JPH08173668A - Sewing machine shuttle and its manufacture - Google Patents
Sewing machine shuttle and its manufactureInfo
- Publication number
- JPH08173668A JPH08173668A JP32504394A JP32504394A JPH08173668A JP H08173668 A JPH08173668 A JP H08173668A JP 32504394 A JP32504394 A JP 32504394A JP 32504394 A JP32504394 A JP 32504394A JP H08173668 A JPH08173668 A JP H08173668A
- Authority
- JP
- Japan
- Prior art keywords
- coating layer
- compound coating
- sewing machine
- hook
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Sewing Machines And Sewing (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ミシンの釜機構及びそ
の製造方法に関し、詳しくは外釜内に配置される内釜が
互いの摺動部を介して摺動・回転するミシンの釜機構及
びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hook mechanism of a sewing machine and a method of manufacturing the same, and more specifically, a hook mechanism of a sewing machine in which an inner hook arranged in an outer hook slides and rotates through mutual sliding portions. And a manufacturing method thereof.
【０００２】[0002]
【従来の技術】従来より、工業用に用いられるミシンの
外釜や内釜（中釜）は、普通炭素鋼等の金属材料からな
り、これに耐摩耗性や耐焼付き性を付与するために、浸
炭焼入れ処理、窒化処理、或は硬質クロムメッキ処理等
を施して使用していた。この際、外釜と内釜との摺動部
である相対するレース面は、非常に高速で摺動するため
に、摩擦によって発熱し、摩耗や焼付きを引き起こすこ
とがある。そこで、これを防止するために、外釜の駆動
軸の内部を通して、その摺動部に強制的に多量の潤滑油
を供給していた。2. Description of the Related Art Conventionally, an outer hook and an inner hook (middle hook) of a sewing machine used for industrial purposes are made of a metal material such as ordinary carbon steel, and are provided with wear resistance and seizure resistance. It was used after being subjected to carburizing and quenching treatment, nitriding treatment, or hard chrome plating treatment. At this time, the opposing race surfaces, which are the sliding portions between the outer hook and the inner hook, slide at a very high speed, so that heat is generated due to friction, which may cause wear and seizure. Therefore, in order to prevent this, a large amount of lubricating oil is forcibly supplied to the sliding portion through the inside of the drive shaft of the outer hook.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、この従
来のミシンの釜機構では、多量に供給される潤滑油が内
釜に装着されたボビン内の糸を汚染したり、釜の回転に
ともなって潤滑油が周囲に飛び散って縫製布を汚染する
という問題を有していた。However, in the conventional hook mechanism of the sewing machine, a large amount of the lubricating oil supplied contaminates the thread in the bobbin attached to the inner hook, and lubricates as the hook rotates. There was a problem that oil spatters around and contaminates the sewing cloth.
【０００４】また、これら糸や縫製布の汚染を防止する
ために、潤滑油の供給を絞っていくと、外釜及び内釜の
摺動部において、異常摩耗や焼付きを引き起こすという
別の問題が発生してしまう。本発明は、上述した問題点
を解決するためになされたものであり、微量給油下又は
無給油下において高速運転することができるミシンの釜
機構及びその製造方法を提供することを目的とするもの
である。Further, if the supply of lubricating oil is reduced in order to prevent the contamination of these threads and sewing cloths, another problem is that abnormal sliding and seizure are caused in the sliding parts of the outer hook and the inner hook. Will occur. The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a hook mechanism of a sewing machine that can be operated at high speed under a small amount of oil supply or without oil supply, and a manufacturing method thereof. Is.
【０００５】[0005]
【課題を解決するための手段】前記目的を達成するため
の請求項１の発明は、外釜内に配置される内釜が、互い
の摺動部を介して摺動・回転するミシンの釜機構におい
て、少なくとも前記外釜及び内釜の一方の少なくとも前
記摺動部の表面に、クロム及び窒素からなる化合物被膜
層を設けたことを特徴とするミシンの釜機構を要旨とす
る。In order to achieve the above object, the invention of claim 1 is a hook of a sewing machine in which an inner hook arranged in an outer hook slides / rotates through mutual sliding portions. In the mechanism, at least one of the outer hook and the inner hook is provided with a compound coating layer made of chromium and nitrogen on at least the surface of the sliding portion.
【０００６】請求項２の発明は、前記化合物被膜層が、
主としてＣｒ2Ｎからなる化合物から構成されているこ
とを特徴とする前記請求項１記載のミシンの釜機構を要
旨とする。請求項３の発明は、前記化合物被膜層の厚さ
が、１〜２０μｍの範囲であることを特徴とする前記請
求項１又は２記載のミシンの釜機構を要旨とする。According to a second aspect of the invention, the compound coating layer comprises:
The gist is the hook mechanism of the sewing machine according to claim 1, characterized in that it is composed mainly of a compound consisting of Cr 2 N. A third aspect of the invention provides the sewing machine hook mechanism according to the first or second aspect, wherein the thickness of the compound coating layer is in the range of 1 to 20 μm.
