JPH07277763A - Glass for liquid crystal display substrate - Google Patents
Glass for liquid crystal display substrateInfo
- Publication number
- JPH07277763A JPH07277763A JP3828195A JP3828195A JPH07277763A JP H07277763 A JPH07277763 A JP H07277763A JP 3828195 A JP3828195 A JP 3828195A JP 3828195 A JP3828195 A JP 3828195A JP H07277763 A JPH07277763 A JP H07277763A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- liquid crystal
- crystal display
- less
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は液晶ディスプレイ基板用
ガラスに係り、特にアクティブマトリクス駆動方式の汎
用液晶ディスプレイに用いる基板用ガラスとして好適
な、液晶ディスプレイ基板用ガラスに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass for a liquid crystal display substrate, and more particularly to a glass for a liquid crystal display substrate suitable as a glass for a substrate used in a general-purpose liquid crystal display of an active matrix driving system.
【０００２】[0002]
【従来の技術】液晶ディスプレイは、ＣＲＴ（カソード
レイチューブ、ブラウン管）に比べて消費電力が低く、
低電圧で駆動させることができ、軽量化や薄型化が容易
である等の利点を有している。中でも、ＴＦＴ（薄膜ト
ランジスタ）形の電界効果トランジスタを用いたアクテ
ィブマトリクス駆動方式の液晶ディスプレイは、非常に
多くの走査電極を設けることができるために画素の高密
度化や高精細化が容易であり、デューティー比が高く、
かつ透過表示が可能なため、ＣＲＴに代わるフルカラー
ディスプレーとして注目されている。2. Description of the Related Art Liquid crystal displays have lower power consumption than CRTs (cathode ray tubes, cathode ray tubes).
It has the advantages that it can be driven at a low voltage and that it can be made lighter and thinner. In particular, an active matrix drive type liquid crystal display using a TFT (thin film transistor) type field effect transistor can be provided with a large number of scanning electrodes, and therefore, high density and high definition of pixels are easy, High duty ratio,
In addition, since it is capable of transparent display, it is drawing attention as a full-color display that replaces CRTs.
【０００３】このＴＦＴ形の電界効果トランジスタを用
いたアクティブマトリクス駆動方式の液晶ディスプレイ
は、ガラスや石英等の透明基板上に形成する半導体トラ
ンジスタの材質により、アモルファスシリコン（α−Ｓ
ｉ）ＴＦＴ形やポリシリコン（Ｐ−Ｓｉ）ＴＦＴ形等に
分けることができる。An active matrix drive type liquid crystal display using the TFT type field effect transistor is made of amorphous silicon (α-S) depending on the material of a semiconductor transistor formed on a transparent substrate such as glass or quartz.
i) It can be divided into a TFT type and a polysilicon (P-Si) TFT type.
【０００４】α−ＳｉＴＦＴおよびＰ−ＳｉＴＦＴは、
いずれも、透明基板上にα−Ｓｉ膜またはＰ−Ｓｉ膜を
成膜した後、フォトリソグラフィーに基づくパターニン
グ工程を繰返し行うことにより成形される。このため、
ＴＦＴが形成される透明基板には、ＴＦＴの材料の線膨
張係数に近似する線膨張係数を有することの他に、耐熱
性に優れること、化学的耐久性に優れること等が要求さ
れる。Α-SiTFT and P-SiTFT are
In either case, after forming the α-Si film or the P-Si film on the transparent substrate, the patterning process based on photolithography is repeatedly performed to mold the film. For this reason,
The transparent substrate on which the TFT is formed is required to have a coefficient of linear expansion close to that of the material of the TFT, excellent heat resistance, and excellent chemical durability.
【０００５】このような要求を満たす透明基板として
は、シリカガラスがあるが、高価であるため、汎用の液
晶ディスプレイ用基板としては不適である。このため、
α−ＳｉＴＦＴ形の汎用液晶ディスプレイにおいては、
シリカガラスに代わるものとして、バリウム硼珪酸無ア
ルカリガラスが多用されている。Silica glass is a transparent substrate that meets such requirements, but it is not suitable as a general-purpose liquid crystal display substrate because it is expensive. For this reason,
In the α-Si TFT type general-purpose liquid crystal display,
Barium borosilicate alkali-free glass is often used as an alternative to silica glass.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、バリウ
ム硼珪酸無アルカリガラスは、歪点が低く、線膨脹係数
も大きいため、これをＰ−ＳｉＴＦＴ形の液晶ディスプ
レイの基板として使用した場合、Ｐ−ＳｉＴＦＴはα−
ＳｉＴＦＴより高温下で形成されるために、耐熱性等の
面で難点が生じる。However, since barium borosilicate non-alkali glass has a low strain point and a large linear expansion coefficient, when it is used as a substrate of a P-SiTFT type liquid crystal display, P-SiTFT is used. Is α-
Since it is formed at a temperature higher than that of SiTFT, there are problems in heat resistance and the like.
