JPH0624860U - Electroplated whetstone - Google Patents

Electroplated whetstone

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Publication number
JPH0624860U
JPH0624860U JP3015492U JP3015492U JPH0624860U JP H0624860 U JPH0624860 U JP H0624860U JP 3015492 U JP3015492 U JP 3015492U JP 3015492 U JP3015492 U JP 3015492U JP H0624860 U JPH0624860 U JP H0624860U
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JP
Japan
Prior art keywords
inclined grooves
grindstone
protrusions
grinding
grinding surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3015492U
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Japanese (ja)
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JPH0715725Y2 (en
Inventor
健二 福島
秀男 大下
Original Assignee
大阪ダイヤモンド工業株式会社
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Priority to JP1992030154U priority Critical patent/JPH0715725Y2/en
Publication of JPH0624860U publication Critical patent/JPH0624860U/en
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Abstract

(57)【要約】 【目的】 砥面の全体にわたって切粉の排出性が良く、
高い精度で加工が行える電着砥石を提供する。 【構成】 砥石台金の砥面2に、互いに交叉する多数の
傾斜溝3、4を設けてその間に4角錐状突起5を形成
し、その突起5と傾斜溝3、4により連続した凹凸パタ
ーンを形成する。各傾斜溝3、4の角度α、βを異なら
せて各突起5の頂点位置を回転方向に対してずらし、各
突起5の表面に、突起より小さい超砥粒を電着する。
(57) [Summary] [Purpose] Good chip discharge over the entire grinding surface,
Provide an electrodeposition grindstone that can be processed with high accuracy. [Structure] A large number of inclined grooves 3 and 4 intersecting each other are provided on a grinding surface 2 of a whetstone base, and a quadrangular pyramid-shaped protrusion 5 is formed between them, and a concavo-convex pattern formed by the protrusions 5 and the inclined grooves 3 and 4. To form. The angles α and β of the inclined grooves 3 and 4 are different from each other to shift the apex position of each protrusion 5 with respect to the rotation direction, and superabrasive grains smaller than the protrusion are electrodeposited on the surface of each protrusion 5.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

この考案は、ダイヤモンド又は立方晶窒化ホウ素などの超砥粒を、砥石の台金 表面に電気化学方法によって固着させた電着砥石の改良に関するものである。 The present invention relates to an improvement of an electrodeposition grindstone in which superabrasive grains such as diamond or cubic boron nitride are fixed to the surface of a base metal of the grindstone by an electrochemical method.

【0002】[0002]

【従来の技術及びその課題】[Prior art and its problems]

この種の電着砥石は、レジンボンドやメタルボンド、或いはビトリファイドボ ンドを用いた砥石に比べて、砥面における砥粒の集中度が高く、加工に作用する 砥粒数が極めて多い。このために、ガラス材やセラミック材などを加工した場合 、砥粒の摩耗の進行と共に切粉の排出が著しく悪くなり、目詰まりや溶着を起こ しやすい問題がある。 This type of electrodeposited grindstone has a higher concentration of abrasive grains on the grinding surface and an extremely large number of abrasive grains that affect machining, as compared with a grindstone using a resin bond, a metal bond, or a vitrified bond. For this reason, when a glass material or a ceramic material is processed, there is a problem that clogging and welding are likely to occur because the discharge of chips becomes significantly worse as the abrasion of the abrasive grains progresses.

【0003】 このような問題に対して、従来、図6に示すように台金21の砥面22に所定 の間隔でスリット23を形成し、そのスリット23により切粉の排出を行うよう にした電着砥石が提案されている。To address such a problem, conventionally, as shown in FIG. 6, slits 23 are formed at a predetermined interval on a polishing surface 22 of a base metal 21, and the slits 23 are used to discharge chips. Electroplated whetstones have been proposed.