【０００７】請求項４の発明は、前記化合物被膜層の平
均表面粗さが、３．２μｍ以下であることを特徴とする
前記請求項１〜３のいずれか記載のミシンの釜機構を要
旨とする。請求項５の発明は、前記一方の摺動部として
前記化合物被膜層を設けた摺動部を用いる場合に、他方
の摺動部として浸炭焼き入れ処理した鉄鋼材料を用いる
ことを特徴とする前記請求項１〜４のいずれか記載のミ
シンの釜機構を要旨とする。A fourth aspect of the present invention provides a sewing machine hook mechanism according to any one of the first to third aspects, characterized in that the average surface roughness of the compound coating layer is 3.2 μm or less. To do. According to a fifth aspect of the present invention, when a sliding portion provided with the compound coating layer is used as the one sliding portion, a carburized and quenched steel material is used as the other sliding portion. The gist is the hook mechanism of the sewing machine according to any one of claims 1 to 4.
【０００８】請求項６の発明は、前記請求項１〜５のい
ずれか記載の化合物被膜層を、イオンプレーティング法
によって形成することを特徴とするミシンの釜機構の製
造方法を要旨とする。請求項７の発明は、前記化合物被
膜層形成後に、該化合物被覆層の平均表面粗さが３．２
μｍ以下になるまで、該化合物被膜層の表面に対し研磨
又はポリッシング等の後加工処理を施すことを特徴とす
る前記請求項６記載のミシンの釜機構の製造方法を要旨
とする。A sixth aspect of the invention provides a method of manufacturing a hook mechanism of a sewing machine, characterized in that the compound coating layer according to any one of the first to fifth aspects is formed by an ion plating method. In the invention of claim 7, the average surface roughness of the compound coating layer is 3.2 after the compound coating layer is formed.
The gist of the method for manufacturing a hook mechanism of a sewing machine according to claim 6 is that post-processing such as polishing or polishing is performed on the surface of the compound coating layer until it becomes equal to or less than μm.
【０００９】[0009]
【作用】請求項１の発明では、少なくとも外釜及び内釜
の一方の少なくとも摺動部の表面に、クロム及び窒素か
らなる化合物被膜層を設けてある。つまり、外釜及び内
釜の両方か、又はどちから一方のみに対して、釜の少な
くとも摺動部（従って全体でもよい）に化合物被膜層が
設けてある。According to the invention of claim 1, a compound coating layer made of chromium and nitrogen is provided on at least the surface of the sliding portion of at least one of the outer pot and the inner pot. That is, the compound coating layer is provided on at least the sliding portion (and hence the whole) of the pot for both the outer pot and the inner pot, or only one of them.
【００１０】この化合物被膜層は、クロムと窒素からな
る化合物の層であり、優れた耐焼付き性、耐摩耗性、低
摩擦性を備えているので、従来の様に、多くの給油を必
要としない。具体的には、例えば回転数が３０００rpm
以下では、無給油でも運転が可能であり、しかもそれ以
上の回転数でも、僅かの潤滑油を供給するだけで済む。
よって、本発明では、ボビン内の糸や縫製布を潤滑油で
汚染することなく、しかも高速な運転が可能である。This compound coating layer is a compound layer consisting of chromium and nitrogen, and has excellent seizure resistance, abrasion resistance, and low friction property, so that it requires a lot of lubrication as in the past. do not do. Specifically, for example, the rotation speed is 3000 rpm
In the following, it is possible to operate without oil supply, and even if the rotation speed is higher than that, it is sufficient to supply a small amount of lubricating oil.
Therefore, in the present invention, high-speed operation is possible without contaminating the thread or sewing cloth in the bobbin with the lubricating oil.
【００１１】請求項２の発明では、化合物被膜層の材料
として、主としてＣｒ2Ｎからなる化合物を採用でき、
この材料を採用する場合には、耐焼付き性、耐摩耗性、
低摩擦性等の性能が向上する。請求項３の発明では、化
合物被膜層の厚さが、１〜２０μｍの範囲であるので、
十分な耐焼付き性、耐摩耗性、低摩擦性等の性能を有す
る。尚、この化合物被膜層の厚さは、好ましくは１〜１
０μｍ、更に好ましくは３〜４μｍである。In the second aspect of the present invention, a compound mainly composed of Cr 2 N can be adopted as the material of the compound coating layer,
When using this material, seizure resistance, wear resistance,
Performance such as low friction is improved. In the invention of claim 3, since the thickness of the compound coating layer is in the range of 1 to 20 μm,
It has sufficient seizure resistance, abrasion resistance, low friction, and other properties. The thickness of the compound coating layer is preferably 1 to 1
It is 0 μm, more preferably 3 to 4 μm.