【０００７】したがって本発明の目的は、上記バリウム
硼珪無アルカリガラスの欠点を解消し、α−ＳｉＴＦＴ
だけでなくＰ−ＳｉＴＦＴ形の汎用液晶ディスプレイの
基板としても好適な、液晶ディスプレイ基板用ガラスを
提供することにある。Therefore, an object of the present invention is to solve the above-mentioned drawbacks of barium borosilicate alkali-free glass and to provide an α-Si TFT.
Another object of the present invention is to provide a glass for a liquid crystal display substrate, which is suitable not only as a substrate for a P-SiTFT type general-purpose liquid crystal display.
【０００８】[0008]
【課題を解決するための手段】本発明は上記目的を達成
するためになされたものであり、本発明の液晶ディスプ
レイ基板用ガラスは、モル％表示による各成分の含有量
が ＳｉＯ2 ６２％以上６８％以下 Ｂ2Ｏ3 ８％以上１２％未満 Ａ１2Ｏ3 ９％以上１３％以下 ＭｇＯ １％以上５％以下 ＣａＯ ３％以上７％以下 であり、平均線膨脹係数α100-300が３９×１０-7deg-1
・cm-1未満であることを特徴とするものである。The present invention has been made to achieve the above object, and the glass for a liquid crystal display substrate of the present invention has a content of each component represented by mol% of SiO 2 of 62% or more. 68% or less B 2 O 3 8% or more and less than 12% A1 2 O 3 9% or more and 13% or less MgO 1% or more and 5% or less CaO 3% or more and 7% or less, and an average linear expansion coefficient α 100-300 of 39 × 10 -7 deg -1
-It is characterized by being less than cm -1 .
【０００９】以下、本発明を詳細に説明する。The present invention will be described in detail below.
【００１０】本発明の液晶ディスプレイ基板用ガラス
は、上述のように、ＳｉＯ2、Ｂ2Ｏ3、Ａ１2Ｏ3、ＭｇＯ、
ＣａＯを含有し、各成分の含有量は、モル％表示でそれ
ぞれ上記の値に限定される。これらの限定理由は、以下
の通りである。The glass for a liquid crystal display substrate of the present invention, as described above, contains SiO 2 , B 2 O 3 , A1 2 O 3 , MgO,
It contains CaO, and the content of each component is limited to the above value in terms of mol%. The reasons for these limitations are as follows.
【００１１】ＳｉＯ2の含有量が６８モル％を超えると
粘性が高くなって熔融性が低下し、６２モル％未満では
得られるガラスの歪点が低下し過ぎる。When the content of SiO 2 exceeds 68 mol%, the viscosity becomes high and the meltability deteriorates, and when it is less than 62 mol%, the strain point of the obtained glass becomes too low.
【００１２】また、Ｂ2Ｏ3の含有量が１２モル％以上で
は得られるガラスの歪点が低下し過ぎると共に耐硝酸性
が低下し、８モル％未満では粘性が高くなって熔融性が
低下すると共に、得られるガラスの耐弗酸性が低下す
る。When the content of B 2 O 3 is 12 mol% or more, the strain point of the obtained glass is too low and the nitric acid resistance is low, and when it is less than 8 mol%, the viscosity is high and the meltability is low. At the same time, the hydrofluoric acid resistance of the obtained glass decreases.
【００１３】Ａ１2Ｏ3の含有量が１３モル％を超えると
得られるガラスの耐失透性が低下すると共に、このガラ
スに弗酸を接触させたときに、弗酸によりガラス表面が
白濁し易くなる。一方、Ａ１2Ｏ3の含有量が９モル％未
満では得られるガラスの歪点が低下し過ぎる。When the content of A1 2 O 3 exceeds 13 mol%, the devitrification resistance of the glass obtained is lowered, and when the glass is brought into contact with hydrofluoric acid, the glass surface becomes clouded by the hydrofluoric acid. It will be easier. On the other hand, if the content of A1 2 O 3 is less than 9 mol%, the strain point of the obtained glass will be too low.
