JPH06138648A - Substrate washing method and washing device - Google Patents
Substrate washing method and washing deviceInfo
- Publication number
- JPH06138648A JPH06138648A JP30830792A JP30830792A JPH06138648A JP H06138648 A JPH06138648 A JP H06138648A JP 30830792 A JP30830792 A JP 30830792A JP 30830792 A JP30830792 A JP 30830792A JP H06138648 A JPH06138648 A JP H06138648A
- Authority
- JP
- Japan
- Prior art keywords
- washing
- substrate
- cleaning
- washing liquid
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、基板などの対象物、特
に半導体素子等の製造に用いるフォトマスクの表面に付
着した異物を除去する洗浄方法及び洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning method and a cleaning apparatus for removing foreign matter adhering to the surface of an object such as a substrate, particularly a photomask used for manufacturing a semiconductor element or the like.
【０００２】[0002]
【従来技術】従来、ＶＬＳＩ等の固体素子における微細
パターンの形成は、レジストを塗布した基板上に配線パ
ターンを描画したフォトマスクを通過した光を結像させ
ることにより上記マスクパターンを転写している。しか
し、近年パターンの高密度化とともにパターンの微細化
が進んできたため、表面に付着した異物に対する許容範
囲も縮小してきている。すなわち、パターンが小さいた
めに、微細な異物でもパターン上に生じる異物の影を無
視できなくなるためである。2. Description of the Related Art Conventionally, in the formation of a fine pattern in a solid-state device such as VLSI, the mask pattern is transferred by focusing light passing through a photomask having a wiring pattern drawn on a resist-coated substrate. . However, in recent years, as the pattern density has increased and the pattern has become finer, the allowable range for foreign matter adhering to the surface has been reduced. That is, since the pattern is small, the shadow of the foreign matter generated on the pattern cannot be ignored even if the foreign matter is minute.
【０００３】それら表面異物を洗浄する手段として、洗
浄槽内に温めた洗浄液を満たし、フォトマスクを浸漬す
る方法や、洗浄液をフォトマスク上に供給する方法、あ
るいはさらに、ブラシなどの器具を用いてこすり落とす
などの方法を組み合わせて行っている。As means for cleaning the surface foreign matter, a method of immersing a photomask by filling a cleaning tank with a warm cleaning solution, a method of supplying the cleaning solution onto the photomask, or a tool such as a brush is used. It is done by combining methods such as scraping.
【０００４】[0004]
【発明が解決しようとする課題】上述のような洗浄方法
では、使用している間、洗浄液中に徐々に不純物が混入
し疲労していくので、常に新しい洗浄液を用いることが
望ましいが、全ての洗浄液を一回のみの使用とすると大
幅なコストの上昇をともなうため、一部の洗浄液は使い
捨てとし、大部分は繰り返し使用して一定のサイクルで
洗浄液の交換を行い管理している。そこで、洗浄液を循
環させる際、洗浄液と不純物を容易に分離し、洗浄液の
寿命を延ばす方法が求められている。In the above-mentioned cleaning method, it is desirable to always use a new cleaning liquid because impurities gradually mix into the cleaning liquid and fatigue during use. Since the use of the cleaning liquid only once causes a significant increase in cost, some cleaning liquids are disposable, and most of them are repeatedly used to manage the cleaning liquid by exchanging the cleaning liquid at a fixed cycle. Therefore, when circulating the cleaning liquid, a method for easily separating the cleaning liquid and impurities to extend the life of the cleaning liquid is required.
