JPH05193972A - Heat treatment device for glass particulate deposit - Google Patents

Heat treatment device for glass particulate deposit

Info

Publication number
JPH05193972A
JPH05193972A JP2720792A JP2720792A JPH05193972A JP H05193972 A JPH05193972 A JP H05193972A JP 2720792 A JP2720792 A JP 2720792A JP 2720792 A JP2720792 A JP 2720792A JP H05193972 A JPH05193972 A JP H05193972A
Authority
JP
Japan
Prior art keywords
muffle
glass
exhaust
glass particulate
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2720792A
Other languages
Japanese (ja)
Inventor
Emi Ishimaru
恵美 石丸
Shinji Araki
真治 荒木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP2720792A priority Critical patent/JPH05193972A/en
Publication of JPH05193972A publication Critical patent/JPH05193972A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C03B37/0146—Furnaces therefor, e.g. muffle tubes, furnace linings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

PURPOSE:To form a preform having a profile stable in a longitudinal direction by monitoring the state of an oscillation valve provided in an auxiliary discharge pipe to control a gas feed system and discharge system and heating while maintaining the atmosphere in a muffle at a constant state. CONSTITUTION:The glass particulate deposit 3 inserted into the muffle 1 is heated by a heater 2 and is traversed in a vertical direction. A prescribed atmosphere gas is supplied from the gas feed device 9 through a gas feed pipe 4 to the muffle 1 and is discharged from the discharge device 10 via a discharge pipe 5. The inclination angle of the oscillation value 7 disposed in the auxiliary discharge pipe 6 is detected by a monitor device 8 and is fed back to the gas feed device 9 and the discharge devices 10, 11 to control these devices, by which the inclination angle of the oscillation value 7 is maintained constant. Consequently, the gaseous flow of the atmosphere gas in the muffle 1 is kept constant at all times in spite of traversing of the glass particulate deposit 3. The transparent glass preform having the profile stable in the longitudinal direction is thus obtd. by executing dehydrating and sintering under specified conditions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【産業上の利用分野】この発明は、ＶＡＤ法や外付け法
などで光ファイバ母材を製造する方法に関し、とくにそ
の工程中の、ガラス微粒子堆積体を加熱することにより
脱水処理や焼結（透明ガラス化）処理の工程を行なうガ
ラス微粒子堆積体の加熱処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an optical fiber preform by a VAD method, an external attachment method or the like, and in particular, dehydration treatment or sintering by heating a glass fine particle deposit during the process. The present invention relates to a heat treatment device for glass particulate deposits that performs the step of (transparent vitrification) treatment.

【０００２】[0002]

【従来の技術】ＶＡＤ法や外付け法などで光ファイバ母
材を製造するとき、バーナより酸水素火炎を生じさせて
その中に四塩化珪素などのガラスの原料ガス及びドーパ
ント材のガスを送り込み、加水分解反応によってガラス
微粒子（二酸化珪素）を生成し、これをターゲットに堆
積させて円柱状の多孔質のガラス微粒子堆積体を形成す
る。そして、この多孔質のガラス微粒子堆積体を加熱す
ることによって、ＯＨ基を除去（脱水）し、透明ガラス
化（焼結）処理する。脱水処理と焼結処理とは、同時に
行なうこともあるし、最初にガラスの溶融温度よりも低
い温度で加熱することにより脱水処理のみを行ない、つ
ぎに温度をガラス溶融温度に上昇させて透明ガラス化処
理を行なうというように２段階に分けて処理を行なうこ
ともある。こうして透明なガラス母材を作り、これを溶
融して線引き紡糸することによって細い光ファイバを作
る。2. Description of the Related Art When manufacturing an optical fiber preform by a VAD method or an external attachment method, an oxyhydrogen flame is generated from a burner and a raw material gas of glass such as silicon tetrachloride and a gas of a dopant material are sent into the flame. Glass particles (silicon dioxide) are generated by the hydrolysis reaction and deposited on a target to form a cylindrical porous glass particle deposit body. Then, by heating this porous glass particle deposit body, the OH groups are removed (dehydrated), and a transparent vitrification (sintering) process is performed. The dehydration treatment and the sintering treatment may be performed at the same time, or only the dehydration treatment is performed by first heating at a temperature lower than the melting temperature of glass, and then the temperature is raised to the glass melting temperature to clear glass. In some cases, the processing is performed in two steps, such as performing the processing. In this way, a transparent glass preform is produced, and this is melted and drawn and spun to form a thin optical fiber.

