JPH05333336A - Production of liquid crystal display element and apparatus for production of liquid crystal display element - Google Patents
Production of liquid crystal display element and apparatus for production of liquid crystal display elementInfo
- Publication number
- JPH05333336A JPH05333336A JP14022892A JP14022892A JPH05333336A JP H05333336 A JPH05333336 A JP H05333336A JP 14022892 A JP14022892 A JP 14022892A JP 14022892 A JP14022892 A JP 14022892A JP H05333336 A JPH05333336 A JP H05333336A
- Authority
- JP
- Japan
- Prior art keywords
- rubbing
- liquid crystal
- crystal display
- display element
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はラップトップ型，ノート
型パソコン対応の液晶表示素子の製造方法および液晶表
示素子の製造装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display device and a device for manufacturing a liquid crystal display device for laptop and notebook computers.
【０００２】[0002]
【従来の技術】液晶表示素子は通常一定の間隙を保持し
た相対向する２枚の基板上に形成した電極間に液晶分子
を配列させ、これら電極間に印加する電圧を制御するこ
とで作動させる。この時に使用する上下電極は少なくと
も一方は光透過性の電極（以下透明電極）を使用する。
一般に液晶表示素子のパネル部分の断面図は従来例を引
用するまでもなく図６に示すような構成になっている。
図６において、６１は基板、６２は透明電極、６３は配
向膜、６４は液晶、６５はスペーサである。すなわち、
ほぼ均一で平坦な基板６１上に形成した透明電極６２上
に液晶分子を配列制御させるために配列しやすくするポ
リイミド樹脂などの配向膜材料を膜厚にして数百ｎｍ電
極を含む基体上に極めて薄くほぼ均一に塗布して乾燥硬
化した後に液晶分子を配向させる前処理としてこの配向
膜表面をローラーに巻き付けたナイロン製などの布でラ
ビングする処理を実施している。工業的にはクリーンル
ーム内で空気中でラビング処理が実施されている。配向
膜面をラビングした時に配向膜とラビング用布との機械
的摩擦により配向膜の一部が剥離したり、ラビング用布
の繊維の一部が切断されてごみになり、これらのごみが
機械的摩擦により発生する静電気により元の配向膜面に
吸着する。そのために洗浄工程で除去する方法が実施さ
れている。ごみを除去する洗浄工程として純水ブラシ洗
浄，キロヘルツ帯の純水超音波洗浄，メガヘルツ帯の純
水超音波洗浄，フロン洗浄など半導体プロセスの洗浄が
実施されているが充分に除去しきれていない。そしてご
みが配向膜面に吸着した基板を使用した液晶表示素子は
液晶の配向がこの部分で配向乱れを生じるために表示む
らによる表示品位の低下になる。またローラーがラビン
グ時に高速回転するためにクリーンルーム周辺に上記の
ごみをまき散らす悪化要因にもなっている。これらの問
題点の解決策として特開昭６１−２４５１３７号公報に
開示されているようにローラーと基板を水槽に入れて水
中でラビング処理する方法が提案されている。2. Description of the Related Art A liquid crystal display device is normally operated by arranging liquid crystal molecules between electrodes formed on two substrates facing each other with a constant gap and controlling a voltage applied between these electrodes. .. At least one of the upper and lower electrodes used at this time is a light transmissive electrode (hereinafter referred to as a transparent electrode).
Generally, a cross-sectional view of a panel portion of a liquid crystal display device has a structure as shown in FIG.
