JPH0627678Y2 - Cleaning equipment for liquid stream processing equipment such as cloth - Google Patents
Cleaning equipment for liquid stream processing equipment such as clothInfo
- Publication number
- JPH0627678Y2 JPH0627678Y2 JP9450191U JP9450191U JPH0627678Y2 JP H0627678 Y2 JPH0627678 Y2 JP H0627678Y2 JP 9450191 U JP9450191 U JP 9450191U JP 9450191 U JP9450191 U JP 9450191U JP H0627678 Y2 JPH0627678 Y2 JP H0627678Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- tank
- liquid
- wall
- retention
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Treatment Of Fiber Materials (AREA)
Description
【0001】[0001]
【産業上の利用分野】本考案は、布帛等の繊維製品を処
理液の液流によつて循環させながら染色その他の処理を
行う液流処理装置における洗浄装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device in a liquid stream processing apparatus for performing dyeing and other processing while circulating a textile product such as cloth with a liquid stream of a processing liquid.
【0002】[0002]
【従来の技術】布帛等の繊維製品を処理液の液流によつ
て循環させながら染色その他の処理を行う液流処理装置
において、処理液には、被処理物の種類や処理手段に応
じて各種の染料その他の薬品,助剤等が使用される。ま
た、被処理物自身から、オリゴマ,毛羽,スケール等が
離脱して処理液中を浮遊する。これらの薬品や浮遊物
は、装置の滞留槽内壁に付着して処理液を排出したのち
も残留するため、繰り返し使用により堆積して滞留槽缶
体内壁に堆積層を形成する。内壁に堆積層が形成される
と、上記堆積層から溶出・剥離する不純成分が処理液中
に混入して被処理物を汚染するため、処理品の品質が低
下するという問題を生じる。また、上記堆積層で、ステ
ンレス製の缶体の内表面が覆われると、この部分が酸素
と接触できないためステンレスの腐食を招き、装置寿命
を縮めるという問題を生じる。2. Description of the Related Art In a liquid stream processing apparatus for performing dyeing and other processing while circulating a textile product such as cloth with a liquid flow of a processing liquid, the processing liquid is treated in accordance with the type of processing object and processing means. Various dyes and other chemicals and auxiliaries are used. Further, oligomers, fluffs, scales, etc. separate from the object to be treated and float in the treatment liquid. Since these chemicals and suspended matters remain on the inner wall of the retention tank of the apparatus and remain after discharging the treatment liquid, they are accumulated by repeated use and form a deposition layer on the inner wall of the inner tank of the retention tank. When the deposited layer is formed on the inner wall, impure components that are eluted and separated from the deposited layer are mixed in the treatment liquid to contaminate the object to be treated, which causes a problem that the quality of the treated product deteriorates. Further, when the inner surface of the stainless steel can body is covered with the above-mentioned deposited layer, this portion cannot contact oxygen, which leads to corrosion of the stainless steel and shortens the life of the device.
【0003】そこで、最近、処理液の滞留槽内壁に薬品
等の残渣物が付着・堆積しないように、処理工程が終了
するごとに流路内を洗浄できるようにしたものが提案さ
れ、実用化されている。この洗浄装置は、図6に示すよ
うに、布帛等の滞留槽1と、この滞留槽1と布帛の移送
通路2とを接続した環状処理経路と、上記滞留槽の底部
の吸い込み部5(この図では4個所)から処理液を吸い
込み、ポンプ6,熱交換器7を介して、上記移送通路2
に一端に付設された液噴射部4に循環させる処理液循環
路8とを有する液流処理装置において、上記処理液循環
路8のポンプ6吐出側に一端を接続し、他端を滞留槽1
の外槽1bと内槽1aの間に導入した洗浄用配管9が、
洗浄液供給配管10を介して設けられている。上記洗浄
用配管9は、滞留槽1の上流側の内槽1aと外槽1bと
の間の天井側に、滞留槽1の傾斜に沿つて斜めに延びて
おり、その周面には、外槽1bの内壁に向かつて洗浄液
を噴射するノズル孔が所定間隔で設けられている。な
お、11は仕切り弁,12は給水弁,13は排液弁,1
4はノズル弁である。したがつて、この装置によれば、
液流処理工程の終了後に処理液または新しく給水された
水を洗浄用配管9に導入することによつて滞留槽1の外
槽1bと内槽1aに洗浄液をかけて直ちに付着残渣を洗
浄することができる。Therefore, recently, a method has been proposed in which the inside of the flow path can be cleaned each time the processing step is completed so that the residue such as chemicals does not adhere to or deposit on the inner wall of the processing liquid retention tank. Has been done. As shown in FIG. 6, this cleaning device includes a retention tank 1 for a cloth and the like, an annular processing path connecting the retention tank 1 and a cloth transfer passage 2, and a suction section 5 at the bottom of the retention tank (this The processing liquid is sucked from four locations in the figure), and the transfer passage 2 is transferred through the pump 6 and the heat exchanger 7.
