JPH06208704A - Washing method of magnetic material - Google Patents
Washing method of magnetic materialInfo
- Publication number
- JPH06208704A JPH06208704A JP220293A JP220293A JPH06208704A JP H06208704 A JPH06208704 A JP H06208704A JP 220293 A JP220293 A JP 220293A JP 220293 A JP220293 A JP 220293A JP H06208704 A JPH06208704 A JP H06208704A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- substrate
- cleaning
- magnetic material
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、磁性体をその一部に
使用した基板、磁性基板、非磁性基板上に磁性体を使用
したもの等の、全体または一部が磁性を有する材料（磁
性材）を洗浄する方法に関し、例えば、磁気ヘッドの製
造工程に利用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material which is wholly or partially magnetic, such as a substrate using a magnetic material as a part thereof, a magnetic substrate or a non-magnetic substrate using a magnetic material. The method of cleaning a material is used, for example, in a manufacturing process of a magnetic head.
【０００２】[0002]
【従来の技術】以下、特に磁気ヘッドの製造工程を中心
に述べる。2. Description of the Related Art A magnetic head manufacturing process will be mainly described below.
【０００３】磁気ヘッド製造工程中の洗浄工程は次のよ
うな場合がある。基板に切削溝を入れる場合、薄膜
成膜工程前の基板洗浄、摺動面の研削時または研削後
の洗浄、出来上がったヘッドを単体に分割するとき、
ヘッド分割時の切削時、ヘッド分割後の洗浄、等で
ある。なおここではフォトリソ工程時の洗浄は除いてい
る。これらの洗浄は、基板（磁性材）の切削またはチッ
ピングによる微粒子が出来やすい工程時に行われる。従
来の洗浄方法は、洗剤を用い、軟らかいスポンジで、純
水流水中でこすり洗いをすることにより物理的に洗浄す
るというものであった。また、洗浄中の温度は純水をそ
のまま使用するため、室温もしくは２０〜２５℃程度で
あった。The cleaning process in the magnetic head manufacturing process may be as follows. When making cutting grooves on the substrate, cleaning the substrate before the thin film deposition process, cleaning the sliding surface or after grinding, when dividing the completed head into single units,
For example, during cutting when the head is divided, cleaning after the head is divided, and the like. Note that the cleaning during the photolithography process is omitted here. These cleanings are performed during a process in which fine particles are easily formed by cutting or chipping the substrate (magnetic material). The conventional washing method has been to physically wash by using a soft sponge with a detergent and scrubbing in running pure water. The temperature during cleaning was room temperature or about 20 to 25 ° C. because pure water was used as it was.
【０００４】[0004]
【発明が解決しようとする課題】ところで、磁性材を切
削研磨後、または切削研磨途中では、切削や研磨によっ
て生じた磁性材の微粉末（磁性粉）が、磁性材の表面に
付着する。また、薄膜成膜前の洗浄時には基板納入時の
磁性粉または搬送のチッピングによる磁性粉が常に付着
している。一般に、強磁性体は自発磁化を持つため、強
磁性体どうしが接触すると磁気的な付着が起きる。強磁
性体のように保持力が大きい場合は特に顕著にこの現象
が起きるが、磁気ヘッドに使用する軟磁性体つまり保磁
力の極めて小さい磁性体についても微粉末になると磁気
的付着が起きる。すなわち上記したように、切削によっ
て生じた磁性粉や、搬送のチッピングによる磁性粉が磁
性材表面に付着する。この磁性粉は、洗浄時の流水の水
圧、こすり洗いにより除去されることもあるが、たいて
いの場合、磁性材の表面上を移動するだけで、磁性材の
端面に集中して付着してしまう場合が多い。このため、
薄膜成膜時にダストと同様な不具合が発生し歩留りを低
下させる。また磁性粉が出す磁界が微細部分において特
性劣化の要因となることがあった。またヘッド部分割時
の磁性粉がテープ摺動面に傷を付ける原因になることも
あった。By the way, after or during cutting and polishing of the magnetic material, fine powder (magnetic powder) of the magnetic material generated by cutting or polishing adheres to the surface of the magnetic material. Further, during cleaning before thin film formation, magnetic powder at the time of substrate delivery or magnetic powder due to chipping during transportation is always attached. In general, a ferromagnetic substance has spontaneous magnetization, so that magnetic attachment occurs when the ferromagnetic substances come into contact with each other. This phenomenon remarkably occurs when the coercive force is large like a ferromagnetic material, but magnetic adhesion occurs even when a soft magnetic material used for a magnetic head, that is, a magnetic material having an extremely small coercive force becomes a fine powder. That is, as described above, the magnetic powder generated by cutting and the magnetic powder caused by chipping during transportation adhere to the surface of the magnetic material. This magnetic powder may be removed by running water pressure or scrubbing at the time of cleaning, but in most cases, it only adheres to the end surface of the magnetic material simply by moving on the surface of the magnetic material. In many cases. For this reason,
When a thin film is formed, the same problem as dust occurs and the yield is reduced. In addition, the magnetic field generated by the magnetic powder may cause deterioration of the characteristics in the fine portion. In addition, the magnetic powder when dividing the head portion may cause scratches on the tape sliding surface.
