JPH0636770U - Abrasive disc with good cushioning - Google Patents
Abrasive disc with good cushioningInfo
- Publication number
- JPH0636770U JPH0636770U JP7928392U JP7928392U JPH0636770U JP H0636770 U JPH0636770 U JP H0636770U JP 7928392 U JP7928392 U JP 7928392U JP 7928392 U JP7928392 U JP 7928392U JP H0636770 U JPH0636770 U JP H0636770U
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- piece
- polishing cloth
- pieces
- cushioning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【目的】研磨作業時の力かげんを容易に調整することが
でき、ガラスや比較的柔らかい金属を被研磨物とする際
にも、良好な研磨をなすことのできる研磨ディスクの提
供を図る。
【構成】回転工具に取り付けられて回転する基板１の下
面に可撓性を有する多数の研磨布片２を放射状に植え
る。これらの研磨布片２間に可撓性を有する緩衝片３を
放射状に植える。緩衝片３の上下長さは、研磨布片２の
上下長さよりも小さく、必要に応じて、緩衝片３を研磨
布により構成する。研磨作業時に、緩衝片３が研磨布片
２の撓みを緩和して、良好なクッション性を得る。
(57) [Summary] [Purpose] A polishing disk that can easily adjust the force during polishing work and that can perform good polishing even when using glass or relatively soft metal as an object to be polished. To provide. [Structure] A large number of flexible polishing cloth pieces 2 are radially planted on the lower surface of a substrate 1 which is attached to a rotating tool and rotates. Buffer pieces 3 having flexibility are radially planted between the polishing cloth pieces 2. The vertical length of the buffer piece 3 is smaller than the vertical length of the polishing cloth piece 2, and the buffer piece 3 is made of a polishing cloth as necessary. During the polishing operation, the buffer piece 3 relieves the bending of the polishing cloth piece 2 to obtain good cushioning property.
Description
【０００１】[0001]
本願考案は、研磨ディスクに関するものである。 The present invention relates to a polishing disc.
【０００２】[0002]
従来、グラインダ等の回転工具に取り付けて使用する研磨ディスクにあっては 、グラインダ等の回転工具に取り付けられて回転する基板１と、この基板１の下 面に放射状に植えられた可撓性を有する研磨布片２とを備えたものが知られてい る。この種の研磨ディスクにあっては、比較的クッション性が良いため、良好な 研磨作業が可能であるとして、今日広く使用されている。 図５に基づき、このクッション性について説明する。この研磨ディスクは、回 転させられながら、被研磨物ｈに押し付けられる（図５（Ａ））。すると、多数 の研磨布片２は、放射状に植えられているため、斜めに重なりながら、基板１に よって押さえつけられるが、その際の、研磨布片２の有する可撓性がクッション 性となって作用する。より詳しくは、押さえつけられることによって、隣合う研 磨布片２が互いに重なり合う。この重なり合いまでの力ａは、１枚の研磨布片２ が撓む力に相当する（図５（Ｂ））。さらに押さえつけられると、互いに重なっ た研磨布片２全体が撓む。この力ｃは、重なり合った数枚の研磨布片２が撓む力 に相当する（図５（Ｃ））。尚、隣合う研磨布片２間の間隔は僅かであるため、 少し強い力で押すと、これらはすぐに互いに重なり合ってしまい、通常の作業者 は、力ｃのみを感じながら研磨作業を行っている。そのため、ガラスや比較的柔 らかい金属の研磨にあっては、良好な研磨作業ができない場合がある。ただ、熟 練した作業者は、被研磨物の種類や硬さや面の状況を判断して、上記の力ａで押 圧して研磨するか、上記の力ｃで押圧して研磨するかを、微妙な力かげんで操作 して研磨しているが、その力の調節は、熟練者であっても困難なものである。 Conventionally, in a polishing disk that is used by being attached to a rotary tool such as a grinder, a substrate 1 that is attached to a rotary tool such as a grinder and rotates, and a flexibility that is radially planted on the lower surface of the substrate 1 are used. An abrasive cloth piece 2 having the abrasive cloth piece 2 is known. Since this type of polishing disk has a relatively good cushioning property, it is widely used today because of its ability to perform good polishing work. This cushioning property will be described with reference to FIG. This polishing disk is pressed against the object h to be polished while being rotated (FIG. 5 (A)). Then, since a large number of polishing cloth pieces 2 are planted radially, they are pressed down by the substrate 1 while overlapping diagonally, but the flexibility of the polishing cloth pieces 2 at that time becomes cushioning. To work. More specifically, the polishing cloth pieces 2 adjacent to each other overlap each other by being pressed. The force a until the overlapping is equivalent to the bending force of one polishing cloth piece 2 (FIG. 5 (B)). When the polishing cloth pieces 2 are further pressed, the polishing cloth pieces 2 overlapping each other are bent. This force c corresponds to the force of bending of the overlapping polishing cloth pieces 2 (FIG. 5C). Since the space between the adjacent polishing cloth pieces 2 is small, if they are pushed with a little strong force, they will immediately overlap with each other, and a normal worker performs polishing work while feeling only the force c. There is. Therefore, when polishing glass or relatively soft metal, good polishing work may not be possible. However, the skilled worker judges whether the object to be polished, the hardness, or the condition of the surface, and whether to press and polish with the force a or the force c. Even if it is a skilled person, it is difficult to adjust the force although it is operated and polished with a slight force.
