JPH0641629B1 - - Google Patents
Info
- Publication number
- JPH0641629B1 JPH0641629B1 JP3508781A JP50878191A JPH0641629B1 JP H0641629 B1 JPH0641629 B1 JP H0641629B1 JP 3508781 A JP3508781 A JP 3508781A JP 50878191 A JP50878191 A JP 50878191A JP H0641629 B1 JPH0641629 B1 JP H0641629B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3508781A JPH0641629B1 (en) | 1990-05-15 | 1991-05-15 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12305490 | 1990-05-15 | ||
JP3508781A JPH0641629B1 (en) | 1990-05-15 | 1991-05-15 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16923695A Division JPH0820863A (en) | 1995-06-12 | 1995-06-12 | Silicide film and semiconductor device using the same film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0641629B1 true JPH0641629B1 (en) | 1994-06-01 |
Family
ID=26460071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3508781A Expired - Lifetime JPH0641629B1 (en) | 1990-05-15 | 1991-05-15 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0641629B1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179534A (en) * | 1985-01-16 | 1986-08-12 | Mitsubishi Metal Corp | Compound target for sputtering equipment |
JPS63219580A (en) * | 1987-03-09 | 1988-09-13 | Hitachi Metals Ltd | Sputtering target and its production |
JPS63227771A (en) * | 1987-03-16 | 1988-09-22 | Tosoh Corp | High purity titanium silicide target for sputtering and production thereof |
-
1991
- 1991-05-15 JP JP3508781A patent/JPH0641629B1/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179534A (en) * | 1985-01-16 | 1986-08-12 | Mitsubishi Metal Corp | Compound target for sputtering equipment |
JPS63219580A (en) * | 1987-03-09 | 1988-09-13 | Hitachi Metals Ltd | Sputtering target and its production |
JPS63227771A (en) * | 1987-03-16 | 1988-09-22 | Tosoh Corp | High purity titanium silicide target for sputtering and production thereof |
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