【0004】 しかし、上記提案の砥石では、砥石全体でみれば確かに砥面22にスリット2 3による凹凸が混在し、切粉の排出性が若干改善されるが、砥面22の高い部分 では、以前と同様に砥粒の集中度が高く、従来通り目詰まりや溶着を起こしやす い欠点がある。However, in the above-mentioned proposed grindstone, when seen from the whole grindstone, the unevenness due to the slits 23 is surely mixed in the grind surface 22 and the discharge property of the chips is slightly improved, but in the high part of the grind surface 22 As before, the concentration of abrasive grains is high, and there is a drawback that clogging and welding easily occur as before.

【0005】 また、従来の電着砥石においては、切込み深さを大きくできると共に、高い加 工精度が確保でき、高い研削能率が得られる砥石の開発が求められている。Further, in the conventional electrodeposition grindstone, there is a demand for development of a grindstone capable of increasing the cutting depth, ensuring high machining accuracy, and obtaining high grinding efficiency.

【0006】 そこで、この考案は、上記の課題を解決し、砥面の全体にわたって切粉の排出 を良好に行うことができ、しかも高い研削精度で加工を行うことができる電着砥 石を提供することを目的としている。Therefore, the present invention solves the above-mentioned problems and provides an electrodeposition grindstone capable of satisfactorily discharging chips over the entire grinding surface and capable of processing with high grinding accuracy. The purpose is to do.

【0007】[0007]

【課題を解決するための手段】[Means for Solving the Problems]

上記の課題を解決するため、この考案は、砥石台金の砥面に、その砥面の両側 から一定のピッチで傾斜する多数の傾斜溝をそれぞれ互いに交叉するように設け 、その各傾斜溝の間に砥面に、一様に分布する4角錘状突起を形成し、この4角 錐状突起の表面に、その突起より小さな粒径の超砥粒を電着作用によって固定し た構成としたものである。 In order to solve the above problems, the present invention provides a plurality of inclined grooves, which are inclined at a constant pitch from both sides of the grinding surface of a grinding wheel base metal, so as to intersect each other, and In the structure, four pyramidal protrusions that are uniformly distributed are formed on the grinding surface, and superabrasive grains with a smaller particle size than the protrusions are fixed to the surface of the four-sided pyramidal protrusions by electrodeposition. It was done.

【0008】 また、この考案は第2の手段として、上記各傾斜溝の傾斜角度を互いに異なら せた構造を採用したのである。Further, the present invention employs, as a second means, a structure in which the inclination angles of the respective inclined grooves are different from each other.

【0009】[0009]

【作用】[Action]

上記の構造においては、各傾斜溝と4角錐状突起により連続した凹凸パターン が形成され、砥面に多数のチップポケットとなる隙間が形成される。また、各4 角錐状突起の頂点付近の砥粒だけが加工に関与するため、切粉の目詰まりや溶着 が防止される。 In the above structure, a concavo-convex pattern is formed by the inclined grooves and the four-sided pyramidal protrusions, and a large number of chip pockets are formed in the polishing surface. Further, since only the abrasive grains near the apexes of the four-sided pyramidal protrusions are involved in the processing, clogging of chips and welding are prevented.

【0010】 また、第2の手段では、各傾斜溝の傾斜角度を互いに異ならせると、その間で 形成される4角錐の頂点の位置がずれるため、その砥石で加工を行った場合、各 々の4角錐突起がそれぞれ細かいピッチで加工面に喰い込むことになり、精度の よい加工面をえることができる。Further, in the second means, when the inclination angles of the inclined grooves are made different from each other, the positions of the vertices of the quadrangular pyramids formed between them are displaced, and therefore, when the grindstone is used for machining, the respective points are different. The quadrangular pyramid protrusions bite into the machined surface at a fine pitch, respectively, and a machined surface with high accuracy can be obtained.

