JPH0733098B2 - Method of manufacturing thermal head - Google Patents

Method of manufacturing thermal head

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Publication number
JPH0733098B2
JPH0733098B2 JP19506386A JP19506386A JPH0733098B2 JP H0733098 B2 JPH0733098 B2 JP H0733098B2 JP 19506386 A JP19506386 A JP 19506386A JP 19506386 A JP19506386 A JP 19506386A JP H0733098 B2 JPH0733098 B2 JP H0733098B2
Authority
JP
Japan
Prior art keywords
glaze layer
thermal head
resistance film
heat generating
inclined surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP19506386A
Other languages
Japanese (ja)
Other versions
JPS6349451A (en
Inventor
隆也 長畑
Original Assignee
ロ−ム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ロ−ム株式会社 filed Critical ロ−ム株式会社
Priority to JP19506386A priority Critical patent/JPH0733098B2/en
Publication of JPS6349451A publication Critical patent/JPS6349451A/en
Publication of JPH0733098B2 publication Critical patent/JPH0733098B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335—Structure of thermal heads

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  • Electronic Switches (AREA)

Description

【発明の詳細な説明】 （イ）産業上の利用分野 この発明は、蓄熱層（グレーズ層）の蓄熱体積を小さく
し、熱応答性を向上させた高速印字処理の可能なサーマ
ルヘッドの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a method for manufacturing a thermal head capable of high-speed printing processing in which the heat storage volume of a heat storage layer (glaze layer) is reduced and thermal response is improved. Regarding

（ロ）従来の技術 第３図は、従来のサーマルヘッドを示す断面図である。
従来のサーマルヘッドは、アルミナセラミック基板11の
上面端部に、長手方向へ非晶化ガラスを載置し、印刷焼
成にて断面が円弧状をした帯状のグレーズ層（蓄熱層）
12を形成した後、このグレーズ層12の上面に窒化タンタ
ル等の抵抗膜（発熱抵抗膜）13を形成し、この抵抗体層
13の裾部両側へリード用電極（個別電極及び共通電極）
14、15を重合状に蒸着或いはスパッタ方式で形成する。(B) Conventional Technique FIG. 3 is a sectional view showing a conventional thermal head.
A conventional thermal head is a strip-shaped glaze layer (heat storage layer) in which an amorphous glass is placed in the longitudinal direction on the upper end portion of an alumina ceramic substrate 11 and a cross section is arc-shaped by printing and firing.
After forming 12, a resistance film (heating resistance film) 13 such as tantalum nitride is formed on the upper surface of the glaze layer 12, and the resistance layer is formed.
Lead electrodes (individual electrode and common electrode) to both sides of 13
14 and 15 are formed in a polymerized form by vapor deposition or sputtering.

そして、最終工程において、前記基板11、抵抗膜13及び
電極14、15の表面に二酸化珪素膜（保護膜）17を蒸着又
はスパッタ方式にて形成し、グレーズ層（抵抗膜13）12
の頂部、つまり電極14、15の対向間隔に発熱部16を形成
している。Then, in the final step, a silicon dioxide film (protective film) 17 is formed on the surfaces of the substrate 11, the resistive film 13 and the electrodes 14 and 15 by vapor deposition or sputtering, and the glaze layer (resistive film 13) 12 is formed.
A heat generating portion 16 is formed at the top of the electrode, that is, at the interval between the electrodes 14 and 15 facing each other.

この製法にて形成されたサーマルヘッドでは、電極（個
別電極及び共通電極）14、15間にパルス電圧を印加する
と、発熱抵抗膜13が発熱し、この発熱部16に対応する感
熱紙或いは感熱リボンによって記録紙に印字される。In the thermal head formed by this manufacturing method, when a pulse voltage is applied between the electrodes (individual electrode and common electrode) 14 and 15, the heating resistance film 13 generates heat and the heat-sensitive paper or heat-sensitive ribbon corresponding to the heat-generating portion 16 is generated. Is printed on the recording paper.

