JPH06302988A - Electromagnetic wave shielding body - Google Patents
Electromagnetic wave shielding bodyInfo
- Publication number
- JPH06302988A JPH06302988A JP9034493A JP9034493A JPH06302988A JP H06302988 A JPH06302988 A JP H06302988A JP 9034493 A JP9034493 A JP 9034493A JP 9034493 A JP9034493 A JP 9034493A JP H06302988 A JPH06302988 A JP H06302988A
- Authority
- JP
- Japan
- Prior art keywords
- electromagnetic wave
- film
- shielding body
- wave shield
- fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、合わせ構造を有する電
磁波遮蔽体に関するものである。この電磁波遮蔽体は、
優れた耐久性及び透明性を有しており、例えば建築用の
窓ガラス等として有用である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetic wave shield having a mating structure. This electromagnetic shield is
It has excellent durability and transparency and is useful, for example, as a window glass for construction.
【0002】[0002]
【従来の技術】現在市販されている電磁波遮蔽ガラスに
は、銀(Ag)膜を使用した複層型や導電性メッシュを
使用した合わせ型等がある。銀膜を使用した電磁波遮蔽
ガラスは、銀膜の耐久性が悪いために複層ガラス構造に
する必要があり、サッシの厚みが厚くなるため通常のサ
ッシが使用できず、高価となる欠点がある。また導電性
メッシュを使用した電磁波遮蔽ガラスは、メッシュのた
めに透視性の点でやや難点がある。2. Description of the Related Art Electromagnetic wave shielding glasses currently on the market include a multi-layer type using a silver (Ag) film and a laminated type using a conductive mesh. Electromagnetic wave shielding glass using a silver film needs to have a double-layered glass structure due to poor durability of the silver film, and since the sash becomes thicker, a normal sash cannot be used, which is expensive. . In addition, the electromagnetic wave shielding glass using the conductive mesh has some difficulties in terms of transparency because of the mesh.
【0003】そこで近年、ガラス基板上に透明導電膜
(錫を含む酸化インジウム、フッ素又はアルミニウムを
含む酸化錫、フッ素又はアルミニウムを含む酸化亜
鉛)、その上に保護膜(クロムとホウ素を含む窒化膜)
を形成した透明導電ガラスが開発されている(特開平2
−217339号公報参照)。あるいは、透明基体上に
チタン、ジルコニウム、ハフニウムの窒化物、ホウ窒化
物、炭化物、ホウ炭化物の導電性膜を有する層を形成し
た電磁波遮蔽体等も提案されている(特開平4−585
98号公報参照)。これらは単板使用が可能であり、熱
線反射性能も優れている。Therefore, in recent years, a transparent conductive film (indium oxide containing tin, tin oxide containing fluorine or aluminum, zinc oxide containing fluorine or aluminum) is formed on a glass substrate, and a protective film (nitride film containing chromium and boron) is formed thereon. )
A transparent conductive glass having a film formed thereon has been developed (Japanese Patent Application Laid-Open No. HEI 2)
-217,339 gazette). Alternatively, an electromagnetic wave shielding body in which a layer having a conductive film of titanium, zirconium, hafnium nitride, boronitride, carbide, or borocarbide is formed on a transparent substrate has been proposed (Japanese Patent Laid-Open No. 4-585).
98 gazette). These can be used as a single plate and have excellent heat ray reflection performance.
【0004】[0004]
【発明が解決しようとする課題】しかし、前者の透明導
電ガラスは、最低限の電磁波遮蔽性能を発現させるため
には、どうしても厚さ数千A以上の透明導電膜を形成す
る必要がある。ところが、このような厚さ数千A以上の
透明導電膜を形成することは成膜コストが高くなる欠点
があり、また特殊な高速成膜設備を必要とする問題があ
る。更に後者の電磁波遮蔽体は、膜厚を薄くできるもの
の、開示されているような導電性膜では20dB程度の
電磁波遮蔽性能しか得られない。However, in the former transparent conductive glass, it is necessary to form a transparent conductive film having a thickness of several thousand A or more in order to exhibit the minimum electromagnetic wave shielding performance. However, forming such a transparent conductive film having a thickness of several thousand Å or more has a drawback that the film forming cost becomes high, and there is a problem that a special high-speed film forming equipment is required. Further, the latter electromagnetic wave shield can be made thin, but the disclosed conductive film can only provide an electromagnetic wave shield performance of about 20 dB.