【０００３】[0003]
そこで、本願考案は、熟練していない作業者であっても、研磨作業時の力かげ んを容易に調整することができ、ガラスや比較的柔らかい金属を被研磨物とする 際にも、良好な研磨をなすことのできる研磨ディスクを提供せんとするものであ る。 Therefore, the invention of the present application allows even an unskilled worker to easily adjust the force level during polishing work, and is excellent even when glass or a relatively soft metal is to be polished. The purpose of the present invention is to provide a polishing disk capable of performing various types of polishing.
【０００４】[0004]
本願考案は、グラインダ等の回転工具に取り付けられて回転する基板１と、こ の基板１の下面に放射状に植えられた可撓性を有する多数の研磨布片２とを備え た研磨ディスクにおいて、次の構成を特徴とするものを提供することにより、上 記の課題を解決する。 本願の第１の考案に係る研磨ディスクは、研磨布片２間に可撓性を有する緩衝 片３，４が配位され、これらの緩衝片３，４が上記の基板１の下面に放射状に植 えられている。これらの緩衝片３，４の上下長さは、研磨布片２の上下長さより も小さく設定されているものである。 本願の第２の考案にあっては、上記の緩衝片３，４が、研磨布により構成され ていることを特徴とする研磨ディスクを提供するものである。 The present invention provides a polishing disk provided with a substrate 1 attached to a rotary tool such as a grinder and rotating, and a large number of flexible polishing cloth pieces 2 radially planted on the lower surface of the substrate 1. The above problems will be solved by providing the following features. In the polishing disk according to the first invention of the present application, flexible cushioning pieces 3 and 4 are arranged between the polishing cloth pieces 2, and these cushioning pieces 3 and 4 are radially arranged on the lower surface of the substrate 1. It has been planted. The vertical length of these cushioning pieces 3 and 4 is set smaller than the vertical length of the polishing cloth piece 2. In a second invention of the present application, there is provided a polishing disk in which the buffer pieces 3 and 4 are composed of a polishing cloth.
【０００５】[0005]
本願考案に係る研磨ディスクは、回転させられながら、被研磨物ｈに押し付け られる（図３（Ａ））。すると、多数の研磨布片２と、緩衝片３は、放射状に植 えられているため、斜めに重なりながら、基板１によって押さえつけられるが、 その際の、研磨布片２及び緩衝片３の有する可撓性がクッション性となって作用 する。より詳しくは、押さえつけられることによって、研磨布片２が緩衝片３に 重なり合う（図３（Ｂ））。この重なり合いまでの力ａは、１枚の研磨布片２が 撓む力に相当する。さらに押さえつけられると、重なった研磨布片２と緩衝片３ との全体が撓むと共に、研磨布片２は緩衝片３よりも、その上下長さが長いため 、研磨布片２の下端（先端）寄りは、それ単独で撓む（図３（Ｃ））。この力ｂ は、上記の力ａより大きいが、研磨布片２と緩衝片３との全体が撓む力ｃよりも 小さい。そして、さらに押さえつけると、研磨布片２と緩衝片３との全体が、力 ｃによって撓む（図３（Ｄ））。 このように、力ａ、力ｂ、力ｃの３段階の力で、撓みが生ずるが、力ｂまでの 力の入れ具合で研磨作業を行うと、従来の力ａのみで作業を行うのに近い研磨状 態が得られる。そして、従来のように、少し力を強めるだけで、力ｃの状態に移 行するのではなく、研磨布片２が緩衝片３に重なり合った後、力ｂによる撓み状 態を経た後、力ｃの状態に移行するため、熟練者でなくとも、比較的適当な力（ 力ｂ）の入れ具合での、研磨作業を維持し得るものである。 The polishing disk according to the present invention is pressed against the object h to be polished while being rotated (FIG. 3 (A)). Then, since the large number of polishing cloth pieces 2 and the cushioning pieces 3 are radially planted, they are pressed by the substrate 1 while being diagonally overlapped. At that time, the polishing cloth pieces 2 and the cushioning pieces 3 have Flexibility acts as cushioning. More specifically, by being pressed, the polishing cloth piece 