JPH0679503A - Tool covered with carbide film and its manufacture - Google Patents
Tool covered with carbide film and its manufactureInfo
- Publication number
- JPH0679503A JPH0679503A JP16128093A JP16128093A JPH0679503A JP H0679503 A JPH0679503 A JP H0679503A JP 16128093 A JP16128093 A JP 16128093A JP 16128093 A JP16128093 A JP 16128093A JP H0679503 A JPH0679503 A JP H0679503A
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- JP
- Japan
- Prior art keywords
- film
- ultra
- tungsten
- hard
- tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、耐摩耗性に優れた超硬
質膜付工具およびその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a tool with a super hard film having excellent wear resistance and a method for manufacturing the tool.
【０００２】[0002]
【従来技術】ダイヤモンド，立方晶窒化硼素等の超硬質
材料は、従来大規模な超高圧プレス装置により作成して
いた。しかし、気相合成法によれば、これらの材料が簡
便な方法により得られることから、気相合成法によるダ
イヤモンドや立方晶窒化硼素等の超硬質材料は、今後、
広範囲にわたる応用が期待されている（特開昭６０−５
４９９５号公報等参照）。2. Description of the Related Art Ultra-hard materials such as diamond and cubic boron nitride have hitherto been produced by a large-scale ultra-high pressure press machine. However, according to the vapor phase synthesis method, since these materials can be obtained by a simple method, ultra-hard materials such as diamond and cubic boron nitride by the vapor phase synthesis method will be used in the future.
A wide range of applications are expected (JP-A-60-5).
4995, etc.).
【０００３】しかし、超硬質膜は、例えば、窒化珪素や
超硬合金からなる母材とは密着性が不十分で剥がれが生
じやすいという問題がある。そこでこの対策としてシリ
コン基盤上にダイヤモンド膜を形成し、しかるのちにこ
のダイヤモンド膜を切り出して超硬工具の刃先に蝋付け
することが提案されている。However, there is a problem in that the ultra-hard film has insufficient adhesion to the base material made of, for example, silicon nitride or cemented carbide, and is likely to peel off. Therefore, as a countermeasure against this, it has been proposed that a diamond film is formed on a silicon substrate, and then this diamond film is cut out and brazed to the cutting edge of the cemented carbide tool.
【０００４】しかし、この方法でもダイヤモンド膜を強
固に蝋付けする方法や適切な蝋材が見当たらず実用化で
きていなかった。また、この方法では厚さ０．１ｍｍ以
上のダイヤモンド膜を生成する必要があり、装置や電力
費等のコストが高かった。However, even with this method, a method for firmly brazing a diamond film and an appropriate brazing material could not be found, so that it could not be put to practical use. In addition, this method requires the production of a diamond film having a thickness of 0.1 mm or more, resulting in high costs such as equipment and power costs.
【０００５】[0005]
【発明が解決しようとする問題点】そこで、これらの超
硬質膜と母材とを強固に密着させることができれば、ダ
イヤモンド，立方晶窒化硼素等の超硬質膜が広い範囲で
使用されるようになり、例えば、金属や複合材料の加工
用切削工具およびスリッターナイフ等の産業用刃物ある
いは各種の褶動部品やガイドブッシュ等の耐摩耗部材な
どで大幅な性能改善が期待できる。しかし、現状では、
上記のように母材との密着性を向上することができない
ために、これら超硬質膜が形成された工具は未だ実用化
されていなかった。Therefore, if these ultra-hard films and the base material can be firmly adhered, the ultra-hard films such as diamond and cubic boron nitride can be used in a wide range. Therefore, for example, industrial tools such as cutting tools for processing metals and composite materials, industrial knives such as slitter knives, various sliding parts, wear-resistant members such as guide bushes, etc. can be expected to greatly improve performance. However, in the present situation,
Since the adhesion with the base material cannot be improved as described above, tools with these ultra-hard films have not yet been put into practical use.
【０００６】[0006]
【問題点を解決するための手段】本発明者は上記の問題
点に対し検討を重ねた結果、ダイヤモンド，立方晶窒化
硼素等の超硬質膜を、タングステンを主成分とする接合
膜と結合させ、更にこの接合膜を介して工具本体に接合
することにより、工具本体と超硬質膜とを強固に密着さ
せることができることを見出し、本発明をするに至っ
た。As a result of repeated studies on the above problems, the present inventor combined an ultra-hard film such as diamond or cubic boron nitride with a bonding film containing tungsten as a main component. Further, they have found that the tool body and the ultra-hard film can be firmly adhered to each other by joining the tool body through this bonding film, and have completed the present invention.
【０００７】即ち、本発明の超硬質膜付工具は、工具本
体上に、気相合成法により作成されたタングステン，タ
ングステンと炭素との化合物のうち少なくとも一種から
なる接合膜と、気相合成法により作成されたダイヤモン
ドまたは立方晶窒化硼素からなる超硬質膜を順次積層し
てなるものである。接合膜と超硬質膜との間には、Ｔ
ｉ，Ｎｉ，Ｆｅ，Ａｌ，Ｃｏ，Ａｕ，Ｐｒ，Ｍｇ，Ｃ
ｕ，Ｚｒ，Ｈｆ，Ｔａ，Ａｇ及びそれらの炭化物，窒化
物，ホウ化物のうち少なくとも一種からなる中間膜が介
在されていることが望ましく、また、接合膜は、その超
硬質膜側に炭化タングステン膜が形成されていることが
望ましい。That is, the tool with an ultra-hard film of the present invention comprises a tool body, a bonding film made of at least one of tungsten and a compound of tungsten and carbon formed by a vapor phase synthesis method, and a vapor phase synthesis method. An ultra-hard film made of diamond or cubic boron nitride is sequentially laminated. Between the bonding film and the ultra-hard film, T
i, Ni, Fe, Al, Co, Au, Pr, Mg, C
It is desirable that an intermediate film made of at least one of u, Zr, Hf, Ta, Ag, and their carbides, nitrides, and borides is interposed, and the bonding film is made of tungsten carbide on the ultra-hard film side. It is desirable that a film is formed.