【０００３】従来、この脱水や焼結の処理は図３または
図４のような加熱処理装置により行なわれている。すな
わち、たとえばカーボンなどで作ったヒーター２を、石
英管で形成したマッフル１の周囲に配置し、マッフル１
を加熱する加熱炉（電気炉）を形成する。そして、この
マッフル１中にガラス微粒子堆積体３を挿入する。ガラ
ス微粒子堆積体３はターゲット棒３１の下部に形成され
ており、このターゲット棒３１によりつり下げられて保
持される。マッフル１の最上部には着脱可能な蓋が設け
られており、この蓋を開いてガラス微粒子堆積体３を挿
入する。マッフル１中でガラス微粒子堆積体３を加熱
し、脱水や透明ガラス化処理を行なう。透明ガラス化さ
れた部分は、体積が減少するので図４のガラス微粒子堆
積体３の下部のように細くなる。マッフル１には給気管
４と排気管５とが設けられており、これらを通じてたと
えば不活性ガスや脱水性のガスがマッフル１中に給・排
気され、マッフル１の内部の雰囲気の調整が行なわれ
る。Conventionally, the dehydration and sintering treatments have been performed by a heat treatment apparatus as shown in FIG. 3 or FIG. That is, for example, a heater 2 made of carbon or the like is arranged around a muffle 1 formed of a quartz tube, and the muffle 1
A heating furnace (electric furnace) for heating is formed. Then, the glass particle deposit body 3 is inserted into the muffle 1. The glass particle deposit body 3 is formed below the target rod 31, and is suspended and held by the target rod 31. A removable lid is provided on the top of the muffle 1, and the glass particulate deposit body 3 is inserted by opening the lid. The fine glass particle deposit body 3 is heated in the muffle 1 to perform dehydration and transparent vitrification treatment. Since the volume of the transparent vitrified portion decreases, it becomes thin like the lower portion of the glass particle deposit body 3 in FIG. The muffle 1 is provided with an air supply pipe 4 and an exhaust pipe 5, through which, for example, an inert gas or a dehydrating gas is supplied / exhausted into the muffle 1 to adjust the atmosphere inside the muffle 1. .

【０００４】図３に示す加熱処理装置はいわゆる均熱炉
であり、ヒーター２がマッフル１のほぼ全体を覆ってそ
の全体を均一に加熱する。そのため、この図３の加熱処
理装置ではガラス微粒子堆積体３はマッフル１の内部で
固定されたままの状態でよい。また、図４に示す加熱処
理装置はいわゆる傾斜型の加熱炉であり、マッフル１の
中央部にのみヒーター２が装着してあって、その中央部
のみが高熱のヒートゾーンとなっている。そこで、ガラ
ス微粒子堆積体３の全体を均一に加熱するため、ガラス
微粒子堆積体３を上下方向にトラバースさせるようにし
ている。The heat treatment apparatus shown in FIG. 3 is a so-called soaking furnace, and the heater 2 covers almost the entire muffle 1 and heats the entire muffle 1 uniformly. Therefore, in the heat treatment apparatus of FIG. 3, the glass particle deposit body 3 may remain fixed inside the muffle 1. The heat treatment apparatus shown in FIG. 4 is a so-called slant type heating furnace, in which the heater 2 is attached only to the central portion of the muffle 1, and only the central portion is a high heat heat zone. Therefore, in order to uniformly heat the entire glass particle deposit body 3, the glass particle deposit body 3 is traversed in the vertical direction.

【０００５】[0005]

【発明が解決しようとする課題】しかしながら、従来の
ガラス微粒子堆積体の加熱処理装置ではいずれも問題が
ある。すなわち、図３の均熱炉型の加熱処理装置ではマ
ッフル１の全体を加熱するため、大きな電力が必要であ
る。また、長期間使用した場合、マッフル１の交換が必
要となるが、このときマッフル１の広い範囲をヒーター
２で加熱するようにしているので、マッフル１の部分的
な修理や交換ができず、マッフル１の全体を廃却せねば
ならず、不経済である。However, all of the conventional heat treatment apparatuses for glass particle deposits have problems. That is, since the soaking furnace type heat treatment apparatus of FIG. 3 heats the entire muffle 1, a large amount of electric power is required. In addition, when used for a long period of time, the muffle 1 needs to be replaced, but at this time, since the wide range of the muffle 1 is heated by the heater 2, the muffle 1 cannot be partially repaired or replaced, It is uneconomical because the whole muffle 1 must be abolished.