In a liquid flow treatment device having a treatment liquid circulation passage 8 which is circulated in a liquid injection portion 4 attached to one end of the treatment liquid circulation passage 8, one end is connected to the discharge side of the pump 6 of the treatment liquid circulation passage 8 and the other end is connected to the retention tank 1
The cleaning pipe 9 introduced between the outer tank 1b and the inner tank 1a of
It is provided via the cleaning liquid supply pipe 10. The cleaning pipe 9 extends obliquely along the inclination of the retention tank 1 on the ceiling side between the inner tank 1a and the outer tank 1b on the upstream side of the retention tank 1, and the outer surface of the cleaning pipe 9 is Nozzle holes for spraying the cleaning liquid are provided at predetermined intervals toward the inner wall of the tank 1b. In addition, 11 is a sluice valve, 12 is a water supply valve, 13 is a drainage valve, 1
4 is a nozzle valve. Therefore, according to this device,
After the completion of the liquid flow treatment step, the treatment liquid or newly supplied water is introduced into the cleaning pipe 9 to apply the cleaning liquid to the outer tank 1b and the inner tank 1a of the retention tank 1 to immediately wash the attached residue. You can
【0004】[0004]
【考案が解決すべき課題】しかしながら、上記洗浄用配
管9による洗浄では、長手方向に延びる滞留槽1の内槽
1a,外槽1bの側方から完全に付着残渣を除去でき
ず、特に、内槽1aの外壁と外槽1bの内壁において処
理液の液面が波打つ気液境界部分や、内槽1aと外槽1
bとの隙間が狭くなつている下流側部分において、付着
残渣による堆積層が厚く形成されやすいことがわかつ
た。すなわち、内槽1aの内壁については、処理中に布
帛等が内壁に摺接して移送されるため残渣は付着しにく
いが、内槽1aの外壁および外槽1bの内壁の、処理液
の液面が波打つ気液境界部分では、液面が下がると同時
に壁面に付着した処理液が熱(処理液は通常、高温に加
熱されているため滞留槽1の壁面も熱く熱せられてい
る)によつて蒸発し、処理液中の溶解成分・浮遊成分が
壁面に固着し、これが繰り返されて極めて取れにくい固
着層が形成される。また、内槽1aと外槽1bとの隙間
が狭くなつている下流側部分では、処理液の流れ抵抗が
大きく残渣が動きにくいため、集中的に残渣が溜まりや
すい。However, the cleaning by the cleaning pipe 9 cannot completely remove the adhered residue from the sides of the inner tank 1a and the outer tank 1b of the retention tank 1 extending in the longitudinal direction. A gas-liquid boundary portion in which the liquid level of the processing liquid undulates on the outer wall of the tank 1a and the inner wall of the outer tank 1b, and the inner tank 1a and the outer tank 1
It was found that the deposition layer is likely to be thick due to the adhesion residue in the downstream portion where the gap with b is narrow. That is, with respect to the inner wall of the inner tank 1a, since the cloth or the like is slidably transferred to the inner wall during the treatment, the residue is unlikely to adhere to the inner wall of the inner tank 1a and the inner wall of the outer tank 1b. At the gas-liquid boundary where the waves are wavy, the treatment liquid attached to the wall surface at the same time as the liquid surface is lowered (the treatment liquid is usually heated to a high temperature, so the wall surface of the retention tank 1 is also heated). Evaporated and the dissolved and suspended components in the treatment liquid adhere to the wall surface, and this is repeated to form a fixed layer that is extremely difficult to remove. Further, in the downstream side portion where the gap between the inner tank 1a and the outer tank 1b is narrow, the flow resistance of the treatment liquid is large and the residue does not easily move, so that the residue is likely to be concentrated in a concentrated manner.
