JPH07277772A - Glass plate effective for improving habitability - Google Patents
Glass plate effective for improving habitabilityInfo
- Publication number
- JPH07277772A JPH07277772A JP6071023A JP7102394A JPH07277772A JP H07277772 A JPH07277772 A JP H07277772A JP 6071023 A JP6071023 A JP 6071023A JP 7102394 A JP7102394 A JP 7102394A JP H07277772 A JPH07277772 A JP H07277772A
- Authority
- JP
- Japan
- Prior art keywords
- glass plate
- layer
- thin film
- visible light
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、簡単な単層膜または２
層膜を被膜し、ガラス板の透明性とミラー効果をバラン
スよく持たせ、同時に満足しうるものとすることで、環
境に優しくかつ存在観を発現せしめ、電波透過性を有す
る居住性を高めたガラス板に関し、建築用窓材としては
もちろん、ビルディング等各種の用途においてその機能
を生かすことができる居住性や環境性に優れたガラス板
を提供するものである。BACKGROUND OF THE INVENTION The present invention is directed to a simple monolayer film or two.
By coating the layered film with a balance between the transparency of the glass plate and the mirror effect, and at the same time satisfying it, it is environmentally friendly and expresses its presence, and enhances the habitability with radio wave transmission. With respect to a glass plate, it is intended to provide a glass plate excellent in habitability and environment, which can be utilized not only as a window material for construction but also in various applications such as a building.
【０００２】[0002]
【従来技術】一般に反射率を高くした高性能熱線反射ガ
ラスは数多く提案されかつ商品化されており、そのなか
で高透過率を有する赤外線反射ガラスがあり、またさら
に無反射ガラス等が知られている。2. Description of the Related Art In general, many high performance heat ray reflective glasses having a high reflectance have been proposed and commercialized. Among them, there are infrared ray reflective glasses having a high transmittance, and further, non-reflective glass and the like are known. There is.
【０００３】例えば、特開昭63ー134232号公報には、高
透過率を有する赤外反射物品が記載されており、透明基
板上に基板側から順次透明酸化物の第１層、銀の第２
層、透明酸化物の第３層、銀の第４層、透明酸化物の第
５層から成る５層コーティングが設けられた赤外反射物
品において、該銀層の厚みが110 Å以下であり、可視光
線透過率が70％以上であるものが開示され、実施例とし
て例えばガラス基板／TiO2（膜厚35nm）／Ag（膜厚10n
m）／TiO2（膜厚70nm）／Ag（膜厚10nm）／TiO2（膜厚3
5nm）で、可視光線透過率が78.7％、可視光線反射率が
8.5 ％、太陽エネルギー透過率が53.2％、太陽エネルギ
ー反射率が28.2％、10μにおける反射率が95％で反射色
がグリーン色である等、赤外域で高い反射率と可視域で
高い透過率を有し、反射色をかなり自由に変化させるこ
とができるというものが記載されている。For example, Japanese Laid-Open Patent Publication No. 63-134232 describes an infrared reflecting article having a high transmittance, in which a transparent oxide first layer and a silver first layer are successively formed on a transparent substrate from the substrate side. Two
An infrared reflective article provided with a five-layer coating comprising a layer, a third layer of transparent oxide, a fourth layer of silver, and a fifth layer of transparent oxide, wherein the thickness of the silver layer is 110 Å or less, A material having a visible light transmittance of 70% or more is disclosed. As an example, for example, glass substrate / TiO 2 (film thickness 35 nm) / Ag (film thickness 10 n
m) / TiO 2 (film thickness 70 nm) / Ag (film thickness 10 nm) / TiO 2 (film thickness 3
5nm), visible light transmittance is 78.7%, visible light reflectance is
8.5%, solar energy transmittance is 53.2%, solar energy reflectance is 28.2%, reflectance at 10μ is 95%, and reflection color is green.High reflectance in infrared region and high transmittance in visible region. It is described that the reflection color can be changed quite freely.
【０００４】また例えば、特開昭63ー218513号公報に
は、TiO X 薄膜及びそれを用いた光学素子が記載されて
おり、分子式：TiO X （ただし１＜ｘ＜２）で表わされ
る薄膜状酸化チタン系物質、ならびに基板上に該薄膜を
形成した光学素子が開示され、蒸発源としてTiO を用
い、一旦真空チャンバー内を高真空にした後、酸素ガス
を導入して酸素分圧を５×10-3〜８×10-4Torrに設定し
て真空蒸着を行うことによって基板上に形成し、紫色を
呈しないしかも帯電しないようにするとともに、ことに
合成樹脂基板ではスキン層とともに薄膜が基板から剥離
するようなこともない、膜厚が0.001 〜20μｍ程度で屈
折率ndが2.2 〜2.4 であるものであって、実施例とし
て、PMMA基板／TiO X （１＜ｘ＜２）〔膜厚488nm 、nd
=2.32 〕の無色透明で帯電なしかつ密着性良好なもの、
PMMA基板／TiO X （１＜ｘ＜２）〔膜厚488nm 、nd=2.3
2 〕／SiO X 〔膜厚488nm 、nd=1.46 〕あるいはPMMA基
板／SiO X （１＜ｘ＜２）〔膜厚550nm 、nd=1.65 〕／T
iO X （１＜ｘ＜２）〔膜厚550nm 、nd=2.32 〕／SiO
X 〔膜厚550nm 、nd=1.46 〕の反射防止膜、さらにPMMA
基板／SiO X （１＜ｘ＜２）〔膜厚632.8nm nd=1.46 〕
／TiO X （１＜ｘ＜２）〔膜厚632.8nm 、nd=2.3〕の反
射膜が開示されている。Further, for example, in JP-A-63-218513.
Is TiOXThe thin film and the optical element using it are described
Cage, molecular formula: TiOX(However, 1 <x <2)
Thin film titanium oxide based material, and the thin film on the substrate
A formed optical element is disclosed, which uses TiO 2 as an evaporation source.
Once the inside of the vacuum chamber is made high vacuum, oxygen gas
To introduce oxygen partial pressure of 5 × 10-3~ 8 x 10-FourSet to Torr
Formed on the substrate by vacuum evaporation to produce a purple color.
In addition to not presenting and not charging, especially
On synthetic resin substrates, the thin film peels off from the substrate along with the skin layer
If the film thickness is 0.001 to 20 μm,
The folding rate nd is 2.2 to 2.4, and
PMMA substrate / TiOX(1 <x <2) [Film thickness 488 nm, nd
= 2.32], colorless and transparent, with no charge and good adhesion,
PMMA substrate / TiOX(1 <x <2) [Film thickness 488 nm, nd = 2.3
2] / SiOX[Film thickness 488 nm, nd = 1.46] or PMMA group
Plate / SiO X(1 <x <2) [Film thickness 550nm, nd = 1.65] / T
iOX(1 <x <2) [film thickness 550nm, nd = 2.32] / SiO
X[Film thickness 550 nm, nd = 1.46] anti-reflection film, PMMA
Substrate / SiOX(1 <x <2) [film thickness 632.8nm nd = 1.46]
/ TiOXThe opposite of (1 <x <2) [film thickness 632.8 nm, nd = 2.3]
A spray film is disclosed.
【０００５】[0005]
【発明が解決しようとする問題点】上記した従来の各公
報に開示されている、例えば特開昭63ー134232号公報に
記載の高透過率を有する赤外反射物品では、５層と多層
で複雑であり、かつ赤外域で高い反射率と可視域で高い
透過率を有するとしたとしても、銀層を備えるため耐薬
品性あるいは耐候性が劣り、また銀層の可視域における
反射を防止するため透明酸化物層を作用させて可視域の
透過率を上昇する必要があり、可視光反射率が９〜６％
程度と低くせざるを得ないものであり、しかも銀層のた
め電波シールド性であるというものであって、必ずしも
簡単な膜構成で、あくまでもガラスらしさを充分にアピ
ールし、そのなかでバランスよい光学特性を有し、しか
も電波透過性を有するものとは言い難いものである。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In the infrared reflective article disclosed in each of the above-mentioned conventional publications and having a high transmittance as disclosed in, for example, JP-A-63-134232, five layers and multiple layers are used. Even if it is complicated and has a high reflectance in the infrared region and a high transmittance in the visible region, since it has a silver layer, it has poor chemical resistance or weather resistance, and prevents reflection of the silver layer in the visible region. Therefore, it is necessary to act the transparent oxide layer to increase the transmittance in the visible region, and the visible light reflectance is 9 to 6%.