In FIG. 6, 61 is a substrate, 62 is a transparent electrode, 63 is an alignment film, 64 is a liquid crystal, and 65 is a spacer. That is,
An alignment film material such as a polyimide resin, which facilitates alignment for controlling alignment of liquid crystal molecules on a transparent electrode 62 formed on a substantially uniform and flat substrate 61, has a thickness of several hundred nm. As a pretreatment for orienting liquid crystal molecules after applying a thin and almost even coating and drying and curing, a rubbing treatment with a cloth made of nylon or the like wound around the surface of the orientation film is performed. Industrially, rubbing is performed in the air in a clean room. When rubbing the surface of the alignment film, a part of the alignment film is peeled off due to mechanical friction between the alignment film and the rubbing cloth, or a part of the fibers of the rubbing cloth is cut into dust. It is adsorbed on the original alignment film surface by static electricity generated by dynamic friction. Therefore, the method of removing in a washing process is implemented. As cleaning processes to remove dust, cleaning of semiconductor processes such as pure water brush cleaning, kilohertz band pure water ultrasonic cleaning, megahertz band pure water ultrasonic cleaning, and CFC cleaning is carried out, but not completely removed. .. Then, in a liquid crystal display element using a substrate in which dust is adsorbed on the surface of the alignment film, the alignment of the liquid crystal is disturbed in this part, so that the display quality is deteriorated due to display unevenness. In addition, since the roller rotates at high speed during rubbing, it is a deteriorating factor of scattering the above dust around the clean room. As a solution to these problems, a method has been proposed in which a roller and a substrate are placed in a water tank and a rubbing treatment is performed in water as disclosed in JP-A-61-245137.
【０００３】[0003]
【発明が解決しようとする課題】しかしながらこのよう
な従来の構成では、ごみをまき散らす防止には効果的で
あるが、ローラーと基板全体が液体中にある時はラビン
グの緩衝材になりラビング効果が空気中で処理するほど
期待できないこと、またラビング処理後に基板を取り出
す時に水槽中に浮遊したごみが基板の配向膜面に再付着
するなどの課題，基板の一方の側の配向膜面をラビング
処理するが、他方の側に基板面の洗浄に対しては特に注
目して行っていないので他方の側の基板面に吸着したご
みが配向膜面に悪影響を及ぼすなどの課題があり、また
ラビング用布の繊維径においても、特に詳細に、繊維径
を可変した場合のラビング効果による表示の善し悪しに
ついての考察も上記特許公開公報の装置で行われていな
かった。However, such a conventional structure is effective in preventing dust from being scattered, but when the roller and the substrate as a whole are in a liquid, they serve as a cushioning material for rubbing, and a rubbing effect is obtained. It is not as expected as processing in air, and problems such as dust floating in the water tank reattaching to the alignment film surface of the substrate when removing the substrate after rubbing processing, rubbing processing of the alignment film surface on one side of the substrate However, since no particular attention is paid to cleaning the substrate surface on the other side, there is a problem that dust adsorbed on the substrate surface on the other side adversely affects the alignment film surface, and also for rubbing. Regarding the fiber diameter of the cloth as well, the device disclosed in the above-mentioned patent publication has not been particularly detailed in consideration of the display quality due to the rubbing effect when the fiber diameter is varied.
【０００４】本発明は上記課題を解決するもので、ラビ
ング時に発生するごみの配向膜面への付着を減らし、表
示品位の高い液晶表示素子の製造方法を提供することを
目的とする。The present invention solves the above problems, and an object of the present invention is to provide a method for manufacturing a liquid crystal display device having a high display quality by reducing the adhesion of dust generated during rubbing to the surface of the alignment film.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成するため
に本発明は、ラビング機および被ラビング基板を恒温で
高湿度の状態に制御された恒温恒湿槽内に設置し、同時
に他方の片側面をブラシ洗浄することで配向膜面のラビ
ング処理と洗浄を行う構成と、さらにラビング時にラビ
ング用布の繊維径を徐々に小さくする構成とによる。In order to achieve the above object, the present invention is to install a rubbing machine and a substrate to be rubbed in a constant temperature and humidity chamber controlled to a constant temperature and high humidity, and at the same time, to install the other piece. The side surface is brush-cleaned to perform rubbing treatment and cleaning on the surface of the alignment film, and the structure is such that the fiber diameter of the rubbing cloth is gradually reduced during rubbing.
