower opening and a processing chamber (22) inside, and a cylinder (not shown). A pressure piston (23) that is pressed down from the upper opening of the high pressure vessel (21) toward the inside of the processing chamber (22) by the pressure means, and the high pressure vessel (2
A jacket (24) is provided around the outer circumference of (1), and a heat medium supply device (25) connected to the jacket (24). In this device, a pressure medium is placed in the processing chamber (22) of the high pressure vessel (21).
(L) and pressurize the pressure piston (23) to pressurize the pressure medium (L), and pressurize the object (M) loaded in the processing chamber (22) to high pressure. The pressure treatment is performed under isotropic pressure through the pressure medium (L) that has been generated. On the other hand, the heat medium (H) is circulated and supplied from the heat medium supply device (25) to the jacket (24), which controls the temperature of the pressure medium (L) in the high-pressure vessel (21) to perform isotropic loading. The pressed object (M) is maintained at a predetermined temperature.
【０００４】一方、 (b)図に示す外部増圧式の高圧処理
装置は、上下の開口部に上蓋(31a)および下蓋(31b) を
配し、内部に処理室(32)を有する筒状の高圧容器(31)
と、この高圧容器(31)の外周上に周設されたジャケット
(33)と、このジャケット(33)に接続された熱媒供給装置
(34)と、高圧容器(31)の下蓋(31b) に設けられた圧媒導
入孔(31C) に接続された圧媒加圧供給装置(35)とを備え
てなる。この装置では、圧媒加圧供給装置(35)により、
高圧容器(31)の処理室(32)に圧媒(L) を送給すると共に
加圧し、その処理室(32)に装入された被処理物(M) を、
高圧に加圧された圧媒(L) を介する等方圧下で加圧処理
する。一方、ジャケット(33)には、熱媒供給装置(34)か
ら熱媒(H) が循環供給され、これによって高圧容器(31)
内の圧媒(L) の温度を制御して、等方加圧される被処理
物(M) を所定温度に保持する。On the other hand, the external pressure-increasing type high-pressure processing apparatus shown in FIG. 1B has a cylindrical shape having an upper lid (31a) and a lower lid (31b) at upper and lower openings, and a processing chamber (32) inside. High Pressure Vessel (31)
And a jacket around the outer circumference of this high-pressure container (31)
(33) and heat medium supply device connected to this jacket (33)
(34) and a pressure medium pressure supply device (35) connected to a pressure medium introduction hole (31C) provided in the lower lid (31b) of the high pressure container (31). In this device, by the pressure medium pressure supply device (35),
The pressure medium (L) is sent to the processing chamber (32) of the high-pressure vessel (31) and pressurized, and the object to be processed (M) loaded in the processing chamber (32) is
The pressure treatment is performed under isotropic pressure through the pressure medium (L) pressurized to a high pressure. On the other hand, the heating medium (H) is circulated and supplied from the heating medium supply device (34) to the jacket (33), whereby the high pressure vessel (31)
The temperature of the pressure medium (L) therein is controlled to hold the object (M) to be isotropically pressurized at a predetermined temperature.
【０００５】また、上記外部増圧式の高圧処理装置の内
で大規模生産用のとしては、例えば、特開平4-299967号
および特開平5-71号公報に提案されたものがある。前者
の高圧処理装置（特開平4-299967号）では、その概要構
成の説明図である〔図６〕の (a)図に示すように、ジャ
ケット(33)に熱媒(H) を循環供給する熱媒供給装置(34)
の熱媒タンク(34a) と、高圧容器(31)に圧媒(L) を送給
する圧媒加圧供給装置(35)の圧媒タンク(35a) とを隣接
配置して、両者を共通の断熱材(36)で取り囲んだ構成と
している。また、後者の高圧処理装置（特開平5-71号）
では、高圧容器(31)と、該高圧容器(31)に圧媒(L) を送
給する圧媒加圧供給装置(35)の圧媒タンク(35a) とを隣
接配置して、両者を共通の冷凍庫(37)で取り囲んだ構成
とし、またその構成によって熱媒供給装置(34)を不要に
している。これら提案に係る外部増圧式の高圧処理装置
では、熱媒タンクと圧媒タンク、または圧媒タンクと高
圧容器が一体で保温もしくは保冷されることから、放熱
および放冷面積を減少させることができ、特に大規模生
産において、省エネルギー化が図れるという利点があ
る。Further, as the large-scale production of the external pressure increasing type high-pressure processing apparatus, there are those proposed in, for example, Japanese Patent Laid-Open Nos. 4-299967 and 5-71. In the former high-pressure processing apparatus (Japanese Patent Laid-Open No. 4-299967), a heating medium (H) is circulated and supplied to a jacket (33) as shown in (a) of FIG. Heat medium supply device (34)
The heat medium tank (34a) and the pressure medium tank (35a) of the pressure medium pressure supply device (35) for feeding the pressure medium (L) to the high pressure container (31) are arranged adjacent to each other, and both are shared. The structure is surrounded by the heat insulating material (36). The latter high-pressure processing device (Japanese Patent Laid-Open No. 5-71)
Then, the high pressure vessel (31) and the pressure medium tank (35a) of the pressure medium pressure supply device (35) for feeding the pressure medium (L) to the high pressure vessel (31) are arranged adjacent to each other, and A common freezer (37) surrounds the heat medium supply device (34), which eliminates the need. In the external pressure-increasing type high-pressure processing apparatus according to these proposals, the heat medium tank and the pressure medium tank, or the pressure medium tank and the high-pressure container are integrally kept warm or cool, so that the heat radiation and cooling area can be reduced. There is an advantage that energy saving can be achieved especially in large-scale production.
【０００６】[0006]
【発明が解決しようとする課題】ところで、高圧な等方
圧加圧だけでなく、熱的作用との共存下で食品の殺菌を
行う高圧処理おいて、例えば、大腸菌の死滅に対する加
圧圧力と温度との相関関係をみると、５分間の加圧下で
の圧力と大腸菌の生存率と関係を示す〔図５〕のグラフ
に示すように、同じ処理圧力（例えば、200MPa）でも温
度が異なると、大腸菌の滅菌効果が大きく異なる。また
同様に、食品の変性、酵素反応の制御などを行う高圧処
理でも、被処理物の特性と処理目的の如何によって温度
が大きく影響することが指摘されている。従って、等方
圧加圧と熱的作用との共存下で食品の高圧処理を行う場
合には、加圧に際する高圧容器内の圧媒の温度を、適正
範囲内の均等な温度に保持できるように制御することが
重要になる。一方、食品の高圧処理では、その処理技術
の進展と適用範囲の拡大に従って、大規模に処理でき、
かつ種々の被処理物に適用可能な装置が望まれるように
なり、それに対応するために近い将来では高圧容器の大
型化や仕様処理圧力の増大が必要になることが予測され
る。By the way, in the high-pressure treatment for sterilizing foods in the presence of thermal action as well as high-pressure isotropic pressurization, for example, a pressurizing pressure for killing E. coli is used. As shown in the graph of FIG. 5 showing the relationship between the pressure under pressure for 5 minutes and the survival rate of Escherichia coli, the correlation with temperature shows that the temperature is different even at the same treatment pressure (for example, 200 MPa). , The sterilization effect of E. coli is very different. Similarly, it has been pointed out that in high-pressure treatment for denaturing foods, controlling enzyme reactions, etc., the temperature greatly affects the characteristics of the object to be treated and the purpose of the treatment. Therefore, when high-pressure processing of food is carried out under the coexistence of isotropic pressure and thermal action, the temperature of the pressure medium in the high-pressure container during pressurization is maintained at a uniform temperature within an appropriate range. It is important to control so that you can. On the other hand, in the high-pressure processing of food, it can be processed on a large scale as the processing technology advances and the scope of application expands.
Moreover, an apparatus applicable to various objects to be processed has been desired, and it is expected that in order to cope with such an apparatus, it is necessary to increase the size of the high-pressure container and increase the specified processing pressure in the near future.
