JPH0567445A - Accelerator for wide-range accelerating voltage ion source - Google Patents
Accelerator for wide-range accelerating voltage ion sourceInfo
- Publication number
- JPH0567445A JPH0567445A JP22732591A JP22732591A JPH0567445A JP H0567445 A JPH0567445 A JP H0567445A JP 22732591 A JP22732591 A JP 22732591A JP 22732591 A JP22732591 A JP 22732591A JP H0567445 A JPH0567445 A JP H0567445A
- Authority
- JP
- Japan
- Prior art keywords
- accelerating
- electrodes
- tube
- potential distribution
- accelerating voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は広範囲加速電圧イオン源
用加速装置に関し、例えばイオンアシスト蒸着によるＣ
ＢＮ成膜などに用いて有用なものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an accelerator for a wide range accelerating voltage ion source, for example, C by ion assisted deposition.
It is useful when used for BN film formation and the like.
【０００２】[0002]
【従来の技術】従来、イオン源としては、高電圧（〜１
００kV）から低電圧（〜１kV）まで自由に対応できるも
のはない。そこで加速装置を設けて、所望の電圧に対応
するようにしている。図３、図４を参照して従来の静電
型加速装置を説明する。2. Description of the Related Art Conventionally, a high voltage (~ 1
There is no one that can freely handle from 00kV) to low voltage (~ 1kV). Therefore, an accelerating device is provided so as to correspond to a desired voltage. A conventional electrostatic accelerator will be described with reference to FIGS. 3 and 4.
【０００３】図３、図４において、加速管１には絶縁物
２を挾んで複数の加速用電極３を多段に配置し、各電極
３間を固定抵抗４で結び、加速電源５により電極間に電
位分布を与えている。電極３の中央部の孔３Ａはイオン
ビーム通過用である。In FIG. 3 and FIG. 4, a plurality of acceleration electrodes 3 are arranged in multiple stages with an insulator 2 sandwiched in an acceleration tube 1, and each electrode 3 is connected by a fixed resistor 4, and an acceleration power source 5 is used to connect the electrodes. The potential distribution is given to. The hole 3A at the center of the electrode 3 is for passing an ion beam.
【０００４】図５は加速装置を用いたイオン注入装置の
例を示し、高圧絶縁碍子６で支持した真空チャンバ７内
にイオン源８、集束レンズ系９及び質量分離器１１を順
に配置してあり、更に真空チャンバ７のイオンビーム出
口に加速管１を連結し、加速管１のイオンビーム出口に
イオン打ち込み室１２を連結してある。図５中、１０は
ベースである。１３は発電機であり、イオン源８、質量
分離器１１及び加速管１の電源に用いられる。１４は発
電機駆動用モータであり、絶縁シャフト１５により発電
機１３と接続してある。１６は排気装置である。FIG. 5 shows an example of an ion implanter using an accelerating device. An ion source 8, a focusing lens system 9 and a mass separator 11 are sequentially arranged in a vacuum chamber 7 supported by a high voltage insulator 6. Further, the acceleration tube 1 is connected to the ion beam outlet of the vacuum chamber 7, and the ion implantation chamber 12 is connected to the ion beam outlet of the acceleration tube 1. In FIG. 5, 10 is a base. A generator 13 is used as a power source for the ion source 8, the mass separator 11 and the acceleration tube 1. Reference numeral 14 denotes a generator driving motor, which is connected to the generator 13 by an insulating shaft 15. Reference numeral 16 is an exhaust device.
【０００５】[0005]
【発明が解決しようとする課題】従来の加速装置では電
極３間を固定抵抗４で接続してあるため、広範囲に加速
電圧レベルを変えると、電位分布の形は一定であるた
め、ビームの収束拡がり特性が変化する。このため、ビ
ームの拡がりにより加速管１の電極にイオンや電子が衝
突したり、あるいはターゲットへのイオン電流密度が大
きくとれないといった問題がある。電極とイオンの衝突
防止には加速管１の径を大きくすることが考えられる
が、これでは加速管１が大形化するだけであり、ビーム
の収束拡がり特性の変化を改善することはできない。そ
こで、図６（ｂ）に示すように、必要プロセス条件（加
速電圧）１９毎に、所望の特性２０を有する加速装置を
製作せざるを得なかった。図６（ｂ）は、同図６（ａ）
に示す加速管出口１７とターゲット１８間の距離ｄを一
定にした場合のイオンエネルギー（eV）とターゲット１
８でのイオン電流密度（mA／cm2)との関係を示す。In the conventional accelerating device, the electrodes 3 are connected by the fixed resistor 4, so that if the accelerating voltage level is changed over a wide range, the shape of the potential distribution is constant, so that the beam is converged. Spreading characteristics change. Therefore, there is a problem that ions or electrons collide with the electrode of the acceleration tube 1 due to the spread of the beam, or the ion current density to the target cannot be large. The diameter of the accelerating tube 1 may be increased in order to prevent collision between the electrodes and the ions, but this only enlarges the accelerating tube 1 and cannot improve the change in the beam converging / diverging characteristics. Therefore, as shown in FIG. 6B, an accelerating device having a desired characteristic 20 has to be manufactured for each required process condition (accelerating voltage) 19. FIG. 6B is the same as FIG.
