JPH05196044A - Rolling bearing for semiconductor manufacturing facility - Google Patents
Rolling bearing for semiconductor manufacturing facilityInfo
- Publication number
- JPH05196044A JPH05196044A JP610992A JP610992A JPH05196044A JP H05196044 A JPH05196044 A JP H05196044A JP 610992 A JP610992 A JP 610992A JP 610992 A JP610992 A JP 610992A JP H05196044 A JPH05196044 A JP H05196044A
- Authority
- JP
- Japan
- Prior art keywords
- rolling
- bearing
- semiconductor manufacturing
- outer ring
- inner ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Rolling Contact Bearings (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体製造設備に使用
される固体潤滑転がり軸受に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid lubricating rolling bearing used in semiconductor manufacturing equipment.
【０００２】[0002]
【従来の技術】半導体製造設備用転がり軸受は、高い清
浄度が要求される密封真空下で運転されるため、その潤
滑には、一般に、二硫化モリブデン等の層状物質、金、
銀、鉛等の軟質金属、ＰＴＦＥ、ポリイミド等の高分子
材料などの固体潤滑剤が用いられている。2. Description of the Related Art Rolling bearings for semiconductor manufacturing equipment are generally operated under a sealed vacuum which requires high cleanliness. Therefore, for lubrication thereof, layered substances such as molybdenum disulfide, gold,
Solid lubricants such as soft metals such as silver and lead, polymer materials such as PTFE and polyimide are used.
【０００３】ところで、近年、半導体製造分野では半導
体の集積度が増すにつれて回路パターンの線幅が微細化
しており、軸受から排出される固体潤滑剤の摩耗粉がパ
ターン上に付着すると種々の弊害を引き起こす可能性が
あることから、固体潤滑剤の特性として、本来の潤滑性
・耐久性の他に、特に低発塵性を要求するようになって
きている。By the way, in recent years, in the field of semiconductor manufacturing, the line width of circuit patterns has become finer as the degree of integration of semiconductors has increased, and if the abrasion powder of the solid lubricant discharged from the bearing adheres to the pattern, various adverse effects are caused. Because of the possibility of causing it, solid lubricants are required to have particularly low dusting property in addition to the original lubricity and durability.
【０００４】このような現状に鑑み、本出願人は、転が
り軸受を構成する部品のうち少なくとも転がり摩擦また
は滑り摩擦を生ずる表面に、平均分子量が５０００以下
のポリテトラフルオロエチレン（以下、簡単のため、低
分子量ＰＴＦＥと称す。）からなる潤滑皮膜を形成した
固体潤滑転がり軸受について既に出願している（特願平
３−１９０１５０号等）。従来より、転がり軸受の固体
潤滑剤として用いられているＰＴＦＥは平均分子量が１
×１０5 以上、主に、１×１０6〜１×１０7のものであ
るが、低分子量ＰＴＦＥを用いて潤滑皮膜を形成するこ
とにより、潤滑性、耐久性、低発塵性等に優れた潤滑皮
膜を得ることができることを上記出願において示した。
これらの効果は、低分子量ＰＴＦＥが、従来より固体潤
滑剤として用いられているＰＴＦＥに比べて、剪断強度
が著しく小く、また、転着性に優れていることによるも
のであった。In view of the above situation, the applicant of the present invention has found that polytetrafluoroethylene having an average molecular weight of 5,000 or less (hereinafter, for the sake of simplicity, on the surface of at least rolling friction or sliding friction among the components constituting the rolling bearing). , Which is referred to as low molecular weight PTFE), has already applied for a solid lubricating rolling bearing having a lubricating film formed thereon (Japanese Patent Application No. 3-190150, etc.). Conventionally, PTFE used as a solid lubricant for rolling bearings has an average molecular weight of 1
It is more than × 10 5 , mainly 1 × 10 6 to 1 × 10 7 , but by forming a lubricating film using low molecular weight PTFE, it has excellent lubricity, durability, low dust generation, etc. It has been shown in the above application that a different lubricating coating can be obtained.