【０００７】しかしながら、上記従来の高圧処理装置で
は、処理量の増大や適用範囲の拡大に対応するために、
高圧容器の大型化や処理圧力の増大を図る場合、圧媒の
温度制御に際する熱効率および温度変動に対する反応速
度に劣り、更には高圧容器内での温度分布が上下方向で
大きくばらつき易くて、均熱性に劣るものとなり、その
ままでは目的を達成し難いものになると言う問題があ
る。However, in the above-mentioned conventional high-pressure processing apparatus, in order to cope with an increase in processing amount and an applicable range,
When attempting to increase the size of the high-pressure container or increase the processing pressure, the thermal efficiency in controlling the temperature of the pressure medium and the reaction rate with respect to temperature fluctuations are inferior, and the temperature distribution in the high-pressure container tends to vary greatly in the vertical direction. There is a problem that it becomes inferior in heat uniformity and it is difficult to achieve the purpose as it is.
【０００８】すなわち、〔図７〕に示した従来の高圧処
理装置では、ピストン加圧式および外部増圧式とも、高
圧容器の外周側から加熱ないしは冷却し、この高圧容器
の壁を介した熱交換によって、内部の圧媒の温度を制御
する構成とされているため、高圧容器の大型化や仕様処
理圧力の増大に伴って該高圧容器の壁厚がより厚肉に構
成されるほど、その内部の圧媒に対する温度制御のため
の熱効率が大幅に低下し、かつ温度変動に対する反応速
度に劣るものとなる。一方、内部の圧媒側からみれば外
側から加熱または冷却されて、外周側で上昇または下降
して中央部で逆方向に流れる対流を生じることで、高圧
容器内での温度を制御されるのであるが、加熱された圧
媒は上部で、冷却された圧媒は下部でそれぞれ滞留し易
く、またこのことは高圧容器が大型になればなるほど顕
著になり、その結果、圧媒の温度分布が上下方向で大き
くばらつき、被処理物を適正範囲内の温度に保持し難い
もの、つまり均熱性に劣るものとなる。また、〔図６〕
に示した従来の高圧処理装置では、総体的な放熱および
放冷面積は減少できるものの、高圧容器の内部の圧媒に
対する温度制御は、該高圧容器壁を介した熱交換による
ことは変わらず、その壁厚がより厚肉に構成されるほ
ど、内部の圧媒の温度変動に対する反応速度および均熱
性に劣るものとなる。更に、温度条件を一定とした高圧
処理では、省エネルギー化が図れるものの、大容量の複
数の機器を一体で保温もしくは保冷するため、温度条件
を変更する場合の熱ロスが大きく、かつ温度変更に時間
がかかるため、条件の異なる高圧処理に対応し難く、そ
の適用範囲が小さく制約される。That is, in the conventional high-pressure processing apparatus shown in FIG. 7, both the piston pressurization type and the external pressure-increasing type are heated or cooled from the outer peripheral side of the high-pressure container, and heat is exchanged through the wall of the high-pressure container. Since the temperature of the internal pressure medium is controlled, the thicker the wall thickness of the high-pressure container is, the larger the wall thickness of the high-pressure container is and the higher the specification processing pressure is. The thermal efficiency for controlling the temperature of the pressure medium is significantly reduced, and the reaction rate with respect to temperature fluctuations is poor. On the other hand, when viewed from the internal pressure medium side, the temperature inside the high-pressure container is controlled by being heated or cooled from the outside and generating convection that rises or falls on the outer peripheral side and flows in the opposite direction in the central part. However, the heated pressure medium tends to stay in the upper part and the cooled pressure medium tends to stay in the lower part, and this becomes more noticeable as the size of the high-pressure container becomes larger, and as a result, the temperature distribution of the pressure medium becomes larger. There is a large variation in the vertical direction, and it becomes difficult to maintain the object to be processed at a temperature within an appropriate range, that is, the heat uniformity is poor. Also, [Fig. 6]
In the conventional high-pressure processing apparatus shown in, although the overall heat dissipation and cooling area can be reduced, the temperature control for the pressure medium inside the high-pressure vessel is unchanged by the heat exchange through the wall of the high-pressure vessel, The thicker the wall is, the poorer the reaction rate and temperature uniformity with respect to the temperature fluctuation of the internal pressure medium becomes. Furthermore, high-pressure processing with constant temperature conditions saves energy, but since multiple large-capacity devices are kept warm or cool together, there is a large heat loss when changing temperature conditions, and it takes time to change the temperature. Therefore, it is difficult to deal with high-pressure treatment under different conditions, and the applicable range is limited.
【０００９】本発明は、上記従来技術の問題点を解消す
るためになされたもので、高圧容器の大型化や仕様処理
圧力の増大のために、その壁厚がより厚肉に構成されて
も、、加圧に際する圧媒の温度を熱効率良く、かつ高い
均熱性と反応速度のもとで所定温度範囲内に制御して保
持することができ、よって処理量の増大や適用範囲の拡
大に容易に対応できる高圧処理装置を提供することを目
的とする。The present invention has been made in order to solve the above-mentioned problems of the prior art. Even if the wall thickness of the high-pressure container is increased, the wall thickness of the high-pressure container is increased due to an increase in the specification processing pressure. , The temperature of the pressure medium during pressurization can be controlled and maintained within a predetermined temperature range with good thermal efficiency and high thermal uniformity and reaction rate, thus increasing the throughput and expanding the range of application. It is an object of the present invention to provide a high-pressure processing device that can easily cope with the above.
【００１０】[0010]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明は以下の構成とされている。すなわち、請
求項１に係る発明の高圧処理装置は、上下の開口部に上
蓋(1a)および下蓋(1b)を配し、内部に処理室(2) を有す
る高圧容器(1) と、この高圧容器(1) の処理室(2) に圧
媒(L) を送給加圧する圧媒加圧供給装置(5) とを備え、
前記高圧容器(1) の処理室(2) 内に装入された被処理物
(M) を前記圧媒(L) を介する等方圧下で加圧処理する高
圧処理装置おいて、前記高圧容器(1) の上蓋(1a)に冷却
機構(6) を設ける一方、下蓋(1b)に加熱機構(7) を設け
てなることを特徴とする。In order to achieve the above object, the present invention has the following constitution. That is, the high-pressure processing apparatus of the invention according to claim 1 has a high-pressure container (1) having an upper lid (1a) and a lower lid (1b) at upper and lower openings, and a processing chamber (2) inside, A pressure medium pressurizing and feeding device (5) for feeding and pressurizing the pressure medium (L) to the processing chamber (2) of the high-pressure container (1) is provided.
The object to be processed placed in the processing chamber (2) of the high-pressure container (1)
In a high-pressure processing apparatus for pressure-treating (M) under isotropic pressure through the pressure medium (L), a cooling mechanism (6) is provided on the upper lid (1a) of the high-pressure container (1) while the lower lid ( It is characterized in that the heating mechanism (7) is provided in 1b).
【００１１】また、請求項２に係る発明の高圧処理装置
は、下開口部に下蓋(1b)を配し、内部に処理室(2) を有
する高圧容器(1) と、この高圧容器(1) の上開口部から
処理室(2) 内に向けて圧下される加圧ピストン(3) とを
備え、前記高圧容器(1) の処理室(2) に圧媒(L) を充填
すると共に加圧ピストン(3) を圧下させて該圧媒(L)を
加圧し、その処理室(2) 内に装入された被処理物(M) を
前記圧媒(L) を介する等方圧下で加圧処理する高圧処理
装置おいて、前記加圧ピストン(3) の下端部に冷却機構
(6) を設ける一方、前記高圧容器(1) の下蓋(1b)に加熱
機構(7) を設けてなることを特徴とする。Further, in the high-pressure processing apparatus of the invention according to claim 2, the lower lid (1b) is arranged in the lower opening, and the high-pressure container (1) having the processing chamber (2) therein, and the high-pressure container (1) are provided. 1) The pressurizing piston (3) is pressed down from the upper opening toward the processing chamber (2), and the processing chamber (2) of the high-pressure vessel (1) is filled with the pressure medium (L). Along with pressing the pressure piston (3) to pressurize the pressure medium (L), the object to be treated (M) loaded in the processing chamber (2) is isotropically passed through the pressure medium (L). In a high-pressure treatment device that performs pressure treatment under pressure, a cooling mechanism is installed at the lower end of the pressure piston (3).