【0011】[0011]

【実施例】【Example】

図1乃至図4は実施例の電着砥石を示している。 図において、1は円板状に形成した台金であり、その台金1の外周の砥面2に 、その両側面からそれぞれ一定のピッチで円周方向に傾斜する多数の傾斜溝3、 4が設けられ、その交叉する各傾斜溝3、4の間に、砥面2に一様に分布する4 角錐状突起5が形成されている。 1 to 4 show an electrodeposition grindstone of the embodiment. In the figure, reference numeral 1 denotes a disc-shaped base metal, and a large number of inclined grooves 3 and 4 inclined in the circumferential direction from both side surfaces of the base metal 1 on the outer peripheral polishing surface 2 at a constant pitch. Are provided, and the four-sided pyramidal protrusions 5 uniformly distributed on the grinding surface 2 are formed between the intersecting inclined grooves 3 and 4.

【0012】 上記傾斜溝3、4は、砥面2の全体にわたって均一に形成され、その各傾斜溝 3、4と4角錐状突起5により砥面2に連続した凹凸パターンが形成されている 。また、図2に示すように、各傾斜溝3、4の回転方向に対する傾斜角度α、β は、45°を中心に前後10°の角度範囲で互いに異なるように(α≠β)設定 されており、これにより各傾斜溝3、4の間で形成される各4角錐状突起5の頂 点の位置は、砥石の円周方向(すなわち砥石の回転方向)に対してそれぞれわず かな量ずれて配列されている。The inclined grooves 3 and 4 are formed uniformly over the entire polishing surface 2, and the inclined grooves 3 and 4 and the four-sided pyramidal protrusion 5 form a concavo-convex pattern continuous to the polishing surface 2. Further, as shown in FIG. 2, the inclination angles α and β of the respective inclined grooves 3 and 4 with respect to the rotation direction are set so as to be different (α ≠ β) within an angular range of 10 ° in front and back around 45 °. As a result, the positions of the apexes of the four-sided pyramidal protrusions 5 formed between the inclined grooves 3 and 4 are slightly displaced with respect to the circumferential direction of the grindstone (that is, the rotating direction of the grindstone). Are arranged.

【0013】 また、上記各4角錐状突起5の表面には、図4に示すように、ダイヤモンドま たは立方晶窒化ホウ素等の多数の超砥粒6がニッケル電着によって固着されてい る。この超砥粒6は、4角錐状突起5よりも小さな粒径のもので形成されており 、砥面2全体に単層で一様に分布して研削作業面を形成している。Further, as shown in FIG. 4, a large number of superabrasive grains 6 such as diamond or cubic boron nitride are fixed to the surface of each of the four-sided pyramidal protrusions 5 by nickel electrodeposition. The superabrasive grains 6 are formed with a grain size smaller than that of the quadrangular pyramidal protrusions 5, and are uniformly distributed in a single layer over the entire polishing surface 2 to form a grinding work surface.

【0014】 上記のような構造で成る実施例の電着砥石においては、図4に示すように、各 傾斜溝3、4と4角錐状突起5によって、砥面2全体に一様にチップポケットと なる多数の間隙7が形成されるため、その間隙7を通って切粉が排出され、目詰 まりが防止される。In the electrodeposition grindstone of the embodiment having the above-mentioned structure, as shown in FIG. 4, the inclined grooves 3, 4 and the quadrangular pyramid-shaped projections 5 make the chip pocket uniformly over the entire grinding surface 2. Since a large number of gaps 7 are formed, the chips are discharged through the gaps 7 and clogging is prevented.

【0015】 また、各4角錐状突起5の頂点部分の砥粒6だけが加工に関与するために、砥 面2に対する切粉の目詰まりや溶着が生じにくい。Further, since only the abrasive grains 6 at the apex of each four-sided pyramidal protrusion 5 are involved in the processing, clogging and welding of cutting chips to the polishing surface 2 are less likely to occur.

