JPH07237765A - Floating type vacuum chuck - Google Patents
Floating type vacuum chuckInfo
- Publication number
- JPH07237765A JPH07237765A JP5820794A JP5820794A JPH07237765A JP H07237765 A JPH07237765 A JP H07237765A JP 5820794 A JP5820794 A JP 5820794A JP 5820794 A JP5820794 A JP 5820794A JP H07237765 A JPH07237765 A JP H07237765A
- Authority
- JP
- Japan
- Prior art keywords
- pad
- work
- supported
- vacuum chuck
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manipulator (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、板状の本体部材に吸着
構造部を備え、１枚の板状ワーク又は多段に支持された
板状のワークを吸着するバキュームチャックに関し、Ｌ
ＣＤを主流とするガラス基板を扱う製造ラインや、シリ
コンウェハーを扱う半導体製造ラインにおけるワークの
搬送に利用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum chuck having a plate-shaped main body member having a suction structure for sucking a single plate-shaped work or a plate-shaped work supported in multiple stages.
It is used for transporting workpieces on a manufacturing line that handles glass substrates, which mainly uses CDs, and a semiconductor manufacturing line that handles silicon wafers.
【０００２】[0002]
【従来の技術】例えば液晶ディスプレイ用ガラス基板の
製造行程中における搬送は、通常バキュームチャックに
よって行われる。この場合、ガラスの裏面にパッド材料
等の異物が付着するのを防止するため、パッド材料とし
ては、ゴムの使用を避け、比較的硬いテフロンやＰＥＥ
Ｋ等のプラスチックが使用されている。そして、このプ
ラスチック製のバキュームチャックは、図５（ｂ）に示
す如く、金属等の剛性を有する材料でできたハンド１´
上に薄い板状又はシート状のパッド１１´を張り付ける
ことにより構成されていた。 しかしながら、この構造
のバキュームチャックでは、ガラス基板に歪みがある場
合に、パッドが固定されていて且つ硬い材質のものであ
るため基板面になじみにくく、バキューム不良が多発す
るという問題があった。2. Description of the Related Art For example, a glass substrate for a liquid crystal display is usually transported by a vacuum chuck during its manufacturing process. In this case, in order to prevent foreign matter such as pad material from adhering to the back surface of the glass, avoid using rubber as the pad material, and use relatively hard Teflon or PEE.
Plastics such as K are used. As shown in FIG. 5B, this plastic vacuum chuck is a hand 1'made of a material having rigidity such as metal.
It was constituted by sticking a thin plate-shaped or sheet-shaped pad 11 ′ on top. However, the vacuum chuck having this structure has a problem that when the glass substrate is distorted, the pad is fixed and made of a hard material, so that the vacuum chuck is hard to fit to the substrate surface, and vacuum defects frequently occur.
【０００３】一方、傾斜角度を調節でき且つ吸着前の姿
勢を正規位置に保持できるようにしたバキュームパッド
が提案されている（実開平２ー１１７８８５号及び実開
平４ー４２３９５号公報参照）。この構造のものでは、
パッドをこれより小径のボールジョイントで支持してい
る。従って、支持状態が不安定であるため、パッドを動
かすときにその慣性によりアンバランスな外力やモーメ
ントがかかると、パッドが容易に傾く。そこでスプリン
グを設けてパッドの姿勢を維持するようにしている。し
かしながら、スプリングを設けると、傾斜したワークに
パッドを沿わせるときに、傾斜に近い側の反力が大きく
なり、パッドが円滑にワーク面に沿わなくなる。又、パ
ッドを或る程度の力で押し付けなければならないので、
特に自重の軽い物を持ち上げるような場合には不適当で
ある。更に、このようにジョイントとして球体を使用し
且つスプリングを設けると、構造が複雑になると共に、
吸着部の吸着方向の寸法が大きくなり、製造装置に多段
支持されたワークを取り出して搬送する場合には、装置
の積層ピッチが大きくなるという問題も生ずる。On the other hand, there has been proposed a vacuum pad in which the inclination angle can be adjusted and the posture before suction can be held at a regular position (see Japanese Utility Model Publication Nos. 2-117885 and 4-42395). With this structure,
The pad is supported by a ball joint with a smaller diameter than this. Therefore, since the supporting state is unstable, the pad easily tilts when an unbalanced external force or moment is applied due to its inertia when the pad is moved. Therefore, a spring is provided to maintain the posture of the pad. However, when the spring is provided, when the pad is moved along the inclined work, the reaction force on the side close to the inclination increases, and the pad does not smoothly follow the work surface. Also, since the pad must be pressed with a certain amount of force,
In particular, it is unsuitable for lifting a light weight object. Furthermore, when a sphere is used as a joint and a spring is provided in this way, the structure becomes complicated and
When the size of the suction part in the suction direction becomes large and the work supported in multiple stages by the manufacturing apparatus is taken out and conveyed, there is also a problem that the stacking pitch of the apparatus becomes large.