While (6) is provided, a heating mechanism (7) is provided on the lower lid (1b) of the high-pressure container (1).
【００１２】また、請求項３に係る発明の高圧処理装置
は、前記高圧容器(1) 内に、下端部に圧媒流通口(4a)を
有する対流案内筒(4) を、その外周面と前記高圧容器
(1) 内面との間に圧媒流通可能な間隙をおいて、前記高
圧容器(1) の下蓋(1b)に支持させて配設し、この対流案
内筒(4) 内側を処理室(2) としているものである。Further, in the high-pressure processing apparatus according to the third aspect of the present invention, a convection guide tube (4) having a pressure medium flow port (4a) at the lower end is provided in the high-pressure container (1) as an outer peripheral surface thereof. The high-pressure container
(1) A pressure medium can be circulated between the inner surface of the convection guide tube (4) and the processing chamber ( 2).
【００１３】また、請求項４に係る発明の高圧処理装置
は、前記冷却機構(6) が、外部の冷媒供給装置(10)に接
続された冷媒循環流路(6a)を備えてなる一方、前記加熱
機構(7) が、外部の熱媒供給装置(11)に接続された熱媒
循環流路(7a)を備えてなる。Further, in the high-pressure processing apparatus of the invention according to claim 4, the cooling mechanism (6) comprises a refrigerant circulation flow channel (6a) connected to an external refrigerant supply device (10), The heating mechanism (7) includes a heat medium circulation flow path (7a) connected to an external heat medium supply device (11).
【００１４】また、請求項５に係る発明の高圧処理装置
は、前記冷却機構(6) が、外部の冷媒供給装置(10)に接
続された冷媒循環流路(6a)を備えてなる一方、前記加熱
機構(7) が、外部の入電制御装置(12)に接続されたヒー
タ(8) を備えてなる。Further, in the high-pressure processing apparatus of the invention according to claim 5, the cooling mechanism (6) is provided with a refrigerant circulation flow path (6a) connected to an external refrigerant supply device (10), The heating mechanism (7) comprises a heater (8) connected to an external power input control device (12).
【００１５】[0015]
【作用】請求項１に係る発明では、圧媒加圧供給装置
(5) により、高圧容器(1) の処理室(2) に、圧媒(L) を
送給すると共に加圧し、その処理室(2) 内に装入された
被処理物(M) を、高圧に加圧された圧媒(L) を介する等
方圧下で加圧処理する。またその際に、前記処理室(2)
内の圧媒(L) を、該高圧容器(1) の上蓋(1a)に設けた冷
却機構(6) ないしは下蓋(1b)に設けた加熱機構(7) によ
って、冷却ないしは加熱して所定温度に保持すること
で、前記被処理物(M) を高圧な等方圧加圧と熱的作用の
共存下で加圧処理して、殺菌、変性、酵素反応の制御な
どを行う。すなわち、圧媒(L) 温度をマイナス側に制御
する場合には、上蓋(1a)に設けた冷却機構(6) によって
冷却するのであるが、このとき冷却された圧媒(L) は処
理室(2) の下部に向かって流れ、被処理物(M) および高
圧容器(1) 内壁との熱交換によって外周側から上昇し、
かつまた常に上方から冷却されることより、下部で低温
滞留部を形成することなく、中央部で下降して外周部で
上昇する対流を生じて上下方向で均等に冷却される。ま
た、その圧媒(L) 温度をプラス側に制御する場合には、
下蓋(1b)に設けた加熱機構(7) によって加熱するのであ
るが、このとき加熱された圧媒(L) は処理室(2) 上部に
向かって流れ、被処理物(M) および高圧容器(1) 内壁と
の熱交換によって外周側から下降し、かつまた常に下方
から加熱されることより、上部で高温滞留部を形成する
ことなく、中央部で上昇して外周部で下降する対流を生
じて上下方向で均等に加熱される。更にまた、上蓋(1a)
の冷却機構(6) および下蓋(1b)の加熱機構(7) は、それ
ぞれ上蓋(1a)および下蓋(1b)の内面寄り壁内ないしは内
面上に設けることで、これら上蓋(1a)および下蓋(1b)を
含む高圧容器(1) の壁厚の増大に左右されることなく、
処理室(2) 内の圧媒(L) を熱効率良く、かつ高い反応速
度のもとで、加熱ないしは冷却して所定温度範囲内に制
御すると共に保持することができる。In the invention according to claim 1, the pressure medium pressurizing and feeding device is provided.
By (5), the pressure medium (L) is fed and pressurized to the processing chamber (2) of the high-pressure vessel (1), and the object (M) loaded in the processing chamber (2) is discharged. The pressure treatment is performed under isotropic pressure through the pressure medium (L) pressurized to high pressure. At that time, the processing chamber (2)
The pressure medium (L) is cooled or heated by a cooling mechanism (6) provided on the upper lid (1a) of the high-pressure container (1) or a heating mechanism (7) provided on the lower lid (1b) of the high pressure container (1) to a predetermined temperature. By maintaining the temperature, the material to be treated (M) is subjected to pressure treatment under the coexistence of high-pressure isotropic pressure and thermal action, and sterilization, denaturation, control of enzyme reaction and the like are performed. That is, when controlling the temperature of the pressure medium (L) to the minus side, it is cooled by the cooling mechanism (6) provided on the upper lid (1a). It flows toward the lower part of (2) and rises from the outer peripheral side due to heat exchange with the object to be treated (M) and the inner wall of the high pressure vessel (1),
Further, since the cooling is always performed from above, convection that descends in the central part and rises in the outer peripheral part is generated without forming a low temperature retention part in the lower part and is uniformly cooled in the vertical direction. Also, when controlling the temperature of the pressure medium (L) to the positive side,
It is heated by the heating mechanism (7) provided on the lower lid (1b), and the pressure medium (L) heated at this time flows toward the upper part of the processing chamber (2), and the object to be processed (M) and high pressure Convection that descends from the outer side by heat exchange with the inner wall of the container (1) and is always heated from the lower side so that it does not form a high temperature retention part in the upper part and rises in the central part and descends in the outer peripheral part. And is heated evenly in the vertical direction. Furthermore, the upper lid (1a)
The cooling mechanism (6) and the heating mechanism (7) for the lower lid (1b) are installed in or on the inner wall of the upper lid (1a) and the lower lid (1b), respectively. Without being affected by the increase in the wall thickness of the high pressure vessel (1) including the lower lid (1b),
The pressure medium (L) in the processing chamber (2) can be heated or cooled to be controlled and maintained within a predetermined temperature range with good thermal efficiency and a high reaction rate.