Ion energy (eV) and target 1 when the distance d between the accelerating tube outlet 17 and the target 18 shown in FIG.
8 shows the relationship with the ion current density (mA / cm 2 ) in FIG.
【０００６】本発明は上記従来技術の問題点を解消した
広範囲加速電圧に対応できるイオン源用加速装置を提供
することを目的とする。An object of the present invention is to provide an accelerating device for an ion source capable of coping with a wide range accelerating voltage, which solves the above-mentioned problems of the prior art.
【０００７】[0007]
【課題を解決するための手段】本発明の構成は、静電型
加速管に複数の加速電極を設け、加速電極間を電位分布
制御装置で接続したことを特徴とするものである。The structure of the present invention is characterized in that a plurality of accelerating electrodes are provided in an electrostatic accelerating tube, and the accelerating electrodes are connected by a potential distribution control device.
【０００８】[0008]
【作用】加速電圧のレベルに応じて、手動によりまたは
自動的に電位分布制御装置を働かせて加速電極間の電位
分布を所望のビーム収束拡がり特性となるように変更す
る。これにより、広範囲の加速電圧に対し、ターゲット
で電流集中する。従って、ターゲット以外への電流拡が
りを防止でき、ターゲットでの電流密度が向上し、また
ビームと加速電極の衝突を防止できる。According to the level of the accelerating voltage, the potential distribution control device is manually or automatically operated to change the potential distribution between the accelerating electrodes so as to obtain a desired beam converging / spreading characteristic. As a result, the current concentrates on the target for a wide range of acceleration voltages. Therefore, it is possible to prevent the current from spreading to other than the target, improve the current density at the target, and prevent the collision between the beam and the acceleration electrode.
【０００９】[0009]
【実施例】以下、本発明の実施例を図１、図２に基づい
て説明する。図１において、真空チャンバ２１の途中に
多段式加速管２２が接続され、加速管２２の両側にそれ
ぞれイオン源２３及びターゲット（基材）２４が配置さ
れている。加速管２２には絶縁物２５を挾んで導体板で
作られた加速電極２６を多段に配置してある。そして各
加速電極２６間を電位分布制御装置２７で結んである。
加速用電源２８は可変電源であり、１kV〜１００kVの広
範囲で加速電圧を両端の加速電極間に印加する。２９は
イオン源用電源、３０はイオンビームである。Embodiments of the present invention will be described below with reference to FIGS. In FIG. 1, a multistage accelerating tube 22 is connected in the middle of a vacuum chamber 21, and an ion source 23 and a target (base material) 24 are arranged on both sides of the accelerating tube 22, respectively. In the accelerating tube 22, an insulator 25 is sandwiched and accelerating electrodes 26 made of a conductor plate are arranged in multiple stages. A potential distribution control device 27 connects the accelerating electrodes 26.
The accelerating power supply 28 is a variable power supply and applies an accelerating voltage in a wide range of 1 kV to 100 kV between the accelerating electrodes at both ends. 29 is a power source for an ion source, and 30 is an ion beam.
【００１０】動作としては、各電位分布制御装置２７を
用いて、加速電圧のレベルに応じて加速電極２６間の接
続を短絡も含めて変更し、加速管２２内の電位分布を、
所望のビーム収束拡がり特性となるように設定する。こ
の電位分布制御装置２７の動作は加速電圧レベルに応じ
て手動で行っても良く、また自動でも良い。自動の場合
は各加速電圧レベル毎に、各電位分布制御装置２７の動
作パターンを予め設定しておけば良い。In operation, each potential distribution control device 27 is used to change the connection between the acceleration electrodes 26 including a short circuit according to the level of the acceleration voltage, and the potential distribution in the acceleration tube 22 is changed to
It is set so as to obtain a desired beam converging / diverging characteristic. The operation of the potential distribution control device 27 may be performed manually or automatically according to the acceleration voltage level. In the case of automatic operation, the operation pattern of each potential distribution control device 27 may be set in advance for each acceleration voltage level.
【００１１】図１に示した加速装置を用いると、図６
（ｂ）の特性３２に示すように、各種の必要プロセス条
件１９に対し、十分なターゲットイオン電流密度が得ら
れる。Using the accelerator shown in FIG.
As shown in the characteristic 32 of (b), a sufficient target ion current density can be obtained for various necessary process conditions 19.
【００１２】図２は、電位分布制御装置２７の一例を示
し、連続的または段階的に抵抗が変化する可変抵抗３１
を用いて各加速電極２６間を接続している。FIG. 2 shows an example of the potential distribution control device 27, which is a variable resistor 31 whose resistance changes continuously or stepwise.
Are used to connect the respective acceleration electrodes 26.