【0005】このように、滞留槽1内に残渣付着物が堆
積すると、前記のように、被処理物が汚染されたりステ
ンレスが腐食したりするので、これを回避するために、
処理工程終了後、洗浄液を滞留槽1の天井まで張つて液
を循環させることが行われているが、洗浄液および動力
エネルギーの消費コストを要するわりに効果があがつて
いない。そこで、強力な薬剤を使用して堆積層を化学的
に分解除去することも考えられるが、薬剤の使用によつ
て缶体自身が侵されるおそれもあり、薬剤の使用は好ま
しくない。このため、結局は、滞留槽1を分解し、内部
に生じた堆積層を手作業で削り取る作業を行わざるを得
ず、多大な手間を要しているのが実情である。As described above, when the residue deposits are accumulated in the retention tank 1, the object to be treated is contaminated or the stainless steel is corroded, as described above.
After completion of the treatment process, the cleaning liquid is stretched up to the ceiling of the retention tank 1 to circulate the liquid, but the effect is not achieved although the cleaning liquid and power energy consumption costs are required. Therefore, it is possible to chemically decompose and remove the deposited layer by using a strong agent, but the use of the agent is not preferable because the can itself may be damaged by the use of the agent. For this reason, in the end, it is necessary to disassemble the retention tank 1 and manually scrape off the accumulated layer generated inside, and in reality, it takes a lot of time and effort.
【0006】本考案は、このような事情に鑑みなされた
もので、滞留槽側方の、処理液の液面が波打つ部分や、
内槽と外槽の隙間が狭くなつている下流側の部分を集中
的に洗浄することができる洗浄装置の提供をその目的と
する。The present invention has been made in view of the above circumstances, and includes a portion on the side of the retention tank where the liquid surface of the processing liquid is wavy,
An object of the present invention is to provide a cleaning device capable of intensively cleaning a downstream portion where a gap between an inner tank and an outer tank is narrow.
【0007】[0007]
【課題を解決するための手段】上記の目的を達成するた
め、本考案は、布帛等の進行方向に向かつて傾斜した滞
留槽と、この滞留槽の一端から他端に接続された移送通
路とで構成された環状処理通路と、上記滞留槽底部の吸
い込み部からポンプ,熱交換器を介して上記移送通路の
一端に付設された処理液噴射部に循環させる処理液循環
路とを備え、上記環状処理通路内で布帛等を処理液とと
もに移送しながら処理するようにした液流処理装置にお
いて、一端が上記処理液循環路のポンプ吐出側に接続さ
れ他端が上記滞留槽の外槽と内槽との間に水平に延びる
洗浄用水平配管を付設し、上記洗浄用水平配管に、滞留
槽の外槽内壁および内槽外壁の液面近傍位置に向かつて
洗浄液を噴射する洗浄ノズルを設けた布帛等の液流処理
装置における洗浄装置を第1の要旨とし、上記と同様の
洗浄装置であつて、上記滞留槽の外槽と内槽との間の下
流側に、外槽の長手方向に沿つて傾斜した洗浄用傾斜配
管を所定間隔で複数平行に設け、上記各洗浄用傾斜配管
に、上記滞留槽の外槽内壁および内槽外壁に向かつて洗
浄液を噴射する洗浄ノズルを設けた布帛等の液流処理装
置における洗浄装置を第2の要旨とする。In order to achieve the above object, the present invention provides a retention tank inclined toward the advancing direction of a cloth and the like, and a transfer passage connected from one end to the other end of the retention tank. And a processing liquid circulation passage that circulates from a suction portion at the bottom of the retention tank through a pump and a heat exchanger to a processing liquid injection portion attached to one end of the transfer passage. In a liquid flow treatment device for treating cloth and the like while transferring it with a treatment liquid in an annular treatment passage, one end is connected to the pump discharge side of the treatment liquid circulation passage and the other end is inside the outer tank of the retention tank. A horizontal cleaning pipe extending horizontally between the tank and the tank was provided, and the horizontal pipe for cleaning was provided with a cleaning nozzle for injecting the cleaning liquid toward a position near the liquid surface of the outer tank inner wall and the inner tank outer wall of the retention tank. Cleaning in a liquid stream treatment device for cloth In the same cleaning apparatus as described above, the inclined pipe for cleaning inclined along the longitudinal direction of the outer tank is provided on the downstream side between the outer tank and the inner tank of the retention tank. A washing device for a liquid flow treatment device such as a cloth provided with a plurality of parallel pipes at predetermined intervals, and a washing nozzle for injecting a washing liquid toward the inner wall of the outer tank and the outer wall of the inner tank of each of the slant pipes for washing are provided in the washing pipe. This is the second summary.
