JPH0461723A - Impregnation type cathode and its manufacture - Google Patents
Impregnation type cathode and its manufactureInfo
- Publication number
- JPH0461723A JPH0461723A JP2166813A JP16681390A JPH0461723A JP H0461723 A JPH0461723 A JP H0461723A JP 2166813 A JP2166813 A JP 2166813A JP 16681390 A JP16681390 A JP 16681390A JP H0461723 A JPH0461723 A JP H0461723A
- Authority
- JP
- Japan
- Prior art keywords
- electron emitting
- emitting surface
- porous body
- cathode
- opening part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000005470 impregnation Methods 0.000 title abstract description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 12
- 238000002844 melting Methods 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 8
- 239000010937 tungsten Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims 1
- 230000006866 deterioration Effects 0.000 abstract description 2
- 230000002950 deficient Effects 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 6
- 229910052788 barium Inorganic materials 0.000 description 5
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001552 barium Chemical class 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Solid Thermionic Cathode (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は主として電子ビーム発生装置、陰極線管の電子
源として用いられる含浸型陰極に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention mainly relates to an impregnated cathode used as an electron source for an electron beam generator or a cathode ray tube.
従来、含浸型陰極は以下のような方法で作られている。 Conventionally, impregnated cathodes have been made by the following method.
まず４〜６μｍ程度の平均粒径のタングステン粉末をプ
レス成型し、約２０００〜２３００°Ｃで焼結を行い、
気孔率２０〜２５％の多孔質タングステンを作る。陰極
形状への機械加工が必要な場合は銅やプラスチックを含
浸し、加工後に熱処理でこれを除去するなどの工程が入
るが、多孔質体にはその後ＢａＣＯ３を主成分とする化
合物を水素雰囲気中にて約１８００°Ｃに加熱、溶融し
多孔質体内部に含浸する。陰極表面に残った余剰の含浸
剤を研摩紙等で除去した後、真空中で熱処理を行い、陰
極製作の基本工程を完了する。First, tungsten powder with an average particle size of about 4 to 6 μm is press-molded and sintered at about 2000 to 2300°C.
Create porous tungsten with a porosity of 20-25%. If machining into the shape of a cathode is required, a process such as impregnating copper or plastic and removing it by heat treatment is required after machining, but the porous body is then treated with a compound mainly composed of BaCO3 in a hydrogen atmosphere. The mixture is heated to about 1800°C, melted, and impregnated into the porous body. After removing excess impregnating agent remaining on the cathode surface with abrasive paper, etc., heat treatment is performed in a vacuum to complete the basic process of cathode production.
このようにして作られた陰極の電子放射面には含浸剤を
詰められた５μｍφ程度の大きさの開孔が無数に存在し
ている。On the electron emitting surface of the cathode thus produced, there are countless openings each having a size of about 5 μm and filled with an impregnating agent.
第１図は、そのような電子放射面の一部を拡大した模式
図であり、１は多孔質体、２はその間孔を示す。図示し
たように開孔間の間隔をｄ（平均値をｄ）とするとｄ’
＝２〜１０μｍ程度となっている。また電子放射面（全
面）に対する開孔部分の面積比は２０〜５０％程度とな
っている。FIG. 1 is a schematic enlarged view of a part of such an electron emitting surface, where 1 indicates a porous body and 2 indicates the pores therebetween. As shown in the figure, if the distance between the holes is d (the average value is d), then d'
= approximately 2 to 10 μm. Further, the area ratio of the opening portion to the electron emitting surface (the entire surface) is about 20 to 50%.
［発明が解決しようとする課題］
上記のようにして作られた含浸型陰極は、１０−’〜１
０−ＢＴｏｒｒのような非常に良好な真空中では安定し
て動作するが、真空度が１０−５〜１０−’Ｔｏｒｒで
使用される装置や、工程中に水蒸気等にさらされること
が不可避のような場合には電子放出特性の劣化又は不安
定動作が引きおこされるという問題点があった。[Problem to be solved by the invention] The impregnated cathode produced as described above has a
Although it operates stably in a very good vacuum such as 0-B Torr, equipment used at a vacuum degree of 10-5 to 10-'Torr or unavoidable exposure to water vapor etc. during the process. In such cases, there is a problem in that electron emission characteristics deteriorate or unstable operation occurs.