【００１４】ＭｇＯは、得られるガラスの膨張係数と粘
性とを低下させる成分としてアルカリ土類酸化物中で最
も効果的な成分であるため、１モル％以上含有させる必
要があるが、５モル％を超えて含有させると得られるガ
ラスの耐失透性が低下する。Since MgO is the most effective component in the alkaline earth oxides as a component for lowering the expansion coefficient and viscosity of the obtained glass, it must be contained in an amount of 1 mol% or more, but 5 mol% If it is contained in excess of 1.0, the devitrification resistance of the glass obtained will be reduced.
【００１５】また、ＣａＯはＭｇＯとほぼ類似した作用
を有するため３モル％以上必要であるが、７モル％を超
えて含有させると得られるガラスの耐失透性が低下す
る。Further, CaO needs to be 3 mol% or more because it has an action substantially similar to MgO, but if it is contained in excess of 7 mol%, the devitrification resistance of the glass obtained will be lowered.
【００１６】ＳｒＯおよびＢａＯは共に、得られるガラ
スの耐失透性を向上させる成分として効果的な成分であ
り、かつ粘性を高めて熔融性を低下させると共に得られ
ガラスの歪点を低下させ、かつ膨張係数を大きくさせる
成分でもあるため、所望により加えることができる。加
える場合はその含有量はそれぞれ３モル％未満が好まし
く、両者の合量も５モル％以下が好ましい。。Both SrO and BaO are effective components for improving the devitrification resistance of the glass to be obtained, and also increase the viscosity to lower the meltability and the strain point of the obtained glass, It is also a component that increases the expansion coefficient, so that it can be added if desired. When added, the content is preferably less than 3 mol% and the total content of both is preferably 5 mol% or less. .
【００１７】そして、これらの成分の合量は、９５モル
％以上が好ましい。各成分の含有量が上述の範囲内にあ
っても、これらの成分の合量が９５モル％未満では所望
の特性が得られなくなるため、好ましくない。The total amount of these components is preferably 95 mol% or more. Even if the content of each component is within the above range, if the total amount of these components is less than 95 mol%, the desired properties cannot be obtained, which is not preferable.
【００１８】ガラスの成分およびその含有量、ならびに
各成分の合量を上述のように規定することにより、Ｐ−
Ｓｉの線膨張係数と近似する線膨張係数を有し、かつＰ
−ＳｉＴＦＴ形の液晶ディスプレイの基板としても使用
可能な歪点を有するガラス、より具体的には、１００〜
３００℃における平均線膨張係数が３４×１０-7以上３
９×１０-7deg-1・cm-1未満で、歪点が６３０℃以上であ
るガラスを得ることができる。そしてこのガラスは、熔
融性および成形性にも優れたガラスであるので、α−Ｓ
ｉＴＦＴ形だけでなくＰ−ＳｉＴＦＴ形の液晶ディスプ
レイの基板としても好適に用いられる。By defining the glass components and their contents, and the total amount of each component as described above, P-
Has a linear expansion coefficient close to that of Si, and P
Glass having a strain point that can be used as a substrate for a liquid crystal display of SiTFT type, more specifically, 100 to
Average linear expansion coefficient at 300 ℃ 34 × 10 -7 or more 3
It is possible to obtain a glass having a strain point of 630 ° C. or higher at 9 × 10 −7 deg −1 cm −1 or less. Since this glass is also a glass excellent in meltability and formability, α-S
It is preferably used not only as an iTFT type but also as a substrate for a P-SiTFT type liquid crystal display.
【００１９】また、本発明の液晶ディスプレイ基板用ガ
ラスは、前述したＳｉＯ2、Ｂ2Ｏ3、Ａ１2Ｏ3、ＭｇＯ、Ｃ
ａＯ、ＳｒＯ、およびＢａＯ以外の成分（以下、副成分
という）を、総量で５モル％以下含有することができ
る。The glass for a liquid crystal display substrate of the present invention comprises the above-mentioned SiO 2 , B 2 O 3 , A1 2 O 3 , MgO and C.
Components other than aO, SrO, and BaO (hereinafter referred to as subcomponents) can be contained in a total amount of 5 mol% or less.
【００２０】副成分としては、ＺｎＯ、ＰｂＯ、Ｌａ2
Ｏ3、ＺｒＯ2、Ａｓ2Ｏ3、およびＳｂ2Ｏ3からなる群より
選択される少なくとも１種を含有させることが好まし
い。そして、モル％表示による各副成分の含有量は ＺｎＯ ２％以下 ＰｂＯ １％以下 Ｌａ2Ｏ3 １％以下 ＺｒＯ2 １％以下 Ａｓ2Ｏ3 ２％以下 Ｓｂ2Ｏ3 ２％以下 であることが特に好ましい。なお、これら各副生分の含
有量の範囲は、いずれも０％を含む。As subcomponents, ZnO, PbO, La 2
It is preferable to contain at least one selected from the group consisting of O 3 , ZrO 2 , As 2 O 3 , and Sb 2 O 3 . And, the content of each subcomponent in terms of mol% is ZnO 2% or less, PbO 1% or less, La 2 O 3 1% or less, ZrO 2 1% or less, As 2 O 3 2% or less, Sb 2 O 3 2% or less. Is particularly preferable. The content range of each of these by-products includes 0%.