【００１２】請求項４の発明では、化合物被膜層の平均
表面粗さが、３．２μｍ以下であるので、一層優れた耐
焼付き性、耐摩耗性、低摩擦性等の性能を有する。請求
項５の発明では、一方の摺動部として化合物被膜層を設
けた摺動部を用い、他方の摺動部として浸炭焼き入れ処
理した鉄鋼材料を用いる場合に、更に優れた耐焼付き
性、耐摩耗性、低摩擦性等の性能を有する。In the invention of claim 4, since the average surface roughness of the compound coating layer is 3.2 μm or less, it has further excellent performances such as seizure resistance, abrasion resistance and low friction. According to the invention of claim 5, when a sliding portion provided with a compound coating layer is used as one sliding portion and a carburizing and quenching treated steel material is used as the other sliding portion, further excellent seizure resistance, It has properties such as wear resistance and low friction.
【００１３】請求項６の発明では、化合物被膜層を、イ
オンプレーティング法によって形成することによって、
耐焼付き性、耐摩耗性、低摩擦性等の優れた性能を有す
る化合物被膜層を実現できる。請求項７の発明では、化
合物被膜層形成後に、３．２μｍ以下の平均表面粗さと
なるまで、化合物被膜層の表面に対し研磨又はポリッシ
ング等の後加工処理を施すので、表面が滑らかになり、
一層耐焼付き性、耐摩耗性、低摩擦性等の性能が向上す
る。According to the invention of claim 6, the compound coating layer is formed by an ion plating method.
It is possible to realize a compound coating layer having excellent properties such as seizure resistance, wear resistance, and low friction. In the invention of claim 7, after the compound coating layer is formed, the surface of the compound coating layer is subjected to post-treatment such as polishing or polishing until the average surface roughness becomes 3.2 μm or less, so that the surface becomes smooth,
Performance such as seizure resistance, wear resistance, and low friction is further improved.
【００１４】[0014]
【実施例】以下、本発明を具体化した一実施例を図面を
参照して説明する。図１は本実施例の工業用ミシンの釜
部分の断面図、図２はその釜部分の分解斜視図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a hook portion of an industrial sewing machine of this embodiment, and FIG. 2 is an exploded perspective view of the hook portion.
【００１５】まず、図１（ａ）に示す様に、本実施例の
工業用ミシン（以下単にミシンと称す）は、外釜１と、
この外釜１内に回転軸を一致させて収容される内釜３と
を備えている。このうち、外釜１は、中央の外釜本体５
と、大きな開口部７側に取り付けられるリング状の内釜
押え９と、内釜押え９と反対側に設けられたボス部１１
とからなる。前記外釜本体５には、外側面１７Ａ及び周
側面１７Ｃを有する段部１３が形成されており、この段
部１３は、内釜押え９の内側面１７Ｂとによって環状の
摺動溝１７を構成している。摺動溝１７は、後述する内
釜３の摺動レール１９と嵌合して、内釜２を回動可能に
使用する環状の溝であり、外釜１の開口部７の内周面に
形成されている。また、前記ボス部１１は、釜駆動軸２
１が嵌合される中心孔２３を有している。First, as shown in FIG. 1 (a), an industrial sewing machine of the present embodiment (hereinafter simply referred to as a sewing machine) comprises an outer pot 1,
The outer pot 1 is provided with an inner pot 3 which is housed with its rotation axis aligned. Of these, the outer pot 1 is the outer pot body 5 at the center.
A ring-shaped inner hook holder 9 attached to the large opening 7 side, and a boss portion 11 provided on the opposite side of the inner hook holder 9
Consists of A step portion 13 having an outer side surface 17A and a peripheral side surface 17C is formed on the outer hook main body 5, and the step portion 13 forms an annular sliding groove 17 with the inner side surface 17B of the inner hook holder 9. are doing. The sliding groove 17 is an annular groove that fits with a slide rail 19 of the inner hook 3 described later and is used to rotatably use the inner hook 2, and is formed on the inner peripheral surface of the opening 7 of the outer hook 1. Has been formed. Also, the boss portion 11 is used for the shuttle drive shaft 2
1 has a central hole 23 into which it is fitted.
【００１６】また、図２に示す様に、前記外釜本体５及
び内釜押え９には、３箇所に貫通孔２５が形成されてお
り、この貫通孔２５に挿通されるボルト２７及びそれに
ねじ込まれるナット２９によって、両者は着脱可能に固
定されている。尚、外釜本体５の周囲には、剣先３１に
隣接する部位に、金属板からなる糸さばき板３３が固定
されている。As shown in FIG. 2, through holes 25 are formed at three locations in the outer hook main body 5 and the inner hook retainer 9, and bolts 27 inserted into the through holes 25 and screwed into them. Both are detachably fixed by a nut 29 provided. In addition, around the outer hook main body 5, a thread separating plate 33 made of a metal plate is fixed to a portion adjacent to the sword tip 31.