【０００４】[0004]
【発明が解決しようとする課題】本発明は従来技術に於
ける上記問題を解決し、構造が簡単で、パッドがワーク
の傾斜になじみ易く、且つ多段支持されたワークの搬送
に適したバキュームチャックを提供することを課題とす
る。SUMMARY OF THE INVENTION The present invention solves the above problems in the prior art, has a simple structure, a pad easily conforms to the inclination of a work, and a vacuum chuck suitable for conveying a work supported in multiple stages. The challenge is to provide.
【０００５】[0005]
【課題を解決するための手段】本発明は上記課題を解決
するために、請求項１の発明は、板状の本体部材に吸着
構造部を備え、板状のワークを吸着するバキュームチャ
ックにおいて、前記吸着構造部は、前記ワークに吸着す
るパッドと該パッドを支持する支持面と抜け出し規制部
材とを有し、前記パッドは、前記本体部材の表面から突
出し前記ワークに接触する接触面と、該接触面と接続し
一定曲率の曲面をなす外周面と、前記外周面の内側に設
けられた開口面と、該開口面の内側に突出した突出部と
を備え、前記支持面は、前記本体部材に形成され前記外
周面と同じ曲率を持つ曲面をなし、前記抜け出し規制部
材は、前記開口面の内側に設けられ、前記本体部材に固
定され、前記突出部に対して前記ワーク側に間隙を隔て
て対向した対向突出部を備えている、ことを特徴とし、
請求項２の発明は、上記に加えて、前記吸着構造部を有
する前記本体部材は２組から成り、それぞれの本体部材
は前記ワークの両端支持部間の距離に近い間隔を隔てて
結合されていることを特徴とする。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a vacuum chuck for adsorbing a plate-shaped workpiece, wherein a plate-shaped main body member is provided with an adsorption structure. The suction structure part has a pad that is sucked to the work, a support surface that supports the pad, and a slip-out restricting member, and the pad is a contact surface that projects from the surface of the main body member and contacts the work; An outer peripheral surface that is connected to the contact surface and forms a curved surface with a constant curvature, an opening surface provided inside the outer peripheral surface, and a protrusion protruding inside the opening surface, and the support surface is the main body member. Is formed in a curved surface having the same curvature as that of the outer peripheral surface, the escape regulating member is provided inside the opening surface, is fixed to the main body member, and has a gap on the work side with respect to the projecting portion. Oncoming collision And a section, characterized in that,
According to the invention of claim 2, in addition to the above, the main body member having the suction structure is composed of two sets, and each main body member is coupled with a distance close to a distance between both end support portions of the work. It is characterized by being
【０００６】[0006]
【作用】請求項１の発明によれば、パッドの外周面が一
定の曲率の曲面状になっていて、本体部材に設けられた
同じ曲率の支持面で支持されるので、パッドは広い面で
安定して支持されると共に、ワーク吸着時に支持面で内
外の圧力差が確実にシールされる。この場合、外周面を
支持するので、両端でパッドを支持する形になり、パッ
ドの安定性が良くなる。即ち、パッドを支持する支持面
には一定の摩擦力があるので、パッドに回転力がかかっ
たときに摩擦力が偶力として作用し、抵抗モーメントを
生ずる。この場合、支点間の距離が大きいので、摩擦力
が小さくてもパッドを安定させるだけのモーメントが生
じてパッドの姿勢が安定する。従って、ワークを取りに
行くときにバキュームチャックを動かしても、通常の動
きによってはそれ程大きなアンバランスモーメントが生
じないので、抵抗モーメントの作用によりパッドは回転
しない。その結果、パッドの姿勢保持のためのスプリン
グを必要としない。According to the invention of claim 1, since the outer peripheral surface of the pad has a curved surface with a constant curvature and is supported by the supporting surface of the same curvature provided on the main body member, the pad has a wide surface. In addition to being stably supported, the pressure difference between the inside and outside is reliably sealed on the support surface when the work is adsorbed. In this case, since the outer peripheral surface is supported, the pad is supported at both ends, and the stability of the pad is improved. That is, since there is a constant frictional force on the support surface that supports the pad, the frictional force acts as a couple when a rotational force is applied to the pad to generate a resistance moment. In this case, since the distance between the fulcrums is large, even if the frictional force is small, a moment sufficient to stabilize the pad is generated and the posture of the pad is stabilized. Therefore, even if the vacuum chuck is moved when the work is taken, a large unbalance moment is not generated by the normal movement, and the pad does not rotate due to the action of the resistance moment. As a result, there is no need for a spring for maintaining the posture of the pad.
