JPH0575703B2 - - Google Patents
Info
- Publication number
- JPH0575703B2 JPH0575703B2 JP59181586A JP18158684A JPH0575703B2 JP H0575703 B2 JPH0575703 B2 JP H0575703B2 JP 59181586 A JP59181586 A JP 59181586A JP 18158684 A JP18158684 A JP 18158684A JP H0575703 B2 JPH0575703 B2 JP H0575703B2
- Authority
- JP
- Japan
- Prior art keywords
- sintered body
- silicon dioxide
- cristobalite
- alkali metal
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 56
- 229910052783 alkali metal Inorganic materials 0.000 claims description 17
- 150000001340 alkali metals Chemical class 0.000 claims description 17
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000002844 melting Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 12
- 239000012535 impurity Substances 0.000 claims description 11
- 229910052906 cristobalite Inorganic materials 0.000 claims description 9
- 239000013078 crystal Substances 0.000 claims description 9
- 230000007704 transition Effects 0.000 claims description 6
- 229910021494 β-cristobalite Inorganic materials 0.000 claims description 6
- 229910021493 α-cristobalite Inorganic materials 0.000 claims description 4
- 238000000034 method Methods 0.000 description 25
- 238000010438 heat treatment Methods 0.000 description 11
- 239000002994 raw material Substances 0.000 description 10
- 238000004017 vitrification Methods 0.000 description 10
- 239000000843 powder Substances 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000001354 calcination Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、非晶質二酸化珪素を原料とし、真空
溶融法によつて透明石英ガラスを製造する方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing transparent quartz glass using amorphous silicon dioxide as a raw material by a vacuum melting method.
一般に非晶質二酸化珪素を原料として透明石英
ガラスを製造する方法としては、ベルヌーイ法が
知られている。この方法は二酸化珪素の粉体をア
ルゴン−酸素プラズマ炎あるいは酸水素炎中に少
しづつ供給して石じゆんを生成されるようにして
透明石英ガラスを得るものである。
The Bernoulli method is generally known as a method for producing transparent quartz glass using amorphous silicon dioxide as a raw material. In this method, silicon dioxide powder is fed little by little into an argon-oxygen plasma flame or an oxyhydrogen flame to produce a stone oxide to obtain transparent quartz glass.
また、水晶粉を真空溶融炉中で溶融して透明石
英ガラスを得る真空溶融法がある。この方法は、
粒径100μｍ程度に調整された水晶粉を例えばグ
ラフアイト製ルツボに入れ真空加熱炉で長時間焼
結、溶融することによつて透明石英ガラスを得る
ものである。 There is also a vacuum melting method in which crystal powder is melted in a vacuum melting furnace to obtain transparent quartz glass. This method is
Transparent quartz glass is obtained by placing crystal powder adjusted to a particle size of about 100 μm in a crucible made of graphite, for example, and sintering and melting it in a vacuum heating furnace for a long time.
しかし、ベルヌーイ法は、アルゴン−酸素プラ
ズマ炎の熱源を用いた場合に、得られてた透明石
英ガラスの残存−OH基が少なく、かつ比較的泡
も少ないものであるが、製造装置類が複雑にな
り、かつエネルギーコストが高くなり、酸水素炎
を用いた場合はエネルギーコストが安く、比較的
泡の少ないものが得られるが、残存−OH基が多
くなる。しかもベルヌーイ法は、前記したように
原料供給の速さの限度があるため生産性が悪いこ
と、原料供給の速さと製品インゴツトの成長との
関係に熟練を要することから作業性が悪い等の問
題点をもつばかりか、製造可能なインゴツトの形
状は丸くかつ細いものに限られる。
However, in the Bernoulli method, when using an argon-oxygen plasma flame heat source, the resulting transparent quartz glass has few residual -OH groups and relatively few bubbles, but the manufacturing equipment is complicated. However, if an oxyhydrogen flame is used, the energy cost is low and a product with relatively few bubbles can be obtained, but the amount of residual -OH groups increases. Moreover, as mentioned above, the Bernoulli method has problems such as poor productivity due to the limit on the speed of raw material supply, and poor workability because it requires skill in understanding the relationship between the speed of raw material supply and the growth of the product ingot. In addition to having points, the shape of ingots that can be manufactured is limited to round and thin ones.
