JPH08131909A - Feeder of treating liquid for substrate-treating device - Google Patents
Feeder of treating liquid for substrate-treating deviceInfo
- Publication number
- JPH08131909A JPH08131909A JP6295671A JP29567194A JPH08131909A JP H08131909 A JPH08131909 A JP H08131909A JP 6295671 A JP6295671 A JP 6295671A JP 29567194 A JP29567194 A JP 29567194A JP H08131909 A JPH08131909 A JP H08131909A
- Authority
- JP
- Japan
- Prior art keywords
- cylinder
- processing liquid
- pipe line
- air
- speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Spray Control Apparatus (AREA)
- Weting (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、半導体デバイスや液
晶表示デバイスなどの製造工程において、シリコンウエ
ハ、ガラス基板等の基板の表面にフォトレジストを塗布
したり基板表面を現像処理したりする場合などに、基板
へフォトレジスト液、現像液等の処理液を供給する基板
処理装置用処理液供給装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the case of applying a photoresist to the surface of a substrate such as a silicon wafer or a glass substrate or developing the surface of a substrate in a manufacturing process of a semiconductor device or a liquid crystal display device. In particular, the present invention relates to a processing liquid supply device for a substrate processing device that supplies a processing liquid such as a photoresist liquid and a developing liquid to a substrate.
【０００２】[0002]
【従来の技術】例えば、半導体デバイスの製造装置にお
いて、シリコンウエハの表面にフォトレジストを塗布す
るには、例えば実公平３−５６０４０号公報等に開示さ
れているような構成の処理液供給装置が使用される。図
８は、従来使用されている処理液供給装置の流路構成の
１例を示す模式図である。この処理液供給装置は、処理
液（フォトレジスト液）10を収容した容器12、この容器
12と吸入管路14を介して吸入口が連通接続され吐出口が
吐出管路16に連通接続されたベローズ18及びこのベロー
ズ18を伸縮駆動させるシリンダ20から構成されたポンプ
22、並びに、吐出管路16の先端に接続され供給口がウエ
ハＷに対向するように配設された吐出ノズル24、吐出管
路16に介挿されたフィルタ26などにより構成されてい
る。そして、シリンダ20の一端側の流出入口に連通接続
された空気管路90及びシリンダ20の他端側の流出入口に
連通接続された空気管路92は、それぞれシリンダ動作切
換え弁94を経て圧縮空気源に切換え可能に流路接続され
ている。シリンダ動作切換え弁94は、４つのポートを持
つ２位置弁で構成され、４つのポートは、各空気管路9
0、92、圧縮空気の供給管路28及び排気管路96にそれぞ
れ各別に接続されている。また、各空気管路90、92に
は、それぞれ速度制御弁98が介挿されている。そして、
空気管路90、92を交互に圧縮空気の供給管路28と排気管
路96とに接続するようにシリンダ動作切換え弁94を作動
させることにより、シリンダ20を駆動させてベローズ18
を伸縮駆動させ、容器12から処理液10を、吸入管路14を
通しベローズ18を経て吐出管路16内へ送給し、吐出管路
16を通って吐出ノズル24へ供給された処理液を吐出ノズ
ル24の先端からウエハＷへ吐出するようになっている。
尚、図８に例示した処理液供給装置は、ベローズ18を伸
縮駆動させる駆動手段として圧縮空気の作動圧を利用し
たシリンダ20を使用しているが、モータを使用してベロ
ーズを伸縮駆動させるようにしてもよい。2. Description of the Related Art For example, in a semiconductor device manufacturing apparatus, in order to apply a photoresist to the surface of a silicon wafer, a processing liquid supply apparatus having a structure as disclosed in, for example, Japanese Utility Model Publication No. 3-56040 is used. used. FIG. 8 is a schematic view showing an example of the flow path configuration of a conventionally used processing liquid supply apparatus. This processing liquid supply device includes a container 12 containing a processing liquid (photoresist liquid) 10, and this container.
A pump including a bellows 18 having an intake port connected to each other via a suction pipe line 14 and a discharge port connected to a discharge pipe line 16 and a cylinder 20 for driving the bellows 18 to expand and contract.
22, a discharge nozzle 24 connected to the tip of the discharge conduit 16 so that the supply port faces the wafer W, a filter 26 inserted in the discharge conduit 16, and the like. The air pipeline 90 communicating with the outflow inlet on one end side of the cylinder 20 and the air pipeline 92 communicating with the outflow inlet on the other end side of the cylinder 20 are compressed air after passing through the cylinder operation switching valve 94. A flow path is switchably connected to the source. The cylinder operation switching valve 94 is composed of a two-position valve having four ports, each of which has four ports.
0, 92, compressed air supply conduit 28 and exhaust air conduit 96, respectively. A speed control valve 98 is inserted in each of the air ducts 90 and 92. And
By operating the cylinder operation switching valve 94 so as to alternately connect the air pipelines 90 and 92 to the compressed air supply pipeline 28 and the exhaust pipeline 96, the cylinder 20 is driven and the bellows 18
Is driven to expand and contract to feed the treatment liquid 10 from the container 12 through the suction pipe line 14 and the bellows 18 into the discharge pipe line 16,
The processing liquid supplied to the discharge nozzle 24 through 16 is discharged onto the wafer W from the tip of the discharge nozzle 24.
Although the treatment liquid supply apparatus illustrated in FIG. 8 uses the cylinder 20 that uses the operating pressure of compressed air as the drive means for driving the bellows 18 to expand and contract, a bellows 18 can be expanded and contracted using a motor. You may
【０００３】ところで、ウエハＷの表面に均一にフォト
レジストを塗布するには、吐出管路16内における気泡の
存在は許されない。従って、基板を順次処理していく過
程で、処理と処理との間などに、吐出管路16内からの気
泡抜きの作業を随時行なう必要がある。従来、この気泡
抜きの作業は、ポンプ22を実処理時と全く同様に低速で
動作させて、吐出管路16内に処理液を流し、フィルタ26
に付設された廃液ラインを通して処理液を排出したり吐
出ノズル24から処理液を排出したりすることにより行な
われていた。また、ポンプ22の動作速度を、速度制御弁
98、98を開いて速め、吐出管路16内に比較的大容量の処
理液を流して吐出管路16内からの気泡抜きを行ない、気
泡抜きの作業後に、速度制御弁98、98を元の状態に戻す
よう再調整していた。By the way, in order to uniformly apply the photoresist to the surface of the wafer W, the presence of bubbles in the discharge conduit 16 is not allowed. Therefore, in the process of sequentially processing the substrates, it is necessary to perform the work of removing air bubbles from the inside of the discharge conduit 16 as needed between the processes. Conventionally, in this air bubble removal work, the pump 22 is operated at the same low speed as in the actual processing, the processing liquid is caused to flow in the discharge pipe line 16, and the filter 26
It was carried out by discharging the processing liquid through the waste liquid line attached to the device or discharging the processing liquid from the discharge nozzle 24. In addition, the operating speed of the pump 22 is controlled by the speed control valve.
98, 98 are opened to speed up, a relatively large volume of processing liquid is made to flow into the discharge pipe 16 to remove bubbles from the discharge pipe 16, and after the bubble removal work, the speed control valves 98, 98 are turned on. It was readjusted to return to the state of.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、製品歩
留りの低下を防ぐためには、上記気泡抜きの作業を日常
的に行なう必要があり、ポンプ22を実処理時と同様の低
速で動作させて気泡抜きを行なう方法では、気泡抜き作
業に費やされる総時間が長くなって、処理装置の稼働率
低下の要因となる、といった問題点がある。また、気泡
抜きに際して、速度制御弁98を調整し、気泡抜き後に速
度制御弁98を再調整するといった方法は、速度調整弁98
の調整及び再調整に時間を要することとなって、結局、
気泡抜き作業全体に費やされる時間が長くなり、装置の
稼働率の低下を来すこととなる。However, in order to prevent a decrease in product yield, it is necessary to routinely perform the above-mentioned bubble removal work, and the pump 22 is operated at the same low speed as in actual processing to remove the bubbles. However, there is a problem in that the total time spent for the bubble removal work becomes long, which causes a decrease in the operating rate of the processing apparatus. In addition, the method of adjusting the speed control valve 98 at the time of removing the air bubbles and re-adjusting the speed control valve 98 after removing the air bubbles is performed by the speed adjusting valve 98.
It will take time to adjust and readjust the
The time spent for the entire bubble removal work becomes long, and the operating rate of the device is reduced.
【０００５】この発明は、以上のような事情に鑑みてな
されたものであり、基板処理装置の処理液供給装置にお
いて、日常的に行なう必要のある吐出管路からの気泡抜
きの作業を迅速に行なうことができ、作業性を向上させ
装置の稼働率の向上を図ることを目的とする。The present invention has been made in view of the above circumstances, and in the processing liquid supply apparatus of the substrate processing apparatus, the work of removing air bubbles from the discharge pipe line, which needs to be performed on a daily basis, is quickly performed. The purpose is to improve workability and operating rate of the device.
【０００６】[0006]
【課題を解決するための手段】請求項１に記載の発明
は、低速駆動手段により処理液供給手段を低速で駆動さ
せて吐出管路を通し基板へ比較的小流量の処理液を供給
するようにした従来の処理液供給装置の構成に、処理液
供給手段から比較的大流量の処理液を送り出すように処
理液供給手段を高速で駆動させる高速駆動手段、前記低
速駆動手段のみを作動させる状態と前記高速駆動手段を
作動させる状態とを切り換える速度切換え手段、及び、
基板への処理液供給時には前記低速駆動手段のみを作動
させ気泡抜き時には前記高速駆動手段を作動させるよう
に前記速度切換手段を制御する切換え制御手段を付加し
た構成を有する。According to a first aspect of the present invention, the processing liquid supply means is driven at a low speed by the low speed driving means to supply a relatively small flow rate of the processing liquid to the substrate through the discharge conduit. In the configuration of the conventional processing liquid supply device described above, a state in which only the high speed drive means for driving the processing liquid supply means at a high speed so as to send out a relatively large flow rate of the processing liquid supply means and the low speed drive means are operated. And speed switching means for switching between a state in which the high speed drive means is operated, and
A switching control means for controlling the speed switching means is added so that only the low speed driving means is operated when the processing liquid is supplied to the substrate and the high speed driving means is operated when the bubbles are removed.
