JPH0481966U

JPH0481966U -

Info

Publication number: JPH0481966U
Application number: JP12386390U
Authority: JP
Priority date: 1990-11-26
Filing date: 1990-11-26
Publication date: 1992-07-16

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の実施例の密封用リングの平面
図、第２図は上記密封用リングを出入口の外周部
に取り付けた状態を示す斜視図、第３図は上記密
封用リングの成型に使用する金型の斜視図、第４
図は本考案を適用するプラズマ装置の概略全体構
成図、第５図は上記プラズマ装置の要部斜視図、
第６図Ａ，Ｂは上記プラズマ装置の扉を開放した
場合と、閉じた場合を示す側面図、第７図Ａ，Ｂ
は従来の密封用リングの自然放置状態の形状と、
強制変形させた場合の形状のそれぞれ平面図であ
る。符号説明、１……密封用リング、２……金型、
６……出入口、７……扉、Ｗ……シリコンウエー
ハ（被処理物）。 Fig. 1 is a plan view of a sealing ring according to an embodiment of the present invention, Fig. 2 is a perspective view showing the sealing ring attached to the outer periphery of the entrance/exit, and Fig. 3 is a diagram showing the molding of the sealing ring. Perspective view of the mold used, 4th
The figure is a schematic overall configuration diagram of a plasma device to which the present invention is applied, and FIG. 5 is a perspective view of essential parts of the plasma device.
Figures 6A and B are side views showing when the door of the plasma device is opened and closed; Figures 7A and B
is the shape of a conventional sealing ring in its natural state,
FIG. 7 is a plan view of the shape when forcedly deformed. Symbol explanation, 1...Sealing ring, 2...Mold,
6... Entrance/exit, 7... Door, W... Silicon wafer (object to be processed).

Claims

【実用新案登録請求の範囲】被処理物をプラズマ雰囲気中で加工する際に使
用するプラズマ装置における前記被処理物を出入
りさせる出入口の周囲に設けられ、外気遮断用の
扉とで前記プラズマ装置内をシールする密封用リ
ングにおいて、前記密封用リングは、前記出入口の開口部の形
状に合わせて予め型成形されていることを特徴と
するプラズマ装置の密封用リング。[Claims for Utility Model Registration] A door for shutting off outside air is provided around an entrance for entering and exiting the workpiece in a plasma apparatus used when processing the workpiece in a plasma atmosphere. A sealing ring for a plasma device, wherein the sealing ring is molded in advance to match the shape of the opening of the inlet/outlet.