一方、真空溶融法で得られた透明石英ガラス
は、残存−OH基が少なく、高温における粘性も
高い等の特徴をもつが、比較的泡が多く、原料が
水晶粉のため高純度のものが期待できない等の不
都合がある。しかも水晶粉を使用するため原料供
給上にも問題点がある。 On the other hand, transparent quartz glass obtained by vacuum melting has characteristics such as low residual -OH groups and high viscosity at high temperatures, but it has relatively many bubbles and is made of quartz powder as a raw material, making it difficult to obtain high-purity products. There are inconveniences such as not being able to meet expectations. Moreover, since crystal powder is used, there are also problems in terms of raw material supply.
このように従来の透明石英ガラスを製造する方
法によると、種々不都合点があり、珠に生産性の
高い方法が望まれていた。 As described above, the conventional methods for manufacturing transparent quartz glass have various disadvantages, and a method with high productivity for beads has been desired.
本発明は上記の如き実情に鑑みなされたもの
で、原料として資源的制約のない非晶質二酸化珪
素粉を使用し、真空溶融法によつて透明石英ガラ
スを得るものであり、高純度の大型インゴツトの
製造が可能であり、かつ生産性に優れたた透明石
英ガラスの製造法を提供することを目的とする。 The present invention was developed in view of the above-mentioned circumstances, and uses amorphous silicon dioxide powder, which has no resource constraints, as a raw material, and obtains transparent quartz glass by a vacuum melting method. It is an object of the present invention to provide a method for manufacturing transparent quartz glass that enables the manufacture of ingots and has excellent productivity.
上記目的を達成するため、第１発明の方法は、
非晶質二酸化珪素粉をアルカリ金属成分の存在下
で加熱してクリストバライト結晶相をもつ多孔状
の焼結体とし、得られた焼結体を真空下で加熱
し、不純物を除去した後、溶融したガラス化する
ことを特徴とするものである。
In order to achieve the above object, the method of the first invention includes:
Amorphous silicon dioxide powder is heated in the presence of an alkali metal component to form a porous sintered body having a cristobalite crystal phase, and the resulting sintered body is heated under vacuum to remove impurities and then melted. It is characterized by vitrification.
また、第２発明の方法は、アルカリ金属成分を
含む非晶質二酸化珪素粉を容器に充填して加熱し
β−クリストバライト結晶質の焼結体とした後、
α−クリストバライトへの移転温度以上に維持し
て真空下で加熱し、不純物を除去した後、溶融し
てガラス化することを特徴とするものである。 Further, in the method of the second invention, after filling a container with amorphous silicon dioxide powder containing an alkali metal component and heating it to form a β-cristobalite crystalline sintered body,
It is characterized by heating under vacuum at a temperature higher than the transfer temperature to α-cristobalite to remove impurities, and then melting and vitrifying it.
さらに、上記両発明の方法において、前記アル
カリ金属として、Na成分を用いることが有利で
ある。 Furthermore, in the methods of both of the above inventions, it is advantageous to use a Na component as the alkali metal.
以下本発明に係る透明石英ガラスの製造法につ
き、その実施例を説明すると、本発明は例えば四
塩化珪素を酸化して得られる非晶質二酸化珪素粉
をアルカリ金属成分の存在下で加熱し結晶化する
と共に焼結する仮焼工程と、該仮焼工程によつて
得られた焼結体を真空下で加熱溶融しガラス化さ
せるガラス化工程とからなる。
Examples of the method for producing transparent quartz glass according to the present invention will be described below.The present invention involves heating amorphous silicon dioxide powder obtained by oxidizing silicon tetrachloride in the presence of an alkali metal component to crystallize it. It consists of a calcination step in which the sintered body is sintered and sintered, and a vitrification step in which the sintered body obtained by the calcination step is heated and melted in a vacuum and vitrified.