【０００６】一方、図４の傾斜型加熱処理装置の場合
は、ヒーター２でマッフル１の一部を加熱するようにし
ているのでこのような問題は生じないが、脱水あるいは
焼結のための加熱処理工程にしたがってガラス微粒子堆
積体３を上下にトラバースさせなければならないので、
そのガラス微粒子堆積体３の移動にともなってマッフル
１内の空間領域が変動することになる。そのため、給・
排気の気流が乱れ、マッフル１内の全域にわたり均一な
一定の雰囲気に保つことが難しくなり、ガラス微粒子堆
積体３の長手方向にわたって一定したプロファイルを持
つプリフォームを製造することが困難になる、等々の問
題がある。On the other hand, in the case of the inclined type heat treatment apparatus of FIG. 4, since the heater 2 heats a part of the muffle 1, this problem does not occur, but heating for dehydration or sintering is performed. Since it is necessary to traverse the glass particle deposit body 3 up and down according to the treatment process,
With the movement of the glass particle deposit body 3, the spatial region in the muffle 1 changes. Therefore, salary
The air flow of the exhaust gas is disturbed, it becomes difficult to maintain a uniform and uniform atmosphere throughout the muffle 1, it becomes difficult to manufacture a preform having a constant profile in the longitudinal direction of the glass particle deposit body 3, and so on. There is a problem.

【０００７】この発明は、上記に鑑み、大電力が不要
で、かつ修理・交換時の経済性を高めることができると
ともに、給・排気の気流の乱れを防いで均一なプロファ
イルを持つガラスプリフォームを作製することを可能な
らしめる、ガラス微粒子堆積体の加熱処理装置を提供す
ることを目的とする。In view of the above, the present invention is a glass preform which does not require a large amount of electric power, can improve the economical efficiency at the time of repair / replacement, and can prevent the turbulence of the air flow of supply / exhaust and have a uniform profile It is an object of the present invention to provide a heat treatment apparatus for glass particulate deposits, which makes it possible to produce

【０００８】[0008]

【課題を解決するための手段】上記の目的を達成するた
め、この発明によるガラス微粒子堆積体の加熱処理装置
では、マッフルに補助排気管を設けてその排気状態を監
視し、これにより給気系及び排気系をフィードバック制
御することが特徴となっており、その結果、ガラス微粒
子堆積体のトラバースにかかわらずマッフル内の雰囲気
ガスの気流が一定のものとすることができ、もって長手
方向に安定したプロファイルをもつ透明ガラスプリフォ
ームを低い製造コストで得ることができるようになる。In order to achieve the above object, in the heat treatment apparatus for depositing glass fine particles according to the present invention, an auxiliary exhaust pipe is provided in the muffle to monitor the exhaust condition, and thereby the air supply system is provided. Also, feedback control of the exhaust system is featured, and as a result, the air flow of the atmospheric gas in the muffle can be made constant regardless of the traverse of the glass particulate deposits, and thus stable in the longitudinal direction. It becomes possible to obtain a transparent glass preform having a profile at a low manufacturing cost.

【０００９】[0009]

