JPH0729762B2 - Carbon material purification method - Google Patents
Carbon material purification methodInfo
- Publication number
- JPH0729762B2 JPH0729762B2 JP62084321A JP8432187A JPH0729762B2 JP H0729762 B2 JPH0729762 B2 JP H0729762B2 JP 62084321 A JP62084321 A JP 62084321A JP 8432187 A JP8432187 A JP 8432187A JP H0729762 B2 JPH0729762 B2 JP H0729762B2
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- JP
- Japan
- Prior art keywords
- pressure
- gas
- processing chamber
- purification
- carbon material
- Prior art date
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Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、カーボン材を高純化するための純化処理方法
に関する。TECHNICAL FIELD The present invention relates to a purification treatment method for highly purifying a carbon material.
（従来の技術） カーボン材は、高温下での機械的強度、耐熱性、耐久
性、耐薬品性、電気伝導性、熱伝導性等の優れた特性を
有するため各種の用途に使用されている。(Prior Art) Carbon materials have excellent properties such as mechanical strength at high temperatures, heat resistance, durability, chemical resistance, electrical conductivity, and thermal conductivity, and are used in various applications. .
半導体装置、原子炉装置、石英溶融装置等に用いられる
カーボン材には、カーボン材が有する前述の特性に加え
て、高純度であることが要求される。Carbon materials used in semiconductor devices, nuclear reactor devices, quartz melting devices, etc. are required to have high purity in addition to the above-mentioned characteristics of carbon materials.
従来のカーボン材の純化処理方法は、純化炉内に被処理
物としてのカーボン材を配置し、炉壁とカーボン材の間
の間隙をコークス、カーボン等の詰粉を入れ、炉の側壁
下方に設けたガス導入口より純化処理用ガスとして塩素
ガスを流しながら、炉の両側壁の電極に通電して行なう
ものである。これにより、塩素はカーボン材中の不純物
と反応して塩素化合物となり、カーボン材の周囲に充填
されているガス透過性の詰粉の中に侵入する。この塩素
化合物の大部分は詰粉上部の温度の低い部分で凝縮し、
一部の塩素化合物および未反応の塩素は上方の排気装置
から排気される。The conventional purification method of carbon material is to place a carbon material as an object to be treated in a purification furnace, and insert a coke, a filling powder such as carbon into the gap between the furnace wall and the carbon material, and place it below the side wall of the furnace. This is done by energizing the electrodes on both side walls of the furnace while flowing chlorine gas as a purification gas from the gas inlet provided. As a result, chlorine reacts with impurities in the carbon material to form a chlorine compound, which penetrates into the gas-permeable packing powder filled around the carbon material. Most of this chlorine compound condenses in the lower temperature part of the upper part of the powder,
Some chlorine compounds and unreacted chlorine are exhausted from the upper exhaust system.
（発明が解決しようとする問題点） この従来の純化処理方法では、カーボン材を高純度化す
るのに長時間を要し、電力、ガス等のエエネルギ消費量
が多いため処理コストが高く、また純化処理効率が悪い
という欠点がある。さらに、このような純化炉は炉の上
方が開口されているため純化処理用ガスとして使用され
る人体に有害な塩素ガス等が飛散するため、炉上方に設
けた排気装置でも十分に排気し得ず作業環境が悪いとい
う問題がある。(Problems to be Solved by the Invention) In this conventional purification treatment method, it takes a long time to highly purify the carbon material, and energy consumption such as electric power and gas is large, so that the treatment cost is high, and There is a drawback that the purification efficiency is poor. Furthermore, since such a purification furnace has an opening above the furnace, chlorine gas, which is harmful to the human body and is used as a purification gas, scatters.Therefore, an exhaust device installed above the furnace can sufficiently exhaust the gas. There is a problem that the working environment is bad.
