JPH05188218A - Uneven exposure correcting plate, production of uneven exposure correcting plate and uneven exposure correcting method - Google Patents
Uneven exposure correcting plate, production of uneven exposure correcting plate and uneven exposure correcting methodInfo
- Publication number
- JPH05188218A JPH05188218A JP331392A JP331392A JPH05188218A JP H05188218 A JPH05188218 A JP H05188218A JP 331392 A JP331392 A JP 331392A JP 331392 A JP331392 A JP 331392A JP H05188218 A JPH05188218 A JP H05188218A
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- slit
- longitudinal direction
- exposure unevenness
- imaging lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、露光むら補正板・露
光むら補正板製造方法および露光むら補正方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure unevenness correction plate, a method for manufacturing an exposure unevenness correction plate, and an exposure unevenness correction method.
【０００２】[0002]
【従来の技術】スリット露光方式の複写機は従来から広
く知られている。この種の複写機においてはスリット状
に設定された露光部に原稿像を結像させて露光を行なう
が、原稿に良く対応する静電潜像を形成するには、スリ
ット状の露光部の長手方向における結像の照度分布が均
一である必要がある。2. Description of the Related Art A slit exposure type copying machine has been widely known. In this type of copying machine, a document image is formed on a slit-shaped exposure portion to perform exposure. However, in order to form an electrostatic latent image that corresponds well to the document, the slit-shaped exposure portion has a long length. The illuminance distribution of the image in the direction needs to be uniform.
【０００３】上記露光部における照度分布は、原稿面に
おける照明光強度分布と結像レンズの特性により定ま
る。結像レンズによる像の明るさは周知の如く「コサイ
ン４乗則」等により、周辺に行くほど暗くなる。このよ
うな「周辺における明るさの低下」を考慮して露光部に
おける照度分布を露光部長手方向に一様とする方法とし
て、従来から「原稿照明部のスリット状露光部の長手方
向に対応する方向において、中央部を相対的に暗く、両
端部を相対的に明るく照明する」照明光強度分布による
露光むら補正や、「結像レンズの近傍に開口部を設けた
遮光板を配備し、上記開口部の形状により、露光部長手
方向の結像光束が中央部で大きく、両端部で小さく遮光
されるようにする」結像光束遮光板による露光むら補
正、あるいはこれら方法の組合せによる補正方法が従来
から知られている。The illuminance distribution in the exposure section is determined by the illumination light intensity distribution on the document surface and the characteristics of the imaging lens. As is well known, the brightness of the image formed by the imaging lens becomes darker toward the periphery due to the "cosine fourth law" or the like. As a method of making the illuminance distribution in the exposure section uniform in the longitudinal direction of the exposure section in consideration of such “a decrease in brightness in the periphery”, conventionally, “corresponding to the longitudinal direction of the slit-shaped exposure section of the document illumination section” has been adopted. In the direction, the central part is relatively dark, and both ends are relatively bright. "Exposure unevenness correction by the illumination light intensity distribution" and "a light-shielding plate having an opening near the imaging lens is provided. Depending on the shape of the aperture, the image-forming light beam in the longitudinal direction of the exposure part is large at the central part and small at both ends. It is possible to correct uneven exposure by the image-forming light beam shielding plate or a correction method by a combination of these methods. Known from the past.
【０００４】これらの補正方法のうち、照明光強度分布
を調整する方法は、発光量の異なる発光部を長手方向に
所定の配置に配列した特殊な菅状ランプを必要とし、補
正の精度もあまり高くない。Among these correction methods, the method for adjusting the illumination light intensity distribution requires a special tube-shaped lamp in which light emitting portions having different light emission amounts are arranged in a predetermined arrangement in the longitudinal direction, and the correction accuracy is not so high. not high.
【０００５】また結像光束遮光板による方法でも補正の
精度は必ずしも十分ではない。結像光束遮光板は一般
に、金属板に特殊な形状の開口部を穿設して作成される
が、露光むら補正が所望の効果をあげないような場合
に、開口部形状を再調整するのは極めて面倒であり、こ
のような観点からすると結像光束遮光板の製造コストは
案外に高いものにつく。Further, the accuracy of the correction is not always sufficient even with the method using the image forming light-shielding plate. The image forming light-shielding plate is generally formed by punching a specially shaped opening in a metal plate. However, when the exposure unevenness correction does not produce the desired effect, the shape of the opening is readjusted. Is extremely troublesome, and from such a viewpoint, the manufacturing cost of the image forming light-shielding plate is unexpectedly high.