【０００６】[0006]
【作用】ラビング機と被ラビング基板が高湿度の恒温恒
湿槽内に設置されているので、摩擦による静電気の発生
も低減でき、静電気による配向膜の一部の剥がれたごみ
やラビング布の繊維の切断破片の吸着も低減し、ラビン
グ用布の繊維径を徐々に細くして処理するので配向膜面
の仕上げ表面形状も良くなる。[Function] Since the rubbing machine and the substrate to be rubbed are installed in a high-humidity, constant-temperature and constant-humidity chamber, the generation of static electricity due to friction can be reduced. Also, the adsorption of the cut pieces is reduced and the fiber diameter of the rubbing cloth is gradually reduced to be treated, so that the finished surface shape of the alignment film surface is improved.
【０００７】[0007]
（実施例１）図１は本発明の実施例１を説明するための
斜視図である。図１において、１はローラー、２はラビ
ング用布、３は基板、４はステージ、５は恒温恒湿槽、
６は制御部である。ラビング用布２を巻き付けたローラ
ー１を高速回転させステージ４上に設置された基板３を
機械的にラビング処理する。これらのワーク部は恒温恒
湿槽５内に設置されている。恒温恒湿槽５内の湿度は槽
内を一定の環境に保持する制御部６でコントロールさ
れ、５０〜６０％で一定に保持されるが、機械的摩擦に
より基板表面に発生する静電気を極力低下させるにはよ
り高湿度の方が良い。従来はクリーンルーム内で空調制
御された部屋で実施されていたが、本発明では省スペー
ス化が図れ、槽内の湿度も作業者に適した状態と無関係
に高湿度で実施できる。(Embodiment 1) FIG. 1 is a perspective view for explaining Embodiment 1 of the present invention. In FIG. 1, 1 is a roller, 2 is a rubbing cloth, 3 is a substrate, 4 is a stage, 5 is a constant temperature and humidity chamber,
6 is a control unit. The roller 1 around which the rubbing cloth 2 is wound is rotated at high speed to mechanically rub the substrate 3 placed on the stage 4. These work parts are installed in the constant temperature and humidity chamber 5. The humidity in the constant temperature and constant humidity tank 5 is controlled by the control unit 6 which keeps the inside of the tank in a constant environment and is kept constant at 50 to 60%, but static electricity generated on the substrate surface by mechanical friction is reduced as much as possible. Higher humidity is better to allow. Conventionally, it has been carried out in a room controlled by air conditioning in a clean room, but in the present invention, space can be saved and the humidity in the tank can be carried out at high humidity regardless of the condition suitable for the operator.
【０００８】（実施例２）図２は実施例２を示すもの
で、２１はラビング用布、２２はローラー、２３はブラ
シ、２４はローラー、２５は基板、２６は配向膜側、２
７は基板裏面である。すなわち基板２５の配向膜面側２
６をラビング処理し、同時に基板裏面２７をブラシ洗浄
処理する製造方法を示す。同図において、配向膜面側２
６を処理するローラー２２にはラビング用布２１がセッ
トされ、基板裏面２７を洗浄処理するローラー２４には
洗浄用ブラシ２３がセットされている。ブラシ洗浄は純
水または界面活性剤を含有する純水を流水として注ぎな
がら行う。またこれらは実施例１と同様にワーク部は恒
温恒湿槽内に設置されている。(Embodiment 2) FIG. 2 shows Embodiment 2, wherein 21 is a rubbing cloth, 22 is a roller, 23 is a brush, 24 is a roller, 25 is a substrate, 26 is an alignment film side, 2
7 is the back surface of the substrate. That is, the alignment film surface side 2 of the substrate 25
6 shows a manufacturing method in which 6 is rubbed and at the same time, the back surface 27 of the substrate is brush-cleaned. In the figure, the alignment film surface side 2
The rubbing cloth 21 is set on the roller 22 for processing 6, and the cleaning brush 23 is set on the roller 24 for cleaning the back surface 27 of the substrate. Brush cleaning is performed while pouring pure water or pure water containing a surfactant as running water. In addition, as in the first embodiment, the work part of these is installed in a constant temperature and humidity chamber.