本発明は上記問題点を解消し、真空度の低い状態にさら
されても特性の劣化が小さく安定動作が保たれる改善さ
れた含浸型陰極およびその製造方法を提供しようとする
ものである。The present invention aims to solve the above-mentioned problems and provide an improved impregnated cathode that exhibits little deterioration of characteristics and maintains stable operation even when exposed to a low degree of vacuum, and a method for manufacturing the cathode.
〔課題を解決するための手段〕
上記目的を達成するために、本発明はタングステン、モ
リブデン等の高融点金属の多孔質体にＢａＣＯ３を主成
分とする化合物を溶融、含浸してなる含浸型陰極におい
て、前記多項質体の電子放射面における開孔間の平均間
隔を２５〜１２５μｍとし、電子放射面に対する開孔部
分の面積比が０．０２〜１．０％となるようにしたもの
である。[Means for Solving the Problems] In order to achieve the above object, the present invention provides an impregnated cathode obtained by melting and impregnating a porous body of a high-melting point metal such as tungsten or molybdenum with a compound mainly composed of BaCO3. In the above, the average interval between the openings on the electron emission surface of the polytopic body is set to 25 to 125 μm, and the area ratio of the openings to the electron emission surface is 0.02 to 1.0%. .
また、上記陰極を作る製造方法として、平均粒径１〜２
．５μｍのタングステン、モリブデン等の高融点金属の
粉末を成型、焼結して多孔質体を作り、該多孔質体にＢ
、ＣＯ，を主成分とする化合物を溶融、含浸した後、前
記多孔質体の電子放射面の開口部分の一部を目詰まりさ
せることにより、前記平均間隔、前記面積比を有する陰
極を製造するようにしたものである。In addition, as a manufacturing method for making the above cathode, an average particle size of 1 to 2
．． A porous body is made by molding and sintering 5 μm powder of high melting point metal such as tungsten or molybdenum, and B is added to the porous body.
, CO, is melted and impregnated with the compound as a main component, and then a part of the opening portion of the electron emitting surface of the porous body is clogged, thereby manufacturing a cathode having the above-mentioned average spacing and the above-mentioned area ratio. This is how it was done.
含浸型陰極の電子放射面を本発明のように構成すること
により開孔部分の面積が従来のものに較べ１／１００〜
１１５０と格段に小さくなるので低真空下における含浸
部分への悪影響が著しく低減される。By configuring the electron emitting surface of the impregnated cathode as in the present invention, the area of the aperture can be reduced to 1/100 to 1/100 compared to the conventional one.
1150, which is significantly smaller, so that the adverse effect on the impregnated part under low vacuum is significantly reduced.
一方、電子放射特性については開孔部分の面積が小さく
なるにも拘らず以下に述べる理由で放射電流の低下を招
くことはない。On the other hand, regarding the electron emission characteristics, although the area of the aperture becomes smaller, the emission current does not decrease for the reasons described below.
バリウムを含む含浸型陰極においては、陰極温度を１０
００〜１１００°Ｃ６に加熱すると含浸した化合物と多
孔質体内部とが界面にて化学反応をおこして遊離バリウ
ムが生成し、これが陰極表面に拡散してバリウムの単原
子層を作り電子放射源となるが、このバリウム単原子層
の拡散距離は９００°Ｃ１１で約２５０ ａ ｍ、 １
１００”Ｃｍで約１００μｍである。本発明においては
開孔間の平均間隔を１２５μｍ以下とするのでバリウム
単原子層を電子放射面に隈なく生成させるには充分短か
い間隔であり、その生成は充分に行なわれ電子放射特性
が損われることは全くない。In an impregnated cathode containing barium, the cathode temperature is set to 10
When heated to 00 to 1100°C6, a chemical reaction occurs at the interface between the impregnated compound and the inside of the porous body, producing free barium, which diffuses onto the cathode surface to form a monoatomic layer of barium, which acts as an electron radiation source. However, the diffusion distance of this barium monoatomic layer is approximately 250 am at 900°C, 1
At 100"Cm, it is approximately 100 μm. In the present invention, the average distance between the openings is set to 125 μm or less, which is a sufficiently short distance to generate a barium monoatomic layer all over the electron emitting surface. It is carried out satisfactorily and the electron emission characteristics are not impaired at all.