（ハ）発明が解決しようとする問題点 サーマルヘッドを使用する熱転写プリンタでは、サーマ
ルヘッドにプラテンローラを対向配備させ、サーマルヘ
ッドとプラテンローラ間に転写シート及び記録紙を重合
状態で圧着給送し、サーマルヘッドの発熱部を選択的に
発熱させることで、記録紙に情報を印字するものであ
る。従って、サーマルヘッドの発熱部は、印字効率上、
基板に対し膨出している必要がある。従来のサーマルヘ
ッドでは、グレーズ層が通常、基板に対し40乃至60μ高
さとなるように厚みを設定している。(C) Problems to be Solved by the Invention In a thermal transfer printer using a thermal head, a platen roller is arranged to face the thermal head, and a transfer sheet and recording paper are pressure-fed in a superposed state between the thermal head and the platen roller. Information is printed on the recording paper by selectively heating the heating portion of the thermal head. Therefore, the heat generating part of the thermal head is
It must be swollen with respect to the substrate. In conventional thermal heads, the thickness is usually set so that the glaze layer is 40 to 60 μ higher than the substrate.

ところで、このグレーズ層（蓄熱層）は、非晶化ガラス
を印刷焼成して形成するものであるため、加熱によりガ
ラスが溶解し、所謂だれ現象を起こし、グレーズ層は曲
率半径の大きい断面が円弧状となる結果、グレーズ層の
幅長さは、通常、0.6乃至1.0mm程度となっている。更
に、このグレーズ層の頂部中心位置は、基板の垂直端面
から0.6乃至1.0mm離れた位置に配置されることとなる。By the way, since this glaze layer (heat storage layer) is formed by printing and firing amorphous glass, the glass is melted by heating, causing a so-called sag phenomenon, and the glaze layer has a large cross section with a large radius of curvature. As a result of the arc shape, the width and length of the glaze layer are usually about 0.6 to 1.0 mm. Further, the center position of the top of this glaze layer is arranged at a position separated by 0.6 to 1.0 mm from the vertical end face of the substrate.

このため、基板に対し発熱部の充分な突出高さ（厚み）
を得るには、グレーズ層の幅が大きくならざるを得ず
（また、基板端部から発熱部・ドット中心が大きく離れ
ることとなり）、結果的に蓄熱容量が増大して高速印字
に対応し得ず、しかも高速印字で要請されるグレーズ層
の頂部位置、つまり発熱部（ドット）位置を基板端部か
ら0.25mm以内に配置するという命題も不可能となる等の
不利があった。Therefore, the protruding height (thickness) of the heat generating part is sufficient for the substrate.
To obtain this, the width of the glaze layer must be increased (and the heat generating part and the dot center are largely separated from the substrate edge), and as a result, the heat storage capacity is increased and high-speed printing can be supported. In addition, there is a disadvantage that the top position of the glaze layer, which is required for high-speed printing, that is, the position of the heat generating portion (dot) is located within 0.25 mm from the edge of the substrate, which is impossible.

この発明は、基板に対し発熱部の充分な突出高さを確保
し、且つ蓄熱容量が小さく高速印字に対応できるサーマ
ルヘッドを得るための製造方法を提供することを目的と
する。SUMMARY OF THE INVENTION It is an object of the present invention to provide a manufacturing method for obtaining a thermal head having a sufficient protruding height of a heat generating portion with respect to a substrate and having a small heat storage capacity and capable of supporting high-speed printing.

（ニ）問題点を解決するための手段及び作用 この目的を達成させるために、この発明のサーマルヘッ
ドの製造方法は、次のような方式で行われる。(D) Means and Actions for Solving Problems In order to achieve this object, the method of manufacturing the thermal head of the present invention is performed by the following method.