【0008】[0008]
【作用】すなわち、本考案は、滞留槽の外槽と内槽との
間に水平に延びる洗浄用水平配管を設け、この洗浄用水
平配管に、滞留槽の外槽内壁および内槽外壁の液面近傍
位置に向かつて洗浄液を噴射する洗浄ノズルを設けたも
のである。これにより、従来、その除去が困難であつた
液面近傍の付着残渣を、上記洗浄ノズルからの噴射洗浄
液によつて集中的に洗浄除去することができ、滞留槽内
を清浄に保つことができる。また、上記洗浄用水平配管
とともに、滞留槽の外槽と内槽との間の下流側に、外槽
の長手方向に沿う洗浄用傾斜配管を所定間隔で複数平行
に設けて滞留槽の外槽内壁および内槽外壁に向かつて洗
浄液を噴射させることにより、液面近傍の付着残渣のみ
ならず、外槽内壁と内槽との間の、隙間が狭い部分の側
面の付着残渣も充分に洗浄除去することができる。した
がつて、本考案によれば、滞留槽の分解清掃や強力な薬
剤による循環清浄等を行うことが不要で、循環処理工程
終了ごとに上記洗浄用配管から洗浄液を噴射させるだけ
で、外槽内壁および内槽外壁に付着した残渣を除去する
ことができ、滞留槽内を清浄な状態に維持することがで
きる。That is, according to the present invention, a horizontal cleaning pipe extending horizontally is provided between the outer tank and the inner tank of the retention tank, and the cleaning horizontal pipe is provided with liquid on the inner wall of the outer tank and the outer wall of the inner tank. A cleaning nozzle for ejecting the cleaning liquid is provided toward the position near the surface. As a result, it is possible to intensively remove the adhered residue in the vicinity of the liquid surface, which was conventionally difficult to remove, by the jet cleaning liquid from the cleaning nozzle, and to keep the inside of the retention tank clean. . In addition to the horizontal pipe for cleaning, a plurality of inclined pipes for cleaning along the longitudinal direction of the outer tank are provided in parallel on the downstream side between the outer tank and the inner tank of the retention tank at a predetermined interval in parallel to each other. By spraying the cleaning liquid toward the inner wall and the outer wall of the inner tank, not only the adhered residue in the vicinity of the liquid surface but also the adhered residue on the side surface of the narrow part between the inner wall of the outer tank and the inner tank can be sufficiently removed. can do. Therefore, according to the present invention, it is not necessary to disassemble and clean the retention tank or to perform circulation cleaning with a powerful chemical agent. Instead, the cleaning liquid is sprayed from the cleaning pipe at each end of the circulation treatment process. The residue attached to the inner wall and the outer wall of the inner tank can be removed, and the inside of the retention tank can be maintained in a clean state.
【0009】つぎに、本考案を実施例にもとづいて詳細
に説明する。Next, the present invention will be described in detail based on embodiments.
【0009】[0009]
【実施例】図1は本考案の一実施例の構成図、図2は図
1のA−A′断面図である。この液流処理装置における
洗浄装置には、図6に示す洗浄液供給配管10から分岐
する第2の洗浄液供給配管20が設けられており、その
先端側が滞留槽1の上部で下向き半円状に分岐してヘツ
ダー部20aを形成している。そして、このヘツダー部
20aの各先端に、滞留槽1の外槽1bと内槽1aとの
間に水平に延びる洗浄用水平配管21,21′が、分岐
細管22を介してそれぞれ接続されている。なお、上記
洗浄用水平配管21,21′の高さは、処理液の液面X
の高さに一致するよう設定されている。そして、これら
の洗浄用水平配管21,21′には、図2の鎖線Yで囲
まれた部分の拡大図(断面位置を、分岐細管22を通ら
ない断面にずらしてある)に示すように、外槽1bの内
壁に向かつて洗浄液を噴射するノズル孔23と、内槽1
aの外壁に向かつて洗浄液を噴射するノズル孔24と
が、パイプ長手方向に沿つて所定間隔で穿設されてい
る。それ以外の部分は、図6と同様であり、同一部分に
同一番号を付している。1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a sectional view taken along the line AA 'in FIG. The cleaning device in this liquid flow treatment device is provided with a second cleaning liquid supply pipe 20 branching from the cleaning liquid supply pipe 10 shown in FIG. 6, and the tip side thereof branches downward in a semicircular shape at the upper part of the retention tank 1. To form the header portion 20a. Further, horizontal pipes 21 and 21 'for cleaning extending horizontally between the outer tank 1b and the inner tank 1a of the retention tank 1 are connected to the respective ends of the header portion 20a via branching narrow tubes 22, respectively. . The height of the cleaning horizontal pipes 21 and 21 'is equal to the level X of the processing liquid.