【０００７】請求項２に記載の発明では、上記処理液供
給手段を、処理液が収容された容器と、この容器と吸入
管路を介して吸入口が連通接続され吐出口が吐出管路に
連通接続されたベローズと、このベローズを伸縮駆動さ
せるシリンダとから構成し、上記低速駆動手段を、圧縮
空気源、排気管路並びに前記シリンダの一端側の流出入
口との空気管路及び他端側の流出入口との空気管路に各
別に流路接続された４つのポートを持つ第１のシリンダ
動作切換え弁と、前記各空気管路にそれぞれ介挿された
低速用速度制御弁とから構成し、上記高速駆動手段を、
前記圧縮空気源、排気管路並びに前記シリンダの一端側
の流出入口との空気管路及び他端側の流出入口との空気
管路に各別に流路接続された４つのポートを持つ第２の
シリンダ動作切換え弁と、前記各空気管路にそれぞれ介
挿された高速用速度制御弁とから構成し、上記速度切換
え手段を、前記圧縮空気源と前記第１のシリンダ動作切
換え弁又は前記第２のシリンダ動作切換え弁とを択一的
に連通させる弁機構から構成した。According to the second aspect of the present invention, the processing liquid supply means is provided with a container containing the processing liquid, the container and the suction port are connected to each other through the suction pipe line, and the discharge port is the discharge pipe line. The bellows connected in communication with each other and a cylinder for driving the bellows to expand and contract, and the low-speed driving means include a compressed air source, an exhaust pipe line, and an air pipe line and an other end side of the one end side of the cylinder A first cylinder operation switching valve having four ports each of which is separately connected to the air pipeline with the inflow / outflow inlet of the vehicle, and a low speed speed control valve inserted in each of the air pipelines. , The high-speed drive means,
A second port having four ports respectively connected to the compressed air source, the exhaust pipe line, the air pipe line with the outflow port on one end side of the cylinder, and the air pipe line with the outflow port on the other end side of the cylinder. It is composed of a cylinder operation switching valve and a high speed speed control valve inserted in each of the air pipelines, and the speed switching means is constituted by the compressed air source and the first cylinder operation switching valve or the second cylinder. It is composed of a valve mechanism that selectively communicates with the cylinder operation switching valve of.
【０００８】請求項３に記載の発明では、上記処理液供
給手段、上記低速駆動手段及び上記高速駆動手段をそれ
ぞれ、請求項２に記載の発明と同様に構成し、第１のシ
リンダ動作切換え弁及び第２のシリンダ動作切換え弁を
それぞれクローズドセンタ弁とし、切換え制御手段によ
って制御されることにより第１のシリンダ動作切換え弁
又は第２のシリンダ動作切換え弁が択一的に中立位置と
なるようにして、上記速度切換え手段を構成した。According to a third aspect of the present invention, the processing liquid supply means, the low speed drive means and the high speed drive means are respectively configured in the same manner as in the second aspect of the invention, and a first cylinder operation switching valve is provided. The second cylinder operation switching valve and the second cylinder operation switching valve are closed center valves, respectively, so that the first cylinder operation switching valve or the second cylinder operation switching valve is selectively brought to the neutral position by being controlled by the switching control means. Thus, the speed switching means is configured.
【０００９】請求項４に記載の発明では、上記処理液供
給手段を、処理液が収容された容器と、この容器と吸入
管路を介して吸入口が連通接続され吐出口が吐出管路に
連通接続されたベローズと、このベローズを伸縮駆動さ
せる第１のシリンダと、この第１のシリンダにタンデム
状に連接され、前記ベローズを伸縮駆動させる第２のシ
リンダとから構成した。そして、上記低速駆動手段を、
圧縮空気源、排気管路並びに前記第１のシリンダの一端
側の流出入口との空気管路及び他端側の流出入口との空
気管路に各別に流路接続された４つのポートを持つ第１
のシリンダ動作切換え弁と、前記各空気管路にそれぞれ
介挿された低速用速度制御弁とから構成し、上記高速駆
動手段を、前記圧縮空気源、排気管路並びに前記第２の
シリンダの一端側の流出入口との空気管路及び他端側の
流出入口との空気管路に各別に流路接続された４つのポ
ートを持つ第２のシリンダ動作切換え弁と、前記各空気
管路にそれぞれ介挿された高速用速度制御弁とから構成
し、前記第１のシリンダ動作切換え弁及び前記第２のシ
リンダ動作切換え弁をそれぞれ２位置弁とし、切換え制
御手段によって制御されることにより基板への処理液供
給時には第１のシリンダ動作切換え弁のみが作動し気泡
抜き時には第２のシリンダ動作切換え弁が作動するよう
にして、上記速度切換え手段を構成した。According to a fourth aspect of the present invention, the processing liquid supply means is provided with a container containing the processing liquid, the container and the suction port are connected to each other through the suction pipe line, and the discharge port is the discharge pipe line. The bellows are connected in communication with each other, a first cylinder for expanding and contracting the bellows, and a second cylinder connected to the first cylinder in a tandem shape for expanding and contracting the bellows. Then, the low-speed driving means,
A compressed air source, an exhaust pipe line, and an air pipe line with an outflow inlet port on one end side of the first cylinder and an air pipe line with an outflow inlet port on the other end side of the first cylinder; 1
Of the cylinder operation switching valve and a speed control valve for low speed inserted in each of the air pipelines, and the high speed drive means includes the compressed air source, the exhaust pipeline and one end of the second cylinder. Second cylinder operation switching valve having four ports respectively connected to the air pipeline with the outflow inlet on the side and the air pipeline with the outflow inlet on the other end, and each of the air pipelines. And a speed control valve for high speed inserted, each of the first cylinder operation switching valve and the second cylinder operation switching valve is a two-position valve, and is controlled by the switching control means to transfer to the substrate. The speed switching means is configured such that only the first cylinder operation switching valve operates when the processing liquid is supplied, and the second cylinder operation switching valve operates when the bubbles are removed.
【００１０】請求項５に記載の発明は、処理液が収容さ
れその処理液中に吐出管路の一端が差し込まれた密閉容
器の内部を低加圧系統により比較的低い空気圧で加圧し
て、密閉容器内から比較的小流量の処理液を吐出管路内
へ送り出して吐出管路を通し基板へ処理液を供給するよ
うにした処理液供給装置の構成に、前記密閉容器の内部
を比較的高い空気圧で加圧して密閉容器内から比較的大
流量の処理液を前記吐出管路内へ送り出す高加圧系統、
前記低加圧系統又は前記高加圧系統の何れか一方により
前記密閉容器の内部を加圧するように切り換える圧力切
換え手段、及び、基板への処理液供給時には前記低加圧
系統により密閉容器内部を加圧し気泡抜き時には前記高
加圧系統により密閉容器内部を加圧するよう前記圧力切
換え手段を制御する切換え制御手段を付加した構成を有
する。According to a fifth aspect of the present invention, the inside of a hermetically sealed container in which the treatment liquid is contained and one end of the discharge pipe is inserted into the treatment liquid is pressurized with a relatively low air pressure by a low pressure system, In the structure of the processing liquid supply device, which sends a relatively small flow rate of the processing liquid into the discharge conduit from the inside of the closed container and supplies the processing liquid to the substrate through the discharge conduit, A high pressure system that pressurizes with a high air pressure and sends a relatively large flow rate of the processing liquid from the inside of the closed container into the discharge pipe line,
Pressure switching means for switching so as to pressurize the inside of the closed container by either the low pressure system or the high pressure system, and the inside of the closed container by the low pressure system when supplying the processing liquid to the substrate. A switching control means for controlling the pressure switching means is added so as to pressurize the inside of the closed container by the high pressure system when pressurizing and removing bubbles.
【００１１】[0011]
【作用】請求項１に記載の発明に係る処理液供給装置で
は、基板へ処理液を供給して基板の処理を行なうときに
は、従来通り、低速駆動手段のみにより処理液供給手段
が低速で駆動されて、処理液供給手段から比較的小流量
の処理液が吐出管路内へ送り出される。一方、吐出管路
内からの気泡抜きを行なうときは、切換え制御手段によ
り速度切換え手段が切り換えられて高速駆動手段が作動
し、その高速駆動手段により処理液供給手段が高速で駆
動されて、処理液供給手段から比較的大流量の処理液が
吐出管路内へ送り出される。このように、気泡抜き時に
は、比較的大流量の処理液が吐出管路内に流されるの
で、気泡抜きの作業が迅速に行なわれることとなる。In the processing liquid supply apparatus according to the first aspect of the present invention, when the processing liquid is supplied to the substrate to process the substrate, the processing liquid supply unit is driven at a low speed only by the low speed driving unit as in the conventional case. As a result, a relatively small flow rate of the processing liquid is delivered from the processing liquid supply means into the discharge conduit. On the other hand, when removing air bubbles from the inside of the discharge pipe, the switching control means switches the speed switching means to operate the high-speed driving means, and the high-speed driving means drives the processing liquid supply means at high speed to perform processing. A relatively large flow rate of the processing liquid is sent out from the liquid supply means into the discharge conduit. In this way, when removing bubbles, a relatively large flow rate of the processing liquid is caused to flow into the discharge conduit, so that the bubbles can be removed quickly.
【００１２】請求項２に記載の発明に係る処理液供給装
置では、基板への処理液供給時には、圧縮空気源と第１
のシリンダ動作切換え弁とが連通させられ、第１のシリ
ンダ動作切換え弁が作動し、低速用速度制御弁がそれぞ
れ介挿された第１の空気管路及び第１の別の空気管路を
通して、シリンダの一端側の流出入口への圧縮空気の供
給及びシリンダの他端側の流出入口からの圧縮空気の排
出と、シリンダの他端側の流出入口への圧縮空気の供給
及びシリンダの一端側の流出入口からの圧縮空気の排出
とが交互に繰り返されることにより、シリンダが低速で
駆動されて、べローズが低速で伸縮駆動される。そし
て、べローズ内へ容器内の処理液が吸入管路を通して吸
入され、べローズから吐出管路内へ比較的小流量の処理
液が送り出される。一方、気泡抜き時には、圧縮空気源
と第２のシリンダ動作切換え弁とが連通させられ、第２
のシリンダ動作切換え弁が作動し、高速用速度制御弁が
それぞれ介挿された第２の空気管路及び第２の別の空気
管路を通して、シリンダの一端側の流出入口への圧縮空
気の供給及びシリンダの他端側の流出入口からの圧縮空
気の排出と、シリンダの他端側の流出入口への圧縮空気
の供給及びシリンダの一端側の流出入口からの圧縮空気
の排出とが交互に繰り返されることにより、シリンダが
高速で駆動されて、べローズが高速で伸縮駆動される。
そして、べローズ内へ容器内の処理液が吸入管路を通し
て吸入され、べローズから吐出管路内へ比較的大流量の
処理液が送り出される。In the processing liquid supply apparatus according to the second aspect of the present invention, when the processing liquid is supplied to the substrate, the compressed air source and the first
Through the first air pipe line and the first another air pipe line in which the low speed speed control valve is inserted, respectively. Supply of compressed air to the outlet and inlet of one end of the cylinder and discharge of compressed air from the outlet and inlet of the other end of the cylinder, supply of compressed air to the outlet and inlet of the other end of the cylinder, and supply of compressed air to the one end of the cylinder. By alternately repeating the discharge of the compressed air from the outflow / outlet port, the cylinder is driven at a low speed and the bellows is expanded / contracted at a low speed. Then, the processing liquid in the container is sucked into the bellows through the suction pipe line, and a relatively small flow rate of the processing liquid is sent out from the bellows into the discharge pipe line. On the other hand, when removing bubbles, the compressed air source and the second cylinder operation switching valve are made to communicate with each other, and the second
Supply of compressed air to the outlet / inlet on one end side of the cylinder through the second air pipe and the second another air pipe in which the high speed speed control valve is inserted. And the discharge of compressed air from the outflow inlet at the other end of the cylinder, the supply of compressed air to the outflow inlet at the other end of the cylinder, and the discharge of compressed air from the outflow inlet at the one end of the cylinder are repeated alternately. As a result, the cylinder is driven at high speed, and the bellows is expanded and contracted at high speed.
