JPH0771759B2 - X-ray target brazing material and X-ray tube rotating anode composite target - Google Patents
X-ray target brazing material and X-ray tube rotating anode composite targetInfo
- Publication number
- JPH0771759B2 JPH0771759B2 JP58085912A JP8591283A JPH0771759B2 JP H0771759 B2 JPH0771759 B2 JP H0771759B2 JP 58085912 A JP58085912 A JP 58085912A JP 8591283 A JP8591283 A JP 8591283A JP H0771759 B2 JPH0771759 B2 JP H0771759B2
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- Prior art keywords
- alloy
- tungsten
- weight
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- molybdenum
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/32—Selection of soldering or welding materials proper with the principal constituent melting at more than 1550 degrees C
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- Mechanical Engineering (AREA)
- Ceramic Products (AREA)
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は、高融点金属材料とグラフアイトとの接合用ろ
う材、及びタングステン若しくはその合金／グラフアイ
ト又はタングステン若しくはその合金／モリブデン／グ
ラフアイトなるＸ線管回転陽極用複合ターゲツトにおけ
る該ろう材の利用に関する。The present invention relates to a brazing filler metal for joining a refractory metal material and graphite, and tungsten or its alloy / graphite or tungsten or its alloy / molybdenum / graphite. The present invention relates to the use of the brazing material in a composite target for an X-ray tube rotating anode.
近年、高融点金属材料とグラフアイトとを接合した部材
を使用した機器が各種の用途に利用されてきている。そ
の例には、耐熱容器、耐火材及びＸ線管用複合ターゲツ
ト等がある。In recent years, a device using a member obtained by joining a high melting point metal material and a graphite has been used for various purposes. Examples include heat resistant containers, refractory materials, and composite targets for X-ray tubes.
しかしながら、従来の接合用ろう材及び接合方法では、
ろう材のぬれ性が阻害され、また接合層に空洞を生じた
り、その厚さが厚い上にバラツキがあるために、その接
合強度に難点があつた。However, in the conventional brazing filler metal and joining method,
Since the wettability of the brazing material is impaired, the bonding layer has voids, and the thickness of the brazing material is large and uneven, the bonding strength is difficult.
以下、従来技術及び本発明について、Ｘ線管回転陽極用
複合ターゲツトを例にとり詳細に説明するが、本発明は
それに限定されるものではない。Hereinafter, the prior art and the present invention will be described in detail by taking a composite target for an X-ray tube rotating anode as an example, but the present invention is not limited thereto.
従来からＸ線管回転陽極用ターゲツトとしてはタングス
テン（以下、Ｗと略記する）の単板が使用されてきた。
その性能改善のため、Ｗに少量のレニウム（以下、Reと
略記する）又はオスミウムなどを添加したＷ合金が用い
られている。最近医療機器用のＸ線CT（Computed tomog
raphy）用のＸ線管の需要が多く、また画像の鮮明化と
撮影時間の短縮のため大容量のものが要求されてきてい
る。このためターゲツトの構成としては、直径を大きく
すると共に軽量化する必要がある。このために、ターゲ
ツトの電子衝撃面のみにＷ合金を用い、その裏面の部分
に、比重が小さく、しかも比熱の大きなモリブデン（以
下、Moと略記する）やグラフアイト（以下、Gtと略記す
る）を合体させた、Ｗ若しくはその合金/Mo/Gt又は若し
くはその合金/Gtのような複合ターゲツトが開発されて
きた。Conventionally, a single plate of tungsten (hereinafter abbreviated as W) has been used as a target for an X-ray tube rotating anode.
In order to improve its performance, a W alloy in which a small amount of rhenium (hereinafter abbreviated as Re) or osmium is added to W is used. Recently, X-ray CT (Computed tomog) for medical equipment
There is a great demand for an X-ray tube for a raphy), and a large-capacity one is required for sharpening an image and shortening a photographing time. Therefore, it is necessary to increase the diameter and reduce the weight of the target. For this reason, W alloy is used only for the electron impact surface of the target, and molybdenum (hereinafter, abbreviated as Mo) and graphite (hereinafter, abbreviated as Gt) having a small specific gravity and a large specific heat are provided on the back surface of the W alloy. Composite targets such as W or its alloy / Mo / Gt or its alloy / Gt have been developed.