【０００８】また、本発明の超硬質膜付工具は、単結晶
シリコン等からなる基板の表面にダイヤモンドまたは立
方晶窒化硼素からなる超硬質膜を形成した後、この超硬
質膜上にタングステン，タングステンと炭素との化合物
のうち少なくとも一種からなる接合膜を気相合成法によ
り形成し、しかるのちにシリコン等からなる基板を除去
し、前記接合膜を工具本体に接合することにより、前記
超硬質膜を前記接合膜を介して工具本体に取り付け、製
造される。また、シリコン等からなる基板の除去は、接
合膜を工具本体に接合した後、行っても良い。また、基
板表面に超硬質膜を形成した後、この超硬質膜上にＴ
ｉ，Ｎｉ，Ｆｅ，Ａｌ，Ｃｏ，Ａｕ，Ｐｒ，Ｍｇ，Ｃ
ｕ，Ｚｒ，Ｈｆ，Ｔａ，Ａｇ及びそれらの炭化物，窒化
物，ホウ化物のうち少なくとも一種からなる中間膜を物
理蒸着法（ＰＶＤ法）など従来の方法で形成し、この中
間膜上にタングステンやタングステンと炭素との化合物
からなる接合膜を形成しても良い。尚、前記中間膜は、
ＣＶＤ時やロウ付け時の加熱等により金属がそれらの炭
化物，窒化物，ホウ化物となっても良い。Further, the tool with an ultra-hard film of the present invention is such that after forming an ultra-hard film made of diamond or cubic boron nitride on the surface of a substrate made of single crystal silicon or the like, tungsten or tungsten is formed on the ultra-hard film. By forming a bonding film made of at least one of the compounds of carbon and carbon by a vapor phase synthesis method, and then removing the substrate made of silicon or the like, and bonding the bonding film to the tool body, thereby forming the ultra-hard film. Is attached to the tool main body through the bonding film, and is manufactured. Further, the removal of the substrate made of silicon or the like may be performed after the bonding film is bonded to the tool body. In addition, after forming a super hard film on the substrate surface, T
i, Ni, Fe, Al, Co, Au, Pr, Mg, C
An intermediate film made of at least one of u, Zr, Hf, Ta, Ag, and their carbides, nitrides, and borides is formed by a conventional method such as physical vapor deposition (PVD method), and tungsten or tungsten is formed on the intermediate film. A bonding film made of a compound of tungsten and carbon may be formed. The intermediate film is
The metal may become a carbide, a nitride, or a boride of them by heating during CVD or brazing.
【０００９】タングステンと炭素との化合物とは、ＷＣ
やＷ2 Ｃ等がある。The compound of tungsten and carbon is WC
And W 2 C etc.
【００１０】超硬質膜の接合膜側の面は、表面粗さＲｍ
ａｘが０．２μｍ以上であることが望ましい。０．２μ
ｍよりも小さいと超硬質膜の接合膜への付着強度が小さ
くなり、切削時に超硬質膜の剥離等を生じるからであ
る。表面粗さＲｍａｘは特に１μｍ以上とすることが望
ましい。このような表面粗さの調節は、超硬質膜形成時
の各種成膜パラメータを適度に調製することにより得ら
れる。The surface of the ultra-hard film on the bonding film side has a surface roughness Rm.
It is desirable that ax is 0.2 μm or more. 0.2μ
This is because if it is smaller than m, the adhesion strength of the superhard film to the bonding film becomes small and peeling of the superhard film occurs during cutting. The surface roughness Rmax is particularly preferably 1 μm or more. Such adjustment of the surface roughness can be obtained by appropriately adjusting various film-forming parameters at the time of forming the ultra-hard film.
【００１１】[0011]
【作用】本発明の超硬質膜付工具では、超硬質膜は直接
工具本体に接合されるのではなく、気相合成法により作
成されたタングステンやタングステンと炭素との化合物
からなる接合膜を介して工具本体に接合したので、超硬
質膜と工具本体との接合強度が向上する。即ち、接合膜
は工具本体にＡｇろうやＡｕ−Ｓｎなどのろう材により
ろう付けされるが、タングステンやタングステンと炭素
との化合物からなる接合膜は上記ろう材と濡れ性が良い
ため、接合膜と工具本体が強固に接着され、この結果、
超硬質膜と工具本体との接合強度が向上する。In the tool with an ultra-hard film of the present invention, the ultra-hard film is not directly bonded to the tool body but is bonded through a bonding film made of tungsten or a compound of tungsten and carbon prepared by a vapor phase synthesis method. Since it is joined to the tool body with the use of a tool, the joining strength between the ultra-hard film and the tool body is improved. That is, the bonding film is brazed to the tool body with a brazing material such as Ag brazing or Au—Sn, but since the bonding film made of tungsten or a compound of tungsten and carbon has good wettability with the brazing material, the bonding film is Is firmly bonded to the tool body, and as a result,
The bonding strength between the ultra-hard film and the tool body is improved.
