JPH08133876A - Non-slip tile and its production - Google Patents
Non-slip tile and its productionInfo
- Publication number
- JPH08133876A JPH08133876A JP26730894A JP26730894A JPH08133876A JP H08133876 A JPH08133876 A JP H08133876A JP 26730894 A JP26730894 A JP 26730894A JP 26730894 A JP26730894 A JP 26730894A JP H08133876 A JPH08133876 A JP H08133876A
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- layer
- glaze layer
- glazing layer
- slip tile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/60—Flooring materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Floor Finish (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は浴室、洗面所、トイレ等
の床材等として用いる滑り止めタイルとその製造方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a non-slip tile used as a floor material for bathrooms, washrooms, toilets and the like, and a method for producing the same.
【０００２】[0002]
【従来の技術】表面に微細な凹凸を形成して滑り止め効
果を発揮するようにしたタイルが特公昭６０−３９８２
７号公報に開示されている。このタイルはタイル本体の
焼成温度よりも高い耐火度を有する熔融アルミナ等の微
粒子をタイル表面に付着させ、この上から釉薬を塗布し
た後に焼成するようにしたものである。2. Description of the Related Art A tile having fine irregularities formed on its surface to exhibit an anti-slip effect is disclosed in Japanese Examined Patent Publication No. 60-3982.
No. 7 publication. In this tile, fine particles of fused alumina or the like having a fire resistance higher than the firing temperature of the tile body are adhered to the surface of the tile, and a glaze is applied onto the tile, followed by firing.
【０００３】[0003]
【発明が解決しようとする課題】上述した先行技術によ
る場合には、熔融アルミナ等の微粒子を釉薬層が完全に
覆っており、釉薬層が最表層となっている。この釉薬層
は耐摩耗性がそれほど高くないので、滑り止め効果を発
揮するために形成した表面の凹凸が短期間のうちに減少
してしまう不利がある。In the case of the above-mentioned prior art, the glaze layer completely covers the fine particles such as fused alumina, and the glaze layer is the outermost layer. Since this glaze layer has not so high abrasion resistance, there is a disadvantage that surface irregularities formed for exhibiting an anti-slip effect are reduced in a short period of time.
【０００４】[0004]
【課題を解決するための手段】上記課題を解決すべく本
発明に係る滑り止めタイルは、基材表面に凹凸部を有す
る釉薬層が形成され、この釉薬層の表面に略均一な厚さ
の金属酸化物層が形成され、この金属酸化物層が形成さ
れた凹凸部の中心線平均粗さ（Ｒa）と平均凸部間隔
（Ｓm）とが、１．０≦１００Ｒa／Ｓm≦５．０（カッ
トオフ値＝０．８μｍ）を満足する関係となるようにし
た。Means for Solving the Problems In order to solve the above problems, a non-slip tile according to the present invention is formed with a glaze layer having irregularities on the surface of a base material, and the glaze layer has a substantially uniform thickness on the surface. A metal oxide layer is formed, and the center line average roughness (Ra) and the average convex portion spacing (Sm) of the uneven portion on which the metal oxide layer is formed are 1.0 ≦ 100Ra / Sm ≦ 5.0. The relation was set to satisfy (cutoff value = 0.8 μm).
【０００５】１．０≦１００Ｒa／Ｓm≦５．０となるよ
うにしたのは、１．０＞１００Ｒa／Ｓmであると、表面
が平滑になり過ぎて十分な滑り止め効果を発揮すること
ができず、１００Ｒa／Ｓm＞５．０であると表面粗度が
大きくなり過ぎて耐摩耗性が低下することによる。尚、
１００Ｒa／Ｓmの好ましい範囲は１．５≦１００Ｒa／
Ｓm≦３．５である。The reason why 1.0≤100Ra / Sm≤5.0 is set is that when 1.0> 100Ra / Sm, the surface becomes too smooth and a sufficient anti-slip effect is exhibited. If it is not possible and 100 Ra / Sm> 5.0, the surface roughness becomes too large, and the wear resistance decreases. still,
The preferred range of 100 Ra / Sm is 1.5 ≦ 100 Ra /
Sm ≦ 3.5.
