JPH0521825Y2 - - Google Patents
Info
- Publication number
- JPH0521825Y2 JPH0521825Y2 JP2687687U JP2687687U JPH0521825Y2 JP H0521825 Y2 JPH0521825 Y2 JP H0521825Y2 JP 2687687 U JP2687687 U JP 2687687U JP 2687687 U JP2687687 U JP 2687687U JP H0521825 Y2 JPH0521825 Y2 JP H0521825Y2
- Authority
- JP
- Japan
- Prior art keywords
- skimmer
- handle
- flat cam
- mass spectrometer
- motion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000009616 inductively coupled plasma Methods 0.000 claims description 8
- 230000007246 mechanism Effects 0.000 claims description 5
- 238000005070 sampling Methods 0.000 claims description 3
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 13
- 150000002500 ions Chemical class 0.000 description 7
- 125000006850 spacer group Chemical group 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Description
【考案の詳細な説明】
＜産業上の利用分野＞
本考案は、高周波誘導結合プラズマと質量分析
計を結合させてなる高周波誘導結合プラズマ・質
量分析計（Inductiveiy Coupledly Plasma−
Mass Spectrometer 以下「ICP−MS」と略
す）に関する。[Detailed explanation of the invention] <Industrial application field> The invention is a high-frequency inductively coupled plasma mass spectrometer (Inductively Coupledly Plasma mass spectrometer) that combines a high-frequency inductively coupled plasma and a mass spectrometer.
Mass Spectrometer (hereinafter abbreviated as "ICP-MS").
＜従来の技術＞
ICP−MSは、高周波誘導結合プラズマを用い
て試料を励起させ、生じたイオンを、例えばノズ
ルとスキマーからなるサンプリングインターフエ
イスを介して質量分析計に導いて、特定質量のイ
オンを電気的に検出し、該イオン量を精密に測定
することによつて、上記試料中の被測定元素等を
分析するように構成されている。第２図はこのよ
うなICP−MSの従来例要部構成説明図であり、
図中、１は例えば、最外室１ａ、外室１ｂ、およ
び内室１ｃを有する三重管構造のプラズマトー
チ、２はプラズマトーチ１に例えば３回巻回され
た高周波誘導コイル、３は該コイル２にコンデン
サC1，C2を介して高周波電流を供給する高周波
電源、４は高周波誘導結合プラズマ、５は水冷構
造のフランジ、６は質量分析計へのサンプリング
インターフエイスのイオン取り込み口たるノズル
（以下、単に「ノズル」という）、７はスキマー、
８はノズル６の先端とスキマー７の先端との距離
を変えるために挿入されたスペーサ、９は真空ポ
ンプ（図示せず）で例えば10-1torr.まで真空吸引
されているフオアチヤンバー、１０は油拡散ポン
プ（図示せず）で例えば10-4torr.まで真空吸引さ
れているセンターチヤンバーである。この図にお
いて、コイル２にコンデンサC1，C2を介して高
周波電源３から高周波エネルギーが供給される
と、コイル２の周囲に高周波磁界（図示せず）が
形成される。この高周波磁界の近傍で、プラズマ
トーチ１内のアルゴンガス中に電子かイオンが植
えつけられると、該高周波磁界の作用で瞬時に高
周波誘導結合プラズマ４が生じる。該プラズマ４
内のイオンはノズル６を介してスキマー７内に引
き出され図示しない質量分析計で検出されるよう
になる。<Conventional technology> ICP-MS uses high-frequency inductively coupled plasma to excite a sample, and the generated ions are guided to a mass spectrometer via a sampling interface consisting of a nozzle and a skimmer to collect ions of a specific mass. By electrically detecting the ion and precisely measuring the amount of the ion, the element to be measured, etc. in the sample is analyzed. Figure 2 is an explanatory diagram of the main part configuration of a conventional example of such ICP-MS,
In the figure, 1 is, for example, a plasma torch with a triple tube structure having an outermost chamber 1a, an outer chamber 1b, and an inner chamber 1c, 2 is a high-frequency induction coil wound, for example, three times around the plasma torch 1, and 3 is the coil. 2 is a high-frequency power supply that supplies high-frequency current through capacitors C 1 and C 2 , 4 is a high-frequency inductively coupled plasma, 5 is a flange with a water-cooled structure, and 6 is a nozzle (which is the ion intake port of the sampling interface to the mass spectrometer). (hereinafter simply referred to as "nozzle"), 7 is a skimmer,