【００１２】さらに超硬質膜と接合膜との間にＴｉ，Ｎ
ｉ，Ｆｅ等の中間膜を形成すると、超硬質膜と、接合
膜，工具本体との熱膨張率差による応力が、中間膜が塑
性変形することにより緩和され、切削時における超硬質
膜の剥離を防止する。Further, Ti, N is formed between the ultra-hard film and the bonding film.
When an intermediate film such as i, Fe is formed, the stress due to the difference in coefficient of thermal expansion between the ultra-hard film, the bonding film, and the tool body is relieved by the plastic deformation of the intermediate film, and the ultra-hard film peels off during cutting. Prevent.
【００１３】そして、接合膜を、その超硬質膜側に炭化
タングステン膜を形成して構成すると、高強度の炭化タ
ングステン膜の存在により接合膜と超硬質膜からなる基
板の強度が高くなるととともに、接合膜と超硬質膜との
密着性がさらに向上する。When the bonding film is formed by forming a tungsten carbide film on the ultra-hard film side, the strength of the bonding film and the ultra-hard film increases due to the presence of the high-strength tungsten carbide film. The adhesiveness between the bonding film and the ultra-hard film is further improved.
【００１４】しかも、ダイヤモンド, 立方晶窒化硼素と
タングステンやタングステンと炭素との化合物とは熱膨
張率が近似しているので膜剥離を抑制することができ、
また、タングステンやタングステンと炭素との化合物の
生成温度が低いためにダイヤモンド, 立方晶窒化硼素が
分解することがない。Moreover, since the coefficient of thermal expansion of diamond, cubic boron nitride and tungsten, and the compound of tungsten and carbon are close to each other, film peeling can be suppressed,
Further, since the formation temperature of tungsten and the compound of tungsten and carbon is low, diamond and cubic boron nitride are not decomposed.
【００１５】[0015]
実施例１ 本発明の超硬質膜付工具及びその製造方法を図面を用い
て詳細に説明する。Example 1 A tool with a super hard film and a method for manufacturing the same according to the present invention will be described in detail with reference to the drawings.
【００１６】図１は、本発明の超硬質膜付工具を示すも
ので、符号３１は、例えば、スリッターナイフからなる
工具本体を示している。この工具本体３１は、例えば、
ＷＣとコバルト（Ｃｏ）と周期律表第４ａ，５ａ，６ａ
族元素の炭化物，窒化物または炭窒化物とからなる化合
物や、ＴｉＣまたはＴｉＣＮとニッケル（Ｎｉ）または
Ｃｏと周期律表第４ａ，５ａ，６ａ族元素の炭化物，窒
化物または炭窒化物とからなる化合物や、炭化ケイ素
（ＳｉＣ）とホウ素と炭素とからなる化合物や、Ｓｉ3
Ｎ4 またはＳｉＣと希土類元素酸化物とからなる化合物
から構成されている。また、工具本体３１は、鉄系合
金，Ｎｉ系，Ｃｏ系合金，ハイスなどであってもよい。FIG. 1 shows a tool with an ultra-hard film according to the present invention, and reference numeral 31 denotes a tool body composed of, for example, a slitter knife. This tool body 31 is, for example,
WC, Cobalt (Co) and Periodic Table 4a, 5a, 6a
From compounds consisting of carbides, nitrides or carbonitrides of group elements, TiC or TiCN and nickel (Ni) or Co and carbides, nitrides or carbonitrides of group 4a, 5a or 6a of the periodic table Compound, a compound of silicon carbide (SiC), boron and carbon, Si 3
It is composed of a compound consisting of N 4 or SiC and a rare earth element oxide. Further, the tool body 31 may be made of iron-based alloy, Ni-based, Co-based alloy, high speed steel, or the like.
【００１７】この工具本体３１の表面には、気相合成法
により作成されたタングステンまたはタングステンと炭
素との化合物からなる接合膜３３が形成されており、さ
らにこの接合膜３３の表面には、ダイヤモンドまたは立
方晶窒化硼素等からなる超硬質膜３５が形成されてい
る。即ち、超硬質膜３５は、接合膜３３を介して工具本
体３１にろう付けにより取り付けられている。On the surface of the tool body 31, a bonding film 33 made of tungsten or a compound of tungsten and carbon is formed by a vapor phase synthesis method, and further, on the surface of the bonding film 33, a diamond film is formed. Alternatively, a super hard film 35 made of cubic boron nitride or the like is formed. That is, the superhard film 35 is attached to the tool body 31 via the bonding film 33 by brazing.
【００１８】このような超硬質膜付工具を作成するに
は、先ず、図２に示すように、基板３７にダイヤモンド
または立方晶窒化硼素（ｃＢＮ）等の超硬質膜３５を形
成する。ダイヤモンド膜ではマイクロ波プラズマＣＶ
Ｄ，熱フィラメント法など、立方晶窒化硼素膜はIon Be
am Asisted Deposition 法により作成することができ
る。To produce such a tool with a super hard film, first, as shown in FIG. 2, a super hard film 35 such as diamond or cubic boron nitride (cBN) is formed on a substrate 37. Microwave plasma CV for diamond film
D, hot filament method, cubic boron nitride film is Ion Be
It can be created by the am Asisted Deposition method.