【０００６】[0006]
【発明が解決しようとする課題】この発明は上述した事
情に鑑みてなされたものであって、新規な露光むら補正
板とその製造方法、およびこの露光むら補正板を用いる
露光むら補正方法の提供を目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and provides a novel exposure unevenness correction plate, a method for manufacturing the same, and an exposure unevenness correction method using the exposure unevenness correction plate. With the goal.
【０００７】[0007]
【課題を解決するための手段】請求項１の露光むら補正
板は「スリット露光方式の複写機において、スリット状
の露光部に原稿像を結像させる結像レンズに起因する、
露光部長手方向の露光むらを補正する」ためのフィルタ
ーである。An exposure unevenness correcting plate according to a first aspect of the present invention is a "slit exposure type copying machine, which is caused by an image forming lens for forming an original image on a slit-shaped exposure portion,
This is a filter for “correcting the exposure unevenness in the longitudinal direction of the exposure part”.
【０００８】「結像レンズに起因する露光部長手方向の
露光むら」とは、スリット状の露光部と共役関係にある
原稿面部分を、露光部長手方向に対応する方向に均一に
照明した場合に、結像レンズに起因して露光部に発生す
る露光むら（周辺における光量低下）で、「コサイン４
乗則」が大きく影響するが、実際には結像レンズのレン
ズ面による反射等の影響もあり、簡単な解析表現では表
し難い場合が多い。"Exposure unevenness in the longitudinal direction of the exposure part due to the image forming lens" means that the original surface portion conjugate with the slit-shaped exposure part is uniformly illuminated in the direction corresponding to the longitudinal direction of the exposure part. In addition, the exposure unevenness (decrease in light amount in the periphery) generated in the exposure part due to the imaging lens causes
The "law of multiplication" has a great influence, but in reality, it is often difficult to express it in a simple analytical expression due to the influence of reflection by the lens surface of the imaging lens.
【０００９】請求項１の露光むら補正板は、透明基板の
片側の面に「透過率分布薄膜」を成膜形成したものであ
る。透過率分布薄膜は、その透過率が「露光部の長手方
向に対応する方向において、中央部から両端部に向かっ
て次第に増大する」ように設定される。そしてこの「露
光むら補正板」は結像レンズの近傍に設けられる。The exposure unevenness correction plate according to the first aspect is a transparent substrate having a "transmittance distribution thin film" formed on one surface thereof. The transmittance distribution thin film is set so that the transmittance thereof “increases gradually from the central portion toward both end portions in the direction corresponding to the longitudinal direction of the exposed portion”. This "exposure unevenness correction plate" is provided near the imaging lens.
【００１０】「透明基板」としては光学ガラス板が好適
であるが、メタクリル樹脂やスチロール樹脂、ポリアセ
タール樹脂等のプラスチック板を用いることもできる。
透過率分布薄膜の材料としては、インコネル、クロメ
ル、クローム等を好適に用いることができる。An optical glass plate is suitable as the "transparent substrate", but a plastic plate such as a methacrylic resin, a styrene resin, a polyacetal resin or the like can also be used.
As the material of the transmittance distribution thin film, Inconel, chromel, chrome, etc. can be preferably used.
【００１１】請求項２の方法は、請求項１記載の露光む
ら補正板を製造する方法であり、以下の如く構成され
る。長方形形状の透明基板の成膜面の近傍にシャッター
を配備する。シャッターは、スリット幅を変化させるこ
とができるものである。このシャッターの「スリット状
開口部のスリット幅方向を透明基板の長手方向に対応さ
せ、上記スリット状開口部の幅を連続的もしくは段階的
に増大させつつ」蒸着もしくはスパッタリングを行なっ
て透過率分布薄膜を形成する。The method of claim 2 is a method of manufacturing the exposure unevenness correction plate of claim 1, and is configured as follows. A shutter is provided near the film forming surface of the rectangular transparent substrate. The shutter can change the slit width. The transmittance distribution thin film of this shutter is formed by vapor deposition or sputtering "while making the slit width direction of the slit-shaped opening correspond to the longitudinal direction of the transparent substrate and continuously or gradually increasing the width of the slit-shaped opening". To form.
【００１２】請求項３の方法は、請求項１記載の露光む
ら補正板を製造する別の方法であって以下の如くに構成
される。成膜材料供給源（この明細書において、蒸着に
おける蒸発源および、スパッタリングにおけるターゲッ
トを指す）の長手方向を長方形形状の透明基板の長手方
向に対応させ、透明基板と成膜材料供給源の間で且つ成
膜材料供給源の近傍に、スリット状の開口部を有する遮
蔽板を固定的に配備する。このとき、開口部の幅方向が
上記長手方向に対応するようする。そして遮蔽板を介し
て蒸着もしくはスパッタリングを行なう。The method of claim 3 is another method of manufacturing the exposure unevenness correction plate of claim 1, and is configured as follows. The longitudinal direction of the film-forming material supply source (in this specification, the evaporation source in vapor deposition and the target in sputtering) is made to correspond to the longitudinal direction of the rectangular transparent substrate, and between the transparent substrate and the film-forming material supply source. In addition, a shielding plate having a slit-shaped opening is fixedly provided near the film-forming material supply source. At this time, the width direction of the opening corresponds to the longitudinal direction. Then, vapor deposition or sputtering is performed through the shield plate.