It has to be made as low as possible, and because it is a radio wave shielding property due to the silver layer, it is not necessarily a simple film structure, it fully appeals the glass-likeness, and among them is a well-balanced optics. It is hard to say that it has characteristics and has radio wave transparency.
【０００６】また例えば特開昭63ー218513号公報に記載
のTiO X 薄膜及びそれを用いた光学素子では、TiO
X （ただし１＜ｘ＜２）薄膜は成膜時ならびに成膜後に
おいて充分安定したものであるとは言い難く、耐薬品
性、耐候性あるいは耐摩耗性等耐久性に不安があって、
必ずしも建築用窓材等屋外には採用し難いものである。Further, for example, in the TiO X thin film and the optical element using the TiO X thin film described in JP-A-63-218513,
It is hard to say that the X (where 1 <x <2) thin film is sufficiently stable during and after film formation, and there is concern about durability such as chemical resistance, weather resistance, and abrasion resistance.
It is not always easy to use it outdoors such as building window materials.
【０００７】[0007]
【問題点を解決するための手段】従来のかかる問題点に
鑑みてなしたものであって、本発明は、簡単な膜構成で
可視光透過率と可視光反射率を特定することで、ガラス
らしさを充分発揮してアピールし、透明感と存在観なら
びに透視性とミラー性を発現するなかで、バランスよい
光学特性を有し、耐薬品性、耐候性あるいは耐摩耗性等
耐久性を備え、しかも電波透過性を有する居住性を高め
たガラス板を安価に提供することができるものである。SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and in the present invention, the visible light transmittance and the visible light reflectance are specified by a simple film structure, so that the glass It has a well-balanced optical property, and has durability such as chemical resistance, weather resistance, and abrasion resistance, among others, while exhibiting its fullness and appealing, and expressing transparency and presence, as well as transparency and mirror property. Moreover, it is possible to inexpensively provide a glass plate having radio wave transparency and improved comfortability.
【０００８】すなわち、本発明は、透明基板の表面に薄
膜層を形成したガラス板において、可視光透過率が67〜
86％であって、しかもガラス面と膜面の平均可視光反射
率を10〜30％かつガラス面と膜面の可視光反射率差が3.
5 ％以下であることを特徴とする居住性を高めたガラス
板。That is, the present invention provides a glass plate having a thin film layer formed on the surface of a transparent substrate and having a visible light transmittance of 67 to
86%, and the average visible light reflectance between the glass surface and the film surface is 10 to 30%, and the visible light reflectance difference between the glass surface and the film surface is 3.
Glass plate with improved habitability, which is less than 5%.
【０００９】ならびに、前記薄膜層が単層であることを
特徴とする上述した居住性を高めたガラス板。また、前
記薄膜層が２層であることを特徴とする上述した居住性
を高めたガラス板。Further, the above-mentioned glass plate with improved comfortability, wherein the thin film layer is a single layer. Further, the above-mentioned glass plate having enhanced comfortability, wherein the thin film layer is two layers.
【００１０】さらに、前記薄膜層がTiO2もしくはSnO2な
らびにこれらを主体とする複合酸化物からなることを特
徴とする上述した居住性を高めたガラス板。さらにま
た、前記居住性を高めたガラス板が、TiO2薄膜層の膜厚
が５nm以上35nm以下であって、刺激純度が５〜25％であ
ることを特徴とする上述した居住性を高めたガラス板。Further, the above-mentioned glass plate with enhanced habitability, characterized in that the thin film layer is made of TiO 2 or SnO 2 and a composite oxide mainly containing them. Furthermore, the glass plate with improved habitability has a TiO 2 thin film layer having a film thickness of 5 nm or more and 35 nm or less and a stimulation purity of 5 to 25%. Glass plate.
【００１１】さらにまた、前記居住性を高めたガラス板
が、SnO2薄膜層の膜厚が15nm以上55nm以下であって、刺
激純度が５〜25％であることを特徴とする上述した居住
性を高めたガラス板。Furthermore, the above-mentioned habitability is characterized in that the glass plate with enhanced habitability has a SnO 2 thin film layer having a film thickness of 15 nm or more and 55 nm or less and a stimulation purity of 5 to 25%. The glass plate which raised.
【００１２】さらにまた、前記居住性を高めたガラス板
が、ガラス板表面から第１層目としてTiO2薄膜層、その
上に第２層目としてSnO2薄膜層を積層した２層からなる
ものであって、その各層の膜厚が５nm以上30nm以下であ
って、刺激純度が５〜25％であることを特徴とする上述
した居住性を高めたガラス板。Still further, the glass plate having improved comfortability is composed of two layers in which a TiO 2 thin film layer as a first layer and a SnO 2 thin film layer as a second layer are laminated on the glass plate surface. The glass plate with enhanced habitability as described above, characterized in that the film thickness of each layer is 5 nm or more and 30 nm or less and the stimulation purity is 5 to 25%.
【００１３】さらにまた、前記居住性を高めたガラス板
が、ガラス板表面から第１層目としてSnO2薄膜層、その
上に第２層目としてTiO2薄膜層を積層した２層からなる
ものであって、その各層の膜厚が５nm以上35nm以下であ
って、刺激純度が５〜25％であることを特徴とする上述
した居住性を高めたガラス板。Furthermore, the glass plate having improved comfortability is composed of two layers in which a SnO 2 thin film layer as a first layer and a TiO 2 thin film layer as a second layer are laminated on the glass plate surface. The glass plate with enhanced habitability as described above, characterized in that the film thickness of each layer is 5 nm or more and 35 nm or less and the stimulation purity is 5 to 25%.
【００１４】さらに、前記透明基板の板厚が、５〜19mm
であることを特徴とする上述した居住性を高めたガラス
板。さらに、前記居住性を高めたガラス板が、電波透過
性を有することを特徴とする上述した居住性を高めたガ
ラス板をそれぞれ提供するものである。Further, the plate thickness of the transparent substrate is 5 to 19 mm.
The glass plate with improved comfort as described above. Further, the above-mentioned glass plate with improved habitability is provided with the above-mentioned glass plate with improved habitability, characterized in that it has radio wave permeability.
【００１５】ここで、ガラス板としては、例えば建築用
窓材としてはもちろん、ビルディング等各種のガラス板
状体等に用いられる市販のソーダライムガラスである無
機質またはポリカーボネートやアクリルなどである有機
質からなる所謂ガラス板状体等であって、平板状あるい
は曲げ板ガラスであり、さらに強化ガラス、合わせガラ
ス、複層ガラスならびに表面処理ガラス等各種加工処理
ガラスまたは各種用途ガラスであってもよい。また、該
ガラス板の形状としては、とくに限定するものではない
が、長辺と短辺でなる略四辺形でなるものが最も好まし
く採用できるものである。Here, the glass plate is made of an inorganic material such as commercially available soda lime glass or an organic material such as polycarbonate or acrylic, which is used not only as a window material for buildings but also as various glass plate-shaped bodies such as buildings. It is a so-called glass plate or the like, which is a flat plate or bent plate glass, and may be various processed glass such as tempered glass, laminated glass, double glazing and surface-treated glass, or glass for various purposes. The shape of the glass plate is not particularly limited, but a substantially quadrangular shape having long sides and short sides can be most preferably adopted.