8 is a spacer inserted to change the distance between the tip of the nozzle 6 and the tip of the skimmer 7, 9 is a fore chamber that is vacuumed to, for example, 10 -1 torr. with a vacuum pump (not shown), and 10 is an oil The center chamber is vacuumed to, for example, 10 -4 torr. by a diffusion pump (not shown). In this figure, when high frequency energy is supplied to the coil 2 from the high frequency power supply 3 via capacitors C 1 and C 2 , a high frequency magnetic field (not shown) is formed around the coil 2 . When electrons or ions are planted in the argon gas in the plasma torch 1 in the vicinity of this high-frequency magnetic field, high-frequency inductively coupled plasma 4 is instantaneously generated by the action of the high-frequency magnetic field. The plasma 4
The ions inside are extracted into the skimmer 7 through the nozzle 6 and detected by a mass spectrometer (not shown).
＜考案が解決しようとする問題点＞
然し乍ら、上記従来例においては、フオアチヤ
ンバー９やセンターチヤンバー１０の内部が真空
状態でICP−MSが作動するため、ノズル６とス
キマー７の位置関係はICP−MSを作動させる前
に一定の位置関係に固定するようにしていた。即
ち、スキマー７がICP−MSの内部機構にネジ等
で固定されており、ノズル６は該ノズルと水冷構
造のフランジ５の間にスペーサ８が挿入されて該
ノズルとスキマー７の位置関係が固定されてい
る。また、様々な寸法のスペーサ８を入れ替える
ことによりスキマー７とノズル６の位置関係（間
隔等）が変化させられ、必要に応じて所望の位置
関係に固定させられてのちICP−MSが作動され
ていた。このため、ICP−MSが作動中に上記ノ
ズル６とスキマー７の位置関係を変えたいような
ときであつても、フオアチヤンバー９等が真空状
態で作動していること等から上記スペーサ８の交
換は不可能であり、該位置関係の変更ができず
ICP−MS使用上様々な不都合が生じていた。ま
た、上記スペーサ８を挿入してノズル６の先端と
スキマー７の先端との距離を一定に保つ方法を採
用しているため、該距離の微小調節が困難である
という欠点もあつた。<Problems to be solved by the invention> However, in the conventional example described above, since the ICP-MS operates with the inside of the front chamber 9 and the center chamber 10 in a vacuum state, the positional relationship between the nozzle 6 and the skimmer 7 is ICP-MS. Before activating the MS, it was fixed in a certain position. That is, the skimmer 7 is fixed to the internal mechanism of the ICP-MS with screws, etc., and the spacer 8 is inserted between the nozzle 6 and the flange 5 of the water-cooled structure to fix the positional relationship between the nozzle and the skimmer 7. has been done. In addition, by replacing spacers 8 of various dimensions, the positional relationship (interval, etc.) between the skimmer 7 and nozzle 6 can be changed, and the ICP-MS can be operated after fixing the desired positional relationship as necessary. Ta. Therefore, even if it is desired to change the positional relationship between the nozzle 6 and the skimmer 7 while the ICP-MS is operating, it is not necessary to replace the spacer 8 because the force chamber 9 and other components are operating in a vacuum state. possible, and the positional relationship cannot be changed.
Various inconveniences have arisen when using ICP-MS. Furthermore, since the method of inserting the spacer 8 to keep the distance between the tip of the nozzle 6 and the tip of the skimmer 7 constant is adopted, there is also a drawback that fine adjustment of the distance is difficult.