【００１３】請求項４の方法は、請求項１に記載された
露光むら補正板を用いて露光むらを補正する方法であっ
て、「露光むら補正板の配備位置を、結像レンズ光軸方
向に変位させて、露光むらが最も小さくなる位置に調整
する」ことを特徴とする。According to a fourth aspect of the present invention, there is provided a method of correcting uneven exposure using the uneven exposure correction plate according to the first aspect, wherein "a position where the uneven exposure correction plate is disposed is set in an optical axis direction of the imaging lens. And adjust to a position where the exposure unevenness is minimized. "
【００１４】請求項５の露光むら補正板は、「透明基板
の片側の面に、高い遮光率をもつ帯状の遮光膜が、結像
レンズの有効径より細く且つ上記有効径より長く」成膜
形成されたことを特徴とする。In the exposure unevenness correction plate according to the present invention, a band-shaped light-shielding film having a high light-shielding rate is formed on one surface of the transparent substrate so as to be thinner than the effective diameter of the imaging lens and longer than the effective diameter. It is characterized by being formed.
【００１５】請求項６の露光むら補正方法は、請求項５
に記載された露光むら補正板を用いて露光むらを補正す
る方法であって、「遮光膜の幅方向を露光部長手方向に
対応させ、露光部長手方向における露光むらが最も小さ
くなるように、結像レンズ光軸上の配備位置を調整す
る」ことを特徴とする。An exposure unevenness correction method according to a sixth aspect of the present invention is the method of the fifth aspect.
A method for correcting exposure unevenness using the exposure unevenness correction plate described in, "corresponding the width direction of the light-shielding film to the exposure portion longitudinal direction so that the exposure unevenness in the exposure portion longitudinal direction is minimized, The arrangement position on the optical axis of the imaging lens is adjusted ".
【００１６】なお、請求項１，５の露光むら補正板の、
他方の面には反射防止膜を形成することができる。The exposure unevenness correcting plate according to the first and fifth aspects,
An antireflection film can be formed on the other surface.
【００１７】[0017]
【作用】図１（ａ）を参照すると、この図において符号
１０は露光むら補正板を示している。露光むら補正板１
０は透明基板１Ａ上に透過率分布薄膜１Ｂを形成した構
成となっている。図の左右方向は、スリット状の露光部
の長手方向に対応する方向であり、透過率分布薄膜１Ｂ
の厚さは上記方向においてフィルター中央部が最も厚
く、周辺に向かうに従い薄くなっている。透過率分布薄
膜１Ｂにおける透過率は膜厚が大きいほど小さいから、
露光むら補正板１０における透過率の分布は、図示のよ
うに上記方向における中央部で極小で、周辺部に向かう
につれて次第に増大する。Referring to FIG. 1 (a), reference numeral 10 in this figure denotes an exposure unevenness correction plate. Exposure unevenness correction plate 1
0 has a structure in which the transmittance distribution thin film 1B is formed on the transparent substrate 1A. The left-right direction of the figure is the direction corresponding to the longitudinal direction of the slit-shaped exposure portion, and the transmittance distribution thin film 1B
In the above-mentioned direction, the thickness of is the thickest in the central part of the filter, and becomes thinner toward the periphery. Since the transmittance of the transmittance distribution thin film 1B is smaller as the film thickness is larger,
The distribution of the transmittance of the exposure unevenness correction plate 10 has a minimum in the central portion in the above direction as shown in the drawing, and gradually increases toward the peripheral portion.
【００１８】図１（ａ）における透過率の分布は「露光
むら補正板１０に直交的に入射する平行光束」に関する
ものであり、実際の使用状態では、図１（ｂ）に示すよ
うに露光むら補正板１０は結像レンズ２０の近傍に設け
られ、結像光線は「物体高に応じた画角」を持って露光
むら補正板１０に入射するので、画角と透過率との関係
は図１（ａ）の透過率分布とは若干異なるものとなる。The transmittance distribution in FIG. 1 (a) relates to "a parallel light beam that is orthogonally incident on the exposure unevenness correction plate 10", and in an actual use state, as shown in FIG. The unevenness correction plate 10 is provided in the vicinity of the imaging lens 20, and the image-forming light beam enters the exposure unevenness correction plate 10 with an “angle of view according to the object height”. Therefore, the relationship between the angle of view and the transmittance is The transmittance distribution is slightly different from that shown in FIG.