【実施例】以下、この発明の一実施例について図面を参
照しながら詳細に説明する。図１はこの発明の一実施例
にかかるガラス微粒子堆積体の加熱処理装置の全体を示
すものである。この実施例では図４と同様の傾斜型加熱
炉を採用している。すなわち図１に示すように、石英ガ
ラスで円筒形に形成したマッフル１の中央部の周囲に、
たとえばカーボンなどで作ったヒーター２が配置され、
マッフル１の中央部のみが加熱され、その中央部のみが
高熱のヒートゾーンとなっている。ガラス微粒子堆積体
３はこのマッフル１中に挿入されて加熱され、脱水処理
や透明ガラス化処理が行なわれるが、ガラス微粒子堆積
体３の全体を均一に加熱するため、ガラス微粒子堆積体
３が上下方向にトラバースさせられる。ガラス微粒子堆
積体３はターゲット棒３１の下部に形成されており、こ
のターゲット棒３１によりつり下げられて保持される。
マッフル１の最上部には着脱可能な蓋が設けられてお
り、この蓋を開いてガラス微粒子堆積体３を挿入する。
この図ではマッフル１中でガラス微粒子堆積体３の透明
ガラス化処理が行なわれており、透明ガラス化された部
分が、図１のガラス微粒子堆積体３の下部のように細く
なっている。マッフル１には給気管４と排気管５とが設
けられており、これらを通じてたとえば不活性ガスや脱
水性のガスがマッフル１中に給・排気され、マッフル１
の内部の雰囲気の調整が行なわれる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 shows an entire heat treatment apparatus for glass particulate deposits according to an embodiment of the present invention. In this embodiment, an inclined heating furnace similar to that shown in FIG. 4 is used. That is, as shown in FIG. 1, around the center of the muffle 1 formed of quartz glass into a cylindrical shape,
For example, the heater 2 made of carbon is placed,
Only the central part of the muffle 1 is heated, and only the central part is a high heat heat zone. The glass particle deposit body 3 is inserted into the muffle 1 and heated, and dehydration treatment or transparent vitrification treatment is performed. However, since the entire glass particle deposit body 3 is heated uniformly, the glass particle deposit body 3 is vertically moved. To be traversed in the direction. The glass particle deposit body 3 is formed below the target rod 31, and is suspended and held by the target rod 31.
A removable lid is provided on the top of the muffle 1, and the glass particulate deposit body 3 is inserted by opening the lid.
In this figure, the glass particle deposit 3 is subjected to the transparent vitrification treatment in the muffle 1, and the transparent vitrified portion is thin like the lower part of the glass particle deposit 3 in FIG. The muffle 1 is provided with an air supply pipe 4 and an exhaust pipe 5, through which, for example, an inert gas or a dehydrating gas is supplied / exhausted into the muffle 1.
The atmosphere inside is adjusted.

【００１０】マッフル１にはさらに補助の排気管６、６
がヒーター２の上下近傍に取り付けられている。この排
気管６には、図２に示すように蝶番などによって揺動自
在に保持された揺動弁７が設けられている。この補助排
気管６及び揺動弁７等は純粋石英ガラスにより形成され
る。この揺動弁７の状態、つまりその角度がたとえばテ
レビカメラなどによるモニター装置８によって監視され
るようになっている。The muffle 1 further has auxiliary exhaust pipes 6, 6
Are attached near the top and bottom of the heater 2. As shown in FIG. 2, the exhaust pipe 6 is provided with a swing valve 7 swingably held by a hinge or the like. The auxiliary exhaust pipe 6, the swing valve 7 and the like are made of pure quartz glass. The state of the rocking valve 7, that is, the angle thereof is monitored by a monitor device 8 such as a television camera.

【００１１】そして、この２つのモニター装置８の出力
はそれぞれ制御装置１２に送られる。制御装置１２は、
モニター装置８の出力に基づいて、給気管にガスを供給
する給気装置９と、排気管５に連結された排気装置１０
及び補助排気管６、６に連結された排気装置１１、１１
を制御する。The outputs of the two monitor devices 8 are sent to the control device 12, respectively. The controller 12 is
An air supply device 9 for supplying gas to the air supply pipe and an exhaust device 10 connected to the exhaust pipe 5 based on the output of the monitor device 8.
And the exhaust device 11, 11 connected to the auxiliary exhaust pipe 6, 6.
To control.

【００１２】この焼結装置において、マッフル１には給
気装置９により給気管４を経て所定の雰囲気のガスが供
給され、この実施例の場合、上方に設けた排気管５を通
じて排気装置１０により排気される。同時に排気装置１
１、１１により補助排気管６、６を通じて排気がなされ
（なお、補助排気管６、６における排気圧は、排気管５
におけるものよりも弱いものとされる）、その結果、揺
動弁７は排気側に傾いた状態となる。ここで、補助排気
管６、６の引き圧がマッフル１の内圧よりもやや低くな
るように排気装置１１、１１を制御することとする。マ
ッフル１の内圧は給気管４からの給気圧及び排気管５か
らの排気圧の相互作用によって定まる。そのため、揺動
弁７、７は補助排気管６、６において一定の角度に傾い
た状態となる。In this sintering apparatus, the muffle 1 is supplied with a gas of a predetermined atmosphere by an air supply device 9 through an air supply pipe 4, and in this embodiment, an exhaust device 10 is provided through an exhaust pipe 5 provided above. Exhausted. Exhaust device 1 at the same time
Exhaust is performed through the auxiliary exhaust pipes 6 and 6 by the exhaust pipes 1 and 11 (exhaust pressure in the auxiliary exhaust pipes 6 and 6 is
It is weaker than that of the rocking valve 7), and as a result, the rocking valve 7 is tilted toward the exhaust side. Here, the exhaust devices 11, 11 are controlled so that the drawing pressure of the auxiliary exhaust pipes 6, 6 is slightly lower than the internal pressure of the muffle 1. The internal pressure of the muffle 1 is determined by the interaction between the supply pressure from the supply pipe 4 and the exhaust pressure from the exhaust pipe 5. Therefore, the swing valves 7 and 7 are inclined in the auxiliary exhaust pipes 6 and 6 at a constant angle.