【０００５】この発明はこのような問題点に鑑みて成さ
れたものであって、切削等加工等により生じた磁性粉の
除去効率を向上できる磁性材の洗浄方法を提供すること
にある。The present invention has been made in view of the above problems, and it is an object of the present invention to provide a method of cleaning a magnetic material which can improve the efficiency of removing magnetic powder generated by machining such as cutting.
【０００６】[0006]
【課題を解決するための手段】この発明の洗浄方法は、
全体または一部が磁性を有する磁性材を、切削等の加工
の前または加工中あるいは加工の後に洗浄するとき、前
記磁性材を加熱しながら洗浄したり、磁性材を加熱した
洗浄液により洗浄するものである。The cleaning method of the present invention comprises:
When cleaning a magnetic material which is wholly or partially magnetic, before, during or after machining such as cutting, cleaning while heating the magnetic material or cleaning the magnetic material with a cleaning liquid that has been heated Is.
【０００７】なお磁性材の加熱温度，流体の加熱温度
は、磁性材のキュリー温度Θｃの７０％程度の温度に設
定することが望ましい。It is desirable that the heating temperature of the magnetic material and the heating temperature of the fluid be set to about 70% of the Curie temperature Θc of the magnetic material.
【０００８】[0008]
【作用】磁性体（磁性材）においてはキュリー温度Θｃ
での自発磁化が理論上０となり、この温度で常磁性体に
移行し、磁気的付着が起こらない。また、キュリー温度
Θｃ以下であっても、キュリー温度Θｃ近く（７０％程
度）まで温度を上げると自発磁化が小さくなり磁気的結
合力が弱くなる。したがって、磁性材を加熱したり加熱
した洗浄液を用いて洗浄した場合、磁性体とこの磁性体
に付着した磁性粉との磁気的結合力が弱くなり、磁性粉
は除去され易くなって、従来と同様の、ジェット水流や
こすり洗い等によっても磁性粉を簡単に除去できるよう
になる。[Function] Curie temperature Θc for magnetic material (magnetic material)
In theory, the spontaneous magnetization becomes zero, and at this temperature, the spontaneous magnetization shifts to a paramagnetic substance, and magnetic adhesion does not occur. Further, even if the temperature is not higher than the Curie temperature Θc, if the temperature is raised to near the Curie temperature Θc (about 70%), the spontaneous magnetization becomes small and the magnetic coupling force becomes weak. Therefore, when the magnetic material is heated or washed with a heated cleaning liquid, the magnetic coupling force between the magnetic substance and the magnetic powder attached to the magnetic substance is weakened, and the magnetic powder is easily removed. Similarly, the magnetic powder can be easily removed by jet water flow or scrubbing.
【０００９】[0009]
【実施例】以下、図面を参照して実施例を述べる。EXAMPLES Examples will be described below with reference to the drawings.