【０００５】[0005]
【課題を解決するための手段】本発明は、上述したよう
な課題を達成するためになされたものであり、基板に付
着した微細な異物を洗浄する方法において、洗浄液を加
熱し蒸気を発生させ、該蒸気を還流管により凝縮し、還
流管より落下する凝縮液を上記基板に滴下し、洗浄する
ことを特徴とする基板洗浄方法である。また、本発明の
洗浄装置は、基板を保持する保持機構と、前記基板の下
側にある洗浄液の液溜部と、上側に加熱され蒸気となっ
た該洗浄液を凝縮する還流管を有し、それらが一体とな
って構成されている洗浄装置である。なお、本発明はフ
ォトマスクに適用すると効果的であり、また、基板をス
ピンナー上に備えて洗浄を行うと異物や洗浄液の除去が
容易になり洗浄が迅速となる。更に、還流管上部にシリ
カゲル等の入った脱水部を置き、上部から混入する水分
を防ぐことが好ましい。The present invention has been made in order to achieve the above-mentioned object, and in a method for cleaning fine foreign matters adhering to a substrate, heating a cleaning liquid to generate steam. A method for cleaning a substrate is characterized in that the vapor is condensed by a reflux pipe, and a condensate that drops from the reflux pipe is dropped on the substrate for cleaning. Further, the cleaning apparatus of the present invention has a holding mechanism for holding the substrate, a liquid reservoir of the cleaning liquid on the lower side of the substrate, and a reflux pipe for condensing the cleaning liquid heated to the upper side into vapor. This is a cleaning device that is integrally configured. It should be noted that the present invention is effective when applied to a photomask, and if a substrate is provided on a spinner for cleaning, foreign matters and a cleaning liquid can be easily removed and cleaning can be performed quickly. Further, it is preferable to place a dehydrating section containing silica gel or the like on the upper part of the reflux tube to prevent water mixed in from the upper part.
【０００６】[0006]
【作用】本発明では、還流された洗浄液を基板上へ直接
滴下することにより、常に新しい洗浄液を繰り返し使用
でき、コストの上昇を避けることができる。In the present invention, by directly dropping the refluxed cleaning liquid onto the substrate, a new cleaning liquid can be repeatedly used, and the cost can be prevented from increasing.
【０００７】[0007]
【実施例】次に、本発明の洗浄方法と洗浄装置をフォト
マスクの洗浄を例にとり、図面を参照して説明する。図
１は、本発明における洗浄装置の側面を示す図である。
洗浄室４に入れた洗浄液の液溜部８は、加熱器９により
温められて蒸気７となり、還流管２で冷却水１により冷
却されて凝縮し、再び洗浄液となる。凝縮した洗浄液
は、スペーサー３によりフォトマスク支持用チャック６
で保持されたフォトマスク５全面に滴下される。スペー
サーは、凝縮した洗浄液がかたよらずにフォトマスク上
に滴下するために用いるものである。尚、ここではスペ
ーサーを用いて洗浄液をフォトマスク上に滴下する例を
示したが、洗浄液を基板中央付近に滴下し、フォトマス
クをスピンナーにより回転させることによって洗浄する
ことも可能である。洗浄装置の材質は、石英ガラスを用
いることがナトリウムイオンから汚染を防止する上で通
常のソーダガラスを用いるよりも望ましい。また、洗浄
液は混合液を用いると分留してしまうため好ましくない
ので、イソプロピルアルコール，メチルエチルケトン等
のマスク材料に影響を与えない低沸点の単一有機溶媒を
用いることが望ましい。尚、フォトマスクの装着，取り
出しは、例えば洗浄液の側面に取り出し口を設けて、ネ
ジで開閉する等任意の構造で行うことができる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the cleaning method and cleaning apparatus of the present invention will be described with reference to the drawings, taking cleaning of a photomask as an example. FIG. 1 is a diagram showing a side surface of a cleaning device according to the present invention.
The liquid reservoir 8 of the cleaning liquid contained in the cleaning chamber 4 is heated by the heater 9 to become the vapor 7, cooled by the cooling water 1 in the reflux pipe 2 and condensed to become the cleaning liquid again. The condensed cleaning liquid is supplied to the photomask supporting chuck 6 by the spacer 3.
It is dropped on the entire surface of the photomask 5 held by. The spacer is used for allowing the condensed cleaning liquid to drop on the photomask without being stiff. Although the example in which the cleaning liquid is dropped on the photomask by using the spacer is shown here, it is also possible to drop the cleaning liquid near the center of the substrate and rotate the photomask by a spinner for cleaning. It is preferable that quartz glass is used as the material for the cleaning device, as compared with the case where ordinary soda glass is used in order to prevent contamination from sodium ions. Further, since it is not preferable to use a mixed solution as a cleaning solution because it is fractionally distilled, it is desirable to use a single organic solvent having a low boiling point that does not affect the mask material such as isopropyl alcohol and methyl ethyl ketone. The photomask can be attached and removed by an arbitrary structure such as an opening provided on the side surface of the cleaning liquid and opening and closing with a screw.