【００１９】また図２（ｂ）に示すように、露光むら補
正板１０を結像レンズ２０に対して光軸方向へ変位させ
ると、結像レンズに対しては同じ画角の光線でも、露光
むら補正板１０の位置により、透過率分布薄膜を透過す
る位置が異なるから、上記「画角と透過率の関係」は、
露光むら補正板１０と結像レンズ２０との位置関係によ
っても変化する。従ってこのことを利用して、露光むら
補正板を結像レンズの光軸方向へ変位させて、露光むら
を最もよく補正する位置に配備することができる。As shown in FIG. 2B, when the exposure unevenness correction plate 10 is displaced in the optical axis direction with respect to the imaging lens 20, even a light beam having the same angle of view is exposed to the imaging lens. Since the position of transmitting the transmittance distribution thin film differs depending on the position of the unevenness correction plate 10, the above “relationship between the angle of view and the transmittance” is
It also changes depending on the positional relationship between the exposure unevenness correction plate 10 and the imaging lens 20. Therefore, by utilizing this, it is possible to displace the exposure unevenness correction plate in the optical axis direction of the imaging lens and arrange it at a position where the exposure unevenness is best corrected.
【００２０】図２（ａ）は、上記請求項２の製造方法を
説明図的に示している。長方形形状の透明基板１Ａ（図
の左右方向が長手方向であり、スリット状露光部の長手
方向に対応する）と蒸発源４０とを対向させ、これら両
者間の透明基板１Ａよりの位置にシャッター３０を配備
する。シャッター３０は、スリット幅：ｄを変化させる
ことができるものである。FIG. 2 (a) schematically illustrates the manufacturing method of claim 2. A rectangular transparent substrate 1A (the left-right direction in the figure is the longitudinal direction and corresponds to the longitudinal direction of the slit-shaped exposure portion) and an evaporation source 40 are opposed to each other, and the shutter 30 is located between them in a position from the transparent substrate 1A. To deploy. The shutter 30 can change the slit width: d.
【００２１】このスリット幅：ｄを蒸着開始当初は小さ
く設定し、蒸着時間の経過とともに漸次大きくすれば、
透明基板１Ａの上記中央部に近いほど蒸着時間が長くな
るので、図１（ａ）に示すような透過率分布薄膜を形成
できる。If this slit width: d is set to be small at the beginning of vapor deposition and gradually increased with the elapse of vapor deposition time,
Since the vapor deposition time becomes longer as it gets closer to the central portion of the transparent substrate 1A, a transmittance distribution thin film as shown in FIG. 1A can be formed.
【００２２】図２（ｂ）は請求項３の製造方法を説明図
的に示している。長方形形状の透明基板１Ａに蒸発源４
０Ａを対向させる。このとき透明基板１Ａの長手方向を
蒸発源４０Ａの長手方向と対向させる。FIG. 2B schematically illustrates the manufacturing method of claim 3. Evaporation source 4 on rectangular transparent substrate 1A
Face 0A. At this time, the longitudinal direction of the transparent substrate 1A is opposed to the longitudinal direction of the evaporation source 40A.
【００２３】透明基板１Ａと蒸発源４０Ａとの間の、蒸
発源４０Ａよりの位置に、スリット幅：Ｄの遮蔽板５０
を配備して蒸着を行なう。蒸発源４０Ａからの蒸発物質
は透明基板１Ａの被蒸着面の至る所に飛来するが、例え
ば、蒸発源４０Ａ上のＰ点からの蒸発物質に対しては、
遮蔽板５０の「スリットの有効幅」がＤからＤ・ｃｏｓ
αに減少し、且つは蒸発物質の指向性のため、被蒸着面
に飛来する蒸発物質量は透明基板中央部から周辺部へ行
くに従い単調に減少し、図１（ａ）に示すような透過率
分布薄膜が形成される。Between the transparent substrate 1A and the evaporation source 40A, a shielding plate 50 having a slit width: D is provided at a position closer to the evaporation source 40A.
Is installed and vapor deposition is performed. Evaporated substances from the evaporation source 40A fly all over the surface to be vapor-deposited of the transparent substrate 1A. For example, for the evaporated substances from the point P on the evaporation source 40A,
The “effective width of the slit” of the shielding plate 50 is from D to D · cos
Due to the directivity of the vaporized substance, the amount of vaporized substance flying to the surface to be vapor-deposited decreases monotonically from the central part of the transparent substrate to the peripheral part, and as shown in FIG. A rate distribution thin film is formed.