サーマルヘッドの製造工程は、絶縁基板の上面に断面が
円弧状の帯状グレーズ層を形成する工程と、このグレー
ズ層の表面に発熱抵抗膜を形成する工程と、この発熱抵
抗膜の上面であって頂部より僅か位置ずれした傾斜面部
に個別電極と共通電極を対局して配置し、頂部より外れ
た少なくとも一方の傾斜面部に発熱部を形成する工程
と、前記基板、抵抗膜及び電極を被覆する保護層を形成
する工程と、前記グレーズ層の頂部を切断点として上記
保護層、電極、発熱抵抗膜、グレーズ層及び絶縁基板を
垂直切断する切断工程とから成る。The manufacturing process of the thermal head consists of forming a band-shaped glaze layer having an arcuate cross section on the upper surface of the insulating substrate, forming a heating resistance film on the surface of the glaze layer, and forming the heating resistance film on the upper surface. A step of arranging the individual electrode and the common electrode in opposition to the inclined surface portion slightly displaced from the top, and forming a heat generating portion on at least one inclined surface portion deviated from the top, and protection for covering the substrate, the resistance film and the electrode. It comprises a step of forming a layer, and a cutting step of vertically cutting the protective layer, the electrode, the heating resistance film, the glaze layer and the insulating substrate with the top of the glaze layer as a cutting point.

このような製法によれば、基板に対しグレーズ層の頂部
高さ（厚み）が、従来どおり40乃至60μ高さを有し、且
つ幅長さが同様に0.6乃至1.0mmの断面が円弧状のグレー
ズ層が得られる。そして、このグレーズ層に形成される
発熱部の位置は、従来と異なり、グレーズ層頂部より位
置ずれした傾斜面部に設けられている。従って、グレー
ズ層、抵抗膜、電極及び保護層を順次形成して得られた
サーマルヘッド素体を、グレーズ層の頂部を切断点とし
て垂直に切断する時、蓄熱層であるグレーズ層は突出高
さがそのまま保持される（40乃至60μ）と共に幅が0.3
乃至0.5mmであり、且つ発熱部（ドット）中心が基板端
面より0.25mm以内の位置にあるサーマルヘッドが得られ
る。According to such a manufacturing method, the top height (thickness) of the glaze layer with respect to the substrate is 40 to 60 μm as in the conventional case, and the width and length are similarly 0.6 to 1.0 mm. A glaze layer is obtained. The position of the heat generating portion formed in the glaze layer is different from the conventional one, and is provided on the inclined surface portion displaced from the top portion of the glaze layer. Therefore, when the thermal head element obtained by sequentially forming the glaze layer, the resistance film, the electrode and the protective layer is cut vertically with the top of the glaze layer as a cutting point, the glaze layer which is the heat storage layer has a protruding height. Is kept as it is (40-60μ) and the width is 0.3
It is possible to obtain a thermal head in which the center of the heat generating portion (dot) is within 0.25 mm from the end face of the substrate.

これにより、蓄熱層の体積が従来の半分となり、熱応答
性が良好となる結果、高速印字に対応し得ることとな
る。As a result, the volume of the heat storage layer is reduced to half that of the conventional one, and the thermal response is improved, so that high-speed printing can be supported.

（ホ）実施例 第１図は、この発明に係る製造方法で形成されたサーマ
ルヘッドの一実施例を示す断面図である。(E) Example FIG. 1 is a sectional view showing an example of a thermal head formed by the manufacturing method according to the present invention.

サーマルヘッドは、絶縁性アルミナ基板１の上面に、基
板１の垂直端面に連続し、且つ上方へ立上がる垂直壁面
から湾曲状に下降傾斜する傾斜面をもった帯状グレーズ
層（蓄熱層）２が、記録紙送り方向に対し直交方向へ配
置されている。そして、このグレーズ層２の表面に発熱
抵抗膜３及びこの抵抗膜３の表面に共通リード導体（共
通電極）５及び切込み部（図示せず）によって、互いに
区分される複数の個別リード導体（個別電極）４を形成
し、更にこれらを被覆する保護層６が最上部に、順次、
成形処理されている。The thermal head has a strip-shaped glaze layer (heat storage layer) 2 on the upper surface of the insulating alumina substrate 1, which is continuous with the vertical end face of the substrate 1 and has an inclined surface that is inclined downward in a curved shape from a vertical wall surface that rises upward. , Are arranged in a direction orthogonal to the recording paper feeding direction. Then, a plurality of individual lead conductors (individual lead conductors) separated from each other by the heating resistance film 3 on the surface of the glaze layer 2 and the common lead conductor (common electrode) 5 and the cut portion (not shown) on the surface of the resistance film 3 are formed. Electrode) 4, and a protective layer 6 covering them further on top,
Has been molded.