【００１９】例えば、ダイヤモンドでは、特公昭６１−
２５６７９号公報や特公昭６１−２６３２号公報等に開
示される方法が使用され、立方晶窒化硼素膜では、特公
平５−９５１３号公報や特公平５−１５７８８号公報等
に開示される方法が使用される。また、膜の厚さや結晶
構造（純粋なダイヤモンドやｃＢＮの割合）についても
任意に選択できるが、基板３７との密着性が低くなる条
件を選択する。また、超硬質膜３５の接合膜側の面は、
表面粗さＲｍａｘが０．２μｍ以上、望ましくは１μｍ
以上であることが望ましい。このような超硬質膜３５の
表面粗さはＲａの調節は、超硬質膜の成膜時の温度、ガ
ス流量，圧力等のパラメータを変更することにより得ら
れる。超硬質膜３５の膜厚は、性能と生産性との兼ね合
いから０．３〜１００μｍが適当である。For example, in diamond, Japanese Patent Publication No. 61-
The methods disclosed in JP-B No. 25679 and JP-B No. 61-2632 are used, and for cubic boron nitride films, the methods disclosed in JP-B-5-9513 and JP-B-5-15788 are used. used. Further, the thickness of the film and the crystal structure (ratio of pure diamond or cBN) can be arbitrarily selected, but the condition that the adhesion to the substrate 37 is low is selected. Further, the surface of the super hard film 35 on the bonding film side is
Surface roughness Rmax is 0.2 μm or more, preferably 1 μm
The above is desirable. The surface roughness Ra of the surface of the ultra-hard film 35 can be adjusted by changing parameters such as the temperature, gas flow rate, and pressure during film formation of the ultra-hard film. The film thickness of the ultra-hard film 35 is preferably 0.3 to 100 μm in terms of the balance between performance and productivity.
【００２０】これらの膜を成膜する基板３７は、例え
ば、シリコン，カーボン，チタン等の金属から形成さ
れ、任意に選択できるが、成膜初期に於ける核生成の容
易さや後の工程における基板３７の除去の容易さからシ
リコンからなる基板３７が適している。The substrate 37 on which these films are formed is made of, for example, a metal such as silicon, carbon or titanium, and can be arbitrarily selected, but the ease of nucleation at the initial stage of the film formation and the substrate in the subsequent steps are used. A substrate 37 made of silicon is suitable because it is easy to remove 37.
【００２１】次に、この基板３７の上に成膜したダイヤ
モンドもしくはｃＢＮ等の超硬質膜３５の上に、図３に
示すように、タングステン（Ｗ），Ｗと炭素（Ｃ）から
なる化合物（接合膜３３）のうち少なくとも一種を成膜
する。成膜に際しては公知の方法が使用できる。例え
ば、Ｗを成膜する例について説明すると、超硬質膜３５
の付着した基板３７を化学的気相合成装置内に収容し、
この化学的気相合成装置内を温度４５０〜１２００℃に
保持し、気相含浸装置内にＨ2 ／ＷＦ6 のモル比が４以
上となるように混合したＷＦ6 ＋Ｈ2 ガスを導入するこ
とにより、超硬質膜３５の表面に、Ｗからなる接合膜３
３が形成される。ＷＦ6 ＋Ｈ2 ガスと同時にＡｒガスや
Ｈｅガス等の不活性ガスを導入しても良い。ＷとＣから
なる接合膜３３を成膜する場合には、Ｈ2 ，ＷＦ6 のガ
スと同時にメタン，アセチレン等の炭素源となるガスを
反応炉に導入する。接合膜３３の厚さは後の工程での取
扱の容易さや強度の関係から０．１〜５ｍｍ程度が好ま
しい。Next, as shown in FIG. 3, on the superhard film 35 such as diamond or cBN formed on the substrate 37, a compound (comprising tungsten (W), W and carbon (C) ( At least one of the bonding films 33) is formed. A known method can be used for the film formation. For example, describing an example of forming W, the ultra-hard film 35.
The substrate 37 to which is attached is housed in the chemical vapor deposition apparatus,
The inside of this chemical vapor phase synthesizer is maintained at a temperature of 450 to 1200 ° C., and WF 6 + H 2 gas mixed so that the H 2 / WF 6 molar ratio is 4 or more is introduced into the vapor phase impregnation apparatus. Thus, the bonding film 3 made of W is formed on the surface of the superhard film 35.
3 is formed. An inert gas such as Ar gas or He gas may be introduced together with the WF 6 + H 2 gas. When forming the bonding film 33 made of W and C, a gas serving as a carbon source such as methane and acetylene is introduced into the reaction furnace at the same time as the gases of H 2 and WF 6 . The thickness of the bonding film 33 is preferably about 0.1 to 5 mm in terms of easiness of handling in later steps and strength.
【００２２】次いで、接合膜３３の表面を研磨等の加工
を行い、そののち超硬質膜３５や接合膜３３のマスキン
グを行いシリコン等からなる基板３７を酸等で溶解除去
する。これにより、超硬質膜３５の付着した接合膜３３
が得られる。次にこれをレーザーで所定形状にカットし
研磨などの加工を行う。その後に、図１に示したよう
に、接合膜３３を工具本体３１に銀蝋、もしくはその他
の蝋材で蝋付けし、接合する。即ち、超硬質膜３５を接
合膜３３を介して工具本体３１に接合する。蝋付け終了
後最終的な加工を行い、本発明の超硬質膜付工具を得
る。基板３７の除去は接合膜３３を工具本体３１に蝋付
けした後行っても良い。Next, the surface of the bonding film 33 is processed by polishing or the like, and then the superhard film 35 and the bonding film 33 are masked, and the substrate 37 made of silicon or the like is dissolved and removed with an acid or the like. As a result, the bonding film 33 to which the ultra-hard film 35 is attached
Is obtained. Next, this is cut into a predetermined shape with a laser and subjected to processing such as polishing. After that, as shown in FIG. 1, the bonding film 33 is brazed to the tool body 31 with silver wax or another brazing material and bonded. That is, the ultra-hard film 35 is bonded to the tool body 31 via the bonding film 33. After the brazing is finished, final processing is performed to obtain the tool with an ultra-hard film of the present invention. The substrate 37 may be removed after brazing the bonding film 33 to the tool body 31.