【００１６】また、前記ガラス板の表面に薄膜層を形成
したガラス板において、可視光透過率を67〜86％とし、
しかもガラス面と膜面の平均可視光反射率を10〜30％と
しかつガラス面と膜面の可視光反射率差を3.5 ％以下と
したのは、可視光透過率が67％未満もしくは平均可視光
反射率が30％を超える範囲においては、反射性能、特に
膜面の反射性能が高くなりすぎ、透視性が下がり、可視
光透過率が86％を超えるもしくは平均可視光反射率が10
％未満の範囲においては、反射性能が下がりすぎ、所定
のミラー効果を得ることができないからである。また可
視光反射率差が3.5 ％を超えると透明性能が活かされな
くなるという問題、例えばガラス中での吸収あるいは多
重反射等があるからである。可視光反射率差として好ま
しいのは３％程度以下であり、より格段に透視性とミラ
ー性をバランスせしめることとなる。一般に光学的特性
は透過率、反射率、吸収率の組み合わせであり、そのバ
ランスにより異なる面もあるが、上述の範囲内にあれ
ば、透過性と反射性を同時に満足することができる。Further, in the glass plate having a thin film layer formed on the surface of the glass plate, the visible light transmittance is 67 to 86%,
Moreover, the average visible light reflectance between the glass surface and the film surface is set to 10 to 30%, and the visible light reflectance difference between the glass surface and the film surface is set to 3.5% or less because the visible light transmittance is less than 67% or the average visible light transmittance. In the range where the light reflectance exceeds 30%, the reflection performance, especially the reflection performance of the film surface becomes too high and the transparency deteriorates, and the visible light transmittance exceeds 86% or the average visible light reflectance is 10%.
This is because, in the range of less than%, the reflection performance becomes too low and the predetermined mirror effect cannot be obtained. Also, if the visible light reflectance difference exceeds 3.5%, there is a problem that the transparency is not utilized, such as absorption in glass or multiple reflection. The visible light reflectance difference is preferably about 3% or less, and the transparency and the mirror property are remarkably balanced. Generally, the optical characteristic is a combination of transmittance, reflectance, and absorptance, and there are different surfaces depending on the balance, but if it is within the above range, the transmittance and the reflectance can be satisfied at the same time.
【００１７】さらに、薄膜層として単層膜または２層膜
としたのは、簡単な膜構成であるため、複雑な工程も要
しないので、コスト低減ができるからである。さらにま
た、前記居住性を高めたガラス板が、TiO2薄膜層の膜厚
が５nm以上35nm以下であって、刺激純度（ガラス面の反
射色と膜面の反射色の平均の刺激純度を示す。以下、同
様。）が５〜25％であることとしたのは、膜厚が５nm未
満では平均可視光反射率が所定より低くなり過ぎ、また
膜厚が35nmを超えると可視光透過率が所定より低くなり
過ぎ、所期の居住性を高めたガラス板を得ることができ
なくなり、刺激純度が５〜25％、好ましくは６〜20％程
度であることがより確かに所期の居住性を高めたガラス
板の性能を発揮することとなるからである。Furthermore, the reason why the single-layer film or the two-layer film is used as the thin film layer is that the film structure is simple and no complicated steps are required, so that the cost can be reduced. Furthermore, the glass plate with enhanced habitability has a TiO 2 thin film layer having a film thickness of 5 nm or more and 35 nm or less, and exhibits a stimulus purity (an average stimulus purity of the reflection color of the glass surface and the reflection color of the film surface. The same shall apply hereinafter.) Is 5 to 25% because the average visible light reflectance is too low when the film thickness is less than 5 nm, and the visible light transmittance is more than 35 nm when the film thickness exceeds 35 nm. It is certainly lower than the specified level, and it is not possible to obtain a glass plate with improved desired habitability, and it is more certain that the stimulation purity is 5 to 25%, preferably 6 to 20%. This is because the glass plate will exhibit the performance of the improved glass plate.
【００１８】さらにまた、前記居住性を高めたガラス板
が、SnO2薄膜層の膜厚が15nm以上55nm以下であって、刺
激純度が５〜25％であることとしたのは、膜厚が15nm未
満では平均可視光反射率が所定より低くなり過ぎ、刺激
純度が約５％程度未満となり、また膜厚が55nmを超える
と刺激純度が約５％程度未満となり、コスト的にも必ず
しも好ましくなくなるためである。好ましい刺激純度と
しては６〜20％程度である。Furthermore, the reason why the glass plate having enhanced comfortability is that the SnO 2 thin film layer has a film thickness of 15 nm or more and 55 nm or less and the stimulation purity is 5 to 25% is that the film thickness is If it is less than 15 nm, the average visible light reflectance is too low, and the stimulation purity is less than about 5%. If the film thickness exceeds 55 nm, the stimulation purity is less than about 5%, which is not always preferable in terms of cost. This is because. A preferable stimulation purity is about 6 to 20%.
【００１９】さらにまた、前記居住性を高めたガラス板
が、ガラス板表面から第１層目としてTiO2薄膜層、その
上に第２層目としてSnO2薄膜層を積層した２層からなる
ものであって、その各層の膜厚が５nm以上30nm以下であ
って、刺激純度が５〜25％であることとしたのは、膜厚
が５nm未満では膜厚の均一性を得るのが難しくなり、膜
厚が30nmを超えると可視光透過率が低くなり過ぎ、平均
可視光反射率も高くなり過ぎ、刺激純度も前記範囲に留
まらないことが多くなるためである。好ましい刺激純度
としては６〜20％程度である。Furthermore, the glass plate having improved comfortability is composed of two layers in which a TiO 2 thin film layer as a first layer and a SnO 2 thin film layer as a second layer are laminated on the glass plate surface. The thickness of each layer is 5 nm or more and 30 nm or less, and the stimulation purity is 5 to 25% because it is difficult to obtain the uniformity of the film thickness when the thickness is less than 5 nm. When the film thickness exceeds 30 nm, the visible light transmittance becomes too low, the average visible light reflectance becomes too high, and the stimulation purity often does not stay within the above range. A preferable stimulation purity is about 6 to 20%.
【００２０】さらにまた、前記居住性を高めたガラス板
が、ガラス板表面から第１層目としてSnO2薄膜層、その
上に第２層目としてTiO2薄膜層を積層した２層からなる
ものであって、その各層の膜厚が５nm以上35nm以下であ
って、刺激純度が５〜25％であることとしたのは、膜厚
が５nm以上35nm以下の範囲内にあれば、可視光透過率な
らびに平均可視光反射率と可視光反射率差とも所定の範
囲に入るものの、膜厚が５nm未満では膜厚の均一性を得
るのが難しくなり、膜厚が35nmを超えると刺激純度が５
％未満となることが多くなるためである。好ましい刺激
純度としては６〜20％程度である。Furthermore, the glass plate with enhanced comfortability is composed of two layers in which a SnO 2 thin film layer as a first layer and a TiO 2 thin film layer as a second layer are laminated on the glass plate surface. The thickness of each layer is 5 nm or more and 35 nm or less, and the stimulus purity is 5 to 25% because the visible light transmission is within the range of 5 nm or more and 35 nm or less. Although the ratio and the average visible light reflectance and the visible light reflectance difference both fall within the predetermined ranges, it becomes difficult to obtain the uniformity of the film thickness when the film thickness is less than 5 nm, and the stimulation purity is 5 when the film thickness exceeds 35 nm.
This is because it often becomes less than%. A preferable stimulation purity is about 6 to 20%.
【００２１】またさらに、電波透過性を有するガラス板
としたのは、電波反射型であると周辺の住民にＴＶにゴ
ースト現象等の所謂電波障害を発生させるためである。
さらに、前記薄膜層がTiO2もしくはSnO2ならびにこれら
を主体とする複合酸化物からなるものとしたのは、若干
青味がかった色合いを呈するもののどちらかと言えばニ
ュートラル色調に近い色合いとなるためであり、単層あ
るいは２層で、デザイン的にも所期の可視光透過性を得
て必要な透視性を持ち、所期の可視光反射性を有してミ
ラー効果を適当にもたらすようにできるからである。Furthermore, the reason why the glass plate having a radio wave transmission property is used is that the radio wave reflection type glass plate causes a so-called radio wave interference such as a ghost phenomenon on a TV in the surrounding residents.