【０００７】一方、ワークが傾斜しているときにパッド
の接触面の一部分がワークに当たると、パッドには自重
による摩擦力以外の力は作用しないので、パッドは軽く
動き容易にワークの傾斜に沿う。パッドが傾斜に沿って
ワークに接触すると、パッドの接触面には、もはやスプ
リングを設けた場合のようにアンバランスな力が加わら
ないので、パッドは完全にワークになじみ接触状態が良
好になり、確実にバキュームが生じてワークを吸着する
ことができる。更に、外周面を支持することにより、従
来技術のように中心近くを支持するよりも、同じ揺動角
に対して支持部の変位が大きくなるので、ワークとパッ
ドとがなじみ動作をするときに微小な角変化が容易に行
われ、この点からも接触状態が一層良好になる。On the other hand, when a part of the contact surface of the pad hits the work while the work is tilted, no force other than the frictional force due to its own weight acts on the pad, so the pad moves lightly and easily follows the tilt of the work. . When the pad comes into contact with the work along the slope, the contact surface of the pad no longer receives an unbalanced force as in the case where a spring is provided, so the pad fits perfectly to the work and the contact state is good. Vacuum is reliably generated and the work can be adsorbed. Furthermore, by supporting the outer peripheral surface, the displacement of the supporting portion becomes larger for the same swing angle than when supporting near the center as in the prior art, so that when the work and the pad perform a familiar motion. A slight angle change is easily performed, and the contact state is further improved from this point as well.
【０００８】パッドの開口部の内側には、間隙を隔てて
パッドの突出部と抜け出し規制部材の対向突出部とが対
向配置されているので、曲面状の支持部がワーク側に開
いた形状であっても、パッドが何かの原因で抜け出す方
向に動くと、突出部が対向突出部に当たってその動きが
停止され、抜け出しが防止される。一方、両突出部間に
は間隙があるので、前述の如くパッドの自由ななじみ動
作が制約されることはない。そして、両者の間隙を適当
な大きさにすれば、何らかの原因でパッドに大きな回転
力が加えられたたときに、パッドが傾斜すると円周方向
の何れかの側の突出部が接触することにより、最大回転
角を一定範囲内に制限することができる。従って、突出
部の間隙は、パッドとワークとの間に生じ得る傾斜角の
調整が可能な範囲で、パッドの回転角をできるだけ小さ
く制限するように定められることが望ましい。そのよう
にすれば、バキュームチャックがワークを取りに行くと
きに、パッドの姿勢が悪いために吸着不良を生ずるおそ
れが全くなくなる。但し、パッドの異常傾斜を防止する
ためには、本体部材の支持面の一定位置に回転ストッパ
を設けるようにしてもよい。Inside the opening of the pad, the protruding portion of the pad and the opposed protruding portion of the slip-out restricting member are arranged to face each other with a gap, so that the curved support portion is open to the work side. Even if there is, however, if the pad moves in the direction of coming out due to some reason, the projecting portion comes into contact with the opposing projecting portion, the movement is stopped, and the coming out is prevented. On the other hand, since there is a gap between the both protrusions, the free familiar movement of the pad is not restricted as described above. If the gap between them is set to an appropriate size, when a large rotational force is applied to the pad for some reason, if the pad tilts, the protrusions on either side in the circumferential direction come into contact with each other. The maximum rotation angle can be limited within a certain range. Therefore, it is desirable that the gap between the protrusions be set so as to limit the rotation angle of the pad as small as possible within a range in which the tilt angle that can occur between the pad and the work can be adjusted. By doing so, when the vacuum chuck goes to pick up the work, there is no possibility of causing suction failure due to the bad posture of the pad. However, in order to prevent the pad from abnormally tilting, a rotation stopper may be provided at a fixed position on the support surface of the main body member.
【０００９】このように対向突出部を設けると、パッド
の抜け出しを防止するために、支持部の曲面をワーク側
にも閉じた形状にする必要がなくなるため、半球面を部
分的に利用した形状にすることができる。その結果、支
持部の吸着方向の長さが短縮される。When the opposing protrusions are provided in this way, it is not necessary to make the curved surface of the support portion close to the work side in order to prevent the pad from coming off. Can be As a result, the length of the support portion in the suction direction is shortened.
【００１０】以上のように、請求項１の発明において
は、スプリングを設けなくてもパッドの機能が十分発揮
されるので、バキュームチャックの構造が簡素化され
る。又、スプリングがないことと球面の部分的利用とに
より、本体部材の吸着方向の幅が極めて小さくなる。そ
の結果、バキュームチャックの本体部材を薄型に形成で
き、特に多段に積層支持されたワークを搬送する場合
に、積層間隔を短縮することが可能になる。As described above, according to the first aspect of the present invention, the function of the pad is sufficiently exerted without providing the spring, so that the structure of the vacuum chuck is simplified. Further, the absence of the spring and the partial utilization of the spherical surface make the width of the main body member in the suction direction extremely small. As a result, the main body member of the vacuum chuck can be formed to be thin, and the stacking interval can be shortened particularly when the works stacked and supported in multiple stages are conveyed.