【００１３】[0013]
【発明の効果】本発明の加速装置によれば、加速電圧の
レベルに応じて加速管内の電位分布を変え、ビーム収束
拡がり特性を所望のものに設定できる。これにより、広
範囲の加速電圧に対し、ターゲット以外への電流拡がり
を防止でき、またターゲットでの電流密度が向上し、更
に、ビームと加速電極の衝突を防止できる。また、ビー
ムと加速電極の衝突がなくなるので、加速管のコンパク
ト化が可能である。According to the accelerating device of the present invention, the potential distribution in the accelerating tube can be changed according to the level of the accelerating voltage, and the beam converging / spreading characteristic can be set to a desired one. As a result, it is possible to prevent the current from spreading to areas other than the target for a wide range of accelerating voltages, improve the current density at the target, and prevent collision between the beam and the accelerating electrode. Further, since the collision between the beam and the acceleration electrode is eliminated, the acceleration tube can be made compact.
【図１】本発明の一実施例の構成を示す図。FIG. 1 is a diagram showing the configuration of an embodiment of the present invention.
【図２】可変抵抗を用いた例を示す図。FIG. 2 is a diagram showing an example using a variable resistor.
【図３】従来例の構成を示す図。FIG. 3 is a diagram showing a configuration of a conventional example.
【図４】加速電極の形状例を示す図。FIG. 4 is a diagram showing an example of the shape of an accelerating electrode.
【図５】イオン注入装置の例を示す図。FIG. 5 is a diagram showing an example of an ion implantation device.
【図６】本発明の効果を従来のものと対比して示す図。FIG. 6 is a diagram showing the effect of the present invention in comparison with a conventional one.
２１ 真空チャンバ ２２ 加速管 ２３ イオン源 ２４ ターゲット ２５ 絶縁物 ２６ 加速電極 ２７ 電位分布制御装置 ２８ 加速用電源 ２９ イオン源用電源 ３０ イオンビーム ３１ 可変抵抗 21 Vacuum Chamber 22 Accelerating Tube 23 Ion Source 24 Target 25 Insulator 26 Accelerating Electrode 27 Potential Distribution Control Device 28 Accelerating Power Supply 29 Ion Source Power Supply 30 Ion Beam 31 Variable Resistance
───────────────────────────────────────────────────── フロントページの続き (72)発明者 花中 勝保 広島県広島市西区観音新町四丁目６番22号 三菱重工業株式会社広島研究所内 (72)発明者 梶西 邦幸 広島県広島市西区観音新町四丁目６番22号 三菱重工業株式会社広島研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Katsuho Hananaka, 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima City, Hiroshima Prefecture Mitsubishi Heavy Industries, Ltd. Hiroshima Research Institute (72) Inventor Kuniyuki Kajisai Kannon Shinmachi, Nishi-ku, Hiroshima City, Hiroshima Prefecture 4-6-22 Mitsubishi Heavy Industries Ltd. Hiroshima Research Laboratory
Claims (1)
加速電極間を電位分布制御装置で接続したことを特徴と
する広範囲加速電圧イオン源用加速装置。1. An electrostatic acceleration tube having a plurality of acceleration electrodes,
An accelerator for a wide range accelerating voltage ion source, characterized in that the accelerating electrodes are connected by a potential distribution controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22732591A JPH0567445A (en) | 1991-09-06 | 1991-09-06 | Accelerator for wide-range accelerating voltage ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22732591A JPH0567445A (en) | 1991-09-06 | 1991-09-06 | Accelerator for wide-range accelerating voltage ion source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0567445A true JPH0567445A (en) | 1993-03-19 |
Family
ID=16859043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22732591A Withdrawn JPH0567445A (en) | 1991-09-06 | 1991-09-06 | Accelerator for wide-range accelerating voltage ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0567445A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8003958B2 (en) | 1996-05-15 | 2011-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus and method for doping |
| CN104582230A (en) * | 2014-12-11 | 2015-04-29 | 中国原子能科学研究院 | Accelerating electrode for electrostatic accelerator |
| JP2015530719A (en) * | 2012-09-28 | 2015-10-15 | シーメンス アクティエンゲゼルシャフト | High voltage electrostatic field generator |
-
1991
- 1991-09-06 JP JP22732591A patent/JPH0567445A/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8003958B2 (en) | 1996-05-15 | 2011-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus and method for doping |
| US8344336B2 (en) | 1996-05-15 | 2013-01-01 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus and method for doping |
| JP2015530719A (en) * | 2012-09-28 | 2015-10-15 | シーメンス アクティエンゲゼルシャフト | High voltage electrostatic field generator |
| US9847740B2 (en) | 2012-09-28 | 2017-12-19 | Siemens Aktiengesellschaft | High voltage electrostatic generator |
| CN104582230A (en) * | 2014-12-11 | 2015-04-29 | 中国原子能科学研究院 | Accelerating electrode for electrostatic accelerator |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19981203 |