また従来の含浸型陰極においては開孔が近接して存在す
るため電子放射面に過剰なバリウム原子を生じ、特性が
逆に悪化することがあったが本発明では平均間隔を２５
μｍ以上とすることにしたのでそのおそれを軽減するこ
とができる。In addition, in conventional impregnated cathodes, the openings are located close to each other, resulting in excessive barium atoms on the electron emitting surface, which may actually deteriorate the properties, but in the present invention, the average spacing is reduced to 25
Since the thickness is set to be .mu.m or more, this possibility can be reduced.
本発明の実施例について以下に説明する。まず、平均粒
径２μｍ、純度９９．９％のタングステン粉末を０．５
〜１．０ ｔ／ｃｍ”の圧力で所要の形状にプレス成型
し、その後２２００〜２５００°Ｃの還元性雰囲気中で
焼結を行い気孔率１８〜２５％の多孔質タングステンを
得る。多孔質タングステンに銅又はプラスチックを含浸
した後、機械加工により所要の陰極寸法に加工し、その
後熱処理により含浸した銅またはプラスチックを完全に
除去する。Examples of the present invention will be described below. First, 0.5 μm of tungsten powder with an average particle size of 2 μm and a purity of 99.9% was
It is press-molded into the desired shape at a pressure of ~1.0 t/cm", and then sintered in a reducing atmosphere at 2200-2500°C to obtain porous tungsten with a porosity of 18-25%. Porous After impregnating tungsten with copper or plastic, it is machined to the required cathode dimensions, and then heat treated to completely remove the impregnated copper or plastic.
次に、モリブデン等の高融点金属よりなるカソードスリ
ーブ（カソード支持筒）の端部に上記陰極をＭｏ−Ｒｕ
粉末ロウ材により接合し、カソードスリーブの内側に陰
極加熱用ヒータをアルミナ粉末によるポツティングによ
り埋め込む。次に、含浸剤としてＢａＣＯ３、ＣａＣ０
１，＾！２０．を１１：１に混合した化合物を陰極表面
に載せ、還元性雰囲気炉で多孔質体内部に溶融、含浸す
る。含浸されない余剰の含浸剤を除去した後＃６００〜
＃ １０００メツシユの粗さのアルミナ製研摩紙を用い
て電子放射面を研摩する。この研摩により多孔質タング
ステンの表面の薄層に微細な変形を生じるが、無数に存
在する開孔の中の一部はその変形により目詰まりされ塞
がれた状態となる。Next, the cathode was attached to the end of a cathode sleeve (cathode support cylinder) made of a high melting point metal such as molybdenum.
They are joined using powder brazing material, and a cathode heater is embedded inside the cathode sleeve by potting with alumina powder. Next, as an impregnating agent, BaCO3, CaC0
1, ^! 20. A compound prepared by mixing 11:1 is placed on the surface of the cathode, and is melted and impregnated into the inside of the porous body in a reducing atmosphere furnace. After removing the excess impregnating agent that is not impregnated, #600~
# Polish the electron emitting surface using alumina abrasive paper with a roughness of 1000 mesh. This polishing causes minute deformations in the thin layer on the surface of the porous tungsten, but this deformation causes some of the countless openings to become clogged and blocked.