【００１６】請求項２に係る発明では、高圧容器(1) の
処理室(2) に圧媒(L) を充填すると共に加圧ピストン
(3) を圧下させて該圧媒(L) を加圧し、その処理室(2)
内に装入された被処理物(M) を、高圧な圧媒(L) を介す
る等方圧下で加圧処理する。またその際に、前記処理室
(2) 内の圧媒(L) を、加圧ピストン(3) の下端部に設け
た冷却機構(6) ないしは下蓋(1b)に設けた加熱機構(7)
によって、冷却ないしは冷却して所定温度に保持するこ
とで、前記被処理物(M) を高圧な等方圧加圧と熱的作用
の共存下で加圧処理して、殺菌、変性、酵素反応の制御
などを行う。すなわち、圧媒(L) 温度をマイナス側に制
御する場合には、加圧ピストン(3)の下端部に設けた冷
却機構(6) によって冷却し、プラス側に制御する場合に
は、下蓋(1b)に設けた加熱機構(7) によって加熱するの
で、上記請求項１に係る発明と同作用のもとで、該圧媒
(L) を均等に冷却ないしは加熱することができる。更に
また、加圧ピストン(3) の冷却機構(6) は、その下端面
寄りに設ける一方、下蓋(1b)の加熱機構(7) は、該下蓋
(1b)の内面寄り壁内ないしは内面上に設けることで、こ
の下蓋(1b)を含む高圧容器(1) の壁厚の増大に左右され
ることなく、処理室(2) 内の圧媒(L) を熱効率良く、か
つ高い反応速度のもとで、加熱ないしは冷却して所定温
度範囲内に制御すると共に保持することができる。In the invention according to claim 2, the pressure chamber (2) of the high-pressure container (1) is filled with the pressure medium (L) and the pressure piston is
(3) is pressed down to pressurize the pressure medium (L), and its processing chamber (2)
The object to be treated (M) charged inside is subjected to pressure treatment under isotropic pressure through a high-pressure pressure medium (L). At that time, the processing chamber
(2) The cooling medium (L) inside the cooling mechanism (6) at the lower end of the pressure piston (3) or the heating mechanism (7) at the lower lid (1b).
Depending on, by cooling or holding at a predetermined temperature by cooling, the object to be treated (M) is subjected to pressure treatment under the coexistence of high-pressure isotropic pressure and thermal action, and sterilization, denaturation, enzymatic reaction Control, etc. That is, when controlling the temperature of the pressure medium (L) to the minus side, it is cooled by the cooling mechanism (6) provided at the lower end of the pressurizing piston (3), and when controlling to the plus side, the lower lid is used. Since the heating is performed by the heating mechanism (7) provided in (1b), the pressure medium has the same function as the invention according to claim 1.
(L) can be uniformly cooled or heated. Furthermore, the cooling mechanism (6) of the pressurizing piston (3) is provided near the lower end surface thereof, while the heating mechanism (7) of the lower lid (1b) is
By installing in or on the inner wall of (1b), the pressure medium in the processing chamber (2) is not affected by the increase in the wall thickness of the high-pressure vessel (1) including the lower lid (1b). (L) can be heated or cooled by heat efficiency and at a high reaction rate to be controlled and maintained within a predetermined temperature range.
【００１７】請求項３に係る発明では、前記高圧容器
(1) 内に、下端部に圧媒流通口(4a)を有する対流案内筒
(4) を該高圧容器(1) 内面との間に圧媒流通可能な間隙
をおいて配設し、この対流案内筒(4) 内側を処理室(2)
としているので、処理室(2) 内の圧媒(L) に生じ、中央
部と外周部とで逆方向に流れる対流を助長して、該処理
室(2) 内における圧媒(L) の均熱性を高めることができ
る。In the invention according to claim 3, the high-pressure container
(1) A convection guide tube with a pressure medium flow port (4a) at the lower end.
(4) is arranged with a gap through which the pressure medium can flow between the inner surface of the high-pressure vessel (1) and the inside of the convection guide tube (4) inside the processing chamber (2).
Therefore, it is generated in the pressure medium (L) in the processing chamber (2) and promotes convection flowing in the opposite direction between the central part and the outer peripheral part, and the pressure medium (L) in the processing chamber (2) The soaking property can be improved.
【００１８】請求項４に係る発明では、前記冷却機構
(6) が、冷媒供給装置(10)に接続された冷媒循環流路(6
a)を備えてなるので、その冷媒供給装置(10)から制御温
度に対応する温度の冷媒を、冷却機構(6) の冷媒循環流
路(6a)に循環送給することで、処理室(2) 内の圧媒(L)
を冷却して所定温度範囲内に制御することができる。一
方、前記加熱機構(7) が、熱媒供給装置(11)に接続され
た熱媒循環流路(7a)を備えてなるので、その熱媒供給装
置(11)から制御温度に対応する温度の熱媒を、加熱機構
(7) の熱媒循環流路(7a)に循環送給することで、処理室
(2) 内の圧媒(L) を加熱して所定温度範囲内に制御する
ことができる。In the invention according to claim 4, the cooling mechanism is provided.
(6) is the refrigerant circulation flow path (6
a), a refrigerant having a temperature corresponding to the control temperature is circulated from the refrigerant supply device (10) to the refrigerant circulation flow path (6a) of the cooling mechanism (6), so that the processing chamber ( 2) Internal pressure medium (L)
Can be cooled and controlled within a predetermined temperature range. On the other hand, since the heating mechanism (7) is provided with the heat medium circulation flow path (7a) connected to the heat medium supply device (11), the temperature corresponding to the control temperature from the heat medium supply device (11). Heating medium, heating mechanism
By circulating and supplying to the heat medium circulation flow path (7a) of (7),
(2) The pressure medium (L) in the inside can be heated and controlled within a predetermined temperature range.
【００１９】請求項５に係る発明では、前記冷却機構
(6) が外部の冷媒供給装置(10)に接続された冷媒循環流
路(6a)を備えてなるので、その冷媒供給装置(10)から制
御温度に対応する温度の冷媒を、冷却機構(6) の冷媒循
環流路(6a)に循環送給することで、処理室(2) の圧媒
(L) を冷却して所定温度範囲内に制御することができ
る。一方、前記加熱機構(7) が、外部の入電制御装置(1
2)に接続されたヒータ(8)を備えてなるので、その入電
制御装置(12)からの出力を調整することで、処理室(2)
内の圧媒(L) を加熱して所定温度範囲内に制御すること
ができる。In the invention according to claim 5, the cooling mechanism is provided.
Since (6) is provided with the refrigerant circulation flow path (6a) connected to the external refrigerant supply device (10), the refrigerant of the temperature corresponding to the control temperature from the refrigerant supply device (10) is cooled by the cooling mechanism ( By circulating and supplying to the refrigerant circulation flow path (6a) of (6), the pressure medium of the processing chamber (2) is
(L) can be cooled and controlled within a predetermined temperature range. On the other hand, the heating mechanism (7) is
Since it is equipped with a heater (8) connected to 2), by adjusting the output from the power input control device (12), the processing chamber (2)
The pressure medium (L) therein can be heated and controlled within a predetermined temperature range.
【００２０】[0020]
【実施例】以下、本発明に係る高圧処理装置の実施例を
図面を参照して説明する。〔図１〕は、本発明の第１実
施例の概要構成を示す断面図である。なお、本実施例の
高圧処理装置は、前述の外部増圧式に属するものであ
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a high pressure processing apparatus according to the present invention will be described below with reference to the drawings. [FIG. 1] is a sectional view showing a schematic configuration of a first embodiment of the present invention. The high pressure processing apparatus of this embodiment belongs to the above-mentioned external pressure increasing type.
【００２１】〔図１〕において、(1) は高圧容器であっ
て、この高圧容器(1) は、上下の開口部に上蓋(1a)およ
び下蓋(1b)を気密かつ挿脱自由に嵌合させて配し、その
内部に処理室(2) を画成している。また、その下蓋(1b)
に設けた圧媒給排孔(1c)を、断熱管路を介して、外部の
圧媒加圧供給装置(5) に接続させており、この圧媒加圧
供給装置(5) から、高圧容器(1) の処理室(2) に、清浄
水等の圧媒(L) を送給すると共に所定圧力に加圧し、か
つ加圧後に排出還流させる。なお、圧媒(L) の加圧に際
して上・下蓋(1a),(1b) に作用する軸力は、ここでは図
示を省略したプレス装置および支持機構のフレーム(F),
(F')に担持させるものとされている。また、ここでは図
示を省略したが、この高圧容器(1) には、処理室(2) に
送給された圧媒(L) の温度を検出する測温手段を配設し
ている。In FIG. 1, (1) is a high-pressure container, and the high-pressure container (1) has an upper lid (1a) and a lower lid (1b) fitted in upper and lower openings in an airtight manner and freely inserted and removed. They are placed together and a processing chamber (2) is defined inside. Also, its lower lid (1b)
The pressure medium supply / exhaust hole (1c) provided in the is connected to an external pressure medium pressure supply device (5) via an adiabatic conduit. A pressure medium (L) such as clean water is fed into the processing chamber (2) of the container (1) and pressurized to a predetermined pressure, and after pressurization, it is discharged and refluxed. The axial force acting on the upper and lower lids (1a) and (1b) when pressurizing the pressure medium (L) is the same as the frame (F) of the pressing device and the supporting mechanism (not shown).