It is set to match the height of. As shown in an enlarged view of the portion surrounded by the chain line Y in FIG. 2 (the cross-sectional position is shifted to a cross section not passing through the branch thin tube 22) in these cleaning horizontal pipes 21 and 21 ', A nozzle hole 23 for jetting the cleaning liquid toward the inner wall of the outer tank 1b, and the inner tank 1
Nozzle holes 24 for spraying the cleaning liquid toward the outer wall of a are formed at predetermined intervals along the longitudinal direction of the pipe. The other parts are the same as those in FIG. 6, and the same parts are denoted by the same reference numerals.
【0010】この洗浄装置によれば、液流処理装置によ
る布帛3の処理終了後に、ノズル弁14を閉じ仕切り弁
30を開くことにより、処理液または新たな給水による
新鮮な水(洗浄液)を、洗浄用水平配管21,21′の
ノズル孔23,24から、図3(a)に矢印で示すよう
に噴射させることができる。したがつて、上記噴射洗浄
液によつて、滞留槽1の外槽1b内壁および内槽1a外
壁の液面X近傍部分を集中的に洗浄することができ、こ
れらの部分の付着残渣を清浄に除去することができる。
なお、洗浄後の汚水は、ポンプ6吸い込み側に設けられ
る排液弁13から外部に排出される。According to this cleaning device, after the processing of the cloth 3 by the liquid flow processing device is completed, the nozzle valve 14 is closed and the partition valve 30 is opened, so that the processing liquid or fresh water (cleaning liquid) by new supply of water is supplied. It is possible to inject from the nozzle holes 23 and 24 of the horizontal cleaning pipes 21 and 21 'as shown by the arrow in FIG. Therefore, the spray cleaning liquid can intensively clean the inner wall of the outer tank 1b and the outer wall of the inner tank 1a in the vicinity of the liquid surface X of the retention tank 1, and cleanly remove the residue attached to these parts. can do.
In addition, the dirty water after cleaning is discharged to the outside from a drain valve 13 provided on the suction side of the pump 6.
【0011】このように、この洗浄装置によれば、従
来、残渣が、熱によつて強固に固着していた液面近傍
を、一回の循環処理工程終了ごとに上記洗浄用水平配管
21,21′からの噴射洗浄液で洗い流すことができ、
付着残渣が残留することがないため、滞留槽1内を常時
清浄に保つことができる。したがつて、被処理物汚染や
ステンレス腐食の問題を生じることがなく、長期にわた
つて高品質の処理を行うことができる。As described above, according to this cleaning apparatus, the horizontal pipe for cleaning 21, which is conventionally used in the vicinity of the liquid surface where the residue has been firmly adhered by heat, is formed every time the circulation processing step is completed. It can be washed off with the jet cleaning liquid from 21 ',
Since the adhered residue does not remain, the inside of the retention tank 1 can be always kept clean. Therefore, it is possible to perform high-quality processing over a long period of time without causing problems such as contamination of the object to be processed and corrosion of stainless steel.
【0012】なお、上記仕切り弁30を開くと同時に、
従来からの洗浄装置である洗浄配管9に接続する仕切り
弁31を開き、洗浄配管9と洗浄用水平配管21,2
1′の双方から同時に洗浄液を噴射させることができ
る。また、片方の仕切り弁30(31)を閉じて一方か
らのみ洗浄液を噴射させることによりその噴射圧を高く
して集中的に片方の部位の洗浄を行うことができる。逆
に、双方の仕切り弁30,31を開き、その上で互いの
弁の開度を調整することにより、双方の配管9,21,
21′からバランスのとれた状態で滞留槽1内を洗浄す
ることもできる。At the same time when the gate valve 30 is opened,
The sluice valve 31 connected to the cleaning pipe 9 which is a conventional cleaning device is opened, and the cleaning pipe 9 and the horizontal pipes 21 and 2 for cleaning are opened.