These effects were due to the fact that low-molecular-weight PTFE has remarkably small shear strength and excellent transferability as compared with PTFE conventionally used as a solid lubricant.
【０００５】[0005]
【発明が解決しようとする課題】近時の半導体集積度の
向上には著しいものがあり、半導体製造分野では回路パ
ターンの線幅をより一層微細化する必要に迫られてい
る。そのため、半導体回路マスク作成において、従来の
縮小投影露出法に代えて電子ビーム描画法等を採用する
傾向にある。図３は電子ビーム描画法の概念図を示す。
電子ビーム描画法は、電子顕微鏡と同じように、高速中
において電子銃のカソードから放射された電子を高電圧
で加速し、さらに電磁場において集束し、偏向電極によ
って走査する方法であるが、焦点面で０．０２μｍ程度
まで集光することができ、０．１〜１μｍの微細パター
ンを形成することが可能である。Recently, there has been a remarkable improvement in the degree of integration of semiconductors, and in the field of semiconductor manufacturing, there is an urgent need to further reduce the line width of circuit patterns. Therefore, in the production of semiconductor circuit masks, there is a tendency to adopt an electron beam drawing method or the like instead of the conventional reduced projection exposure method. FIG. 3 shows a conceptual diagram of the electron beam drawing method.
Like the electron microscope, the electron beam drawing method is a method of accelerating electrons emitted from the cathode of an electron gun at high voltage at high speed, further focusing in an electromagnetic field, and scanning with a deflection electrode. It is possible to collect light up to about 0.02 μm, and it is possible to form a fine pattern of 0.1 to 1 μm.
【０００６】ところで、電子ビーム描画法の一つの特徴
は、マスク近傍の装置あるいは部材の材質が非磁性でな
ければならないということである。これは、マスク近傍
に磁性体があると、偏向器の電磁場の影響で磁性体に残
留磁気が発生し、この残留磁気が電子ビームの解像度等
に悪影響を及ぼすからである。また、磁性体には、加工
ひずみ、熱ひずみ、さらに、回転や滑りを伴う場合には
その際に発生する静電気等によっても残留磁気が生じ
る。したがって、電子ビーム描画法を採用する場合、マ
スク近傍の移動テーブル、搬送装置などを非磁性材で構
成することは必須であり、この点から、これら装置に組
み込まれる軸受にも非磁性が当然に要求されることにな
る。勿論、この場合にも、軸受の低発塵性が厳格に要求
されることには変わりない。By the way, one of the characteristics of the electron beam drawing method is that the material of the device or member near the mask must be non-magnetic. This is because if there is a magnetic substance in the vicinity of the mask, remanence is generated in the magnetic substance due to the influence of the electromagnetic field of the deflector, and this residual magnetism adversely affects the resolution of the electron beam. In addition, remanence is generated in the magnetic body due to processing strain, thermal strain, and static electricity generated at the time of rotation or slippage. Therefore, when adopting the electron beam drawing method, it is indispensable that the moving table near the mask, the transfer device, and the like are made of a non-magnetic material. From this point, the bearings incorporated in these devices are naturally non-magnetic. Will be required. In this case, of course, the low dust generation of the bearing is still strictly required.
【０００７】そこで、本発明の目的は、耐久性、低発塵
性等の基本的特性に加え、さらに非磁性が要求される環
境下で使用することのできる半導体製造設備用転がり軸
受を提供することある。Therefore, an object of the present invention is to provide a rolling bearing for semiconductor manufacturing equipment which can be used in an environment where basic properties such as durability and low dust generation are required, and further non-magnetism is required. There are things.