【０００６】また、前記金属酸化物層の厚さは０．１μ
ｍ以上５０μｍ以下とすることが基材表面の釉薬との密
着性を高め、金属酸化物の剥離を防止する上で好まし
い。即ち、０．１μｍ未満とすると、基材表面の釉薬中
へ金属酸化物粒子層が溶け込み、分散して、金属酸化物
層が表面に形成されない部分が生じるおそれがあり、ま
た５０μｍを超えると、金属酸化物粒子と釉薬との密着
性は確保されるが、金属酸化物粒子同士の密着性が低下
し、金属酸化物層が剥離しやすくなる。ここで、金属酸
化物層の更なる好ましい厚さとしては、０．５μｍ以上
３μｍ以下である。The thickness of the metal oxide layer is 0.1 μm.
It is preferable that the thickness is not less than m and not more than 50 μm in order to enhance the adhesion to the glaze on the surface of the base material and prevent the peeling of the metal oxide. That is, when the thickness is less than 0.1 μm, the metal oxide particle layer dissolves in the glaze on the surface of the base material and may be dispersed, which may cause a portion where the metal oxide layer is not formed on the surface, and when it exceeds 50 μm, Although the adhesion between the metal oxide particles and the glaze is secured, the adhesion between the metal oxide particles is reduced and the metal oxide layer is easily peeled off. Here, a further preferable thickness of the metal oxide layer is 0.5 μm or more and 3 μm or less.
【０００７】金属酸化物としては、ＴiＯ2、ＳnＯ2、Ｚ
nＯ等が利用できる。また、抗菌性等を付与するため
に、或いは焼成後の金属酸化物の耐久性を考慮すると、
金属酸化物をＴiＯ2とすることが好ましい。Metal oxides include TiO 2 , SnO 2 and Z.
nO etc. can be used. Further, in order to impart antibacterial properties or the like, or considering the durability of the metal oxide after firing,
The metal oxide is preferably TiO 2 .
【０００８】一方、本発明に係る滑り止めタイルの製造
方法は、基材表面に均一な厚さで下地釉薬層を塗布し、
この下地釉薬層の表面に、中心線平均粗さ（Ｒa）と平
均凸部間隔（Ｓm）とが、１．０≦１００Ｒa／Ｓm≦
５．０（カットオフ値＝０．８μｍ）を満足する関係と
なる高さ及び間隔で釉薬層を部分的に塗布し、次いで焼
成して下地釉薬層と部分的に塗布した釉薬層とが一体と
なった凹凸釉薬層を形成し、この凹凸釉薬層の表面に金
属酸化物ゾルを塗布した後に焼成する。On the other hand, in the method for producing a non-slip tile according to the present invention, the base glaze layer is applied to the surface of the base material with a uniform thickness,
On the surface of the base glaze layer, the center line average roughness (Ra) and the average convex portion spacing (Sm) are 1.0 ≦ 100Ra / Sm ≦
The glaze layer is partially applied at heights and intervals that satisfy the relationship of 5.0 (cutoff value = 0.8 μm), and then the base glaze layer and the partially applied glaze layer are integrated by firing. The uneven glaze layer is formed, and the surface of the uneven glaze layer is coated with the metal oxide sol and then baked.
【０００９】[0009]
【作用】摩耗しやすい凹凸釉薬層表面を所定厚みの金属
酸化物層で被覆することで、滑り止め効果を維持しつつ
耐摩耗性を向上することが可能となる。By coating the surface of the uneven glaze layer, which is likely to wear, with the metal oxide layer having a predetermined thickness, it becomes possible to improve the wear resistance while maintaining the anti-slip effect.