【０００９】基板２５はソーダライムガスで有効表示エ
リアは対角線距離で１０インチ、このガラス上にカラー
フィルターを形成し、このカラーフィルター上に幅数百
μｍでスペース幅数十μｍのストライプ状透明電極を数
百本形成した。カラーフィルターのない別の基板にも同
様にストライプ状電極を形成した。配向膜としてはポリ
イミド樹脂をオフセット印刷法で数百ｎｍ形成した。こ
れらの２枚の配向処理した基板を電極および配向膜側か
ら内側に相対向するように数μｍの間隙を保持して液晶
を充填した。表示状態の良否の判別は偏光位相板を使用
し、電圧無印加時に光透過ＯＦＦ（ノーマリブラック）
から電圧を徐々に印加して各色の中間調状態での表示の
均一性，ピンホールの数量とサイズ，鮮明さなどで評価
した。中間調表示で径が１mm以上の白色むら表示が発生
する数量、および静電気によると推定される表示むら数
量で判定した。（表１）に判定結果を示す。The substrate 25 is soda lime gas and the effective display area is a diagonal distance of 10 inches. A color filter is formed on this glass, and a stripe-shaped transparent electrode having a width of several hundred μm and a space width of several tens μm. Several hundred were formed. Striped electrodes were similarly formed on another substrate having no color filter. As the alignment film, a polyimide resin having a thickness of several hundreds nm was formed by an offset printing method. A liquid crystal was filled in these two alignment-treated substrates with a gap of several μm so as to face inward from the electrodes and the alignment film side. A polarization phase plate is used to judge the display state, and light transmission is turned off (normally black) when no voltage is applied.
Then, the voltage was gradually applied to evaluate the uniformity of display in the halftone state of each color, the number and size of pinholes, and the sharpness. Judgment was made based on the number of white uneven display with a diameter of 1 mm or more in the halftone display and the uneven display amount estimated to be caused by static electricity. (Table 1) shows the determination results.
【００１０】[0010]
【表１】 [Table 1]
【００１１】（表２）は基板２５の配向膜面側２６をラ
ビング処理する時に、同時に基板裏面２７のブラシ洗浄
の有無および超音波洗浄による配向膜上の１０μｍ以上
の異物数量の測定結果である。Table 2 shows the measurement results of the presence / absence of brush cleaning of the back surface 27 of the substrate and the number of foreign matters on the alignment film of 10 μm or more by ultrasonic cleaning at the same time when the surface 26 of the alignment film surface of the substrate 25 is rubbed. ..
【００１２】[0012]
【表２】 [Table 2]
【００１３】（実施例３）図３は工程（１）３１，工程
（２）３２，工程（３）３３からなる実施例３のブロッ
ク図である。同図において工程（１）は実施例１，２で
説明した処理工程である。工程（１）に加えて工程
（２）の純水洗浄槽でキロヘルツ帯（ＵＳＷ）の超音波
洗浄を行い、さらに工程（３）の純水洗浄槽でメガヘル
ツ帯（ＭＳＷ）の超音波洗浄を行う方法をラビング後の
洗浄ラインとしての提案である。これらの超音波洗浄は
いずれか一方でも良い。(Third Embodiment) FIG. 3 is a block diagram of a third embodiment including a step (1) 31, a step (2) 32, and a step (3) 33. In the figure, step (1) is the processing step described in the first and second embodiments. In addition to step (1), ultrasonic cleaning of kilohertz band (USW) is performed in the pure water cleaning tank of step (2), and ultrasonic cleaning of megahertz band (MSW) is further performed in the pure water cleaning tank of step (3). It is a proposal as a cleaning line after rubbing the method of performing. Either of these ultrasonic cleanings may be used.