【００２３】尚、本発明によれば、接合膜３３を、その
超硬質膜３５側に炭化タングステン膜を形成して構成し
ても良い。接合膜３３の超硬質膜３５側に炭化タングス
テン膜を形成するには、例えば、超硬質膜３５を形成し
た後、ＷＦ6 ＋Ｈ2 ガスと同時にメタン，アセチレン等
の炭素源となるガスを反応炉に導入して炭化タングステ
ン膜を形成し、その後、ＷＦ6 ＋Ｈ2 ガスを反応炉内に
導入することにより形成される。このようにすれば、接
合膜３３と超硬質膜３５からなる多層膜の強度が高くな
り性能が向上するだけでなく、ダイヤモンド等の超硬質
膜３５と接合膜３３との密着性が向上する。According to the present invention, the bonding film 33 may be formed by forming a tungsten carbide film on the ultra-hard film 35 side thereof. To form the tungsten carbide film on the ultra-hard film 35 side of the bonding film 33, for example, after forming the ultra-hard film 35, a gas that serves as a carbon source such as methane and acetylene is simultaneously supplied with WF 6 + H 2 gas. To form a tungsten carbide film, and then WF 6 + H 2 gas is introduced into the reaction furnace. By doing so, not only the strength of the multilayer film including the bonding film 33 and the superhard film 35 is increased and the performance is improved, but also the adhesion between the superhard film 35 such as diamond and the bonding film 33 is improved.
【００２４】尚、任意の基板３７上にＷ又はＷとＣとの
化合物を析出させて接合膜３３を形成し、この接合膜３
３の上に超硬質膜３５を形成しても良い。しかし、この
場合、気相合成法により形成した接合膜３３の表面は凹
凸が多いので、超硬質膜３５も凹凸の多い表面となり、
用途が限られる。平滑なシリコンからなる基板３７上に
超硬質膜３５を析出させると、基板３７を除去した後は
平滑となるので、実用上有利である。また基板３７に所
定の形状をつけると、それがそのまま超硬質膜３５に写
し取られることから、所望形状の超硬質膜３５を得るこ
とができる。The bonding film 33 is formed by depositing W or a compound of W and C on an arbitrary substrate 37.
You may form the super-hard film 35 on 3. However, in this case, since the surface of the bonding film 33 formed by the vapor phase synthesis method has many irregularities, the super-hard film 35 also has many irregularities,
Limited use. When the ultra-hard film 35 is deposited on the smooth silicon substrate 37, it becomes smooth after the substrate 37 is removed, which is practically advantageous. Further, when the substrate 37 is given a predetermined shape, it is directly copied onto the superhard film 35, so that the superhard film 35 having a desired shape can be obtained.
【００２５】以上のような超硬質膜付工具では、超硬質
膜３５は直接工具本体３１に接合されるのではなく、気
相合成法により作成されたタングステン，タングステン
と炭素との化合物のうち少なくとも一種からなる接合膜
３３を介して工具本体３１に接合したので、超硬質膜３
５と工具本体３１との接合強度を向上することができ
る。そして、接合膜３３の超硬質膜３５側に炭化タング
ステン膜を形成すると、接合膜３３と超硬質膜３５から
なる複合膜の強度が高くなるととともに、接合膜３３と
超硬質膜３５との密着性をさらに向上することができ
る。In the above-described tool with an ultra-hard film, the ultra-hard film 35 is not directly bonded to the tool body 31, but at least tungsten or a compound of tungsten and carbon prepared by a vapor phase synthesis method. Since it is bonded to the tool body 31 via the bonding film 33 made of one kind, the ultra-hard film 3
It is possible to improve the joint strength between the tool 5 and the tool body 31. When the tungsten carbide film is formed on the bonding film 33 on the ultra-hard film 35 side, the strength of the composite film including the bonding film 33 and the ultra-hard film 35 increases, and the adhesion between the bonding film 33 and the ultra-hard film 35 increases. Can be further improved.
【００２６】ところで、本発明者は、本発明の効果を確
認すべく、超硬質膜を、ＷやＷとＣの化合物からなる接
合膜を介して工具本体に取り付ける実験を行った。そし
て、接合膜と工具本体との接合時における蝋付け歩留り
を測定するとともに、超硬質膜が取り付けられた工具に
より切削試験を行った。In order to confirm the effect of the present invention, the inventor conducted an experiment to attach a superhard film to a tool body through a bonding film made of W or a compound of W and C. Then, the brazing yield at the time of joining the joining film and the tool main body was measured, and a cutting test was performed using a tool to which an ultra-hard film was attached.
【００２７】蝋付け歩留りの試験は、蝋付けをアルゴン
ガス中、短時間の加熱により行い、１０個の工具におい
て蝋材の付着の完全さなどを外観からチェックし、完全
なものの割合を求めることにより行った。The brazing yield test is carried out by heating the brazing in argon gas for a short period of time and visually checking the completeness of the adhesion of the brazing material in the 10 tools and determining the percentage of the perfect brazing material. Went by.
【００２８】また、切削試験は、５個の工具を用い、ア
ルミニウム−シリコン合金を、切り込み２ｍｍ、送り
０．２０ｍｍ、切削速度４００ｍｍ／ｍｉｎで切削し
て、切削後の超硬質膜の剥離をチェックした。これらの
結果を表１に示す。In the cutting test, five tools were used to cut an aluminum-silicon alloy at a cut of 2 mm, a feed of 0.20 mm, and a cutting speed of 400 mm / min to check the peeling of the super-hard film after cutting. did. The results are shown in Table 1.