【００１０】[0010]
【実施例】以下に本発明の実施例を添付図面に基づいて
説明する。図１ないし図４は本発明に係る滑り止めタイ
ルの製造方法を工程順に説明したものであり、図１は基
材表面に下地釉薬層を塗布した状態を示す図、図２は下
地釉薬層の表面に釉薬層を部分的に塗布した状態を示す
図、図３は下地釉薬層と部分的に塗布した釉薬層とを焼
成して一体となった凹凸釉薬層を形成した状態を示す
図、図４は凹凸釉薬層の表面に金属酸化物層を形成した
状態を示す図である。尚、図においては理解を容易にす
るために上下方向の凹凸を誇張して示している。Embodiments of the present invention will be described below with reference to the accompanying drawings. 1 to 4 are diagrams for explaining a method for manufacturing a non-slip tile according to the present invention in the order of steps, FIG. 1 is a view showing a state in which a base glaze layer is applied to a surface of a base material, and FIG. 2 is a diagram showing a base glaze layer. FIG. 3 is a diagram showing a state in which a glaze layer is partially applied to the surface, and FIG. 3 is a diagram showing a state in which an uneven glaze layer is formed by firing a base glaze layer and a partially applied glaze layer. 4 is a view showing a state in which a metal oxide layer is formed on the surface of the uneven glaze layer. It should be noted that in the drawings, the unevenness in the vertical direction is exaggerated for ease of understanding.
【００１１】先ず図４に基づいて、完成した滑り止めタ
イルの構造を説明すると、滑り止めタイルは基材１上に
凹凸釉薬層２を形成し、この凹凸釉薬層２の表面に０．
１μｍ以上５０μｍ以下の厚さのＴiＯ2等の金属酸化物
層３を形成している。First, referring to FIG. 4, the structure of the completed anti-slip tile will be described. The anti-slip tile has an uneven glaze layer 2 formed on a base material 1, and the uneven glaze layer 2 has a surface roughness of 0.
A metal oxide layer 3 such as TiO 2 having a thickness of 1 μm or more and 50 μm or less is formed.
【００１２】そして、金属酸化物層３が形成された滑り
止めタイル表面の凹凸部の中心線平均粗さ（Ｒa）と平
均凸部間隔（Ｓm）との関係は、１．０≦１００Ｒa／Ｓ
m≦５．０（カットオフ値＝０．８μｍ）となってい
る。The relationship between the center line average roughness (Ra) of the irregularities on the surface of the non-slip tile on which the metal oxide layer 3 is formed and the average convex interval (Sm) is 1.0≤100 Ra / S.
m ≦ 5.0 (cutoff value = 0.8 μm).
【００１３】ここで、中心線とは粗さ曲線（ｙ）の平均
線に平行な直線を引いた時に、この直線と粗さ曲線で囲
まれる面積が、この直線の両側で等しくなる直線をい
う。また、中心線平均粗さ（Ｒa）は、粗さ曲線（ｙ）
からその中心線の方向に所定長さ（ｌ）の部分を抜き取
り、この抜き取り部分の中心線をＸ軸、縦倍率の方向を
Ｙ軸とし、粗さ曲線をｙ＝ｆ（ｘ）で表わしたとき、以
下の（数１）によって表わされる。また、平均凸部間隔
（Ｓm）は以下の（数２）によって表わされる。Here, the center line means a straight line in which, when a straight line parallel to the average line of the roughness curve (y) is drawn, the areas surrounded by this straight line and the roughness curve are equal on both sides of this straight line. . The center line average roughness (Ra) is the roughness curve (y).
A portion having a predetermined length (l) is extracted from the center of the sample, the center line of the extracted portion is the X axis, the direction of the longitudinal magnification is the Y axis, and the roughness curve is represented by y = f (x). Then, it is represented by the following (Equation 1). The average convex portion spacing (Sm) is expressed by the following (Equation 2).
【００１４】[0014]
【数１】 [Equation 1]
【数２】 [Equation 2]
【００１５】次に、以上の如き構成の滑り止めタイルの
製造手順を説明する。先ず図１に示すように、基材１の
表面に下地釉薬層２１を塗布する。下地釉薬層２１とし
ては、長石２０重量部、珪石１０重量部、焼タルク２０
重量部、石灰１０重量部、粘土５重量部それにフリット
３５重量部とからなり、融点が１１８０℃（耐火度ＳＫ
５ａ）の釉薬を調製する。Next, a procedure for manufacturing the non-slip tile having the above structure will be described. First, as shown in FIG. 1, a base glaze layer 21 is applied to the surface of the base material 1. As the base glaze layer 21, 20 parts by weight of feldspar, 10 parts by weight of silica stone, 20 calcinated talc
It is composed of 1 part by weight, 10 parts by weight of lime, 5 parts by weight of clay and 35 parts by weight of frit and has a melting point of 1180 ° C (refractory SK
Prepare the glaze of 5a).