Furthermore, the thin film layer is made of TiO 2 or SnO 2 and a composite oxide mainly composed of these, because it has a slightly bluish hue because it is a hue close to a neutral color tone. Yes, with a single layer or two layers, the desired visible light transmittance can be obtained even in terms of design, and the required transparency can be obtained, and the desired visible light reflectance can be obtained to appropriately provide the mirror effect. Because.
【００２２】さらにまた、前記透明基板の板厚が、５〜
19mmであるとしたのは、例えば４mm以下は風荷重からみ
てビル用の外壁材としては使用できない場合が大半であ
り、また例えば20mmを超えるとガラス内の吸収率が高く
なるので透過率と反射率の両面を同時に満足することが
できない。Furthermore, the plate thickness of the transparent substrate is 5 to 5.
The reason why it is 19 mm is that, for example, if it is 4 mm or less, it cannot be used as an outer wall material for buildings in view of wind load, and if it exceeds 20 mm, the absorptivity in the glass becomes high, so the transmittance and reflection are high. It is not possible to satisfy both sides of the rate at the same time.
【００２３】[0023]
【作用】前述したように、本発明の居住性を高めたガラ
ス板によれば、透明基板の表面に薄膜層を形成したガラ
ス板において、可視光透過率が67〜86％であって、しか
もガラス面と膜面の平均可視光反射率を10〜30％かつガ
ラス面と膜面の可視光反射率差が3.5 ％以下であるもの
とし、さらに膜厚や刺激純度等を特定したことにより、
ガラスらしさを充分発揮してアピールし、透明感と存在
観ならびに透視性とミラー性を発現するなかで、バラン
スよい光学特性を有し同時に満足しうるものとなり、耐
薬品性、耐候性あるいは耐摩耗性等耐久性を備え、しか
も電波透過性を有する居住性を高めたガラス板を簡単な
膜構成で安価に提供することができ、例えば中庭におい
て、ビルディング内の中庭を大きく見せることができる
ミラー性、室内からよく見えるようにする透視性を同時
に達成でき、さらに例えば若干の省エネルギー効果を持
ちながらホテル等からの夜景を楽しむという最適なるも
のとすることができる卓効を奏する。As described above, according to the glass plate of the present invention with enhanced comfortability, the glass plate having the thin film layer formed on the surface of the transparent substrate has a visible light transmittance of 67 to 86%, and The average visible light reflectance between the glass surface and the film surface is 10 to 30%, and the visible light reflectance difference between the glass surface and the film surface is 3.5% or less.
It has a good balance of optical properties while exhibiting transparency and a sense of presence, as well as transparency and mirror properties, while exhibiting a glass-like appearance and chemical resistance, weather resistance, or abrasion resistance. It is possible to provide a glass plate with high durability such as properties and radio wave transmission that enhances habitability at a low cost with a simple film structure. For example, in a courtyard, a mirror property that can make the inner courtyard of the building look large In addition, it is possible to achieve the transparency that makes the interior more visible, and to achieve the optimum effect of enjoying the night view from the hotel while having some energy saving effect.
【００２４】[0024]
【実施例】以下、実施例により本発明を具体的に説明す
る。ただし本発明は係る実施例に限定されるものではな
い。EXAMPLES The present invention will be specifically described below with reference to examples. However, the present invention is not limited to the embodiment.
【００２５】実施例１〜３ 大きさ600 ×900mm2、厚さ５mmのクリアガラス(Fl5) を
中性洗剤、水すすぎ、イソプロピルアルコールで順次洗
浄し、乾燥した後、DCマグネトロンスパッタリング装置
の真空槽内にセットしてあるTiのターゲットに対向して
上方を往復できるようセットし、次に前記槽内を真空ポ
ンプで約５×10-6Torrまでに脱気した後、該真空槽内に
O2ガス（但し、ArとO2ガスの流量比は1:1 から0:1 の範
囲であればよい。）を導入して真空度を約２×10-3Torr
に保持し、前記Tiのターゲットに約1.9kw の電力を印加
し、O2ガスによるDCマグネトロンスパッタの中を、前記
Tiのターゲット上方においてスピード約112mm ／min で
前記板ガラスを搬送することによって約10nm厚さのTiO2
薄膜を成膜し、TiO2薄膜付き板ガラスを得た。成膜が完
了した後、Tiターゲットへの印加を停止した。 Examples 1 to 3 Clear glass (Fl5) having a size of 600 × 900 mm 2 and a thickness of 5 mm was sequentially washed with a neutral detergent, water rinse, isopropyl alcohol and dried, and then dried in a vacuum chamber of a DC magnetron sputtering apparatus. It is set so as to be able to reciprocate upwards facing the target of Ti set inside, and then the inside of the chamber is degassed to about 5 × 10 −6 Torr by a vacuum pump, and then the inside of the vacuum chamber is set.
O 2 gas (however, the flow rate ratio of Ar and O 2 gas may be in the range of 1: 1 to 0: 1) is introduced and the degree of vacuum is set to about 2 × 10 −3 Torr.
Then, a power of about 1.9 kw was applied to the Ti target, and the inside of the DC magnetron sputter by O 2 gas was
By transporting the plate glass at a speed of about 112 mm / min above the Ti target, TiO 2 with a thickness of about 10 nm can be obtained.
A thin film was formed to obtain a plate glass with a TiO 2 thin film. After the film formation was completed, the application to the Ti target was stopped.
【００２６】上述と同様にして、上記以外に膜厚が12n
m、20nm、30nm、35nm、38nmのTiO2薄膜を成膜し、また
これらの各膜厚について板ガラスの板厚を5mm 、6mm 、
8mm 、10mm、12mm、15mm、19mmと変えて実施しTiO2薄膜
付き板ガラスを得た。Other than the above, the film thickness is 12n in the same manner as described above.
m, 20 nm, 30 nm, 35 nm, 38 nm TiO 2 thin films are formed, and the plate thickness of each of these film thicknesses is 5 mm, 6 mm,
The plate glass with a TiO 2 thin film was obtained by changing the steps to 8 mm, 10 mm, 12 mm, 15 mm and 19 mm.
【００２７】得られたTiO2薄膜付き板ガラスについて、
可視光透過率（Tv：380 〜780nm ）、可視光反射率（R
v：380 〜780nm ）、可視光反射率差、刺激純度（Pe：3
80 〜780nm ）ならびに日射透過率（Ts：340 〜1800n
m）と日射反射率（Rs：340 〜1800nm）等については340
型自記分光光度計（日立製作所製）とJISZ8722、JISR3
106によってそれぞれその光学的特性を求め、その一部
を表１、ならびに図１乃至図３に可視光透過率、平均可
視光反射率、可視光反射率差および刺激純度について示
した。Regarding the obtained plate glass with a TiO 2 thin film,
Visible light transmittance (Tv: 380-780nm), visible light reflectance (R
v: 380-780nm), visible light reflectance difference, stimulation purity (Pe: 3
80 to 780nm) and solar radiation transmittance (Ts: 340 to 1800n)
m) and solar reflectance (Rs: 340 to 1800 nm), etc.
Type self-recording spectrophotometer (Hitachi) and JISZ8722, JISR3
The optical characteristics were determined by 106 respectively, and a part thereof is shown in Table 1 and FIGS. 1 to 3 for visible light transmittance, average visible light reflectance, visible light reflectance difference and stimulus purity.