【００２１】ＺｎＯは得られるガラスの膨張係数を上げ
ずに粘性を低下させ、かつ耐失透性を向上させる成分と
して効果的であるが、得られるガラスの歪点を低下させ
ると共に耐硝酸性を低下させる成分でもあるため、含有
させる場合は２モル％以下が特に好ましい。ZnO is effective as a component for lowering the viscosity and improving the devitrification resistance without increasing the expansion coefficient of the obtained glass, but it lowers the strain point of the obtained glass and improves the nitric acid resistance. When it is contained, it is particularly preferably 2 mol% or less because it is also a component that lowers the content.
【００２２】ＰｂＯは得られるガラスの耐失透性を向上
させる成分として効果的であるが、得られるガラスの歪
点を低下させると共に熔解時の粘性を上げる成分でもあ
るため、含有させる場合は１モル％以下が特に好まし
い。PbO is effective as a component for improving the devitrification resistance of the obtained glass, but it is also a component for lowering the strain point of the obtained glass and increasing the viscosity during melting. It is particularly preferably not more than mol%.
【００２３】Ｌａ2Ｏ3は得られるガラスの歪点を低下さ
せずに耐失透性を向上させる成分として効果的である
が、高価であると共に得られるガラスの耐硝酸性を低下
させる成分でもあるため、含有させる場合は１モル％以
下が特に好ましい。La 2 O 3 is effective as a component for improving the devitrification resistance without lowering the strain point of the obtained glass, but it is expensive and also a component for lowering the nitric acid resistance of the obtained glass. Therefore, when it is contained, 1 mol% or less is particularly preferable.
【００２４】ＺｒＯ2は得られるガラスの歪点を上げ、
耐弗酸性および耐硝酸性を向上させる成分として効果的
であるが、得られるガラスの耐失透性を低下させる成分
でもあるため、含有させる場合は１モル％以下が特に好
ましい。ZrO 2 raises the strain point of the obtained glass,
Although it is effective as a component for improving the resistance to hydrofluoric acid and the resistance to nitric acid, it is also a component for reducing the devitrification resistance of the obtained glass. Therefore, when it is contained, its content is preferably 1 mol% or less.
【００２５】Ａｓ2Ｏ3およびＳｂ2Ｏ3は、それぞれ脱泡
剤として必要な成分であるが、白金るつぼや通電装置等
の熔融装置を損傷させるため、含有させる場合は、それ
ぞれ２モル％以下が特に好ましい。本発明の液晶ディス
プレイ基板用ガラスは、各成分の原料として、ガラスの
原料として一般に使用される酸化物、炭酸塩、硝酸塩、
水酸化物等を用い、これらの原料を所定の酸化物換算組
成となるように秤量、混合した後、通常のガラス熔融装
置を用いて１５００〜１６００℃で熔融し、脱泡、均質
化を行ってから所定の形状に成形、徐冷することにより
得られる。As 2 O 3 and Sb 2 O 3 are components necessary as defoaming agents, respectively, but when they are contained, they are not more than 2 mol% in order to damage the melting equipment such as platinum crucible and current-carrying equipment. Is particularly preferable. The glass for a liquid crystal display substrate of the present invention, as a raw material for each component, oxides, carbonates, nitrates commonly used as raw materials for glass,
Using a hydroxide or the like, these raw materials are weighed and mixed so as to have a predetermined oxide-equivalent composition, and then melted at 1500 to 1600 ° C. using a normal glass melting device to perform defoaming and homogenization. After that, it is obtained by molding into a predetermined shape and gradual cooling.
【００２６】[0026]
【実施例】以下、本発明の実施例について説明する。EXAMPLES Examples of the present invention will be described below.