【００１６】上記の釉薬を基材１の表面に４００μｍの
厚みで一様に塗布し下地釉薬層２１とし、この下地釉薬
層２１の上に図２に示すように同一組成の釉薬２２を斑
点掛けする。The above glaze is uniformly applied to the surface of the base material 1 to a thickness of 400 μm to form a base glaze layer 21, and a glaze 22 of the same composition is spotted on the base glaze layer 21 as shown in FIG. To do.
【００１７】次いで上記の基材１と釉薬層２１，２２を
ローラーハースキルン中で１１５０℃で４０分間焼成し
て、図３に示すように、下地釉薬層２１と部分的に塗布
した釉薬層２２とが一体となった凹凸釉薬層２を形成す
る。Next, the base material 1 and the glaze layers 21 and 22 are fired in a roller hearth kiln at 1150 ° C. for 40 minutes, and as shown in FIG. 3, the base glaze layer 21 and the partially applied glaze layer 22. The uneven glaze layer 2 is formed integrally with.
【００１８】この後、凹凸釉薬層２の表面に金属酸化物
ゾルをスプレー塗布した後に、ローラーハースキルン中
で８８０℃で６０分間焼成して、図４に示すような厚み
が０．１μｍ以上５０μｍ以下の金属酸化物層３を形成
する。After that, a metal oxide sol is spray-coated on the surface of the uneven glaze layer 2 and then baked at 880 ° C. for 60 minutes in a roller hearth kiln to have a thickness of 0.1 μm or more and 50 μm as shown in FIG. The following metal oxide layer 3 is formed.
【００１９】[0019]
【発明の効果】以下の（表）は金属酸化物層としてＴi
Ｏ2層を形成した本発明に係る滑り止めタイルと、釉薬
層を剥き出しにした従来の滑り止めタイルとを、光沢変
化率、色変化、染色変化及び滑り摩擦係数変化において
比較したものである。尚、光沢変化率についてはＪＩＳ
Ｚ８７４１に基づき、光沢度計（日本電色工業社製）
を用いて光反射率を測定し、色変化については色度計に
てＬabを求め、それぞれの値からΔＥを算出し、染色変
化については同じくΔＥを算出するが、具体的には０．
０１％フクシン溶液（Ｃ20Ｈ20ＣlＮ3）に５秒浸漬し、
その後余剰のフクシンを水で洗い流し、更にサンプルを
１１０℃で２日間乾燥放置し、色値を測定し、滑り摩擦
係数変化はサンプル表面を水に濡らし、次いでサンプル
上に０．５ｋｇの重りを載せ、荷重方向に対し垂直に力
を加え、重りが移動し始めた力（ｆｋｇ）を表面性測定
機（新東科学社製）で読み取り、滑り摩擦係数（μ）＝
ｆ／０．５にて算出した。The following (Table) shows Ti as a metal oxide layer.
FIG. 2 is a comparison between the anti-slip tile according to the present invention having an O 2 layer formed thereon and a conventional anti-slip tile having a glaze layer exposed in terms of gloss change rate, color change, dyeing change and sliding friction coefficient change. Regarding the gloss change rate, JIS
Gloss meter (made by Nippon Denshoku Industries Co., Ltd.) based on Z8741
Is used to measure the light reflectance, and for color change, L ab is obtained with a chromaticity meter, and ΔE is calculated from the respective values. For dyeing change, ΔE is calculated in the same manner.