【０００８】[0008]
【課題を解決するための手段】本発明の半導体製造設備
用転がり軸受は、半導体製造設備に用いられる転がり軸
受であって、この軸受を構成する内輪、外輪、転動体、
および保持器を非磁性材で形成し、かつ、この軸受の転
がり摩擦または滑り摩擦を生ずる構成部品のうち、少な
くとも転動体の表面に平均分子量が５０００以下のポリ
テトラフルオロエチレンからなる潤滑皮膜を形成したこ
とを特徴とする。A rolling bearing for semiconductor manufacturing equipment according to the present invention is a rolling bearing used in semiconductor manufacturing equipment, and includes an inner ring, an outer ring, rolling elements, and
And a cage made of a non-magnetic material, and a lubricating film made of polytetrafluoroethylene having an average molecular weight of 5000 or less is formed on at least the surface of the rolling element among the components that cause rolling friction or sliding friction of the bearing. It is characterized by having done.
【０００９】そして、非磁性材として、Ｍｎ−Ｃｒ系オ
ーステナイト鋼、オーステナイト系ステンレス鋼、高分
子材を用いるようにした。Ｍｎ−Ｃｒ系オーステナイト
鋼としては、例えば、１０〜２０％Ｍｎ、３〜２０％Ｃ
ｒを含有する鋼がある。これに、オーステナイト相の安
定化を目的として、０〜５％Ｎｉ、０〜０．２５％Ｎが
添加されることがある。また、オーステナイト系ステン
レス鋼としては、ＳＵＳ３０４が一般的である。As the non-magnetic material, Mn--Cr type austenitic steel, austenitic stainless steel, and polymer material are used. As the Mn-Cr austenitic steel, for example, 10 to 20% Mn and 3 to 20% C
There is steel containing r. To this, 0-5% Ni and 0-0.25% N may be added for the purpose of stabilizing an austenite phase. SUS304 is generally used as the austenitic stainless steel.
【００１０】[0010]
【作用】低分子量ＰＴＦＥを用いて潤滑皮膜を形成する
ことにより、潤滑性、耐久性、低発塵性に優れた潤滑皮
膜を得ることができる。また、軸受部品を非磁性材で形
成することにより、軸受部に残留磁気が発生しなくな
る。By forming a lubricating film using low molecular weight PTFE, it is possible to obtain a lubricating film excellent in lubricity, durability and low dust generation. Further, by forming the bearing component with a non-magnetic material, residual magnetism does not occur in the bearing portion.
【００１１】[0011]
【実施例】以下、本発明の実施例について説明する。EXAMPLES Examples of the present invention will be described below.
【００１２】図１は、本発明を深溝玉軸受に適用した実
施例について説明する。この軸受は、内輪１、外輪２、
内・外輪１、２間に介在する複数の転動体３、転動体３
を円周等間隔に保持する保持器４といった軸受構成部品
で構成される。これらの軸受構成部品は非磁性材で形成
されており、例えば、内輪１および外輪２はＭｎ−Ｃｒ
系オーステナイト鋼、転動体３はセラミック（Ｓｉ
3Ｎ4）、保持器４はオーステナイト系ステンレス鋼で形
成される。そして、内・外輪１、２の転走面および転動
体３の表面にはそれぞれ平均分子量が５０００以下のＰ
ＴＦＥ（低分子量ＰＴＦＥ）の潤滑皮膜１ａ、２ａ、３
ａが形成されている。これらの潤滑皮膜は、低分子量Ｐ
ＴＦＥ（例えば、日本アチソン製ＡＲＣ７）を、２５ｃ
ｍ離れた位置から皮膜形成面にスプレーして付着させた
もので、この場合の平均皮膜厚さは０．６μｍ程度であ
った。ただし、同図では皮膜厚さをかなり誇張してあ
る。低分子量ＰＴＦＥの皮膜コーティング法としては、
上記スプレー法による他、浸漬法等がある。尚、本実施
例では内・外輪１、２の転走面および転動体３の表面に
潤滑皮膜を形成するようにしたが、潤滑皮膜は少なくと
も転動体３の表面に形成すれば良い。また、同図では内
・外輪１、２の外表面全体に潤滑皮膜１ａ、２ａが形成
されているが、嵌合面等の潤滑皮膜が本来不要な部分に
ついては、マスキングによって皮膜処理を施さない、あ
るいは、最終製品となる前に除去するようにすると良
い。さらに、軸受の形式は、同図に示すような深溝玉軸
受に限らず、広く転がり軸受一般に適用することができ
る。FIG. 1 illustrates an embodiment in which the present invention is applied to a deep groove ball bearing. This bearing has an inner ring 1, an outer ring 2,
A plurality of rolling elements 3, rolling elements 3 interposed between the inner and outer rings 1, 2.