（問題点を解決するための手段） 本発明は以上のような問題点を解決するため、短時間で
高純度化処理し得、純化効率が良く、処理コストの安い
カーボン材の純化処理方法を提供するものである。(Means for Solving Problems) In order to solve the above problems, the present invention provides a purification method for a carbon material which can be highly purified in a short time, has high purification efficiency, and is low in processing cost. It is provided.
本発明の前記目的は、次の構成によって達成される。す
なわち、内方にカーボン材を配置するための密閉された
処理室を囲周する特定空間に不活性ガスを所定圧力に導
入する第１の段階と、処理室内に純化処理用ガスを少な
くとも不活性ガスの圧力より低い圧力にて導入する第２
の段階と、処理室内を減圧する第３の段階と、処理室内
を昇温する第４の段階と、処理室内を特定空間内の圧力
より低い圧力内で昇圧する第５の段階と、処理室内の減
圧及び昇圧を２回以上繰返す第６の段階とを含むことを
特徴とするカーボン材の純化方法である。The above object of the present invention is achieved by the following configurations. That is, the first step of introducing an inert gas at a predetermined pressure into a specific space surrounding the sealed processing chamber for disposing the carbon material inside, and at least the purification processing gas in the processing chamber being inert. Second introduction at pressure lower than gas pressure
Step, a third step of reducing the pressure in the processing chamber, a fourth step of increasing the temperature of the processing chamber, a fifth step of increasing the pressure in the processing chamber to a pressure lower than the pressure in the specific space, and the processing chamber. And a sixth step of repeating depressurization and pressurization of 2 or more times.
本発明の純化処理方法においては、内方にカーボン材を
配置するための密閉された処理室を囲周する特定空間に
不活性ガスを所定圧力にて導入する第１の段階の後に、
処理室内に純化処理用ガスを少なくとも不活性ガスの圧
力より低い圧力にて導入する第２の段階を行うが故に、
処理室からその外周側の特定空間ひいてはさらにその外
周側の炉外への純化処理用ガス洩れを初期段階から防止
できる。In the purification treatment method of the present invention, after the first step of introducing an inert gas at a predetermined pressure into a specific space surrounding the closed treatment chamber for disposing the carbon material inside,
Since the second step of introducing the purification treatment gas into the treatment chamber at a pressure lower than at least the pressure of the inert gas is performed,
It is possible to prevent the gas for purification treatment from leaking from the processing chamber to the specific space on the outer peripheral side thereof, and further to the outside of the furnace on the outer peripheral side thereof from the initial stage.
また、内方にカーボン材を配置するための密閉された処
理室を囲周する特定空間に不活性ガスを所定圧力にて導
入する第１の段階の後に、処理室内に純化処理用ガスを
少なくとも不活性ガスの圧力より低い圧力にて導入する
第２の段階を行い、加えて、処理室内を減圧する第３の
段階の後に、特定空間に設けられたヒータにより処理室
内を昇温する第４の段階を行うが故に、初期段階からヒ
ータの酸化防止ができると共に、被処理物であるカーボ
ン材を酸化することなく、純化処理効率を向上し得る。Further, after the first step of introducing an inert gas at a predetermined pressure into a specific space surrounding the sealed processing chamber for disposing the carbon material inside, at least the purification processing gas is introduced into the processing chamber. A fourth step of performing a second step of introducing the gas at a pressure lower than the pressure of the inert gas and, in addition, performing a second step of depressurizing the processing chamber, and then raising the temperature of the processing chamber by a heater provided in the specific space Therefore, the heater can be prevented from being oxidized from the initial stage, and the purification treatment efficiency can be improved without oxidizing the carbon material that is the object to be treated.
さらには、処理室内を特定空間内の圧力より低い圧力内
で昇圧する第５の段階により、純化処理用ガスの洩れを
随時防止でき、処理室内の減圧及び昇圧を２回以上繰返
す第６の段階によりカーボン材に存在する気孔の中まで
純化処理用ガスを侵入させ、カーボン材の純化効率を向
上させ得る。Furthermore, the fifth step of increasing the pressure in the processing chamber at a pressure lower than the pressure in the specific space can prevent leakage of the purification processing gas at any time, and the sixth step of repeating the pressure reduction and the pressure increase in the processing chamber twice or more. Thus, the purification treatment gas can be introduced into the pores existing in the carbon material to improve the purification efficiency of the carbon material.