【００１４】（実施例４）実施例１，２においてラビン
グ用および洗浄用ローラーが基板に対して任意の押圧が
加えられるように上下方向に移動可能なように装置をセ
ットし、基板に対して一定の押圧を選択的に加えてラビ
ング処理または洗浄処理を行う方法が実施例１，２の応
用として新規に提案できる。そしてまた斜視図の図４で
４１はローラー、４２はラビング用布、４３は議はん、
４４はステージ、４５は基板４３とローラー４１との角
度を示す。実施例１，２においてラビング用または洗浄
用ローラー４１が基板４３に対して任意の角度（θ）４
５を保持できるようにローラー４１または基板４３を水
平方向に移動可能なように装置をセットし、基板４３に
対して一定の角度（θ）４５を選択的に保持してラビン
グ処理または洗浄処理を行う方法が実施例１，２の応用
として提案できる。(Embodiment 4) In Embodiments 1 and 2, the apparatus is set so that the rubbing and cleaning rollers can be moved vertically so that an arbitrary pressure is applied to the substrate, and A method of selectively applying a constant pressure to perform a rubbing process or a cleaning process can be newly proposed as an application of the first and second embodiments. In the perspective view of FIG. 4, 41 is a roller, 42 is a rubbing cloth, and 43 is a meeting.
Reference numeral 44 indicates a stage, and 45 indicates an angle between the substrate 43 and the roller 41. In Examples 1 and 2, the rubbing or cleaning roller 41 is set at an arbitrary angle (θ) 4 with respect to the substrate 43.
5 is set so that the roller 41 or the substrate 43 can be moved in the horizontal direction, and a certain angle (θ) 45 with respect to the substrate 43 is selectively held to perform a rubbing process or a cleaning process. A method of performing it can be proposed as an application of the first and second embodiments.
【００１５】液晶分子の配向機構は現時点で充分に解明
されているわけではないが、配向膜材料や、ラビング時
のローラー４１の回転数やローラー４１の基板４３に対
する押圧やラビング角度に大きく影響することが経験的
に知られている。恒温恒湿槽内でラビングおよび洗浄処
理する場合も工程上のマージンを考慮して、基板４３に
対するローラー４１の押圧や角度が可変可能なように設
計しておくことが良い。Although the alignment mechanism of liquid crystal molecules has not been fully clarified at present, it has a great influence on the alignment film material, the rotation speed of the roller 41 during rubbing, the pressing of the roller 41 against the substrate 43 and the rubbing angle. It is empirically known. Even when the rubbing and cleaning processes are performed in the constant temperature and humidity chamber, it is preferable to design the pressure and the angle of the roller 41 against the substrate 43 to be variable in consideration of the process margin.
【００１６】（実施例５）図５は実施例１，２，３にお
いて説明したラビング用および洗浄用装置が複数箇所ラ
イン化セットされた工程のブロック図で、５１は初段の
ラビング処理および洗浄工程、５２は最終のラビング処
理および洗浄工程、５３は初段の超音波洗浄工程、５４
は最終段の超音波洗浄工程である。また同図において最
初のラビング処理から最終のラビング処理までラビング
用の布の繊維径が徐々に小さくなるように設計されたラ
ビング機で実施した場合は数量的判定は困難であるが、
（表３）に示すように繊維径一定のラビング処理をした
場合と比較して表示の均一性と色の鮮明度が得られる。
同表においてラビング布の繊維径が約１００μｍ，約６
０μｍ，約３０μｍに可変した場合とそれぞれ一種類の
繊維径でラビング処理した結果である。(Embodiment 5) FIG. 5 is a block diagram of a process in which the rubbing and cleaning devices described in Embodiments 1, 2, and 3 are set in a line at a plurality of locations, and 51 is a first-stage rubbing and cleaning process. , 52 is the final rubbing treatment and cleaning step, 53 is the first ultrasonic cleaning step, 54
Is the final ultrasonic cleaning step. Further, in the same figure, when the rubbing machine designed to gradually reduce the fiber diameter of the cloth for rubbing from the first rubbing treatment to the final rubbing treatment is performed, it is difficult to make a quantitative determination,
As shown in (Table 3), display uniformity and color clarity can be obtained as compared with the case where a rubbing treatment with a constant fiber diameter is performed.