2 overlaps the buffer piece 3 (FIG. 3 (B)). The force a until the overlapping is equivalent to the bending force of one polishing cloth piece 2. When the polishing cloth piece 2 and the cushioning piece 3 overlap each other when further pressed, the polishing cloth piece 2 is longer than the cushioning piece 3 in the vertical direction. ) The deviation bends by itself (FIG. 3 (C)). This force b 1 is larger than the above-mentioned force a 1 but smaller than the force c 3 that the polishing cloth piece 2 and the cushion piece 3 are entirely bent. Then, when further pressed, the polishing cloth piece 2 and the cushioning piece 3 are entirely bent by the force c (FIG. 3 (D)). As described above, the bending occurs due to the force of three stages of the force a, the force b, and the force c. A nearly polished state can be obtained. Then, as in the conventional case, the force c is not moved to the state of the force c just by increasing the force a little, but after the polishing cloth piece 2 overlaps the cushioning piece 3 and the force is passed through the bending state, Since the state shifts to the state of c, even an unskilled person can maintain the polishing work with a relatively appropriate force (force b).
【０００６】[0006]
以下、図面に基づき本願考案の一実施例を説明する。 図１は本願考案の第１の実施例に係る研磨ディスクの上方から見た斜視図であ り、図２は本願考案の第１の実施例に係る研磨ディスクの下方から見た斜視図で あり、図３の（Ａ）乃至（Ｄ）は、夫々同研磨ディスクの要部拡大縦断面図であ る。 An embodiment of the present invention will be described below with reference to the drawings. 1 is a perspective view of a polishing disc according to a first embodiment of the present invention as seen from above, and FIG. 2 is a perspective view of a polishing disc as seen from below according to a first embodiment of the present invention. 3 (A) to 3 (D) are enlarged vertical cross-sectional views of essential parts of the same polishing disk.
【０００７】 この研磨ディスクは、グラインダ等の回転工具に取り付けられて回転する基板 １と、この基板１の下面に放射状に植えられた可撓性を有する多数の研磨布片２ と、これらの研磨布片２間に放射状に配位された可撓性を有する多数の緩衝片３ とを備える。This polishing disk comprises a substrate 1 which is attached to a rotary tool such as a grinder and rotates, a large number of flexible polishing cloth pieces 2 radially planted on the lower surface of the substrate 1, and polishing of these. A large number of flexible cushioning pieces 3 arranged radially between the cloth pieces 2.
【０００８】 基板１は、合成樹脂やファイバーや金属等、この種の研磨ディスクにおいて使 用されている通常の材質からなり、その形状も、平面視円形等、この通常の形状 で足りる。この基板の中央には、グラインダ等の回転工具（図示せず）への取り 付け穴１１が上下方向に貫通して形成されている。The substrate 1 is made of an ordinary material such as synthetic resin, fiber, metal, etc. used in this type of polishing disk, and its shape may be an ordinary shape such as a circular shape in plan view. A mounting hole 11 for a rotary tool (not shown) such as a grinder is formed at the center of the substrate so as to penetrate therethrough in the vertical direction.