Then, the processing liquid in the container is sucked into the bellows through the suction pipe line, and a relatively large flow rate of the processing liquid is sent out from the bellows into the discharge pipe line.
【００１３】請求項３に記載の発明に係る処理液供給装
置では、基板への処理液供給時には、クローズドセンタ
弁からなる第２のシリンダ動作切換え弁が中立位置に保
持され、第１のシリンダ動作切換え弁のみを介して、圧
縮空気源及び排気管路と第１の空気管路及び第１の別の
空気管路とが連通することが可能な状態とされ、第１の
シリンダ動作切換え弁が作動し、低速用速度制御弁がそ
れぞれ介挿された第１の空気管路及び第１の別の空気管
路を通して、シリンダの一端側の流出入口への圧縮空気
の供給及びシリンダの他端側の流出入口からの圧縮空気
の排出と、シリンダの他端側の流出入口への圧縮空気の
供給及びシリンダの一端側の流出入口からの圧縮空気の
排出とが交互に繰り返されることにより、シリンダが低
速で駆動されて、べローズが低速で伸縮駆動される。そ
して、べローズ内へ容器内の処理液が吸入管路を通して
吸入され、べローズから吐出管路内へ比較的小流量の処
理液が送り出される。一方、気泡抜き時には、クローズ
ドセンタ弁からなる第１のシリンダ動作切換え弁が中立
位置に保持され、第２のシリンダ動作切換え弁を介し
て、圧縮空気源及び排気管路と第２の空気管路及び第２
の別の空気管路とが連通することが可能な状態とされ、
第２のシリンダ動作切換え弁が作動し、高速用速度制御
弁がそれぞれ介挿された第２の空気管路及び第２の別の
空気管路を通して、シリンダの一端側の流出入口への圧
縮空気の供給及びシリンダの他端側の流出入口からの圧
縮空気の排出と、シリンダの他端側の流出入口への圧縮
空気の供給及びシリンダの一端側の流出入口からの圧縮
空気の排出とが交互に繰り返されることにより、シリン
ダが高速で駆動されて、べローズが高速で伸縮駆動され
る。そして、べローズ内へ容器内の処理液が吸入管路を
通して吸入され、べローズから吐出管路内へ比較的大流
量の処理液が送り出される。In the processing liquid supply apparatus according to the third aspect of the present invention, when the processing liquid is supplied to the substrate, the second cylinder operation switching valve, which is a closed center valve, is held at the neutral position and the first cylinder operation is performed. The compressed air source and the exhaust pipe line and the first air pipe line and the first another air pipe line are brought into a state in which they can communicate with each other via only the switching valve, and the first cylinder operation switching valve is Supplying compressed air to the inlet and outlet of one end of the cylinder and the other end of the cylinder through the first air conduit and the first separate air conduit in which the low speed speed control valves are respectively inserted. Of the compressed air from the inflow / outflow port of the cylinder, supply of compressed air to the outflow / inflow port on the other end side of the cylinder, and discharge of compressed air from the outflow / inflow port on the one end side of the cylinder are alternately repeated, Driven at low speed, Rose is stretchable driven at low speed. Then, the processing liquid in the container is sucked into the bellows through the suction pipe line, and a relatively small flow rate of the processing liquid is sent out from the bellows into the discharge pipe line. On the other hand, when removing air bubbles, the first cylinder operation switching valve, which is a closed center valve, is held in the neutral position, and the compressed air source, the exhaust pipe line, and the second air pipe line are passed through the second cylinder operation switching valve. And the second
It is in a state where it can communicate with another air pipeline of
Compressed air to the outflow / inflow port on one end side of the cylinder through the second air pipe line and the second another air pipe line in which the second cylinder operation switching valve operates and the high speed speed control valve are respectively inserted. Supply of compressed air from the other end of the cylinder and discharge of compressed air from the other end of the cylinder, and supply of compressed air to the other end of the cylinder and discharge of compressed air from the other end of the cylinder. By repeating the above, the cylinder is driven at high speed and the bellows is expanded and contracted at high speed. Then, the processing liquid in the container is sucked into the bellows through the suction pipe line, and a relatively large flow rate of the processing liquid is sent out from the bellows into the discharge pipe line.
【００１４】請求項４に記載の発明に係る処理液供給装
置では、基板への処理液供給時には、２位置弁からなる
第２のシリンダ動作切換え弁が停止したままま作動せ
ず、第１のシリンダ動作切換え弁のみが作動し、低速用
速度制御弁がそれぞれ介挿された第１の空気管路及び第
１の別の空気管路を通して、第１のシリンダの一端側の
流出入口への圧縮空気の供給及び第１のシリンダの他端
側の流出入口からの圧縮空気の排出と、第１のシリンダ
の他端側の流出入口への圧縮空気の供給及び第１のシリ
ンダの一端側の流出入口からの圧縮空気の排出とが交互
に繰り返されることにより、第１のシリンダが低速で駆
動されて、べローズが低速で伸縮駆動される。そして、
べローズ内へ容器内の処理液が吸入管路を通して吸入さ
れ、べローズから吐出管路内へ比較的小流量の処理液が
送り出される。一方、気泡抜き時には、第２のシリンダ
動作切換え弁が作動し、高速用速度制御弁がそれぞれ介
挿された第２の空気管路及び第２の別の空気管路を通し
て、第２のシリンダの一端側の流出入口への圧縮空気の
供給及び第２のシリンダの他端側の流出入口からの圧縮
空気の排出と、第２のシリンダの他端側の流出入口への
圧縮空気の供給及び第２のシリンダの一端側の流出入口
からの圧縮空気の排出とが交互に繰り返されることによ
り、第２のシリンダが高速で駆動されて、べローズが高
速で伸縮駆動される。そして、べローズ内へ容器内の処
理液が吸入管路を通して吸入され、べローズから吐出管
路内へ比較的大流量の処理液が送り出される。In the processing liquid supply apparatus according to the fourth aspect of the present invention, when the processing liquid is supplied to the substrate, the second cylinder operation switching valve composed of the two-position valve does not remain in operation and remains in the first position. Only the cylinder operation switching valve is operated, and compression to the outflow inlet on the one end side of the first cylinder is performed through the first air line and the first other air line in which the speed control valve for low speed is inserted. Supply of air and discharge of compressed air from the outflow inlet on the other end side of the first cylinder, supply of compressed air to the outflow inlet on the other end side of the first cylinder, and outflow on one end side of the first cylinder By alternately repeating the discharge of the compressed air from the inlet, the first cylinder is driven at a low speed, and the bellows is expanded / contracted at a low speed. And
The processing liquid in the container is sucked into the bellows through the suction pipe line, and a relatively small flow rate of the processing liquid is delivered from the bellows into the discharge pipe line. On the other hand, at the time of removing air bubbles, the second cylinder operation switching valve operates, and the second cylinder air passage is inserted through the second air passage and the second air passage in which the high speed speed control valve is inserted. Supply of compressed air to the outflow inlet on one end side, discharge of compressed air from the outflow inlet on the other end side of the second cylinder, supply of compressed air to the outflow inlet on the other end side of the second cylinder, and The second cylinder is driven at high speed and the bellows is expanded and contracted at high speed by alternately repeating the discharge of the compressed air from the outflow inlet on the one end side of the second cylinder. Then, the processing liquid in the container is sucked into the bellows through the suction pipe line, and a relatively large flow rate of the processing liquid is sent out from the bellows into the discharge pipe line.
【００１５】請求項５に記載の発明に係る処理液供給装
置では、基板へ処理液を供給して基板の処理を行なうと
きには、低加圧系統により密閉容器の内部が比較的低い
空気圧で加圧され、密閉容器内から比較的小流量の処理
液が吐出管路内へ送り出される。一方、吐出管路内から
の気泡抜きを行なうときは、切換え制御手段により圧力
切換え手段が切り換えられ、高加圧系統により密閉容器
の内部が比較的高い空気圧で加圧され、密閉容器内から
比較的大流量の処理液が吐出管路内へ送り出される。こ
のように、気泡抜き時には、比較的大流量の処理液が吐
出管路内に流され、気泡抜きの作業が迅速に行なわれ
る。In the processing liquid supply apparatus according to the fifth aspect of the present invention, when the processing liquid is supplied to the substrate to process the substrate, the inside of the closed container is pressurized with a relatively low air pressure by the low pressurization system. Then, a relatively small flow rate of the processing liquid is sent out from the closed container into the discharge pipe line. On the other hand, when removing air bubbles from the discharge pipe, the switching control means switches the pressure switching means, and the high pressure system pressurizes the inside of the closed container with a relatively high air pressure. A large flow rate of the processing liquid is delivered into the discharge conduit. In this way, at the time of bubble removal, a relatively large flow rate of the processing liquid is caused to flow into the discharge conduit, and the bubble removal operation is performed quickly.
【００１６】[0016]
【実施例】以下、この発明の好適な実施例について図面
を参照しながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to the drawings.
【００１７】図１は、請求項１に記載の発明の１実施例
を示し、基板処理装置用処理液供給装置の概略流路構成
を示す模式図である。この処理液供給装置の処理液供給
手段は、図８に示した従来装置と同様に構成されてい
る。すなわち、処理液10を収容した容器12、この容器12
と吸入管路14を介して吸入口が連通接続され吐出口が吐
出管路16に連通接続されたベローズ18及びこのベローズ
18を伸縮駆動させるシリンダ30から構成されたポンプ、
吐出管路16の先端に接続され供給口がウエハＷに対向す
るように配設された吐出ノズル24、並びに、吐出管路16
に介挿されたフィルタ26から構成されている。FIG. 1 is a schematic diagram showing an embodiment of the invention described in claim 1 and showing a schematic flow path configuration of a processing liquid supply apparatus for a substrate processing apparatus. The processing liquid supply means of this processing liquid supply device is configured similarly to the conventional device shown in FIG. That is, the container 12 containing the processing liquid 10, the container 12
And a bellows 18 in which the suction port is in communication with the suction pipe line 14 and the discharge port is in communication with the discharge pipe line 16, and the bellows
A pump composed of a cylinder 30 that drives the 18 to expand and contract,
A discharge nozzle 24, which is connected to the tip of the discharge conduit 16 and is arranged so that the supply port faces the wafer W, and the discharge conduit 16.