【００１３】この揺動弁７、７の傾き角度がモニター装
置８、８によってそれぞれ検出される。制御装置１２は
これを給気装置９、排気装置１０、１１、１１にフィー
ドバックしてこれらを制御し、上記の揺動弁７、７の傾
き角度が常に一定の角度となるようにする。そのため、
脱水や焼結の各工程において、ガラス微粒子堆積体３が
トラバースされてその位置が変動しても、常に、マッフ
ル１内の雰囲気ガスの気流を一定のものにすることがで
きる。The tilt angles of the swing valves 7, 7 are detected by the monitor devices 8, 8, respectively. The control device 12 feeds this back to the air supply device 9 and the exhaust devices 10, 11 and 11 to control them so that the tilt angles of the rocking valves 7 and 7 are always constant. for that reason,
In each step of dehydration and sintering, even if the glass particle deposit body 3 is traversed and its position is changed, the air flow of the atmospheric gas in the muffle 1 can be kept constant.

【００１４】その結果、脱水や焼結の各工程を、常に均
一な条件下で行うことができ、ガラス微粒子堆積体３の
長手方向にわたって安定したプロファイルを持つ透明ガ
ラスプリフォーム（光ファイバ母材）を得ることができ
る。As a result, the steps of dehydration and sintering can be performed under uniform conditions at all times, and the transparent glass preform (optical fiber preform) has a stable profile in the longitudinal direction of the glass particle deposit body 3. Can be obtained.

【００１５】また、この焼結装置では、傾斜型加熱炉の
場合と同様に、ヒーター２がマッフル１の一部にしか装
着されていないので、マッフル１の交換時にはマッフル
１の全体を廃却せず、ヒーター２の付近の一部のみを廃
却し、他の大部分は再利用することができるため、経済
的にも有利で、光ファイバ母材の製造コストの削減に寄
与できる。Further, in this sintering apparatus, as in the case of the inclined heating furnace, the heater 2 is mounted only on a part of the muffle 1, so that when replacing the muffle 1, the entire muffle 1 should be discarded. Instead, only a part of the vicinity of the heater 2 can be discarded and the other part can be reused, which is economically advantageous and can contribute to the reduction of the manufacturing cost of the optical fiber preform.

【００１６】なお、上記ではマッフル１に対して下方に
給気管４を上方に排気管５を設けているが、これら給気
管４、排気管５、及び補助排気管６、６の位置は上記の
実施例に限定されず、適宜変更することが可能である。In the above description, the air supply pipe 4 is provided below the muffle 1, and the exhaust pipe 5 is provided above the muffle 1. However, the positions of the air supply pipe 4, the exhaust pipe 5, and the auxiliary exhaust pipes 6 and 6 are as described above. The present invention is not limited to the embodiment, and can be changed as appropriate.

【００１７】[0017]

【発明の効果】以上説明したように、この発明のガラス
微粒子堆積体の加熱処理装置によれば、マッフル内の雰
囲気ガスの気流を、脱水や焼結の工程でのガラス微粒子
堆積体のトラバースにかかわらず一定のものに保つこと
ができるため、ヒーターをマッフルの一部に設けてガラ
ス微粒子堆積体をトラバースさせる構成としても、長手
方向に安定したプロファイルを持つ透明ガラスプリフォ
ームを得ることができる。また、マッフルの一部にヒー
ターを設けてマッフルの一部を加熱するようにできるの
で、マッフル修理・交換時のコストを削減し、透明ガラ
スプリフォームの製造コストを低下させることができ
る。As described above, according to the heat treatment apparatus for a glass particle deposit of the present invention, the air flow of the atmospheric gas in the muffle can be used to traverse the glass particle deposit during the dehydration and sintering steps. Since it can be kept constant regardless of the structure, a transparent glass preform having a stable profile in the longitudinal direction can be obtained even if a heater is provided in a part of the muffle to traverse the glass particle deposit body. Further, since it is possible to provide a heater to a part of the muffle to heat a part of the muffle, it is possible to reduce the cost at the time of repair / replacement of the muffle and reduce the manufacturing cost of the transparent glass preform.