【００２８】また、表面抵抗率については、105 Ω／口
以下のものは四探針抵抗測定装置RT-8（NAPSON社製）、
105 Ω／口〜105 ＭΩ／口Ｋのものは表面高抵抗計HIRE
STAHT-210（三菱油化社製）によって測定し、その一部
について１ｋΩ／口以上を○印、１ｋΩ／口未満を×印
で表１に示した。Regarding the surface resistivity, the one having a resistance of 10 5 Ω / port or less is a four-point probe resistance measuring device RT-8 (manufactured by NAPSON),
10 5 Ω / port to 10 5 MΩ / port K is a surface high resistance meter HIRE
STAHT-210 (manufactured by Mitsubishi Petrochemical Co., Ltd.) was measured, and about 1 part thereof, 1 kΩ / port or more is shown by a circle, and less than 1 kΩ / port is shown by a cross in Table 1.
【００２９】さらに、同様にその一部について、生産性
等を加味したコスト上良好なものは○印、良好でないも
のは×印で表１に示し、上述した各特性ならびに外観上
等から所期の居住性を高めたガラス板となったものを総
合的評価として○印、所期のものではないものを×印で
それぞれ表１に示した。Further, similarly, regarding some of them, those having good cost in consideration of productivity and the like are indicated by ◯, and those which are not favorable are indicated by X in Table 1, which is expected from the above-mentioned characteristics and appearance. Table 1 shows a glass plate with improved habitability as a comprehensive evaluation, and X shows a glass plate that is not expected as a comprehensive evaluation.
【００３０】その結果、単層膜であるTiO2薄膜付き板ガ
ラスは、可視光透過率が67〜86％程度、可視光反射率が
10〜30％程度かつガラス面と膜面の可視光反射率差が3.
5 ％以内であり、所期の居住性を高めたガラス板であっ
た。さらに刺激純度が５〜20％程度にあってより優れた
所期のものとなった。その膜厚は約10〜35nm程度であっ
た。As a result, the plate glass with a TiO 2 thin film, which is a single layer film, has a visible light transmittance of about 67 to 86% and a visible light reflectance.
About 10 to 30% and the difference in visible light reflectance between the glass surface and the film surface is 3.
It was within 5%, and it was a glass plate with improved desired habitability. Furthermore, the stimulation purity was about 5 to 20%, which was a more excellent target. The film thickness was about 10 to 35 nm.
【００３１】実施例４〜８ 実施例１と同様の方法に、DCマグネトロンスパッタリン
グ装置の真空槽内にセットしてあるSnのターゲットに対
向して上方を往復できるようセットし、次に前記槽内を
真空ポンプで約５×10-6Torrまでに脱気した後、該真空
槽内にO2ガス（但し、ArとO2ガスの流量比は1:1 から0:
1 の範囲であればよい。）を導入して真空度を約２×10
-3Torrに保持し、前記Snのターゲットに約0.4kw の電力
を印加し、O2ガスによるDCマグネトロンスパッタの中
を、前記Snのターゲット上方においてスピード約330mm
／min で前記板ガラスを搬送することによって約10nm厚
さのSnO2薄膜を成膜した。成膜が完了した後、Snターゲ
ットへの印加を停止した。 Examples 4 to 8 In the same manner as in Example 1, the Sn target set in the vacuum chamber of the DC magnetron sputtering apparatus was set so as to be able to reciprocate upward, and then in the chamber. Was degassed to about 5 × 10 −6 Torr with a vacuum pump, and then O 2 gas (however, the flow rate ratio of Ar and O 2 gas was 1: 1 to 0: 0) in the vacuum chamber.
It should be in the range of 1. ) Is introduced and the degree of vacuum is about 2 × 10
-3 Torr, the target of Sn is applied with electric power of about 0.4kw, and the DC magnetron sputter by O 2 gas is spun on the target of Sn at a speed of about 330mm.
The SnO 2 thin film having a thickness of about 10 nm was formed by transporting the plate glass at a flow rate of 1 / min. After the film formation was completed, the application to the Sn target was stopped.
【００３２】上述したと同様にして、上記以外にSnO2薄
膜の膜厚を12nm、20nm、30nm、35nm、38nmと成膜した。
またこれらの各膜厚について板ガラスの板厚を５mm、６
mm、８mm、10mm、12mm、15mm、19mmと変えて同様に実施
した。In the same manner as described above, other than the above, the SnO 2 thin films were formed to have film thicknesses of 12 nm, 20 nm, 30 nm, 35 nm and 38 nm.
For each of these film thicknesses, the plate thickness of the plate glass is 5 mm, 6
mm, 8 mm, 10 mm, 12 mm, 15 mm, and 19 mm were changed, and the same operation was performed.
【００３３】得られたSnO2薄膜付き板ガラスについて、
実施例１と同様に各装置を用いて各測定を行った。その
結果の一部を表１、ならびに図４〜６に可視光透過率、
平均可視光反射率、可視光反射率差および刺激純度につ
いて示す。About the obtained plate glass with SnO 2 thin film,
Each measurement was performed using each device in the same manner as in Example 1. A part of the result is shown in Table 1 and FIGS.
The average visible light reflectance, visible light reflectance difference, and stimulus purity are shown.
【００３４】実施例１と同様、単層膜であるSnO2薄膜付
き板ガラスは、可視光透過率が67〜86％程度、可視光反
射率が10〜30％程度かつガラス面と膜面の可視光反射率
差が3.5 ％以内であり、所期の居住性を高めたガラス板
であった。さらに刺激純度が５〜15％程度にあってより
優れた所期のものとなった。その膜厚は約15〜55nm程度
であった。As with Example 1, the SnO 2 thin film-coated flat glass, which is a single-layer film, has a visible light transmittance of about 67 to 86%, a visible light reflectance of about 10 to 30%, and a visible glass surface and a film surface. The difference in light reflectance was 3.5% or less, and the glass plate was highly comfortable. Furthermore, the stimulation purity was about 5 to 15%, which was a more desirable product. The film thickness was about 15 to 55 nm.
【００３５】実施例９〜11 実施例１および２と同様に板ガラスを用意し、DCマグネ
トロンスパッタリング装置の真空槽内にセットしてある
TiとSnのターゲットに対向して上方を往復できるようセ
ットし、次に前記槽内を真空ポンプで約５×10-6Torrま
でに脱気した後、該真空槽内にO2ガス（但し、ArとO2ガ
スの流量比は1:1 から0:1 の範囲であればよい。）を導
入して真空度を約２×10-3Torrに保持し、前記Tiのター
ゲットに約1.9kw の電力を印加し、O2ガスによるDCマグ
ネトロンスパッタの中を、前記Tiのターゲット上方にお
いてスピード約112mm ／min で前記板ガラスを搬送する
ことによって約10nm厚さのTiO2薄膜を成膜した。成膜が
完了した後、Tiターゲットへの印加を停止した。 Examples 9 to 11 Sheet glass was prepared and set in the vacuum chamber of a DC magnetron sputtering apparatus as in Examples 1 and 2.
The Ti and Sn targets were set so as to be able to reciprocate upwards facing each other, and then the inside of the chamber was degassed by a vacuum pump to about 5 × 10 −6 Torr, and then O 2 gas (however, , The flow rate ratio of Ar and O 2 gas may be in the range of 1: 1 to 0: 1) and the vacuum degree is maintained at about 2 × 10 −3 Torr, and the target of Ti is about 1.9. A TiO 2 thin film having a thickness of about 10 nm was formed by conveying the plate glass at a speed of about 112 mm 3 / min above the Ti target in a DC magnetron sputter by O 2 gas while applying a power of kw. After the film formation was completed, the application to the Ti target was stopped.
【００３６】次に、板ガラスを前記真空槽内においたま
ま、前記Snのターゲットに約0.4kwの電力を印加し、O2
ガスによるDCマグネトロンスパッタの中を、前記Snのタ
ーゲット上方においてスピード約660mm ／min で前記板
ガラスを搬送することにより、前記板ガラスのTiO2薄膜
表面に約5nm 厚さのSnO2薄膜を成膜し積層した。Next, with the plate glass kept in the vacuum chamber, a power of about 0.4 kw was applied to the Sn target, and O 2 was added.