仮焼工程は、前記した従来方法にない特徴を示
すもので、非晶質二酸化珪素粉をルツボ等の容器
に充填して加熱し、クリストバライト結晶相をも
つ多孔状の焼結体とする。 The calcination step exhibits features not found in the conventional methods described above, in which amorphous silicon dioxide powder is filled into a container such as a crucible and heated to form a porous sintered body having a cristobalite crystal phase.
このとき純粋な二酸化珪素は、高温度例えば
1500℃まで加熱しても容易に結晶化しないが、ア
ルカリ金属成分を含むものは1100℃程度の加熱で
もクリストバライト結晶相へ転移することより、
アルカリ金属成分の存在下で加熱する。 At this time, pure silicon dioxide is exposed to high temperature e.g.
Although it does not crystallize easily even when heated to 1500℃, those containing alkali metal components transform to the cristobalite crystal phase even when heated to about 1100℃.
Heating in the presence of an alkali metal component.
これは、アルカリ金属を適宜量予め含む材料を
選択しても、純粋な二酸化珪素粉にアルカリ金属
成分を付着あるいは混合させてもよいし、あるい
は、アルカリ金属成分の雰囲気下で加熱してもよ
い。また、コロイダルシリカより製造された二酸
化珪素の粉体より焼結体を作る場合は、通常コロ
イダルシリカがNa成分を含み、結晶化が容易で
あるから、前記アルカリ金属成分の添加処理を省
略できる場合もある。 This can be done by selecting a material that contains an appropriate amount of alkali metal in advance, by attaching or mixing an alkali metal component to pure silicon dioxide powder, or by heating in an atmosphere of an alkali metal component. . In addition, when making a sintered body from silicon dioxide powder produced from colloidal silica, colloidal silica usually contains a Na component and is easily crystallized, so the addition process of the alkali metal component can be omitted. There is also.
なお、アルカリ金属成分としては、相転移促進
材として結晶化に効果を示すものであれば問わな
いが、本発明者の実験によると、Na成分を利用
することが、後記するガラス化工程における脱ガ
ラス処理に有利なことが確かれられている。 Note that any alkali metal component may be used as long as it is effective in crystallization as a phase transition accelerator, but according to the inventor's experiments, the use of Na component is effective for desorption in the vitrification process described later. It has been found to be advantageous for glass processing.
ここで、Na成分が重量比で1000ppm程度含ま
れた二酸化珪素粉を用いた場合について述べる
と、先ず脱イオン水にNaOHを加えた溶液中に
非晶質二酸化珪素粉を添加して撹拌する。この場
合、二酸化珪素粉に対する重量比として約
2300ppmのNa成分をNaOHの形で添加すれば、
二酸化珪素粉に付着するNaの量は重量比で略
1000ppmになる。 Here, to describe the case of using silicon dioxide powder containing about 1000 ppm of Na component by weight, first, amorphous silicon dioxide powder is added to a solution of deionized water and NaOH and stirred. In this case, the weight ratio to silicon dioxide powder is approximately
If 2300ppm Na component is added in the form of NaOH,
The amount of Na attached to silicon dioxide powder is expressed as a weight ratio.
It becomes 1000ppm.
次に、溶液中の二酸化珪素粉を取出し、適宜手
段で乾燥して粉末化する。 Next, the silicon dioxide powder in the solution is taken out and dried and powdered by an appropriate means.
このようにして得られた原料粉を、ルツボ等の
耐熱性の容器に充填し、1100℃程度に加熱すると
多孔状の焼結体が得られる。 The raw material powder thus obtained is filled into a heat-resistant container such as a crucible and heated to about 1100°C to obtain a porous sintered body.
得られた焼結体は、自立性をもつ多孔状物でク
リストバライト結晶の高温型であるから、得られ
た焼結体を低温型のα−クリストバライトに転移
させると６％程度の体積減少によつて微小のクラ
ツクが発生する。クラツクの発生した焼結体を溶
融してガラス化させると、クラツクはさらに進行
し、最終的には望ましい製品が得られない。β−
クリストバライトからα−クリストバライトへの
転移は220℃〜275℃の間で生ずるので、前記工程
で1100℃程度まで加熱して得られた焼結体をα−
クリストバライトへの転移温度以上に保持し、ガ
ラス化工程でガラス化させる。 The obtained sintered body is a self-supporting porous material and is a high-temperature type of cristobalite crystal, so when the obtained sintered body is transformed into a low-temperature type α-cristobalite, the volume decreases by about 6%. A small crack will occur. If a sintered body with cracks is melted and vitrified, the cracks will progress further and ultimately a desired product will not be obtained. β-
Since the transition from cristobalite to α-cristobalite occurs between 220°C and 275°C, the sintered body obtained by heating to about 1100°C in the above step is
It is held above the transition temperature to cristobalite and vitrified in the vitrification process.