なお、上記第２の段階と第３の段階とは、各々独立して
実施されてもよいが、同時に実施されてもよい。The second stage and the third stage may be carried out independently of each other, or may be carried out simultaneously.
本発明の純化処理方法の特定空間内の圧力としては、大
気圧以下であるのが望ましい。これにより、処理室内の
圧力が変動しても、特定空間内の不活性ガスの雰囲気が
緩衝の働きをなし、炉壁材の破損、損傷を防止し得る。The pressure in the specific space of the purification method of the present invention is preferably atmospheric pressure or lower. As a result, even if the pressure in the processing chamber fluctuates, the atmosphere of the inert gas in the specific space acts as a buffer, and damage to the furnace wall material can be prevented.
本発明の純化処理方法の純化処理用ガスとしてはハロゲ
ン又はハロゲン含有ガスが望ましい。As the purification treatment gas of the purification treatment method of the present invention, halogen or a halogen-containing gas is desirable.
（具体例） 本発明の１具体例を、図面を参照しながら説明する。第
１図は、本発明の方法を実施するための純化処理装置の
縦断面概略図である。純化炉１の炉外壁２内には処理室
３を形成するカーボン製の炉内壁４が設けられており、
純化処理される図示しないカーボン材が処理室３に適宜
な固定治具を介して配置されている。この処理室３は、
カーボン材が配置された後、図示しない両側端の蓋によ
って密閉される。炉内壁４と炉外壁２との間の間隙５か
らなる特定空間には処理室３を加熱するための複数のヒ
ータ６が配設されており、このヒータの酸化を防止する
ために間隙５には不活性ガス供給手段11から不活性ガス
導入路８を介して例えば窒素ガス等の不活性ガスが導入
される。炉外壁２は二重構造となっており、その間には
冷却水が流されている。また、この二重構造の内側の壁
は適宜な断熱材によって断熱されている。(Specific Example) One specific example of the present invention will be described with reference to the drawings. FIG. 1 is a schematic vertical sectional view of a purification processing apparatus for carrying out the method of the present invention. A carbon furnace inner wall 4 forming a processing chamber 3 is provided in the furnace outer wall 2 of the purification furnace 1.
A carbon material (not shown) to be purified is placed in the processing chamber 3 via an appropriate fixing jig. This processing chamber 3
After the carbon material is arranged, it is sealed by lids (not shown) at both ends. A plurality of heaters 6 for heating the processing chamber 3 are arranged in a specific space defined by the gap 5 between the inner wall 4 of the furnace and the outer wall 2 of the furnace, and the gap 5 is provided to prevent oxidation of the heaters. An inert gas such as nitrogen gas is introduced from the inert gas supply means 11 through the inert gas introduction passage 8. The outer wall 2 of the furnace has a double structure, and cooling water is flown between them. In addition, the inner wall of this double structure is insulated by a suitable heat insulating material.
処理室３に配置されたカーボン材を純化処理するための
純化処理用ガスは、純化処理用ガス導入路７を介して適
宜な圧力で処理室３に導入される。また、この処理室３
に導入された純化処理用ガスを排出するために、炉内壁
４にはガス排出手段９が接続されている。このガス排出
手段９には、ダストキャッチャーが設けられ、ダスト又
は処理室内反応物、例えば塩素化合物が取り除かれた排
気ガスが排出される。The purification treatment gas for purifying the carbon material arranged in the treatment chamber 3 is introduced into the treatment chamber 3 at an appropriate pressure via the purification treatment gas introduction passage 7. In addition, this processing chamber 3
A gas discharge means 9 is connected to the inner wall 4 of the furnace in order to discharge the purification gas introduced into the furnace. The gas discharge means 9 is provided with a dust catcher and discharges dust or a reaction product in the processing chamber, for example, exhaust gas from which chlorine compounds have been removed.