【０００８】[0008]
【発明の効果】以上の説明から明らかなように、本発明
による洗浄方法を利用することにより、清浄な洗浄液を
連続的に繰り返し利用することが可能となるため、洗浄
コストの増大を避け、効果的に基板の洗浄を行うことが
できる。As is apparent from the above description, by using the cleaning method according to the present invention, it is possible to continuously and repeatedly use a clean cleaning liquid, so that an increase in cleaning cost can be avoided and an effect can be obtained. The substrate can be cleaned effectively.
【図１】本発明を用いた洗浄装置の側面図である。FIG. 1 is a side view of a cleaning device using the present invention.
１ 冷却水 ２ 還流管 ３ スペーサー ４ 洗浄室 ５ フォトマスク ６ フォトマスク支持用チャック ７ 洗浄液蒸気 ８ 洗浄液液溜 ９ 加熱器 １０ シリカゲル 1 Cooling Water 2 Reflux Pipe 3 Spacer 4 Cleaning Room 5 Photomask 6 Photomask Support Chuck 7 Cleaning Liquid Vapor 8 Cleaning Liquid Liquid Reservoir 9 Heater 10 Silica Gel
Claims (7)
法において、洗浄液を加熱し蒸気を発生させ、該蒸気を
還流管により凝縮し、還流管より落下する凝縮液を上記
基板上に滴下し、洗浄することを特徴とする基板洗浄方
法。1. A method of cleaning fine foreign matter adhering to a substrate, wherein a cleaning liquid is heated to generate steam, the steam is condensed by a reflux pipe, and the condensate falling from the reflux pipe is dropped on the substrate. A substrate cleaning method comprising: cleaning the substrate.
の洗浄方法。2. The cleaning method according to claim 1, wherein the substrate is a photomask.
する請求項１記載の洗浄方法。3. The cleaning method according to claim 1, wherein the cleaning is performed on a spinner.
置において、前記基板を保持する保持機構と、前記基板
の下側にある洗浄液の液溜部と、上側に加熱され蒸気と
なった該洗浄液を凝縮する還流管を具備し、それらが一
体となって構成されていることを特徴とする基板洗浄装
置。4. In a device for cleaning fine foreign matter adhering to a substrate, a holding mechanism for holding the substrate, a liquid reservoir of a cleaning liquid on the lower side of the substrate, and an upper heated vaporized steam. A substrate cleaning apparatus comprising a reflux pipe for condensing a cleaning liquid, which is integrally configured.
の洗浄装置。5. The cleaning apparatus according to claim 4, wherein the substrate is a photomask.
求項４記載の洗浄装置。6. The cleaning apparatus according to claim 4, wherein the substrate is provided on the spinner.
求項４記載の洗浄装置。7. The cleaning device according to claim 4, wherein a dehydration unit is provided on the upper portion of the reflux pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30830792A JPH06138648A (en) | 1992-10-22 | 1992-10-22 | Substrate washing method and washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30830792A JPH06138648A (en) | 1992-10-22 | 1992-10-22 | Substrate washing method and washing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06138648A true JPH06138648A (en) | 1994-05-20 |
Family
ID=17979480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30830792A Withdrawn JPH06138648A (en) | 1992-10-22 | 1992-10-22 | Substrate washing method and washing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06138648A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0747337A (en) * | 1993-08-03 | 1995-02-21 | Japan Field Kk | Scattering device for condensate in steam cleaning vessel |
| CN105855212A (en) * | 2016-05-23 | 2016-08-17 | 强新正品（苏州）环保材料科技有限公司 | Method for cleaning silica gel high polymer material |
| CN107208223A (en) * | 2015-04-20 | 2017-09-26 | 新日铁住金株式会社 | Grain-oriented magnetic steel sheet |
-
1992
- 1992-10-22 JP JP30830792A patent/JPH06138648A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0747337A (en) * | 1993-08-03 | 1995-02-21 | Japan Field Kk | Scattering device for condensate in steam cleaning vessel |
| CN107208223A (en) * | 2015-04-20 | 2017-09-26 | 新日铁住金株式会社 | Grain-oriented magnetic steel sheet |
| CN105855212A (en) * | 2016-05-23 | 2016-08-17 | 强新正品（苏州）环保材料科技有限公司 | Method for cleaning silica gel high polymer material |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20000104 |