Is constituted by a bearing component such as a cage 4 for holding the bearings at regular intervals. These bearing components are made of a non-magnetic material. For example, the inner ring 1 and the outer ring 2 are made of Mn-Cr.
Austenitic steel, rolling element 3 is made of ceramic (Si
3 N 4 ) and the cage 4 are made of austenitic stainless steel. Then, on the rolling surfaces of the inner and outer races 1 and 2 and on the surfaces of the rolling elements 3, P having an average molecular weight of 5,000 or less, respectively.
TFE (low molecular weight PTFE) lubricating film 1a, 2a, 3
a is formed. These lubricating coatings have a low molecular weight P
TFE (for example, ARC7 made by Nippon Acheson) 25c
It was sprayed and attached to the film-forming surface from a position distant by m, and the average film thickness in this case was about 0.6 μm. However, in the figure, the film thickness is exaggerated considerably. As a film coating method of low molecular weight PTFE,
In addition to the above-mentioned spray method, there is a dipping method. In this embodiment, the lubricating film is formed on the rolling surfaces of the inner and outer races 1, 2 and the surface of the rolling element 3, but the lubricating film may be formed on at least the surface of the rolling element 3. Further, in the figure, the lubricating coatings 1a and 2a are formed on the entire outer surfaces of the inner and outer races 1 and 2, but the portions such as the mating surfaces where the lubricating coating is originally unnecessary are not subjected to coating treatment by masking. Or, it is better to remove it before it becomes the final product. Further, the type of bearing is not limited to the deep groove ball bearing as shown in the figure, but can be widely applied to rolling bearings in general.
【００１３】図２は、上記構成の転がり軸受（軸受Ａと
する）と、上記構成において潤滑皮膜１ａ、２ａ、３ａ
を形成していない転がり軸受（軸受Ｂとする）とについ
て行なった発塵試験の結果を示す。尚、内輪１および外
輪２の形成材料はＭｎ−Ｃｒ系オーステナイト鋼のＹＨ
Ｄ５０（日立金属製）、転動体３の形成材料はセラミッ
ク、保持器４の形成材料はオーステナイト系ステンレス
鋼のＳＵＳ３０４とした。また、試験は、回転数：５０
ｒｐｍ、スラスト荷重：１０Ｎ、真空度：１０-6Ｔｏｒ
ｒ、温度：室温の条件下で行なった。同図に示すよう
に、軸受Ａの相対発塵量は、軸受Ｂのそれに比べて１０
分の１以下であった。FIG. 2 shows the rolling bearing (bearing A) having the above structure and the lubricating coatings 1a, 2a and 3a having the above structure.
The results of a dusting test conducted on a rolling bearing (bearing B) on which no bearing is formed are shown. The material for forming the inner ring 1 and the outer ring 2 is YH of Mn-Cr austenitic steel.
D50 (manufactured by Hitachi Metals), the forming material of the rolling elements 3 was ceramic, and the forming material of the cage 4 was SUS304 of austenitic stainless steel. In addition, the test, rotation speed: 50
rpm, thrust load: 10N, the degree of vacuum: 10- 6 Tor
r, temperature: Performed under the conditions of room temperature. As shown in the figure, the relative dust generation amount of the bearing A is 10 times that of the bearing B.
It was less than one-third.