【０００９】 次に、研磨布片２について説明する。 これらの研磨布片２は、略長方形をなすサンドペーパー等の研磨布（紙）から なる小片であり、詳しくは、布或いは紙等の基礎シートと、その下面に設けられ た多数の砥材とからなる。 これらの研磨布片は、基板１の下面に放射状に且つ適宜角度で傾斜した状態に 植えられている。この植え付けは、研磨布片２の上辺を接着剤により基板１の下 面に接着しているが、この接着に際しては、基板１の下面に綿布等を接着し、こ の接着された綿布の下面に研磨布片２の上辺を接着剤により接着する等、植付け の具体的方法は適宜変更し得る。Next, the polishing cloth piece 2 will be described. These polishing cloth pieces 2 are small pieces made of a polishing cloth (paper) such as sandpaper, which has a substantially rectangular shape, and more specifically, a basic sheet such as cloth or paper and a large number of abrasives provided on the lower surface thereof. Consists of. These polishing cloth pieces are planted radially on the lower surface of the substrate 1 and in a state of being inclined at an appropriate angle. In this planting, the upper side of the polishing cloth piece 2 is adhered to the lower surface of the substrate 1 with an adhesive. At the time of adhesion, a cotton cloth or the like is adhered to the lower surface of the substrate 1 and the lower surface of the adhered cotton cloth is adhered. The specific method of planting may be changed as appropriate, such as bonding the upper side of the polishing cloth piece 2 with an adhesive.
【００１０】 次に、緩衝片３について説明する。 これらの緩衝片３は、略長方形をなすサンドペーパー等の研磨布（紙）からな る小片であり、詳しくは、布或いは紙等の基礎シートと、その下面に設けられた 多数の砥材とからなる。 これらの緩衝片３は、基板１の下面に放射状に、且つ、各研磨布片２間にこれ らと平行に傾斜した状態に植えられている。この植え付けは、緩衝片３の上辺を 接着剤により基板１の下面に接着しているが、この接着の具体的方法は、研磨布 片２の場合と同様に、適宜変更し得る。Next, the buffer piece 3 will be described. These cushioning pieces 3 are small pieces made of a polishing cloth (paper) such as sandpaper which has a substantially rectangular shape, and more specifically, a basic sheet such as cloth or paper and a large number of abrasives provided on the lower surface thereof. Consists of. These buffer pieces 3 are planted radially on the lower surface of the substrate 1 and in a state of being inclined between the polishing cloth pieces 2 in parallel with them. In this planting, the upper side of the buffer piece 3 is adhered to the lower surface of the substrate 1 with an adhesive, but the specific method of this adhesion can be appropriately changed as in the case of the polishing cloth piece 2.
【００１１】 ここで、これらの緩衝片３は、略長方形をなすものであるが、その上下長さは 、研磨布片２の約３分の１から３分の２程度とされている。他方、その横長さ（ 植付け状態で言えば放射方向長さ）は、緩衝片３と同一とされているが、研磨布 片２よりも短くすることもできる。このように、緩衝片３の上下長さを研磨布片 ２よりも短くすることにより、植付け状態において、研磨ディスク下面、即ち研 磨面となる面には、研磨布片２の先端寄り部分のみが現れ、緩衝片３はその陰に 隠れて現れない。Here, the cushioning pieces 3 have a substantially rectangular shape, and the vertical length thereof is about one third to two thirds of that of the polishing cloth piece 2. On the other hand, the lateral length (radial length in a planted state) is the same as that of the buffer piece 3, but it can be shorter than the polishing cloth piece 2. Thus, by making the vertical length of the cushioning piece 3 shorter than that of the polishing cloth piece 2, only the portion near the tip of the polishing cloth piece 2 is on the lower surface of the polishing disk, that is, the surface to be the polishing surface in the planted state. Appears, and the buffer piece 3 is hidden behind it and does not appear.
【００１２】 尚、緩衝片３は、可撓性があれば足り、研磨能力は必ずしも必要でないため、 砥材のない布や紙、さらには合成樹脂シート片等の可撓性を有する小片のみで実 施することもできる。但し、砥材のない布等で実施すると、研磨布片２の下端寄 りが使用によって消耗した際には、砥材のない布等が、研磨布片２間から研磨面 に現れてしまい、研磨能力が低下することは避けられない。これに対して、この 実施例のように、研磨布片２と同様の研磨布を緩衝片３として用いると、研磨布 片２の下端寄りが使用によって消耗した後でも、研磨能力が低下することはない 。但し、緩衝片３が現れる程度に研磨布片２が消耗すると、前述の作用は期待し 得ないため軟質の被研磨物の研磨用としては適さず、硬質の金属の研磨用として 用いることが好ましい。Since the cushioning piece 3 need only be flexible and does not necessarily need polishing ability, it is only a small piece having flexibility such as cloth or paper without abrasive material, and synthetic resin sheet piece. It can also be applied. However, when using a cloth without abrasives, when the lower end of the polishing cloth piece 2 is consumed by use, the cloth without abrasives will appear on the polishing surface from between the polishing cloth pieces 2. It is unavoidable that the polishing ability will decrease. On the other hand, when a polishing cloth similar to the polishing cloth piece 2 is used as the buffer piece 3 as in this embodiment, the polishing ability is lowered even after the lower end of the polishing cloth piece 2 is consumed by use. Not. However, when the polishing cloth piece 2 is consumed to such an extent that the buffer piece 3 appears, the above-described action cannot be expected, so that it is not suitable for polishing a soft work piece, and is preferably used for polishing a hard metal. .