【００２７】実施例１ 原料として珪石粉、硼酸、アルミナ、炭酸マグネシウ
ム、炭酸カルシウム、硝酸ストロンチウム、炭酸バリウ
ムおよび亜砒酸を用い、これらを酸化物換算量で表−１
に示す組成となるように秤量、混合した後、１６００℃
で熔融し、脱泡、均質化を行ってから板状に成形、徐冷
して、１２０×１５０×５０mmの板状を呈する本発明の
液晶ディスプレイ基板用ガラスを得た。Example 1 As a raw material, silica stone powder, boric acid, alumina, magnesium carbonate, calcium carbonate, strontium nitrate, barium carbonate and arsenous acid were used, and these are shown in terms of oxides.
After weighing and mixing to obtain the composition shown in 1600 ° C
Was melted, defoamed and homogenized, then shaped into a plate and gradually cooled to obtain a glass for a liquid crystal display substrate of the present invention having a plate shape of 120 × 150 × 50 mm.
【００２８】得られたガラスの１００〜３００℃におけ
る平均線膨張係数（α100-300)、歪点、および１５００
℃における粘度を表−１に示す。また、得られたガラス
の耐弗酸性および耐硝酸性を以下の要領で評価した。The average linear expansion coefficient (α 100-300 ), strain point, and 1500 of the obtained glass at 100 to 300 ° C.
Table 1 shows the viscosities at ° C. Further, the resistance to hydrofluoric acid and the resistance to nitric acid of the obtained glass were evaluated in the following manner.
【００２９】・耐弗酸性 得られたガラスを研摩して得た試料を２５℃の５％ＨＦ
水溶液に３時間浸漬し、乾燥後、試料の重量減を単位面
積、単位時間当りの量に換算して、その耐弗酸性を評価
した。Hydrofluoric acid resistance The sample obtained by polishing the obtained glass is 5% HF at 25 ° C.
After being immersed in the aqueous solution for 3 hours and dried, the weight loss of the sample was converted into the unit area and the amount per unit time, and the hydrofluoric acid resistance was evaluated.
【００３０】・耐硝酸性 耐弗酸性の評価の場合と同様にして得た試料を８０℃の
３０％ＨＮＯ3水溶液に３時間浸漬し、乾燥後、試料の
重量減を単位面積、単位時間当りの量に換算して、その
耐硝酸性を評価した。Nitric acid resistance A sample obtained in the same manner as in the evaluation of hydrofluoric acid resistance was dipped in a 30% HNO 3 aqueous solution at 80 ° C. for 3 hours and dried, and then the weight reduction of the sample was measured per unit area per unit time. And the nitric acid resistance was evaluated.
【００３１】これらの各換算値も表−１に示す。Table 1 also shows these converted values.
【００３２】さらに、得られたガラス約１００ｇを容量
１００ccの白金坩堝に入れ、この白金坩堝に白金製の蓋
をして１１００℃で２４時間放置し、放置後のガラス内
部における結晶（失透）発生の有無を顕微鏡観察して、
その耐失透性を評価した。この顕微鏡観察結果も表−１
に示す。Further, about 100 g of the obtained glass was placed in a platinum crucible having a capacity of 100 cc, the platinum crucible was covered with a platinum lid and left at 1100 ° C. for 24 hours, and crystals (devitrification) inside the glass after standing were left. By observing the presence or absence of occurrence with a microscope,
The devitrification resistance was evaluated. The results of this microscope observation are also shown in Table-1.
Shown in.
【００３３】実施例２〜４ 原料として珪石粉、硼酸、アルミナ、炭酸マグネシウ
ム、炭酸カルシウム、硝酸ストロンチウム、炭酸バリウ
ム、亜鉛華、硝酸鉛、酸化ランタン、酸化ジルコニウ
ム、亜砒酸および酸化アンチモンを用い、これらを酸化
物換算量で表−１に示す組成となるように秤量、混合し
た後、１５００〜１６００℃で熔融し、脱泡、均質化を
行ってから板状に成形、徐冷して、実施例１と同一形状
の液晶ディスプレイ基板用ガラスをそれぞれ得た。Examples 2 to 4 As the raw materials, silica stone powder, boric acid, alumina, magnesium carbonate, calcium carbonate, strontium nitrate, barium carbonate, zinc white, lead nitrate, lanthanum oxide, zirconium oxide, arsenous acid and antimony oxide are used. After weighing and mixing so as to have a composition shown in Table 1 in terms of oxide, the mixture was melted at 1500 to 1600 ° C., defoamed and homogenized, and then molded into a plate shape and gradually cooled, A glass for a liquid crystal display substrate having the same shape as that of No. 1 was obtained.
【００３４】得られた各ガラスのα100-300、歪点、およ
び１５００℃における粘度を表−１に示す。Table 1 shows the α 100-300 , strain point, and viscosity at 1500 ° C. of each glass obtained.