【0016】 さらに、砥石の回転方向に対して各4角錐状突起5の頂点位置がわずかずつず れ、各4角錐状突起5の回転軌跡がそれぞれ異なるため、加工面は細かいピッチ の突起5表面で研削されることになり、凹凸が少なく精度の高い仕上面を得るこ とができる。これに対して、各4角錐状突起5が全て同一の回転軌跡上にあると 、各突起5によって加工面が何回もえぐられるため、深い筋がつき、仕上面精度 が悪くなる不具合がある。Furthermore, since the vertex positions of the four-sided pyramidal protrusions 5 are slightly shifted with respect to the rotation direction of the grindstone, and the rotation trajectories of the respective four-sided pyramidal protrusions 5 are different from each other, the processing surface is the surface of the protrusions 5 with a fine pitch. Therefore, it is possible to obtain a highly accurate finished surface with less unevenness. On the other hand, if all the four-sided pyramidal protrusions 5 are on the same rotation locus, the machining surface is scooped by the protrusions 5 many times, resulting in deep streaks and poor finishing surface accuracy. .

【0017】 また、互いに交叉する傾斜溝3、4により4角錐状突起5を形成する構造では 、各傾斜溝3、4の傾斜角度α、βやピッチを変化させることによって、加工に 作用する砥粒数を自由に変化させることができる。このため、加工する被削材料 の性質に応じて、切粉排出が最適となる作用砥粒数を設定することが可能となり 、高い能率で安定した加工を行うことができる。Further, in the structure in which the quadrangular pyramidal protrusions 5 are formed by the inclined grooves 3 and 4 intersecting with each other, the abrasive angles which act on the machining are changed by changing the inclination angles α and β and the pitch of the inclined grooves 3 and 4. The number of grains can be changed freely. For this reason, it is possible to set the number of working abrasive grains that optimizes the discharge of chips according to the property of the work material to be processed, and it is possible to perform stable processing with high efficiency.

【0018】 なお、上記の例では、砥面2をストレートな円筒形状としたが、砥面を半径方 向に凸形又は凹形の円弧状とした異形の砥石や、台金を棒状に形成した砥石に対 しても、この考案を同様に適用することができる。In the above example, the grinding surface 2 has a straight cylindrical shape, but the grinding surface is formed in the shape of a bar with a deformed grindstone in which the grinding surface has a convex or concave arc shape in the radial direction. The present invention can be similarly applied to a grindstone.

【0019】[0019]

【実施例】【Example】

円板状の台金1(外径150mmΦ、幅10mm、材質S25C)の外周面に、そ の両側からピッチ2mmで円周方向に傾斜する傾斜溝3、4を形成し、その各傾斜 溝3、4の間に、底辺が0.8mmの4角錐状突起5を形成した。また、各傾斜溝 3、4の傾斜角度α、βは、それぞれα=41°、β=49°に設定した。 On the outer peripheral surface of a disk-shaped base metal 1 (outer diameter 150 mmΦ, width 10 mm, material S25C), inclined grooves 3 and 4 inclined in the circumferential direction with a pitch of 2 mm from both sides are formed, and each inclined groove 3 4, the pyramidal protrusions 5 having a base of 0.8 mm were formed. The inclination angles α and β of the inclined grooves 3 and 4 were set to α = 41 ° and β = 49 °, respectively.

【0020】 上記のように形成した台金1を、めっき前処理として電解脱脂及び塩酸処理を 行った後、図5に示すようなダイヤモンド砥粒6’を含んだ電解ニッケルメッキ 槽10に入れ、ニッケル電着を行った。この電着作業は、台金1を回転させなが らポンプ11によりダイヤモンド砥粒6’を撹拌し、台金1に砥粒を沈降させな がら、台金1の外周面に砥粒を固着させた。この場合、ダイヤモンド砥粒6’は メッシュ120の粒径のものを使用し、めっき厚みは砥粒径の60%前後に設定 した。なお、図5において12はニッケル板、13はヒータである。The base metal 1 formed as described above is subjected to electrolytic degreasing and hydrochloric acid treatment as a pretreatment for plating, and then placed in an electrolytic nickel plating tank 10 containing diamond abrasive grains 6 ′ as shown in FIG. Nickel electrodeposition was performed. In this electrodeposition work, while the base metal 1 is rotated, the diamond abrasive grains 6 ′ are stirred by the pump 11 and the abrasive grains are allowed to settle on the base metal 1, while the abrasive grains are fixed on the outer peripheral surface of the base metal 1. Let In this case, diamond abrasive grains 6'having a grain size of mesh 120 were used, and the plating thickness was set to about 60% of the abrasive grain size. In FIG. 5, 12 is a nickel plate and 13 is a heater.