なお、処理室３内の純化処理用ガスが処理室３の外側に
流出しないように間隙５内の不活性ガスの圧力PAは処理
室３内の純化処理用ガスの圧力PBより高く設定されるの
が好ましい。The pressure P A of the inert gas in the gap 5 is set higher than the pressure P B of the purification gas in the processing chamber 3 so that the purification gas in the processing chamber 3 does not flow out of the processing chamber 3. Preferably.
しかも、間隙５内の不活性ガスが間隙５の外側に流出し
ないように間隙５内の不活性ガスの圧力PAは大気圧より
も低く設定されるのが好ましい。Moreover, the pressure P A of the inert gas in the gap 5 is preferably set lower than the atmospheric pressure so that the inert gas in the gap 5 does not flow out of the gap 5.
この純化処理装置は第２図のガス供給及び排気系統図に
示されるように接続されており、図示しない制御手段に
よって、以下のように制御される。This purification apparatus is connected as shown in the gas supply and exhaust system diagram of FIG. 2, and is controlled by the control means (not shown) as follows.
処理室３は、ガス排出手段９を介して排気され、0.01ト
ール（第３図P1）まで減圧される。減圧後、炉内壁４と
炉外壁２との間の間隙５に設けられたヒータにより処理
室３を約2,000℃まで昇温する。昇温後、処理室３にカ
ーボン材の純化処理用ガスとして塩素ガスを純化処理用
ガス供給手段10から処理用ガス導入路７を介して圧力が
大気圧以下の第１の圧力としての700トール（第３図
P2）となるまで導入し、処理室３を昇圧する。昇圧後一
定時間、例えば５分経過後に処理室３の温度を2000℃に
維持したまま、再度処理室３はガス排気手段９を介して
排気されて、第２の圧力としての0.01トール（第３図
P3）まで減圧され、その後処理室３の圧力は、前述と同
様の方法で700トールと0.01トールとの間で純化処理が
完了するまで交互に昇圧及び減圧を繰り返すいわゆるパ
ルス制御が行なわれる。この時、P3の値は必ずしもP1に
等しくなくてもよい。このような純化処理工程中、処理
室３を大気圧以下の所定圧P2,P3においてカーボン材を
純化処理するが故に、処理室における純化処理用ガスの
蒸気圧を低くし得、カーボン中の不純物を純化処理用ガ
スの化合物としてカーボン材から除去し易くし得、加え
て純化処理用ガスの排気、導入を交互に繰り返すので効
率よくカーボン材を高純度化し得る。The processing chamber 3 is exhausted through the gas exhausting means 9 and is depressurized to 0.01 Torr (P 1 in FIG. 3). After depressurization, the temperature of the processing chamber 3 is raised to about 2,000 ° C. by the heater provided in the gap 5 between the furnace inner wall 4 and the furnace outer wall 2. After the temperature is raised, chlorine gas is used as a purification gas for the carbon material in the treatment chamber 3 from the purification treatment gas supply means 10 through the treatment gas introduction passage 7 and the pressure is 700 torr as the first pressure below atmospheric pressure. (Fig. 3
P 2 ) until the process chamber 3 is pressurized. After a lapse of a certain time, for example, 5 minutes, after the pressurization, the temperature of the processing chamber 3 is maintained at 2000 ° C., and the processing chamber 3 is exhausted again via the gas exhausting means 9 to obtain the second pressure of 0.01 Torr (third Figure
The pressure in the processing chamber 3 is reduced to P 3 ), and then the pressure in the processing chamber 3 is subjected to so-called pulse control in which the pressure is increased and decreased alternately between 700 Torr and 0.01 Torr until the purification process is completed. At this time, the value of P 3 is not necessarily equal to P 1 . During such a purification process, since the carbon material is purified in the treatment chamber 3 at a predetermined pressure P 2 or P 3 below atmospheric pressure, the vapor pressure of the purification gas in the treatment chamber can be lowered, The impurities can be easily removed from the carbon material as a compound of the purification gas, and in addition, the exhaustion and introduction of the purification gas are alternately repeated, so that the carbon material can be highly purified efficiently.