【0005】ところで、近年フロートガラスのオンライ
ン製造設備において、熱分解法によりフッ素ドープ酸化
錫(SnO2:F)膜を形成したガラスが製造されるよ
うになった。前記フッ素ドープ酸化錫膜は、銀膜に比較
して優れた耐久性を有しており、例えばガラス上に厚さ
1500〜2500A程度の膜を形成した場合、15〜
20Ω/□の表面抵抗値が得られ、またヘーズ値も3以
下で透明性が良好である。By the way, in recent years, in an online manufacturing facility for float glass, glass having a fluorine-doped tin oxide (SnO 2 : F) film formed by a thermal decomposition method has been manufactured. The fluorine-doped tin oxide film has excellent durability as compared with a silver film. For example, when a film having a thickness of about 1500 to 2500 A is formed on glass,
A surface resistance value of 20 Ω / □ is obtained, and a haze value is 3 or less, and transparency is good.
【0006】電磁波遮蔽ガラスとしての遮蔽性能を発現
させるためには、ガラス上に形成されるフッ素ドープ酸
化錫膜が表面抵抗値10Ω/□以下の膜であることが必
要であり、この表面抵抗値を有する膜を得るためには、
フッ素ドープ酸化錫膜の膜厚を数千 程度に形成すれば
良い。In order to develop the shielding performance as the electromagnetic wave shielding glass, the fluorine-doped tin oxide film formed on the glass must have a surface resistance value of 10 Ω / □ or less. To obtain a film having
The fluorine-doped tin oxide film may be formed to have a film thickness of about several thousand.
【0007】ところが、膜厚を増すにつれて前記フッ素
ドープ酸化錫膜の結晶粒が大きくなり、膜表面が粗面化
されていく。このため、数千A程度の膜厚ではヘーズ値
が大きくて曇ったものとなり、著しく美観を損なうため
に建築用の窓ガラスとしては不適であった。However, as the film thickness increases, the crystal grains of the fluorine-doped tin oxide film increase, and the film surface becomes rough. For this reason, a film thickness of about several thousand A has a large haze value and becomes cloudy and remarkably impairs the aesthetic appearance, which is unsuitable as a window glass for construction.
【0008】本発明の目的は、前記低抵抗値を有する膜
を形成した透明基板を有効利用して、電磁波遮蔽体の本
来の重要な機能を確実に発揮させながら透明性向上を図
り、しかも低コストで製造できる合わせ構造の電磁波遮
蔽体を提供することである。An object of the present invention is to effectively utilize the transparent substrate on which the film having the low resistance value is formed, to ensure the original important function of the electromagnetic wave shield, and to improve the transparency. An object is to provide an electromagnetic wave shield having a combined structure that can be manufactured at low cost.
【0009】[0009]
【課題を解決するための手段】本発明は、一対の透明基
板間に中間膜が挟持された電磁波遮蔽体であって、該対
向する透明基板上の少なくとも一方にフッ素ドープ酸化
錫膜が被着されていることを特徴とする電磁波遮蔽体で
ある。本発明において、前記フッ素ドープ酸化錫膜の表
面抵抗値は、8〜12Ω/□の範囲であることが好まし
い。また、前記透明基板上に形成されるフッ素ドープ酸
化錫膜は、その厚さが4000〜5000A程度である
ことが好ましい。The present invention is an electromagnetic wave shield in which an intermediate film is sandwiched between a pair of transparent substrates, and a fluorine-doped tin oxide film is deposited on at least one of the opposing transparent substrates. The electromagnetic wave shield is characterized in that In the present invention, the surface resistance value of the fluorine-doped tin oxide film is preferably in the range of 8 to 12 Ω / □. The thickness of the fluorine-doped tin oxide film formed on the transparent substrate is preferably about 4000 to 5000A.