【００１０】図１は強磁性体の自発磁化Ｉが温度Ｔに対
してどう変化するかを示す図である。横軸の左端は絶対
零度状態を示し、右端はキュリー温度Θｃ状態を示す。
縦軸上端は絶対零度での自発磁化の値（すなわち自発磁
化はＩ0 となる）を示し、下端は自発磁化零であること
を示す。自発磁化は普通、絶対零度で最大で、温度が上
がると各原子の磁気モーメントの方向が熱運動によって
無秩序に近づくため減少し、キュリー温度で急激に消失
する。例えば図から分かるように、キュリー点の８０％
までの温度で自発磁化は約７０％まで減少している。一
般に磁気ヘッドでは基板として鉄の酸化物からなるフェ
ライト基板を用いる。これらのキュリー温度は例えば、
Ni−Znフェライトで４１０Ｋ（ほぼ１４０℃）程度、Mn
−Znフェライトで４６０Ｋ（ほぼ１９０℃）程度であ
る。したがって、これらの温度に近い温度に加熱しなが
ら洗浄を行うと、自発磁化が減少するため、磁性粉との
磁気的結合力が落ち、有効な洗浄を行うことができる。
洗浄温度を例えば、８０℃（３５３Ｋ）で行うとする
と、Ni−Znフェライトでは自発磁化は５０％程度まで減
少する。同様にMn−Znフェライトでは約７０％程度まで
減少する。さらに、磁気的な付着の場合、その結合力は
両方の材料（基板と微粉末）の磁化の積に比例するため
同じ材質であれば上記Ni−Znフェライトで約３０％(0.5
×0.5)、Mn−Znフェライトで約５０％(0.7×0.7)に結合
力は減少していることになる。したがって例えば、高圧
で洗浄水を噴きつける高圧ジェット式の洗浄装置の場合
には、洗浄で吹きつける高圧ジェット水圧を各々３０
％、５０％程度に落とすことと同等である。実際にはキ
ュリー温度の７０％程度の温度で自発磁化は８０％程度
になるが、結合力で６０％程度になるため洗浄に対する
効果は十分と認められた。FIG. 1 is a diagram showing how the spontaneous magnetization I of a ferromagnetic material changes with temperature T. The left end of the horizontal axis shows the absolute zero state, and the right end shows the Curie temperature Θc state.
The upper end of the vertical axis indicates the value of spontaneous magnetization at absolute zero (that is, the spontaneous magnetization is I 0 ), and the lower end indicates that the spontaneous magnetization is zero. Spontaneous magnetization is usually maximum at absolute zero, and when the temperature rises, the direction of the magnetic moment of each atom approaches disorderly due to thermal motion, and it decreases rapidly at the Curie temperature. For example, as you can see from the figure, 80% of the Curie point
The spontaneous magnetization decreases to about 70%. Generally, in a magnetic head, a ferrite substrate made of iron oxide is used as the substrate. These Curie temperatures are, for example,
About 410K (about 140 ℃) with Ni-Zn ferrite, Mn
-Zn ferrite is about 460K (about 190 ° C). Therefore, if the cleaning is performed while heating to a temperature close to these temperatures, the spontaneous magnetization is reduced, so that the magnetic coupling force with the magnetic powder is reduced and effective cleaning can be performed.
If the cleaning temperature is, for example, 80 ° C. (353 K), the spontaneous magnetization of Ni—Zn ferrite is reduced to about 50%. Similarly, with Mn-Zn ferrite, it decreases to about 70%. Furthermore, in the case of magnetic adhesion, the bonding force is proportional to the product of the magnetizations of both materials (substrate and fine powder), so if the same material is used, the Ni-Zn ferrite will be about 30% (0.5%).
X0.5), and the binding strength of Mn-Zn ferrite is reduced to about 50% (0.7 x 0.7). Therefore, for example, in the case of a high-pressure jet type cleaning device that sprays cleaning water at high pressure, the high-pressure jet water pressure sprayed for cleaning is 30
%, Which is equivalent to dropping to about 50%. Actually, the spontaneous magnetization was about 80% at a temperature of about 70% of the Curie temperature, but the binding strength was about 60%, so that the effect on cleaning was recognized to be sufficient.
【００１１】また洗浄するときの流体は高圧純水に限っ
たものではない。例えば磁気ヘッド摺動面の研削にはオ
イルを用いる場合もあるが、この場合は液温を１００℃
以上に上げることも可能になり、よりキュリー温度に近
い加熱を行うことができる。The fluid used for cleaning is not limited to high pressure pure water. For example, oil may be used to grind the sliding surface of the magnetic head. In this case, the liquid temperature is 100 ° C.
It is also possible to raise the temperature to above, and it is possible to perform heating closer to the Curie temperature.