純化処理工程終了後、純化処理用ガス導入路７、不活性
ガス導入路８及び中間接続路12に夫々設けられた各弁13
を適宜に開閉して、処理室３の純化処理用ガスを700ト
ール下の不活性ガスに切換える。この時も前述の純化処
理工程と同様に不活性ガスの導入、排気が交互に繰返さ
れ、処理室３を不活性ガス雰囲気に置換えた後、炉内を
冷却しカーボン材を取出す。After completion of the purification process, the valves 13 provided in the purification gas introducing passage 7, the inert gas introducing passage 8 and the intermediate connecting passage 12, respectively.
Is appropriately opened and closed to switch the purification treatment gas in the treatment chamber 3 to an inert gas under 700 Torr. At this time as well, the introduction and exhaust of the inert gas are alternately repeated in the same manner as in the above-mentioned purification treatment step, the processing chamber 3 is replaced with the inert gas atmosphere, and then the inside of the furnace is cooled to take out the carbon material.
本発明の方法を実施する純化処理装置に対する従来の純
化処理装置との効果の比較を指数で表１に示す。Table 1 shows an index comparison of the effect of the purification treatment apparatus for carrying out the method of the present invention with the conventional purification treatment apparatus.
この表１からも明らかなように本具体例の純化処理方法
によれば、純化処理時間を大巾に短縮し、純化処理効率
を向上し得る。また、塩素消費量、電力消費量を大巾に
減少させ、処理コストを下げ得る。 As is clear from Table 1, according to the purification treatment method of this example, the purification treatment time can be greatly shortened and the purification treatment efficiency can be improved. In addition, chlorine consumption and electric power consumption can be greatly reduced, and the processing cost can be reduced.
さらに、炉の内部が外気としゃ断されるため、従来の炉
のように純化処理用ガスを炉外に漏れなくし得、詰粉を
使用しないため、粉塵の飛散を防止し得、したがって、
炉の回りの作業環境を良好に維持し得る。Furthermore, since the inside of the furnace is cut off from the outside air, it is possible to prevent the purification gas from leaking out of the furnace like a conventional furnace, and since no packing powder is used, it is possible to prevent the scattering of dust, therefore,
A good working environment around the furnace can be maintained.
本具体例では、純化処理用ガスとして塩素ガスを使用し
たが、これに限らず塩酸、フレオン、その他のハロゲン
含有ガスを使用できる。In this example, chlorine gas was used as the gas for purification treatment, but not limited to this, hydrochloric acid, freon, and other halogen-containing gas can be used.
また、本具体例では、間隙５内の圧力PA及び処理室３内
の圧力PBを負圧としたが、大気圧よりも高くしてもよ
い。Further, in this specific example, the pressure P A in the gap 5 and the pressure P B in the processing chamber 3 are negative, but they may be higher than atmospheric pressure.
（本発明の効果） 本発明の純化処理方法によれば、内方にカーボン材を配
置するための密閉された処理室を囲周する特定空間に不
活性ガスを所定圧力にて導入する第１の段階の後に、処
理室内に純化処理用ガスを少なくとも不活性ガスの圧力
より低い圧力にて導入する第２の段階を行うが故に、処
理室からその外周側の特定空間ひいてはさらにその外周
側の炉外への純化処理用ガス洩れを初期段階から防止で
きる。(Effect of the present invention) According to the purification treatment method of the present invention, the inert gas is introduced at a predetermined pressure into the specific space surrounding the sealed treatment chamber for disposing the carbon material inside. After the step of, the second step of introducing the purification treatment gas into the processing chamber at a pressure lower than at least the pressure of the inert gas is performed, so that the specific space on the outer peripheral side of the processing chamber, and further on the outer peripheral side thereof, It is possible to prevent the gas for purification treatment from leaking outside the furnace from the initial stage.