【0010】また本発明は、前述の電磁波遮蔽体と、金
属酸化物膜の被着された別の透明基板とが、中間膜を介
して積層されている電磁波遮蔽体であってもよい。The present invention may also be an electromagnetic wave shield in which the above-mentioned electromagnetic wave shield and another transparent substrate coated with a metal oxide film are laminated via an intermediate film.
【0011】さらに、前述の電磁波遮蔽体と、該電磁波
遮蔽体との対向面に金属膜、窒化物膜または酸化物膜か
らなる1層または2層以上の膜が被着された別の透明基
板とが、中間膜を介して積層されている電磁波遮蔽体で
あってもよい。Further, the above-mentioned electromagnetic wave shield and another transparent substrate in which one or more layers of a metal film, a nitride film or an oxide film are adhered on the surface facing the electromagnetic wave shield. May be an electromagnetic wave shield laminated with an intermediate film interposed therebetween.
【0012】本発明に係る透明基板としては、特に限定
されるものではないが、透明フロートガラス板等のガラ
ス基板が好ましい。The transparent substrate according to the present invention is not particularly limited, but a glass substrate such as a transparent float glass plate is preferable.
【0013】前記中間膜についても特に限定はなく、例
えばポリビニルブチラール(PVB)、エチレン酢酸ビ
ニル系の樹脂膜等が用いられ、フッ素ドープ酸化錫膜を
被着させて透明基板を一体的に結合する機能、及び透明
基板の損傷時の飛散防止機能とを有している。The intermediate film is also not particularly limited, and for example, polyvinyl butyral (PVB), ethylene vinyl acetate resin film or the like is used, and a fluorine-doped tin oxide film is adhered to integrally bond the transparent substrates. It has a function and a scattering prevention function when the transparent substrate is damaged.
【0014】前記金属酸化物膜としては、例えば錫やチ
タニウム、クロム等の酸化物膜を用いることができ、そ
の膜厚として300〜800Aの範囲が好ましく、とり
わけ400〜600Aの範囲であることが望ましい。ま
た、前記金属膜としては例えばクロムやステンレス、タ
ンタル等、前記窒化物としては例えばチタンや、クロ
ム、タンタル等の窒化物膜、前記酸化物としては例えば
チタンや錫、ジルコニウム、タンタル等の酸化物膜を用
いることができ、これらの群から1種または2種以上を
選択して1層または2層以上の膜を形成することができ
る。その膜厚は、単層及び複数層のいずれの場合も全体
として200〜1000Aの範囲にあることが好まし
い。As the metal oxide film, for example, an oxide film of tin, titanium, chromium or the like can be used, and the film thickness thereof is preferably in the range of 300 to 800A, and more preferably in the range of 400 to 600A. desirable. The metal film is, for example, chromium, stainless steel, tantalum, or the like, the nitride is, for example, titanium, a nitride film of chromium, tantalum, or the like, or the oxide is, for example, oxide of titanium, tin, zirconium, tantalum, or the like. A film can be used, and one kind or two or more kinds can be selected from these groups to form one layer or two or more layers. The film thickness is preferably in the range of 200 to 1000 A as a whole in both cases of single layer and plural layers.
【0015】[0015]
【作用】透明基板上に形成されたフッ素ドープ酸化錫膜
は、優れた耐久性能を有する。しかし、高い遮蔽性能を
得るには膜厚を厚くすることが必要であり、ヘーズ値が
大きくなって透明性が損なわれる。The fluorine-doped tin oxide film formed on the transparent substrate has excellent durability. However, in order to obtain high shielding performance, it is necessary to increase the film thickness, which increases the haze value and impairs transparency.