It is supposed to be carried on (F '). Although not shown here, the high-pressure container (1) is provided with temperature measuring means for detecting the temperature of the pressure medium (L) fed to the processing chamber (2).
【００２２】また、この高圧容器(1) の上蓋(1a)には、
該上蓋(1a)内の下面寄り部位で循環路を形成し、かつ下
面寄りで蛇行して放熱表面積を高めた冷媒循環流路(6a)
からなる冷却機構(6) を内装させている。また、その冷
媒循環流路(6a)を、可撓性の断熱管路を介して、外部の
冷媒供給装置(10)に接続させており、この冷媒供給装置
(10)から、上蓋(1a)に内装された冷却機構(6) の冷媒循
環流路(6a)に、所定温度に冷却されたシリコン油等の冷
媒を循環供給し、これによって高圧容器(1) の処理室
(2) に送給された圧媒(L) を冷却する。The upper lid (1a) of this high-pressure container (1) is
A refrigerant circulation channel (6a) in which a circulation path is formed in a portion near the lower surface in the upper lid (1a) and which meanders near the lower surface to increase the heat dissipation surface area.
It is equipped with a cooling mechanism (6). Further, the refrigerant circulation flow path (6a) is connected to an external refrigerant supply device (10) via a flexible heat insulation pipe line.
From (10), a coolant such as silicon oil cooled to a predetermined temperature is circulated and supplied to the coolant circulation channel (6a) of the cooling mechanism (6) installed in the upper lid (1a), whereby the high pressure vessel (1 ) Processing room
Cool the pressure medium (L) sent to (2).
【００２３】また、この高圧容器(1) の下蓋(1b)には、
前記圧媒給排孔(1c)に加え、該下蓋(1b)内の上面寄り部
位で循環路を形成し、かつ上面寄りで蛇行して放熱表面
積を高めた熱媒循環流路(7a)からなる加熱機構(7) を内
装させている。また、その熱媒循環流路(7a)を、断熱管
路を介して、外部の熱媒供給装置(11)に接続させてお
り、この熱媒供給装置(11)から、上蓋(1a)に内装された
加熱機構(7) の熱媒循環流路(6a)に、所定温度に加熱さ
れたシリコン油等の熱媒を循環供給し、これによって高
圧容器(1) の処理室(2) に送給された圧媒(L) を加熱す
る。The lower lid (1b) of the high-pressure container (1) is
In addition to the pressure medium supply / discharge hole (1c), a heat medium circulation flow channel (7a) in which a circulation path is formed at a portion near the upper surface in the lower lid (1b) and meandering near the upper surface to increase the heat dissipation surface area The heating mechanism (7) consisting of is installed inside. Further, the heat medium circulation flow path (7a) is connected to an external heat medium supply device (11) via an adiabatic conduit, and from this heat medium supply device (11) to the upper lid (1a). A heating medium such as silicon oil heated to a predetermined temperature is circulated and supplied to the heating medium circulation flow path (6a) of the heating mechanism (7) installed in the heating mechanism (7), and this is supplied to the processing chamber (2) of the high pressure vessel (1). The pressure medium (L) fed is heated.
【００２４】なお、〔図１〕において、(M) は被処理物
であって、原形のまま、ないしは塊状、ゼリー状、液状
等に加工されて密封包装された食品である。In FIG. 1, (M) is an object to be treated, which is a food in its original form or processed into a block, jelly, liquid or the like and hermetically packaged.
【００２５】上記構成の本実施例の高圧処理装置では、
高圧容器(1) の処理室(2) に、圧媒(L) を送給すると共
に所定圧力に加圧し、その処理室(2) に装入された食品
等の被処理物(M) を、高圧に加圧された圧媒(L) を介す
る等方圧下で加圧処理する。またその際に、上蓋(1a)に
内装した冷却機構(6) に冷媒を循環供給し、ないしは下
蓋(1b)に内装した加熱機構(7) に熱媒を循環供給するこ
とによって、処理室(2) の圧媒(L) を、冷却ないしは加
熱して所定温度に保持することで、前記被処理物(M) を
高圧な等方圧加圧と熱的作用の共存下で加圧処理して、
殺菌、変性、酵素反応の制御などを行う。In the high-pressure processing apparatus of the present embodiment having the above structure,
The pressure medium (L) is fed to the processing chamber (2) of the high-pressure container (1) and pressurized to a predetermined pressure, and the processed material (M) such as food loaded in the processing chamber (2) is loaded. The pressure treatment is performed under isotropic pressure through the pressure medium (L) pressurized to high pressure. At that time, by circulating the refrigerant to the cooling mechanism (6) installed in the upper lid (1a) or circulating the heating medium to the heating mechanism (7) installed in the lower lid (1b), the processing chamber By cooling or heating the pressure medium (L) of (2) and maintaining it at a predetermined temperature, the object to be treated (M) is pressure-treated under the coexistence of high-pressure isotropic pressure and thermal action. do it,
Performs sterilization, denaturation, control of enzymatic reaction, etc.
【００２６】ここで、処理室(2) の圧媒(L) 温度をマイ
ナス側に制御する場合、上蓋(1a)側の冷却機構(6) によ
って冷却するのであるが、このとき冷却された圧媒(L)
は、〔図１〕中の一点鎖線の矢印で示すように、処理室
(2) の下部に向かって流れ、被処理物(M) および高圧容
器(1) 内壁との熱交換によって外周側で上昇し、かつま
た常に上方から冷却されることより、下部で低温滞留部
を形成することなく、中央部で下降して外周部で上昇す
る対流を生じて上下方向で均等に冷却される。また、同
圧媒(L) 温度をプラス側に制御する場合、下蓋(1b)側の
加熱機構(7)によって加熱するのであるが、このとき加
熱された圧媒(L) は、同図中の二点鎖線の矢印で示すよ
うに、処理室(2) 上部に向かって流れ、被処理物(M) お
よび高圧容器(1) 内壁との熱交換によって外周側で下降
し、かつまた常に下方から加熱されることより、上部で
高温滞留部を形成することなく、中央部で上昇して外周
部で下降する対流を生じて上下方向で均等に加熱され
る。Here, when the temperature of the pressure medium (L) in the processing chamber (2) is controlled to the minus side, it is cooled by the cooling mechanism (6) on the side of the upper lid (1a). Medium (L)
Indicates the processing chamber, as indicated by the one-dot chain line arrow in [Fig. 1].
It flows toward the lower part of (2), rises on the outer peripheral side due to heat exchange with the object to be treated (M) and the inner wall of the high-pressure container (1), and is always cooled from above, so that there is a low temperature retention part at the bottom. Without being formed, convection that descends in the central part and rises in the outer peripheral part is generated and is uniformly cooled in the vertical direction. Also, when controlling the temperature of the pressure medium (L) to the positive side, it is heated by the heating mechanism (7) on the lower lid (1b) side.The pressure medium (L) heated at this time is As indicated by the two-dot chain line arrow inside, it flows toward the upper part of the processing chamber (2), descends on the outer peripheral side by heat exchange with the object to be processed (M) and the inner wall of the high-pressure vessel (1), and always By being heated from below, convection that rises in the central part and descends in the outer peripheral part is generated without forming a high-temperature retention part in the upper part, and is uniformly heated in the vertical direction.