【００２９】[0029]
【表１】 [Table 1]
【００３０】表１により本発明品は蝋付け歩留りや切削
後における剥離も良好であった。According to Table 1, the product of the present invention showed good brazing yield and good peeling after cutting.
【００３１】尚、試料Ｎo,１は、ダイヤモンドからなる
超硬質膜を超硬合金からなる工具本体にコーティングし
た例であり、試料Ｎo.２はダイヤモンド膜のみうろう付
けした例であり、試料Ｎo,１６〜１８，２０は、接合膜
をＷ膜とＷＣ膜により構成した例である。また、試料Ｎ
o.１９〜２１は、基板上に予め５μｍの窒化チタン膜を
形成した後、ｃＢＮ膜を形成した例である。Sample No. 1 is an example in which a cemented carbide film made of diamond is coated on a tool body made of cemented carbide, and Sample No. 2 is an example in which only the diamond film is brazed. , 16 to 18 and 20 are examples in which the bonding film is composed of a W film and a WC film. Also, sample N
o.19 to 21 are examples in which a titanium nitride film having a thickness of 5 μm is formed on the substrate in advance and then a cBN film is formed.
【００３２】実施例２ 上記実施例１において、図４に示すように、ダイヤモン
ドもしくはｃＢＮ等の超硬質膜３５の上に、Ｔｉ，Ｎ
ｉ，Ｆｅ，Ａｌ，Ｃｏ，Ａｕ，Ｐｒ，Ｍｇ，Ｃｕ，Ｚ
ｒ，Ｈｆ，Ｔａ，Ａｇ及びそれらの炭化物，窒化物，ホ
ウ化物から選ばれる少なくとも一種よりなる中間膜５１
を成膜し、この中間膜５１の上にタングステン（Ｗ）ま
たはＷと炭素（Ｃ）からなる接合膜３３を成膜し、この
接合膜３３を工具本体３１にろう付けしても、上記実施
例１とほぼ同様の効果が得られるが、さらに超硬質膜３
５と接合膜３３の接合強度を向上することができ、切削
時等における超硬質膜３５の剥離を防止することができ
る。また、超硬質膜３５と、接合膜３３，工具本体３１
との熱膨張率差による応力が、中間膜５１が塑性変形す
ることにより緩和され、切削時における超硬質膜３５の
剥離を防止することができる。中間膜５１の厚みは、
０．１〜１０μｍ、特に１〜３μｍが好ましい。Embodiment 2 In the above Embodiment 1, as shown in FIG. 4, Ti, N is deposited on a super hard film 35 such as diamond or cBN.
i, Fe, Al, Co, Au, Pr, Mg, Cu, Z
An intermediate film 51 made of at least one selected from r, Hf, Ta, Ag, and their carbides, nitrides, and borides.
Even if the bonding film 33 made of tungsten (W) or W and carbon (C) is formed on the intermediate film 51 and the bonding film 33 is brazed to the tool body 31, The same effect as in Example 1 can be obtained, but the ultra-hard film 3
5 and the bonding film 33 can be improved in bonding strength, and peeling of the superhard film 35 during cutting or the like can be prevented. Further, the ultra-hard film 35, the bonding film 33, the tool body 31
The stress due to the difference in the coefficient of thermal expansion between and is relaxed by the plastic deformation of the intermediate film 51, and the superhard film 35 can be prevented from peeling off during cutting. The thickness of the intermediate film 51 is
0.1 to 10 μm, particularly 1 to 3 μm is preferable.
【００３３】本発明者は、中間膜５１の効果を確認すべ
く、超硬質膜３５と接合膜３３の間に種々の中間膜を形
成する実験を行った。そして、接合膜と工具本体との接
合時におけるろう付け歩留りを測定するとともに、切削
試験を行った。切削試験は、５個の工具を用い、アルミ
ニウム−シリコン合金を、切り込み２ｍｍ、送り０．２
５ｍｍ、切削速度４００ｍｍ／ｍｉｎで切削して、切削
後の超硬質膜の剥離をチェックした。これらの結果を表
２に示す。The present inventor conducted experiments to form various intermediate films between the superhard film 35 and the bonding film 33 in order to confirm the effect of the intermediate film 51. Then, a brazing yield at the time of joining the joining film and the tool body was measured, and a cutting test was performed. For the cutting test, using 5 tools, an aluminum-silicon alloy was cut 2 mm and the feed was 0.2
It was cut at 5 mm and a cutting speed of 400 mm / min, and the peeling of the superhard film after cutting was checked. The results are shown in Table 2.
【００３４】[0034]
【表２】 [Table 2]
【００３５】上記切削条件では、表１における試料Ｎo.
１３は５個中３個が剥離した。一方、本発明品は蝋付け
歩留りや切削後における剥離も、実施例１よりも向上し
ていることが判る。尚、試料Ｎo.４４はｃＢＮ膜のみを
ろう付けした例である。Under the above cutting conditions, the sample No.
As for No. 13, 3 out of 5 were peeled off. On the other hand, it is understood that the product of the present invention has improved brazing yield and peeling after cutting as compared with Example 1. Sample No. 44 is an example in which only the cBN film was brazed.