【0016】本発明のように、少なくとも一方の面にフ
ッ素ドープ酸化錫膜を被着した2枚の透明基板を中間膜
を介して合わせ構造とすることにより、電磁波遮蔽体と
しての機能を発揮するとともに、中間膜との接着により
中間膜が変形してフッ素ドープ酸化錫膜表面の凹凸を埋
め、さらに中間膜とフッ素ドープ酸化錫膜との屈折率の
差が比較的小さいため、ヘーズ値が小さくなり透明性向
上を図ることが可能である。特に、フッ素ドープ酸化錫
膜の表面抵抗値が8〜12Ω/□の範囲となるよう構成
すれば、電磁波遮蔽体としてより優れた機能を発揮す
る。As in the present invention, two transparent substrates each having a fluorine-doped tin oxide film coated on at least one surface thereof are combined together with an intermediate film interposed therebetween, thereby exhibiting a function as an electromagnetic wave shield. At the same time, the intermediate film is deformed by the adhesion with the intermediate film to fill the irregularities on the surface of the fluorine-doped tin oxide film, and since the difference in the refractive index between the intermediate film and the fluorine-doped tin oxide film is relatively small, the haze value is small It is possible to improve transparency. Particularly, when the surface resistance value of the fluorine-doped tin oxide film is configured to be in the range of 8 to 12 Ω / □, a more excellent function as an electromagnetic wave shield is exhibited.
【0017】また、この電磁波遮蔽体と金属酸化物膜、
金属膜、窒化物膜または酸化物膜の被着された透明基板
を組み合わせた構成としたため、さらに熱線反射性能も
付与することが可能である。Further, the electromagnetic wave shield and the metal oxide film,
Since the transparent substrate to which the metal film, the nitride film or the oxide film is adhered is combined, it is possible to further impart the heat ray reflection performance.
【0018】[0018]
【実施例】以下に、本発明を実施例に基づいて説明す
る。図2は、本発明の電磁波遮蔽体の断面図であり、一
対の透明ガラス基板10、10の対向面上に各々フッ素
ドープ酸化錫膜12、12が被着され、PVB膜14を
介して積層されている。EXAMPLES The present invention will be described below based on examples. FIG. 2 is a cross-sectional view of the electromagnetic wave shield of the present invention, in which fluorine-doped tin oxide films 12 and 12 are deposited on the facing surfaces of a pair of transparent glass substrates 10 and 10, respectively, and are laminated via a PVB film 14. Has been done.
【0019】(実施例1)フロート板ガラスの製造ライ
ンにおいて、熱分解法により透明ガラス基板10(厚さ
3mm)の表面に厚さ5000Aのフッ素ドープ酸化錫
膜12を成膜した。成膜された前記フッ素ドープ酸化錫
膜12の表面抵抗値は、10Ω/□であった。また、フ
ッ素ドープ酸化錫膜12の成膜された透明ガラス基板1
0のヘーズ値を測定したところ5.4であった。(Example 1) A fluorine-doped tin oxide film 12 having a thickness of 5000 A was formed on the surface of a transparent glass substrate 10 (thickness: 3 mm) by a pyrolysis method in a float plate glass production line. The surface resistance value of the formed fluorine-doped tin oxide film 12 was 10 Ω / □. In addition, the transparent glass substrate 1 on which the fluorine-doped tin oxide film 12 is formed
When the haze value of 0 was measured, it was 5.4.
【0020】一対の透明ガラス基板10、10を、フッ
素ドープ酸化錫膜12、12側を対向させて、PVB膜
14を介して貼り合わせ、オートクレープ中で加熱圧着
して、電磁波遮蔽体30を得た。A pair of transparent glass substrates 10 and 10 are bonded to each other with the fluorine-doped tin oxide films 12 and 12 facing each other with a PVB film 14 interposed therebetween, and they are thermocompression bonded in an autoclave to form an electromagnetic wave shield 30. Obtained.
【0021】この電磁波遮蔽体30の平面波の電磁波遮
蔽効果の測定結果を、図3に示す。測定は、MIL−S
TD−285法により行った。この結果から、電磁波遮
蔽体30は周波数100〜1000MHzで29.0〜
35.0dBの電磁波遮蔽効果を有することが分かっ
た。FIG. 3 shows the measurement result of the electromagnetic wave shielding effect of the plane wave of this electromagnetic wave shielding body 30. The measurement is MIL-S
It was performed by the TD-285 method. From this result, the electromagnetic wave shield 30 is 29.0 at a frequency of 100 to 1000 MHz.
It was found to have an electromagnetic wave shielding effect of 35.0 dB.