【００１１】請求項２の発明によれば、上記のような吸
着構造部を備えた本体部材を２組設け、それぞれを１枚
だけ単独に又は多段に支持されたワークの両端支持部間
の距離に近い間隔だけ離して結合するので、２組の本体
部材が支持されたワークを受け取るときに、両端支持部
の近くを支持することになる。従って、製造装置に多段
に支持されたワークを搬送させる場合には、装置に支持
されたワークと、本体部材に支持されたワークとの間で
ワークの撓み曲線が近似することになり、それぞれのワ
ークの間隔が有効に利用される。その結果、製造装置の
積層ピッチを小さくしても他のワークと干渉しなくな
り、薄型の本体部材の採用に加えて一層搬送システムの
能率化を図ることができる。According to the second aspect of the present invention, two sets of main body members having the above-mentioned suction structure are provided, and only one of each of the main body members is supported alone or the distance between both end support portions of the work is supported in multiple stages. Since the two sets of main body members are coupled to each other at a distance close to, the two sets of body members support near both end support portions when receiving the supported work. Therefore, when the manufacturing apparatus conveys the workpieces supported in multiple stages, the deflection curves of the workpieces are approximated between the workpieces supported by the apparatus and the workpieces supported by the main body member. Work spacing is effectively used. As a result, even if the stacking pitch of the manufacturing apparatus is reduced, it does not interfere with other works, and it is possible to further improve the efficiency of the transfer system in addition to the use of a thin main body member.
【００１２】[0012]
【実施例】図１は実施例のバキュームチャックの吸着部
分の構造を示す。バキュームチャックは、板状の本体部
材であるハンド１に吸着構造部１０を備え、板状のワー
クであるガラス基板２０を吸着する。吸着構造部１０
は、ガラス基板２０に吸着するパッド１１とこれを支持
する支持面１ａと抜け出し規制部材としてのパッド押さ
え１２とを有する。EXAMPLE FIG. 1 shows a structure of a suction portion of a vacuum chuck of an example. The vacuum chuck has a suction structure portion 10 on a hand 1 which is a plate-shaped body member, and sucks a glass substrate 20 which is a plate-shaped work. Adsorption structure part 10
Has a pad 11 attracted to the glass substrate 20, a support surface 1a for supporting the pad 11, and a pad retainer 12 as a slip-out restricting member.
【００１３】パッド１１は、ハンド１の表面１ｂから突
出しガラス基板２０に接触する接触面１１ａと、これと
接続し一定曲率の曲面をなす外周面としての半球面の一
部分をなす形状をした部分球面１１ｂと、その内側に設
けられた開口面１１ｃと、その内側に突出した突出部１
１ｄとを備えている。支持面１ａは、ハンド１にホルダ
１ｃを介して形成され、部分球面１１ｂと同じ曲率を持
つ曲面をなしている。The pad 11 has a contact surface 11a which projects from the surface 1b of the hand 1 and comes into contact with the glass substrate 20, and a partial spherical surface which is connected to the contact surface 11a and forms a part of a hemisphere as an outer peripheral surface having a curved surface with a constant curvature. 11b, an opening surface 11c provided inside thereof, and a protruding portion 1 protruding inside thereof.
1d and. The support surface 1a is formed on the hand 1 via the holder 1c and has a curved surface having the same curvature as the partial spherical surface 11b.
【００１４】パッド押さえ１２は、開口面１１ｃの内側
に設けられ、ハンド１にネジ込みや圧入等により固定さ
れ、突出部１１ｄからガラス基板２０側に間隙を隔てて
対向した対向突出部１２ａを備えていて、その内部はバ
キューム形成用の空気通路１２ｂになっている。符号１
ｄは同じく空気通路で、符号１ｅはこれを形成するため
の裏板である。突出部１１ｄと対向突出部１２ａとの間
隙は、パッド１１が或る程度の角度自由に傾斜できるよ
うに定められる。但し本実施例では、ホルダ１ｃを支持
するハンド１の支持面を延長することによってもパッド
１１の回転を規制し、パッド１１の最大傾斜状態を安定
させている。なお、このようなパッド１１の回転角の規
制は、パッド１１が基板２０の傾斜角に対応する動作を
妨げないように定められる。The pad retainer 12 is provided inside the opening surface 11c, is fixed to the hand 1 by screwing, press-fitting, or the like, and is provided with a facing protrusion 12a facing the glass substrate 20 side with a gap from the protrusion 11d. However, the inside thereof is an air passage 12b for forming a vacuum. Code 1
Similarly, d is an air passage, and reference numeral 1e is a back plate for forming the air passage. The gap between the protrusion 11d and the opposing protrusion 12a is determined so that the pad 11 can be freely tilted to some extent. However, in the present embodiment, the rotation of the pad 11 is restricted by extending the support surface of the hand 1 that supports the holder 1c, and the maximum tilted state of the pad 11 is stabilized. The regulation of the rotation angle of the pad 11 is set so that the pad 11 does not interfere with the operation corresponding to the inclination angle of the substrate 20.
【００１５】図２は実施例のバキュームチャックの全体
構成を示す。図１に示す吸着構造部１０を備えたハンド
１は２組から成り、それぞれのハンド１は、図４にも示
す如く、積層支持されたガラス基板２０の両端支持部３
０間の距離Ｌに近い間隔Ｄを隔てて連結板２で結合さ
れ、これらによってバキュームチャックが形成されてい
る。２組のハンド１には、それぞれガラス基板２０の長
さ方向の２箇所に吸着構造部１０が設けられている。ハ
ンド１の空気通路１ｄは、順次、後方の連結板２の近く
の連絡穴１ｆ、後部空気通路１ｇ、連絡穴１ｈ、連結板
２内に形成された穴２ａ及び穴２ｂを介して連結板２の
連絡穴２ｃと導通している。そして、連絡穴２ｃに図示
しない真空装置からエアホースが結合されることによ
り、吸着構造部１０のパッド１１の接触面１１ａ近辺の
空気を吸い込むことができるようになっている。符号３
は、ハンド１と連結板２とを結合するねじである。FIG. 2 shows the overall construction of the vacuum chuck of the embodiment. The hand 1 provided with the suction structure 10 shown in FIG. 1 is composed of two sets, and each hand 1 has both ends supporting portions 3 of the glass substrates 20 laminated and supported as shown in FIG.