By transporting the plate glass above the Sn target at a speed of about 660 mm / min in a DC magnetron sputter by gas, a SnO 2 thin film with a thickness of about 5 nm was formed and laminated on the TiO 2 thin film surface of the plate glass. did.
【００３７】得られたSnO2薄膜／TiO2薄膜／板ガラスの
２層被膜板ガラスについて、実施例１と同様に各装置を
用いて各測定を行った。その結果の一部を表１、ならび
に図７〜９に可視光透過率、平均可視光反射率、可視光
反射率差および刺激純度について示す。Each of the obtained SnO 2 thin film / TiO 2 thin film / plate glass two-layer coated plate glass was measured by using each apparatus in the same manner as in Example 1. Some of the results are shown in Table 1 and FIGS. 7 to 9 for visible light transmittance, average visible light reflectance, visible light reflectance difference, and stimulation purity.
【００３８】実施例１と同様、２層膜であるSnO2薄膜と
TiO2薄膜付き板ガラスは、可視光透過率が67〜86％程
度、可視光反射率が10〜30％程度かつガラス面と膜面の
可視光反射率差が3.5 ％以内であり、所期の居住性を高
めたガラス板であった。さらに刺激純度が５〜25％程
度、好ましくは６％以上20％以下にある際により優れた
所期のものとなった。その膜厚はTiO2薄膜が約 5〜30nm
程度でかつSnO2薄膜が約 5〜30nm程度であった。As in Example 1, a SnO 2 thin film, which is a two-layer film,
The plate glass with a TiO 2 thin film has a visible light transmittance of about 67 to 86%, a visible light reflectance of about 10 to 30%, and a visible light reflectance difference between the glass surface and the film surface of 3.5% or less. It was a glass plate with enhanced habitability. Further, when the stimulation purity is about 5 to 25%, preferably 6% or more and 20% or less, it is more excellent. The film thickness is about 5 to 30 nm for TiO 2 thin film
And the SnO 2 thin film was about 5 to 30 nm.
【００３９】実施例12〜15 実施例３と同様に、板ガラスの表面に先ずDCマグネトロ
ンスパッタリング装置の真空槽内にセットしてあるSnと
Tiのターゲットに対向して上方を往復できるようセット
し、次に前記槽内を真空ポンプで約５×10-6Torrまでに
脱気した後、該真空槽内にO2ガス（但し、ArとO2ガスの
流量比は1:1 から0:1 の範囲であればよい。）を導入し
て真空度を約２×10-3Torrに保持し、前記Snのターゲッ
トに約0.4kw の電力を印加し、O2ガスによるDCマグネト
ロンスパッタの中を、前記Snのターゲット上方において
スピード約330mm ／min で前記板ガラスを搬送すること
によって約10nm厚さのSnO2薄膜を成膜した。成膜が完了
した後、Snターゲットへの印加を停止した。 Examples 12 to 15 As in Example 3, Sn on the surface of the plate glass was first set in the vacuum chamber of the DC magnetron sputtering apparatus.
It is set so as to be able to reciprocate upwards facing the target of Ti, and then the inside of the chamber is degassed to about 5 × 10 −6 Torr by a vacuum pump, and then O 2 gas (however, Ar And O 2 gas flow ratio may be in the range of 1: 1 to 0: 1.) And the vacuum degree is maintained at about 2 × 10 -3 Torr, and the target of Sn is about 0.4 kw. A SnO 2 thin film having a thickness of about 10 nm was formed by transporting the plate glass at a speed of about 330 mm 3 / min above the Sn target in DC magnetron sputtering with O 2 gas by applying electric power. After the film formation was completed, the application to the Sn target was stopped.
【００４０】次に、板ガラスを前記真空槽内においたま
ま、前記Snのターゲットに約1.9kwの電力を印加し、O2
ガスによるDCマグネトロンスパッタの中を、前記Tiのタ
ーゲット上方においてスピード約224mm ／min で前記板
ガラスを搬送することにより、前記板ガラスのSnO2薄膜
表面に約5nm 厚さのTiO2薄膜を成膜し積層した。Next, with the plate glass kept in the vacuum chamber, a power of about 1.9 kw was applied to the Sn target, and O 2 was added.
By transporting the plate glass above the Ti target at a speed of about 224 mm / min in a DC magnetron sputter by gas, a TiO 2 thin film with a thickness of about 5 nm was formed and laminated on the SnO 2 thin film surface of the plate glass. did.
【００４１】得られたTiO2薄膜／SnO2薄膜／板ガラスの
２層被膜板ガラスについて、実施例１と同様に各装置を
用いて各測定を行った。その結果の一部を表１、ならび
に図10〜12に可視光透過率、平均可視光反射率、可視光
反射率差および刺激純度について示す。Each of the obtained TiO 2 thin film / SnO 2 thin film / plate glass two-layer coated plate glass was measured by using each apparatus in the same manner as in Example 1. Some of the results are shown in Table 1 and FIGS. 10 to 12 for visible light transmittance, average visible light reflectance, visible light reflectance difference, and stimulation purity.
【００４２】実施例１と同様、２層膜であるTiO2薄膜と
SnO2薄膜付き板ガラスは、可視光透過率が67〜86％程
度、可視光反射率が10〜30％程度かつガラス面と膜面の
可視光反射率差が3.5 ％以内であり、所期の居住性を高
めたガラス板であった。さらに刺激純度が５〜25％程
度、より好ましくは６％以上20％以下にある際により優
れた所期のものとなった。その膜厚はSnO2薄膜が約 5〜
35nm程度でかつTiO2薄膜が約 5〜35nm程度であった。As in Example 1, a TiO 2 thin film which is a two-layer film and
The SnO 2 thin film-coated flat glass has a visible light transmittance of 67 to 86%, a visible light reflectance of 10 to 30%, and a visible light reflectance difference of 3.5% or less between the glass surface and the film surface. It was a glass plate with enhanced habitability. Further, when the stimulation purity is about 5 to 25%, and more preferably 6% or more and 20% or less, it is more excellent. The thickness of SnO 2 thin film is about 5 ~
It was about 35 nm and the TiO 2 thin film was about 5 to 35 nm.
【００４３】[0043]
【表１】 [Table 1]
【００４４】比較例１〜６ 実施例１と同様の方法に、DCマグネトロンスパッタリン
グ装置の真空槽内にセットしてあるTiのターゲットに対
向して上方を往復できるようセットし、次に前記槽内を
真空ポンプで約５×10-6Torrまでに脱気した後、該真空
槽内にN2ガス（但し、ArとN2ガスの流量比は1:1 から0:
1 の範囲であればよい。）を導入して真空度を約２×10
-3Torrに保持し、前記Tiのターゲットに約1.5kw の電力
を印加し、N2ガスによるDCマグネトロンスパッタの中
を、前記Tiのターゲット上方においてスピード約304mm
／min で前記板ガラスを搬送することによって約10nm厚
さのTiN 薄膜を成膜した。成膜が完了した後、Tiターゲ
ットへの印加を停止した。 Comparative Examples 1 to 6 In the same manner as in Example 1, a DC magnetron sputtering apparatus was set so as to be able to reciprocate upwards facing a Ti target set in a vacuum chamber, and then in the chamber. Was degassed to about 5 × 10 −6 Torr with a vacuum pump, and then N 2 gas (however, the flow ratio of Ar and N 2 gas was from 1: 1 to 0:
It should be in the range of 1. ) Is introduced and the degree of vacuum is about 2 × 10
Hold at -3 Torr, apply a power of about 1.5kw to the Ti target, and in the DC magnetron sputter with N 2 gas, the speed is about 304mm above the Ti target.
A TiN thin film having a thickness of about 10 nm was formed by transporting the plate glass at a flow rate of 1 / min. After the film formation was completed, the application to the Ti target was stopped.