【００１２】まず磁性微粉末を洗い流す意味でオイルに
よる洗浄を行い、その後もっと低い温度で脱脂を行って
もよい。The magnetic fine powder may be first washed with oil, and then degreased at a lower temperature.
【００１３】図２はこの洗浄方法を実施する装置の構成
例を示す図である。この実施例では溝付け加工後の基板
の溝部を洗浄する例を示している。FIG. 2 is a diagram showing a structural example of an apparatus for carrying out this cleaning method. In this embodiment, an example of cleaning the groove portion of the substrate after the groove forming process is shown.
【００１４】ヒータ付プレート４は内部にヒータを内蔵
し、上面が磁性体基板１のキュリー温度近い温度に加熱
される。磁性体基板１はこのヒータ付プレート４の上に
支持される。洗浄液５の液面Ａはヒータ付プレート４の
上方部に維持され、洗浄液５はヒータ付プレート４から
の熱により加熱されている。この洗浄液５がノズル２へ
供給され、ノズル２から噴出されて洗浄液槽へと戻る。
このように洗浄液５は絶えず循環されている。なおブラ
シ３は磁性体基板１の溝部に沿うように移動される。磁
性体基板１の洗浄時には、ヒータ付プレート４から伝達
される熱量およびノズル２から噴出される洗浄液５の熱
量により磁性体基板１およびその表面に付着している磁
性体の微粉末が加熱され、それにより磁性体基板１と微
粉末との磁気的結合力が小さくなり、ノズル２から噴出
される洗浄水流とブラシ３によるこすり洗いによって前
記微粉末が洗い流される。The heater-equipped plate 4 has a heater built therein, and the upper surface is heated to a temperature close to the Curie temperature of the magnetic substrate 1. The magnetic substrate 1 is supported on the heater-equipped plate 4. The liquid surface A of the cleaning liquid 5 is maintained above the heater plate 4, and the cleaning liquid 5 is heated by the heat from the heater plate 4. The cleaning liquid 5 is supplied to the nozzle 2, ejected from the nozzle 2 and returned to the cleaning liquid tank.
In this way, the cleaning liquid 5 is constantly circulated. The brush 3 is moved along the groove of the magnetic substrate 1. At the time of cleaning the magnetic substrate 1, the amount of heat transferred from the heater-equipped plate 4 and the amount of heat of the cleaning liquid 5 ejected from the nozzle 2 heat the magnetic substrate 1 and the fine powder of the magnetic substance adhering to the surface thereof As a result, the magnetic coupling force between the magnetic substance substrate 1 and the fine powder is reduced, and the fine powder is washed away by the washing water flow ejected from the nozzle 2 and the scrubbing with the brush 3.
【００１５】図３は他の洗浄装置の構成例であり、基板
を洗浄している例を示している。FIG. 3 shows another example of the structure of the cleaning apparatus, in which the substrate is cleaned.
【００１６】この例も上記の実施例と同様に、ヒータを
内蔵するヒータ付プレート１４に磁性体基板１１を支持
する。図示しない洗浄槽には洗浄液１５が、液面Ａまで
溜められている。磁性体基板１１および洗浄液１５はヒ
ータ付プレート１４からの熱伝達により加熱される。洗
浄液１５は磁性体基板１１の上方に突出されたノズル１
２に送られここから噴出される。磁性体基板１１の上方
には洗浄部材１３が設けられている。洗浄部材１３は磁
性体基板１１との接触面がスポンジ等の磁性体基板１１
に対して十分に硬度の低い材料で構成され、この接触面
が磁性体基板１１の表面に沿って回転運動することによ
り、磁性体表面をこすり洗いする。洗浄時には、磁性体
基板１１およびその表面の磁性体の微粉末がヒータ付プ
レート１４およびノズル１２から噴出される洗浄液１５
により加熱され、両者の磁気的結合力が弱くなったとこ
ろで、洗浄部材１３によりこすり洗いされるとともに、
ノズル１２から噴出される洗浄水の水流により磁性体の
微粉末が洗い流される。In this example as well, the magnetic substrate 11 is supported by the heater-equipped plate 14 having a built-in heater, as in the above-described embodiments. The cleaning liquid 15 is stored up to the liquid level A in a cleaning tank (not shown). The magnetic substrate 11 and the cleaning liquid 15 are heated by the heat transfer from the heater plate 14. The cleaning liquid 15 is the nozzle 1 that is projected above the magnetic substrate 11.