【0022】また、電磁波遮蔽体30のヘーズ値を測定
したところ2.4であった。前記透明ガラス基板10の
ヘーズ値5.4に比較して大幅に小さくなっており、透
明性の向上したことが確認された。The haze value of the electromagnetic wave shield 30 was measured and found to be 2.4. The haze value of the transparent glass substrate 10 was significantly smaller than the haze value of 5.4, and it was confirmed that the transparency was improved.
【0023】(実施例2)本発明に係る電磁波遮蔽体の
他の実施例を図4に示す。実施例1で用いた設備によ
り、透明ガラス基板10の表面に厚さ4500Aのフッ
素ドープ酸化錫膜12を成膜した。次に、前記フッ素ド
ープ酸化錫膜12、12側を対向させた一対の透明ガラ
ス基板10、10と、厚さ500Aの酸化チタン膜18
を成膜した透明ガラス基板16とを、各々PVB膜を介
して貼り合わせ、加熱圧着して合わせガラス構造とし、
電磁波遮蔽体40を得た。(Embodiment 2) FIG. 4 shows another embodiment of the electromagnetic wave shield according to the present invention. With the equipment used in Example 1, a fluorine-doped tin oxide film 12 having a thickness of 4500 A was formed on the surface of the transparent glass substrate 10. Next, the fluorine-doped tin oxide films 12 and 12, a pair of transparent glass substrates 10 and 10 facing each other, and a titanium oxide film 18 having a thickness of 500A.
And the transparent glass substrate 16 on which the above is formed, respectively, are bonded via a PVB film, and thermocompression bonded to form a laminated glass structure.
The electromagnetic wave shield 40 was obtained.
【0024】この電磁波遮蔽体40の電磁波遮蔽効果を
測定したところ、図3に示す実施例1とほぼ同様の結果
が得られた。また、電磁波遮蔽体40のヘーズ値は2.
5でった。これは、前記透明ガラス基板10のフッ素ド
ープ酸化錫膜12を形成した状態のヘーズ値5.4に比
較して大幅に小さくなっており、透明性が向上したこと
が確認された。When the electromagnetic wave shielding effect of this electromagnetic wave shielding body 40 was measured, almost the same results as in Example 1 shown in FIG. 3 were obtained. The haze value of the electromagnetic wave shield 40 is 2.
Was 5. This is significantly smaller than the haze value of 5.4 in the state where the fluorine-doped tin oxide film 12 of the transparent glass substrate 10 is formed, and it was confirmed that the transparency was improved.
【0025】なお、本実施例では酸化チタン膜18を電
磁波遮蔽体40の最外面に形成したが、透明ガラス基板
16の内側面に形成してもよい。Although the titanium oxide film 18 is formed on the outermost surface of the electromagnetic wave shield 40 in this embodiment, it may be formed on the inner surface of the transparent glass substrate 16.
【0026】(実施例3)図5に、本発明に係る電磁波
遮蔽体のさらに他の実施例を示す。まず、透明ガラス基
板16の表面上に厚さ300Aの窒化チタン膜20をス
パッタリング法により成膜した。そして、前記透明ガラ
ス基板16の窒化チタン膜22と実施例1で得た電磁波
遮蔽体30とを対向させ、PVB膜14を介して貼り合
わせ、加熱圧着して電磁波遮蔽体50を得た。(Embodiment 3) FIG. 5 shows still another embodiment of the electromagnetic wave shield according to the present invention. First, a 300 A thick titanium nitride film 20 was formed on the surface of the transparent glass substrate 16 by a sputtering method. Then, the titanium nitride film 22 of the transparent glass substrate 16 and the electromagnetic wave shield 30 obtained in Example 1 were opposed to each other, and were pasted together with the PVB film 14 interposed therebetween, and heat-pressed to obtain an electromagnetic wave shield 50.
【0027】この電磁波遮蔽体50の電磁波遮蔽効果を
測定したところ、図3に示す実施例1とほぼ同様の結果
が得られた。また、電磁波遮蔽体50のヘーズ値は2.
