JPH07194961A - Raw material feeding apparatus - Google Patents
Raw material feeding apparatusInfo
- Publication number
- JPH07194961A JPH07194961A JP6001188A JP118894A JPH07194961A JP H07194961 A JPH07194961 A JP H07194961A JP 6001188 A JP6001188 A JP 6001188A JP 118894 A JP118894 A JP 118894A JP H07194961 A JPH07194961 A JP H07194961A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- vaporization
- vaporization chamber
- chamber
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、液体原料を直接気化
し、反応装置に送って所要の反応を行わせるために用い
られる原料供給装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a raw material supply device used for directly vaporizing a liquid raw material and sending it to a reactor to carry out a desired reaction.
【０００２】[0002]
【従来の技術】液体原料を直接気化して反応炉に供給す
る原料供給装置の一例を図７に示す。図中１は原料タン
クであって、液体原料２を気化するためのヒータ３で包
まれている。この原料タンク１の上部空間４には気化し
た原料ガスが満され、反応炉に通じる配管系５にはそれ
ぞれ開閉弁６（メタルダイアフラム弁）、自動開閉弁７
（空気圧メタルダイアフラム弁）、質量流量制御装置８
（マスフローコントローラ）が配管されており、さらに
自動開閉弁７と質量流量制御装置８との間には自動開閉
弁10を有するパージガス導入用の配管９が接続されてい
る。自動開閉弁７は自動開閉弁10と連動し、原料ガス供
給中は自動開閉弁７が開で自動開閉弁10が閉となって原
料ガスを反応炉に供給し、原料供給をしていないときは
自動開閉弁７が閉で、自動開閉弁10が開となって配管中
にＮ2などのバージガスを流して配管保護のためにパー
ジを行うことになっている。2. Description of the Related Art An example of a raw material supply device for directly vaporizing a liquid raw material and supplying it to a reaction furnace is shown in FIG. In the figure, reference numeral 1 denotes a raw material tank, which is surrounded by a heater 3 for vaporizing a liquid raw material 2. The upper space 4 of the raw material tank 1 is filled with vaporized raw material gas, and the piping system 5 leading to the reactor is provided with an on-off valve 6 (metal diaphragm valve) and an automatic on-off valve 7 respectively.
(Pneumatic metal diaphragm valve), mass flow controller 8
A (mass flow controller) is piped, and a purge gas introducing pipe 9 having an automatic open / close valve 10 is connected between the automatic open / close valve 7 and the mass flow controller 8. When the automatic open / close valve 7 is interlocked with the automatic open / close valve 10 and the automatic open / close valve 7 is opened and the automatic open / close valve 10 is closed during the supply of the raw material gas to supply the raw material gas to the reactor and not supply the raw material gas. The automatic opening / closing valve 7 is closed and the automatic opening / closing valve 10 is opened to flow a barge gas such as N 2 into the pipe for purging to protect the pipe.
【０００３】ところで、上記従来の装置では、ヒータに
よって原料タンク内の温度を一定制御すると共にタンク
内を減圧状態にして液体原料を気化させる。気化量が少
ないうちはヒータから液体に供給され、液面まで伝達さ
れる熱量と液面にて気化するガスの気化熱とをバランス
させることが出来、液面の温度は一定に保たれる。液面
の温度が一定に保たれていれば、気化タンク内の圧力は
その温度に於ける、液体原料の蒸気圧で安定しており、
気化ガスを反応炉側へ安定して供給することが出来る。
ところが、気化ガス量を増やすと、次第にヒータから液
体に供給され、液面まで伝達される熱量と液面にて気化
するガスの気化熱とをバランスさせることが出来なくな
り、液面の温度は低下し、気化タンク内の圧力も低下す
る。液体の温度が低下、タンク内圧力が減少していると
ころへヒータから供給される熱量は液体温度を上げるた
めに増加する。すると液体表面からの気化ではなく、タ
ンク内壁での気化、すなわち沸騰が始まる。沸騰が始ま
ると、気化タンク内の圧力は不連続に大きく変化し、そ
の変動は配管５まで影響を与える。質量流量制御装置は
この内圧変化には追従しきれず一時的に流量誤差を生じ
てしまう。By the way, in the above-mentioned conventional apparatus, the temperature of the raw material tank is constantly controlled by the heater and the inside of the tank is depressurized to vaporize the liquid raw material. While the vaporization amount is small, the amount of heat supplied to the liquid from the heater and transferred to the liquid surface and the vaporization heat of the gas vaporized on the liquid surface can be balanced, and the liquid surface temperature is kept constant. If the temperature of the liquid surface is kept constant, the pressure in the vaporization tank is stable at the vapor pressure of the liquid raw material at that temperature,
The vaporized gas can be stably supplied to the reaction furnace side.