ガラス化工程は、真空加熱炉で焼結体を真空度
0.5mb以下で1700℃以上に加熱するものである
が、溶融に至るまで二酸化珪素粉中の不純成分及
び原料粉に添加したNa成分等は、夫々の熱分解
温度まで加温することにより順次離脱、排気され
る。 In the vitrification process, the sintered body is heated in a vacuum heating furnace to a high degree of vacuum.
Although it is heated to 1700℃ or higher at 0.5mb or less, impurity components in the silicon dioxide powder and Na components added to the raw material powder are gradually released by heating to their respective thermal decomposition temperatures until melting. , is exhausted.
このとき、焼結体は前記したように多孔質状に
形成されるため、不純成分の除去は容易であり、
その内部がほぼ真空化された後溶融される。しか
も、焼結体は、前記したようにβ−クリストバラ
イト結晶質であるから、温度経過によつて徐々に
溶融するものではなく、一意的な融点をもつた
め、不純成分を除去が容易かつ充分に行なうこと
ができ、その後溶融してガラス化できる。したが
つて、不純物のない、即ち内部に泡や巣のない透
明なインゴツトが得られる。 At this time, since the sintered body is formed in a porous state as described above, it is easy to remove impurity components.
After the inside is almost evacuated, it is melted. Moreover, since the sintered body is made of β-cristobalite crystalline material as described above, it does not melt gradually as the temperature passes, but has a unique melting point, so impurities can be easily and thoroughly removed. It can then be melted and vitrified. Therefore, a transparent ingot without impurities, that is, without bubbles or cavities inside, can be obtained.
以上の説明から明らかな如く、本発明の特徴
は、非晶質の二酸化珪素粉を結晶質の所望の形状
でなく焼結体とすることにあり、一般に透明石英
ガラスを得る場合に、その材料中に結晶化に寄与
する成分が含まれることは、好ましくないとされ
ているに反し、本発明では主要件としている。 As is clear from the above description, the feature of the present invention is that the amorphous silicon dioxide powder is made into a sintered body instead of the desired crystalline shape. Contrary to the fact that the inclusion of components that contribute to crystallization is considered undesirable, it is a main requirement of the present invention.
また、結晶化に寄与する成分、即ち相転移促進
材は、ガラス化工程で除去するものであるから、
結晶化し易くかつ除去し易い条件をもつ成分及び
添加量が選択される。本発明者等の知見による
と、Na成分が100〜2000ppm含有された二酸化珪
素粉を用いると可能であり、約1000ppm程度含ま
れたものが望ましい。 In addition, since the components that contribute to crystallization, that is, the phase transition promoter, are removed in the vitrification process,
Components and amounts added that have conditions that allow easy crystallization and easy removal are selected. According to the findings of the present inventors, it is possible to use silicon dioxide powder containing 100 to 2000 ppm of Na, and desirably about 1000 ppm.
以上の説明から明らかなように、本発明の透明
石英ガラスの製造法に係わる第１の発明は、非晶
質二酸化珪素粉をアルカリ金属成分の存在下で加
熱しクリストバライト結晶相をもつ多孔状の焼結
体とする仮焼工程と、得られた焼結体を真空下が
加熱し、不純物を除去した後、溶融してガラス化
するガラス化工程とからなるものであるので、従
来方法では得られない効果をもたらす。
As is clear from the above description, the first invention related to the method for producing transparent quartz glass of the present invention is to heat amorphous silicon dioxide powder in the presence of an alkali metal component to form a porous structure having a cristobalite crystal phase. The process consists of a calcination process to form a sintered body, and a vitrification process in which the resulting sintered body is heated under vacuum to remove impurities and then melted and vitrified. It brings about an effect that cannot be achieved.