6であった。これは、前記透明ガラス基板10のフッ素
ドープ酸化錫膜12を形成した状態のヘーズ値5.4に
比較して大幅に小さくなっており、実施例2と同様に透
明性が向上したことが確認された。When the electromagnetic wave shielding effect of this electromagnetic wave shielding body 50 was measured, almost the same results as in Example 1 shown in FIG. 3 were obtained. The haze value of the electromagnetic wave shield 50 is 2.
It was 6. This is significantly smaller than the haze value of 5.4 in the state where the fluorine-doped tin oxide film 12 of the transparent glass substrate 10 is formed, and it is confirmed that the transparency is improved as in Example 2. Was done.
【0028】なお、本実施例では透明ガラス基板16の
表面上に形成される窒化物膜として窒化チタン膜の1層
のみの構成としたが、複数層を形成してもよい。In the present embodiment, the nitride film formed on the surface of the transparent glass substrate 16 is composed of only one layer of titanium nitride film, but a plurality of layers may be formed.
【0029】[0029]
【発明の効果】以上詳述したように、本発明は一対の透
明基板の対向面に各々表面抵抗値8〜12Ω/□のフッ
素ドープ酸化錫膜が被着されており、中間膜を介して積
層された合わせ構造であるため、優れた電磁波遮蔽性能
と透明性を呈する。しかも、この性能を発現させるに
は、通常のフロートガラスのオンライン製造設備を用い
て熱分解法により製造することができるため、製造が容
易で特別の成膜設備を必要とせず、製造コストを低減で
きる。As described above in detail, according to the present invention, a fluorine-doped tin oxide film having a surface resistance value of 8 to 12 Ω / □ is adhered to the opposing surfaces of a pair of transparent substrates, and an intermediate film is interposed therebetween. Since it is a laminated laminated structure, it exhibits excellent electromagnetic wave shielding performance and transparency. Moreover, in order to realize this performance, since it can be manufactured by a thermal decomposition method using a normal float glass online manufacturing facility, the manufacturing is easy and no special film deposition facility is required, and the manufacturing cost is reduced. it can.
【図1】本発明に係る電磁波遮蔽体の一部断面図FIG. 1 is a partial sectional view of an electromagnetic wave shield according to the present invention.
【図2】本発明に係る電磁波遮蔽体の一実施例を示す断
面図FIG. 2 is a sectional view showing an embodiment of an electromagnetic wave shield according to the present invention.
【図3】図2に示す電磁波遮蔽体の平面波の電磁波遮蔽
効果を示すグラフFIG. 3 is a graph showing the electromagnetic wave shielding effect of plane waves of the electromagnetic wave shielding body shown in FIG.
【図4】本発明に係る電磁波遮蔽体の他の実施例を示す
断面図FIG. 4 is a sectional view showing another embodiment of the electromagnetic wave shield according to the present invention.
【図5】本発明に係る電磁波遮蔽体の他の実施例を示す
断面図FIG. 5 is a sectional view showing another embodiment of the electromagnetic wave shield according to the present invention.
10 透明ガラス基板 12 フッ素ドープ酸化錫膜 14 PVB膜 16 透明ガラス基板 18 金属酸化物膜 20 PVB膜 22 窒化チタン膜 30、40、50 電磁波遮蔽体 10 Transparent Glass Substrate 12 Fluorine Doped Tin Oxide Film 14 PVB Film 16 Transparent Glass Substrate 18 Metal Oxide Film 20 PVB Film 22 Titanium Nitride Film 30, 40, 50 Electromagnetic Wave Shield
Claims (4)
電磁波遮蔽体であって、該対向する透明基板上の少なく
とも一方にフッ素ドープ酸化錫膜が被着されていること
を特徴とする電磁波遮蔽体。1. An electromagnetic wave shield having an intermediate film sandwiched between a pair of transparent substrates, wherein a fluorine-doped tin oxide film is deposited on at least one of the opposing transparent substrates. Electromagnetic wave shield.
が8〜12Ω/□の範囲である請求項1に記載の電磁波
遮蔽体。2. The electromagnetic wave shield according to claim 1, wherein the fluorine-doped tin oxide film has a surface resistance value in the range of 8 to 12 Ω / □.