【0021】 この様に得られた電着砥石と、砥面を均一な円筒面とした従来の砥石とを用い て超硬合金を平面研削により、砥石周速1600m/min 、工作物速度15m/ min 、切り込み量0.02mm/pass、研削液JIS W2種2%の条件で工作物 を4000mm3 /mm研削した結果、従来の砥石では、法線方向の研削抵抗が62 N/mm、接線方向の研削抵抗が22N/mmであり、また砥面に目詰まりを生じた のに対して、上記の電着砥石では法線方向の研削抵抗が43N/mm、接線方向の 研削抵抗が16N/mmと従来の電着砥石にくらべて低くまた砥面に目詰まりが見 られなかった。Using the electrodeposition grindstone thus obtained and a conventional grindstone having a uniform cylindrical surface as a grinding surface, a cemented carbide was surface-ground to obtain a grinding wheel peripheral speed of 1600 m / min and a work speed of 15 m / min. min, depth of cut 0.02 mm / pass, grinding fluid JIS W2 class 2%, the workpiece was ground at 4000 mm 3 / mm. As a result, the conventional grinding wheel had a grinding resistance of 62 N / mm in the normal direction and tangential direction. Grinding resistance was 22 N / mm, and the grinding surface was clogged. On the other hand, with the above electrodeposition grindstone, the grinding resistance in the normal direction was 43 N / mm and the grinding resistance in the tangential direction was 16 N / mm. As compared with the conventional electroplated whetstone, it was lower and there was no clogging on the grinding surface.

【0022】 また、従来砥石では溶着によってほとんど加工出来なかった合成樹脂材を、上 記の電着砥石を用いて研削加工を行った場合、砥面に溶着が少なく、加工継続が 可能であった。Further, when a synthetic resin material, which could hardly be processed by welding with a conventional grindstone, was ground by using the above-mentioned electrodeposition grindstone, there was little welding on the grinding surface and it was possible to continue processing. .

【0023】[0023]

【考案の効果】[Effect of device]

以上のように、この考案においては、砥面に多数の傾斜溝と4角錐状突起によ って連続した凹凸パターンを形成し、その4角錐状突起の表面に小さい超砥粒を 電着させたので、砥面全体に切粉が排出する多数の間隙が形成されると共に、4 角錐状突起の頂点部分の砥粒のみが加工に関与することになり、切粉の目詰まり や溶着を確実に防止できる効果がある。 As described above, in the present invention, a continuous uneven pattern is formed on the polishing surface by a large number of inclined grooves and quadrangular pyramid protrusions, and small superabrasive grains are electrodeposited on the surface of the quadrangular pyramid protrusions. As a result, a large number of gaps from which chips are discharged are formed on the entire grinding surface, and only the abrasive grains at the apex of the four-sided pyramidal protrusions are involved in the processing, which ensures clogging and welding of chips. There is an effect that can be prevented.

【0024】 また、交叉する傾斜溝によって4角錐状突起を形成する構造では、傾斜溝の角 度やピッチを変えることにより加工に作用する砥粒数を変化させることができる ため、被加工材料に応じた最適な砥面を形成することができ、高精度で高能率な 研削加工を行うことができる。Further, in the structure in which the quadrangular pyramid-shaped protrusions are formed by the intersecting inclined grooves, the number of abrasive grains acting on the processing can be changed by changing the angle or pitch of the inclined grooves. The optimum grinding surface can be formed according to the conditions, and highly accurate and efficient grinding can be performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】樹脂の電着砥石を示す斜視図FIG. 1 is a perspective view showing a resin electrodeposition grindstone.

【図2】同上の砥面を拡大して示す正面図FIG. 2 is a front view showing an enlarged grinding surface of the same.