The connecting plates 2 are connected to each other with a distance D close to the distance L between 0s, and these form a vacuum chuck. The two sets of hands 1 are respectively provided with the suction structure portions 10 at two positions in the length direction of the glass substrate 20. The air passage 1d of the hand 1 is sequentially connected to the connecting plate 2 through the connecting hole 1f near the rear connecting plate 2, the rear air passage 1g, the connecting hole 1h, and the holes 2a and 2b formed in the connecting plate 2. Is connected to the communication hole 2c. By connecting an air hose to the communication hole 2c from a vacuum device (not shown), the air in the vicinity of the contact surface 11a of the pad 11 of the suction structure 10 can be sucked. Code 3
Is a screw for connecting the hand 1 and the connecting plate 2.
【００１６】図３は他の実施例のバキュームチャックの
全体構成を示す。このものでは、ハンド１と連結板２と
の間に穴４ａ、４ｂ及び４ｃを備えた中間板４が設けら
れている。このように中間板４を設けると、真空装置か
らの接続部となる連結板２が既存の設備として存在する
ような場合に、これに対して本発明の吸着構造部１０を
備えたハンド１を適用することが容易になる。FIG. 3 shows the whole structure of a vacuum chuck of another embodiment. In this one, an intermediate plate 4 having holes 4a, 4b and 4c is provided between the hand 1 and the connecting plate 2. By providing the intermediate plate 4 in this way, in the case where the connecting plate 2 serving as the connecting portion from the vacuum device is present as existing equipment, the hand 1 provided with the suction structure portion 10 of the present invention is opposed to this Easy to apply.
【００１７】図４は、実施例のバキュームチャックが積
層支持されたガラス基板２０を吸着搬送するときの状態
を示す。ガラス基板２０は、両端支持部３０に比較的近
い所を２点で吸着支持される。FIG. 4 shows a state where the vacuum chuck of the embodiment sucks and conveys the glass substrates 20 which are laminated and supported. The glass substrate 20 is adsorbed and supported at two points in a place relatively close to the both-ends supporting portion 30.
【００１８】以上のような構成により、バキュームチャ
ックは次のように作動される。パッド１１は、通常水平
に近い位置になっている。又は、場合によっては、何ら
かの原因で例えば１０°〜２０°傾斜した位置で位置規
制されている。この状態でバキュームを効かせつつハン
ド１をガラス基板２０に近づけると、パッド１１が水平
でガラス基板２０が傾斜していた場合や、それ以外の場
合でそれぞれの傾斜角が一致していないときでも、パッ
ド１１の接触面１１ａがガラス基板２０に接触すると、
パッド１１はその部分球面１１ｂが支持面１ａ上を滑る
ことにより容易にその傾斜を変える。即ち、本発明によ
れば、パッドには摩擦力以外にスプリング力のような余
分な力が作用しないので、接触面１１ａは容易にガラス
基板２０の面に沿う。そして、パッド１１は自重以外に
如何なる抑止力もないフローティング状態になっている
ので、或る程度なじみ動作をすると浮き上がり気味にガ
ラス基板２０に吸着する。このとき、部分球面１１ｂと
支持面１ａとの間に微小間隙ができるが、内外の圧力差
によって瞬時にこの間隙がなくなり、ガラス基板２０が
パッド１１を介してハンド１に吸着・支持される。この
ような動作は、パッド１１のフローティング効果により
迅速且つ確実に行われる。そして、パッド１１が外周面
で安定して支持され通常正常な姿勢になっているので、
吸着動作が一層迅速・確実になる。With the above structure, the vacuum chuck is operated as follows. The pad 11 is usually in a position close to horizontal. Alternatively, depending on the case, the position is regulated at a position inclined by, for example, 10 ° to 20 ° for some reason. When the hand 1 is brought close to the glass substrate 20 while vacuuming in this state, even when the pad 11 is horizontal and the glass substrate 20 is inclined, or when the inclination angles are not the same in other cases, , When the contact surface 11a of the pad 11 contacts the glass substrate 20,
The pad 11 easily changes its inclination as its partial spherical surface 11b slides on the support surface 1a. That is, according to the present invention, since no extra force such as a spring force acts on the pad in addition to the frictional force, the contact surface 11a easily follows the surface of the glass substrate 20. Since the pad 11 is in a floating state in which there is no restraint force other than its own weight, when the pad 11 is moved to a certain extent, it is lifted and adsorbed to the glass substrate 20. At this time, a minute gap is formed between the partial spherical surface 11b and the support surface 1a, but this gap is instantly eliminated by the pressure difference between the inside and the outside, and the glass substrate 20 is adsorbed and supported by the hand 1 via the pad 11. Such an operation is performed quickly and reliably by the floating effect of the pad 11. Since the pad 11 is stably supported on the outer peripheral surface and is in a normal posture,
The suction operation becomes even faster and more reliable.