【００１７】一方、内釜３は、図１（ａ）に示す様に、
外釜１に嵌合する（一端が閉塞された）円筒部３５を備
えており、この円筒部３５の外周に、環状に突出する前
記摺動レール１９が形成されている。つまり、図１
（ｂ）に示す様に、この摺動レール１９は、前記摺動溝
１７に嵌合する様に、平行な左右の側面１９Ａ，１９Ｂ
と、この左右の側面１９Ａ，１９Ｂに直角に外周面１９
Ｃとを備えている。On the other hand, the inner pot 3 is, as shown in FIG.
A cylindrical portion 35 that fits into the outer pot 1 (one end is closed) is provided, and the sliding rail 19 that projects annularly is formed on the outer periphery of the cylindrical portion 35. That is, FIG.
As shown in (b), the sliding rail 19 has parallel left and right side surfaces 19A and 19B so as to fit in the sliding groove 17.
And the outer peripheral surface 19 at right angles to the left and right side surfaces 19A and 19B.
It has C and.
【００１８】特に本実施例では、内釜３の摺動レール１
９の表面に、即ち、両側面１９Ａ，１９Ｂ及び外周面１
９Ｃに、膜厚１〜２０μｍ、被膜硬度Ｈｖ１５００〜２
０００のクロム及び窒素の化合物被膜層３７が、後述す
るイオンプレーティング法により形成されている。更
に、化合物被膜層３７の表面は、平均面粗さ３．２μｍ
以下にまでポリッシュ（又は研磨）されて、表面が極め
て滑らかに仕上げられている。Particularly in this embodiment, the sliding rail 1 of the inner hook 3 is
9 surface, that is, both side surfaces 19A, 19B and outer peripheral surface 1
9C, film thickness 1 to 20 μm, coating hardness Hv 1500 to 2
000 chromium and nitrogen compound coating layers 37 are formed by the ion plating method described later. Further, the surface of the compound coating layer 37 has an average surface roughness of 3.2 μm.
The surface is extremely smooth finished by polishing (or polishing) to the following.
【００１９】また、外釜本体５及び内釜押え９は、浸炭
焼入鋼（Ｈｖ６００以上）にて形成されているので、化
合物被膜層３７と直接接触する摺動溝１７は、この浸炭
焼入鋼にて形成されている。尚、内釜３の本体部分は、
同様に浸炭焼入鋼から構成されている。Further, since the outer pot main body 5 and the inner pot presser 9 are made of carburized and hardened steel (Hv600 or more), the sliding groove 17 which is in direct contact with the compound coating layer 37 is formed by the carburized and hardened steel. It is made of steel. The body of the inner pot 3 is
Similarly, it is composed of carburized and hardened steel.
【００２０】次に、本実施例の釜構造の製造方法につい
て、図３の工程図及び図４のイオンプレーティングの説
明図を参照して説明する。 （前処理工程）まず、図３に示す様に、材料の内釜３の
表面に、活性な新生面をつくり、被膜との密着性を向上
させるために、ペーパーラップを行なった後に、ポリッ
シュを行ない、その後超音波精密洗浄を行なう。尚、こ
こで、化合物被膜層３７を形成しない箇所には、治具等
によってマスキングを行なう。Next, a method for manufacturing the kettle structure of this embodiment will be described with reference to the process diagram of FIG. 3 and the ion plating diagram of FIG. (Pretreatment Step) First, as shown in FIG. 3, an active new surface is formed on the surface of the inner pot 3 of the material, and in order to improve the adhesion with the coating, paper lap is performed and then polishing is performed. , And then ultrasonic precision cleaning. Here, masking is performed on a portion where the compound coating layer 37 is not formed with a jig or the like.
【００２１】（コーティング工程）次に、被処理物であ
る内釜３を、図４に示す様に、イオンプレーティングを
行なうための真空槽（真空チャンバ）内の回転テーブル
上に配置する。次に、この真空槽の真空引きを行った後
に、加熱して脱ガスを行ない、その後清浄な被処理面の
ために、スパッタクリーニングを行なう。(Coating Step) Next, as shown in FIG. 4, the inner pot 3 which is the object to be treated is placed on a rotary table in a vacuum chamber (vacuum chamber) for performing ion plating. Next, after evacuation of this vacuum chamber, heating is performed to degas, and then sputter cleaning is performed for a clean surface to be processed.
【００２２】次に、真空槽内を約４００℃に加熱し、こ
の加熱された真空槽内に、プロセスガスとして窒素ガス
（Ｎ2）を流しながら、アーク電源によるアーク放電を
行なう。それによって、カソードからＣｒイオンを蒸発
させ、バイアス電圧をかけた回転テーブルに載置した内
釜３の表面に、主としてＣｒ2Ｎの形からなる化合物を
蒸着させてコーティングを行なう。即ち、イオンプレー
ティング法によるコーティングによって化合物被膜層３
７を形成し、冷却した後に、マスキングを取り除く。Next, heated to about 400 ° C. The vacuum chamber to the heated vacuum chamber, under a flow of nitrogen gas (N 2) as a process gas, performing arc discharge by the arc power supply. Thereby, Cr ions are evaporated from the cathode, and a compound mainly composed of Cr 2 N is vapor-deposited on the surface of the inner pot 3 placed on the rotary table to which a bias voltage is applied to perform coating. That is, the compound coating layer 3 is formed by coating by the ion plating method.