【００１４】内・外輪１、２の形成材料としては、上記
ＹＨＤ５０の他、例えば、Ｃ０．６０％、Ｓｉ０．９５
％、Ｍｎ１２．５％、Ｎｉ２．４％、Ｃｒ１０．２％を
主に含むＭｎ−Ｃｒ系オーステナイト鋼に、予め窒化処
理をし、その後に浸炭窒化処理をして形成された窒素富
化層による表面硬化層を有する非磁性材（特願平２−２
６２２６８号参照）、セラミック、さらに、軽荷重であ
ればオーステナイト系ステンレス鋼のＳＵＳ３０４等を
用いることができる。As the material for forming the inner and outer rings 1 and 2, in addition to the above YHD50, for example, C0.60%, Si0.95
%, Mn 12.5%, Ni 2.4%, and Cr 10.2% are mainly contained in the Mn-Cr-based austenitic steel, which is subjected to nitriding treatment in advance and then carbonitriding treatment to form a nitrogen-rich layer. Non-magnetic material with surface hardened layer (Japanese Patent Application No. 2-2
No. 62268), ceramics, and austenitic stainless steel such as SUS304 can be used if the load is light.
【００１５】また、保持器４の形成材料としては、ＳＵ
Ｓ３０４の他、ＮＴＮ精密樹脂製ルーロンＥ等の高分子
材を用いることができる。As a material for forming the cage 4, SU is used.
In addition to S304, a polymer material such as NTN precision resin Rulon E can be used.
【００１６】[0016]
【発明の効果】以上説明したように、本発明によれば、
軸受構成部品を非磁性材で形成すると共に、転がり摩擦
または滑り摩擦を生じる軸受構成部品のうち少なくとも
転動体の表面に平均分子量が５０００以下のＰＴＦＥか
らなる潤滑皮膜を形成するようにしたので、耐久性、低
発塵性に優れ、しかも非磁性を有する転がり軸受を提供
することができる。As described above, according to the present invention,
The bearing components are made of non-magnetic material, and a lubricating film made of PTFE with an average molecular weight of 5000 or less is formed on at least the surface of the rolling elements of the bearing components that cause rolling friction or sliding friction. It is possible to provide a rolling bearing having excellent magnetic properties and low dust generation and having non-magnetism.
【００１７】したがって、本発明の転がり軸受を、特
に、電子ビーム描画装置の周辺機器・装置に用いること
によって、軸受部からの発塵、残留磁気による半導体品
質への悪影響がなくなり、半導体製造分野における半導
体集積度の向上に寄与することができる。Therefore, by using the rolling bearing of the present invention especially in the peripheral equipment of electron beam drawing apparatus, the adverse effect on the semiconductor quality due to dust generation from the bearing portion and residual magnetism is eliminated, and in the field of semiconductor manufacturing. This can contribute to the improvement of the degree of semiconductor integration.
【図１】本発明の実施例に係わる深溝玉軸受を示す断面
図である。FIG. 1 is a sectional view showing a deep groove ball bearing according to an embodiment of the present invention.
【図２】発塵試験の結果を示す図である。FIG. 2 is a diagram showing a result of a dusting test.
【図３】電子ビーム描画法の概念図である。FIG. 3 is a conceptual diagram of an electron beam drawing method.
１ 内輪 １ａ 潤滑皮膜 ２ 外輪 ２ａ 潤滑皮膜 ３ 転動体 ３ａ 潤滑皮膜 ４ 保持器 1 Inner ring 1a Lubrication film 2 Outer ring 2a Lubrication film 3 Rolling element 3a Lubrication film 4 Cage
Claims (5)
であって、この軸受を構成する内輪、外輪、転動体、お
よび保持器を非磁性材で形成し、かつ、この軸受の転が
り摩擦または滑り摩擦を生ずる軸受構成部品のうち、少
なくとも転動体の表面に平均分子量が５０００以下のポ
リテトラフルオロエチレンからなる潤滑皮膜を形成した
ことを特徴とする半導体製造設備用転がり軸受。1. A rolling bearing used in semiconductor manufacturing equipment, wherein an inner ring, an outer ring, a rolling element, and a cage constituting the bearing are made of a non-magnetic material, and the rolling friction or sliding friction of the bearing. A rolling bearing for semiconductor manufacturing equipment, wherein a lubricating film made of polytetrafluoroethylene having an average molecular weight of 5000 or less is formed on at least the surface of the rolling element among the bearing components that cause the above.