However, when the amount of vaporized gas is increased, the amount of heat that is gradually supplied to the liquid from the heater and transferred to the liquid surface and the heat of vaporization of the gas that vaporizes on the liquid surface cannot be balanced, and the temperature of the liquid surface decreases. However, the pressure in the vaporization tank also drops. The amount of heat supplied from the heater to the place where the temperature of the liquid has decreased and the tank internal pressure has decreased increases to raise the liquid temperature. Then, not the vaporization from the liquid surface but the vaporization at the inner wall of the tank, that is, the boiling starts. When boiling starts, the pressure in the vaporization tank changes greatly discontinuously, and the fluctuation affects up to the pipe 5. The mass flow rate control device cannot follow this change in internal pressure and temporarily causes a flow rate error.
【０００４】[0004]
【発明が解決しようとする課題】この問題を解決するた
めに例えば、 （イ）タンクの断面積を大きく、液体原料の深さを浅く
して、ヒータから供給される熱量を液面まで伝達しやす
くすることが考えられるが、単純にタンクを大きくした
だけでは現実的でない上にタンク内の温度の不均一をま
ねき、これによって気化量が不安定になる問題がある。
又、タンク内の液体量が少なくなるため、気化中に液体
原料を供給しなくてはならない。気化中に液体原料を補
給することはタンク内温度、圧力の変動を引き起こす
為、問題がある。In order to solve this problem, for example, (a) the cross-sectional area of the tank is made large and the depth of the liquid raw material is made shallow so that the amount of heat supplied from the heater is transmitted to the liquid surface. Although it is possible to make it easier, there is a problem that simply increasing the size of the tank is not realistic and also causes the temperature in the tank to be non-uniform, which makes the vaporization amount unstable.
In addition, since the amount of liquid in the tank becomes small, the liquid raw material must be supplied during vaporization. There is a problem in replenishing the liquid raw material during vaporization because it causes fluctuations in temperature and pressure in the tank.
【０００５】（ロ）特公平２−12142 号には、急激な沸
騰を避けるために原料タンク内に沸騰時の気泡の核とな
る不活性ガスを供給することが提案されている。しかし
この場合は、直接気化というよりいわゆるバブリング式
の気化手段となるので気化ガスの中には不活性ガス量も
含まれることになり、純粋な原料ガスの質量流量を把握
するには複雑な補正が必要となり直接気化のメリットが
損われる。(B) Japanese Patent Publication No. 2-12142 proposes to supply an inert gas, which is a nucleus of bubbles at the time of boiling, into a raw material tank in order to avoid sudden boiling. However, in this case, since it becomes a so-called bubbling type vaporization means rather than direct vaporization, the amount of inert gas is also included in the vaporized gas, and in order to grasp the mass flow rate of the pure raw material gas, a complicated correction is necessary. Is required, and the advantage of direct vaporization is impaired.
【０００６】（ハ）実公平４−50895 号には、原料タン
ク内に小孔を有する仕切壁を設けて気化タンク室と緩衛
タンク室とに分けて急激な圧力変化を一旦緩衛タンク室
内で緩衛することが提案されている。しかし、この場合
は気化タンク室に比べて緩衛タンク室内の圧力はかなり
低下するので十分な気化量を得ることができず効率が悪
い。また気化量が少なくなるので適用装置が限定される
という不都合もある。(C) In Japanese Utility Model Publication No. 4-50895, a partition wall having a small hole is provided in the raw material tank to divide the vaporization tank chamber and the slow-protection tank chamber into a sudden pressure change and temporarily It is proposed to relax in. However, in this case, since the pressure in the slow guard tank chamber is considerably lower than that in the vaporization tank chamber, a sufficient vaporization amount cannot be obtained and the efficiency is poor. Further, since the vaporization amount becomes small, there is a disadvantage that the applicable device is limited.
【０００７】本発明は、上記の問題を解消するもので、
原料タンク内の急激な沸騰を無駄なく抑制し、効率良く
大流量まで安定した原料気化ガスの供給を行うことので
きる原料供給装置を提供することを目的とする。The present invention solves the above problems.
An object of the present invention is to provide a raw material supply device capable of suppressing rapid boiling in the raw material tank without waste and efficiently supplying a stable raw material vaporized gas up to a large flow rate.