【００１９】又、パッド１１の外周面を外側に開いた形
状の部分球面にしていることと、スプリング等の余分な
部品を一切設けていないことから、以上のように傾斜自
在な機能を有するにもかかわらず、ハンド１の高さが極
めて低く、且つ吸着構造部１０が簡素な構造のものにな
っている。Further, since the outer peripheral surface of the pad 11 is a partial spherical surface that is opened outward and no extra parts such as springs are provided, it has the function of freely tilting as described above. Nevertheless, the height of the hand 1 is extremely low, and the suction structure 10 has a simple structure.
【００２０】図４は、マガジンの支持部３０に多段に積
層支持されたガラス基板２０間にロボットで操縦される
ハンド１が挿入され、基板２０を支持・搬送するときの
状態を示す。図示の如く、ハンド１が支持部３０に近い
位置を支持しているので、支持部３０及びハンド１に支
持されたガラス基板２０の自重による撓み曲線は近似し
たものになる。従って、基板の支持・搬送動作に当たっ
て積層ピッチが有効に活用され、支持されたガラス基板
２０−２と上下のガラス基板２０−１及び２０−３との
間隔が十分確保される。一方、図５（ｂ）に示すような
従来のハンド１´を用いると、同図（ａ）に示す如く、
ガラス基板２０の撓み曲線が反対向きになるため、支持
した基板２０−２とその上の基板２０−３との間隔が殆
どなくなる。このため、従来のハンド１´を用いる場合
には、積層ピッチを大きくしなければならなかった。従
って、本発明のバキュームチャックによれば、従来より
積層ピッチを小さくすることにより、ガラス基板の製造
システムの高能率化を図ることができる。FIG. 4 shows a state where the robot-operated hand 1 is inserted between the glass substrates 20 laminated and supported in multiple stages on the supporting portion 30 of the magazine to support and convey the substrates 20. As shown in the figure, since the hand 1 supports the position close to the support portion 30, the deflection curves due to the weight of the glass substrate 20 supported by the support portion 30 and the hand 1 are similar. Therefore, the stacking pitch is effectively utilized in the substrate supporting / transporting operation, and the space between the supported glass substrate 20-2 and the upper and lower glass substrates 20-1 and 20-3 is sufficiently secured. On the other hand, when the conventional hand 1'as shown in FIG. 5B is used, as shown in FIG.
Since the bending curves of the glass substrate 20 are in opposite directions, there is almost no gap between the substrate 20-2 supported and the substrate 20-3 above it. Therefore, when the conventional hand 1'is used, the stacking pitch has to be increased. Therefore, according to the vacuum chuck of the present invention, it is possible to improve the efficiency of the glass substrate manufacturing system by making the stacking pitch smaller than in the past.
【００２１】なお以上では、図２に示す如く、ハンド１
を２組設けた場合について説明したが、取り扱うワーク
の形状、大きさ、材質等が定まっており、２点で支持し
たときの撓み曲線が略一定であるような場合には、吸着
構造部１０を有するハンド部分を中心位置に設け、その
両側にマガジンの支持間隔に近い距離を隔ててワーク受
け部を設け、パッド１１及びワーク受け部の高さがワー
クの撓み曲線に近い関係位置になるようなバキュームチ
ャックにすることも可能である。In the above, as shown in FIG. 2, the hand 1
Although the case where two sets are provided has been described, when the shape, size, material, etc. of the work to be handled are fixed and the bending curve when supported at two points is substantially constant, the suction structure section 10 is provided. The hand portion having the is provided at the center position, and the work receiving portions are provided on both sides thereof at a distance close to the support interval of the magazine so that the heights of the pad 11 and the work receiving portion are in a relational position close to the bending curve of the work. It is also possible to use a different vacuum chuck.
【００２２】[0022]
【発明の効果】以上の如く本発明によれば、請求項１の
発明においては、パッドの外周面を本体部材で球面支持
すると共に、抜け出し規制部材でその抜け出しを防止す
ることにより、パッドをフローティング支持して歪みの
大きなワークでも確実に吸着することができる。又、ス
プリングを設ける必要がないので、構造が簡単になると
共に、本体部材を薄型にすることができる。その結果、
ワークを多段に支持する製造装置の場合に、その積層間
隔を縮小して集積率を大きくし、そのコンパクト化と処
理能力の向上を図ることができる。更に、本体部材自体
の平面精度を厳しく維持する必要がなくなるので、製造
コストが低減する。As described above, according to the present invention, in the first aspect of the invention, the pad is floated by supporting the outer peripheral surface of the pad with the main body member in a spherical surface and preventing the coming out by the coming-out restricting member. Even a work that supports and has large distortion can be reliably adsorbed. Further, since it is not necessary to provide a spring, the structure is simple and the main body member can be made thin. as a result,
In the case of a manufacturing apparatus that supports works in multiple stages, it is possible to reduce the stacking interval to increase the integration rate, to make it compact and to improve the processing capacity. Further, since it is not necessary to strictly maintain the plane accuracy of the main body member itself, the manufacturing cost is reduced.