It is sent to 2 and is ejected from here. A cleaning member 13 is provided above the magnetic substrate 11. The contact surface of the cleaning member 13 with the magnetic substrate 11 is a magnetic substrate 11 such as sponge.
The contact surface is made to rotate along the surface of the magnetic body substrate 11 to scrub the surface of the magnetic body. At the time of cleaning, the cleaning liquid 15 in which the magnetic substance substrate 11 and the fine powder of the magnetic substance on the surface thereof are jetted from the heater plate 14 and the nozzle 12
When the magnetic coupling force between the two is weakened, the scrubbing member 13 scrubs and
The fine powder of the magnetic material is washed away by the water flow of the washing water ejected from the nozzle 12.
【００１７】なお上記の実施例では磁性体基板を加熱す
る方法としてヒータを備えたヒータ付プレートを用いて
いるが加熱手段はこれに限られるものではない。In the above embodiment, the plate with the heater provided with the heater is used as the method for heating the magnetic substrate, but the heating means is not limited to this.
【００１８】図４に示した洗浄装置は、磁気ヘッドを分
割する場合の洗浄装置の構成例である。The cleaning device shown in FIG. 4 is an example of the structure of the cleaning device when the magnetic head is divided.
【００１９】磁気ヘッド２１は、ダイシングブレード２
２により単体の磁気ヘッドに分割される。磁気ヘッド２
１を載置するホルダ２４は、ヒータを備え、磁気ヘッド
２１をキュリー温度近い温度に加熱する。ダイシングブ
レード２２の切削位置には、ノズル２３から純水または
洗浄液が噴出される。なおこの場合、ノズル２３から噴
出する純水または洗浄液は、常温（２０〜２５℃程度）
でも良いし、若干加熱した状態にしてもよい。しかし、
ダイシング中は磁気ヘッド２１が熱を持つからその熱を
冷却できる程度の温度にする必要がある。この装置にお
いては、ダイシング中、磁気ヘッド２１がホルダ２４か
ら伝達される熱量により加熱されるため、ダイシングの
削り屑（磁性粉）との磁気的結合力が弱く、ノズル２３
から噴出される純水または洗浄液により磁性粉が洗い流
される。したがって、後の洗浄工程が無用または簡単に
なる。The magnetic head 21 comprises the dicing blade 2
It is divided by 2 into a single magnetic head. Magnetic head 2
The holder 24 on which 1 is mounted includes a heater to heat the magnetic head 21 to a temperature close to the Curie temperature. Pure water or cleaning liquid is ejected from the nozzle 23 to the cutting position of the dicing blade 22. In this case, the pure water or the cleaning liquid ejected from the nozzle 23 is at room temperature (about 20 to 25 ° C).
However, it may be a slightly heated state. But,
Since the magnetic head 21 has heat during dicing, it is necessary to set the temperature to such a degree that the heat can be cooled. In this device, since the magnetic head 21 is heated by the amount of heat transferred from the holder 24 during dicing, the magnetic coupling force with the shavings (magnetic powder) of the dicing is weak, and the nozzle 23
The magnetic powder is washed away by pure water or a cleaning liquid ejected from the magnetic powder. Therefore, the subsequent cleaning process is unnecessary or simple.
【００２０】以上の実施例で用いられる流体は純水でも
オイル系洗浄液でも良いことは前記キュリー点の観点か
ら明白である。ただし基板上の磁性体が金属系磁性体、
例えばパーマロイセンダストである場合、キュリー点が
４５０〜５５０℃という高温になるため、この昇温は実
質上困難であり、非現実的なものになってしまう。しか
し、フェライト等のキュリー温度が２００℃以下の比較
的低いものについては大変有効である。It is clear from the viewpoint of the Curie point that the fluid used in the above embodiments may be pure water or an oil-based cleaning liquid. However, the magnetic substance on the substrate is a metallic magnetic substance,
For example, in the case of permalloysen dust, the Curie point is as high as 450 to 550 ° C., and this temperature rise is substantially difficult and unrealistic. However, it is very effective for ferrites and the like having a relatively low Curie temperature of 200 ° C. or lower.