即ち、第１に、従来方法の如く、原料粉を直接
ガラス化するのではなく、粉体を成型化された焼
結体としたのちガラス化するものであるから、製
造が容易であり生産性が高い。 Firstly, unlike the conventional method, raw material powder is not directly vitrified, but the powder is formed into a molded sintered body and then vitrified, so manufacturing is easy and productivity is high. is high.
第２に、多孔状の焼結体を真空下で加熱溶融す
るものであることと、焼結体の融点が一意的に決
められることから、不純物の除去が容易かつ充分
に行えるため高品質のインゴツトが得られる。 Second, since the porous sintered body is heated and melted under vacuum, and the melting point of the sintered body is uniquely determined, impurities can be easily and thoroughly removed, resulting in high quality. Obtains ingots.
第３に、真空加熱下におけるガラス化工程にお
いて、被処理物が従来法の如く粉体ではなく、成
型化された焼結体であるため、処理が容易である
ばかりか容積効率が高くなる。 Thirdly, in the vitrification step under vacuum heating, the object to be treated is not a powder as in the conventional method but a molded sintered body, which not only facilitates the treatment but also improves volumetric efficiency.
第４に、上記した説明から明らかなように比較
的大型のインゴツトが得られるから、以降の処理
工程が容易になる。 Fourth, as is clear from the above description, a relatively large ingot can be obtained, which facilitates subsequent processing steps.
第２の発明は、アルカリ金属成分を含む非晶質
二酸化珪素粉を容器に充填して加熱しβ−クリス
トバライト結晶質を焼結体とする仮焼工程と、得
られた焼結体をβ−クリストバライト結晶質を維
持して真空下で加熱し、不純物を除去した後、溶
融してガラス化するガラス化工程とからなるもの
であるので、上述の効果に加えて、β−クリスト
バライトの状態を保持してガラス化させることに
より、クラツク等の発生を防いで、高品質の透明
石英ガラスを簡便に得ることができる。 The second invention includes a calcination step of filling a container with amorphous silicon dioxide powder containing an alkali metal component and heating it to form a sintered body of β-cristobalite crystalline material, and a calcination step of turning the obtained sintered body into a β-cristobalite crystalline body. The process consists of a vitrification process in which cristobalite is heated under vacuum while maintaining its crystalline state, impurities are removed, and then melted and vitrified.In addition to the above-mentioned effects, it maintains the β-cristobalite state. By vitrifying the glass, it is possible to easily obtain high-quality transparent quartz glass while preventing the occurrence of cracks and the like.
また、相転移促進材としてのアルカリ金属に
Na成分を用いた場合には、ガラス化工程におけ
る脱ガス処理に有利であると共に、通常Na成分
を含んでいるコロイダルシリカをそのまま利用で
きる場合は、二酸化珪素粉へのNa成分の添加処
理を省略できる。 Also, alkali metals as phase transition accelerators
When using Na component, it is advantageous for degassing treatment in the vitrification process, and if colloidal silica, which normally contains Na component, can be used as is, the process of adding Na component to silicon dioxide powder can be omitted. can.