【００３５】また、得られた各ガラスの耐弗酸性および
耐硝酸性を実施例１と同様にして評価した。このときの
各換算値も表−１に示す。Further, the hydrofluoric acid resistance and the nitric acid resistance of each of the obtained glasses were evaluated in the same manner as in Example 1. Each conversion value at this time is also shown in Table 1.
【００３６】さらに、得られた各ガラスの耐失透性を実
施例１と同様にして評価した。このときの各顕微鏡観察
結果も表−１に示す。Further, the devitrification resistance of each obtained glass was evaluated in the same manner as in Example 1. The results of each microscopic observation at this time are also shown in Table 1.
【００３７】比較例１ 表−１に示すように、従来よりα−ＳｉＴＦＴ形の液晶
ディスプレイの基板として多用されているバリウム硼珪
酸無アルカリガラスに類似する組成のガラスを得た。Comparative Example 1 As shown in Table 1, a glass having a composition similar to barium borosilicate alkali-free glass which has been widely used as a substrate of an α-SiTFT type liquid crystal display has been obtained.
【００３８】得られたガラスのα100-300、歪点、および
１５００℃における粘度を表−１に示す。The α 100-300 , strain point and viscosity at 1500 ° C. of the obtained glass are shown in Table 1.
【００３９】また、得られたガラスの耐弗酸性および耐
硝酸性を実施例１と同様にして評価した。このときの各
換算値も表−１に示す。Further, the hydrofluoric acid resistance and nitric acid resistance of the obtained glass were evaluated in the same manner as in Example 1. Each conversion value at this time is also shown in Table 1.
【００４０】さらに、得られたガラスの耐失透性を実施
例１と同様にして評価した。このときの顕微鏡観察結果
も表−１に示す。Further, the devitrification resistance of the obtained glass was evaluated in the same manner as in Example 1. The results of microscopic observation at this time are also shown in Table 1.
【００４１】[0041]
【表１】 [Table 1]
【００４２】表−１から明らかなように、実施例１〜４
で得られた本発明の液晶ディスプレイ基板用ガラスのα
100-300は３６×１０-7〜３８×１０-7deg-1・cm-1であ
り、Ｐ−Ｓｉの線膨張係数と近似している。また、各ガ
ラスの歪点はいずれも６３０℃以上であり、α−ＳｉＴ
ＦＴ形だけでなく、Ｐ−ＳｉＴＦＴ形の液晶ディスプレ
イの基板としても使用可能なものである。As is clear from Table 1, Examples 1 to 4
Α of the glass for a liquid crystal display substrate of the present invention obtained in
100-300 is 36 × 10 −7 to 38 × 10 −7 deg −1 · cm −1 , which is close to the linear expansion coefficient of P-Si. Moreover, the strain point of each glass is 630 ° C. or higher, and α-SiT
Not only the FT type but also a P-SiTFT type liquid crystal display substrate can be used.
【００４３】また、１５００℃における粘度はいずれの
ガラスでも１０3ホ゜イズ未満であり、実用的な熔融性を
有していることがわかる。Further, the viscosity at 1500 ° C. is less than 10 3 poise for all glasses, and it can be seen that the glass has a practical meltability.
【００４４】さらに、５％ＨＦ水溶液に浸漬した場合の
重量減が７〜９mg／cm2・hr、３０％ＨＮＯ3水溶液に浸
漬した場合の重量減が４×１０-2〜１２×１０-2mg／cm
・hrであり、それぞれ、耐弗酸性および耐硝酸性に優れ
ていることがわかる。なお、５％ＨＦ水溶液による処理
中および３０％ＨＮＯ3水溶液による処理中のいずれに
おいても、ガラス表面が白濁する現象は見られなかっ
た。Further, the weight loss when immersed in a 5% HF aqueous solution is 7 to 9 mg / cm 2 · hr, and the weight loss when immersed in a 30% HNO 3 aqueous solution is 4 × 10 -2 to 12 × 10 -2. mg / cm
・ Hr, which shows excellent resistance to hydrofluoric acid and nitric acid, respectively. In addition, neither the treatment with the 5% HF aqueous solution nor the treatment with the 30% HNO 3 aqueous solution showed the phenomenon that the glass surface became cloudy.
【００４５】また、いずれのガラスにおいても、１１０
０℃で２４時間放置した後に結晶の発生は認められなか
った。このことから各ガラスの失透温度は１１００℃以
下であり、実用的な成形性を有していることがわかる。Further, in any glass, 110
No crystals were observed after standing at 0 ° C. for 24 hours. From this, it can be seen that the devitrification temperature of each glass is 1100 ° C. or lower, and that it has a practical formability.