【００２１】[0021]
【発明の効果】この発明においては、洗浄時に磁性材の
温度を上げることによって磁性材と、この磁性材に付着
した磁性粉との磁気的結合力を弱めることができ、磁性
粉が除去され易くなる。その結果、磁性材を用いた製品
（例えば磁気ヘッド等）の歩留まりが向上する。According to the present invention, the magnetic coupling force between the magnetic material and the magnetic powder adhering to the magnetic material can be weakened by raising the temperature of the magnetic material during cleaning, and the magnetic powder can be easily removed. Become. As a result, the yield of products (for example, magnetic heads) using the magnetic material is improved.
【図１】強磁性体の加熱温度と、自発磁化との関係を示
す図FIG. 1 is a diagram showing a relationship between a heating temperature of a ferromagnetic material and spontaneous magnetization.
【図２】この発明の洗浄方法を実施する洗浄装置の構成
例を示す図FIG. 2 is a diagram showing a configuration example of a cleaning device for carrying out the cleaning method of the present invention.
【図３】他の洗浄装置の構成例を示す図FIG. 3 is a diagram showing a configuration example of another cleaning device.
【図４】他の洗浄装置の構成例を示す図FIG. 4 is a diagram showing a configuration example of another cleaning device.
１，１１ 磁性体基板 ２，１２，２３ ノズル ３，１４ ヒータ付プレート（磁性体基板の加熱手段） ５，１５ 洗浄液 ２１ 磁気ヘッド ２４ ホルダ（磁気ヘッドの加熱手段） 1, 11 Magnetic Substrate 2, 12, 23 Nozzle 3, 14 Heater Plate (Heating Unit for Magnetic Substrate) 5, 15 Cleaning Liquid 21 Magnetic Head 24 Holder (Heating Unit for Magnetic Head)
Claims (4)
切削等の加工の前または加工中あるいは加工の後に洗浄
するとき、前記磁性材を加熱しながら洗浄することを特
徴とする磁性材の洗浄方法。1. A magnetic material having magnetism in whole or in part,
A method for cleaning a magnetic material, which comprises cleaning the magnetic material while heating it before, during, or after machining such as cutting.
切削等の加工の前または加工中あるいは加工の後に洗浄
するとき、前記磁性材を加熱した流体により洗浄するこ
とを特徴とする磁性材の洗浄方法。2. A magnetic material having magnetism in whole or in part,
A method for cleaning a magnetic material, which comprises cleaning the magnetic material with a heated fluid when cleaning before, during, or after processing such as cutting.
切削等の加工の前または加工中あるいは加工の後に洗浄
するとき、前記磁性材を加熱しながら、加熱した流体に
より洗浄することを特徴とする磁性材の洗浄方法。3. A magnetic material having magnetism in whole or in part,
A method of cleaning a magnetic material, which comprises cleaning the magnetic material with a heated fluid while heating the magnetic material before, during or after machining such as cutting.
浄方法において、磁性材を加熱する加熱温度Ｔおよび／
または洗浄を行う流体の流体温度Ｔがほぼ、 Ｔ≧0.7 ・Θｃ （Θｃ：磁性材のキュリー温度） である磁性材の洗浄方法。4. The cleaning method according to any one of claims 1 to 3, wherein a heating temperature T for heating the magnetic material and / or
Alternatively, a method of cleaning a magnetic material in which the fluid temperature T of the fluid to be cleaned is approximately T ≧ 0.7 · Θc (Θc: Curie temperature of magnetic material).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP220293A JPH06208704A (en) | 1993-01-11 | 1993-01-11 | Washing method of magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP220293A JPH06208704A (en) | 1993-01-11 | 1993-01-11 | Washing method of magnetic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06208704A true JPH06208704A (en) | 1994-07-26 |
Family
ID=11522776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP220293A Pending JPH06208704A (en) | 1993-01-11 | 1993-01-11 | Washing method of magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06208704A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012134244A (en) * | 2010-12-20 | 2012-07-12 | Kobe Steel Ltd | Manufacturing method of dust core, and dust core obtained by the same |
-
1993
- 1993-01-11 JP JP220293A patent/JPH06208704A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012134244A (en) * | 2010-12-20 | 2012-07-12 | Kobe Steel Ltd | Manufacturing method of dust core, and dust core obtained by the same |
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