【００２４】図２（ａ）に即して説明した、スリット幅
可変のシャッターとしては、例えば図２（ｃ）に示すよ
うなものを用いることができる。即ち、回転円板３０Ａ
における回転中心から等距離の部位に、回転方向にスリ
ット幅が単調に変化するスリット３０Ｂが穿設されてい
る。透明基板１Ａをスリット３０Ｂに対して破線で示す
態位に配備し、回転円板３０Ａを矢印方向へ回転させれ
ば、スリット幅を次第に増大させることができる。この
例ではスリット幅は段階的に変化しているが、スリット
幅の変化を連続的とすることもできることは言うまでも
ない。As the shutter having a variable slit width described with reference to FIG. 2A, for example, a shutter shown in FIG. 2C can be used. That is, the rotating disk 30A
A slit 30B having a slit width that monotonously changes in the rotation direction is formed at a position equidistant from the center of rotation of the slit 30B. The slit width can be gradually increased by disposing the transparent substrate 1A in the position shown by the broken line with respect to the slit 30B and rotating the rotating disk 30A in the direction of the arrow. In this example, the slit width changes stepwise, but it goes without saying that the slit width can also be changed continuously.
【００２５】以上の製造方法では蒸着の場合を例にとっ
て説明したが、蒸着源の代わりにターゲットを用いてス
パッタリングを行なっても、上記と同様の結果を得るこ
とができる。In the above manufacturing method, the case of vapor deposition has been described as an example, but the same results as above can be obtained even if sputtering is performed using a target instead of the vapor deposition source.
【００２６】図４（ａ）は請求項５の露光むら補正板を
説明するための図である。このフィルター３０は図示の
ように、透明な基板１Ａの片面に帯状の遮光膜１Ｃを形
成してなる。この帯状の遮光膜１Ｃの幅：Ｈ（図の左右
方向の長さ）は結像レンズの有効径よりも細く、長さ：
Ｌ（図の上下方向の長さ）は上記有効径よりも長い。遮
光膜１Ｃによる遮光率は均一であり、全体の透過率分布
は図のようになる。FIG. 4A is a view for explaining the exposure unevenness correction plate of claim 5. As shown in the figure, the filter 30 is formed by forming a band-shaped light shielding film 1C on one surface of a transparent substrate 1A. The band-shaped light-shielding film 1C has a width: H (length in the left-right direction in the drawing) smaller than the effective diameter of the imaging lens, and a length:
L (length in the vertical direction in the figure) is longer than the effective diameter. The light-shielding rate of the light-shielding film 1C is uniform, and the entire transmittance distribution is as shown in the figure.
【００２７】図４（ｂ）に示すように、結像レンズ２０
の光軸上で、有効径：Ｇの瞳面から所定の距離Ｅだけ離
して露光むら補正板３０を配備すると、遮光膜１Ｃの幅
が有効径Ｇより小さいため、露光部長手方向（図の左右
方向）における光束遮光効果は画角：θが小さい所で大
きく、画角が大きくなる周辺に行くに従って小さくな
る。このことを利用して露光むらの補正が可能である。As shown in FIG. 4B, the imaging lens 20
When the exposure unevenness correction plate 30 is arranged at a predetermined distance E from the pupil plane of the effective diameter G on the optical axis of, the width of the light-shielding film 1C is smaller than the effective diameter G. The light beam shielding effect in the left-right direction is large when the angle of view: θ is small, and becomes smaller as the angle of view increases. By utilizing this fact, it is possible to correct uneven exposure.
【００２８】[0028]
【実施例】以下、具体的な実施例を説明する。図３
（ａ）において符号２０Ａは結像レンズを示す。結像レ
ンズ２０Ａの有効径は２９．６ｍｍであり、等倍で使用
される。共役長は７５７．８３０ｍｍ、最大像高は２９
７ｍｍである。従って半画角は２１．８３度である。EXAMPLES Specific examples will be described below. Figure 3
In (a), reference numeral 20A indicates an imaging lens. The effective diameter of the imaging lens 20A is 29.6 mm and is used at the same magnification. Conjugate length is 757.830 mm, maximum image height is 29
It is 7 mm. Therefore, the half angle of view is 21.83 degrees.
【００２９】白色原稿の原稿面を均一に照明すると、結
像面における照度分布は結像レンズ光軸上の照度を１０
０％として図３（ｃ）に示す如くである。この図の横軸
は像高である。照度分布はコサイン４乗則等の影響で周
辺に行くに従い暗くなっている。When the original surface of a white original is uniformly illuminated, the illuminance distribution on the image plane is 10 on the optical axis of the imaging lens.