そのような複合ターゲツトを、添付図面の第１図に示
す。すなわち第１図は、従来のＸ線管回転陽極用複合タ
ーゲツトの縦断面概略図である。第１図において、符号
１は電子衝撃部（Ｗ又はＷ合金）、２はMo、３はGt、４
は中間層、５は回転軸を意味する。これら複合ターゲツ
トの製造方法としては、CVD、溶射及び接合法等がある
が、特に価格の点で接合法が有利である。接合法による
場合、上記４は接合用ろう材からなる接合層である。Such a composite target is shown in Figure 1 of the accompanying drawings. That is, FIG. 1 is a schematic longitudinal sectional view of a conventional composite target for an X-ray tube rotating anode. In FIG. 1, reference numeral 1 is an electron impact part (W or W alloy), 2 is Mo, 3 is Gt, 4
Represents an intermediate layer and 5 represents a rotation axis. As a manufacturing method of these composite targets, there are a CVD method, a thermal spraying method, a joining method and the like, and the joining method is particularly advantageous in terms of cost. In the case of the joining method, the above 4 is a joining layer made of a brazing material for joining.
しかして、従来行われている接合法には問題点がある。
すなわち、Ｗ若しくはその合金又はMoとGtとの接合は、
金属とセラミツクとの接合であるので、その接合法には
種種の問題点がある。However, the conventional joining method has a problem.
That is, the joining of W or its alloy or Mo and Gt is
Since it is the joining of metal and ceramic, there are various problems in the joining method.
まず、従来上記のような接合には、ろう材として、ジル
コニウム（以下、Zrと略記する）、チタン（以下、Tiと
略記する）、Mo、Ｗ及びReなどの金属粉にエチルセルロ
ース等の有機溶剤を加えてペースト状にしたものをGt基
板に塗布し、次いでＷ合金板等を重ね合せ、真空中で高
温に加熱加圧して接合を行う。この従来法では、製造中
に溶剤から排出される水分、不純物及び解離した酸化物
によつてろう材の酸化が促進され、融体が酸化物層で包
囲された形となつて、ぬれ性が著しく阻害される結果、
健全な接合層を形成できない欠点がある。また、従来法
では、接合層の組成及び厚さを一定にすることが困難で
あるので、接合層に大きな空洞及び酸化物の巻込みが生
じたり、厚さにバラツキが生じたりした。その結果、接
合強度の面においても難点があつた。First, conventionally, for joining as described above, as a brazing filler metal, zirconium (hereinafter abbreviated as Zr), titanium (hereinafter abbreviated as Ti), metal powder such as Mo, W, and Re, and an organic solvent such as ethyl cellulose are used. Is added to apply a paste to a Gt substrate, and then W alloy plates and the like are superposed, and heated and pressurized at a high temperature in vacuum to perform bonding. In this conventional method, the oxidation of the brazing filler metal is promoted by the water, impurities and dissociated oxides discharged from the solvent during the production, and the melt is surrounded by the oxide layer, so that the wettability is improved. As a result of significant inhibition,
There is a drawback that a sound bonding layer cannot be formed. Further, in the conventional method, it is difficult to make the composition and thickness of the bonding layer constant, so that large voids and oxides are entrained in the bonding layer, and the thickness varies. As a result, there were problems in terms of bonding strength.
本発明は、従来技術の問題点を解決するためになされた
ものであり、その目的は、高融点金属材料とGtとの新た
な接合用ろう材、それを使用した接合強度の改良された
Ｘ線管回転陽極用複合ターゲツトを提供することにあ
る。The present invention has been made to solve the problems of the prior art, and its purpose is to provide a new brazing filler metal for joining a refractory metal material and Gt, and an X joint having improved joint strength. An object is to provide a composite target for a rotating tube anode.
本発明を概説すれば、本発明の第１の発明は、高融点金
属材料とGtとを接合するＸ線ターゲツト用ろう材に関す
る発明であつて、それが、Zr単体、Ｗ分が30重量％以下
のZr−Ｗ合金、Mo分が30重量％以下のZr−Mo合金、Ｗ分
が30重量％以下でニツケル（以下、Niと略記する）分が
20重量％以下のZr−Ｗ−Ni合金、Mo分が30重量％以下で
Ni分が20重量％以下のZr−Mo−Ni合金、Ti、ニオブ（以
下、Nbと略記する）及びタンタル（以下、Taと略記す
る）よりなる群から選択した金属材料の１種の表面に、
厚さ0.01〜20μｍのNi又はコバルト（以下、Coと略記す
る）層を設けたクラツド箔であることを特徴とする。Briefly describing the present invention, the first invention of the present invention is an invention relating to a brazing material for an X-ray target for joining a refractory metal material and Gt, which is Zr simple substance and W content is 30% by weight. The following Zr-W alloy, Zr-Mo alloy with a Mo content of 30% by weight or less, and nickel (hereinafter abbreviated as Ni) content with a W content of 30% by weight or less.
20 wt% or less Zr-W-Ni alloy, Mo content is 30 wt% or less
On one surface of a metal material selected from the group consisting of a Zr-Mo-Ni alloy having a Ni content of 20% by weight or less, Ti, niobium (hereinafter abbreviated as Nb) and tantalum (hereinafter abbreviated as Ta). ,
It is a cladding foil provided with a Ni or cobalt (hereinafter abbreviated as Co) layer having a thickness of 0.01 to 20 μm.
また本発明の第２の発明は、Ｗ若しくはその合金/Gt又
はＷ若しくはその合金/Mo/GtなるＸ線管回転陽極用複合
ターゲツトに関する発明であつて、そのＷ若しくはその
合金又はMoとGtとの接合用ろう材が、本発明の第１の発
明のろう材であることを特徴とする。A second invention of the present invention relates to a composite target for an X-ray tube rotary anode comprising W or its alloy / Gt or W or its alloy / Mo / Gt, which is W or its alloy or Mo and Gt. The joining brazing filler metal is the brazing filler metal of the first invention of the present invention.
更に本発明の第３の発明は、前記第２の発明のＸ線管回
転陽極用複合ターゲツトに関する発明であつて、そのＷ
若しくはその合金又はMoとGtとの接合用ろう材が、Zr単
体、Ｗ分が30重量％以下のZr−Ｗ合金、Ｗ分が30重量％
以下でNi分が20重量％以下のZr−Ｗ−Ni合金、Mo分が30
重量％以下のZr−Mo合金及びMo分が30重量％以下でNi分
が20重量％以下のZr−Mo−Ni合金よりなる群から選択し
た金属材料の１種の表面に、厚さ0.01〜20μｍのNi層を
設けたクラツド箔であり、更に該Ｗ若しくはその合金又
はMoと該ろう材との間にMo又はＷ粉末を、該ろう材とGt
との間にZr粉末を設けて接合を行つて製造したものであ
ることを特徴とする。Furthermore, a third invention of the present invention is an invention relating to the composite target for an X-ray tube rotary anode of the second invention, wherein W
Alternatively, an alloy thereof or a brazing filler metal for joining Mo and Gt is a Zr simple substance, a Zr-W alloy having a W content of 30% by weight or less, a W content of 30% by weight.
Zr-W-Ni alloy with Ni content of 20% by weight or less and Mo content of 30% or less
A Zr-Mo alloy having a weight percentage of 0.01% or less and a Mo content of 30 wt% or less and a Ni component of a Zr-Mo-Ni alloy having a Ni content of 20 wt% or less are formed on one surface of a metal material having a thickness of 0.01- A cladding foil provided with a Ni layer of 20 μm, further containing Mo or W powder between the W or its alloy or Mo and the brazing material, and the brazing material and Gt.
It is characterized in that it is manufactured by providing Zr powder between and and joining.
本発明において、ろう材のうちＷ又はMo含有合金におけ
るＷ又はMo含有率は30重量％以下が必須である。それ
は、30重量％超では、Zr−Ｗ又はZr−Moの化合物が析出
し、延性を阻害するので箔を得ることが不可能であるか
らである。他方、Ni含有合金においては、Ｗ又はMoが共
存しないとNi分が多過ぎてGtが浸食されるので、Ｗ又は
Moの共存が必須要件である。In the present invention, the W or Mo content in the W or Mo-containing alloy of the brazing filler metal is essential to be 30% by weight or less. This is because, if it exceeds 30% by weight, a Zr-W or Zr-Mo compound is precipitated and the ductility is impaired, so that it is impossible to obtain a foil. On the other hand, in the Ni-containing alloy, if W or Mo does not coexist, the Ni content will be too large and Gt will be eroded.
Coexistence of Mo is an essential requirement.
また、Ni含有合金において、Niの含有率が20重量％超で
は、Zr−Niの化合物が生成し、延性を著しく阻害するの
で不適当である。Further, in the Ni-containing alloy, if the Ni content exceeds 20% by weight, a Zr-Ni compound is generated and ductility is significantly impaired, which is not suitable.
更に、ろう材表面に設けるNi又はCo層の厚さは0.01〜20
μｍが適当である。それは、0.01μｍ未満では、Ni又は
Co層とGt基板とのぬれ性が十分でないため、接合を行う
ことができず、他方20μｍ超では、Ni又はCoとGtとが反
応してGtが浸食され、接合層の剥離を生じやすいからで
ある。Furthermore, the thickness of the Ni or Co layer provided on the brazing material surface is 0.01 to 20.
μm is suitable. If it is less than 0.01 μm, Ni or
Since the wettability between the Co layer and the Gt substrate is not sufficient, bonding cannot be performed. On the other hand, when the thickness exceeds 20 μm, Ni or Co and Gt react with each other and Gt is eroded, so that the bonding layer is easily peeled off. Is.
次に、本発明のろう材を用いて、Ｘ線管回転陽極用複合
ターゲツトを製造するには、接合部に本発明のろう材で
あるクラツド箔を配置し、次いで真空中又は不活性ガス
中で、静圧又は加圧して加熱接合を行えばよい。Next, in order to manufacture a composite target for an X-ray tube rotating anode using the brazing filler metal of the present invention, a cladding foil, which is the brazing filler metal of the present invention, is placed at the joint and then in a vacuum or in an inert gas. Then, the heating and joining may be performed by applying static pressure or pressurization.
以下、本発明を実施例により具体的に説明するが、本発
明はこれらにより限定されるものでない。Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto.
なお、第２図〜第６図は、本発明の複合ターゲツトの接
合層付近の断面組織の顕微鏡写真である。2 to 6 are micrographs of the cross-sectional structure near the bonding layer of the composite target of the present invention.
各図において、符号21はＸ線管用Ｗ−Re合金、41は接合
層、３はGtを意味する。In each drawing, reference numeral 21 means W-Re alloy for X-ray tube, 41 means bonding layer, and 3 means Gt.
実施例１ Ｗが28重量％、Niが0.5重量％、Zrが残部なるZr−Ｗ−N
i合金に、厚さ0.08μｍのNi層を設けて、厚さ40μｍの
クラツド箔なる本発明のろう材を製造した。Example 1 Zr-W-N in which W is 28% by weight, Ni is 0.5% by weight, and Zr is the balance
An i alloy was provided with a Ni layer having a thickness of 0.08 μm to manufacture a brazing material of the present invention, which was a cladding foil having a thickness of 40 μm.
実施例２ 第１図に示したような、Ｘ線管用Ｗ−Re合金/Gt複合タ
ーゲツトを製造するため、接合用ろう材として実施例１
に記載のろう材を使用し、真空中、1550℃で静圧又は加
圧下に0.5時間加熱接合を行つた。得られた接合層付近
の顕微鏡写真を第２図に示す。第２図から明らかなよう
に、空洞がなく、非常に健全で、40μｍ程度の薄い接合
層が観察され、接合強度の優れた複合ターゲツトを得る
ことができた。Example 2 In order to manufacture a W-Re alloy / Gt composite target for an X-ray tube as shown in FIG.
Using the brazing material described in 1., heating and joining were performed at 1550 ° C. in vacuum for 0.5 hour under static pressure or pressure. A micrograph of the vicinity of the obtained bonding layer is shown in FIG. As is clear from FIG. 2, there was no void, and a very healthy bonding layer with a thickness of about 40 μm was observed, and a composite target having excellent bonding strength could be obtained.
上例において、Ｗの代りにMoを含有する合金を使用して
同様な結果を得た。Similar results were obtained in the above example using an alloy containing Mo instead of W.
実施例３ Zr金属の表面に、厚さ0.05μｍのCo層を設けて、厚さ40
μｍのクラツド箔なる本発明のろう材を製造した。Example 3 A Co layer having a thickness of 0.05 μm was provided on the surface of Zr metal to give a thickness of 40 μm.
A brazing material of the present invention, which is a μm cladding foil, was produced.
実施例４ 実施例３において、Zr金属の代りにTi金属を使用して、
ろう材を製造した。Example 4 In Example 3, substituting Ti metal for Zr metal,
A brazing material was manufactured.
実施例５ 実施例２に記載の方法と同様にして、ろう材として実施
例３に記載のろう材を使用し、真空中、1600℃で20分間
加圧して加熱接合を行つた。得られた接合層付近の顕微
鏡写真を第３図に示す。第３図から明らかなように、空
洞のない健全な接合層が形成されている。Example 5 In the same manner as in the method described in Example 2, the brazing material described in Example 3 was used as a brazing material, and heating and bonding were performed by applying pressure at 1600 ° C. for 20 minutes in vacuum. A micrograph of the vicinity of the obtained bonding layer is shown in FIG. As is clear from FIG. 3, a sound bonding layer without voids is formed.
実施例６ 実施例５において、ろう材として実施例４に記載のろう
材を使用した以外は同条件で接合を行つた。得られた接
合層付近の顕微鏡写真を第４図に示す。第４図から明ら
かなように、実施例５と同様の結果を得た。Example 6 Joining was performed under the same conditions as in Example 5, except that the brazing material described in Example 4 was used as the brazing material. A micrograph of the vicinity of the obtained bonding layer is shown in FIG. As is clear from FIG. 4, the same results as in Example 5 were obtained.
この例において、Ti金属の代りにNb又はTa金属を用いた
ろう材を使用して同様な結果を得た。In this example, similar results were obtained using a braze material with Nb or Ta metal instead of Ti metal.
実施例７ Ti金属の表面にNiめつきを施し、次いで真空中、800℃
で焼鈍して冷圧により表面層のNiの厚さが0.08μｍのTi
−Niクラツド箔（40μｍ）なる本発明のろう材を製造し
た。Example 7 Ni plating is applied to the surface of Ti metal, and then 800 ° C. in vacuum.
Annealed and cold-pressed to a surface layer of Ni with a thickness of 0.08 μm
A brazing material of the invention consisting of a Ni-clad foil (40 μm) was produced.
実施例８ 実施例２に記載の方法と同様にして、ろう材として実施
例７に記載のろう材を使用し、真空中、1600℃で10分間
静圧して加熱接合を行つた。得られた接合層付近の顕微
鏡写真を第５図に示す。第５図から明らかなように、空
洞のない強固接合層が形成されている。Example 8 In the same manner as in the method described in Example 2, the brazing material described in Example 7 was used as the brazing material, and heating and bonding were performed in vacuum at 1600 ° C. for 10 minutes under static pressure. A micrograph of the obtained bonding layer and its vicinity is shown in FIG. As is clear from FIG. 5, a strong bonding layer without voids is formed.
この例において、Ti金属の代りにNb又はTa金属を用いた
ろう材を使用して同様な結果を得た。In this example, similar results were obtained using a braze material with Nb or Ta metal instead of Ti metal.
実施例９ 実施例２に記載の方法と同様にして、ろう材として同じ
く実施例１に記載のろう材を使用し、更に、ろう材とＷ
合金基体との間にMo粉末を、またろう材とGt基板との間
にZr粉末を設けて接合を行つた。得られた接合層付近の
顕微鏡写真を第６図に示す。第６図から明らかなよう
に、空洞がなく、100μｍ厚程度の健全な接合層が観察
され、接合強度の優れた複合ターゲツトを得ることがで
きた。Example 9 In the same manner as in the method described in Example 2, the brazing material described in Example 1 was used as the brazing material, and the brazing material and W
Bonding was performed by providing Mo powder between the alloy base and Zr powder between the brazing material and the Gt substrate. A micrograph of the obtained bonding layer and its vicinity is shown in FIG. As is clear from FIG. 6, a sound bonding layer having a thickness of about 100 μm was observed without cavities, and a composite target having excellent bonding strength could be obtained.
以上の各実施例は、Ｗ合金/Gt複合ターゲツトについて
例示したが、Ｗ若しくはその合金/Mo/Gt複合ターゲツト
についても、前記各実施例と同様にして、同様な結果を
得た。Although each of the above examples has been described with respect to the W alloy / Gt composite target, the same results were obtained with respect to W or its alloy / Mo / Gt composite target in the same manner as each of the above examples.
以上詳細に説明したように、本発明のろう材は、ぬれ性
が改良されたので、酸化物の巻込みなく、空洞のない接
合層が得られる。しかも、このろう材自体の強度が高
く、安価なため経済的に有利である。したがつて、本発
明のろう材は、Ｘ線管回転陽極用複合ターゲツトにおい
て、接合用ろう材として有用なものである。本発明のろ
う材は、本発明のＸ線管回転陽極用複合ターゲツトの接
合部が加熱される1350℃以上の融点を持つているので有
利であるばかりでなく、熱伝導性が良く、熱膨張率差に
よる接合層の剥離がなく、接合方法が簡単であるので、
複合ターゲツトを経済的有利に製造することができると
いう顕著な効果が奏せられた。As described in detail above, since the brazing material of the present invention has improved wettability, a bonding layer having no void can be obtained without the inclusion of oxide. Moreover, since the brazing material itself has high strength and is inexpensive, it is economically advantageous. Therefore, the brazing material of the present invention is useful as a brazing material for joining in a composite target for an X-ray tube rotating anode. The brazing material of the present invention is not only advantageous because it has a melting point of 1350 ° C. or higher at which the joint part of the composite target for an X-ray tube rotary anode of the present invention is heated, and also has good thermal conductivity and thermal expansion. There is no peeling of the bonding layer due to the difference in the rate, and the bonding method is simple
The remarkable effect that the composite target can be produced economically has been achieved.
第１図は従来のＸ線管回転陽極用複合ターゲツトの縦断
面概略図、第２図〜第６図は、本発明のＸ線管回転陽極
用複合ターゲツトの接合層付近の断面組織の顕微鏡写真
である。 1:電子衝撃部、2:W合金又はMo、21:X線管用Ｗ−Re合
金、3:Gt、4:中間層、41:接合層、5:回転軸FIG. 1 is a schematic vertical cross-sectional view of a conventional composite target for an X-ray tube rotary anode, and FIGS. 2 to 6 are micrographs of a cross-sectional structure near a bonding layer of the composite target for an X-ray tube rotary anode of the present invention. Is. 1: Electron impact part, 2: W alloy or Mo, 21: W-Re alloy for X-ray tube, 3: Gt, 4: Intermediate layer, 41: Bonding layer, 5: Rotating shaft
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ０４Ｂ 37/02 Ｂ Ｈ０１Ｊ 35/10 Ａ (72)発明者 馬場 昇 茨城県日立市幸町３丁目１番１号 株式会 社日立製作所日立研究所内 (72)発明者 諏訪 正輝 茨城県日立市幸町３丁目１番１号 株式会 社日立製作所日立研究所内 (72)発明者 中川 雄策 茨城県日立市幸町３丁目１番１号 株式会 社日立製作所日立研究所内 (72)発明者 小野寺 久吉 茨城県日立市幸町３丁目１番１号 株式会 社日立製作所日立研究所内 (72)発明者 坂本 広志 茨城県日立市幸町３丁目１番１号 株式会 社日立製作所日立研究所内 (56)参考文献 特開 昭53−120658（ＪＰ，Ａ) 特開 昭47−42548（ＪＰ，Ａ) 特公 昭44−30373（ＪＰ，Ｂ１) 特公 昭43−17405（ＪＰ，Ｂ１) 特公 平４−48555（ＪＰ，Ｂ２) 特公 昭60−10414（ＪＰ，Ｂ２)─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Reference number within the agency FI technical display location C04B 37/02 B H01J 35/10 A (72) Inventor Noboru Baba 3 Saiwaicho, Hitachi City, Ibaraki Prefecture 1-1 Hitachi Ltd., Hitachi Research Laboratory (72) Inventor Masateru Suwa 3-1-1, Sachimachi, Hitachi City, Ibaraki Hitachi Ltd. (72) Inventor Yusaku Nakagawa Hitachi City, Ibaraki Prefecture 3-1, 1-1 Sachimachi Hitachi Research Laboratory, Hitachi, Ltd. (72) Inventor Hisakichi Onodera 3-1-1, Sachimachi Hitachi City, Ibaraki Hitachi Ltd. Hitachi Research Laboratory (72) Inventor Hiroshi Sakamoto 3-1, 1-1 Sachimachi, Hitachi, Ibaraki, Ltd., Hitachi Research Laboratory, Hitachi, Ltd. (56) References JP-A-53-120658 (JP, A) JP-A-47-42548 (JP, A) JP-B 44-30373 (JP, B1) JP-B 43-17405 (JP, B1) JP-B 4-48555 (JP, B2) JP-B 60-14414 (JP, B2)
Claims (3)
ろう材において、それがジルコニウム単体、タングステ
ン分が30重量％以下のジルコニウム−タングステン合
金、モリブデン分が30重量％以下のジルコニウム−モリ
ブデン合金、タングステン分が30重量％以下でニツケル
分が20重量％以下のジルコニウム−タングステン−ニツ
ケル合金、モリブデン分が30重量％以下でニツケル分が
20重量％以下のジルコニウム−モリブデン−ニツケル合
金、チタン、ニオブ及びタンタルよりなる群から選択し
た金属材料の１種の表面に、厚さ0.01〜20μｍのニツケ
ル又はコバルト層を設けたクラツド箔であることを特徴
とするＸ線ターゲツト用ろう材。1. A brazing filler metal for joining a refractory metal material and graphite, which is a zirconium simple substance, a zirconium-tungsten alloy having a tungsten content of 30% by weight or less, and a zirconium-molybdenum alloy having a molybdenum content of 30% by weight or less. , Zirconium-tungsten-nickel alloy with a tungsten content of 30% by weight or less and a nickel content of 20% by weight or less, a nickel content of 30% by weight or less
A cladding foil having a nickel or cobalt layer of 0.01 to 20 μm in thickness on one surface of a metal material selected from the group consisting of 20 wt% or less of zirconium-molybdenum-nickel alloy, titanium, niobium and tantalum. A brazing material for X-ray targets characterized by.
イト又はタングステン若しくはその合金／モリブデン／
グラフアイトなるＸ線管回転陽極用複合ターゲツトにお
いて、そのタングステン若しくはその合金又はモリブデ
ンとグラフアイトとの接合用ろう材がジルコニウム単
体、タングステン分が30重量％以下のジルコニウム−タ
ングステン合金、モリブデン分が30重量％以下のジルコ
ニウム−モリブデン合金、タングステン分が30重量％以
下でニツケル分が20重量％以下のジルコニウム−タング
ステン−ニツケル合金、モリブデン分が30重量％以下で
ニツケル分が20重量％以下のジルコニウム−モリブデン
−ニツケル合金、チタン、ニオブ及びタンタルよりなる
群から選択した金属材料の１種の表面に、厚さ0.01〜20
μｍのニツケル又はコバルト層を設けたクラツド箔であ
ることを特徴とするＸ線管回転陽極用複合ターゲツト。2. Tungsten or its alloy / graphite or tungsten or its alloy / molybdenum /
In a composite target for an X-ray tube rotating anode made of graphite, the tungsten or its alloy or a brazing material for joining molybdenum and graphite is zirconium alone, a zirconium-tungsten alloy having a tungsten content of 30% by weight or less, and a molybdenum content of 30%. % Zirconium-molybdenum alloy, tungsten content 30% by weight or less nickel content 20% by weight or less zirconium-tungsten-nickel alloy, molybdenum content 30% by weight or less nickel content 20% by weight zirconium- The surface of one kind of metal material selected from the group consisting of molybdenum-nickel alloy, titanium, niobium, and tantalum has a thickness of 0.01 to 20.
A composite target for a rotary anode of an X-ray tube, which is a cladding foil provided with a nickel or cobalt layer of μm.
イト又はタングステン若しくはその合金／モリブデン／
グラフアイトなるＸ線管回転陽極用複合ターゲットにお
いて、そのタングステン若しくはその合金又はモリブデ
ンとグラフアイトとの接合用ろう材が、ジルコニウム単
体、タングステン分が30重量％以下のジルコニウム−タ
ングステン合金、モリブデン分が30重量％以下のジルコ
ニウム−モリブデン合金、タングステン分が30重量％以
下でニツケル分が20重量％以下のジルコニウム−タング
ステン−ニツケル合金及びモリブデン分が30重量％以下
でニツケル分が20重量％以下のジルコニウム−モリブデ
ン−ニツケル合金よりなる群から選択した金属材料の１
種の表面に、厚さ0.01〜20μｍのニツケル層を設けたク
ラツド箔であり、更に該タングステン若しくはその合金
又はモリブデンと該ろう材との間にモリブデン又はタン
グステン粉末を、該ろう材とグラフアイトとの間にジル
コニウム粉末を設けて接合を行つて製造したものである
ことを特徴とするＸ線管回転陽極用複合ターゲツト。3. Tungsten or its alloy / graphite or tungsten or its alloy / molybdenum /
In the composite target for X-ray tube rotating anode made of graphite, the brazing material for joining tungsten or its alloy or molybdenum and graphite is zirconium simple substance, zirconium-tungsten alloy having a tungsten content of 30% by weight or less, and molybdenum content. Zirconium-molybdenum alloy containing 30% by weight or less, zirconium-tungsten-nickel alloy containing 30% by weight or less of nickel and 20% by weight or less of nickel, and zirconium containing 20% or less of nickel by weight or less than 30% by weight of molybdenum. -A metal material selected from the group consisting of molybdenum-nickel alloys
It is a cladding foil in which a nickel layer having a thickness of 0.01 to 20 μm is provided on the surface of the seed, and molybdenum or tungsten powder is provided between the tungsten or its alloy or molybdenum and the brazing material, and the brazing material and the graphite. A composite target for an X-ray tube rotating anode, characterized in that it is manufactured by providing zirconium powder between and joining.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58085912A JPH0771759B2 (en) | 1983-05-18 | 1983-05-18 | X-ray target brazing material and X-ray tube rotating anode composite target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58085912A JPH0771759B2 (en) | 1983-05-18 | 1983-05-18 | X-ray target brazing material and X-ray tube rotating anode composite target |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59212189A JPS59212189A (en) | 1984-12-01 |
| JPH0771759B2 true JPH0771759B2 (en) | 1995-08-02 |
Family
ID=13872020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58085912A Expired - Lifetime JPH0771759B2 (en) | 1983-05-18 | 1983-05-18 | X-ray target brazing material and X-ray tube rotating anode composite target |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0771759B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4802196A (en) * | 1986-12-31 | 1989-01-31 | General Electric Company | X-ray tube target |
| DE4129414A1 (en) * | 1990-11-13 | 1993-03-11 | Endress Hauser Gmbh Co | Ternary activated solder |
| JP2720762B2 (en) * | 1993-08-13 | 1998-03-04 | 日本電気株式会社 | How to join graphite and metal |
| JP7048061B1 (en) * | 2021-08-20 | 2022-04-05 | 大学共同利用機関法人自然科学研究機構 | Bond of carbon material and tungsten material and its manufacturing method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53120658A (en) * | 1977-03-30 | 1978-10-21 | Seiko Epson Corp | Improved brazing filler metal |
| US4145632A (en) * | 1977-04-18 | 1979-03-20 | General Electric Company | Composite substrate for rotating x-ray anode tube |
| JPS5455015A (en) * | 1977-10-12 | 1979-05-01 | Hitachi Chemical Co Ltd | Method of bonding copper and ceramic |
| JPS5595685A (en) * | 1979-01-12 | 1980-07-21 | Tokyo Shibaura Electric Co | Ceramiccmetal sealed structure |
| DE3013441C2 (en) * | 1980-04-05 | 1984-12-13 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Anode plate for a rotating anode X-ray tube and process for its manufacture |
-
1983
- 1983-05-18 JP JP58085912A patent/JPH0771759B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59212189A (en) | 1984-12-01 |
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