The cleaning liquid can be sprayed simultaneously from both 1 '. Further, by closing one of the sluice valves 30 (31) and injecting the cleaning liquid only from one side, the injection pressure can be increased to intensively clean one part. On the contrary, by opening both sluice valves 30 and 31, and adjusting the opening of each valve on the sluice valves 30, 31, both pipes 9, 21,
It is also possible to wash the inside of the retention tank 1 in a balanced state from 21 '.
【0012】また、上記洗浄装置では、洗浄用水平配管
21,21′のノズル孔23,24が、水平方向にのみ
設けられているが、図3(b)に示すように、ある程度
角度をつけてノズル孔25を設け、外槽1bの内壁と内
槽1aの外壁に洗浄液を当てて反射させるようにしても
差し支えはない。また、各ノズル孔23〜25は、周方
向において同一円周上に並ぶようにしてもよいし、互い
違いになるような配列にしてもよい。Further, in the above cleaning apparatus, the nozzle holes 23 and 24 of the horizontal cleaning pipes 21 and 21 'are provided only in the horizontal direction, but as shown in FIG. There is no problem even if the nozzle hole 25 is provided and the cleaning liquid is applied to the inner wall of the outer tank 1b and the outer wall of the inner tank 1a to be reflected. Further, the nozzle holes 23 to 25 may be arranged on the same circumference in the circumferential direction, or may be staggered.
【0013】図4は本考案の他の実施例の構成図、図5
は図4のB−B′断面図である。この液流処理装置にお
ける洗浄装置には、図6に示す洗浄液供給用配管10か
ら分岐する第2の洗浄液供給配管20の先端側が滞留槽
1の周囲を環状に取り巻いてヘツダー部20bを形成し
ている。そして、このヘツダー部20bの内周側が、滞
留槽1の外槽1bと内槽1aとの間の下流側に、外槽1
bの長手方向に沿つて傾斜して設けられた洗浄用傾斜配
管35に、分岐細管22を介してそれぞれ接続されてい
る。なお、上記洗浄用傾斜配管35は、外槽1bの天井
側に3本、底部側に2本設けられており、前記2本の洗
浄用水平配管21,21′と合わせて、それぞれが略等
間隔となるように同一円周上に配置されている。ただ
し、図5においてSで示す部分には、洗浄用傾斜配管3
5を設けていない。これは、これら洗浄用傾斜配管35
が設けられた部分の底部には、吸い込み口5(図4参
照)のうちの2個が配置しており、これらの吸い込み口
5に流入する処理液の強い流れによつて残渣の付着を殆
ど生じないからである。そして、各洗浄用傾斜配管35
には、上記洗浄用水平配管21,21′と同様のノズル
孔23〜25(図3《a》参照)が穿設されており、外
槽1bの内壁および内槽1aの外壁に向かつて洗浄液が
噴射されるようになつている。それ以外の部分は、図1
と同様であり、同一部分に同一番号を付している。FIG. 4 is a block diagram of another embodiment of the present invention, FIG.
4 is a sectional view taken along line BB ′ of FIG. 4. In the cleaning device in this liquid flow treatment device, the tip side of the second cleaning liquid supply pipe 20 branched from the cleaning liquid supply pipe 10 shown in FIG. 6 annularly surrounds the periphery of the retention tank 1 to form a header portion 20b. There is. Then, the inner peripheral side of the header 20b is provided on the downstream side between the outer tank 1b of the retention tank 1 and the inner tank 1a.
The inclined pipes for cleaning 35, which are inclined along the longitudinal direction of b, are connected to each other via the branched thin pipes 22. The three inclined cleaning pipes 35 are provided on the ceiling side and two on the bottom side of the outer tub 1b. Together with the two horizontal cleaning pipes 21 and 21 ', the cleaning inclined pipes 35 are substantially equal to each other. They are arranged on the same circumference so as to be spaced apart. However, in the portion indicated by S in FIG.
5 is not provided. This is the inclined pipe 35 for cleaning.