【０００８】[0008]
【課題を解決するための手段】本発明は、原料液を収容
して加熱気化する原料タンクと、気化された原料ガスを
開閉および流量制御する装置を介して反応装置に導く配
管を備えた原料供給装置において、前記原料タンクは、
その外部を加熱手段で包被し、その内部を各々に気化空
間部を有した内側気化室と外部気化室とに区画してな
り、前記内側気化室と外側気化室は下方の一部で連通し
てなり、外側気化室の気化空間部からはバブリング管が
下方に延出して内側気化室の原料液中に埋没し、内側気
化室の気化空間部からは前記反応装置に導く配管が延出
している原料供給装置である。SUMMARY OF THE INVENTION The present invention is a raw material provided with a raw material tank for accommodating a raw material liquid and heating and vaporizing it, and a pipe for guiding the vaporized raw material gas to a reaction device through a device for opening / closing and controlling the flow rate. In the supply device, the raw material tank is
The outside is covered with heating means, and the inside is divided into an internal vaporization chamber and an external vaporization chamber each having a vaporization space portion, and the internal vaporization chamber and the external vaporization chamber communicate with each other at a lower part. The bubbling pipe extends downward from the vaporization space of the outer vaporization chamber and is buried in the raw material liquid of the inner vaporization chamber, and the pipe leading to the reactor extends from the vaporization space of the inner vaporization chamber. It is a raw material supply device.
【０００９】上記において、バブリング管の先端にさら
に細径のひげ状細管を複数本放射状に密封固着するこ
と、また、バブリング管の挿入（埋没）深さを可変調節
できるようにすることが望ましい。In the above description, it is desirable that a plurality of whisker-like capillaries having a smaller diameter are radially and hermetically fixed to the tip of the bubbling pipe, and that the insertion (burial) depth of the bubbling pipe can be variably adjusted.
【００１０】[0010]
【作用】内側気化室と外側気化室の当初の原料液温度は
ほぼ同じであるが気化が進むと、内側気化室は気化熱が
奪われるため外側気化室の温度、圧力の方が若干高くな
りはじめ、しかも外側にはヒータがあるのでさらに高く
なる方向に進む。このとき、バブリング管は外側気化室
の気化部から内側空気室内の原料液中に埋没されている
ので、当初内側気化室と外側気化室は挿入深さ分の圧力
差をもって両室はバランスしている。その後、使用流量
が増えて気化量が多くなると内側空気室の圧力は低下し
続け、ついには沸騰しようとするが、一方で外側気化室
との間の圧力差は大きくなるので圧力バランスが崩れ、
ついには外側空気室内の気化ガス自身がバブリング管を
介して内側気化室の液中にバブリングする。しかし、こ
のバブリングは細泡となって原料液中に分散して内側気
化室内の圧力減少にブレーキをかける。これが内側気化
室内の沸騰を抑える働きをなし、結果大きな圧力変動を
起すことなく気化ガスの安定供給が可能となる。[Function] Initially, the temperature of the raw material liquid in the inner vaporization chamber and that in the outer vaporization chamber are almost the same, but as vaporization progresses, the heat and vaporization of the inner vaporization chamber are deprived, so the temperature and pressure of the outer vaporization chamber become slightly higher. At the beginning, since there is a heater on the outside, the direction goes higher. At this time, since the bubbling pipe is buried in the raw material liquid in the inner air chamber from the vaporization section of the outer vaporization chamber, the inner vaporization chamber and the outer vaporization chamber are initially balanced with a pressure difference corresponding to the insertion depth. There is. After that, when the use flow rate increases and the amount of vaporization increases, the pressure in the inner air chamber continues to drop, and finally tries to boil, but on the other hand, the pressure difference between the outer vaporization chamber increases and the pressure balance collapses,
Finally, the vaporized gas itself in the outer air chamber bubble into the liquid in the inner vaporization chamber through the bubbling pipe. However, this bubbling becomes fine bubbles that are dispersed in the raw material liquid and brake the pressure decrease in the inner vaporization chamber. This serves to suppress boiling in the inner vaporization chamber, and as a result, stable supply of vaporized gas is possible without causing large pressure fluctuations.