The filter 26 is inserted in the
【００１８】そして、この装置では、シリンダ30の一端
側の流出入口に、第１の空気管路32及び第２の空気管路
36がそれぞれ連通接続されているとともに、シリンダ30
の他端側の流出入口に、第１の別の空気管路34及び第２
の別の空気管路38がそれぞれ連通接続されている。第１
の空気管路32及び第１の別の空気管路34は、第１のシリ
ンダ動作切換え弁40の２つのポートにそれぞれ各別に接
続されており、他の２つのポートに圧縮空気の供給管路
28の分岐管路及び排気管路44が各別に接続されている。
一方、第２の空気管路36及び第２の別の空気管路38は、
第２のシリンダ動作切換え弁42の２つのポートにそれぞ
れ各別に接続されており、他の２つのポートに圧縮空気
の供給管路28の分岐管路及び排気管路46が各別に接続さ
れている。また、第１の空気管路32及び第１の別の空気
管路34に、それぞれ低速用速度制御弁48が介挿されてお
り、一方、第２の空気管路36及び第２の別の空気管路38
に、それぞれ高速用速度制御弁50が介挿されている。さ
らに、圧縮空気の供給管路28の各分岐管路及び各排気管
路44、46には、それぞれ電磁開閉弁52が介挿されいる。
そして、各電磁開閉弁52の開閉動作をそれぞれ制御する
制御器54が設けられている。Further, in this device, the first air pipe 32 and the second air pipe 32 are provided at the outflow inlet on one end side of the cylinder 30.
36 are connected to each other and cylinder 30
At the outflow inlet on the other end side of the first other air pipe 34 and the second
Of the other air pipes 38 are connected in communication with each other. First
Of the first cylinder operation switching valve 40, and the other of the two air ports 32 of the first cylinder operation switching valve 40 are respectively connected to the other air ports 32 and the other two ports.
28 branch lines and an exhaust line 44 are separately connected.
On the other hand, the second air pipeline 36 and the second another air pipeline 38 are
The two ports of the second cylinder operation switching valve 42 are individually connected to each other, and the branch line of the compressed air supply line 28 and the exhaust line 46 are separately connected to the other two ports. . A low speed speed control valve 48 is inserted in each of the first air conduit 32 and the first another air conduit 34, while the second air conduit 36 and the second another air conduit 34 are inserted. Air line 38
A high speed speed control valve 50 is inserted in each of the above. Further, an electromagnetic opening / closing valve 52 is inserted in each branch pipe of the compressed air supply pipe 28 and each exhaust pipe 44, 46.
A controller 54 that controls the opening / closing operation of each electromagnetic opening / closing valve 52 is provided.
【００１９】図１に示した処理液供給装置を使用して基
板Ｗの表面へ処理液を供給するときは、制御器54により
各電磁開閉弁52をそれぞれ制御し、圧縮空気の供給管路
28と第１のシリンダ動作切換え弁40とを接続する分岐管
路に介挿された電磁開閉弁52及び排気管路44に介挿され
た電磁開閉弁52をそれぞれ開き、一方、圧縮空気の供給
管路28と第２のシリンダ動作切換え弁42とを接続する分
岐管路に介挿された電磁開閉弁52及び排気管路46に介挿
された電磁開閉弁52をそれぞれ閉じる。そして、第１の
シリンダ動作切換え弁40を作動させる。すなわち、図２
に第１のシリンダ動作切換え弁40の構成の１例及びその
動作を示すように、第１のシリンダ動作切換え弁40を同
図（ａ）に示した状態と同図（ｂ）に示した状態とに交
互に切り換える動作を繰り返させることにより、低速用
速度制御弁48がそれぞれ介挿された第１の空気管路32及
び第１の別の空気管路34を通して、シリンダ30の一端側
の流出入口からシリンダ30内へ圧縮空気を供給するとと
もにシリンダ30の他端側の流出入口からシリンダ30外へ
圧縮空気を排出し、次いでシリンダ30の他端側の流出入
口からシリンダ30内へ圧縮空気を供給するとともにシリ
ンダ30の一端側の流出入口からシリンダ30外へ圧縮空気
を排出し、これらの動作を交互に繰り返させる。これに
より、シリンダ30が低速で駆動され、べローズ18が低速
で伸縮駆動される。そして、容器12から処理液10が、吸
入管路14を通しベローズ18を経て吐出管路16内へ送給さ
れ、比較的小流量の処理液が吐出管路16を通って吐出ノ
ズル24の先端からウエハＷへ吐出される。When supplying the processing liquid to the surface of the substrate W by using the processing liquid supply apparatus shown in FIG. 1, each electromagnetic on-off valve 52 is controlled by the controller 54 to supply the compressed air supply line.
Open the electromagnetic on-off valve 52 inserted in the branch line connecting the 28 and the first cylinder operation switching valve 40 and the electromagnetic on-off valve 52 inserted in the exhaust line 44, while supplying compressed air. The electromagnetic on-off valve 52 inserted in the branch line connecting the line 28 and the second cylinder operation switching valve 42 and the electromagnetic on-off valve 52 inserted in the exhaust line 46 are closed. Then, the first cylinder operation switching valve 40 is operated. That is, FIG.
As an example of the configuration of the first cylinder operation switching valve 40 and its operation, the first cylinder operation switching valve 40 is in the state shown in FIG. 3A and the state shown in FIG. By repeating the operation of alternately switching to and from, the outflow to the one end side of the cylinder 30 through the first air pipeline 32 and the first another air pipeline 34 in which the low speed speed control valve 48 is respectively inserted. Compressed air is supplied from the inlet to the inside of the cylinder 30, and compressed air is discharged from the outflow inlet on the other end side of the cylinder 30 to the outside of the cylinder 30, and then compressed air is fed into the cylinder 30 from the outflow inlet on the other end side of the cylinder 30. The compressed air is supplied to the outside of the cylinder 30 from the inlet / outlet on one end side of the cylinder 30, and these operations are alternately repeated. As a result, the cylinder 30 is driven at a low speed, and the bellows 18 is driven to expand and contract at a low speed. Then, the processing liquid 10 is supplied from the container 12 through the suction pipe line 14 and the bellows 18 into the discharge pipe line 16, and a relatively small amount of the processing liquid passes through the discharge pipe line 16 and the tip of the discharge nozzle 24. Is discharged onto the wafer W.
【００２０】一方、吐出管路16内からの気泡抜きを行な
うときは、制御器54により各電磁開閉弁52をそれぞれ制
御し、圧縮空気の供給管路28と第２のシリンダ動作切換
え弁42とを接続する分岐管路に介挿された電磁開閉弁52
及び排気管路46に介挿された電磁開閉弁52をそれぞれ開
き、一方、圧縮空気の供給管路28と第１のシリンダ動作
切換え弁40とを接続する分岐管路に介挿された電磁開閉
弁52及び排気管路44に介挿された電磁開閉弁52をそれぞ
れ閉じる。そして、第２のシリンダ動作切換え弁42を、
上記した第１のシリンダ動作切換え弁40と同様に作動さ
せることにより、高速用速度制御弁50がそれぞれ介挿さ
れた第２の空気管路36及び第２の別の空気管路38を通し
て、シリンダ30の一端側の流出入口からシリンダ30内へ
圧縮空気を供給するとともにシリンダ30の他端側の流出
入口からシリンダ30外へ圧縮空気を排出し、次いでシリ
ンダ30の他端側の流出入口からシリンダ30内へ圧縮空気
を供給するとともにシリンダ30の一端側の流出入口から
シリンダ30外へ圧縮空気を排出し、これらの動作を交互
に繰り返させる。これにより、シリンダ30が高速で駆動
され、べローズ18が高速で伸縮駆動されて、比較的大流
量の処理液がベローズ18から吐出管路16内へ送給され
る。そして、比較的大流量の処理液が吐出管路16内を流
され、その処理液が、フィルタ26に付設された廃液ライ
ンを通して排出され或いは吐出ノズル24から排出される
ことにより、吐出管路16内部からの気泡抜きの作業が迅
速に行なわれる。On the other hand, when air bubbles are removed from the discharge pipe line 16, each electromagnetic on-off valve 52 is controlled by the controller 54 so that the compressed air supply pipe line 28 and the second cylinder operation switching valve 42 are connected. Solenoid on-off valve 52 inserted in the branch line connecting the
And the electromagnetic opening / closing valve 52 inserted in the exhaust pipe line 46, respectively, while the electromagnetic opening / closing valve inserted in the branch pipe line connecting the compressed air supply pipe line 28 and the first cylinder operation switching valve 40. The valve 52 and the electromagnetic on-off valve 52 inserted in the exhaust pipe line 44 are closed. Then, the second cylinder operation switching valve 42
By operating in the same manner as the above-described first cylinder operation switching valve 40, the cylinder can be operated through the second air pipeline 36 and the second another air pipeline 38 in which the high speed speed control valve 50 is inserted. Compressed air is supplied into the cylinder 30 from the outflow inlet at one end of the cylinder 30, compressed air is discharged from the outflow inlet at the other end of the cylinder 30 to the outside of the cylinder 30, and then from the outflow inlet at the other end of the cylinder 30 to the cylinder 30. Compressed air is supplied to the inside of the cylinder 30, and compressed air is discharged to the outside of the cylinder 30 from the outflow inlet on one end side of the cylinder 30, and these operations are alternately repeated. As a result, the cylinder 30 is driven at high speed, the bellows 18 is expanded and contracted at high speed, and a relatively large flow rate of the processing liquid is fed from the bellows 18 into the discharge conduit 16. Then, a relatively large flow rate of the processing liquid is caused to flow in the discharge pipe line 16, and the processing liquid is discharged through the waste liquid line attached to the filter 26 or discharged from the discharge nozzle 24, whereby the discharge pipe line 16 is discharged. The work of removing air bubbles from the inside is performed quickly.
【００２１】尚、上記説明では、気泡抜き時に、圧縮空
気の供給管路28と第２のシリンダ動作切換え弁42とを接
続する分岐管路に介挿された電磁開閉弁52及び排気管路
46に介挿された電磁開閉弁52だけを開き第２のシリンダ
動作切換え弁42だけを作動させるようにしているが、す
べての電磁開閉弁52を開き、第１のシリンダ動作切換え
弁40と第２のシリンダ動作切換え弁42との作動タイミン
グを一致させて双方のシリンダ動作切換え弁40、42を同
時に作動させるようにしてもよい。In the above description, the electromagnetic opening / closing valve 52 and the exhaust pipe line inserted in the branch pipe line connecting the compressed air supply pipe line 28 and the second cylinder operation switching valve 42 at the time of removing bubbles.
Although only the solenoid opening / closing valve 52 inserted in 46 is opened and only the second cylinder operation switching valve 42 is operated, all the solenoid opening / closing valves 52 are opened and the first cylinder operation switching valve 40 and the first cylinder operation switching valve 40 are opened. The two cylinder operation switching valves 42 and 42 may be operated at the same time by matching the operation timings of the two cylinder operation switching valves 42.
【００２２】尚、上記実施例の装置において、ベローズ
18の代わりにダイヤフラムを用いてポンプを構成するよ
うにしてもよい。In the apparatus of the above embodiment, the bellows
A diaphragm may be used instead of 18 to configure the pump.