Claims (1)
在下で加熱してクリストバライト結晶相をもつ多
孔状の焼結体とし、得られた焼結体を真空下で加
熱し、不純物を除去した後、溶融してガラス化す
ることを特徴とする透明石英ガラスの製造法。 ２ アルカリ金属成分を含む非晶質二酸化珪素粉
を容器に充填して加熱しβ−クリストバライト結
晶質の焼結体とした後、α−クリストバライトへ
の転移温度以上に維持して真空下で加熱し、不純
物を除去した後、溶融してガラス化することを特
徴とする透明石英ガラスの製造法。 ３ 前記アルカリ金属は、Na成分であることを
特徴とする特許請求の範囲第１項または第２項記
載の透明石英ガラスの製造法。[Claims] 1. Amorphous silicon dioxide powder is heated in the presence of an alkali metal component to form a porous sintered body having a cristobalite crystal phase, and the obtained sintered body is heated under vacuum, A method for producing transparent quartz glass, which is characterized by removing impurities and then melting and vitrifying it. 2 Amorphous silicon dioxide powder containing an alkali metal component is filled into a container and heated to form a crystalline sintered body of β-cristobalite, and then heated under vacuum while maintaining the temperature above the transition temperature to α-cristobalite. A method for producing transparent quartz glass, which is characterized by removing impurities and then melting and vitrifying it. 3. The method for producing transparent quartz glass according to claim 1 or 2, wherein the alkali metal is a Na component.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18158684A JPS6158822A (en) | 1984-08-30 | 1984-08-30 | Preparation of transparent quartz glass |
| KR1019850006115A KR870002025A (en) | 1984-08-30 | 1985-08-23 | Glass manufacturing method |
| EP85110852A EP0173961B1 (en) | 1984-08-30 | 1985-08-28 | Process for the production of glass |
| DE8585110852T DE3581455D1 (en) | 1984-08-30 | 1985-08-28 | METHOD FOR PRODUCING GLASS. |
| US07/277,452 US4871695A (en) | 1984-08-30 | 1988-10-17 | Process for the production of glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18158684A JPS6158822A (en) | 1984-08-30 | 1984-08-30 | Preparation of transparent quartz glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6158822A JPS6158822A (en) | 1986-03-26 |
| JPH0575703B2 true JPH0575703B2 (en) | 1993-10-21 |
Family
ID=16103397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18158684A Granted JPS6158822A (en) | 1984-08-30 | 1984-08-30 | Preparation of transparent quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6158822A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6158824A (en) * | 1984-08-30 | 1986-03-26 | Nippon Sanso Kk | Preparation of transparent quartz glass |
| JPS6158823A (en) * | 1984-08-30 | 1986-03-26 | Nippon Sanso Kk | Preparation of transparent quartz glass |
| JPS62212234A (en) * | 1986-02-28 | 1987-09-18 | Nippon Sanso Kk | Production of glass |
| US4828593A (en) * | 1986-02-28 | 1989-05-09 | Japan Oxygen Co., Ltd. | Process for the production of glass |
| US4828594A (en) * | 1986-02-28 | 1989-05-09 | Japan Oxygen Co., Ltd. | Process for the production of glass |
| AU653411B2 (en) * | 1991-07-19 | 1994-09-29 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
| JP2012066947A (en) * | 2010-09-21 | 2012-04-05 | Tosoh Corp | Quartz glass having ability to inhibit diffusion of metal impurity |
| KR101986062B1 (en) | 2016-04-28 | 2019-06-04 | 가부시키가이샤 아도마텍쿠스 | Crystal Silica Particle Material, Method of Manufacturing the Same, Crystal Silica Particle Material-Containing Slurry Composition, Crystal Silica Particle Material-Containing Resin Composition |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52156641A (en) * | 1976-06-21 | 1977-12-27 | Sumitomo Electric Ind Ltd | Preparation of optical fiber |
| JPS5439847A (en) * | 1977-09-05 | 1979-03-27 | Hitachi Ltd | Relay |
| JPS6158824A (en) * | 1984-08-30 | 1986-03-26 | Nippon Sanso Kk | Preparation of transparent quartz glass |
| JPS6158823A (en) * | 1984-08-30 | 1986-03-26 | Nippon Sanso Kk | Preparation of transparent quartz glass |
-
1984
- 1984-08-30 JP JP18158684A patent/JPS6158822A/en active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52156641A (en) * | 1976-06-21 | 1977-12-27 | Sumitomo Electric Ind Ltd | Preparation of optical fiber |
| JPS5439847A (en) * | 1977-09-05 | 1979-03-27 | Hitachi Ltd | Relay |
| JPS6158824A (en) * | 1984-08-30 | 1986-03-26 | Nippon Sanso Kk | Preparation of transparent quartz glass |
| JPS6158823A (en) * | 1984-08-30 | 1986-03-26 | Nippon Sanso Kk | Preparation of transparent quartz glass |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6158822A (en) | 1986-03-26 |
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