【００２７】更にまた、上蓋(1a)の冷却機構(6) および
下蓋(1b)の加熱機構(7) は、それぞれ上蓋(1a)および下
蓋(1b)の内面寄りに設けているので、これら上蓋(1a)お
よび下蓋(1b)を含む高圧容器(1) の壁厚の増大に左右さ
れることなく、処理室(2) の圧媒(L) を、熱効率良く、
かつ高い反応速度のもとで、加熱ないしは冷却して温度
制御でき、これによって被処理物(M) を所定温度に保持
しながら加圧して、所期の高圧処理を施すことができ
る。しかも、プラス側の領域からマイナス側の領域にわ
たる温度条件の変更に対する即応性も高く、よって処理
量の増大や適用範囲の拡大に容易に対応できる。Furthermore, since the cooling mechanism (6) of the upper lid (1a) and the heating mechanism (7) of the lower lid (1b) are provided near the inner surfaces of the upper lid (1a) and the lower lid (1b), respectively. The pressure medium (L) in the processing chamber (2) can be thermally and efficiently heated without being affected by the increase in the wall thickness of the high pressure vessel (1) including the upper lid (1a) and the lower lid (1b).
Moreover, the temperature can be controlled by heating or cooling under a high reaction rate, whereby the object (M) to be treated can be pressurized while being kept at a predetermined temperature and subjected to the desired high-pressure treatment. Moreover, the responsiveness to changes in the temperature conditions from the positive side region to the negative side region is high, and therefore, it is possible to easily cope with an increase in the processing amount and an application range.
【００２８】〔図２〕は、本発明の第２実施例の概要構
成を示す断面図である。なお、本実施例の高圧処理装置
は、高圧容器内に対流案内筒を配設した点を除き、前記
第１実施例のものと同じであるので、ここでは等価な各
部に同符号を付して説明を省略し、その差異点のみを要
約して説明する。FIG. 2 is a sectional view showing the schematic construction of the second embodiment of the present invention. The high-pressure processing apparatus of the present embodiment is the same as that of the first embodiment except that the convection guide tube is provided in the high-pressure container, and therefore, equivalent parts are designated by the same reference numerals. The description will be omitted, and only the differences will be summarized and described.
【００２９】本実施例の高圧処理装置では、高圧容器
(1) 内に、下端部に圧媒流通口(4a)を有する対流案内筒
(4) を、その外周面と前記高圧容器(1) 内面との間に圧
媒流通可能な間隙をおいて、該高圧容器(1) の下蓋(1b)
に支持させて配設し、この対流案内筒(4) の内側を処理
室(2) としている。In the high pressure processing apparatus of this embodiment, the high pressure container
(1) A convection guide tube with a pressure medium flow port (4a) at the lower end.
(4) is a lower lid (1b) of the high-pressure container (1) with a gap between the outer peripheral surface thereof and the inner surface of the high-pressure container (1) in which a pressure medium can flow.
The convection guide tube (4) is provided inside the processing chamber (2).
【００３０】上記構成の本実施例の高圧処理装置では、
上蓋(1a)側の冷却機構(6) での冷却、ないしは下蓋(1b)
側の加熱機構(7) での加熱によって処理室(2) の圧媒
(L) に生じ、中央部と外周部とで逆方向に流れる対流
を、対流案内筒(4) よる一種の煙突効果にて、例えば
〔図２〕中の一点鎖線および二点鎖線の矢印で示すよう
に、内外を通して案内することでその流れ助長して促進
させ、該処理室(2) 内における圧媒(L) の均熱性をより
高めることができる。In the high pressure processing apparatus of this embodiment having the above-mentioned structure,
Cooling by the cooling mechanism (6) on the upper lid (1a) side, or the lower lid (1b)
Side heating mechanism (7) heats the pressure medium in the processing chamber (2).
Convection that occurs in (L) and flows in the opposite direction between the central part and the outer peripheral part is caused by a kind of chimney effect by the convection guide tube (4), for example, as shown by the one-dot chain line and two-dot chain line arrow in [Fig. As shown in the drawing, by guiding the gas through the inside and outside, the flow is promoted and promoted, and the thermal uniformity of the pressure medium (L) in the processing chamber (2) can be further enhanced.
【００３１】〔図３〕は、本発明の第３実施例の概要構
成を示す断面図である。なお、本実施例の高圧処理装置
は、前述のピストン加圧式に属するものであるが、圧媒
の加圧構成が異なる点を除き、前記第１実施例のものと
同じであるので、ここでは等価な各部に同符号を付して
説明を省略し、その差異点のみを要約して説明する。FIG. 3 is a sectional view showing the schematic construction of the third embodiment of the present invention. The high-pressure processing apparatus of the present embodiment belongs to the above-mentioned piston pressurizing type, but is the same as that of the first embodiment except that the pressurizing structure of the pressure medium is different, so here, Equivalent parts are assigned the same reference numerals, explanations thereof are omitted, and only the differences will be summarized and described.
【００３２】本実施例の高圧処理装置では、第１実施例
における上蓋(1a)に代わり、高圧容器(1) の上開口部
に、ここでは図示を省略したプレス装置の作動によっ
て、該上開口部から処理室(2) 内に向けて圧下される加
圧ピストン(3) を配設している。また、その加圧ピスト
ン(3) の下端部には、第１実施例における上蓋(1a)と同
様に、該加圧ピストン(3) の下面寄り部位で循環路を形
成し、かつ下面寄りで蛇行して放熱表面積を高めた冷媒
循環流路(6a)からなる冷却機構(6) を内装させている。
また、その冷媒循環流路(6a)を、第１実施例と同構成の
もとで、冷媒供給装置(10)に接続させている。In the high-pressure processing apparatus of this embodiment, instead of the upper lid (1a) in the first embodiment, the upper opening of the high-pressure container (1) is operated by a press device (not shown here), thereby opening the upper opening. A pressurizing piston (3) is provided that is pressed down from inside the processing chamber (2). At the lower end of the pressurizing piston (3), a circulation path is formed near the lower surface of the pressurizing piston (3) as in the upper lid (1a) in the first embodiment, and at the lower surface. A cooling mechanism (6) consisting of a refrigerant circulation channel (6a) that meanders to increase the surface area for radiating heat is incorporated.
Further, the refrigerant circulation flow path (6a) is connected to the refrigerant supply device (10) under the same configuration as in the first embodiment.