【００２３】請求項２の発明においては、上記に加え
て、本体部材を２組設け、その間隔をワークが支持され
る間隔に近づけるので、ワークが多段に支持される場
合、支持状態でのワークの撓み曲線を近似させることが
でき、積層ピッチを一層小さくして更に製造設備の能力
向上を図ることができる。According to the second aspect of the invention, in addition to the above, two sets of main body members are provided and the distance between them is close to the distance at which the work is supported. Therefore, when the work is supported in multiple stages, the work in the supported state is supported. Can be approximated, and the stacking pitch can be further reduced to further improve the capacity of the manufacturing equipment.
【図１】実施例のバキュームチャックの吸着構造部の断
面図である。FIG. 1 is a cross-sectional view of a suction structure portion of a vacuum chuck according to an embodiment.
【図２】上記バキュームチャックの全体構成を示し、
（ａ）は平面図で（ｂ）は（ａ）のｂ−ｂ線拡大断面図
である。FIG. 2 shows the overall structure of the vacuum chuck,
(A) is a top view and (b) is an bb line expanded sectional view of (a).
【図３】他の実施例のバキュームチャックの全体構成を
示し、（ａ）は平面図で（ｂ）は（ａ）のｂ−ｂ線拡大
断面図である。3A and 3B show an overall configuration of a vacuum chuck of another embodiment, FIG. 3A is a plan view and FIG. 3B is an enlarged sectional view taken along line bb of FIG.
【図４】実施例のバキュームチャックでマガジンに積層
支持されたガラス基板を支持・搬送するときの状態を示
した説明図である。FIG. 4 is an explanatory diagram showing a state in which glass substrates stacked and supported in a magazine are supported and conveyed by the vacuum chuck of the embodiment.
【図５】（ａ）は従来のバキュームチャックでマガジン
に積層支持されたガラス基板を支持・搬送するときの状
態を示した説明図で、（ｂ）は従来のバキュームチャッ
クの斜視図である。5A is an explanatory view showing a state in which glass substrates stacked and supported in a magazine are supported and conveyed by a conventional vacuum chuck, and FIG. 5B is a perspective view of the conventional vacuum chuck.
１ ハンド（本体部材） １ａ 支持面 １０ 吸着構造部 １１ パッド １１ａ 接触面１１ １１ｂ 部分球面１１（外周面） １１ｃ 開口面 １１ｄ 突出部 １２ パッド押さえ（抜け出し規制部材） １２ａ 対向突出部 ２０ ガラス基板（ワーク） DESCRIPTION OF SYMBOLS 1 Hand (main body member) 1a Support surface 10 Adsorption structure part 11 Pad 11a Contact surface 11 11b Partial spherical surface 11 (outer peripheral surface) 11c Opening surface 11d Projection part 12 Pad retainer (removal control member) 12a Opposed projection part 20 Glass substrate (workpiece) )
Claims (2)
状のワークを吸着するバキュームチャックにおいて、 前記吸着構造部は、前記ワークに吸着するパッドと、該
パッドを支持する支持面と、抜け出し規制部材とを有
し、前記パッドは、前記本体部材の表面から突出し前記
ワークに接触する接触面と、該接触面と接続し一定曲率
の曲面をなす外周面と、前記外周面の内側に設けられた
開口面と、該開口面の内側に突出した突出部とを備え、
前記支持面は、前記本体部材に形成され前記外周面と同
じ曲率を持つ曲面をなし、前記抜け出し規制部材は、前
記開口面の内側に設けられ、前記本体部材に固定され、
前記突出部に対して前記ワーク側に間隙を隔てて対向し
た対向突出部を備えている、ことを特徴とするバキュー
ムチャック。1. A vacuum chuck, comprising a plate-shaped main body member having a suction structure part for sucking a plate-shaped work, wherein the suction structure part has a pad for sucking the work and a support surface for supporting the pad. A slip-out restricting member, the pad protruding from a surface of the main body member and contacting the work, an outer peripheral surface connected to the contact surface and forming a curved surface with a constant curvature, and an inner side of the outer peripheral surface. An opening surface provided in the, and a protrusion protruding inside the opening surface,
The support surface is formed on the main body member and has a curved surface having the same curvature as the outer peripheral surface, and the slip-out restricting member is provided inside the opening surface and fixed to the main body member,
A vacuum chuck, characterized in that it is provided with an opposed protrusion facing the protrusion with a gap therebetween on the work side.