【００４６】一方、比較例１のバリウム硼珪酸無アルカ
リガラスは、耐弗酸性、耐硝酸性、熔融性および成形性
は問題ないが、実施例１〜４で得られた本発明の液晶デ
ィスプレイ基板用ガラスに比べると歪点が低く、α
100-300も大きい。On the other hand, the barium borosilicate alkali-free glass of Comparative Example 1 has no problem with respect to hydrofluoric acid resistance, nitric acid resistance, meltability and moldability, but the liquid crystal display substrates of the present invention obtained in Examples 1 to 4 The strain point is lower than that of commercial glass, and α
100-300 is also large.
【００４７】[0047]
【発明の効果】以上説明したように、本発明の液晶ディ
スプレイ基板用ガラスは、Ｐ−Ｓｉの線膨張係数と近似
する線膨張係数を有し、かつ、Ｐ−ＳｉＴＦＴ形の液晶
ディスプレイの基板としても使用可能な歪点、Ｐ−Ｓｉ
ＴＦＴの成形過程で多用される弗酸および硝酸に対する
良好な耐性、実用的な熔融性、および実用的な成形性を
有している。As described above, the glass for a liquid crystal display substrate of the present invention has a linear expansion coefficient close to that of P-Si and is used as a substrate for a P-Si TFT type liquid crystal display. Strain point that can also be used, P-Si
It has good resistance to hydrofluoric acid and nitric acid that are often used in the process of forming TFTs, practical meltability, and practical moldability.
【００４８】したがって本発明を実施することにより、
α−ＳｉＴＦＴ形だけでなくＰ−ＳｉＴＦＴ形の汎用液
晶ディスプレイの基板としても好適な、液晶ディスプレ
イ基板用ガラスを提供することが可能となる。Therefore, by carrying out the present invention,
It is possible to provide a glass for a liquid crystal display substrate, which is suitable not only as an α-SiTFT type but also as a P-SiTFT type general-purpose liquid crystal display substrate.
Claims (3)
・cm-1未満であることを特徴とする液晶ディスプレイ基
板用ガラス。1. The content of each component in terms of mol% is SiO 2 62% or more and 68% or less B 2 O 3 8% or more and less than 12% A1 2 O 3 9% or more and 13% or less MgO 1% or more and 5% or less CaO is 3% or more and 7% or less, and the average linear expansion coefficient α 100-300 is 39 × 10 -7 deg -1
-A glass for liquid crystal display substrates, which is less than cm -1 .
・cm-1以下である、請求項１に記載の液晶ディスプレイ
基板用ガラス。2. The content of each component in terms of mol% is SiO 2 62% or more and 68% or less B 2 O 3 8% or more and less than 12% A1 2 O 3 9% or more and 13% or less MgO 1% or more and 5% or less CaO is 3% or more and 7% or less, and the average linear expansion coefficient α 100-300 is 37 × 10 -7 deg -1
-The glass for liquid crystal display substrates according to claim 1, which has a cm -1 or less.
レイ基板を用いて得られた液晶ディスプレイ。3. A liquid crystal display obtained by using the liquid crystal display substrate according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7038281A JP2719504B2 (en) | 1995-02-27 | 1995-02-27 | Glass for liquid crystal display substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7038281A JP2719504B2 (en) | 1995-02-27 | 1995-02-27 | Glass for liquid crystal display substrates |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28689590A Division JP2644622B2 (en) | 1990-10-24 | 1990-10-24 | Glass for liquid crystal display substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07277763A true JPH07277763A (en) | 1995-10-24 |
| JP2719504B2 JP2719504B2 (en) | 1998-02-25 |
Family
ID=12520938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7038281A Expired - Lifetime JP2719504B2 (en) | 1995-02-27 | 1995-02-27 | Glass for liquid crystal display substrates |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2719504B2 (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09304756A (en) * | 1996-05-14 | 1997-11-28 | Toppan Printing Co Ltd | Liquid crystal panel |
| US6060168A (en) * | 1996-12-17 | 2000-05-09 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| WO2001000538A3 (en) * | 1999-06-29 | 2001-07-05 | Hoya Corp | Glass composition for use in a liquid crystal panel |
| US6319867B1 (en) | 1998-11-30 | 2001-11-20 | Corning Incorporated | Glasses for flat panel displays |
| FR2898352A1 (en) * | 2006-03-10 | 2007-09-14 | Saint Gobain | Glass substrate composition for flat screen, comprises specific amounts of silicon oxide, boron oxide, aluminum oxide, calcium oxide, magnesium oxide, barium oxide, strontium oxide and alkali metal oxide |
| CN100337954C (en) * | 2005-02-06 | 2007-09-19 | 河南安彩高科股份有限公司 | Non-alkali glass composition of high specific modulus value and its use |