In the table, the rubbing cloth has a fiber diameter of about 100 μm and about 6
It is the result of rubbing treatment with one kind of fiber diameter and when changing to 0 μm and about 30 μm.
【００１７】[0017]
【表３】 [Table 3]
【００１８】[0018]
【発明の効果】以上の実施例から明らかなように本発明
は、下記の効果をもたらす。As is apparent from the above embodiments, the present invention brings the following effects.
【００１９】（１）機械的摩擦によるラビング処理工程
のワーク部が高湿度に保持された恒温恒湿槽内に設置さ
れているので、ラビング時に発生する静電気が減り、こ
の静電気による配向膜の一部が剥離したごみやラビング
用布の一部切断したごみの吸着も減り、ごみが原因にな
る液晶分子の配向の乱れによる表示品位の低下の防止に
効果がある。(1) Since the work part in the rubbing process by mechanical friction is installed in a constant temperature and humidity chamber kept at high humidity, static electricity generated during rubbing is reduced, and one of the alignment films caused by this static electricity is reduced. Adsorption of dust from which parts are peeled off and dust from which a rubbing cloth is partially cut is also reduced, which is effective in preventing deterioration of display quality due to disorder of liquid crystal molecule alignment caused by dust.
【００２０】（２）液晶の配向に必要な片側面はラビン
グ処理し、かつ、別の片側面はブラシによる洗浄で基板
表面を清浄に保持できる。(2) The surface of the substrate can be kept clean by rubbing one side necessary for the alignment of the liquid crystal and cleaning the other side by a brush.
【００２１】（３）さらに基板面を充分な清浄度に保持
する方法としてラビング後に超音波洗浄を行うことは基
板面に微細な振動や加重を加える効果があり、より微細
な塵埃を除去することができる。(3) Further, as a method of keeping the substrate surface at a sufficient cleanliness, performing ultrasonic cleaning after rubbing has the effect of applying minute vibration or weight to the substrate surface, and removing finer dust. You can
【００２２】（４）液晶分子を一定の秩序で配向させる
処理条件は配向膜材料やラビング用布やローラーの回転
数と密接な関連があるばかりでなく、基板に加圧される
ローラーの押圧や基板とローラーとの角度にも関連する
ので、装置のローラーと基板との押圧および角度が選択
的に可変できることは任意の配向制御が可能になる。(4) The treatment conditions for orienting the liquid crystal molecules in a certain order are not only closely related to the rotation speed of the alignment film material, the rubbing cloth and the roller, but also the pressure of the roller pressed against the substrate and Since it is also related to the angle between the substrate and the roller, the fact that the pressing force and the angle between the roller and the substrate of the apparatus can be selectively changed enables arbitrary orientation control.
【００２３】（５）そして上記ラビングおよび洗浄処理
箇所を複数個設けると、一装置当りの配向処理時間（工
程のスループット時間）が短縮できる効果がある。また
複数箇所で処理するラインにおいて、特にラビング処理
に注目した場合はまず初段から最終段までラビング用布
の繊維径を徐々に細くしてラビング処理するので、ラビ
ング処理の表面仕上げ効果が高くなりＳＴＮ液晶の配向
に要求される微細な処理が得られる。(5) Providing a plurality of the rubbing and cleaning treatment points has the effect of shortening the orientation treatment time per device (process throughput time). In addition, when paying particular attention to the rubbing treatment in a line that is treated at multiple locations, the rubbing treatment is performed by first gradually reducing the fiber diameter of the rubbing cloth from the first stage to the final stage. The fine processing required for the alignment of liquid crystals can be obtained.