本考案はかかる状況に鑑みてなされたものであ
り、その目的は、ICP−MSの作動中でもノズル
６とスキマー７の位置関係を外部から容易に変え
ることができるICP−MSを提供することにある。 The present invention was devised in view of this situation, and its purpose is to provide an ICP-MS in which the positional relationship between the nozzle 6 and the skimmer 7 can be easily changed from the outside even while the ICP-MS is in operation. .
＜問題点を解決するための具体的手段＞
上述のような問題点を解決する本考案の特徴
は、ICP−MSにおいて、平カム機構の中央部に
設けられた溝がノツクピンに沿つてスライドする
ことにより、外部で操作されるハンドルの回転運
動がスキマーを紙面上で上下運動に変換されるよ
うに構成したことにある。<Specific means for solving the problems> The feature of the present invention that solves the above-mentioned problems is that in ICP-MS, the groove provided in the center of the flat cam mechanism slides along the dowel pin. Accordingly, the skimmer is configured so that the rotational movement of the handle operated externally is converted into an up-and-down movement on the plane of the paper.
＜実施例＞
以下、本考案について図を用いて詳しく説明す
る。第１図は本考案実施例の要部構成説明図であ
り、図中、第２図と同一記号は同一意味をもたせ
て使用しここでの重複説明は省略する。また、１
１は平カム、１２は回転可能なハンドル、１３は
ハンドル１２と一体的に結合され該ハンドルの回
転運動を平カム１１へ第１図の紙面上を左右方向
に動く直線運動に変換して伝達するネジ部、１４
はスキマー８に圧入されたノツクピン、１５はノ
ツクピン１４に沿つてスライドするように平カム
１１の中央部付近に一定の角度をもつて設けられ
た溝、１６はスキマー８を第１図の紙面上で左右
方向に動くのを防止して上下方向に移動させるた
めのスキマー受け、１７，１７′は平カム１１を
第１図の紙面上で左右方向に移動させるための軸
受け、１８，１８′は真空シール用のガスケツト
である。このような要部構成からなる本考案の実
施例において、ハンドル１が回転されると、該回
転運動がネジ部１３で直線運動に変換されて平カ
ム１１に伝達され、該平カムが第１図の紙面上を
左右方向へ移動するようになる。このとき、ノツ
クピン１４が圧入されているスキマー７は上記ス
キマー受け１６によつて第１図の紙面上で左右方
向に動くのを規制されているため、ノツクピン１
４が相対的に溝１５に沿つて動くのに対応してス
キマー７が第１図の紙面上を上下方向に移動する
ようになる。従つて、ハンドル１を例えば時計方
向に回転させるとスキマー７を第１図の紙面上で
上方向に移動させるという様に、ハンドル１をフ
オアチヤンバー９の外壁の外側（即ちICP−MS
の外部）から回転させてスキマー７を上下動させ
該スキマーとノズル６の位置関係を調節できるよ
うになる。<Example> Hereinafter, the present invention will be explained in detail using figures. FIG. 1 is an explanatory diagram of the main structure of an embodiment of the present invention. In the figure, the same symbols as in FIG. 2 are used with the same meanings, and redundant explanation will be omitted here. Also, 1
1 is a flat cam, 12 is a rotatable handle, and 13 is integrally connected to the handle 12, and converts the rotational motion of the handle into a linear motion moving left and right on the plane of the paper of FIG. 1 to the flat cam 11, and transmits the same. screw part, 14
1 is a dowel pin press-fitted into the skimmer 8, 15 is a groove provided at a certain angle near the center of the flat cam 11 so as to slide along the dowel pin 14, and 16 is a dowel pin press-fitted into the skimmer 8. 17 and 17' are bearings for moving the flat cam 11 in the horizontal direction on the paper surface of FIG. This is a gasket for vacuum sealing. In the embodiment of the present invention having such a configuration of main parts, when the handle 1 is rotated, the rotational motion is converted into a linear motion by the threaded portion 13 and transmitted to the flat cam 11, and the flat cam You will be able to move left and right on the page of the diagram. At this time, the skimmer 7 into which the knock pin 14 is press-fitted is regulated by the skimmer receiver 16 from moving in the left-right direction on the paper surface of FIG.