【００１１】ここで、バブリングによる泡はできるだけ
細かくして四方に分散する方が効果的であるから、ひげ
状の細管を放射状に延在させていることが有効に働く。
また、バブリング管の液中への挿入深さが内側気化室と
外側気化室間のバランス圧力を決定し、ひいてはバブリ
ングの発生時期を操作できるので、原料液や気化装置の
特性によって適宜上記挿入深さを決定することになる。Here, it is effective to make the bubbles due to bubbling as fine as possible and disperse them in all directions. Therefore, it is effective that the whisker-like thin tubes are radially extended.
In addition, the insertion depth of the bubbling pipe into the liquid determines the balance pressure between the inner vaporization chamber and the outer vaporization chamber, and as a result, the timing of bubbling can be controlled. Will be decided.
【００１２】[0012]
【実施例】以下、本発明の実施例を図面を参照して説明
する。尚、本発明の原料供給装置において、原料タンク
部分以外は従来と同様なので以下は原料タンク部分につ
いて説明する。そして、図１は原料タンク部分の縦断面
図、図２はその上面図である。図１において、原料タン
ク20は、その外面にヒータ51が設けられこれで覆われて
いる。また内部には環状の第１隔壁30を設けて、内側気
化室21と外側気化室22が区画形成されており、両室は隔
壁下部の貫通孔31，32を介して連通状態にある。尚、貫
通孔32は全周にわたって略均等に設けられ、液体ソース
導入管28から原料液が供給されると原料は両室共に同量
貯蔵されるようになっている。25はバブリング管で外側
気化室22の上部にある気化空間部22Ａから下方に延びて
内側気化室21内の液中に埋没している。さらにこのバブ
リング管25の先端には密封を保って複数本のひげ状細管
26が放射状に延びている。なお、ひげ状細管26の内径は
コンマ数ミリ程度の小孔のものが好ましく、これによっ
て均一できめ細かい気泡を連続的に得るようにしてい
る。また放射状にすると内側気化室内の広い範囲にわた
って上記した細泡を発生させることができ、この細胞に
よる内側気化室の圧力変動をおさえることができる。Embodiments of the present invention will be described below with reference to the drawings. In the raw material supply device of the present invention, the raw material tank portion is the same as the conventional one except for the raw material tank portion, and therefore the raw material tank portion will be described below. 1 is a vertical sectional view of the raw material tank portion, and FIG. 2 is a top view thereof. In FIG. 1, the raw material tank 20 is provided with a heater 51 on the outer surface thereof and is covered with the heater 51. Further, an annular first partition wall 30 is provided inside to define an inner vaporization chamber 21 and an outer vaporization chamber 22, and both chambers are in communication with each other through through holes 31 and 32 in the lower portion of the partition wall. The through holes 32 are provided substantially evenly around the entire circumference, and when the raw material liquid is supplied from the liquid source introducing pipe 28, the same amount of raw material is stored in both chambers. A bubbling pipe 25 extends downward from the vaporization space 22A above the outer vaporization chamber 22 and is buried in the liquid inside the inner vaporization chamber 21. Furthermore, at the tip of the bubbling tube 25, a plurality of whisker-like thin tubes are kept sealed.
26 extends radially. The inner diameter of the whisker-like thin tube 26 is preferably a small hole having a comma of several millimeters so that uniform and fine bubbles can be continuously obtained. Further, when the cells are made radial, the above-mentioned fine bubbles can be generated over a wide range in the inner vaporization chamber, and pressure fluctuations in the inner vaporization chamber due to the cells can be suppressed.
【００１３】内側気化室内はさらに仕切板状の第２隔壁
40を設けて、反応装置側につながる配管27がある第１気
化室21Ａとバブリング管が挿入される第２気化室21Ｂと
に区画している。隔壁40には貫通孔41，42があり原料液
部と気化空間部がそれぞれ連通している。なお、この貫
通孔41，42はバブリング管の開口面積や隔壁30の貫通孔
31，32よりも大きくしておく。この隔壁40があることに
よって液面の波動や圧力を安定させる上で有効である。
52は温度センサで原料液の温度を検出し、この結果をも
とにヒータ51をフィードバック制御して温度を一定制御
している。また53は液面計で原料液の量をチェックして
いる。54は圧力計である。The inner vaporizing chamber is further provided with a partition plate-shaped second partition wall.
40 is provided to divide into a first vaporization chamber 21A having a pipe 27 connected to the reactor side and a second vaporization chamber 21B into which a bubbling pipe is inserted. The partition wall 40 has through holes 41 and 42, and the raw material liquid portion and the vaporization space portion communicate with each other. The through holes 41 and 42 are the opening area of the bubbling pipe and the through holes of the partition wall 30.