【００３３】上記構成の本実施例の高圧処理装置では、
圧媒(L) を、高圧容器(1) の処理室(2) に充填すると共
に、加圧ピストン(3) を圧下させて所定圧力に加圧し、
その処理室(2) に装入された被処理物(M) を、高圧に加
圧された圧媒(L) を介する等方圧下で加圧処理する。ま
たその際に、加圧ピストン(3) の下端部に内装した冷却
機構(6) に冷媒を循環供給し、ないしは下蓋(1b)に内装
した加熱機構(7) に熱媒を循環供給するこによって、処
理室(2) の圧媒(L) を、冷却ないしは加熱して所定温度
に保持することで、前記被処理物(M) を高圧な等方圧加
圧と熱的作用の共存下で加圧処理して、殺菌、変性、酵
素反応の制御などを行う。すなわち、第１実施例と同様
に、圧媒(L) 温度をマイナス側に制御する場合には、加
圧ピストン(3) 側の冷却機構(6) によって冷却し、プラ
ス側に制御する場合には、下蓋(1b)に内装した加熱機構
(7) によって加熱するので、第１実施例と同作用のもと
で、該圧媒(L) を均等に冷却ないしは加熱することがで
き、また同様に、高圧容器(1) の壁厚の増大に左右され
ることなく、処理室(2) の圧媒(L)を、熱効率良く、か
つ高い反応速度のもとで、加熱ないしは冷却して温度制
御でき、これによって被処理物(M) を所定温度に保持し
ながら加圧して、所期の高圧処理を施すことができる。
しかも、プラス側の領域からマイナス側の領域にわたる
温度条件の変更に対する即応性も高く、よって処理量の
増大や適用範囲の拡大に容易に対応できる。In the high pressure processing apparatus of this embodiment having the above structure,
The pressure medium (L) is filled in the processing chamber (2) of the high-pressure container (1), and the pressurizing piston (3) is pressed down to a predetermined pressure,
The object to be treated (M) loaded in the processing chamber (2) is subjected to pressure treatment under isotropic pressure via a pressure medium (L) pressurized to high pressure. At that time, the refrigerant is circulated and supplied to the cooling mechanism (6) installed in the lower end of the pressurizing piston (3) or the heating medium is circulated and supplied to the heating mechanism (7) installed in the lower lid (1b). As a result, the pressure medium (L) in the processing chamber (2) is cooled or heated and kept at a predetermined temperature, so that the object (M) to be processed coexists with high-pressure isotropic pressure and thermal action. Under pressure treatment, sterilization, denaturation, control of enzyme reaction, etc. are performed. That is, as in the first embodiment, when controlling the temperature of the pressure medium (L) to the minus side, cooling is performed by the cooling mechanism (6) on the pressurizing piston (3) side, and when it is controlled to the plus side. Is a heating mechanism installed in the lower lid (1b)
Since it is heated by (7), the pressure medium (L) can be uniformly cooled or heated under the same action as in the first embodiment, and similarly, the pressure medium (L) can have a wall thickness of It is possible to control the temperature of the pressure medium (L) in the processing chamber (2) by heating or cooling it with high thermal efficiency and high reaction rate without being affected by the increase. The desired high pressure treatment can be performed by pressurizing while maintaining a predetermined temperature.
Moreover, the responsiveness to changes in the temperature conditions from the positive side region to the negative side region is high, and therefore, it is possible to easily cope with an increase in the processing amount and an application range.
【００３４】なお、上記第３実施例では、高圧容器内に
対流案内筒を配置していないが、前記第２実施例と同様
に、処理室の圧媒の対流を促進させて均熱性を高めるた
め、その高圧容器内に対流案内筒に配置することが望ま
しい。また、この場合、該対流案内筒の高さは、上端が
加圧ピストンの下死点よりも低くなる高さとする。In the third embodiment, the convection guide tube is not arranged in the high-pressure container, but as in the second embodiment, the convection of the pressure medium in the processing chamber is promoted to enhance the thermal uniformity. Therefore, it is desirable to arrange the convection guide tube in the high-pressure container. Further, in this case, the height of the convection guide cylinder is such that the upper end is lower than the bottom dead center of the pressure piston.
【００３５】また、上記第１〜第３実施例では、高圧容
器(1) の上蓋(1a)または加圧ピストン(3) の冷却機構
(6) と下蓋(1b)の加熱機構(7) とは、それぞれの内面寄
りに内装したが、それら冷却機構(6) の冷媒循環流路(6
a)および加熱機構(7) の熱媒循環流路(7a)は、処理室
(2) の圧媒(L) に対する熱交換効率を高めるため、その
一部を管路構成として、処理に悪影響を及ぼさない限り
において、処理室(2) 内に露出なしいは突出させて良い
ことは言うまでもない。In the first to third embodiments, the cooling mechanism for the upper lid (1a) of the high pressure container (1) or the pressurizing piston (3) is used.
(6) and the heating mechanism (7) of the lower lid (1b) were installed near the inner surface of each, but the refrigerant circulation flow path (6) of the cooling mechanism (6)
a) and the heating medium circulation flow path (7a) of the heating mechanism (7)
In order to improve the heat exchange efficiency with respect to the pressure medium (L) of (2), a part of it may be configured as a pipe line, and it can be exposed or exposed in the processing chamber (2) unless it adversely affects the processing. Needless to say.
【００３６】また、上記第１〜第３実施例では、高圧容
器(1) の下蓋(1b)の加熱機構(7) は、外部の熱媒供給装
置(11)に接続された熱媒循環流路(7a)からなるものとし
たが、この下蓋(1b)の加熱機構(7) は、例えば、本発明
の別の実施態様の説明断面図である〔図４〕に示すよう
に、外部の入電制御装置(12)に接続させたヒータ(8)を
備えてなり、その入電制御装置(12)からヒータ(8) への
出力を調整することで、処理室(2) の圧媒(L) を加熱す
るものとされても良い。また、この場合、加熱機構(7)
のヒータ(8) は、処理室(2) の圧媒(L) に対する熱交換
効率を高めるため、 (a)図に示すように下蓋(1b)内の上
面寄り部位に内装するか、 (b)図に示すように下蓋(1b)
の内面上に突出させて設ける。In the first to third embodiments described above, the heating mechanism (7) of the lower lid (1b) of the high-pressure container (1) is a heat medium circulating device connected to an external heat medium supply device (11). The heating mechanism (7) of the lower lid (1b) is, for example, as shown in FIG. 4 which is an explanatory sectional view of another embodiment of the present invention. It is equipped with a heater (8) connected to an external power input control device (12), and by adjusting the output from the power input control device (12) to the heater (8), the pressure medium in the processing chamber (2) is adjusted. (L) may be heated. Also, in this case, the heating mechanism (7)
In order to improve the heat exchange efficiency with respect to the pressure medium (L) in the processing chamber (2), the heater (8) of (1) is installed inside the lower lid (1b) near the upper surface as shown in (a). b) Lower lid (1b) as shown
It is provided so as to project on the inner surface of.
【００３７】[0037]
【発明の効果】以上に述べたように、本発明の高圧処理
装置は、高圧容器の大型化や仕様処理圧力の増大のため
に、その壁厚がより厚肉に構成されても、、加圧に際す
る圧媒の温度を熱効率良く、かつ高い均熱性と反応速度
のもとで所定温度範囲内に制御して保持することがで
き、よって処理量の増大や適用範囲の拡大に容易に対応
できて、各種食品の殺菌、変性、酵素反応の制御などを
行う加圧処理を、大規模かつ効率良く実施することを可
能にすることができる。As described above, the high-pressure processing apparatus of the present invention has a large wall thickness due to the increase in the size of the high-pressure container and the increase in the specified processing pressure. The temperature of the pressure medium at the time of pressure can be controlled and maintained within a predetermined temperature range with high thermal efficiency and high soaking property and reaction rate. Therefore, it is easy to increase the throughput and the range of application. As a result, it is possible to carry out a pressure treatment for sterilizing and denaturing various foods, controlling enzyme reactions, etc. on a large scale and efficiently.
【図１】本発明に係る高圧処理装置の第１実施例の概要
構成を示す断面図である。FIG. 1 is a cross-sectional view showing a schematic configuration of a first embodiment of a high-pressure processing apparatus according to the present invention.
【図２】本発明に係る高圧処理装置の第２実施例の概要
構成を示す断面図である。FIG. 2 is a sectional view showing a schematic configuration of a second embodiment of the high pressure processing apparatus according to the present invention.
【図３】本発明に係る高圧処理装置の第３実施例の概要
構成を示す断面図である。FIG. 3 is a sectional view showing a schematic configuration of a third embodiment of the high-pressure processing apparatus according to the present invention.
【図４】本発明に係る高圧処理装置の別の実施態様の説
明断面図である。FIG. 4 is an explanatory cross-sectional view of another embodiment of the high-pressure processing apparatus according to the present invention.
【図５】本発明に関わる高圧処理における食品殺菌での
大腸菌の死滅に対する加圧圧力と温度との相関関係を示
すグラフである。FIG. 5 is a graph showing a correlation between pressurizing pressure and temperature for killing Escherichia coli in food sterilization in high-pressure treatment according to the present invention.
【図６】従来の外部増圧式の高圧処理装置の概要構成の
説明図である。FIG. 6 is an explanatory diagram of a schematic configuration of a conventional external pressure increasing type high pressure processing apparatus.