【００１３】 使用に際しては、通常の研磨ディスクと同様、グラインダー等の回転工具の回 転軸に、基板１の取り付け穴１１を取り付けて使用する。これにより、前述の作 用が発揮され、熟練者でなくとも、比較的柔らかい被研磨物の研磨を良好に行う ことができる。At the time of use, the mounting hole 11 of the substrate 1 is attached to the rotating shaft of a rotary tool such as a grinder to be used in the same manner as an ordinary polishing disk. As a result, the above-described operation is exhibited, and even a person who is not an expert can satisfactorily polish a relatively soft workpiece.
【００１４】 次に、図４は他の実施例を示す要部説明図であり、この実施例では、緩衝片３ に加えて緩衝片４を用いている点が、先の実施例と相違する。この緩衝片４は、 先の実施例の緩衝片３と同様の素材及び植付け方法により実施することができ、 その上下長さは、緩衝片３が研磨布片２の約２分の１、緩衝片４が研磨布片２の 約３分の２程度とされている。このように、２枚の緩衝片を各研磨布片２間に配 位することにより、より、良好なクッション性が得られるものである。 尚、緩衝片３及び緩衝片４の横長さ（植付け状態で言えば放射方向長さ）は、 緩衝片３と同一としてもよく、或いは、少なくとも一方を、研磨布片２よりも短 くすることもできる。また、緩衝片３と緩衝片４との上下長さを同一のものとし て実施することもできる。Next, FIG. 4 is an explanatory view of a main part showing another embodiment, and this embodiment is different from the previous embodiment in that a buffer piece 4 is used in addition to the buffer piece 3. . This cushioning piece 4 can be implemented by using the same material and planting method as the cushioning piece 3 of the previous embodiment, and the vertical length of the cushioning piece 3 is about half that of the polishing cloth piece 2, The piece 4 is about two-thirds of the polishing cloth piece 2. By arranging the two cushion pieces between the polishing cloth pieces 2 in this way, a better cushioning property can be obtained. The lateral lengths of the cushioning pieces 3 and 4 (radial lengths in the planted state) may be the same as the cushioning pieces 3, or at least one of them may be shorter than the polishing cloth piece 2. You can also Further, the vertical lengths of the buffer piece 3 and the buffer piece 4 can be made the same and can be implemented.
【００１５】 このように、研磨布片２間に配位する緩衝片の数は適宜変更し得るものであり 、逆に、研磨布片２と緩衝片３，４との数を、２対１にすると、先の実施例と従 来例との中間のクッション性を持ったものが得られる等、必要とされるクッショ ン性に応じて、研磨布片２と緩衝片３，４との比率は適宜変更すればよい。As described above, the number of buffer pieces coordinated between the polishing cloth pieces 2 can be appropriately changed, and conversely, the number of the polishing cloth pieces 2 and the buffer pieces 3 and 4 is 2: 1. In this case, the ratio between the polishing cloth piece 2 and the cushioning pieces 3 and 4 is adjusted according to the required cushioning property, such as a cushioning property intermediate between those of the previous embodiment and the conventional embodiment is obtained. Can be changed as appropriate.
【００１６】[0016]
以上、本願の第１の考案は、クッション性が良く、熟練していない作業者であ っても、研磨作業時の力かげんを容易に調整することができ、ガラスや比較的柔 らかい金属を被研磨物とする際にも良好な研磨を行うことのできる研磨ディスク を提供することができたものである。 本願の第２の考案は、クッション性が良く、熟練していない作業者であっても 、研磨作業時の力かげんを容易に調整することができ、ガラスや比較的柔らかい 金属を被研磨物とする際にも良好な研磨を行うことのできるのに加えて、研磨布 片の先端より部分が使用によって消耗した後にも、さらに研磨作業を行うことが できる研磨ディスクを提供することができたものである。 As described above, the first invention of the present application has a good cushioning property, and even an unskilled worker can easily adjust the strength of force during polishing work, and the first invention of the present application is made of glass or a relatively soft metal. It is possible to provide a polishing disk capable of performing excellent polishing even when using as a material to be polished. A second invention of the present application has a good cushioning property, and even an unskilled worker can easily adjust the force level during polishing work, and glass or a relatively soft metal is used as an object to be polished. In addition to being able to perform good polishing even during polishing, it is possible to provide a polishing disk that can perform further polishing work even after the portion from the tip of the polishing cloth piece is consumed by use. Is.