Keep it larger than 31, 32. The presence of the partition wall 40 is effective in stabilizing the wave and pressure of the liquid surface.
A temperature sensor 52 detects the temperature of the raw material liquid, and based on this result, the heater 51 is feedback-controlled to control the temperature constantly. Also, 53 is a liquid level gauge to check the amount of the raw material liquid. 54 is a pressure gauge.
【００１４】次に、図３〜図６を用いて気化ガスの供給
過程の動作について説明する。図３は気化前を示し、内
側気化室の第１気化室21Ａと第２気化室21Ｂ及び外側気
化室22の圧力、温度もほぼ均一で液面も同じとなってい
る。Next, the operation of the vaporized gas supply process will be described with reference to FIGS. FIG. 3 shows before vaporization, and the pressures and temperatures of the first vaporization chamber 21A, the second vaporization chamber 21B and the outer vaporization chamber 22 of the inner vaporization chamber are almost uniform and the liquid surfaces are the same.
【００１５】図４で気化が開始されると、内側気化室21
内の液面から優先的に気化が始まるが、室内は気化熱に
より温度低下が起き蒸気圧が下がる。ここで温度センサ
52は第１気化室21Ａにあるので外側気化室22の温度はヒ
ータ51により上昇し蒸気圧は上がる。また、第１気化室
21Ａから気化ガスは導かれていくので、全般的に内側気
化室21より外側気化室22の方が温度、圧力共高まる方向
で気化が進む。When vaporization is started in FIG. 4, the inner vaporization chamber 21
Evaporation preferentially starts from the liquid level inside, but the temperature in the room decreases due to the heat of vaporization and the vapor pressure drops. Where the temperature sensor
Since 52 is in the first vaporization chamber 21A, the temperature of the outer vaporization chamber 22 is raised by the heater 51 and the vapor pressure is raised. Also, the first vaporization chamber
Since the vaporized gas is guided from 21A, the vaporization progresses generally in the direction in which both the temperature and the pressure increase in the outer vaporization chamber 22 than in the inner vaporization chamber 21.
【００１６】気化量が増えてくると一層内側気化室21と
外側気化室22の圧力差が大きくなって、この圧力差がバ
ブリング管の水深よりも大きくなれば図５に示すよう
に、内側気化室の第２気化室21Ｂ内にバブリングが生じ
始める。このバブリングは自己の気化ガスであるので不
純物を含むようなことはないし、後の流量制御が煩雑に
なることもない。As the amount of vaporization increases, the pressure difference between the inner vaporization chamber 21 and the outer vaporization chamber 22 further increases, and if this pressure difference becomes larger than the water depth of the bubbling pipe, the inner vaporization will be as shown in FIG. Bubbling begins to occur in the second vaporization chamber 21B of the chamber. Since this bubbling is a vaporized gas of its own, it does not contain impurities, and the subsequent flow rate control does not become complicated.
【００１７】図６は、更に気化量を増大させた場合を示
しているが、バブリングが進行すると全体の圧力は下が
るが、内側空気室21と外側空気室22間の圧力差はバブリ
ング管の水深によって決まり継続される。一方で、外側
気化室22は常に温度が高くなってくるので、ある時点で
沸騰が生じ始める。しかし、この沸騰による圧力変動は
バブリング管25と貫通孔31，32を介してしか内側気化室
21には伝わらないので、しかも仕切壁40があるので第２
気化室21Ａ側への影響はほとんどないものである。通常
の気化動作は上記の過程内で設定するものであるが、さ
らに気化量を増やす場合は、隔壁30にある貫通孔31から
バブリングを起こさせて外側気化室22の無用の圧力上昇
を防ぐことを行う。FIG. 6 shows a case where the vaporization amount is further increased. As the bubbling progresses, the overall pressure decreases, but the pressure difference between the inner air chamber 21 and the outer air chamber 22 is the water depth of the bubbling pipe. It is decided by and is continued. On the other hand, since the temperature of the outer vaporization chamber 22 is constantly increasing, boiling starts to occur at a certain point. However, the pressure fluctuation due to the boiling is caused only through the bubbling pipe 25 and the through holes 31 and 32.
Because it does not reach 21, and because there is a partition wall 40
There is almost no effect on the vaporization chamber 21A side. The normal vaporization operation is set in the above process, but when further increasing the vaporization amount, bubbling is caused from the through hole 31 in the partition wall 30 to prevent an unnecessary pressure rise in the outer vaporization chamber 22. I do.