実施例において、具体的な製造工程は、先ずアルミナセ
ラミック基板１状に、帯状の非晶化ガラスを載置し、印
刷焼成にて断面が半円形状をしたグレーズ層（蓄熱層）
２を形成する。この印刷焼成により得られたグレーズ層
２は、従来と同様に、頂部高さが40μ、幅長さが0.6mm
に設定してある。In the examples, a specific manufacturing process is as follows. First, a band-shaped amorphous glass is placed on the alumina ceramic substrate 1 and a glaze layer (heat storage layer) having a semicircular cross section by printing and firing.
Form 2. The glaze layer 2 obtained by this printing and firing has a top height of 40 μ and a width length of 0.6 mm as in the conventional case.
Is set to.

ついで、このグレーズ層２の上面に、窒化タンタル等の
発熱抵抗膜３を形成し、この発熱抵抗膜３上にリード用
電極、つまり共通リード導体５及び個別リード導体４を
対向状に蒸着或いはスパッタ方式にて形成する。Then, a heating resistance film 3 such as tantalum nitride is formed on the upper surface of the glaze layer 2, and lead electrodes, that is, the common lead conductor 5 and the individual lead conductors 4 are vapor-deposited or sputtered on the heating resistance film 3 so as to face each other. It is formed by the method.

実施例では、個別リード導体４は先端部をグレーズ層２
の一方の傾斜面の裾部に位置させ、一方、共通リード導
体５は他方の傾斜面裾部から先端部をグレーズ層２の頂
部を越え、同じ傾斜面にまで延長させて対向状に配置し
ている。そして、この個別リード導体４と共通リード導
体５との対向間隔部を発熱部６とし、発熱部６は、グレ
ーズ層２の一方の傾斜面中央部にのみ形成させる。In the embodiment, the individual lead conductor 4 has a tip portion at the glaze layer 2
One of the common lead conductors 5 is located at the skirt of one of the inclined surfaces, while the common lead conductor 5 extends from the skirt of the other inclined surface over the top of the glaze layer 2 to the same inclined surface, and is arranged in a facing manner. ing. The facing space between the individual lead conductor 4 and the common lead conductor 5 is used as the heat generating portion 6, and the heat generating portion 6 is formed only at the center of one inclined surface of the glaze layer 2.

そして、前記基板１、抵抗膜３及びリード導体４、５の
表面に二酸化珪素膜（保護膜）７を蒸着又はスパッタ方
式にて形成する。Then, a silicon dioxide film (protective film) 7 is formed on the surfaces of the substrate 1, the resistance film 3 and the lead conductors 4 and 5 by vapor deposition or sputtering.

かくして形成されたサーマルヘッド素体をグレーズ層２
の頂部を切断点として、例えばダイヤモンドカッタにて
垂直状に切断し、サーマルヘッド素体を二つ（発熱部６
を有する側と有しない側）に分断し、サーマルヘッドを
得る。The thermal head element thus formed is applied to the glaze layer 2
Using the top of the cutting point as a cutting point, for example, a diamond cutter is used to cut vertically so that two thermal head elements are formed (heating section 6
To obtain a thermal head.

この切断工程にて、グレーズ層２の頂部高さ（厚み）が
40μ、幅長さが0.3mmとなったサーマルヘッドが得られ
る。そして、発熱部６は、このようなグレーズ層（発熱
抵抗膜３）２上の傾斜面部に設けられることとなり、基
板１の端面から発熱部（ドット）６中心までの距離が0.
15mmのものが得られる。In this cutting process, the top height (thickness) of the glaze layer 2 is
A thermal head with a width of 40μ and a width of 0.3mm can be obtained. The heat generating portion 6 is provided on such an inclined surface portion on the glaze layer (heat generating resistance film 3) 2, and the distance from the end face of the substrate 1 to the center of the heat generating portion (dot) 6 is 0.
You can get 15mm.

尚、実施例では、切断工程にダイヤモンドカッタを使用
し、グレーズ層２の頂部から垂直切断してサーマルヘッ
ド素体を二つに分断する方法を示したが、分断方法はこ
れに限らず、例えば発熱部６の位置する傾斜面とは反対
側の傾斜面部側から研磨機によりグレーズ層２の頂部ま
で切削処理を施して、サーマルヘッドを得るも良い。こ
の場合、実施例より滑らかな切断端面が得られる。In the examples, a diamond cutter is used in the cutting process, and a method of vertically cutting from the top of the glaze layer 2 to divide the thermal head element into two parts is shown, but the dividing method is not limited to this, and for example, A thermal head may be obtained by performing a cutting process from the inclined surface side opposite to the inclined surface where the heat generating portion 6 is located to the top of the glaze layer 2 with a polishing machine. In this case, a cut end surface that is smoother than that of the example can be obtained.

第２図は、この発明の他の実施例（製造方法）で得られ
るサーマルヘッド素体（切断工程処理前）を示す断面図
である。FIG. 2 is a sectional view showing a thermal head element body (before the cutting step treatment) obtained in another embodiment (manufacturing method) of the present invention.

先の実施例では、共通リード導体５をグレーズ層２の頂
部を越え、一方の（個別リード導体４が位置する）傾斜
面部にまで延長させて配置した例を示したが、この実施
例では、共通リード導体５をグレーズ層（発熱抵抗膜
３）２の頂部を跨ぐ状態で配置し、個別リード導体４、
４をこの共通リード導体５の両側、つまり一方の傾斜面
部と他方の傾斜面部（傾斜裾部）に、それぞれ対向状に
配置し、両傾斜面部に発熱部６、６を設けている。In the previous embodiment, the common lead conductor 5 was arranged so as to extend beyond the top of the glaze layer 2 and extend to one of the inclined surface portions (where the individual lead conductors 4 are located). However, in this embodiment, The common lead conductor 5 is arranged so as to straddle the top of the glaze layer (heat generating resistance film 3) 2, and the individual lead conductors 4,
The common lead conductors 5 are arranged on both sides of the common lead conductor 5, that is, on one inclined surface portion and the other inclined surface portion (inclined skirt portion) so as to face each other, and heat generating portions 6 are provided on both inclined surface portions.

そして、先の実施例と同様に、グレーズ層２の頂部、つ
まり共通リード導体５の中央部を切断点として、サーマ
ルヘッド素体を垂直に切断する。Then, as in the previous embodiment, the thermal head element is cut vertically with the top of the glaze layer 2, that is, the center of the common lead conductor 5, as the cutting point.

かくして、１つのサーマルヘッド素体から、それぞれグ
レーズ層２の頂部高さが40μで、幅が0.3mmの二つのサ
ーマルヘッドが得られる。Thus, two thermal heads each having a top height of the glaze layer 2 of 40 μ and a width of 0.3 mm can be obtained from one thermal head element.

尚、この実施例の場合、発熱抵抗膜３上にパターン形成
されるリード導体４、５（つまり、切断により二つに分
断される）の引出し方向を、予め逆向きに設定しておく
事は勿論である。In the case of this embodiment, the lead-out directions of the lead conductors 4 and 5 (that is, divided into two by cutting) formed on the heating resistance film 3 may not be set in the opposite direction in advance. Of course.