After forming 7 and cooling, remove the masking.
【００２３】（後処理工程）次に、この化合物被膜層３
７に対して、表面仕上げポリッシュ（又は研磨）を行な
って、化合物被膜層３７を備えた内釜３を完成する。こ
のポリッシュや研磨は、化合物被膜層３７を形成した後
に、その表面の凸部を除去する目的で行なうものであ
り、本実施例では、平均面粗さ３．２μｍ以下に仕上げ
られる。(Post-Processing Step) Next, this compound coating layer 3
Surface finishing polishing (or polishing) is performed on 7 to complete the inner pot 3 provided with the compound coating layer 37. The polishing and polishing are performed for the purpose of removing the convex portions on the surface of the compound coating layer 37 after the compound coating layer 37 is formed. In this embodiment, the average surface roughness is 3.2 μm or less.
【００２４】この様に、本実施例では、内釜３の摺動レ
ール１９の表面に、イオンプレーティング法によって、
クロム及び窒素の化合物被膜層３７が形成してあるの
で、後述する実験例からも明らかな様に、耐焼付き性，
耐摩耗性及び低摩擦性の点で優れている。As described above, in this embodiment, the surface of the slide rail 19 of the inner pot 3 is formed by the ion plating method.
Since the compound coating layer 37 of chromium and nitrogen is formed, seizure resistance,
Excellent in wear resistance and low friction.
【００２５】更に、本実施例では、内釜３の摺動レール
１９の化合物被膜層３７と接触する外釜本体５及び内釜
押え９は、浸炭焼入鋼にて形成されているので、前記耐
焼付き性，耐摩耗性，低摩擦性の点で一層好適であると
いう顕著な効果を奏する。その上、化合物被膜層３７
は、平均面粗さ３．２μｍ以下に仕上げられているの
で、相手材の摩耗も極力減じることができるだけでな
く、摩擦係数の低減にも効果がある。尚、このポリッシ
ュや研磨によって、平均面粗さが３．２μｍ以下となら
ない場合や、ポリッシュや研磨の工程を省略した場合で
も、従来に比較して大きな効果がある。Further, in this embodiment, the outer pot main body 5 and the inner pot presser 9 which come into contact with the compound coating layer 37 of the slide rail 19 of the inner pot 3 are formed of carburized and hardened steel. It has the remarkable effect of being more suitable in terms of seizure resistance, wear resistance, and low friction. In addition, the compound coating layer 37
Is finished to have an average surface roughness of 3.2 μm or less, so that not only the wear of the mating material can be reduced as much as possible, but also the friction coefficient can be reduced. Even when the average surface roughness is not reduced to 3.2 μm or less by this polishing or polishing, or when the polishing and polishing steps are omitted, a great effect is obtained as compared with the conventional case.
【００２６】次に、前記実施例を含む本発明のミシンの
釜機構の効果を確認するために行った実験例について説
明する。 （実験例１）まず、化合物被膜層の摩擦特性及び焼付き
性の評価を、図５のピンオンディスク型試験機を用いて
行った。Next, an example of an experiment conducted to confirm the effect of the hook mechanism of the sewing machine of the present invention including the above-mentioned embodiment will be described. (Experimental Example 1) First, the frictional properties and seizure properties of the compound coating layer were evaluated using the pin-on-disk type tester shown in FIG.
【００２７】本実験例の試験方法は、回転するディスク
試験片Ａ上に、ディスク試験片Ａの回転軸線とは一定の
距離だけ間隔をおいた対称位置に２つのピン試験片Ｂを
固定し、ディスク試験片Ａ上に潤滑油を一定の供給速度
で供給した状態で、ピン試験片Ｂをディスク試験片Ａに
所定の押付け荷重Ｐで押し付けるものである。In the test method of the present experimental example, two pin test pieces B are fixed on a rotating disk test piece A at symmetrical positions spaced apart from the rotation axis of the disk test piece A by a constant distance. The pin test piece B is pressed against the disk test piece A with a predetermined pressing load P while the lubricating oil is supplied onto the disk test piece A at a constant supply rate.