【００３６】実施例３ 上記実施例１において、超硬質膜３５の接合膜側の面の
表面粗さＲｍａｘを０．２μｍ以上としても、上記実施
例１とほぼ同様の効果が得られるが、さらに接合膜３３
のアンカー効果により超硬質膜３５と接合膜３３の接合
強度を一層向上することができ、切削時等における超硬
質膜３５の剥離をさらに確実に防止することができる。Example 3 In Example 1, even if the surface roughness Rmax of the bonding film side surface of the ultra-hard film 35 is 0.2 μm or more, substantially the same effect as in Example 1 can be obtained. Bonding film 33
The bonding effect between the super-hard film 35 and the bonding film 33 can be further improved by the anchor effect, and peeling of the super-hard film 35 during cutting or the like can be prevented more reliably.
【００３７】本発明者は、超硬質膜３５の接合膜側の面
の表面粗さＲｍａｘによる超硬質膜３５と接合膜３３の
接合強度効果を確認すべく、超硬質膜の成膜パラメータ
を変化させて表面粗さＲｍａｘを種々変化させる実験を
行った。そして、接合膜と工具本体との接合時における
ろう付け歩留りを測定するとともに、切削試験を行っ
た。切削試験は、５個の工具を用い、アルミニウム−シ
リコン合金を、切り込み２ｍｍ、送り０．２５ｍｍ、切
削速度４００ｍｍ／ｍｉｎで切削して、切削後の超硬質
膜の剥離をチェックした。これらの結果を表３に示す。The present inventor changes the film forming parameters of the super-hard film in order to confirm the bonding strength effect of the super-hard film 35 and the bonding film 33 due to the surface roughness Rmax of the surface of the super-hard film 35 on the bonding film side. Then, an experiment was performed in which the surface roughness Rmax was variously changed. Then, a brazing yield at the time of joining the joining film and the tool body was measured, and a cutting test was performed. In the cutting test, using five tools, an aluminum-silicon alloy was cut at a cut of 2 mm, a feed of 0.25 mm, and a cutting speed of 400 mm / min to check the peeling of the superhard film after cutting. The results are shown in Table 3.
【００３８】[0038]
【表３】 [Table 3]
【００３９】上記切削条件では、表１における試料Ｎo.
１３は５個中３個が剥離した。一方、表面粗さＲｍａｘ
が０．２μｍ以上となると、超硬質膜の剥離が少なくな
ることが判る。尚、超硬質膜の膜厚は５０μｍで一定と
した。Under the above cutting conditions, the sample No.
As for No. 13, 3 out of 5 were peeled off. On the other hand, the surface roughness Rmax
It can be seen that when the value is 0.2 μm or more, peeling of the superhard film is reduced. The film thickness of the ultra-hard film was constant at 50 μm.
【００４０】[0040]
【発明の効果】以上詳述した通り、本発明によれば、ダ
イヤモンド，立方晶窒化硼素等の超硬質膜を、タングス
テンを主成分とする接合膜を介して工具本体に接合する
ことにより、工具本体と超硬質膜とを強固に密着させる
ことができ、超硬質膜を広い範囲で使用することがで
き、耐摩耗性，靱性に優れた超硬質膜付工具を得ること
ができる。As described in detail above, according to the present invention, a tool such as diamond, cubic boron nitride or the like is bonded to the tool body by bonding a super hard film to the tool body through a bonding film containing tungsten as a main component. The main body and the super-hard film can be firmly adhered to each other, the super-hard film can be used in a wide range, and a tool with a super-hard film having excellent wear resistance and toughness can be obtained.
【図面の簡単な説明】[Brief description of drawings]
【図１】本発明の超硬質膜付工具を示す縦断面図であ
る。FIG. 1 is a vertical cross-sectional view showing a tool with an ultra-hard film of the present invention.
【図２】基板上に超硬質膜を形成した状態を示す縦断面
図である。FIG. 2 is a vertical cross-sectional view showing a state in which an ultra-hard film is formed on a substrate.
【図３】超硬質膜上に接合膜を形成した状態を示す縦断
面図である。FIG. 3 is a vertical cross-sectional view showing a state in which a bonding film is formed on a superhard film.
【図４】超硬質膜と接合膜の間に中間膜を形成した状態
を示す縦断面図である。FIG. 4 is a vertical cross-sectional view showing a state in which an intermediate film is formed between the ultra-hard film and the bonding film.
３１ 工具本体 ３３ 接合膜 ３５ 超硬質膜 ５１ 中間膜 31 Tool Body 33 Bonding Film 35 Super Hard Film 51 Intermediate Film
Claims (5)
たタングステン，タングステンと炭素との化合物のうち
少なくとも一種からなる接合膜と、気相合成法により作
成されたダイヤモンドまたは立方晶窒化硼素からなる超
硬質膜を順次積層してなることを特徴とする超硬質膜付
工具。1. A bonding film made of at least one of tungsten and a compound of tungsten and carbon formed on a tool body by a vapor phase synthesis method, and diamond or cubic boron nitride formed by the vapor phase synthesis method. A tool with an ultra-hard film, which is formed by sequentially laminating an ultra-hard film made of.
ｉ，Ｆｅ，Ａｌ，Ｃｏ，Ａｕ，Ｐｒ，Ｍｇ，Ｃｕ，Ｚ
ｒ，Ｈｆ，Ｔａ，Ａｇ及びそれらの炭化物，窒化物，ホ
ウ化物のうち少なくとも一種からなる中間膜が介在され
ていることを特徴とする請求項１記載の超硬質膜付工
具。2. Ti, N is provided between the bonding film and the ultra-hard film.
i, Fe, Al, Co, Au, Pr, Mg, Cu, Z
The tool with a super-hard film according to claim 1, wherein an intermediate film made of at least one of r, Hf, Ta, Ag, and their carbides, nitrides, and borides is interposed.