２組から成り、それぞれの本体部材は前記ワークの両端
支持部間の距離に近い間隔を隔てて結合されていること
を特徴とする請求項１に記載のバキュームチャック。2. The main body member having the suction structure is composed of two sets, and each main body member is coupled with a distance close to a distance between both end support portions of the work. The vacuum chuck according to Item 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5820794A JP2663240B2 (en) | 1994-03-02 | 1994-03-02 | Floating vacuum chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5820794A JP2663240B2 (en) | 1994-03-02 | 1994-03-02 | Floating vacuum chuck |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07237765A true JPH07237765A (en) | 1995-09-12 |
| JP2663240B2 JP2663240B2 (en) | 1997-10-15 |
Family
ID=13077605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5820794A Expired - Lifetime JP2663240B2 (en) | 1994-03-02 | 1994-03-02 | Floating vacuum chuck |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2663240B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5907770A (en) * | 1995-07-19 | 1999-05-25 | Semiconductor Energy Laboratory Co., | Method for producing semiconductor device |
| JP2002305233A (en) * | 2001-04-05 | 2002-10-18 | Olympus Optical Co Ltd | Arm for carrying wafer |
| US6902616B1 (en) * | 1995-07-19 | 2005-06-07 | Semiconductor Energy Laboratory Co., Ltd. | Method and apparatus for producing semiconductor device |
| WO2012159278A1 (en) * | 2011-05-24 | 2012-11-29 | 深圳市华星光电技术有限公司 | Panel transporting apparatus and panel supporting mechanism thereof |
| KR20190001835U (en) * | 2018-01-10 | 2019-07-18 | 히라따기꼬오 가부시키가이샤 | Suction hand |
| CN116021542A (en) * | 2023-02-13 | 2023-04-28 | 绵阳师范学院 | Balance adjustment system of robot |
-
1994
- 1994-03-02 JP JP5820794A patent/JP2663240B2/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5907770A (en) * | 1995-07-19 | 1999-05-25 | Semiconductor Energy Laboratory Co., | Method for producing semiconductor device |
| US6902616B1 (en) * | 1995-07-19 | 2005-06-07 | Semiconductor Energy Laboratory Co., Ltd. | Method and apparatus for producing semiconductor device |
| US7513949B2 (en) | 1995-07-19 | 2009-04-07 | Semiconductor Energy Laboratory Co., Ltd. | Method and apparatus for producing semiconductor device |
| JP2002305233A (en) * | 2001-04-05 | 2002-10-18 | Olympus Optical Co Ltd | Arm for carrying wafer |
| WO2012159278A1 (en) * | 2011-05-24 | 2012-11-29 | 深圳市华星光电技术有限公司 | Panel transporting apparatus and panel supporting mechanism thereof |
| KR20190001835U (en) * | 2018-01-10 | 2019-07-18 | 히라따기꼬오 가부시키가이샤 | Suction hand |
| CN116021542A (en) * | 2023-02-13 | 2023-04-28 | 绵阳师范学院 | Balance adjustment system of robot |
| CN116021542B (en) * | 2023-02-13 | 2023-06-13 | 绵阳师范学院 | Balance adjustment system of robot |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2663240B2 (en) | 1997-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100445049C (en) | Vacuum suction head, and vacuum suction device and table using the same | |
| JPH0719150Y2 (en) | Wafer transfer hand | |
| JPH09205128A (en) | Arm for semiconductor wafer transport robot | |
| TW200534975A (en) | Carrying robot for glass substrate | |
| JPH07237765A (en) | Floating type vacuum chuck | |
| JP2007083322A (en) | Substrate suction device, substrate support, substrate conveying device, and glass substrate conveying robot | |
| JPH1074816A (en) | Wafer transporting device | |
| JP2598768Y2 (en) | Transfer device | |
| JP3042092B2 (en) | Object handling equipment | |
| JP2003245886A (en) | Adsorbing mechanism | |
| JPH08290382A (en) | Sucking device and carrying device | |
| JP4655272B2 (en) | Substrate adsorption device and substrate transfer device using the same | |
| JP2001341090A (en) | Vacuum gripping device and ic test handler | |
| JP2719657B2 (en) | Swing vacuum pad | |
| WO2022016952A1 (en) | Device placement apparatus | |
| JP4305749B2 (en) | Substrate holding device | |
| JPH06335877A (en) | Vacuum suction device | |
| JP2754817B2 (en) | Wafer handling equipment | |
| JP2002337874A (en) | Pallet for coil material | |
| JP2004082229A (en) | Suction hand | |
| JPH01282834A (en) | Suction band for shifting wafer | |
| JP3351195B2 (en) | Palletizing hand | |
| JP2812866B2 (en) | Suction pad | |
| CN218659140U (en) | Sucking disc subassembly and moving part | |
| KR102365424B1 (en) | Suction jig for articulated robot transferring ultra thin glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080620 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090620 Year of fee payment: 12 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 13 Free format text: PAYMENT UNTIL: 20100620 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 13 Free format text: PAYMENT UNTIL: 20100620 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110620 Year of fee payment: 14 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 14 Free format text: PAYMENT UNTIL: 20110620 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 15 Free format text: PAYMENT UNTIL: 20120620 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 15 Free format text: PAYMENT UNTIL: 20120620 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130620 Year of fee payment: 16 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |