JPH0465443U - - Google Patents
Info
- Publication number
- JPH0465443U JPH0465443U JP10898590U JP10898590U JPH0465443U JP H0465443 U JPH0465443 U JP H0465443U JP 10898590 U JP10898590 U JP 10898590U JP 10898590 U JP10898590 U JP 10898590U JP H0465443 U JPH0465443 U JP H0465443U
- Authority
- JP
- Japan
- Prior art keywords
- film
- spacer
- reel
- winds
- pulled out
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000006850 spacer group Chemical group 0.000 claims description 13
- 238000004804 winding Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Wire Bonding (AREA)
Description
第１図は本考案によるフイルム露光装置の一実
施例を示す正面図である。
図中、１……第１スペーサリール、２……フイ
ルム供給リール、３……フイルム巻取りリール、
４……第２スペーサリール、５……スレーサフイ
ルム６……補助ローラ、７ａ，７ｂ……送りロー
ラ、８……スプロケツトローラ、９……押圧ロー
ラ、１０……露光部、１１……露光位置、１２…
…スペーサフイルム、２０……照射部、２１……
放電ランプ、２２……楕円集光鏡、２３……イン
テグレータレンズ、２４……反射鏡、２５……コ
ンデンサレンズ、２６……レチクル、２７……投
影光学系、Ｆ……フイルム。
FIG. 1 is a front view showing an embodiment of a film exposure apparatus according to the present invention. In the figure, 1...first spacer reel, 2...film supply reel, 3...film take-up reel,
4... Second spacer reel, 5... Slayer film 6... Auxiliary roller, 7a, 7b... Feed roller, 8... Sprocket roller, 9... Press roller, 10... Exposure section, 11... Exposure position, 12...
...Spacer film, 20...Irradiation section, 21...
Discharge lamp, 22...Elliptical condenser mirror, 23...Integrator lens, 24...Reflector, 25...Condenser lens, 26...Reticle, 27...Projection optical system, F...Film.
Claims (1)
クルの回路パターンを投影する照射部と、 未露光のフイルム及びこのフイルムに重ねられ
た第１のスペーサフイルムを巻回しているフイル
ム供給リールと、 該フイルム供給リールより引き出された前記第
１スペーサフイルムを巻き取る第１のスペーサリ
ールと、 第２のスペーサフイルムが巻回された第２のス
ペーサリールと、 露光の終了したフイルムに前記第２のスペーサ
リールから引き出された前記第２のスペーサフイ
ルムを重ね合わせて巻き取るフイルム巻取りリー
ルとを備えたフイルム露光装置において、 前記第１のスペーサリール、前記フイルム供給
リール、前記フイルム巻取りリール及び第２のス
ペーサリールの各々を鉛直方向の一直線上に配置
することを特徴とするフイルム露光装置。[Scope of Claim for Utility Model Registration] An irradiation unit that receives light from a light source and projects a reticle circuit pattern onto a strip-shaped film, and winds an unexposed film and a first spacer film superimposed on this film. a first spacer reel that winds up the first spacer film pulled out from the film supply reel; a second spacer reel around which a second spacer film is wound; and end of exposure. a film take-up reel for overlapping and winding the second spacer film pulled out from the second spacer reel on the film taken out from the second spacer reel, the first spacer reel, the film supply reel; A film exposure apparatus characterized in that each of the film take-up reel and the second spacer reel is arranged on a straight line in the vertical direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10898590U JPH0465443U (en) | 1990-10-19 | 1990-10-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10898590U JPH0465443U (en) | 1990-10-19 | 1990-10-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0465443U true JPH0465443U (en) | 1992-06-08 |
Family
ID=31856134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10898590U Pending JPH0465443U (en) | 1990-10-19 | 1990-10-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0465443U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7292308B2 (en) | 2004-03-23 | 2007-11-06 | Asml Holding N.V. | System and method for patterning a flexible substrate in a lithography tool |
| JP2007314347A (en) * | 2006-04-27 | 2007-12-06 | Orc Mfg Co Ltd | Conveying device |
-
1990
- 1990-10-19 JP JP10898590U patent/JPH0465443U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7292308B2 (en) | 2004-03-23 | 2007-11-06 | Asml Holding N.V. | System and method for patterning a flexible substrate in a lithography tool |
| JP2007314347A (en) * | 2006-04-27 | 2007-12-06 | Orc Mfg Co Ltd | Conveying device |
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