【００２３】次に、図３は、請求項１に記載の発明の第
２の実施例を示す処理液供給装置の概略流路構成図であ
り、図４は、この処理液供給装置における第１のシリン
ダ動作切換え弁400及び第２のシリンダ動作切換え弁420
の構成の１例及びその動作を示す図である。Next, FIG. 3 is a schematic flow path configuration diagram of a processing liquid supply apparatus showing a second embodiment of the invention according to claim 1, and FIG. 4 is a first flow chart of the processing liquid supply apparatus. Cylinder switching valve 400 and second cylinder switching valve 420
3 is a diagram showing an example of the configuration of FIG.
【００２４】図３に示した処理液供給装置が、図１に示
した処理液供給装置と相違する点は、第１のシリンダ動
作切換え弁400及び第２のシリンダ動作切換え弁420をそ
れぞれ４ポート３位置クローズドセンタ弁で構成し、シ
リンダ30（ベローズ18）の速度を切り換える場合には、
第１のシリンダ動作切換え弁400又は第２のシリンダ動
作切換え弁420の何れか一方が中立位置となるように制
御器54によって制御するようにし、電磁開閉弁52を不要
とした構成にある。その以外の構成は、図１に示した処
理液供給装置と同様であり、その説明を省略する。The processing liquid supply apparatus shown in FIG. 3 is different from the processing liquid supply apparatus shown in FIG. 1 in that the first cylinder operation switching valve 400 and the second cylinder operation switching valve 420 are each 4 ports. When the speed of the cylinder 30 (bellows 18) is switched with a 3-position closed center valve,
In this configuration, either the first cylinder operation switching valve 400 or the second cylinder operation switching valve 420 is controlled by the controller 54 so that the solenoid valve 52 is not required. Other than that, the configuration is the same as that of the treatment liquid supply apparatus shown in FIG.
【００２５】図３に示した処理液供給装置を使用して基
板Ｗの表面へ処理液を供給するときは、まず、制御器54
により第２のシリンダ動作切換え弁420を図３の（ａ）
及び（ｂ）に示すように中立位置に保持して、第１のシ
リンダ動作切換え弁400のみを介し、圧縮空気の供給管
路28の分岐管路及び排気管路44と低速用速度制御弁48が
それぞれ介挿された第１の空気管路32及び第１の別の空
気管路34とが連通することが可能な状態とする。そし
て、第１のシリンダ動作切換え弁400を作動させること
により、低速用速度制御弁48がそれぞれ介挿された第１
の空気管路32及び第１の別の空気管路34を通し、図３の
（ａ）に示す状態においてシリンダ30の一端側の流出入
口からシリンダ30内へ圧縮空気を供給するとともにシリ
ンダ30の他端側の流出入口からシリンダ30外へ圧縮空気
を排出し、次いで、制御器54により第１のシリンダ動作
切換え弁400を図３の（ｂ）に示す状態に切り換えて、
シリンダ30の他端側の流出入口からシリンダ30内へ圧縮
空気を供給するとともにシリンダ30の一端側の流出入口
からシリンダ30外へ圧縮空気を排出し、これらの動作を
交互に繰り返させる。これにより、シリンダ30が低速で
駆動されて、ベローズ18が低速で伸縮駆動される。そし
て、容器12から処理液10が、吸入管路14を通しベローズ
18を経て吐出管路16内へ送給され、比較的小流量の処理
液が吐出管路16を通って吐出ノズル24の先端からウエハ
Ｗへ吐出される。When supplying the processing liquid to the surface of the substrate W using the processing liquid supply apparatus shown in FIG. 3, first, the controller 54 is used.
The second cylinder operation switching valve 420 is moved to the position shown in FIG.
And, as shown in (b), it is held in the neutral position, and only through the first cylinder operation switching valve 400, the branch line of the compressed air supply line 28, the exhaust line 44, and the low speed speed control valve 48. The first air pipeline 32 and the first another air pipeline 34 in which the respective ones are inserted can communicate with each other. Then, by operating the first cylinder operation switching valve 400, the first low speed control valve 48 is inserted.
Of the cylinder 30 through the air conduit 32 and the first other air conduit 34 of FIG. 3 and supplying compressed air into the cylinder 30 from the outlet / inlet on one end side of the cylinder 30 in the state shown in FIG. Compressed air is discharged to the outside of the cylinder 30 from the outflow inlet on the other end side, and then the controller 54 switches the first cylinder operation switching valve 400 to the state shown in FIG.
Compressed air is supplied into the cylinder 30 from the outflow inlet on the other end side of the cylinder 30, and compressed air is discharged from the outflow inlet on the one end side of the cylinder 30 to the outside of the cylinder 30, and these operations are repeated alternately. As a result, the cylinder 30 is driven at low speed, and the bellows 18 is driven to expand and contract at low speed. Then, the processing liquid 10 from the container 12 passes through the suction pipe line 14 and then the bellows.
It is fed into the discharge conduit 16 via 18 and a relatively small flow rate of the processing liquid is discharged from the tip of the discharge nozzle 24 to the wafer W through the discharge conduit 16.
【００２６】一方、吐出管路16内からの気泡抜きを行な
うときは、まず、制御器54により第１のシリンダ動作切
換え弁400を図３の（ｃ）及び（ｄ）に示すように中立
位置に保持して、第２のシリンダ動作切換え弁420のみ
を介し、圧縮空気の供給管路28の分岐管路及び排気管路
44と高速用速度制御弁50がそれぞれ介挿された第２の空
気管路36及び第２の別の空気管路38とが連通することが
可能な状態とする。そして、第２のシリンダ動作切換え
弁420を作動させることにより、高速用速度制御弁50が
それぞれ介挿された第２の空気管路36及び第２の別の空
気管路38を通し、図３の（ｃ）に示す状態においてシリ
ンダ30の一端側の流出入口からシリンダ30内へ圧縮空気
を供給するとともにシリンダ30の他端側の流出入口から
シリンダ30外へ圧縮空気を排出し、次いで、制御器54に
より第２のシリンダ動作切換え弁420を図３の（ｄ）に
示す状態に切り換えて、シリンダ30の他端側の流出入口
からシリンダ30内へ圧縮空気を供給するとともにシリン
ダ30の一端側の流出入口からシリンダ30外へ圧縮空気を
排出し、これらの動作を交互に繰り返させる。これによ
り、シリンダ30が高速で駆動されて、ベローズ18が高速
で伸縮駆動される。そして、容器12から処理液10が、吸
入管路14を通しベローズ18を経て吐出管路16内へ送給さ
れ、比較的大流量の処理液が吐出管路16を通って吐出ノ
ズル24の先端からウエハＷへ吐出される。On the other hand, when air bubbles are removed from the discharge pipe 16, first the controller 54 sets the first cylinder operation switching valve 400 to the neutral position as shown in FIGS. 3 (c) and 3 (d). , And the branch line and exhaust line of the compressed air supply line 28 via only the second cylinder operation switching valve 420.
The second air pipe line 36 and the second another air pipe line 38, in which the high speed speed control valve 50 is inserted respectively, can communicate with each other. Then, by operating the second cylinder operation switching valve 420, the second air pipe line 36 and the second another air pipe line 38, into which the high speed speed control valve 50 is inserted, respectively, are passed through, as shown in FIG. (C), compressed air is supplied into the cylinder 30 from the outflow inlet on the one end side of the cylinder 30, and compressed air is discharged from the outflow inlet on the other end side of the cylinder 30 to the outside of the cylinder 30. The second cylinder operation switching valve 420 is switched to the state shown in FIG. 3D by the device 54, compressed air is supplied into the cylinder 30 from the outflow inlet on the other end side of the cylinder 30, and one end side of the cylinder 30 is supplied. Compressed air is discharged to the outside of the cylinder 30 from the inflow / outflow port of the above, and these operations are alternately repeated. As a result, the cylinder 30 is driven at high speed, and the bellows 18 is driven to expand and contract at high speed. Then, the processing liquid 10 is fed from the container 12 through the suction pipe line 14 and the bellows 18 into the discharge pipe line 16, and a relatively large amount of the processing liquid passes through the discharge pipe line 16 and the tip of the discharge nozzle 24. Is discharged onto the wafer W.
【００２７】尚、上記説明では、気泡抜き時に、第１の
シリンダ動作切換え弁400を中立位置に保持して第２の
シリンダ動作切換え弁420だけを作動させるようにして
いるが、第１のシリンダ動作切換え弁400と第２のシリ
ンダ動作切換え弁420との作動タイミングを一致させて
双方のシリンダ動作切換え弁400、420を同時に作動させ
るようにしてもよい。In the above description, the first cylinder operation switching valve 400 is held in the neutral position and only the second cylinder operation switching valve 420 is operated when the air bubbles are removed. The operation switching valve 400 and the second cylinder operation switching valve 420 may be operated at the same timing so that both cylinder operation switching valves 400 and 420 are operated simultaneously.
【００２８】次に、図５は、請求項１に記載の発明の第
３の実施例を示す処理液供給装置の概略流路構成図であ
り、図６は、この処理液供給装置における第１のシリン
ダ動作切換え弁70及び第２のシリンダ動作切換え弁72の
構成の１例及びその動作を示す図である。Next, FIG. 5 is a schematic flow path configuration diagram of a processing liquid supply apparatus showing a third embodiment of the invention as set forth in claim 1, and FIG. 6 is a first flow chart of the processing liquid supply apparatus. FIG. 5 is a diagram showing an example of the configuration of the cylinder operation switching valve 70 and the second cylinder operation switching valve 72 of FIG.
【００２９】図５に示した処理液供給装置は、ベローズ
18を伸縮駆動させる駆動手段が、ベローズ18に直接連結
された第１のシリンダ60ａと、この第１のシリンダ60ａ
にタンデム状に連接され、第１のシリンダ60ａを介在さ
せてベローズ18を伸縮駆動させる第２のシリンダ60ｂと
から構成されている。そして、第１のシリンダ60ａの一
端側の流出入口に連通接続された第１の空気管路62及び
他端側の流出入口に連通接続された第１の別の空気管路
64に、それぞれ低速用速度制御弁78が介挿されており、
第１の空気管路62及び第１の別の空気管路64が、４ポー
ト２位置弁で構成された第１のシリンダ動作切換え弁70
の２つのポートにそれぞれ各別に接続され、残りのポー
トに圧縮空気の供給管路28の分岐管路及び排気管路74が
各別に接続されている。一方、第２のシリンダ60ｂの一
端側の流出入口に連通接続された第２の空気管路66及び
他端側の流出入口に連通接続された第２の別の空気管路
68に、それぞれ高速用速度制御弁80が介挿されており、
第２の空気管路66及び第２の別の空気管路68が、４ポー
ト２位置弁で構成された第２のシリンダ動作切換え弁72
の２つのポートにそれぞれ各別に接続され、残りのポー
トに圧縮空気の供給管路28の分岐管路及び排気管路76が
各別に接続されている。また、第１のシリンダ動作切換
え弁70及び第２のシリンダ動作切換え弁72の切換え動作
をそれぞれ制御する制御器84が設けられている。The treatment liquid supply device shown in FIG.
A driving means for driving the expansion and contraction of the first cylinder 60a is directly connected to the bellows 18, and the first cylinder 60a.