【００２４】以上説明したように本発明は従来の空気中
または液中ラビング処理法に比較してラビング処理のワ
ーク部を恒温恒湿槽内に設置してラビング処理する優れ
た改善方法であり、高品位の液晶表示素子および液晶表
示素子の製造装置を提供できる。As described above, the present invention is an excellent method for improving the rubbing treatment by installing the work part of the rubbing treatment in the constant temperature and humidity chamber, as compared with the conventional rubbing treatment in air or liquid. It is possible to provide a high-quality liquid crystal display element and an apparatus for manufacturing the liquid crystal display element.
【図１】本発明の第１の実施例の液晶表示素子の製造方
法を説明するための斜視図FIG. 1 is a perspective view for explaining a method of manufacturing a liquid crystal display element according to a first embodiment of the present invention.
【図２】本発明の第２の実施例の液晶表示素子の製造方
法を説明するための断面図FIG. 2 is a sectional view for explaining a method of manufacturing a liquid crystal display element according to a second embodiment of the present invention.
【図３】本発明の第３の実施例の液晶表示素子の製造方
法を説明するためのブロック図FIG. 3 is a block diagram for explaining a method of manufacturing a liquid crystal display device according to a third embodiment of the present invention.
【図４】本発明の第４の実施例の液晶表示素子の製造装
置の一部斜視図FIG. 4 is a partial perspective view of an apparatus for manufacturing a liquid crystal display element according to a fourth embodiment of the present invention.
【図５】本発明の第５の実施例の液晶表示素子の製造方
法を説明するためのブロック図FIG. 5 is a block diagram for explaining a method of manufacturing a liquid crystal display device according to a fifth embodiment of the present invention.
【図６】一般的な液晶表示素子の断面図FIG. 6 is a sectional view of a general liquid crystal display device.
１，２２，２４，４１ ローラー ２，２１，４２ ラビング用布 ３，２５，４３ 基板 ４，４４ ステージ ５ 恒温恒湿槽 ６ 制御部 ２３ ブラシ ２６ 配向膜面側 ２７ 基板裏面 ３１ 工程１（ラビングおよび洗浄の同時工程） ３２ 工程２（キロヘルツ帯超音波洗浄工程） ３３ 工程３（メガヘルツ帯超音波洗浄工程） ４５ 基板とローラーの角度 ５１ 初段のラビング処理および洗浄工程 ５２ 最終段のラビング処理および洗浄工程 ５３ 初段の超音波洗浄工程 ５４ 最終段の超音波洗浄工程 1,2,24,41 Roller 2,21,42 Rubbing cloth 3,25,43 Substrate 4,44 Stage 5 Constant temperature and humidity chamber 6 Controller 23 Brush 26 Alignment film side 27 Substrate back 31 Step 1 (rubbing and Simultaneous cleaning process) 32 Process 2 (kHz ultrasonic cleaning process) 33 Process 3 (megahertz ultrasonic cleaning process) 45 Substrate-roller angle 51 Initial rubbing and cleaning process 52 Final rubbing and cleaning process 53 First-stage ultrasonic cleaning process 54 Last-stage ultrasonic cleaning process
Claims (8)
を行う液晶表示素子用基板との少なくともワーク部を恒
温恒湿槽内に設置して前記液晶表示素子上に形成された
配向膜をラビング処理することを特徴とする液晶表示素
子の製造方法。1. A rubbing treatment is applied to an alignment film formed on the liquid crystal display element by installing at least a work part of at least a rubbing machine and a liquid crystal display element substrate to be subjected to a rubbing treatment in a constant temperature and humidity chamber. A method for manufacturing a liquid crystal display element, comprising:
面とは反対側の面も恒温恒湿槽内で純水または界面活性
剤を含有する純水を流水として注ぎながらブラシ洗浄を
行うことを特徴とする請求項１記載の液晶表示素子の製
造方法。2. The surface of the liquid crystal display device substrate opposite to the surface on which the alignment film is formed is also brush-cleaned while pouring pure water or pure water containing a surfactant as running water in a constant temperature and humidity chamber. The method of manufacturing a liquid crystal display element according to claim 1, wherein
製造方法に加えて、キロヘルツ帯の超音波洗浄およびメ
ガヘルツ帯の超音波洗浄のうち少なくとも一つを行うこ
とを特徴とする液晶表示素子の製造方法。3. The liquid crystal display element according to claim 1 or 2, wherein at least one of ultrasonic cleaning in the kilohertz band and ultrasonic cleaning in the megahertz band is performed in addition to the method for manufacturing the liquid crystal display element. Manufacturing method.