In response to the relative movement of the skimmer 4 along the groove 15, the skimmer 7 moves vertically on the plane of FIG. Therefore, when the handle 1 is rotated clockwise, for example, the skimmer 7 is moved upward in the plane of the paper of FIG.
The positional relationship between the skimmer and the nozzle 6 can be adjusted by rotating the skimmer 7 from the outside) to move it up and down.
尚、本考案は上述の実施例に限定されることな
く種々の変形が可能であり、例えば上記スキマー
に直接ネジ部を設け該ネジ部を外部から回わしあ
たかもカメラのレンズを動かすようにスキマーを
直線的に動かすような構成にしてもよいものとす
る。 Note that the present invention is not limited to the above-mentioned embodiments and can be modified in various ways. For example, the skimmer may be provided with a threaded portion directly and the threaded portion may be turned from the outside to move the skimmer as if moving a camera lens. It may be configured to move in a straight line.
＜効果＞
以上詳しく説明したような本考案によれば、ハ
ンドル１を回転させてスキマー７を上下動させる
ような構成であるため、ICP−MS作動中でもノ
ズル６とスキマー７の位置関係を外部から容易か
つ連続的に変えられる利点がある。また、前記従
来例ようにスペーサを挿脱する必要がないため、
ノズル６とスキマー７の位置関係も微小な間隔変
化まで調節できる利点もある。<Effects> According to the present invention as described above in detail, the skimmer 7 is moved up and down by rotating the handle 1, which has the advantage that the positional relationship between the nozzle 6 and the skimmer 7 can be easily and continuously changed from the outside even during the operation of the ICP-MS. In addition, since there is no need to insert or remove a spacer as in the conventional example,
There is also the advantage that the positional relationship between the nozzle 6 and the skimmer 7 can be adjusted even to minute changes in the distance.
第１図は本考案実施例の要部構成説明図、第２
図は従来例の要部構成説明図である。
１……プラズマトーチ、６……ノズル、７……
スキマー、９……フオアチヤンバー、１１……平
カム、１２……ハンドル、１３……ネジ部、１４
……ノツクピン、１５……溝、１６……スキマー
受け、１７，１７′……軸受け、１８，１８′……
ガスケツト。
Figure 1 is an explanatory diagram of the main part configuration of the embodiment of the present invention, Figure 2
The figure is an explanatory diagram of the main part configuration of a conventional example. 1... Plasma torch, 6... Nozzle, 7...
Skimmer, 9...Front chamber, 11...Flat cam, 12...Handle, 13...Threaded part, 14
... Knock pin, 15 ... Groove, 16 ... Skimmer receiver, 17, 17' ... Bearing, 18, 18' ...
Gasket.