【００１８】[0018]
【発明の効果】本発明の原料供給装置によれば、自己の
原料ガスによるバブリングにより気化ガス供給室内の圧
力変動を抑制することができるので、直接気化方式の利
点を備えたまま、大流量まで安定した原料気化ガスの供
給を行うことができる。According to the raw material supply apparatus of the present invention, it is possible to suppress the pressure fluctuation in the vaporized gas supply chamber by bubbling by the raw material gas of its own, so that it is possible to achieve a large flow rate while maintaining the advantages of the direct vaporization system. It is possible to stably supply the raw material vaporized gas.
【図１】 本発明の一実施例を示す原料タンク部分の縦
断面図である。FIG. 1 is a vertical cross-sectional view of a raw material tank portion showing an embodiment of the present invention.
【図２】 図１の上面図である。FIG. 2 is a top view of FIG.
【図３】 図３〜図６は本発明による気化動作の過程を
示すもので、気化前の状態を示す図である。3 to 6 show a process of vaporization operation according to the present invention, which is a diagram showing a state before vaporization.
【図４】 気化開始時の状態を示す図である。FIG. 4 is a diagram showing a state at the start of vaporization.
【図５】 バブリングが開始された状態を示す図であ
る。FIG. 5 is a diagram showing a state where bubbling is started.
【図６】 さらに気化が進んだ状態を示す図である。FIG. 6 is a diagram showing a state in which vaporization has further progressed.
【図７】 従来の原料供給装置の一例を示す図である。FIG. 7 is a diagram showing an example of a conventional raw material supply device.
20…原料タンク 21…内側気化室 22…外側気化室 21Ａ，21Ｂ，22Ａ…気化部 25…バブリング管 26…ひげ状細管 30，40…隔壁 31，32，41，42…貫通孔 20 ... Raw material tank 21 ... Inner vaporization chamber 22 ... Outer vaporization chamber 21A, 21B, 22A ... Vaporization part 25 ... Bubbling tube 26 ... Whisker-like thin tube 30, 40 ... Partition wall 31, 32, 41, 42 ... Through hole
Claims (1)
クと、気化された原料ガスを開閉および流量制御する装
置を介して反応装置に導く配管を備えた原料供給装置に
おいて、前記原料タンクは、その外部を加熱手段で包被
し、その内部を各々に気化空間部を有した内側気化室と
外部気化室とに区画してなり、前記内側気化室と外側気
化室は下方の一部で連通してなり、外側気化室の気化空
間部からはバブリング管が下方に延出して内側気化室の
原料液中に埋没し、内側気化室の気化空間部からは前記
反応装置に導く配管が延出していることを特徴とする原
料供給装置。1. A raw material supply device comprising a raw material tank for containing a raw material liquid and heating and vaporizing it, and a pipe for guiding the vaporized raw material gas to a reactor through an apparatus for opening / closing and controlling the flow rate, wherein the raw material tank is , The outside is covered with a heating means, and the inside is divided into an internal vaporization chamber and an external vaporization chamber each having a vaporization space, and the internal vaporization chamber and the external vaporization chamber are part of the lower part. The bubbling pipe extends downward from the vaporization space of the outer vaporization chamber and is buried in the raw material liquid of the inner vaporization chamber, and the pipe leading to the reactor extends from the vaporization space of the inner vaporization chamber. A raw material supply device characterized by being put out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6001188A JPH07194961A (en) | 1994-01-11 | 1994-01-11 | Raw material feeding apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6001188A JPH07194961A (en) | 1994-01-11 | 1994-01-11 | Raw material feeding apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07194961A true JPH07194961A (en) | 1995-08-01 |
Family
ID=11494485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6001188A Pending JPH07194961A (en) | 1994-01-11 | 1994-01-11 | Raw material feeding apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07194961A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006272100A (en) * | 2005-03-28 | 2006-10-12 | Ishikawajima Harima Heavy Ind Co Ltd | System for volatilizing/supplying volatile substance |
| KR20190132350A (en) | 2017-04-13 | 2019-11-27 | 가부시키가이샤 호리바 에스텍 | Vaporizer and Vaporization System |
-
1994
- 1994-01-11 JP JP6001188A patent/JPH07194961A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006272100A (en) * | 2005-03-28 | 2006-10-12 | Ishikawajima Harima Heavy Ind Co Ltd | System for volatilizing/supplying volatile substance |
| KR20190132350A (en) | 2017-04-13 | 2019-11-27 | 가부시키가이샤 호리바 에스텍 | Vaporizer and Vaporization System |
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