このような製造方法では、グレーズ層２の一方の傾斜面
部に個別リード導体４と共通リード導体５とを配置し、
発熱部６を一方の傾斜面部中央にのみ形成したサーマル
ヘッド素体が、第１段階で得られる。ついで、グレーズ
層２の頂部を切断点としてサーマルヘッド素体を垂直に
切断する第２段階において、グレーズ層２の頂部高さが
従来どおり40μで、且つグレーズ層２の幅長さが0.3mm
となったサーマルヘッドが得られる。In such a manufacturing method, the individual lead conductor 4 and the common lead conductor 5 are arranged on one of the inclined surface portions of the glaze layer 2,
The thermal head element body in which the heat generating portion 6 is formed only in the center of the one inclined surface portion is obtained in the first stage. Then, in the second step of vertically cutting the thermal head element using the top of the glaze layer 2 as a cutting point, the top height of the glaze layer 2 is 40 μ as usual and the width length of the glaze layer 2 is 0.3 mm.
The resulting thermal head is obtained.

ここに、グレーズ層２の蓄熱体積が従来の半分であり、
熱応答性能の優れたサーマルヘッドが形成され、高速印
字に対応し得る。しかも、発熱部６の中心は、基板１の
端部（切断による垂直端面）より0.15mmの位置に配置さ
れる結果となる。従って、従来、プラテンローラの軸中
心に対しサーマルヘッドを位置ずれさせて配置し、印字
効率の向上を図っていた煩わしい位置合わせが省略でき
る。つまり、この製法により製造されたサーマルヘッド
では、発熱部６がグレーズ層２の頂部より位置ずれした
傾斜面部に設けられており、従来印字効率を勘案してサ
ーマルヘッドの中心をプラテンローラに対し変位させて
いた状態が自動的に得られることとなり、簡易に印字効
率を向上し得る。Here, the heat storage volume of the glaze layer 2 is half that of the conventional one,
A thermal head with excellent thermal response performance is formed, and high-speed printing can be supported. Moreover, as a result, the center of the heat generating portion 6 is arranged at a position of 0.15 mm from the end portion (vertical end face due to cutting) of the substrate 1. Therefore, it is possible to omit the cumbersome alignment that has conventionally been performed by disposing the thermal head with respect to the axis center of the platen roller so as to improve the printing efficiency. That is, in the thermal head manufactured by this manufacturing method, the heat generating portion 6 is provided on the inclined surface portion which is displaced from the top portion of the glaze layer 2, and the center of the thermal head is displaced with respect to the platen roller in consideration of the conventional printing efficiency. The state in which the printing is performed is automatically obtained, and the printing efficiency can be easily improved.

（ヘ）発明の効果 この発明では、以上のように、発熱部をグレーズ層の一
方の傾斜面部に形成させた後、グレーズ層の頂部を切断
点としてサーマルヘッド素体を垂直に切断してサーマル
ヘッドを得ることとした。(F) Effect of the Invention In the present invention, as described above, after the heat generating portion is formed on one inclined surface portion of the glaze layer, the thermal head element is vertically cut by using the top portion of the glaze layer as a cutting point to perform thermal treatment. I decided to get a head.

この発明によれば、グレーズ層の頂部高さを保持したま
ま、蓄熱層の体積を従来の半分とすることが出来、熱応
答性に優れ高速印字に対応し得るサーマルヘッドを提供
し得る。According to the present invention, the volume of the heat storage layer can be reduced to half that of the conventional one, while maintaining the height of the top of the glaze layer, and it is possible to provide a thermal head having excellent thermal response and capable of supporting high-speed printing.

しかも、この製法により得られるサーマルヘッドでは、
発熱部がグレーズ層の傾斜面部、つまり最も記録紙及び
転写紙を圧着し得る位置にドットが形成されることとな
り、サーマルヘッドとプラテンローラとの間を狭圧状態
で給送される記録紙の印字性能が一層良好となる。Moreover, in the thermal head obtained by this manufacturing method,
Dots are formed at the heat generating portion on the inclined surface of the glaze layer, that is, at the position where the recording paper and the transfer paper can be pressed most, and the recording paper fed in a narrow pressure state between the thermal head and the platen roller. Printing performance is further improved.