【図７】従来の代表的な高圧処理装置の概要構成の説明
図である。FIG. 7 is an explanatory diagram of a schematic configuration of a conventional typical high-pressure processing apparatus.
(1) --高圧容器 (1a)--上蓋 (1b)--下蓋 (1c)--圧媒給排孔 (2) --処理室 (5) --圧媒加圧供給装置、 (6) --冷却機構 (6a)--冷媒循環流路 (7) --加熱機構 (7a)--熱媒循環流路 (10)--冷媒供給装置 (11)--熱媒供給装置 (L) --圧媒 (M) --被処理物。 (1) --High-pressure container (1a)-Top lid (1b)-Bottom lid (1c)-Pressure medium supply / discharge hole (2)-Process chamber (5)-Pressure medium pressure supply device, ( 6)-Cooling mechanism (6a)-Refrigerant circulation flow path (7)-Heating mechanism (7a)-Heat medium circulation flow path (10)-Refrigerant supply device (11)-Heat medium supply device ( L) --Pressure medium (M) --Processing object.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 井上 陽一 兵庫県高砂市荒井町新浜２丁目３番１号 株式会社神戸製鋼所高砂製作所内 (72)発明者 直井 利勝 兵庫県高砂市荒井町新浜２丁目３番１号 株式会社神戸製鋼所高砂製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoichi Inoue 2-3-1, Niihama, Arai-cho, Takasago, Hyogo Prefecture Kobe Steel Works Takasago Works (72) Inventor Toshikatsu Naoi 2-3, Niihama, Arai-cho, Takasago, Hyogo Prefecture No. 1 Inside Takasago Works, Kobe Steel, Ltd.
Claims (5)
を配し、内部に処理室(2) を有する高圧容器(1) と、こ
の高圧容器(1) の処理室(2) に圧媒(L) を送給加圧する
圧媒加圧供給装置(5) とを備え、前記高圧容器(1) の処
理室(2) 内に装入された被処理物(M) を前記圧媒(L) を
介する等方圧下で加圧処理する高圧処理装置おいて、前
記高圧容器(1) の上蓋(1a)に冷却機構(6) を設ける一
方、下蓋(1b)に加熱機構(7) を設けてなることを特徴と
する高圧処理装置。1. An upper lid (1a) and a lower lid (1b) in upper and lower openings.
And a pressure medium pressurizing and feeding device (1) having a processing chamber (2) inside and a pressure medium (L) for feeding and pressurizing the pressure medium (L) to the processing chamber (2) of the high pressure container (1). 5) and a high-pressure processing apparatus for pressurizing the object (M) loaded in the processing chamber (2) of the high-pressure container (1) under isotropic pressure through the pressure medium (L). In the high pressure processing apparatus, the upper lid (1a) of the high pressure container (1) is provided with a cooling mechanism (6), while the lower lid (1b) is provided with a heating mechanism (7).
室(2) を有する高圧容器(1) と、この高圧容器(1) の上
開口部から処理室(2) 内に向けて圧下される加圧ピスト
ン(3) とを備え、前記高圧容器(1) の処理室(2) に圧媒
(L) を充填すると共に加圧ピストン(3) を圧下させて該
圧媒(L) を加圧し、その処理室(2) 内に装入された被処
理物(M) を前記圧媒(L) を介する等方圧下で加圧処理す
る高圧処理装置おいて、前記加圧ピストン(3) の下端部
に冷却機構(6) を設ける一方、前記高圧容器(1) の下蓋
(1b)に加熱機構(7) を設けてなることを特徴とする高圧
処理装置。2. A high pressure vessel (1) having a lower lid (1b) in the lower opening and having a processing chamber (2) inside, and a processing chamber (2) from the upper opening of the high pressure vessel (1). And a pressurizing piston (3) that is pressed inward, and a pressure medium is added to the processing chamber (2) of the high-pressure container (1).
(L) is filled and the pressure piston (3) is pressed down to pressurize the pressure medium (L), and the object to be treated (M) charged in the processing chamber (2) is transferred to the pressure medium (L). In a high-pressure processing device that performs pressure treatment under isotropic pressure via L), a cooling mechanism (6) is provided at the lower end of the pressure piston (3), while the lower lid of the high-pressure container (1) is installed.
A high-pressure processing apparatus comprising a heating mechanism (7) provided in (1b).
通口(4a)を有する対流案内筒(4) を、その外周面と前記
高圧容器(1) 内面との間に圧媒流通可能な間隙をおい
て、前記高圧容器(1) の下蓋(1b)に支持させて配設し、
この対流案内筒(4) 内側を処理室(2) としている請求項
１または２記載の高圧処理装置。3. A convection guide tube (4) having a pressure medium flow port (4a) at the lower end of the high pressure vessel (1) is provided between the outer peripheral surface and the inner surface of the high pressure vessel (1). With a space through which a medium can flow, the lower lid (1b) of the high-pressure container (1) is supported and disposed,
The high-pressure processing apparatus according to claim 1 or 2, wherein the inside of the convection guide tube (4) is the processing chamber (2).
置(10)に接続された冷媒循環流路(6a)を備えてなる一
方、前記加熱機構(7) が、外部の熱媒供給装置(11)に接
続された熱媒循環流路(7a)を備えてなる請求項１、２ま
たは３記載の高圧処理装置。4. The cooling mechanism (6) comprises a refrigerant circulation channel (6a) connected to an external refrigerant supply device (10), while the heating mechanism (7) comprises an external heat medium. The high-pressure processing apparatus according to claim 1, 2 or 3, comprising a heat medium circulation flow path (7a) connected to the supply device (11).
置(10)に接続された冷媒循環流路(6a)を備えてなる一
方、前記加熱機構(7) が、外部の入電制御装置(12)に接
続されたヒータ(8) を備えてなる請求項１、２または３
記載の高圧処理装置。5. The cooling mechanism (6) comprises a refrigerant circulation channel (6a) connected to an external refrigerant supply device (10), while the heating mechanism (7) controls external power input. 4. A heater (8) connected to the device (12), claim 1, 2 or 3.
The high-pressure processing device described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP353895A JPH08187069A (en) | 1995-01-12 | 1995-01-12 | High-pressure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP353895A JPH08187069A (en) | 1995-01-12 | 1995-01-12 | High-pressure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08187069A true JPH08187069A (en) | 1996-07-23 |
Family
ID=11560193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP353895A Withdrawn JPH08187069A (en) | 1995-01-12 | 1995-01-12 | High-pressure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08187069A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1201139A1 (en) * | 2000-10-26 | 2002-05-02 | SIG Simonazzi S.p.A. | Pressurization Device |
| WO2010119505A1 (en) * | 2009-04-14 | 2010-10-21 | 越後製菓 株式会社 | High-pressure processing device |
| WO2021195276A1 (en) * | 2020-03-27 | 2021-09-30 | Avure Technologies Incorporated | Pressure vessel temperature control for bulk processing in high pressure application |
-
1995
- 1995-01-12 JP JP353895A patent/JPH08187069A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1201139A1 (en) * | 2000-10-26 | 2002-05-02 | SIG Simonazzi S.p.A. | Pressurization Device |
| WO2002034074A1 (en) * | 2000-10-26 | 2002-05-02 | Sig Simonazzi S.P.A. | Pressurization device |
| WO2010119505A1 (en) * | 2009-04-14 | 2010-10-21 | 越後製菓 株式会社 | High-pressure processing device |
| JP5015350B2 (en) * | 2009-04-14 | 2012-08-29 | 越後製菓株式会社 | High pressure processing equipment |
| WO2021195276A1 (en) * | 2020-03-27 | 2021-09-30 | Avure Technologies Incorporated | Pressure vessel temperature control for bulk processing in high pressure application |
| CN115334902A (en) * | 2020-03-27 | 2022-11-11 | 阿维瑞技术股份有限公司 | Batch processing pressure vessel temperature control in high pressure applications |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20020402 |