Two of the suction ports 5 (see FIG. 4) are arranged at the bottom of the portion provided with, and a strong flow of the processing liquid flowing into these suction ports 5 causes almost no residue to be attached. Because it does not occur. Then, each cleaning inclined pipe 35
Nozzle holes 23 to 25 (see FIG. 3 << a >>) similar to those of the horizontal pipes 21 and 21 'for cleaning are bored in the cleaning liquid toward the inner wall of the outer tank 1b and the outer wall of the inner tank 1a. Is being jetted. The other parts are shown in Fig. 1.
The same numbers are given to the same parts.
【0014】この洗浄装置によれば、洗浄用水平配管2
1,21′によつて液面X近傍の付着残渣を洗浄するこ
とができるだけでなく、従来、汚れやすかつた、滞留槽
1の外槽1bと内槽1aの隙間の下流側の狭い部分にお
いても、外槽1bの内壁と内槽1aの外壁とを集中的に
洗浄することができるため、この部分をも常時清浄に保
つことができる。したがつて、上記実施例のものより
も、一層滞留槽1内を、清浄に保つことができる。According to this cleaning device, the horizontal pipe 2 for cleaning is used.
In addition to being able to wash the adhered residue near the liquid surface X with the aid of 1, 21 ', in the narrow portion on the downstream side of the gap between the outer tank 1b and the inner tank 1a of the retention tank 1, which is conventionally easily soiled. Also, since the inner wall of the outer tank 1b and the outer wall of the inner tank 1a can be intensively cleaned, this portion can be always kept clean. Therefore, the inside of the retention tank 1 can be kept more clean than in the above-mentioned embodiment.
【0015】[0015]
【考案の効果】以上のように、本考案は、液流処理装置
による処理終了後に、洗浄液が、滞留槽の内外槽の液面
に沿つて水平に噴射されるようになつている。したがつ
て、従来、処理液が繰り返し蒸発されて薬品等が濃縮固
着しやすかつた気液境界部分を、集中的に洗浄すること
ができるため、滞留槽内を常時清浄に保つことができ
る。また、上記水平噴射ととともに、滞留槽下流側の、
外槽内壁と内槽との間の隙間が狭い部分にも、滞留槽の
傾斜に沿う傾斜した配置で洗浄液を噴射することで、滞
留槽内の洗浄を一層効果的に行うことができる。しか
も、本考案では、洗浄液として処理液を用い、液流処理
装置に備えられた処理液循環用のポンプをそのまま利用
して液の加圧を行うことができるようにしているため、
極めて安価な経費で効果的な洗浄を行うことができる。As described above, according to the present invention, the cleaning liquid is horizontally jetted along the liquid surface of the inner and outer tanks of the retention tank after the processing by the liquid flow processing device is completed. Therefore, since the gas-liquid boundary portion where the treatment liquid is repeatedly evaporated and the chemicals or the like tend to be concentrated and fixed in the related art can be intensively washed, the inside of the retention tank can be always kept clean. In addition to the horizontal injection, on the downstream side of the retention tank,
By spraying the cleaning liquid even in a portion where the gap between the inner wall of the outer tank and the inner tank is narrow, the cleaning liquid can be sprayed in an inclined arrangement along the inclination of the retention tank, so that the inside of the retention tank can be cleaned more effectively. Moreover, in the present invention, since the processing liquid is used as the cleaning liquid and the pump for circulating the processing liquid provided in the liquid flow processing device can be used as it is, the liquid can be pressurized.
Effective cleaning can be performed at an extremely low cost.
【図面の簡単な説明】[Brief description of drawings]
【図1】本考案の一実施例を示す構成図である。FIG. 1 is a block diagram showing an embodiment of the present invention.
【図2】図1のA−A′断面図である。FIG. 2 is a sectional view taken along the line AA ′ of FIG.
【図3】上記実施例のノズル孔の配置の説明図である。FIG. 3 is an explanatory diagram of the arrangement of nozzle holes in the above embodiment.
【図4】本考案の他の実施例を示す構成図である。FIG. 4 is a block diagram showing another embodiment of the present invention.
【図5】図4のB−B′断面図である。5 is a sectional view taken along line BB ′ of FIG.
【図6】従来の洗浄装置を示す構成図である。FIG. 6 is a configuration diagram showing a conventional cleaning device.