第２図は本発明の陰極の電子放射面の一部を拡大した模
式図であり、３は多孔質体、４は開孔である。研摩前の
状態では開孔間隔は２〜５μｍ程度であり、電子放射面
に対する開孔部の面積比は１０〜２０％程度となってい
るが、上記研摩を行いその強度（圧力、速度、時間等）
を調節することにより図示したように開孔間隔をｄ＝２
５〜１２５μｍとすることができる。同時に開孔部分の
面積比は０．０２〜１．０％となる。上記研摩工程のあ
と真空炉中で熱処理を行い含浸型陰極の製作を完了する
。FIG. 2 is a schematic enlarged view of a part of the electron emitting surface of the cathode of the present invention, where 3 is a porous body and 4 is an opening. Before polishing, the gap between the holes is about 2 to 5 μm, and the area ratio of the holes to the electron emitting surface is about 10 to 20%. etc)
By adjusting the hole spacing as shown in the figure, d=2
It can be 5 to 125 μm. At the same time, the area ratio of the open hole portion is 0.02 to 1.0%. After the above polishing step, heat treatment is performed in a vacuum furnace to complete the production of the impregnated cathode.
本実施例の陰極を真空度１０−Ｓ〜１０−６Ｔｏｒｒの
電子ビーム発生装置に装着し動作させたという、顕著な
特性の改善が見られた。特性例を第３図に本発明による
陰極の特性を示す。本発明の場合、放射電流特性の改善
により図示したように従来技術のものに較べ約１００°
ＣＩｌ低い陰極温度で同一な陰極電流が得られることが
確められた。When the cathode of this example was installed and operated in an electron beam generator with a vacuum degree of 10-S to 10-6 Torr, a remarkable improvement in characteristics was observed. An example of the characteristics is shown in FIG. 3, which shows the characteristics of the cathode according to the present invention. In the case of the present invention, as shown in the figure, due to the improvement in the radiation current characteristics, the angle is approximately 100° compared to the conventional technology.
It was confirmed that the same cathode current can be obtained at a lower cathode temperature.
上述の実施例は多孔質体に含浸剤を含浸した後に研摩工
程を設は所要の表面状態を得るようにし比が得られる加
工方法であればよく、上述の方法に限られるものではな
い。The above-mentioned embodiments are not limited to the above-mentioned method, as long as the polishing step is performed after the porous body is impregnated with the impregnating agent to obtain the desired surface condition and the ratio can be obtained.
たとえば多孔質体の本体となるべき粒度４〜６μｍのタ
ングステン粉末の上層に適度な粒度（２μｍ以下）のタ
ングステン粉末の層（成型後の厚さ約１００μｍ）を被
せて一体に成型し、これを焼結することにより、研摩工
程なしで上記と同等な表面状態の得ることが可能である
。なお従来の様な方法で表面から内部まで均一な多孔質
体で同様な表面状態を得ることも可能ではあるが、この
場合は同時に気孔率が小さくなり、含浸量が減る結果と
なるので寿命の点で好ましくない。For example, a layer of tungsten powder with an appropriate particle size (2 μm or less) (about 100 μm thick after molding) is placed on top of a layer of tungsten powder with a particle size of 4 to 6 μm, which is to form the main body of the porous body, and then molded into one piece. By sintering, it is possible to obtain a surface condition equivalent to that described above without a polishing step. It is also possible to obtain a similar surface condition with a porous material that is uniform from the surface to the inside using conventional methods, but in this case, the porosity becomes smaller and the amount of impregnation decreases, resulting in a shorter service life. Unfavorable in some respects.
以上説明したように本発明による含浸型陰極は従来技術
によるものに較べ電子放射面における開孔部分の面積が
極めて小さいので低真空雰囲気に強く、且つ充分な電子
放射が得られるので、比較的低真空度雰囲気で使用する
電子装置の陰極として利用する場合、特にその効果が発
揮される。As explained above, the impregnated cathode according to the present invention has an extremely small area of the opening on the electron emitting surface compared to the conventional technology, so it is resistant to low vacuum atmosphere and can obtain sufficient electron emission, so it has a relatively low This effect is particularly exhibited when used as a cathode for electronic devices used in a vacuum atmosphere.