And a second cylinder 60b that is connected in tandem and that drives the bellows 18 to expand and contract with the first cylinder 60a interposed. Then, a first air pipeline 62 which is connected to the outflow inlet on one end side of the first cylinder 60a and a first another air pipeline which is connected to an outflow inlet on the other end side.
64, the speed control valve 78 for low speed is respectively inserted,
A first cylinder operation switching valve 70 in which the first air line 62 and the first other air line 64 are configured by a 4-port 2-position valve.
Of the compressed air supply line 28 and the exhaust line 74 are connected to the remaining ports. On the other hand, a second air pipeline 66 communicating with the outflow inlet on one end side of the second cylinder 60b and a second air pipeline communicating with the outflow inlet on the other end side.
The speed control valve 80 for high speed is inserted in each 68,
A second cylinder operation switching valve 72 in which the second air line 66 and the second additional air line 68 are configured by a 4-port 2-position valve.
Of the compressed air supply line 28 and the exhaust line 76 of the compressed air supply line 28 are connected to the remaining ports. Further, a controller 84 for controlling the switching operation of each of the first cylinder operation switching valve 70 and the second cylinder operation switching valve 72 is provided.
【００３０】図５に示した処理液供給装置を使用して基
板Ｗの表面へ処理液を供給するときは、まず、制御器84
により第２のシリンダ動作切換え弁72を図６の（ａ）及
び（ｂ）に示すような状態に保持したままにして、第１
のシリンダ動作切換え弁70のみを作動させることによ
り、低速用速度制御弁78がそれぞれ介挿された第１の空
気管路62及び第１の別の空気管路64を通し、図６の
（ａ）に示す状態において第１のシリンダ60ａの他端側
の流出入口から第１のシリンダ60ａ内へ圧縮空気を供給
するとともに第１のシリンダ60ａの一端側の流出入口か
ら第１のシリンダ60ａ外へ圧縮空気を排出し、次いで、
制御器84により第１のシリンダ動作切換え弁70を図６の
（ｂ）に示す状態に切り換えて、第１のシリンダ60ａの
一端側の流出入口から第１のシリンダ60ａ内へ圧縮空気
を供給するとともに第１のシリンダ60ａの他端側の流出
入口から第１のシリンダ60ａ外へ圧縮空気を排出し、こ
れらの動作を交互に繰り返させる。これにより、第１の
シリンダ60ａを低速で駆動させて、べローズ18を低速で
伸縮駆動させる。そして、ベローズ18から吐出管路16内
へ比較的小流量の処理液を送り出し、その処理液を吐出
ノズル24の先端からウエハＷへ吐出させるようにする。When supplying the processing liquid to the surface of the substrate W by using the processing liquid supply apparatus shown in FIG. 5, first, the controller 84 is used.
As a result, the second cylinder operation switching valve 72 is held in the state as shown in FIGS.
By operating only the cylinder operation switching valve 70 of FIG. 6, the low speed control valve 78 is passed through the first air pipeline 62 and the first another air pipeline 64, respectively, and ), Compressed air is supplied into the first cylinder 60a from the outflow inlet on the other end side of the first cylinder 60a, and the compressed air is supplied from the outflow inlet on the one end side of the first cylinder 60a to the outside of the first cylinder 60a. Eject compressed air, then
The controller 84 switches the first cylinder operation switching valve 70 to the state shown in FIG. 6B, and compressed air is supplied into the first cylinder 60a from the outlet / inlet on one end side of the first cylinder 60a. At the same time, compressed air is discharged to the outside of the first cylinder 60a from the outflow inlet on the other end side of the first cylinder 60a, and these operations are alternately repeated. As a result, the first cylinder 60a is driven at a low speed, and the bellows 18 is expanded and contracted at a low speed. Then, a relatively small flow rate of the processing liquid is sent out from the bellows 18 into the discharge pipe 16, and the processing liquid is discharged from the tip of the discharge nozzle 24 to the wafer W.
【００３１】一方、吐出管路16内からの気泡抜きを行な
うときは、まず、制御器84により第１のシリンダ動作切
換え弁70を図６の（ｃ）及び（ｄ）に示すような状態に
保持したままにして、第２のシリンダ動作切換え弁72の
みを作動させることにより、高速用速度制御弁80がそれ
ぞれ介挿された第２の空気管路66及び第２の別の空気管
路68を通し、図６の（ｃ）に示す状態において第２のシ
リンダ60ｂの他端側の流出入口から第２のシリンダ60ｂ
内へ圧縮空気を供給するとともに第２のシリンダ60ｂの
一端側の流出入口から第２のシリンダ60ｂ外へ圧縮空気
を排出し、次いで、制御器84により第２のシリンダ動作
切換え弁72を図６の（ｄ）に示す状態に切り換えて、第
２のシリンダ60ｂの一端側の流出入口から第２のシリン
ダ60ｂ内へ圧縮空気を供給するとともに第２のシリンダ
60ｂの他端側の流出入口から第２のシリンダ60ｂ外へ圧
縮空気を排出し、これらの動作を交互に繰り返させる。
これにより、第２のシリンダ60ｂを高速で駆動させて、
べローズ18を高速で伸縮駆動させる。そして、ベローズ
18から吐出管路16内へ比較的大流量の処理液を送り出
し、その処理液を吐出管路16内に流して、フィルタ26に
付設された廃液ラインを通して排出し或いは吐出ノズル
24から排出する。これにより、吐出管路16内部からの気
泡抜きの作業が迅速に行なわれることとなる。On the other hand, when air bubbles are removed from the discharge pipe line 16, first, the controller 84 sets the first cylinder operation switching valve 70 to the state shown in FIGS. 6 (c) and 6 (d). By operating only the second cylinder operation switching valve 72 while keeping it held, the second air pipeline 66 and the second another air pipeline 68 in which the high speed speed control valve 80 is inserted respectively. Through the second cylinder 60b from the outlet on the other end side of the second cylinder 60b in the state shown in FIG. 6 (c).
The compressed air is supplied into the inside of the second cylinder 60b, and the compressed air is discharged from the second cylinder 60b to the outside of the second cylinder 60b through the outlet / inlet of the second cylinder 60b. (D), the compressed air is supplied into the second cylinder 60b from the outflow inlet on one end side of the second cylinder 60b and the second cylinder 60b is supplied.
Compressed air is discharged to the outside of the second cylinder 60b from the outflow inlet on the other end side of 60b, and these operations are alternately repeated.
This drives the second cylinder 60b at high speed,
The bellows 18 is driven to expand and contract at high speed. And bellows
A relatively large flow rate of the processing liquid is sent from 18 into the discharge pipe line 16, the processing liquid is caused to flow into the discharge pipe line 16, and is discharged through a waste liquid line attached to the filter 26 or a discharge nozzle.
Eject from 24. As a result, the work of removing bubbles from the inside of the discharge conduit 16 can be performed quickly.
【００３２】尚、気泡抜き時に、第１のシリンダ動作切
換え弁70と第２のシリンダ動作切換え弁72との作動タイ
ミングを一致させて双方のシリンダ動作切換え弁70、72
を同時に作動させ、第１のシリンダ60ａと第２のシリン
ダ60ｂとを同時に駆動させるようにしてもよい。When removing air bubbles, the operation timings of the first cylinder operation switching valve 70 and the second cylinder operation switching valve 72 are matched so that both cylinder operation switching valves 70, 72 are operated.
May be operated simultaneously, and the first cylinder 60a and the second cylinder 60b may be simultaneously driven.
【００３３】図７は、請求項５に記載の発明の１実施例
を示し、処理液供給装置の概略流路構成を示す模式図で
ある。FIG. 7 is a schematic view showing an embodiment of the invention described in claim 5 and showing a schematic flow path configuration of the processing liquid supply apparatus.
【００３４】この処理液供給装置は、処理液（フォトレ
ジスト液)10が収容され密閉された密閉容器100、この密
閉容器100内の処理液10中に一端が差し込まれ、電磁開
閉弁104が介挿された吐出管路102、この吐出管路102に
接続され供給口がウエハＷに対向するように配設された
吐出ノズル106、密閉容器100に連通された給気管路108
を通して密閉容器100の内部を比較的低い空気圧で加圧
する低圧加圧系統110、給気管路108を通して密閉容器10
0の内部を比較的高い空気圧で加圧する高圧加圧系統112
などを備えて構成されている。低圧加圧系統110は、圧
縮空気の供給管路114から分岐し給気管路108に流路接続
された分岐管路116に、調圧弁118、圧力計120及び加圧
時に分岐管路116を介して圧縮空気の供給管路114と給気
管路108とを連通させる三方弁122を介挿して構成されて
おり、比較的低い供給圧が得られるように調圧弁118が
調整設定されている。一方、高圧加圧系統112は、圧縮
空気の供給管路114から分岐し給気管路108に流路接続さ
れた分岐管路124に、調圧弁126、圧力計128及び加圧時
に分岐管路124を介して圧縮空気の供給管路114と給気管
路108とを連通させる三方弁130を介挿して構成されてお
り、比較的高い供給圧が得られるように調圧弁126が調
整設定されている。また、各分岐管路116、124には、電
磁開閉弁132、134がそれぞれ介挿されており、その各電
磁開閉弁132、134を択一的に開放・閉塞するように制御
する制御器136が設けられている。This processing liquid supply device has a hermetically sealed container 100 in which a processing liquid (photoresist liquid) 10 is housed and hermetically sealed, one end of which is inserted into the processing liquid 10 in the hermetically sealed container 100 and an electromagnetic opening / closing valve 104 is interposed. The inserted discharge conduit 102, the discharge nozzle 106 connected to the discharge conduit 102 so that the supply port faces the wafer W, and the air supply conduit 108 communicated with the closed container 100.
Through a low pressure system 110 for pressurizing the inside of the closed container 100 with a relatively low air pressure, and the air supply line 108.
High pressure pressurizing system 112 for pressurizing the inside of 0 with relatively high air pressure
And so on. The low-pressure pressurizing system 110 is provided with a pressure regulating valve 118, a pressure gauge 120, and a branch pipeline 116 at the time of pressurization to a branch pipeline 116 branched from a compressed air supply pipeline 114 and connected to the air supply pipeline 108. A three-way valve 122 that connects the compressed air supply pipe 114 and the air supply pipe 108 is inserted, and the pressure regulating valve 118 is adjusted and set so that a relatively low supply pressure can be obtained. On the other hand, the high-pressure pressurizing system 112 has a pressure regulating valve 126, a pressure gauge 128, and a branch pipe 124 at the time of pressurization in a branch pipe 124 branched from the compressed air supply pipe 114 and connected to the air supply pipe 108. It is configured by inserting a three-way valve 130 that connects the compressed air supply pipe 114 and the air supply pipe 108 with each other, and the pressure regulating valve 126 is adjusted and set so that a relatively high supply pressure can be obtained. . In addition, electromagnetic on-off valves 132 and 134 are inserted in the respective branch pipes 116 and 124, respectively, and a controller 136 for controlling the electromagnetic on-off valves 132 and 134 to selectively open and close. Is provided.