| US7833919B2 (en) | 2006-02-10 | 2010-11-16 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US8007913B2 (en) | 2006-02-10 | 2011-08-30 | Corning Incorporated | Laminated glass articles and methods of making thereof |
| WO2012074953A1 (en) * | 2010-11-30 | 2012-06-07 | Corning Incorporated | Glass articles/materials for use as touchscreen substrates |
| US8713967B2 (en) | 2008-11-21 | 2014-05-06 | Corning Incorporated | Stable glass sheet and method for making same |
| US11168018B2 (en) | 2013-08-15 | 2021-11-09 | Corning Incorporated | Aluminoborosilicate glass substantially free of alkali oxides |
| USRE49307E1 (en) | 2013-08-15 | 2022-11-22 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106232540A (en) | 2014-04-24 | 2016-12-14 | 日本板硝子株式会社 | Glass composition, chemical enhanced glass plate, strengthening glass sheets and display hardened glass substrate |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04160030A (en) * | 1990-10-24 | 1992-06-03 | Hoya Corp | Glass for liquid crystal display substrate |
-
1995
- 1995-02-27 JP JP7038281A patent/JP2719504B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04160030A (en) * | 1990-10-24 | 1992-06-03 | Hoya Corp | Glass for liquid crystal display substrate |
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09304756A (en) * | 1996-05-14 | 1997-11-28 | Toppan Printing Co Ltd | Liquid crystal panel |
| USRE38959E1 (en) * | 1996-12-17 | 2006-01-31 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| US6060168A (en) * | 1996-12-17 | 2000-05-09 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| USRE41127E1 (en) * | 1996-12-17 | 2010-02-16 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| US7524784B2 (en) | 1998-11-30 | 2009-04-28 | Corning Incorporated | Glasses for flat panel displays |
| US6831029B2 (en) | 1998-11-30 | 2004-12-14 | Corning Incorporated | Glasses for flat panel displays |
| US7365038B2 (en) | 1998-11-30 | 2008-04-29 | Corning Incorporated | Glasses for flat panel displays |
| US6319867B1 (en) | 1998-11-30 | 2001-11-20 | Corning Incorporated | Glasses for flat panel displays |
| WO2001000538A3 (en) * | 1999-06-29 | 2001-07-05 | Hoya Corp | Glass composition for use in a liquid crystal panel |
| DE10084754B3 (en) * | 1999-06-29 | 2014-07-31 | Hoya Corp. | Glass substrate for use in a liquid crystal panel and its use and manufacture |
| CN100337954C (en) * | 2005-02-06 | 2007-09-19 | 河南安彩高科股份有限公司 | Non-alkali glass composition of high specific modulus value and its use |
| US8007913B2 (en) | 2006-02-10 | 2011-08-30 | Corning Incorporated | Laminated glass articles and methods of making thereof |
| US7833919B2 (en) | 2006-02-10 | 2010-11-16 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US8753993B2 (en) | 2006-02-10 | 2014-06-17 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US8763429B2 (en) | 2006-02-10 | 2014-07-01 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| US10364177B2 (en) | 2006-02-10 | 2019-07-30 | Corning Incorporated | Glass compositions having high thermal and chemical stability and methods of making thereof |
| WO2007104885A3 (en) * | 2006-03-10 | 2008-03-06 | Saint Gobain | Glass substrates for flat-panel displays |
| FR2898352A1 (en) * | 2006-03-10 | 2007-09-14 | Saint Gobain | Glass substrate composition for flat screen, comprises specific amounts of silicon oxide, boron oxide, aluminum oxide, calcium oxide, magnesium oxide, barium oxide, strontium oxide and alkali metal oxide |
| US8713967B2 (en) | 2008-11-21 | 2014-05-06 | Corning Incorporated | Stable glass sheet and method for making same |
| WO2012074953A1 (en) * | 2010-11-30 | 2012-06-07 | Corning Incorporated | Glass articles/materials for use as touchscreen substrates |
| US11168018B2 (en) | 2013-08-15 | 2021-11-09 | Corning Incorporated | Aluminoborosilicate glass substantially free of alkali oxides |
| USRE49307E1 (en) | 2013-08-15 | 2022-11-22 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
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|---|---|
| JP2719504B2 (en) | 1998-02-25 |
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