【図面の簡単な説明】[Brief description of drawings]

【図１】この発明の一実施例の全体の模式図。FIG. 1 is an overall schematic diagram of an embodiment of the present invention.

【図２】この発明の一実施例の要部の模式図。FIG. 2 is a schematic diagram of a main part of an embodiment of the present invention.

【図３】従来例の模式図。FIG. 3 is a schematic diagram of a conventional example.

【図４】他の従来例の模式図。FIG. 4 is a schematic view of another conventional example.

【符号の説明】[Explanation of symbols]

１ マッフル ２ ヒーター ３ ガラス微粒子堆積体 ３１ ターゲット棒 ４ 給気管 ５ 排気管 ６ 補助排気管 ７ 揺動弁 ８ モニター装置 ９ 給気装置 １０、１１ 排気装置 １２ 制御装置 1 Muffle 2 Heater 3 Glass Fine Particle Deposit 31 Target Rod 4 Air Supply Pipe 5 Exhaust Pipe 6 Auxiliary Exhaust Pipe 7 Swing Valve 8 Monitor Device 9 Air Supply Device 10, 11 Exhaust Device 12 Control Device

Claims (2)

【特許請求の範囲】[Claims] 【請求項１】 ガラス微粒子堆積体を収納するマッフル
と、該マッフルの外部に配置されたヒーターと、上記の
マッフルにガスを供給する給気装置と、上記マッフルか
らガスを排気する排気装置と、上記のマッフルに設けら
れた補助排気管と、該補助排気管における排気状態を監
視するモニター手段と、該モニター手段の出力に応じて
上記給気装置及び排気装置を制御する制御装置とを備え
ることを特徴とするガラス微粒子堆積体の加熱処理装
置。1. A muffle for accommodating a glass particulate deposit, a heater arranged outside the muffle, an air supply device for supplying gas to the muffle, and an exhaust device for exhausting gas from the muffle. An auxiliary exhaust pipe provided in the muffle, a monitor means for monitoring an exhaust state of the auxiliary exhaust pipe, and a control device for controlling the air supply device and the exhaust device according to the output of the monitor device. A heat treatment device for glass particulate deposits, characterized by: 【請求項２】 ガラス微粒子堆積体を収納するマッフル
と、該マッフルの外部に配置されたヒーターと、上記の
マッフルにガスを供給する給気装置と、上記マッフルか
らガスを排気する排気装置と、上記のマッフルに設けら
れた補助排気管と、該補助排気管に揺動自在に取り付け
られた揺動弁と、該揺動弁の状態を監視するモニター手
段と、該モニター手段の出力に応じて上記給気装置及び
排気装置を制御する制御装置とを備えることを特徴とす
るガラス微粒子堆積体の加熱処理装置。2. A muffle for accommodating the glass particulate deposit, a heater arranged outside the muffle, an air supply device for supplying gas to the muffle, and an exhaust device for exhausting gas from the muffle. Auxiliary exhaust pipe provided in the muffle, a swing valve swingably attached to the auxiliary exhaust pipe, monitor means for monitoring the state of the swing valve, and depending on the output of the monitor means. A heat treatment device for glass particulate deposits, comprising: a control device that controls the air supply device and the exhaust device.
JP2720792A 1992-01-17 1992-01-17 Heat treatment device for glass particulate deposit Pending JPH05193972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2720792A JPH05193972A (en) 1992-01-17 1992-01-17 Heat treatment device for glass particulate deposit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2720792A JPH05193972A (en) 1992-01-17 1992-01-17 Heat treatment device for glass particulate deposit

Publications (1)

Publication Number Publication Date
JPH05193972A true JPH05193972A (en) 1993-08-03

Family

ID=12214660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2720792A Pending JPH05193972A (en) 1992-01-17 1992-01-17 Heat treatment device for glass particulate deposit

Country Status (1)

Country Link
JP (1) JPH05193972A (en)

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