【００３５】図７に示した処理液供給装置を使用して基
板Ｗの表面へ処理液を供給するときは、制御器136によ
り各電磁開閉弁132、134を制御して、分岐管路116に介
挿された電磁開閉弁132を開き、分岐管路124に介挿され
た電磁開閉弁134を閉じる。そして、低圧加圧系統110に
より、密閉容器100に連通された給気管路108を通して密
閉容器100の内部を比較的低い空気圧で加圧する。これ
により、密閉容器100内から比較的小流量の処理液10が
吐出管路102内へ送り出され、吐出管路102の先端の吐出
ノズル106から基板Ｗの表面へ処理液が供給される。When the processing liquid is supplied to the surface of the substrate W using the processing liquid supply apparatus shown in FIG. 7, the controller 136 controls the electromagnetic on-off valves 132 and 134 so that the branch conduit 116 is opened. The electromagnetic opening / closing valve 132 inserted is opened, and the electromagnetic opening / closing valve 134 inserted in the branch conduit 124 is closed. Then, the low-pressure pressurization system 110 pressurizes the inside of the closed container 100 with a relatively low air pressure through the air supply line 108 communicated with the closed container 100. As a result, a relatively small flow rate of the processing liquid 10 is sent out from the closed container 100 into the discharge conduit 102, and the processing liquid is supplied to the surface of the substrate W from the discharge nozzle 106 at the tip of the discharge conduit 102.
【００３６】一方、吐出管路102内からの気泡抜きを行
なうときは、制御器136により各電磁開閉弁132、134を
制御して、分岐管路124に介挿された電磁開閉弁134を開
き、分岐管路116に介挿された電磁開閉弁132を閉じる。
そして、高加圧系統112により、密閉容器100に連通され
た給気管路108を通して密閉容器100の内部を比較的高い
空気圧で加圧する。これにより、密閉容器100内から比
較的大流量の処理液10が吐出管路102内へ送り出され、
比較的大流量の処理液が吐出管路102内を流れて吐出ノ
ズル106から排出される。このように、気泡抜き時に
は、比較的大流量の処理液が吐出管路102内に流され、
気泡抜きの作業が迅速に行なわれる。On the other hand, when air bubbles are removed from the discharge pipeline 102, the controller 136 controls each of the solenoid on-off valves 132 and 134 to open the solenoid on-off valve 134 inserted in the branch pipeline 124. The electromagnetic on-off valve 132 inserted in the branch pipeline 116 is closed.
Then, the high pressurization system 112 pressurizes the inside of the closed container 100 with a relatively high air pressure through the air supply line 108 communicated with the closed container 100. As a result, a relatively large flow rate of the processing liquid 10 is sent out from the closed container 100 into the discharge pipeline 102,
A relatively large flow rate of the processing liquid flows in the discharge conduit 102 and is discharged from the discharge nozzle 106. As described above, when the bubbles are removed, a relatively large flow rate of the processing liquid is caused to flow into the discharge pipeline 102,
The air bubble removal work is performed quickly.
【００３７】[0037]
【発明の効果】請求項１及び請求項５に記載の各発明に
係る処理液供給装置を使用したときは、基板の処理工程
において、日常的に行なう必要のある吐出管路からの気
泡抜きの作業が迅速に行なわれるため、作業性を向上さ
せ装置の稼働率の向上を図ることができる。When the processing liquid supply apparatus according to each of the first and fifth aspects of the present invention is used, it is necessary to remove air bubbles from the discharge pipe line that must be routinely performed in the substrate processing step. Since the work is performed quickly, the workability can be improved and the operating rate of the device can be improved.
【００３８】そして、請求項２ないし請求項４に記載の
各発明によれば、ベローズ型ポンプを使用してそのポン
プの駆動速度を高・低の２段に切り換えるといった構成
により、また、請求項５に記載の発明によれば、ポンプ
を使用しないで処理液の圧送圧力を高・低の２段に切り
換えるといった構成により、簡単な装置構成で、制御も
簡単でかつ条件通りに確実に行なうことができて、上記
効果を奏する処理液供給装置を提供することができる。According to each of the inventions described in claims 2 to 4, a bellows type pump is used and the driving speed of the pump is switched between two stages, high and low. According to the fifth aspect of the invention, the pumping pressure of the processing liquid is switched between two stages, high and low, without using a pump, so that the control can be performed easily and surely with a simple device configuration. As a result, it is possible to provide a processing liquid supply device that achieves the above effects.
【図１】請求項１に記載の発明の１実施例を示し、基板
処理装置用処理液供給装置の概略流路構成を示す模式図
である。FIG. 1 is a schematic view showing an embodiment of the invention described in claim 1 and showing a schematic flow path configuration of a processing liquid supply apparatus for a substrate processing apparatus.
【図２】図１に示した処理液供給装置における第１のシ
リンダ動作切換え弁の構成の１例及びその動作を示す図
である。FIG. 2 is a diagram showing an example of the configuration of a first cylinder operation switching valve and its operation in the treatment liquid supply apparatus shown in FIG.
【図３】請求項１に記載の発明の第２の実施例を示し、
処理液供給装置の概略流路構成を示す模式図である。FIG. 3 shows a second embodiment of the invention according to claim 1,
It is a schematic diagram which shows the schematic flow path structure of a processing liquid supply apparatus.
【図４】図３に示した処理液供給装置における第１のシ
リンダ動作切換え弁及び第２のシリンダ動作切換え弁の
構成の１例及びその動作を示す図である。FIG. 4 is a diagram showing an example of a configuration of a first cylinder operation switching valve and a second cylinder operation switching valve in the treatment liquid supply apparatus shown in FIG. 3 and an operation thereof.
【図５】請求項１に記載の発明の第３の実施例を示し、
処理液供給装置の概略流路構成を示す模式図である。FIG. 5 shows a third embodiment of the invention as set forth in claim 1,
It is a schematic diagram which shows the schematic flow path structure of a processing liquid supply apparatus.
【図６】図５に示した処理液供給装置における第１のシ
リンダ動作切換え弁及び第２のシリンダ動作切換え弁の
構成の１例及びその動作を示す図である。6 is a diagram showing an example of a configuration of a first cylinder operation switching valve and a second cylinder operation switching valve in the treatment liquid supply apparatus shown in FIG. 5 and an operation thereof.
【図７】請求項５に記載の発明の１実施例を示し、処理
液供給装置の概略流路構成を示す模式図である。FIG. 7 is a schematic view showing an embodiment of the invention according to claim 5 and showing a schematic flow path configuration of a treatment liquid supply apparatus.
【図８】従来の処理液供給装置の概略流路構成の１例を
示す模式図である。FIG. 8 is a schematic diagram showing an example of a schematic flow path configuration of a conventional processing liquid supply apparatus.
10 処理液 12 容器 14 吸入管路 16、102 吐出管路 18 べローズ 24、106 吐出ノズル 28、114 圧縮空気の供給管路 30 シリンダ 32、62 第１の空気管路 34、64 第１の別の空気管路 36、66 第２の空気管路 38、68 第２の別の空気管路 40、70、400 第１のシリンダ動作切換え弁 42、72、420 第２のシリンダ動作切換え弁 44、46、74、76 排気管路 48、78 低速用速度制御弁 50、80 高速用速度制御弁 52、132、134 電磁開閉弁 54、84、136 制御器 60ａ 第１のシリンダ 60ｂ 第２のシリンダ 100 密閉容器 108 給気管路 110 低圧加圧系統 112 高圧加圧系統 118、126 調圧弁 10 Treatment liquid 12 Container 14 Suction line 16, 102 Discharge line 18 Bellows 24, 106 Discharge nozzle 28, 114 Compressed air supply line 30 Cylinder 32, 62 First air line 34, 64 First distinction Air line 36, 66 second air line 38, 68 second air line 40, 70, 400 first cylinder operation switching valve 42, 72, 420 second cylinder operation switching valve 44, 46, 74, 76 Exhaust line 48, 78 Low speed speed control valve 50, 80 High speed speed control valve 52, 132, 134 Electromagnetic on-off valve 54, 84, 136 Controller 60a First cylinder 60b Second cylinder 100 Airtight container 108 Air supply line 110 Low pressure pressurization system 112 High pressure pressurization system 118, 126 Regulator
Claims (5)
る処理液供給手段と、 この処理液供給手段から比較的小流量の処理液を送り出
すように処理液供給手段を低速で駆動させる低速駆動手
段とを備えた基板処理装置用処理液供給装置において、 前記処理液供給手段から比較的大流量の処理液を送り出
すように処理液供給手段を高速で駆動させる高速駆動手
段を併設し、 前記低速駆動手段のみを作動させる状態と前記高速駆動
手段を作動させる状態とを切り換える速度切換え手段、
及び、基板への処理液供給時には前記低速駆動手段のみ
を作動させ気泡抜き時には前記高速駆動手段を作動させ
るように前記速度切換手段を制御する切換え制御手段を
設けたことを特徴とする基板処理装置用処理液供給装
置。1. A processing liquid supply means for supplying a processing liquid to a substrate through a discharge pipe, and a low speed drive for driving the processing liquid supply means at a low speed so as to send out a relatively small flow rate of the processing liquid from the processing liquid supply means. And a high-speed drive means for driving the processing liquid supply means at a high speed so as to send out a relatively large flow rate of the processing liquid from the processing liquid supply means. Speed switching means for switching between a state in which only the driving means is activated and a state in which the high-speed driving means is activated,
Further, the substrate processing apparatus is provided with a switching control means for controlling the speed switching means so that only the low speed driving means is operated when the processing liquid is supplied to the substrate and the high speed driving means is operated when the air bubbles are removed. Treatment liquid supply device.
口が吐出管路に連通接続されたベローズと、 このベローズを伸縮駆動させるシリンダとから構成さ
れ、 低速駆動手段が、 圧縮空気源、排気管路並びに前記シリンダの一端側の流
出入口との第１の空気管路及び他端側の流出入口との第
１の別の空気管路に各別に流路接続された４つのポート
を持つ第１のシリンダ動作切換え弁と、 前記各空気管路にそれぞれ介挿された低速用速度制御弁
とから構成され、 高速駆動手段が、 前記圧縮空気源、排気管路並びに前記シリンダの一端側
の流出入口との第２の空気管路及び他端側の流出入口と
の第２の別の空気管路に各別に流路接続された４つのポ
ートを持つ第２のシリンダ動作切換え弁と、 前記各空気管路にそれぞれ介挿された高速用速度制御弁
とから構成され、 速度切換え手段が、 前記圧縮空気源と前記第１のシリンダ動作切換え弁又は
前記第２のシリンダ動作切換え弁とを択一的に連通させ
る弁機構からなる請求項１記載の基板処理装置用処理液
供給装置。2. The treatment liquid supply means comprises a container containing the treatment liquid, a bellows having a suction port communicating with the container via a suction pipeline, and a discharge port communicating with a discharge pipeline. A low speed drive means for compressing and expanding the bellows, and the low speed drive means includes a compressed air source, an exhaust pipe line, a first air pipe line at one end side of the cylinder, and a first air pipe line at the other end side. A first cylinder operation switching valve having four ports each of which is connected to a separate air pipe line, and a low speed speed control valve inserted in each of the air pipe lines; A high-speed drive means is provided for the compressed air source, the exhaust pipe line, and a second air pipe line with the inflow / outflow port on one end side of the cylinder and a second separate air pipe line with the outflow / inflow port on the other end side, respectively. Second cylinder operation with 4 ports connected in flow path A change valve and a speed control valve for high speed inserted in each of the air ducts, wherein the speed switching means includes the compressed air source and the first cylinder operation switching valve or the second cylinder operation. The processing liquid supply apparatus for a substrate processing apparatus according to claim 1, comprising a valve mechanism that selectively communicates with the switching valve.