と、金属酸化物膜の被着された別の透明基板とが、中間
膜を介して積層されていることを特徴とする電磁波遮蔽
体。3. An electromagnetic wave shield comprising: the electromagnetic wave shield according to claim 1 or 2; and another transparent substrate coated with a metal oxide film, with an intermediate film interposed therebetween. body.
と、該電磁波遮蔽体との対向面に金属膜、窒化物膜また
は酸化物膜からなる1層または2層以上の膜が被着され
た別の透明基板とが、中間膜を介して積層されているこ
とを特徴とする電磁波遮蔽体。4. The electromagnetic wave shield according to claim 1 or 2, and one or more layers of a metal film, a nitride film or an oxide film deposited on a surface facing the electromagnetic wave shield. Another transparent substrate is laminated via an intermediate film, and an electromagnetic wave shield is provided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9034493A JPH06302988A (en) | 1993-04-19 | 1993-04-19 | Electromagnetic wave shielding body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9034493A JPH06302988A (en) | 1993-04-19 | 1993-04-19 | Electromagnetic wave shielding body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06302988A true JPH06302988A (en) | 1994-10-28 |
Family
ID=13995918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9034493A Pending JPH06302988A (en) | 1993-04-19 | 1993-04-19 | Electromagnetic wave shielding body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06302988A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0992032A1 (en) * | 1997-06-25 | 2000-04-12 | Viratec Thin Films, Inc. | Display panel filter and method of making the same |
JP2008182045A (en) * | 2007-01-24 | 2008-08-07 | Asahi Glass Co Ltd | Radio wave absorber and its/dsrc facility |
JP2015056590A (en) * | 2013-09-13 | 2015-03-23 | 株式会社東芝 | Light receiving element and optical coupling type signal isolator |
-
1993
- 1993-04-19 JP JP9034493A patent/JPH06302988A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0992032A1 (en) * | 1997-06-25 | 2000-04-12 | Viratec Thin Films, Inc. | Display panel filter and method of making the same |
EP0992032A4 (en) * | 1997-06-25 | 2000-07-26 | Viratec Thin Films Inc | Display panel filter and method of making the same |
JP2008182045A (en) * | 2007-01-24 | 2008-08-07 | Asahi Glass Co Ltd | Radio wave absorber and its/dsrc facility |
JP2015056590A (en) * | 2013-09-13 | 2015-03-23 | 株式会社東芝 | Light receiving element and optical coupling type signal isolator |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0332717B1 (en) | Transparent laminated product | |
US5506037A (en) | Heat-reflecting and/or electrically heatable laminated glass pane | |
US4859532A (en) | Transparent laminated product | |
EP4361113A1 (en) | Coated glass and laminated glass | |
EP0691553A2 (en) | Thin film filters | |
US20200309997A1 (en) | Coating for a Heads-Up Display with Low Visible Light Reflectance | |
JPH02217339A (en) | Transparent electrically conductive glass | |
JP2012519648A (en) | Substrate with a stack having thermal properties and including a high refractive index layer | |
JPS63206333A (en) | Heat ray reflecting glass of single plate | |
JPH05195201A (en) | Metal vacuum coating article and preparation thereof | |
EP3105194B1 (en) | Coated glass article having an anti-reflective coating and laminated glass thereof | |
EP0386341A1 (en) | Laminated glass structure | |
JP2535350B2 (en) | High transmission solar control glass | |
JPH06302988A (en) | Electromagnetic wave shielding body | |
JP4406237B2 (en) | A method for producing a transparent substrate with a multilayer film having conductivity. | |
JP2811885B2 (en) | Heat shielding glass | |
JPH06177407A (en) | Transparent conductive film | |
JP3566749B2 (en) | Conductive laminate | |
JPH0764598B2 (en) | Infrared blocking glass | |
JP2003004902A (en) | Antireflective conductive multilayered thin film having transparent conductive film as outermost layer | |
JP2647720B2 (en) | Transparent conductive laminate | |
JPH0682163B2 (en) | Optical body with excellent durability | |
KR102574984B1 (en) | Thermal blocking plate for windows with thermal blocking and visibility characteristics | |
JPS60246508A (en) | Low reflective transparent conductive thin film with protective film | |
JPH0474737A (en) | Laminated glass |