【００４５】同様にして、TiN 薄膜の膜厚を１nm、２n
m、３nm、４nm、５nm、６nm、７nm、８nm、９nm、10nm
と成膜した。またこれらの各膜厚について板ガラスの板
厚を5mm 、６mm、８mm、10mm、12mm、15mm、19mmと変え
て同様に実施した。Similarly, the thickness of the TiN thin film is set to 1 nm, 2n.
m, 3nm, 4nm, 5nm, 6nm, 7nm, 8nm, 9nm, 10nm
Was deposited. Further, for each of these film thicknesses, the plate thickness of the plate glass was changed to 5 mm, 6 mm, 8 mm, 10 mm, 12 mm, 15 mm and 19 mm, and the same operation was performed.
【００４６】得られたTiN 薄膜付き板ガラスについて、
実施例１と同様に各装置を用いて各測定を行った。その
うちの5mm 厚のみの結果を表２ならびに図13〜15に、可
視光透過率、平均可視光反射率、可視光反射率差および
刺激純度について示す。Regarding the obtained plate glass with TiN thin film,
Each measurement was performed using each device in the same manner as in Example 1. The results of only 5 mm thickness are shown in Table 2 and FIGS. 13 to 15 for visible light transmittance, average visible light reflectance, visible light reflectance difference and stimulation purity.
【００４７】単層膜であるTiN 薄膜付き板ガラスは、可
視光透過率が膜厚５nmで70.8％程度、６nmで67.9％程度
となるものの、平均可視光反射率が10％程度未満かつガ
ラス面と膜面の可視光反射率差が５％を超えるようにな
り、他は所期の所定範囲外となって所期の居住性を高め
たガラス板とは言い難く、さらに刺激純度が比較的低く
到底所期のめざすものとは言えないものであった。膜厚
が約40nm程度より厚くなると次第に電波反射性を強める
ようになり、またコスト上も大幅な増加になるものであ
った。The plate glass with a TiN thin film, which is a single-layer film, has a visible light transmittance of about 70.8% at a film thickness of 5 nm and about 67.9% at a film thickness of 6 nm, but has an average visible light reflectance of less than about 10% and a glass surface. The visible light reflectance difference of the film surface has exceeded 5%, and it is difficult to say that it is a glass plate that is outside the desired range and has improved the desired habitability, and the stimulation purity is relatively low. It was not what we were aiming for. When the film thickness became thicker than about 40 nm, the radio wave reflectivity gradually became stronger, and the cost also greatly increased.
【００４８】比較例７〜９ 実施例１乃至４に示した範囲外については、その結果を
全て詳細に示さなかったが図１乃至12を組み合わしてみ
れば、また表２によれば明らかなように、所定の範囲外
が単独または複数となり、到底所期のめざす居住性を高
めたガラス板とはならないものであった。表２に示した
条件では電波透過性、コストとも特に大きな問題はなか
った。 Comparative Examples 7 to 9 Results outside of the ranges shown in Examples 1 to 4 were not shown in detail, but it is clear from combining Tables 1 to 12 and Table 2. As described above, the outside of the predetermined range is singular or plural, and the glass plate is not a glass plate having an improved habitability which is the ultimate goal. Under the conditions shown in Table 2, there were no particular problems in terms of radio wave transparency and cost.
【００４９】[0049]
【表２】 [Table 2]
【００５０】[0050]
【発明の効果】以上前述したように、本発明によれば、
透明基板上に薄膜層を形成したガラス板の可視光透過
率、平均可視光反射率ならびに可視光反射率差を特定
し、またさらに膜厚や刺激純度等を特定したものとした
ことにより、ガラスらしさを充分発揮してアッピール
し、透明感と存在観ならびに透視性とミラー性を発現さ
せてバランスよく同時に満足しうるものとでき、耐薬品
性、耐候性あるいは耐摩耗性等耐久性を備え、しかも電
波透過性を有する居住性を高めたガラス板を簡単な膜構
成で安価に提供することができ、建築用窓材としてはも
ちろん、ビルディング等各種の用途にその機能を発揮す
る、居住性と環境性に優れたガラス板を提供するもので
ある。As described above, according to the present invention,
By determining the visible light transmittance, the average visible light reflectance and the visible light reflectance difference of the glass plate on which the thin film layer is formed on the transparent substrate, and by further specifying the film thickness, the stimulation purity, etc. It is possible to fully demonstrate its uniqueness and appeal, and to develop a transparent feeling and presence, as well as transparency and mirror property, which can be satisfied at the same time in a well-balanced manner, with durability such as chemical resistance, weather resistance or abrasion resistance, Moreover, it is possible to provide a glass plate having radio wave permeability and improved comfortability at a low cost with a simple film structure, and not only as a window material for construction, but also as a window material for buildings, it exhibits its function in comfortability. It is intended to provide a glass plate having excellent environmental properties.
【図１】本発明の居住性を高めたガラス板に係わる可視
光透過率を板厚５、10、15、19mmでTiO2薄膜層の膜厚に
対する関係を示す説明図である。FIG. 1 is an explanatory diagram showing the relationship between the visible light transmittance of a glass plate having improved comfortability according to the present invention and the thickness of a TiO 2 thin film layer at plate thicknesses of 5, 10, 15, and 19 mm.
【図２】本発明の居住性を高めたガラス板に係わる平均
可視光反射率と可視光反射率差を板厚５、10、15、19mm
でTiO2薄膜層の膜厚に対する関係を示す説明図である。FIG. 2 shows the average visible light reflectance and the visible light reflectance difference relating to the glass plate of the present invention with enhanced comfortability, with plate thicknesses of 5, 10, 15, 19 mm.
FIG. 3 is an explanatory diagram showing a relationship with the film thickness of a TiO 2 thin film layer.
【図３】本発明の居住性を高めたガラス板に係わる刺激
純度を板厚５、19mmでTiO2薄膜層の膜厚に対する関係を
示す説明図である。FIG. 3 is an explanatory diagram showing the relationship between the stimulus purity of the glass plate of the present invention having improved comfortability and the film thickness of the TiO 2 thin film layer when the plate thickness is 5 and 19 mm.
【図４】本発明の居住性を高めたガラス板に係わる可視
光透過率を板厚５、12mmでSnO2薄膜層の膜厚に対する関
係を示す説明図である。FIG. 4 is an explanatory diagram showing the relationship between the visible light transmittance of the glass plate of the present invention having improved comfortability and the film thickness of the SnO 2 thin film layer when the plate thickness is 5 and 12 mm.
【図５】本発明の居住性を高めたガラス板に係わる平均
可視光反射率と可視光反射率差を板厚５、12mmでSnO2薄
膜層の膜厚に対する関係を示す説明図である。FIG. 5 is an explanatory diagram showing the relationship between the average visible light reflectance and the difference in visible light reflectance relating to the glass plate of the present invention with improved comfortability with respect to the film thickness of the SnO 2 thin film layer when the plate thickness is 5 and 12 mm.
【図６】本発明の居住性を高めたガラス板に係わる刺激
純度を板厚５、12mmでSnO2薄膜層の膜厚に対する関係を
示す説明図である。FIG. 6 is an explanatory diagram showing the relationship between the stimulus purity of the glass plate of the present invention having improved comfortability and the film thickness of the SnO 2 thin film layer when the plate thickness is 5 and 12 mm.
【図７】本発明の居住性を高めたガラス板に係わる可視
光透過率を板厚５mmで第１層目がTiO2薄膜層と第２層目
がSnO2薄膜層からなる２層の膜厚に対する関係を示す説
明図である。FIG. 7 is a two- layer film having a visible light transmittance of a glass plate of 5 mm in thickness and having a TiO 2 thin film layer as a first layer and a SnO 2 thin film layer as a second layer. It is explanatory drawing which shows the relationship with thickness.