It is as shown in FIG. The horizontal axis of this figure is the image height. The illuminance distribution becomes darker toward the surroundings due to the influence of the cosine fourth law.
【００３０】図３（ａ）において符号１０Ａは露光むら
補正板を示している。露光むら補正板１０Ａは、スリッ
ト状露光部の長手方向に対応する方向の長さが１００ｍ
ｍ、露光部幅方向に対応する方向の幅が３５ｍｍの大き
さを有し、図２（ａ）に即して説明した方法で作製し
た。In FIG. 3A, reference numeral 10A indicates an exposure unevenness correction plate. The uneven exposure correction plate 10A has a length of 100 m in the direction corresponding to the longitudinal direction of the slit-shaped exposure portion.
m, the width in the direction corresponding to the widthwise direction of the exposed portion was 35 mm, and it was manufactured by the method described with reference to FIG.
【００３１】即ち、シャッターは図２（ｃ）で説明した
如きものを用いた。蒸着開始直後におけるシャッターの
スリット幅は２ｍｍの大きさに設定され、その後、１ス
テップごとに２ｍｍづつスリット幅を増大させて蒸着を
行なった。透明基板としては厚さ１．１ｍｍのガラス板
を用い、成膜材料としては「インコネル（CrNiFe）」を
用いた。蒸着開始から終了までの時間は４０秒である。That is, as the shutter, the one described with reference to FIG. The slit width of the shutter was set to a size of 2 mm immediately after the start of vapor deposition, and then the vapor deposition was performed by increasing the slit width by 2 mm for each step. A 1.1 mm-thick glass plate was used as the transparent substrate, and "Inconel (CrNiFe)" was used as the film forming material. The time from the start of vapor deposition to the end is 40 seconds.
【００３２】この露光むら補正板１０Ａを、図３（ｂ）
に示すように結像レンズ２０Ａのレンズ中心から１５ｍ
ｍ離した位置に設定し、白紙原稿を均一照明して結像面
における照度分布を測定した。結像レンズ光軸上の照度
を１００％として照度分布を規格化して示したものが図
３（ｄ）の実線の曲線である。結像レンズ２０Ａに基づ
く照度分布の不均一が良好に補正されているのが分か
る。This exposure unevenness correction plate 10A is shown in FIG.
15m from the lens center of the imaging lens 20A as shown in
The positions were set at a distance of m, and a blank document was uniformly illuminated to measure the illuminance distribution on the image plane. The standard curve of the illuminance distribution with the illuminance on the optical axis of the imaging lens as 100% is the solid curve in FIG. It can be seen that the nonuniformity of the illuminance distribution based on the imaging lens 20A is well corrected.
【００３３】この図における破線のカーブは比較例であ
って、従来から知られている結像光束遮光板による補正
結果である。この比較例に比して、露光むら補正板１０
Ａによる補正は、より良好（照度分布が、より平滑化さ
れている）になされていることが分かる。The curve of the broken line in this figure is a comparative example and is the result of correction by the conventionally known imaging light-shielding plate. Compared with this comparative example, the exposure unevenness correction plate 10
It can be seen that the correction by A is better (the illuminance distribution is smoother).
【００３４】図４（ａ）に示す長さ：Ｓが７５ｍｍ、
幅：Ｌが３７ｍｍ、厚さが１．１ｍｍであるガラス板を
基板とし、この基板の成膜面に密接して、開口幅：１５
ｍｍのシャッターを配備し、成膜材料としてインコネル
を膜厚：９０Åに均一蒸着を行ない、裏面側には反射防
止層１ＤとしてＭｇＦ2の膜を形成した。相対透過率は
遮光膜１Ｃの部分で１％、基板の部分で９５％である。Length shown in FIG. 4A: S is 75 mm,
A glass plate having a width: L of 37 mm and a thickness of 1.1 mm is used as a substrate, and is in close contact with the film formation surface of the substrate, and the opening width: 15
A shutter of mm was provided, Inconel as a film forming material was uniformly vapor-deposited with a film thickness of 90Å, and a MgF 2 film was formed as an antireflection layer 1D on the back surface side. The relative transmittance is 1% at the light-shielding film 1C portion and 95% at the substrate portion.