【図面の簡単な説明】[Brief description of drawings]
【図１】本願考案の第１の実施例に係る研磨ディスクの
上方から見た斜視図である。FIG. 1 is a perspective view of a polishing disk according to a first embodiment of the present invention as seen from above.
【図２】同研磨ディスクの下方から見た斜視図である。FIG. 2 is a perspective view of the polishing disk seen from below.
【図３】（Ａ）乃至（Ｄ）は同研磨ディスクの要部拡大
縦断面図である。3 (A) to (D) are enlarged longitudinal sectional views of a main part of the polishing disk.
【図４】本願考案の第２の実施例に係る研磨ディスクの
要部説明図である。FIG. 4 is an explanatory view of a main part of a polishing disk according to a second embodiment of the present invention.
【図５】（Ａ）乃至（Ｃ）は従来の研磨ディスクの要部
拡大縦断面図である。5 (A) to 5 (C) are enlarged vertical cross-sectional views of a main part of a conventional polishing disk.
１…基板 ２…研磨布片 ３…緩衝片 ４…緩衝片 1 ... Substrate 2 ... Polishing cloth piece 3 ... Buffer piece 4 ... Buffer piece
Claims (2)
回転する基板(1) と、この基板(1) の下面に放射状に植
えられた可撓性を有する研磨布片(2) とを備えた研磨デ
ィスクにおいて、 これらの研磨布片(2) 間に可撓性を有する緩衝片(3)
(4) が配位され、これらの緩衝片(3) (4) が上記の基板
(1) の下面に放射状に植えられており、 これらの緩衝片(3) (4) の上下長さが、研磨布片(2) の
上下長さよりも小さいことを特徴とする良クッショク性
の研磨ディスク。1. A substrate (1) which is attached to a rotary tool such as a grinder and rotates, and a flexible polishing cloth piece (2) radially planted on the lower surface of the substrate (1). In the polishing disc, a flexible cushioning piece (3) is provided between these polishing cloth pieces (2).
(4) are coordinated, and these buffer pieces (3) (4) are attached to the above substrate.
Radially planted on the bottom surface of (1), the vertical length of these cushioning pieces (3) (4) is smaller than the vertical length of the polishing cloth piece (2). Abrasive disc.
ていることを特徴とする請求項１記載の良クッショク性
の研磨ディスク。2. The polishing disk having good cushioning property according to claim 1, wherein the buffer pieces (3) (4) are made of a polishing cloth.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7928392U JPH0636770U (en) | 1992-10-20 | 1992-10-20 | Abrasive disc with good cushioning |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7928392U JPH0636770U (en) | 1992-10-20 | 1992-10-20 | Abrasive disc with good cushioning |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0636770U true JPH0636770U (en) | 1994-05-17 |
Family
ID=13685541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7928392U Pending JPH0636770U (en) | 1992-10-20 | 1992-10-20 | Abrasive disc with good cushioning |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0636770U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002530213A (en) * | 1998-11-20 | 2002-09-17 | フェアアイニヒテ・シュミルゲル−ウント・マシイネン−ファブリーケン・アクチェンゲゼルシャフト | Fan wheel |
| JP2011148058A (en) * | 2010-01-22 | 2011-08-04 | Ichiguchi:Kk | Polishing disc |
-
1992
- 1992-10-20 JP JP7928392U patent/JPH0636770U/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002530213A (en) * | 1998-11-20 | 2002-09-17 | フェアアイニヒテ・シュミルゲル−ウント・マシイネン−ファブリーケン・アクチェンゲゼルシャフト | Fan wheel |
| JP4681120B2 (en) * | 1998-11-20 | 2011-05-11 | ファウエスエム・フェアアイニクテ・シュミルゲル−ウント・マシイネン−ファブリーケン・アクチェンゲゼルシャフト | Fan-shaped grinding wheel |
| JP2011148058A (en) * | 2010-01-22 | 2011-08-04 | Ichiguchi:Kk | Polishing disc |
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