また、内方にカーボン材を配置するための密閉された処
理室を囲周する特定空間に不活性ガスを所定圧力にて導
入する第１の段階の後に、処理室内に純化処理用ガスを
少なくとも不活性ガスの圧力より低い圧力にて導入する
第２の段階を行い、加えて、処理室内を減圧する第３の
段階の後に、特定空間に設けられたヒータにより処理室
内を昇温する第４の段階を行うが故に、初期段階からヒ
ータの酸化防止ができると共に、被処理物であるカーボ
ン材を酸化することなく、純化処理効率を向上し得る。Further, after the first step of introducing an inert gas at a predetermined pressure into a specific space surrounding the sealed processing chamber for disposing the carbon material inside, at least the purification processing gas is introduced into the processing chamber. A fourth step of performing a second step of introducing the gas at a pressure lower than the pressure of the inert gas and, in addition, performing a second step of depressurizing the processing chamber, and then raising the temperature of the processing chamber by a heater provided in the specific space Therefore, the heater can be prevented from being oxidized from the initial stage, and the purification treatment efficiency can be improved without oxidizing the carbon material that is the object to be treated.
さらには、処理室内を特定空間の圧力より低い圧力内で
昇圧する第５の段階により、純化処理用ガス洩れを随時
防止でき、処理室内の減圧及び昇圧を２回以上繰返す第
６の段階により、カーボン材に存在する気孔の中まで純
化処理用ガスを侵入させ、カーボン材の純化効率を向上
させ得る。Furthermore, by the fifth step of increasing the pressure in the processing chamber within a pressure lower than the pressure of the specific space, it is possible to prevent leakage of the purification processing gas at any time, and by the sixth step in which the pressure reduction and the pressure increase in the processing chamber are repeated twice or more, The purification gas can be introduced into the pores of the carbon material to improve the purification efficiency of the carbon material.
第１図は、本発明による純化処理装置の縦断面概略図で
あり、第２図は本発明による純化処理装置のガス供給及
び排気系統図であり、第３図は本発明による純化処理装
置の制御方法の説明用グラフである。 １……純化炉、３……処理室、９……ガス排出手段、10
……純化処理用ガス供給手段、11……不活性ガス供給手
段。FIG. 1 is a schematic vertical sectional view of a purification processing apparatus according to the present invention, FIG. 2 is a gas supply and exhaust system diagram of the purification processing apparatus according to the present invention, and FIG. 3 is a purification processing apparatus according to the present invention. It is a graph for explaining a control method. 1 ... Purification furnace, 3 ... Processing chamber, 9 ... Gas discharging means, 10
…… Purification treatment gas supply means, 11 …… Inert gas supply means.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 正廣 山形県西置賜郡小国町大字小国町378番地 東芝セラミツクス株式会社小国製造所内 (72)発明者 梅津 ▲高▼志 山形県西置賜郡小国町大字小国町378番地 東芝セラミツクス株式会社小国製造所内 (72)発明者 安部 茂 山形県西置賜郡小国町大字小国町378番地 東芝セラミツクス株式会社小国製造所内 (72)発明者 川崎 知安 京都府京都市中京区西ノ京桑原町１番地 株式会社島津製作所三条工場内 (72)発明者 田中 秀一 京都府京都市中京区西ノ京桑原町１番地 株式会社島津製作所三条工場内 (56)参考文献 特開 昭58−8418（ＪＰ，Ａ) 実開 昭61−7536（ＪＰ，Ｕ) 特公 昭38−21958（ＪＰ，Ｂ１) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Masahiro Ito, 378, Oguni, Oguni-cho, Nishiokitama-gun, Nishigata, Yamagata Prefecture, Oguni Plant, Toshiba Ceramics Co., Ltd. (72) Inventor, Umezu ▲ High ▼ Oguni-cho, Oguni, Yamagata Prefecture Town 378 Toshiba Ceramics Co., Ltd. Oguni Plant (72) Inventor Shigeru Abe Oguni-machi Oguni Town, Ogishi Town, Yamagata Prefecture 378 Toshiba Ceramics Co., Ltd. Oguni Plant (72) Inventor Kawasaki Chian Nishinokyo Kuwabara, Nakagyo Ward, Kyoto City, Kyoto Prefecture No. 1 in the town Sanjo Factory, Shimadzu Corporation (72) Inventor Shuichi Tanaka No. 1 Kuwabara-cho, Nishinokyo, Nakagyo-ku, Kyoto City, Kyoto Prefecture (56) Inside the Sanjo Factory, Shimadzu Corporation (56) Reference JP-A-58-8418 (JP, A) Actual Development Sho 61-7536 (JP, U) Japanese Patent Sho 38-21958 (JP, B1)