Immerse in a 01% fuchsin solution (C 20 H 20 ClN 3 ) for 5 seconds,
After that, the excess fuchsin was washed off with water, and the sample was left to dry at 110 ° C. for 2 days, and the color value was measured. , A force is applied perpendicularly to the load direction, and the force (fkg) at which the weight starts moving is read with a surface texture measuring machine (manufactured by Shinto Scientific Co., Ltd.), and the sliding friction coefficient (μ) =
It was calculated at f / 0.5.
【００２０】[0020]
【表１】 [Table 1]
【００２１】実験結果を示す（表）及び以上の説明から
明らかなように、本発明に係る滑り止めタイルは、長期
間使用してもタイル表面の凹凸が摩耗によって減りにく
く、滑り止め効果を維持でき、また、光沢変化、色変化
及び染色変化についても金属酸化物層をコーティングし
ないものに比べて、大幅に向上していることが分る。As is clear from the experimental results (table) and the above description, the non-slip tile according to the present invention maintains the anti-slip effect even if it is used for a long period of time because the unevenness of the tile surface is not easily reduced by abrasion. It can be seen that the change in gloss, the change in color and the change in dyeing are significantly improved as compared with the case where the metal oxide layer is not coated.
【００２２】特に、金属酸化物としてＴiＯ2を用いれ
ば、抗菌機能、脱臭機能をも発揮し、タイルとしての利
用価値が高まる。In particular, when TiO 2 is used as the metal oxide, it exerts an antibacterial function and a deodorizing function, and its utility value as a tile is enhanced.
【図面の簡単な説明】[Brief description of drawings]
【図１】基材表面に下地釉薬層を塗布した状態を示す図FIG. 1 is a diagram showing a state in which a base glaze layer is applied to the surface of a base material.
【図２】下地釉薬層の表面に釉薬層を部分的に塗布した
状態を示す図FIG. 2 is a diagram showing a state in which a glaze layer is partially applied to the surface of a base glaze layer.
【図３】下地釉薬層と部分的に塗布した釉薬層とを焼成
して一体となった凹凸釉薬層を形成した状態を示す図FIG. 3 is a diagram showing a state in which a base glaze layer and a partially applied glaze layer are baked to form an integrated glaze layer.
【図４】凹凸釉薬層の表面に金属酸化物層を形成した状
態を示す図FIG. 4 is a view showing a state in which a metal oxide layer is formed on the surface of the uneven glaze layer.
１…基材、２…凹凸釉薬層、３…金属酸化物層、２１…
下地釉薬層、２２…部分的に塗布した釉薬層。1 ... Substrate, 2 ... Uneven glaze layer, 3 ... Metal oxide layer, 21 ...
Base glaze layer, 22 ... A partially applied glaze layer.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 久我 辰彦 福岡県北九州市小倉北区中島２丁目１番１ 号 東陶機器株式会社内 (72)発明者 中島 靖 福岡県北九州市小倉北区中島２丁目１番１ 号 東陶機器株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Tatsuhiko Kuga 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu, Fukuoka Prefecture Totoki Kikai Co., Ltd. (72) Yasushi Nakajima 2 Nakajima, Kokurakita-ku, Kitakyushu, Fukuoka 1st-1st Totoki Equipment Co., Ltd.
Claims (4)
され、この釉薬層の表面に略均一な厚さの金属酸化物層
が形成され、この金属酸化物層が形成された凹凸部の中
心線平均粗さ（Ｒa）と平均凸部間隔（Ｓm）とが、１．
０≦１００Ｒa／Ｓm≦５．０（カットオフ値＝０．８μ
ｍ）を満足する関係となっていることを特徴とする滑り
止めタイル。1. A glaze layer having an uneven portion is formed on the surface of a base material, a metal oxide layer having a substantially uniform thickness is formed on the surface of the glaze layer, and the uneven portion is formed with the metal oxide layer. The centerline average roughness (Ra) and the average convex portion interval (Sm) of 1.
0 ≦ 100Ra / Sm ≦ 5.0 (cutoff value = 0.8μ
A non-slip tile characterized by having a relationship satisfying m).
て、前記金属酸化物層の厚さは０．１μｍ以上５０μｍ
以下であることを特徴とする滑り止めタイル。2. The non-slip tile according to claim 1, wherein the metal oxide layer has a thickness of 0.1 μm or more and 50 μm or more.