び超音波洗浄工程のうち、少なくとも一つ以上の工程を
複数回繰り返すことを特徴とする請求項３記載の液晶表
示素子の製造方法。4. The method of manufacturing a liquid crystal display device according to claim 3, wherein at least one of the rubbing process, the brush cleaning process and the ultrasonic cleaning process is repeated a plurality of times.
ラビング用布の繊維径が徐々に小さくなるようにするこ
とを特徴とする請求項４記載の液晶表示素子の製造方
法。5. When the rubbing process is repeated a plurality of times,
The method for manufacturing a liquid crystal display element according to claim 4, wherein the fiber diameter of the rubbing cloth is gradually reduced.
グ処理するラビング機，前記液晶表示素子用基板の前記
配向膜が形成された面とは反対側の面を洗浄するための
ブラシ洗浄機のうち少なくとも一方を設置した恒温恒湿
槽を少なくとも有することを特徴とする液晶表示素子の
製造装置。6. A rubbing machine for rubbing an alignment film on a liquid crystal display element substrate, and a brush cleaning machine for cleaning the surface of the liquid crystal display element substrate opposite to the surface on which the alignment film is formed. An apparatus for manufacturing a liquid crystal display device, comprising at least a constant temperature and humidity chamber in which at least one of the above is installed.
ーのうち少なくとも一方のローラーと液晶表示素子用基
板との角度が任意に設定できるようにしたことを特徴と
する請求項６記載の液晶表示素子の製造装置。7. The liquid crystal display device according to claim 6, wherein the angle between at least one of the rubbing roller and the cleaning roller and the liquid crystal display device substrate can be arbitrarily set. apparatus.
ーのうち少なくとも一方のローラーと液晶表示素子用基
板との押圧を任意に設定できるようにしたことを特徴と
する請求項６または７記載の液晶表示素子の製造装置。8. The liquid crystal display element according to claim 6, wherein the pressure between at least one of the rubbing roller and the cleaning roller and the liquid crystal display element substrate can be set arbitrarily. Manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14022892A JPH05333336A (en) | 1992-06-01 | 1992-06-01 | Production of liquid crystal display element and apparatus for production of liquid crystal display element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14022892A JPH05333336A (en) | 1992-06-01 | 1992-06-01 | Production of liquid crystal display element and apparatus for production of liquid crystal display element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05333336A true JPH05333336A (en) | 1993-12-17 |
Family
ID=15263889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14022892A Pending JPH05333336A (en) | 1992-06-01 | 1992-06-01 | Production of liquid crystal display element and apparatus for production of liquid crystal display element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05333336A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012032832A (en) * | 2011-10-17 | 2012-02-16 | Dic Corp | Manufacturing method of liquid crystal alignment film, manufacturing method of optical anisotropic body and manufacturing method of liquid crystal element |
-
1992
- 1992-06-01 JP JP14022892A patent/JPH05333336A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012032832A (en) * | 2011-10-17 | 2012-02-16 | Dic Corp | Manufacturing method of liquid crystal alignment film, manufacturing method of optical anisotropic body and manufacturing method of liquid crystal element |
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