イト鋼で形成し、転動体をセラミックで形成した請求項
１の半導体製造設備用転がり軸受。2. The rolling bearing for semiconductor manufacturing equipment according to claim 1, wherein the inner ring and the outer ring are made of Mn—Cr-based austenitic steel, and the rolling elements are made of ceramics.
イト鋼で形成し、転動体をセラミックで形成し、保持器
をオーステナイト系ステンレス鋼で形成した請求項１の
半導体製造設備用転がり軸受。3. The rolling bearing for a semiconductor manufacturing facility according to claim 1, wherein the inner ring and the outer ring are formed of Mn—Cr-based austenitic steel, the rolling elements are formed of ceramic, and the cage is formed of austenitic stainless steel.
イト鋼で形成し、転動体をセラミックで形成し、保持器
を高分子材で形成した請求項１の半導体製造設備用転が
り軸受。4. The rolling bearing for semiconductor manufacturing equipment according to claim 1, wherein the inner ring and the outer ring are made of Mn—Cr-based austenitic steel, the rolling elements are made of ceramics, and the cage is made of a polymer material.
系ステンレス鋼で形成し、転動体をセラミックで形成し
た請求項１の半導体製造設備用転がり軸受。5. The rolling bearing for semiconductor manufacturing equipment according to claim 1, wherein the inner ring, the outer ring and the cage are formed of austenitic stainless steel and the rolling elements are formed of ceramic.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4006109A JP3021902B2 (en) | 1992-01-17 | 1992-01-17 | Rolling bearings for semiconductor manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4006109A JP3021902B2 (en) | 1992-01-17 | 1992-01-17 | Rolling bearings for semiconductor manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05196044A true JPH05196044A (en) | 1993-08-06 |
| JP3021902B2 JP3021902B2 (en) | 2000-03-15 |
Family
ID=11629336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4006109A Expired - Fee Related JP3021902B2 (en) | 1992-01-17 | 1992-01-17 | Rolling bearings for semiconductor manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3021902B2 (en) |
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|---|---|---|---|---|
| CN100410555C (en) * | 2006-09-28 | 2008-08-13 | 大连三环复合材料技术开发有限公司 | Stainless steel solid bearing holder and its making method |
| CN102401425A (en) * | 2010-09-07 | 2012-04-04 | 珠海格力电器股份有限公司 | Vertical rotary air conditioner and transmission mechanism thereof |
| CN102444662A (en) * | 2010-10-13 | 2012-05-09 | 珠海格力电器股份有限公司 | Axial thrust bearing and vertical air conditioner using same |
| WO2013042441A1 (en) * | 2011-09-20 | 2013-03-28 | 富士フイルム株式会社 | Method for producing solid state imaging element |
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| NZ542843A (en) | 2005-10-05 | 2008-08-29 | Pure Depth Ltd | Method of manipulating visibility of images on a volumetric display |
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1992
- 1992-01-17 JP JP4006109A patent/JP3021902B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100410555C (en) * | 2006-09-28 | 2008-08-13 | 大连三环复合材料技术开发有限公司 | Stainless steel solid bearing holder and its making method |
| CN102401425A (en) * | 2010-09-07 | 2012-04-04 | 珠海格力电器股份有限公司 | Vertical rotary air conditioner and transmission mechanism thereof |
| CN102444662A (en) * | 2010-10-13 | 2012-05-09 | 珠海格力电器股份有限公司 | Axial thrust bearing and vertical air conditioner using same |
| WO2013042441A1 (en) * | 2011-09-20 | 2013-03-28 | 富士フイルム株式会社 | Method for producing solid state imaging element |
| JP2013069711A (en) * | 2011-09-20 | 2013-04-18 | Fujifilm Corp | Solid state image sensor manufacturing method |
| US8927321B2 (en) | 2011-09-20 | 2015-01-06 | Fujifilm Corporation | Method for producing solid-state imaging device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3021902B2 (en) | 2000-03-15 |
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