テン膜が形成されていることを特徴とする請求項１また
は請求項２記載の超硬質膜付工具。3. The tool with an ultra-hard film according to claim 1, wherein the bonding film has a tungsten carbide film formed on the ultra-hard film side thereof.
ンドまたは立方晶窒化硼素からなる超硬質膜およびタン
グステン，タングステンと炭素との化合物のうち少なく
とも一種からなる接合膜を順次気相合成法により形成し
た後、前記基板を除去し、しかるのち前記接合膜を工具
本体に接合することにより、前記超硬質膜を前記接合膜
を介して前記工具本体に取り付けることを特徴とする超
硬質膜付工具の製造方法。4. A superhard film made of diamond or cubic boron nitride and a bonding film made of at least one of tungsten and a compound of tungsten and carbon are sequentially formed on the surface of a substrate made of silicon or the like by a vapor phase synthesis method. After that, the substrate is removed, and then the bonding film is bonded to the tool main body to attach the ultra-hard film to the tool main body through the bonding film. Method.
ンドまたは立方晶窒化硼素からなる超硬質膜およびタン
グステン，タングステンと炭素との化合物のうち少なく
とも一種からなる接合膜を順次気相合成法により形成し
た後、前記接合膜を工具本体に接合し、しかるのちに前
記基板を除去し、前記超硬質膜を前記接合膜を介して前
記工具本体に取り付けることを特徴とする超硬質膜付工
具の製造方法。5. An ultra-hard film made of diamond or cubic boron nitride and a bonding film made of at least one of tungsten and a compound of tungsten and carbon are sequentially formed on the surface of a substrate made of silicon or the like by a vapor phase synthesis method. After that, the bonding film is bonded to a tool body, the substrate is then removed, and the superhard film is attached to the tool body via the bonding film. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16128093A JP3380294B2 (en) | 1992-06-30 | 1993-06-30 | Tool with ultra-hard film and method of manufacturing the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17214392 | 1992-06-30 | ||
| JP4-172143 | 1992-06-30 | ||
| JP16128093A JP3380294B2 (en) | 1992-06-30 | 1993-06-30 | Tool with ultra-hard film and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0679503A true JPH0679503A (en) | 1994-03-22 |
| JP3380294B2 JP3380294B2 (en) | 2003-02-24 |
Family
ID=26487465
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16128093A Expired - Fee Related JP3380294B2 (en) | 1992-06-30 | 1993-06-30 | Tool with ultra-hard film and method of manufacturing the same |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4835645A (en) * | 1986-11-05 | 1989-05-30 | Hitachi, Ltd. | Rotary magnetic head assembly |
| WO1997038151A1 (en) * | 1996-04-04 | 1997-10-16 | Kennametal Inc. | Substrate with a superhard coating containing boron and nitrogen and method of making the same |
| JP2011174110A (en) * | 2010-02-23 | 2011-09-08 | Kyushu Univ | Material for cubic boron nitride coating, and method for manufacturing the same |
| WO2012056758A1 (en) * | 2010-10-28 | 2012-05-03 | 住友電工ハードメタル株式会社 | Surface-coated sintered compact |
| WO2019181740A1 (en) * | 2018-03-19 | 2019-09-26 | 住友電気工業株式会社 | Surface-coated cutting tool |
| WO2019181742A1 (en) * | 2018-03-19 | 2019-09-26 | 住友電気工業株式会社 | Surface-coated cutting tool |
| WO2019181741A1 (en) * | 2018-03-19 | 2019-09-26 | 住友電気工業株式会社 | Surface-coated cutting tool |
-
1993
- 1993-06-30 JP JP16128093A patent/JP3380294B2/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4835645A (en) * | 1986-11-05 | 1989-05-30 | Hitachi, Ltd. | Rotary magnetic head assembly |
| WO1997038151A1 (en) * | 1996-04-04 | 1997-10-16 | Kennametal Inc. | Substrate with a superhard coating containing boron and nitrogen and method of making the same |
| JP2011174110A (en) * | 2010-02-23 | 2011-09-08 | Kyushu Univ | Material for cubic boron nitride coating, and method for manufacturing the same |
| WO2012056758A1 (en) * | 2010-10-28 | 2012-05-03 | 住友電工ハードメタル株式会社 | Surface-coated sintered compact |
| US8871340B2 (en) | 2010-10-28 | 2014-10-28 | Sumitomo Electric Hardmetal Corp. | Surface-coated sintered body |
| JP5771882B2 (en) * | 2010-10-28 | 2015-09-02 | 住友電工ハードメタル株式会社 | Surface-coated sintered body |
| WO2019181740A1 (en) * | 2018-03-19 | 2019-09-26 | 住友電気工業株式会社 | Surface-coated cutting tool |
| WO2019181742A1 (en) * | 2018-03-19 | 2019-09-26 | 住友電気工業株式会社 | Surface-coated cutting tool |
| WO2019181741A1 (en) * | 2018-03-19 | 2019-09-26 | 住友電気工業株式会社 | Surface-coated cutting tool |
| CN110691664A (en) * | 2018-03-19 | 2020-01-14 | 住友电气工业株式会社 | Surface-coated cutting tool |
| JPWO2019181741A1 (en) * | 2018-03-19 | 2020-07-27 | 住友電気工業株式会社 | Surface coated cutting tool |
| JPWO2019181742A1 (en) * | 2018-03-19 | 2020-07-27 | 住友電気工業株式会社 | Surface coated cutting tool |
| JPWO2019181740A1 (en) * | 2018-03-19 | 2020-07-27 | 住友電気工業株式会社 | Surface coated cutting tool |
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|---|---|
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