【００２８】そして、本実験例では、下記表１に示す様
に、外釜（摺動溝）と内釜（摺動レール）に対応する様
々な摺動材料を組み合せて、その摩擦係数μと押付け荷
重Ｐとの関係を測定した。その結果を、図６に示す。本
実験例では、ミシン潤滑油を１２０ｃｃ／ｈｒの一定の
供給速度で滴下し、摺動速度を試験機の最高周速４ｍ／
ｓｅｃに固定し、摺動距離５００ｍ毎に押付け荷重Ｐを
段階的に増加し、その間の摩擦係数μ及び運転限界を調
べた。尚、最大押し付け荷重Ｐは、５０ｋｇｆである。In this experimental example, as shown in Table 1 below, various sliding materials corresponding to the outer hook (sliding groove) and the inner hook (sliding rail) were combined to obtain the friction coefficient μ and The relationship with the pressing load P was measured. The result is shown in FIG. In this experimental example, the sewing machine lubricating oil was dropped at a constant supply rate of 120 cc / hr and the sliding speed was set to the maximum peripheral speed of the tester of 4 m /
It was fixed to sec, the pressing load P was increased stepwise at every sliding distance of 500 m, and the friction coefficient μ and the operating limit during that period were examined. The maximum pressing load P is 50 kgf.
【００２９】[0029]
【表１】 [Table 1]
【００３０】図６から明らかな様に、本発明の範囲の試
料No.１〜３のＣｒ−Ｎ系化合物被膜層を設けたもの
は、押付け荷重Ｐを増加させた場合でも、摩擦係数μの
増加が少なく、しかも焼付き限界も高く好適である。そ
れに対して、Ｃｒ−Ｎ系化合物被膜層を設けない従来例
は、低い押付け荷重Ｐにて急激に摩擦係数μが増加し、
焼付きを起こすので好ましくない。 （実験例２）次に、化合物被膜層の耐摩耗性の評価を、
同じくピンオンディスク型試験機を用いて行った。As is apparent from FIG. 6, the samples of the sample Nos. 1 to 3 in the range of the present invention provided with the Cr-N compound coating layer have a friction coefficient of μ even when the pressing load P is increased. It is suitable because the increase is small and the seizure limit is high. On the other hand, in the conventional example in which the Cr-N-based compound coating layer is not provided, the friction coefficient μ rapidly increases at a low pressing load P,
It is not preferable because it causes seizure. (Experimental Example 2) Next, the abrasion resistance of the compound coating layer was evaluated.
Similarly, the test was performed using a pin-on-disk type tester.
【００３１】使用する試料は、前記実験例１と同様で、
潤滑条件、摺動速度も同様としたが、押付け荷重Ｐを１
０ｋｇｆに固定し、摺動距離を１００００ｍと長くとっ
てある。そして、実験終了後の各ディスク試験片Ａ及び
ピン試験片Ｂの摩耗量を、摩耗痕形状から測定して、単
位荷重、単位距離あたりの摩耗量、即ち、比摩耗量とし
て算出した。この結果を、図７のグラフに示す。The sample to be used is the same as in the above-mentioned Experimental Example 1,
Lubrication conditions and sliding speed were the same, but pressing load P was 1
It is fixed at 0 kgf and has a long sliding distance of 10,000 m. Then, the wear amount of each disk test piece A and pin test piece B after the experiment was measured from the wear mark shape, and calculated as the wear amount per unit load and unit distance, that is, the specific wear amount. The results are shown in the graph of FIG.
【００３２】図７から明らかな様に、本発明の範囲の試
料No.１〜３のＣｒ−Ｎ系化合物被膜層を設けたもの
は、従来例と比べて概ね相手材（ピン試験片Ｂ）の比摩
耗量が少なく、特に相手材に浸炭焼入鋼を組み合わせた
場合は、非常に比摩耗量が少なく好適である。それに対
して、Ｃｒ−Ｎ系化合物被膜層を設けない従来例は、比
摩耗量が大きく好ましくない。As is apparent from FIG. 7, the samples provided with the Cr-N compound coating layers of Sample Nos. 1 to 3 within the range of the present invention are almost the same as the conventional example (pin test piece B). It has a small specific wear amount, and particularly when a carburized and hardened steel is combined with the mating material, the specific wear amount is very small and suitable. On the other hand, the conventional example in which the Cr-N compound coating layer is not provided has a large specific wear amount and is not preferable.
【００３３】尚、本発明は前記実施例になんら限定され
るものではなく、本発明の要旨を逸脱しない範囲におい
て種々の態様で実施しうることはいうまでもない。例え
ば前記実施例とは逆に、外釜の摺動溝の表面上に、前記
クロム及び窒素の化合物被膜層を形成し、内釜を浸炭焼
入鋼で形成しても、同様な効果が得られることは言うま
でもない。It is needless to say that the present invention is not limited to the above-mentioned embodiments and can be carried out in various modes without departing from the gist of the present invention. For example, contrary to the above-mentioned embodiment, the same effect can be obtained even if the compound coating layer of chromium and nitrogen is formed on the surface of the sliding groove of the outer pot and the inner pot is made of carburized and hardened steel. It goes without saying that it will be done.