【００３５】図４（ｂ）に示すように、この露光むら補
正板３０を、遮光膜１Ｃの幅方向が露光部長手方向と対
応するようにして、図３に即して説明した結像レンズ２
０Ａの瞳面からの距離：Ｅが３４．２ｍｍとなるように
配備した。このときのスリット状の露光部における照度
分布は、露光部長手方向において、図３（ｄ）における
実線の曲線と実質的に同一となった。即ち図３に即して
説明した、請求項１の露光むら補正板の実施例と全く同
様の、補正効果を実現できた。As shown in FIG. 4B, the exposure unevenness correcting plate 30 is formed so that the width direction of the light shielding film 1C corresponds to the longitudinal direction of the exposure portion, and the imaging lens described with reference to FIG. Two
It was arranged so that the distance E from the pupil plane of 0A: E was 34.2 mm. The illuminance distribution in the slit-shaped exposed portion at this time was substantially the same as the solid line curve in FIG. 3D in the longitudinal direction of the exposed portion. That is, the same correction effect as that of the embodiment of the exposure unevenness correction plate described with reference to FIG. 3 can be realized.
【００３６】[0036]
【発明の効果】以上のように、この発明によれば新規な
露光むら補正板およびその作製方法、露光むら補正方法
を提供できる。この発明の露光むら補正板は上述のよう
に優れた露光むら補正機能を有し、しかも製造が簡単で
低コストに実現でき、且つこの露光むら補正板を用いる
ことにより、結像レンズに基づく露光むらを簡単且つ良
好に補正することができる。As described above, according to the present invention, it is possible to provide a novel exposure unevenness correcting plate, a method for manufacturing the same, and an exposure unevenness correcting method. The uneven exposure correction plate of the present invention has the excellent uneven exposure correction function as described above, and is easy to manufacture and can be realized at low cost. By using this uneven exposure correction plate, exposure based on an imaging lens is performed. The unevenness can be corrected easily and satisfactorily.
【００３７】なお、請求項４，６の方法において、露光
むら補正板を結像レンズ光軸上で変位させて調整位置を
定めたのち、露光むら補正板を上記光軸に直交する方向
に変位させて、さらに調整を行なっても良い。In the method of claims 4 and 6, after the exposure unevenness correction plate is displaced on the optical axis of the imaging lens to determine the adjustment position, the exposure unevenness correction plate is displaced in the direction orthogonal to the optical axis. Then, further adjustment may be performed.
【図１】この発明の露光むら補正板を説明する図であ
る。FIG. 1 is a diagram illustrating an exposure unevenness correction plate of the present invention.
【図２】請求項１の露光むら補正板の製造方法を説明す
る図である。FIG. 2 is a diagram illustrating a method for manufacturing the exposure unevenness correction plate according to claim 1;
【図３】請求項１の露光むら補正板の１実施例を説明す
る図である。FIG. 3 is a diagram illustrating one embodiment of the exposure unevenness correction plate according to claim 1;
【図４】請求項４の露光むら補正板の１実施例を説明す
る図である。FIG. 4 is a diagram illustrating an embodiment of the exposure unevenness correction plate according to a fourth aspect of the present invention.
１０ 露光むら補正板 １Ａ 透明基板 １Ｂ 透過率分布薄膜 ２０ 結像レンズ 10 Exposure unevenness correction plate 1A Transparent substrate 1B Transmittance distribution thin film 20 Imaging lens
───────────────────────────────────────────────────── フロントページの続き (72)発明者 田中 浩巳 群馬県藤岡市本郷1407番地・東京特殊硝子 株式会社藤岡事業部内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiromi Tanaka 1407 Hongo, Fujioka City, Gunma Prefecture, Tokyo Special Glass Co., Ltd., Fujioka Division
Claims (6)
ット状の露光部に原稿像を結像させる結像レンズに起因
する、上記露光部長手方向の露光むらを補正するための
フィルターであって、 上記結像レンズの近傍に設けられ、透明基板の片側の面
に、上記露光部の長手方向に対応する方向において光透
過率が中央部から両端部に向かって次第に増大するよう
に、透過率分布薄膜を成膜形成してなることを特徴とす
る、露光むら補正板。1. A slit exposure type copying machine, comprising: a filter for correcting exposure unevenness in the longitudinal direction of the exposure part, which is caused by an imaging lens for forming an original image on the slit-shaped exposure part, The transmittance distribution is provided on one surface of the transparent substrate provided near the imaging lens so that the light transmittance gradually increases from the central portion toward both ends in the direction corresponding to the longitudinal direction of the exposure portion. An exposure unevenness correction plate, which is formed by forming a thin film.
方法であって、 長方形形状の透明基板の成膜面近傍にスリット幅可変の
シャッターを配備し、このシャッターのスリット状開口
部のスリット幅方向を透明基板の長手方向に対応させ、 上記シャッターによるスリット状の開口部の幅を連続的
もしくは段階的に増大させつつ蒸着もしくはスパッタリ
ングを行なうことを特徴とする、露光むら補正板製造方
法。2. A method for manufacturing an exposure unevenness correction plate according to claim 1, wherein a shutter having a variable slit width is provided in the vicinity of a film forming surface of a rectangular transparent substrate, and the shutter has a slit-shaped opening. A method for manufacturing an exposure unevenness correcting plate, characterized in that the slit width direction is made to correspond to the longitudinal direction of the transparent substrate, and vapor deposition or sputtering is performed while continuously or stepwise increasing the width of the slit-shaped opening formed by the shutter. ..