【図3】砥面の斜視図FIG. 3 is a perspective view of a polishing surface

【図4】砥面の断面図FIG. 4 is a sectional view of a grinding surface

【図5】電解ニッケルめっき槽を示す模式図FIG. 5 is a schematic diagram showing an electrolytic nickel plating tank.

【図6】実施例を示す斜視図FIG. 6 is a perspective view showing an embodiment.

【符号の説明】[Explanation of symbols]

1 台金 3、4 傾斜溝 5 4角錐状突起 6 超砥粒 1 base metal 3, 4 inclined groove 5 4 pyramidal protrusion 6 super abrasive grain

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 砥石台金の砥面に、その砥面の両側から
一定のピッチで傾斜する多数の傾斜溝をそれぞれ互いに
交叉するように設け、その各傾斜溝の間に、砥面に一様
に分布する4角錘状突起を形成し、この4角錐状突起の
表面に、その突起より小さな粒径の超砥粒を電着作用に
よって固定した電着砥石。
1. A grinding surface of a whetstone base is provided with a large number of inclined grooves that are inclined at a constant pitch from both sides of the grinding surface so as to intersect with each other. An electrodeposition grindstone in which four-sided pyramidal protrusions having a uniform distribution are formed, and superabrasive grains having a smaller particle size than the protrusions are fixed to the surface of the four-sided pyramidal protrusions by an electrodeposition action.
【請求項2】 上記各傾斜溝の傾斜角度を互いに異なら
せた請求項1に記載の電着砥石。
2. The electrodeposition grindstone according to claim 1, wherein the inclination angles of the inclined grooves are different from each other.
JP1992030154U 1992-05-08 1992-05-08 Electroplated whetstone Expired - Lifetime JPH0715725Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1992030154U JPH0715725Y2 (en) 1992-05-08 1992-05-08 Electroplated whetstone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1992030154U JPH0715725Y2 (en) 1992-05-08 1992-05-08 Electroplated whetstone

Publications (2)

Publication Number Publication Date
JPH0624860U true JPH0624860U (en) 1994-04-05
JPH0715725Y2 JPH0715725Y2 (en) 1995-04-12

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP1992030154U Expired - Lifetime JPH0715725Y2 (en) 1992-05-08 1992-05-08 Electroplated whetstone

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07299751A (en) * 1994-04-25 1995-11-14 Osaka Diamond Ind Co Ltd Grinding wheel with superabrasive grain
JPH08229828A (en) * 1994-11-16 1996-09-10 Osaka Diamond Ind Co Ltd Super-abrasive grain tool, and manufacture thereof
JP2000317800A (en) * 1999-05-10 2000-11-21 Furukawa Electric Co Ltd:The Optical connector abrasive board and optical connector burnisher with it
WO2018211722A1 (en) * 2016-05-17 2018-11-22 住友重機械工業株式会社 Grindstone and grinder

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6253955U (en) * 1985-09-26 1987-04-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6253955U (en) * 1985-09-26 1987-04-03

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07299751A (en) * 1994-04-25 1995-11-14 Osaka Diamond Ind Co Ltd Grinding wheel with superabrasive grain
JPH08229828A (en) * 1994-11-16 1996-09-10 Osaka Diamond Ind Co Ltd Super-abrasive grain tool, and manufacture thereof
JP2000317800A (en) * 1999-05-10 2000-11-21 Furukawa Electric Co Ltd:The Optical connector abrasive board and optical connector burnisher with it
WO2018211722A1 (en) * 2016-05-17 2018-11-22 住友重機械工業株式会社 Grindstone and grinder
CN110769979A (en) * 2016-05-17 2020-02-07 住友重机械工业株式会社 Grinding wheel and grinding machine
JPWO2018211722A1 (en) * 2016-05-17 2020-05-14 住友重機械工業株式会社 Dressing method, dressing device, grindstone and grinder

Also Published As

Publication number Publication date
JPH0715725Y2 (en) 1995-04-12

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