【００３４】また、外釜の摺動溝の表面及び内釜の摺動
レールの表面の両方に、前記クロム及び窒素の化合物被
膜層を形成してもよい。更に、前記クロム及び窒素の化
合物被膜層を形成する場合には、外釜の摺動溝の表面や
内釜の摺動レールの表面だけでなく、外釜全体や内釜全
体に前記クロム及び窒素の化合物被膜層を形成すると、
他の箇所のマスキングを行なう必要がなく、形成工程が
容易になるという利点がある。Further, the compound coating layer of chromium and nitrogen may be formed on both the surface of the sliding groove of the outer pot and the surface of the sliding rail of the inner pot. Further, when forming the compound coating layer of chromium and nitrogen, not only the surface of the sliding groove of the outer pot and the surface of the sliding rail of the inner pot, but also the entire outer pot and the entire inner pot are covered with the chromium and nitrogen. When the compound coating layer of
There is an advantage that it is not necessary to mask other portions and the forming process is facilitated.
【００３５】[0035]
【発明の効果】以上詳述したことから明らかなように、
請求項１の発明では、少なくとも外釜及び内釜の一方の
少なくとも摺動部の表面に、クロム及び窒素からなる化
合物被膜層を設けてある。この化合物被膜層は、優れた
耐焼付き性、耐摩耗性、低摩擦性を備えており、従来の
様に、多くの給油を必要としないので、ボビン内の糸や
縫製布が潤滑油で汚染することを防止することができ
る。つまり、本発明では、微量給油下又は無給油下にお
いて高速運転することができるので、工業用ミシンには
好適なものである。As is clear from the above description,
In the invention of claim 1, a compound coating layer made of chromium and nitrogen is provided on at least the surface of the sliding portion of at least one of the outer pot and the inner pot. This compound coating layer has excellent seizure resistance, wear resistance, and low friction, and does not require a lot of lubrication as in the past, so the threads and sewing cloth in the bobbin are contaminated with lubricating oil. Can be prevented. That is, according to the present invention, high-speed operation can be performed under a small amount of oil or without oil, which is suitable for an industrial sewing machine.
【００３６】請求項２の発明では、化合物被膜層の材料
として、主としてＣｒ2Ｎからなる化合物を用いるの
で、耐焼付き性、耐摩耗性、低摩擦性等の性能が優れて
いる。請求項３の発明では、化合物被膜層の厚さが１〜
２０μｍの範囲であるので、耐焼付き性、耐摩耗性、低
摩擦性等の性能が向上する。According to the second aspect of the invention, since the compound mainly composed of Cr 2 N is used as the material of the compound coating layer, the performances such as seizure resistance, abrasion resistance and low friction are excellent. In the invention of claim 3, the compound coating layer has a thickness of 1 to
Since it is in the range of 20 μm, performance such as seizure resistance, wear resistance, and low friction is improved.
【００３７】請求項４の発明では、化合物被膜層の平均
表面粗さが３．２μｍ以下であるので、耐焼付き性、耐
摩耗性、低摩擦性等の性能が一層向上する。請求項５の
発明では、一方の摺動部として化合物被膜層を設けた摺
動部を用い、他方の摺動部として浸炭焼き入れ処理した
鉄鋼材料を用いるので、耐焼付き性、耐摩耗性、低摩擦
性等の性能が更に向上する。In the invention of claim 4, since the average surface roughness of the compound coating layer is 3.2 μm or less, performances such as seizure resistance, abrasion resistance and low friction are further improved. In the invention of claim 5, since the sliding portion provided with the compound coating layer is used as one sliding portion and the steel material subjected to the carburizing and quenching treatment is used as the other sliding portion, seizure resistance, abrasion resistance, Performance such as low friction is further improved.
【００３８】請求項６の発明では、化合物被膜層をイオ
ンプレーティング法によって形成することによって、耐
焼付き性、耐摩耗性、低摩擦性等の優れた性能を有する
化合物被膜層を容易に且つ好適に実現できる。請求項７
の発明では、化合物被膜層形成後に、３．２μｍ以下の
平均表面粗さとなるまで、化合物被膜層の表面に対し研
磨又はポリッシング等の後加工処理を施すので、表面が
滑らかになり、耐焼付き性、耐摩耗性、低摩擦性等の性
能が更に向上する。In the invention of claim 6, the compound coating layer is formed by the ion plating method, so that the compound coating layer having excellent performances such as seizure resistance, abrasion resistance and low friction can be easily and suitably used. Can be realized. Claim 7
In the invention described above, after the compound coating layer is formed, the surface of the compound coating layer is subjected to post-treatment such as polishing or polishing until the average surface roughness becomes 3.2 μm or less, so that the surface becomes smooth and seizure resistance is improved. Performances such as abrasion resistance and low friction are further improved.
【図１】 実施例の釜構造を示し、（ａ）はその外釜及
び内釜の断面図であり、（ｂ）はその摺動部分を拡大し
て示す断面図である。FIG. 1 shows a hook structure of an embodiment, (a) is a cross-sectional view of an outer hook and an inner hook thereof, and (b) is a cross-sectional view showing an enlarged sliding portion thereof.