口が吐出管路に連通接続されたベローズと、 このベローズを伸縮駆動させるシリンダとから構成さ
れ、 低速駆動手段が、 圧縮空気源、排気管路並びに前記シリンダの一端側の流
出入口との第１の空気管路及び他端側の流出入口との第
１の別の空気管路に各別に流路接続された４つのポート
を持つ第１のシリンダ動作切換え弁と、 前記各空気管路にそれぞれ介挿された低速用速度制御弁
とから構成され、 高速駆動手段が、 前記圧縮空気源、排気管路並びに前記シリンダの一端側
の流出入口との第２の空気管路及び他端側の流出入口と
の第２の別の空気管路に各別に流路接続された４つのポ
ートを持つ第２のシリンダ動作切換え弁と、 前記各空気管路にそれぞれ介挿された高速用速度制御弁
とから構成され、 前記第１のシリンダ動作切換え弁及び前記第２のシリン
ダ動作切換え弁をそれぞれクローズドセンタ弁とし、切
換え制御手段によって制御されることにより第１のシリ
ンダ動作切換え弁又は第２のシリンダ動作切換え弁が択
一的に中立位置となるようにして、速度切換え手段が構
成された請求項１記載の基板処理装置用処理液供給装
置。3. A processing liquid supply means, a container containing the processing liquid, a bellows having a suction port communicating with the container via a suction pipeline, and a discharge port communicating with a discharge pipeline. A low speed drive means for compressing and expanding the bellows, and the low speed drive means includes a compressed air source, an exhaust pipe line, a first air pipe line at one end side of the cylinder, and a first air pipe line at the other end side. A first cylinder operation switching valve having four ports each of which is connected to a separate air pipe line, and a low speed speed control valve inserted in each of the air pipe lines; A high-speed drive means is provided for the compressed air source, the exhaust pipe line, and a second air pipe line with the inflow / outflow port on one end side of the cylinder and a second separate air pipe line with the outflow / inflow port on the other end side, respectively. Second cylinder operation with 4 ports connected in flow path And a speed control valve for high speed inserted in each of the air pipes. The first cylinder operation switching valve and the second cylinder operation switching valve are closed center valves, and switching is performed. 2. The substrate processing according to claim 1, wherein the speed switching means is configured such that the first cylinder operation switching valve or the second cylinder operation switching valve is selectively brought to a neutral position by being controlled by the control means. Equipment for processing liquid supply.
口が吐出管路に連通接続されたベローズと、 このベローズを伸縮駆動させる第１のシリンダと、 この第１のシリンダにタンデム状に連接され、前記ベロ
ーズを伸縮駆動させる第２のシリンダとから構成され、 低速駆動手段が、 圧縮空気源、排気管路並びに前記第１のシリンダの一端
側の流出入口との第１の空気管路及び他端側の流出入口
との第１の別の空気管路に各別に流路接続された４つの
ポートを持つ第１のシリンダ動作切換え弁と、 前記各空気管路にそれぞれ介挿された低速用速度制御弁
とから構成され、 高速駆動手段が、 前記圧縮空気源、排気管路並びに前記第２のシリンダの
一端側の流出入口との第２の空気管路及び他端側の流出
入口との第２の別の空気管路に各別に流路接続された４
つのポートを持つ第２のシリンダ動作切換え弁と、 前記各空気管路にそれぞれ介挿された高速用速度制御弁
とから構成され、 前記第１のシリンダ動作切換え弁及び前記第２のシリン
ダ動作切換え弁をそれぞれ２位置弁とし、切換え制御手
段によって制御されることにより基板への処理液供給時
には第１のシリンダ動作切換え弁のみが作動し気泡抜き
時には第２のシリンダ動作切換え弁が作動するようにし
て、速度切換え手段が構成された請求項１記載の基板処
理装置用処理液供給装置。4. The treatment liquid supply means includes a container containing the treatment liquid, a bellows having a suction port communicating with the container via a suction conduit, and a discharge port communicating with the discharge conduit. It comprises a first cylinder for expanding and contracting driving the bellows, and a second cylinder connected in tandem to the first cylinder for expanding and contracting driving the bellows, and the low speed driving means includes a compressed air source and an exhaust pipe line. And four ports respectively connected to the first air pipe line with the outlet and inlet port on the one end side of the first cylinder and the first another air pipe line with the outlet and inlet port on the other end side, respectively. A first cylinder operation switching valve and a low speed speed control valve inserted in each of the air pipes, and a high speed drive means is provided for the compressed air source, the exhaust pipe, and the second cylinder. Second empty space with one end 4 which are separately connected to the tracheal line and the second separate air duct with the outflow port on the other end side
A second cylinder operation switching valve having two ports, and a high speed speed control valve inserted in each of the air ducts, wherein the first cylinder operation switching valve and the second cylinder operation switching The valves are two-position valves, respectively, and are controlled by the switching control means so that only the first cylinder operation switching valve operates when the processing liquid is supplied to the substrate and the second cylinder operation switching valve operates when the bubbles are removed. The processing liquid supply apparatus for a substrate processing apparatus according to claim 1, further comprising a speed switching means.
管路の一端が差し込まれた密閉容器と、 この密閉容器の内部を比較的低い空気圧で加圧して密閉
容器内から比較的小流量の処理液を前記吐出管路内へ送
り出す低加圧系統とを備え、 前記吐出管路を通して基板へ処理液を供給するようにし
た基板処理装置用処理液供給装置において、 前記密閉容器の内部を比較的高い空気圧で加圧して密閉
容器内から比較的大流量の処理液を前記吐出管路内へ送
り出す高加圧系統を併設し、 前記低加圧系統又は前記高加圧系統の何れか一方により
前記密閉容器の内部を加圧するように切り換える圧力切
換え手段、及び、基板への処理液供給時には前記低加圧
系統により密閉容器内部を加圧し気泡抜き時には前記高
加圧系統により密閉容器内部を加圧するよう前記圧力切
換え手段を制御する切換え制御手段を設けたことを特徴
とする基板処理装置用処理液供給装置。5. A hermetically-sealed container containing a processing liquid, wherein one end of a discharge pipe is inserted into the processing liquid, and the inside of the hermetically-sealed container is pressurized with a relatively low air pressure to obtain a relatively small amount from the inside of the hermetically-sealed container. A processing liquid supply apparatus for a substrate processing apparatus, comprising: a low-pressure system for sending a flow rate of processing liquid into the discharge conduit, and supplying the processing liquid to the substrate through the discharge conduit, wherein the inside of the closed container Is installed with a high-pressurization system that pressurizes with a relatively high air pressure to send a relatively large flow rate of the processing liquid from the inside of the closed container into the discharge pipeline, and either the low-pressurization system or the high-pressurization system Pressure switching means for switching to pressurize the inside of the closed container by one, and pressure inside the closed container by the low pressure system when supplying the processing liquid to the substrate, and inside the closed container by the high pressure system when removing bubbles. Pressurize Cormorant the substrate processing apparatus for processing liquid supply apparatus characterized in that a switching control means for controlling the pressure switching means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29567194A JP3443192B2 (en) | 1994-11-04 | 1994-11-04 | Processing liquid supply device for substrate processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29567194A JP3443192B2 (en) | 1994-11-04 | 1994-11-04 | Processing liquid supply device for substrate processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08131909A true JPH08131909A (en) | 1996-05-28 |
| JP3443192B2 JP3443192B2 (en) | 2003-09-02 |
Family
ID=17823686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29567194A Expired - Fee Related JP3443192B2 (en) | 1994-11-04 | 1994-11-04 | Processing liquid supply device for substrate processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3443192B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150040220A (en) * | 2013-10-04 | 2015-04-14 | 도쿄엘렉트론가부시키가이샤 | Bubble removal method, bubble removal apparatus, deaeration apparatus and computer-readable recording medium |
| CN113534610A (en) * | 2021-08-05 | 2021-10-22 | 宁波润华全芯微电子设备有限公司 | Photoresist air isolation system |
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| JPH03114565A (en) * | 1989-09-29 | 1991-05-15 | Hitachi Ltd | Rotary coating applicator and fluid feeder |
| JPH04110656A (en) * | 1990-08-30 | 1992-04-13 | Shimadzu Corp | Liquid feeding apparatus for liquid chromatograph |
| JPH0577932U (en) * | 1992-03-30 | 1993-10-22 | 沖電気工業株式会社 | Resist liquid supply device |
-
1994
- 1994-11-04 JP JP29567194A patent/JP3443192B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62211920A (en) * | 1986-03-12 | 1987-09-17 | Toshiba Corp | Apparatus for supplying resist liquid |
| JPS63121435U (en) * | 1987-01-30 | 1988-08-05 | ||
| JPH03114565A (en) * | 1989-09-29 | 1991-05-15 | Hitachi Ltd | Rotary coating applicator and fluid feeder |
| JPH04110656A (en) * | 1990-08-30 | 1992-04-13 | Shimadzu Corp | Liquid feeding apparatus for liquid chromatograph |
| JPH0577932U (en) * | 1992-03-30 | 1993-10-22 | 沖電気工業株式会社 | Resist liquid supply device |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150040220A (en) * | 2013-10-04 | 2015-04-14 | 도쿄엘렉트론가부시키가이샤 | Bubble removal method, bubble removal apparatus, deaeration apparatus and computer-readable recording medium |
| CN104517874A (en) * | 2013-10-04 | 2015-04-15 | 东京毅力科创株式会社 | Bubble removing method, bubble removing apparatus, degassing apparatus |
| JP2015073915A (en) * | 2013-10-04 | 2015-04-20 | 東京エレクトロン株式会社 | Bubble removal method, bubble removal device, deaeration device, and computer-readable recording medium |
| TWI579945B (en) * | 2013-10-04 | 2017-04-21 | 東京威力科創股份有限公司 | Bubble removing method, bubble removing apparatus, degassing apparatus, and computer-readable recording medium |
| US9649577B2 (en) | 2013-10-04 | 2017-05-16 | Tokyo Electron Limited | Bubble removing method, bubble removing apparatus, degassing apparatus, and computer-readable recording medium |
| CN113534610A (en) * | 2021-08-05 | 2021-10-22 | 宁波润华全芯微电子设备有限公司 | Photoresist air isolation system |
| CN113534610B (en) * | 2021-08-05 | 2023-10-27 | 宁波润华全芯微电子设备有限公司 | Photoresist air isolation system |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3443192B2 (en) | 2003-09-02 |
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