方法であって、 成膜材料供給源の長手方向を、長方形形状の透明基板の
長手方向に対応させ、透明基板と上記成膜材料供給源と
の間で且つ成膜材料供給源の近傍にスリット状の開口部
を有する遮蔽板を、開口部の幅方向が上記長手方向に対
応するように固定的に配備して蒸着もしくはスパッタリ
ングを行なうことを特徴とする、露光むら補正板製造方
法。3. The method for manufacturing the exposure unevenness correction plate according to claim 1, wherein the longitudinal direction of the film-forming material supply source corresponds to the longitudinal direction of the rectangular transparent substrate, and the transparent substrate and the above-mentioned film formation. A shield plate having a slit-shaped opening between the material supply source and in the vicinity of the film-forming material supply source is fixedly arranged so that the width direction of the opening corresponds to the longitudinal direction, and vapor deposition or sputtering is performed. A method for manufacturing an exposure unevenness correction plate, which comprises:
光むらを補正する方法であって、露光むら補正板の配備
位置を、結像レンズ光軸方向に変位させて、露光むらが
最も小さくなる位置に調整することを特徴とする、露光
むら補正方法。4. A method for correcting exposure unevenness using the exposure unevenness correction plate according to claim 1, wherein the placement position of the exposure unevenness correction plate is displaced in the optical axis direction of the imaging lens to cause exposure unevenness. An exposure unevenness correction method characterized by adjusting to a position where it becomes the smallest.
ット状の露光部に原稿像を結像させる結像レンズに起因
する、上記露光部長手方向の露光むらを補正するための
補正板であって、 透明基板の片側の面に、高い遮光率をもつ帯状の遮光膜
が、上記結像レンズの有効径より細く、且つ上記有効径
より長く成膜形成されたことを特徴とする、露光むら補
正板。5. A correction plate for correcting unevenness in exposure in the longitudinal direction of the exposure section, which is caused by an imaging lens for forming an original image on a slit-shaped exposure section, in a slit exposure type copying machine. The exposure unevenness correction is characterized in that a band-shaped light-shielding film having a high light-shielding rate is formed on one surface of the transparent substrate so as to be thinner than the effective diameter of the imaging lens and longer than the effective diameter. Board.
光むらを補正する方法であって、遮光膜の幅方向を上記
露光部長手方向に対応させ、露光部長手方向における露
光むらが最も小さくなるように、結像レンズ光軸上の配
備位置を調整することを特徴とする、露光むら補正方
法。6. A method for correcting exposure unevenness using the exposure unevenness correction plate according to claim 5, wherein the width direction of the light-shielding film is made to correspond to the longitudinal direction of the exposure portion, and the exposure unevenness in the longitudinal direction of the exposure portion is caused. A method for correcting exposure unevenness, which comprises adjusting the deployment position on the optical axis of the imaging lens so as to be the smallest.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP331392A JPH05188218A (en) | 1992-01-10 | 1992-01-10 | Uneven exposure correcting plate, production of uneven exposure correcting plate and uneven exposure correcting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP331392A JPH05188218A (en) | 1992-01-10 | 1992-01-10 | Uneven exposure correcting plate, production of uneven exposure correcting plate and uneven exposure correcting method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05188218A true JPH05188218A (en) | 1993-07-30 |
Family
ID=11553872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP331392A Pending JPH05188218A (en) | 1992-01-10 | 1992-01-10 | Uneven exposure correcting plate, production of uneven exposure correcting plate and uneven exposure correcting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05188218A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003075304A1 (en) * | 2002-03-04 | 2003-09-12 | Koninklijke Philips Electronics N.V. | Cathode ray tube having a reduced difference in light transmittance between a central region and a peripheral region of a panel face thereof |
| JP2009246371A (en) * | 1997-12-23 | 2009-10-22 | Canon Inc | Projection light source |
-
1992
- 1992-01-10 JP JP331392A patent/JPH05188218A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009246371A (en) * | 1997-12-23 | 2009-10-22 | Canon Inc | Projection light source |
| WO2003075304A1 (en) * | 2002-03-04 | 2003-09-12 | Koninklijke Philips Electronics N.V. | Cathode ray tube having a reduced difference in light transmittance between a central region and a peripheral region of a panel face thereof |
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