【図８】本発明の居住性を高めたガラス板に係わる平均
可視光反射率と可視光反射率差を板厚５mmで第１層目が
TiO2薄膜層と第２層目がSnO2薄膜層からなる２層の膜厚
に対する関係を示す説明図である。FIG. 8 shows the average visible light reflectance and the visible light reflectance difference relating to the glass plate of the present invention with enhanced comfortability when the thickness of the first layer is 5 mm.
TiO 2 thin film layer and the second layer is an explanatory diagram showing a relationship with respect to the film thickness of the two layers of SnO 2 thin film layer.
【図９】本発明の居住性を高めたガラス板に係わる刺激
純度を板厚５mmで第１層目がTiO2薄膜層と第２層目がSn
O2薄膜層からなる２層の膜厚に対する関係を示す説明図
である。FIG. 9 shows the stimulating purity of the glass plate of the present invention having enhanced comfortability with a plate thickness of 5 mm, the first layer being a TiO 2 thin film layer and the second layer being Sn.
Film of two layers of O 2 thin film layer is an explanatory diagram showing the relationship of the thickness.
【図10】本発明の居住性を高めたガラス板に係わる可視
光透過率を板厚５mmで第１層目がSnO2薄膜層と第２層目
がTiO2薄膜層からなる２層の膜厚に対する関係を示す説
明図である。FIG. 10 is a two- layer film having a visible light transmittance of a glass plate of 5 mm in thickness and a first layer of which is a SnO 2 thin film layer and a second layer of which is a TiO 2 thin film layer. It is explanatory drawing which shows the relationship with thickness.
【図11】本発明の居住性を高めたガラス板に係わる平均
可視光反射率と可視光反射率差を板厚５mmで第１層目が
SnO2薄膜層と第２層目がTiO2薄膜層からなる２層の膜厚
に対する関係を示す説明図である。FIG. 11 shows the average visible light reflectance and the visible light reflectance difference relating to the glass plate of the present invention with enhanced comfortability when the first layer has a thickness of 5 mm.
SnO 2 thin film layer and the second layer is an explanatory diagram showing a relationship with respect to the film thickness of the two layers of TiO 2 thin film layer.
【図12】本発明の居住性を高めたガラス板に係わる刺激
純度を板厚５mmで第１層目がSnO2薄膜層と第２層目がTi
O2薄膜層からなる２層の膜厚に対する関係を示す説明図
である。[FIG. 12] The stimulating purity of the glass plate of the present invention having enhanced comfortability is a plate thickness of 5 mm, the first layer is a SnO 2 thin film layer, and the second layer is Ti.
Film of two layers of O 2 thin film layer is an explanatory diagram showing the relationship of the thickness.
【図13】比較例として、可視光透過率を板厚５mmでTiN
薄膜層の膜厚に対する関係を示す説明図である。FIG. 13 shows, as a comparative example, a visible light transmittance of TiN at a plate thickness of 5 mm.
It is explanatory drawing which shows the relationship with respect to the film thickness of a thin film layer.
【図14】比較例として、平均可視光反射率と可視光反射
率差を板厚５mmでTiN 薄膜層の膜厚に対する関係を示す
説明図である。FIG. 14 is an explanatory diagram showing the relationship between the average visible light reflectance and the visible light reflectance difference with respect to the film thickness of a TiN thin film layer at a plate thickness of 5 mm, as a comparative example.
【図15】比較例として、刺激純度を板厚５mmでTiN 薄膜
層の膜厚に対する関係を示す説明図である。FIG. 15 is an explanatory diagram showing the relationship between stimulation purity and film thickness of a TiN thin film layer with a plate thickness of 5 mm as a comparative example.
Claims (10)
ス板において、可視光透過率が67〜86％であって、しか
もガラス面と膜面の平均可視光反射率を10〜30％かつガ
ラス面と膜面の可視光反射率差が3.5 ％以下であること
を特徴とする居住性を高めたガラス板。1. A glass plate having a thin film layer formed on the surface of a transparent substrate, having a visible light transmittance of 67 to 86% and an average visible light reflectance of the glass surface and the film surface of 10 to 30%. A glass plate with enhanced habitability characterized by a visible light reflectance difference of 3.5% or less between the glass surface and the film surface.
る請求項１記載の居住性を高めたガラス板。2. The glass plate with enhanced habitability according to claim 1, wherein the thin film layer is a single layer.
る請求項１記載の居住性を高めたガラス板。3. The glass plate with enhanced habitability according to claim 1, wherein the thin film layer has two layers.
これらを主体とする複合酸化物からなることを特徴とす
る請求項１乃至３記載の居住性を高めたガラス板。4. The glass plate with enhanced habitability according to claim 1, wherein the thin film layer is made of TiO 2 or SnO 2 and a composite oxide mainly containing them.
膜層の膜厚が５nm以上35nm以下であって、刺激純度が５
〜25％であることを特徴とする請求項１記載の居住性を
高めたガラス板。5. The glass plate with enhanced comfortability, wherein the TiO 2 thin film layer has a film thickness of 5 nm or more and 35 nm or less and a stimulation purity of 5
The glass plate with improved habitability according to claim 1, wherein the glass plate is -25%.
膜層の膜厚が15nm以上55nm以下であって、刺激純度が５
〜25％であることを特徴とする請求項１記載の居住性を
高めたガラス板。6. The glass plate with enhanced comfortability, wherein the SnO 2 thin film layer has a film thickness of 15 nm or more and 55 nm or less and a stimulation purity of 5 or less.
The glass plate with improved habitability according to claim 1, wherein the glass plate is -25%.
板表面から第１層目としてTiO2薄膜層、その上に第２層
目としてSnO2薄膜層を積層した２層からなるものであっ
て、その各層の膜厚が５nm以上30nm以下であって、刺激
純度が５〜25％であることを特徴とする請求項１記載の
居住性を高めたガラス板。7. The glass plate with improved comfort is composed of two layers in which a TiO 2 thin film layer as a first layer and a SnO 2 thin film layer as a second layer are laminated on the glass plate surface. The glass plate with enhanced habitability according to claim 1, wherein the thickness of each layer is 5 nm or more and 30 nm or less and the stimulation purity is 5 to 25%.
板表面から第１層目としてSnO2薄膜層、その上に第２層
目としてTiO2薄膜層を積層した２層からなるものであっ
て、その各層の膜厚が５nm以上35nm以下であって、刺激
純度が５〜25％であることを特徴とする請求項１記載の
居住性を高めたガラス板。8. The glass plate having enhanced comfortability is composed of two layers in which a SnO 2 thin film layer as a first layer and a TiO 2 thin film layer as a second layer are laminated on the glass plate surface as a first layer. The glass plate with enhanced habitability according to claim 1, wherein the thickness of each layer is 5 nm or more and 35 nm or less, and the stimulation purity is 5 to 25%.
ことを特徴とする請求項１乃至８記載の居住性を高めた
ガラス板。9. The glass plate with enhanced habitability according to claim 1, wherein the transparent substrate has a plate thickness of 5 to 19 mm.
過性を有することを特徴とする請求項１乃至９記載の居
住性を高めたガラス板。10. The glass plate with enhanced habitability according to claim 1, wherein the glass plate with enhanced habitability has radio wave transparency.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7102394A JP2895741B2 (en) | 1994-04-08 | 1994-04-08 | Glass plate with enhanced livability |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7102394A JP2895741B2 (en) | 1994-04-08 | 1994-04-08 | Glass plate with enhanced livability |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07277772A true JPH07277772A (en) | 1995-10-24 |
| JP2895741B2 JP2895741B2 (en) | 1999-05-24 |
Family
ID=13448520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7102394A Expired - Fee Related JP2895741B2 (en) | 1994-04-08 | 1994-04-08 | Glass plate with enhanced livability |
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| Country | Link |
|---|---|
| JP (1) | JP2895741B2 (en) |
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1994
- 1994-04-08 JP JP7102394A patent/JP2895741B2/en not_active Expired - Fee Related
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|---|---|
| JP2895741B2 (en) | 1999-05-24 |
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