Claims (1)
合させてなり、該質量分析計へのサンプリング
インターフエイスを構成するノズルとスキマー
の位置関係を調整できるようにした分析計にお
いて、前記分析計の外部から回転可能なハンド
ルと、該ハンドルの回転運動が水平方向の直線
運動に変換されて伝達される平カム機構と、該
平カム機構に設けられている溝と、前記スキマ
ーの水平方向の動きを規制し上下方向にのみ移
動させるスキマー受けと、前記スキマーに圧入
されたノツクピンとを具備し、該ノツクピンに
沿つて前記溝がスライドすることにより、前記
ハンドルの回転運動が前記スキマーの上下運動
に変換されるように構成してなる高周波誘導結
合プラズマ質量分析計。 (2) 前記平カム機構は、中央部に前記溝が設けら
れている平カムと、前記ハンドルと一体的に結
合され該ハンドルの回転運動を直線運動に変換
して平カムに伝達するネジ部とで構成されてな
る実用新案登録請求の範囲第(1)項記載の高周波
誘導結合プラズマ質量分析計。[Claims for Utility Model Registration] (1) High-frequency inductively coupled plasma and a mass spectrometer are combined, and the positional relationship between a nozzle and a skimmer that constitute a sampling interface to the mass spectrometer can be adjusted. The analyzer includes a handle rotatable from the outside of the analyzer, a flat cam mechanism for converting rotational movement of the handle into horizontal linear movement and transmitting the same, and a groove provided in the flat cam mechanism. , comprising a skimmer receiver that restricts the horizontal movement of the skimmer and moves it only in the vertical direction, and a knock pin press-fitted into the skimmer, and when the groove slides along the knock pin, the rotation of the handle is controlled. A high frequency inductively coupled plasma mass spectrometer configured such that motion is converted into vertical motion of the skimmer. (2) The flat cam mechanism includes a flat cam having the groove in the center thereof, and a screw portion that is integrally connected to the handle and converts rotational motion of the handle into linear motion and transmits the linear motion to the flat cam. A high frequency inductively coupled plasma mass spectrometer as set forth in claim (1) of the utility model registration.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2687687U JPH0521825Y2 (en) | 1987-02-25 | 1987-02-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2687687U JPH0521825Y2 (en) | 1987-02-25 | 1987-02-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63134450U JPS63134450U (en) | 1988-09-02 |
| JPH0521825Y2 true JPH0521825Y2 (en) | 1993-06-04 |
Family
ID=30828376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2687687U Expired - Lifetime JPH0521825Y2 (en) | 1987-02-25 | 1987-02-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0521825Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2010303358B2 (en) * | 2009-10-08 | 2016-04-21 | Perkinelmer U.S. Llc | Coupling devices and methods of using them |
-
1987
- 1987-02-25 JP JP2687687U patent/JPH0521825Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63134450U (en) | 1988-09-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7273996B2 (en) | Inductively coupled plasma alignment apparatus and method | |
| JPH03504059A (en) | High resolution plasma mass spectrometer | |
| JPH0521825Y2 (en) | ||
| CA2116821A1 (en) | Improvements in plasma mass spectrometry | |
| WO2020024920A1 (en) | Fuel gas proportional valve and electromagnetic driving device therefor | |
| Duan et al. | Characterization of a modified, low-power argon microwave plasma torch (MPT) as an atomization cell for atomic fluorescence spectrometry | |
| JP5145042B2 (en) | Sputtering apparatus and method for scattering material using a movable flat target | |
| Scott et al. | Highly reproducible laser beam scanning device for an internal source laser desorption microprobe Fourier transform mass spectrometer | |
| JP6747602B2 (en) | Ion source and ion analyzer | |
| CN220525750U (en) | Interface device for chromatographic mass spectrometry | |
| JP2956139B2 (en) | Quadrupole mass filter | |
| JPH0521249Y2 (en) | ||
| JP2009187678A (en) | Electric power feeder | |
| JPH079333Y2 (en) | Ion generator | |
| JPH07240169A (en) | Induction coupling plasma mass spectrometric device | |
| JPH09115697A (en) | Ion extraction part in cyclotron, and adjustment method thereof | |
| JPH0521248Y2 (en) | ||
| JPH0638372Y2 (en) | High frequency inductively coupled plasma mass spectrometer | |
| JPH0817382A (en) | Sample adjuster for use in charged particle beam device | |
| JPS5816750B2 (en) | Ion detection device for double focusing mass spectrometer | |
| JPH0521244Y2 (en) | ||
| JPH0479143A (en) | High-frequency induction coupling plasma mass spectrometer | |
| JPH09320514A (en) | Plasma ton source mass spectrograph | |
| JPH1186779A (en) | Time-of-flight mass spectrometer using high-frequency inductively coupled plasma | |
| JPH06323935A (en) | Sensor |