【図２】 実施例の釜構造を分解して示す斜視図であ
る。FIG. 2 is an exploded perspective view of the hook structure of the embodiment.
【図３】 実施例のイオンプレーティング法を示す説明
図である。FIG. 3 is an explanatory diagram showing an ion plating method according to an embodiment.
【図４】 実施例の製造方法を示す工程チャートであ
る。FIG. 4 is a process chart showing a manufacturing method of an example.
【図５】 実験装置を示す斜視図である。FIG. 5 is a perspective view showing an experimental device.
【図６】 実験例１の結果を示すグラフである。FIG. 6 is a graph showing the results of Experimental Example 1.
【図７】 実験例２の結果を示すグラフである。FIG. 7 is a graph showing the results of Experimental Example 2.
１…外釜 ３…凹部 ９…内釜押え １７…摺動溝 １９…摺動レール ３７…化合物被膜層 DESCRIPTION OF SYMBOLS 1 ... Outer hook 3 ... Recessed portion 9 ... Inner hook retainer 17 ... Sliding groove 19 ... Sliding rail 37 ... Compound coating layer
Claims (7)
部を介して摺動・回転するミシンの釜機構において、 少なくとも前記外釜及び内釜の一方の少なくとも前記摺
動部の表面に、クロム及び窒素からなる化合物被膜層を
設けたことを特徴とするミシンの釜機構。1. A hook mechanism of a sewing machine in which an inner hook arranged inside an outer hook slides / rotates through mutual sliding portions, and at least the sliding portion of at least one of the outer hook and the inner hook. A hook mechanism of a sewing machine characterized in that a compound coating layer made of chromium and nitrogen is provided on the surface of the sewing machine.
からなる化合物から構成されていることを特徴とする前
記請求項１記載のミシンの釜機構。2. The compound coating layer is mainly Cr 2 N
2. The hook mechanism of the sewing machine according to claim 1, wherein the hook mechanism is composed of a compound consisting of
ｍの範囲であることを特徴とする前記請求項１又は２記
載のミシンの釜機構。3. The compound coating layer has a thickness of 1 to 20 μm.
The shuttle mechanism of the sewing machine according to claim 1 or 2, wherein the range is m.
３．２μｍ以下であることを特徴とする前記請求項１〜
３のいずれか記載のミシンの釜機構。4. The average surface roughness of the compound coating layer is
The above-mentioned items 1 to 3, wherein the thickness is 3.2 μm or less.
3. The hook mechanism of the sewing machine according to any one of 3 above.
層を設けた摺動部を用いる場合に、他方の摺動部として
浸炭焼き入れ処理した鉄鋼材料を用いることを特徴とす
る前記請求項１〜４のいずれか記載のミシンの釜機構。5. The carburized and quenched steel material is used as the other sliding portion when the sliding portion provided with the compound coating layer is used as the one sliding portion. The hook mechanism of the sewing machine according to any one of 1 to 4.
物被膜層を、イオンプレーティング法によって形成する
ことを特徴とするミシンの釜機構の製造方法。6. A method of manufacturing a hook mechanism of a sewing machine, wherein the compound coating layer according to any one of claims 1 to 5 is formed by an ion plating method.
覆層の平均表面粗さが３．２μｍ以下になるまで、該化
合物被膜層の表面に対し研磨又はポリッシング等の後加
工処理を施すことを特徴とする前記請求項６記載のミシ
ンの釜機構の製造方法。7. After the formation of the compound coating layer, the surface of the compound coating layer is subjected to post-treatment such as polishing or polishing until the average surface roughness of the compound coating layer becomes 3.2 μm or less. The method for manufacturing a shuttle mechanism of a sewing machine according to claim 6, wherein the sewing machine has a hook mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32504394A JPH08173668A (en) | 1994-12-27 | 1994-12-27 | Sewing machine shuttle and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32504394A JPH08173668A (en) | 1994-12-27 | 1994-12-27 | Sewing machine shuttle and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08173668A true JPH08173668A (en) | 1996-07-09 |
Family
ID=18172519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32504394A Pending JPH08173668A (en) | 1994-12-27 | 1994-12-27 | Sewing machine shuttle and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08173668A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100797726B1 (en) * | 2001-04-09 | 2008-01-23 | 쥬키 가부시키가이샤 | Parts for sewing machine |
| CN104060412A (en) * | 2014-04-28 | 2014-09-24 | 宁波市鄞州勇耀缝制机械有限公司 | Inner shuttle of rotating shuttle of sewing machine and manufacturing process thereof |
-
1994
- 1994-12-27 JP JP32504394A patent/JPH08173668A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100797726B1 (en) * | 2001-04-09 | 2008-01-23 | 쥬키 가부시키가이샤 | Parts for sewing machine |
| CN104060412A (en) * | 2014-04-28 | 2014-09-24 | 宁波市鄞州勇耀缝制机械有限公司 | Inner shuttle of rotating shuttle of sewing machine and manufacturing process thereof |
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