更に、従来のサーマルヘッドでは、発熱部をグレーズ層
の頂部に配置する構成であったため、発熱部の形成位置
に精度を要求されていたが、この発明の発熱部は、傾斜
面部に形成されるため、印字上、従来のようなドット位
置精度は殆ど問題とならず、製品歩留りが向上する等、
発明目的を達成した優れた効果を有する。Further, in the conventional thermal head, since the heat generating portion is arranged on the top of the glaze layer, accuracy is required for the position where the heat generating portion is formed, but the heat generating portion of the present invention is formed on the inclined surface portion. Therefore, in printing, the dot position accuracy as in the past does not pose a problem, and the product yield is improved.
It has an excellent effect of achieving the object of the invention.

【図面の簡単な説明】[Brief description of drawings]

第１図は、この発明により得られたサーマルヘッドを示
す断面図、第２図は、他の実施例により得られる切断工
程前のサーマルヘッド素体を示す断面図、第３図は、従
来の製法により得られるサーマルヘッドを示す断面図で
ある。 1:セラミック基板、2:グレーズ層、 3:発熱抵抗膜、4:個別リード導体、 5:共通リード導体、6:発熱部。FIG. 1 is a sectional view showing a thermal head obtained by the present invention, FIG. 2 is a sectional view showing a thermal head body before a cutting step obtained by another embodiment, and FIG. It is sectional drawing which shows the thermal head obtained by the manufacturing method. 1: Ceramic substrate, 2: Glaze layer, 3: Heating resistance film, 4: Individual lead conductor, 5: Common lead conductor, 6: Heating part.

Claims (1)

【特許請求の範囲】[Claims] 【請求項１】絶縁基板の上面に断面が円弧状をした帯状
グレーズ層を形成する工程と、このグレーズ層の表面に
発熱抵抗膜を形成する工程と、この発熱抵抗膜の上面で
あって頂部より僅か位置ずれした傾斜面部に個別電極と
共通電極を対向して配置し、頂部より外れた少なくとも
一方の傾斜面部に発熱部を形成する工程と、前記基板、
抵抗膜及び電極を被覆する保護層を形成する工程と、前
記グレーズ層の頂部を切断点として上記保護層、電極、
発熱抵抗膜、グレーズ層及び絶縁基板を垂直切断する切
断工程とから成るサーマルヘッドの製造方法。1. A step of forming a band-shaped glaze layer having an arc-shaped cross section on an upper surface of an insulating substrate, a step of forming a heating resistance film on the surface of the glaze layer, and an upper surface of the heating resistance film, which is a top portion. A step of arranging the individual electrodes and the common electrode so as to face each other on the inclined surface portion slightly displaced from each other, and forming a heat generating portion on at least one inclined surface portion deviated from the top portion;
A step of forming a protective layer covering the resistance film and the electrode, the protective layer, the electrode, with the top of the glaze layer as a cutting point,
A method of manufacturing a thermal head, comprising a heating resistance film, a glaze layer, and a cutting step of vertically cutting an insulating substrate.
JP19506386A 1986-08-19 1986-08-19 Method of manufacturing thermal head Expired - Lifetime JPH0733098B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19506386A JPH0733098B2 (en) 1986-08-19 1986-08-19 Method of manufacturing thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19506386A JPH0733098B2 (en) 1986-08-19 1986-08-19 Method of manufacturing thermal head

Publications (2)

Publication Number Publication Date
JPS6349451A JPS6349451A (en) 1988-03-02
JPH0733098B2 true JPH0733098B2 (en) 1995-04-12

Family

ID=16334937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19506386A Expired - Lifetime JPH0733098B2 (en) 1986-08-19 1986-08-19 Method of manufacturing thermal head

Country Status (1)

Country Link
JP (1) JPH0733098B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5317341A (en) * 1991-01-24 1994-05-31 Rohm Co., Ltd. Thermal head and method of making the same
TW212157B (en) * 1991-01-30 1993-09-01 Rohm Co Ltd
JP3298780B2 (en) * 1995-08-30 2002-07-08 アルプス電気株式会社 Thermal head and method of manufacturing thermal head
JP4565724B2 (en) * 2000-09-27 2010-10-20 京セラ株式会社 Thermal printer

Also Published As

Publication number Publication date
JPS6349451A (en) 1988-03-02

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