A non-slip tile characterized by:
めタイルにおいて、前記金属酸化物はＴiＯ2であること
を特徴とする滑り止めタイル。3. The non-slip tile according to claim 1 or 2, wherein the metal oxide is TiO 2 .
布し、この下地釉薬層の表面に、中心線平均粗さ（Ｒ
a）と平均凸部間隔（Ｓm）とが、１．０≦１００Ｒa／
Ｓm≦５．０（カットオフ値＝０．８μｍ）を満足する
関係となる高さ及び間隔で釉薬層を部分的に塗布し、次
いで焼成して下地釉薬層と部分的に塗布した釉薬層とが
一体となった凹凸釉薬層を形成し、この凹凸釉薬層の表
面に金属酸化物ゾルを塗布した後に焼成することを特徴
とする滑り止めタイルの製造方法。4. A base glaze layer having a uniform thickness is applied to the surface of a base material, and the center line average roughness (R) is applied to the surface of the base glaze layer.
a) and the average convex portion interval (Sm) are 1.0 ≦ 100Ra /
A glaze layer is partially applied at a height and a spacing satisfying a relationship of Sm ≦ 5.0 (cutoff value = 0.8 μm), and then baked to form a base glaze layer and a partially applied glaze layer. A method for producing a non-slip tile, comprising: forming a concavo-convex glaze layer that is integrated with a metal oxide sol, coating the surface of the concavo-convex glaze layer with a metal oxide sol, and then firing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26730894A JPH08133876A (en) | 1994-10-31 | 1994-10-31 | Non-slip tile and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26730894A JPH08133876A (en) | 1994-10-31 | 1994-10-31 | Non-slip tile and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08133876A true JPH08133876A (en) | 1996-05-28 |
Family
ID=17443027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26730894A Pending JPH08133876A (en) | 1994-10-31 | 1994-10-31 | Non-slip tile and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08133876A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000109384A (en) * | 1998-10-02 | 2000-04-18 | Danto Corp | Stainproofing and antislipping tile and its production |
| JP2000282666A (en) * | 1999-03-30 | 2000-10-10 | National House Industrial Co Ltd | Floor structure and wear-resistant moisture-controlled tile |
| JP2006125154A (en) * | 2004-11-01 | 2006-05-18 | Matsushita Electric Works Ltd | Floor pan for washing place, and bathtub |
| JP2007321336A (en) * | 2006-05-30 | 2007-12-13 | Takiron Co Ltd | Slip preventive flooring |
| CN103790306A (en) * | 2012-10-26 | 2014-05-14 | 张释文 | Tile |
| JP2017065008A (en) * | 2015-09-29 | 2017-04-06 | 株式会社Ｌｉｘｉｌ | Building material and manufacturing method thereof |
| JP2018168661A (en) * | 2017-03-30 | 2018-11-01 | 株式会社Ｌｉｘｉｌ | Tile and method for producing tile |
-
1994
- 1994-10-31 JP JP26730894A patent/JPH08133876A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000109384A (en) * | 1998-10-02 | 2000-04-18 | Danto Corp | Stainproofing and antislipping tile and its production |
| JP2000282666A (en) * | 1999-03-30 | 2000-10-10 | National House Industrial Co Ltd | Floor structure and wear-resistant moisture-controlled tile |
| JP2006125154A (en) * | 2004-11-01 | 2006-05-18 | Matsushita Electric Works Ltd | Floor pan for washing place, and bathtub |
| JP2007321336A (en) * | 2006-05-30 | 2007-12-13 | Takiron Co Ltd | Slip preventive flooring |
| CN103790306A (en) * | 2012-10-26 | 2014-05-14 | 张释文 | Tile |
| JP2017065008A (en) * | 2015-09-29 | 2017-04-06 | 株式会社Ｌｉｘｉｌ | Building material and manufacturing method thereof |
| JP2018168661A (en) * | 2017-03-30 | 2018-11-01 | 株式会社Ｌｉｘｉｌ | Tile and method for producing tile |
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