Claims (2)
れた処理室を囲周する特定空間に不活性ガスを所定圧力
にて導入する第１の段階と、前記処理室内に純化処理用
ガスを少なくとも前記不活性ガスの圧力より低い圧力に
て導入する第２の段階と、前記処理室内を減圧する第３
の段階と、前記処理室内を昇温する第４の段階と、前記
処理室内を前記特定空間内の圧力より低い圧力内で昇圧
する第５の段階と、前記処理室内の減圧及び昇圧を２回
以上繰返す第６の段階とを含むことを特徴とするカーボ
ン材の純化方法。1. A first step of introducing an inert gas at a predetermined pressure into a specific space surrounding a sealed processing chamber for arranging a carbon material therein, and a purification treatment in the processing chamber. A second step of introducing gas at a pressure lower than at least the pressure of the inert gas, and a third step of depressurizing the processing chamber
And a fourth step of raising the temperature in the processing chamber, a fifth step of increasing the pressure in the processing chamber within a pressure lower than the pressure in the specific space, and a decompression and a pressure increase in the processing chamber twice. A method for purifying a carbon material, including the sixth step of repeating the above.
ことを特徴とする特許請求の範囲第１項に記載の方法。2. The method according to claim 1, wherein the pressure in the specific space is equal to or lower than atmospheric pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62084321A JPH0729762B2 (en) | 1987-04-06 | 1987-04-06 | Carbon material purification method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62084321A JPH0729762B2 (en) | 1987-04-06 | 1987-04-06 | Carbon material purification method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63248706A JPS63248706A (en) | 1988-10-17 |
| JPH0729762B2 true JPH0729762B2 (en) | 1995-04-05 |
Family
ID=13827245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62084321A Expired - Fee Related JPH0729762B2 (en) | 1987-04-06 | 1987-04-06 | Carbon material purification method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0729762B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100032319A (en) * | 2008-09-16 | 2010-03-25 | 미쓰비시 마테리알 가부시키가이샤 | Method of refining carbon parts for production of polycrystalline silicon |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2934186B1 (en) * | 2008-07-28 | 2013-04-05 | Tile S | MANUFACTURE AND PURIFICATION OF A SOLID SEMICONDUCTOR |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5884181A (en) * | 1981-11-11 | 1983-05-20 | 松下電器産業株式会社 | Carbon member purifying treatment |
| JPS617536U (en) * | 1984-06-21 | 1986-01-17 | 東海カ−ボン株式会社 | Homogeneous firing equipment for carbon molded bodies |
| JPS6284322A (en) * | 1985-10-09 | 1987-04-17 | Hitachi Ltd | Data inputting system for data base system |
-
1987
- 1987-04-06 JP JP62084321A patent/JPH0729762B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100032319A (en) * | 2008-09-16 | 2010-03-25 | 미쓰비시 마테리알 가부시키가이샤 | Method of refining carbon parts for production of polycrystalline silicon |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63248706A (en) | 1988-10-17 |
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