1 滞留槽 1a 内槽 1b 外槽 2 移送通路 3 布帛 4 噴射部 5 吸い込み部 6 ポンプ 7 熱交換器 8 処理液循環路 10,20 洗浄液供給配管 21,21′ 洗浄用水平配管 22 分岐細管 23〜25 ノズル孔 35 洗浄用傾斜配管 X 液面 1 Retaining tank 1a Inner tank 1b Outer tank 2 Transfer passage 3 Fabric 4 Injection part 5 Suction part 6 Pump 7 Heat exchanger 8 Treatment liquid circulation path 10, 20 Cleaning liquid supply pipe 21, 21 'Horizontal pipe for cleaning 22 Branch thin tube 23- 25 Nozzle hole 35 Sloping pipe for cleaning X Liquid level
Claims (2)
留槽と、この滞留槽の一端から他端に接続された移送通
路とで構成された環状処理通路と、上記滞留槽底部の吸
い込み部からポンプ,熱交換器を介して上記移送通路の
一端に付設された処理液噴射部に循環させる処理液循環
路とを備え、上記環状処理通路内で布帛等を処理液とと
もに移送しながら処理するようにした液流処理装置にお
いて、一端が上記処理液循環路のポンプ吐出側に接続さ
れ他端が上記滞留槽の外槽と内槽との間に水平に延びる
洗浄用水平配管を付設し、上記洗浄用水平配管に、滞留
槽の外槽内壁および内槽外壁の液面近傍位置に向かつて
洗浄液を噴射する洗浄ノズルを設けたことを特徴とする
布帛等の液流処理装置における洗浄装置。1. An annular processing passage constituted by a retention tank inclined toward the advancing direction of cloth and the like, a transfer passage connected from one end to the other end of the retention tank, and a suction portion at the bottom of the retention tank. From the pump through a pump and a heat exchanger to a treatment liquid circulating passage that is circulated to a treatment liquid jetting part attached to one end of the transfer passage, and the fabric and the like are treated while being transported together with the treatment liquid in the annular treatment passage. In the liquid flow treatment device thus configured, one end is connected to the pump discharge side of the treatment liquid circulation path and the other end is provided with a horizontal pipe for cleaning that extends horizontally between the outer tank and the inner tank of the retention tank, A cleaning device in a liquid flow treatment device for a cloth or the like, characterized in that the cleaning horizontal pipe is provided with a cleaning nozzle for injecting a cleaning liquid toward positions near the liquid surfaces of the outer tank inner wall and the inner tank outer wall of the retention tank.
滞留槽の外槽と内槽との間の下流側に、外槽の長手方向
に沿つて傾斜した洗浄用傾斜配管を所定間隔で複数平行
に設け、上記各洗浄用傾斜配管に、上記滞留槽の外槽内
壁および内槽外壁に向かつて洗浄液を噴射する洗浄ノズ
ルを設けたことを特徴とする布帛等の液流処理装置にお
ける洗浄装置。2. The cleaning apparatus according to claim 1, wherein inclined pipes for cleaning which are inclined along the longitudinal direction of the outer tank are provided at predetermined intervals on the downstream side between the outer tank and the inner tank of the retention tank. In a liquid flow treatment device for a cloth or the like, a plurality of parallel nozzles are provided in parallel, and each of the cleaning inclined pipes is provided with a cleaning nozzle for injecting a cleaning liquid toward the outer tank inner wall and the inner tank outer wall of the retention tank. Cleaning device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9450191U JPH0627678Y2 (en) | 1991-10-21 | 1991-10-21 | Cleaning equipment for liquid stream processing equipment such as cloth |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9450191U JPH0627678Y2 (en) | 1991-10-21 | 1991-10-21 | Cleaning equipment for liquid stream processing equipment such as cloth |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0537992U JPH0537992U (en) | 1993-05-21 |
JPH0627678Y2 true JPH0627678Y2 (en) | 1994-07-27 |
Family
ID=14112064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9450191U Expired - Lifetime JPH0627678Y2 (en) | 1991-10-21 | 1991-10-21 | Cleaning equipment for liquid stream processing equipment such as cloth |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0627678Y2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101304383B1 (en) * | 2013-04-18 | 2013-09-06 | 권중형 | Rapid dyeing machine |
JP6149069B2 (en) * | 2015-06-26 | 2017-06-14 | 株式会社日阪製作所 | Treatment agent input device for liquid flow type fabric treatment device |
-
1991
- 1991-10-21 JP JP9450191U patent/JPH0627678Y2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0537992U (en) | 1993-05-21 |
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EXPY | Cancellation because of completion of term |