また前述のように製造方法としては本実施例の他に種々
考えられるが実施例のような方法によった場合は、多孔
質体内部の気孔率は１８〜２５％と大きくとれるので含
浸剤を充分に貯えることができ、且つ開孔部分の面積が
小さく作られるので含浸剤の蒸発を充分抑制でき、寿命
の点でも好結果が得られる。In addition, as mentioned above, various manufacturing methods can be considered other than those in this example, but if the method in this example is used, the porosity inside the porous body can be as high as 18 to 25%, so no impregnating agent can be used. Since it can be stored sufficiently and the area of the opening is made small, evaporation of the impregnating agent can be sufficiently suppressed, and good results can be obtained in terms of service life.
第１図は従来技術による含浸型陰極の電子放射面の拡大
模式図、第２図は本発明による同上陰極の拡大模式図、
第３図は陰極電流の対陰極温度特性を示す特性図であり
、本発明によるものと従来技術によるものとを対比して
示す。
１．３・・・多孔質体、２．４・・・開孔、５・・・従
来技術による含浸型陰極の特性、６・・・本発明による
含浸型陰極の特性。
第１図
第２図
１α℃
１２０゜
陰極１度 （’ＣＢ）
第３図FIG. 1 is an enlarged schematic diagram of the electron emitting surface of an impregnated cathode according to the prior art, and FIG. 2 is an enlarged schematic diagram of the same cathode according to the present invention.
FIG. 3 is a characteristic diagram showing anticathode temperature characteristics of cathode current, and shows a comparison between the present invention and the prior art. 1.3...Porous body, 2.4...Open pores, 5...Characteristics of the impregnated cathode according to the prior art, 6...Characteristics of the impregnated cathode according to the present invention. Figure 1 Figure 2 1α℃ 120° Cathode 1 degree ('CB) Figure 3
Claims (1)
体にＢａＣＯ＿３を主成分とする化合物を溶融、含浸し
てなる含浸型陰極において、前記多孔質体の電子放射面
における開孔間の平均間隔を２５〜１２５μｍとし、電
子放射面に対する開孔部分の面積比を０．０２〜１．０
％としたことを特徴とする含浸型陰極。 ２、平均粒径１〜２．５μｍのタングステン、モリブデ
ン等の高融点金属の粉末を成型、焼結して多孔質体を作
り、該多孔質体にＢａＣＯ＿３を主成分とする化合物を
溶融、含浸した後、前記多孔質体の電子放射面に研摩加
工を加えて該電子放射面の開孔部分の一部を目詰まりさ
せ、請求項１項記載の含浸型陰極を製造する方法。[Claims] 1. An impregnated cathode obtained by melting and impregnating a porous body of a high-melting point metal such as tungsten or molybdenum with a compound containing BaCO_3 as a main component, in which an electron emitting surface of the porous body has an open area. The average interval between holes is 25 to 125 μm, and the area ratio of the opening to the electron emission surface is 0.02 to 1.0.
%. 2. Molding and sintering powder of high melting point metals such as tungsten and molybdenum with an average particle size of 1 to 2.5 μm to create a porous body, and melting and impregnating the porous body with a compound whose main component is BaCO_3. 2. The method for producing an impregnated cathode according to claim 1, wherein the electron emitting surface of the porous body is then polished to partially clog the openings of the electron emitting surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16681390A JP3068160B2 (en) | 1990-06-27 | 1990-06-27 | Impregnated cathode and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16681390A JP3068160B2 (en) | 1990-06-27 | 1990-06-27 | Impregnated cathode and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0461723A true JPH0461723A (en) | 1992-02-27 |
| JP3068160B2 JP3068160B2 (en) | 2000-07-24 |
Family
ID=15838142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16681390A Expired - Fee Related JP3068160B2 (en) | 1990-06-27 | 1990-06-27 | Impregnated cathode and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3068160B2 (en) |
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1990
- 1990-06-27 JP JP16681390A patent/JP3068160B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP3068160B2 (en) | 2000-07-24 |
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