JPH0453058U - - Google Patents
Info
- Publication number
- JPH0453058U JPH0453058U JP9354990U JP9354990U JPH0453058U JP H0453058 U JPH0453058 U JP H0453058U JP 9354990 U JP9354990 U JP 9354990U JP 9354990 U JP9354990 U JP 9354990U JP H0453058 U JPH0453058 U JP H0453058U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- chamber
- differential
- connecting portion
- pumping device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005086 pumping Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案に係る差動排気装置の一実施例
の概略構成を示す構成図、第２図、第３図は乾燥
気体の流量に伴う酸素イオン電流値と真空槽内の
到達真空度の変化を示す図、第４図は差動排気装
置の他の実施例の概略構成を示す構成図である。
１１，１２，２１，２２……差動排気室、１１
ａ，１２ａ，２１ａ，２２ａ，２４ａ……真空計
、１１ｂ……出入り口、１３，２０……真空槽、
１３ｂ……質量分析器、１４，１５，２３，２４
……連結部、１４ｂ，２４ｂ……乾燥ガス供給器
、１４ｃ，２４ｃ……流量計、２５……長尺基体
、２６……送り出し装置、２７……巻取装置。
Fig. 1 is a block diagram showing the schematic structure of an embodiment of the differential pumping device according to the present invention, and Figs. 2 and 3 show the oxygen ion current value and the ultimate vacuum degree in the vacuum chamber according to the flow rate of dry gas. FIG. 4 is a block diagram showing a schematic structure of another embodiment of the differential pumping device. 11, 12, 21, 22...differential exhaust chamber, 11
a, 12a, 21a, 22a, 24a... Vacuum gauge, 11b... Doorway, 13, 20... Vacuum chamber,
13b...Mass spectrometer, 14, 15, 23, 24
. . . Connection portion, 14b, 24b . . . Dry gas supply device, 14c, 24c . . . Flow meter, 25 .
Claims (1)
動排気室内と真空槽内を連通させ、該真空槽内へ
の大気の漏入を抑えると共に、前記差動排気室、
連結部及び真空槽を移動貫通する長尺基体に前記
真空槽内で成膜及び表面処理を行うようにした差
動排気装置において、前記差動排気室と真空槽と
に設けた前記長尺基体の導入口、導出口及び連結
部のうち、少なくともいずれかに乾燥気体を注入
する気体注入手段を具えたことを特徴とする差動
排気装置。 The differential exhaust chamber and the vacuum chamber are connected by a connecting portion to communicate the differential exhaust chamber and the inside of the vacuum chamber to suppress leakage of air into the vacuum chamber, and the differential exhaust chamber,
In a differential pumping device, in which a long substrate that moves through a connecting portion and a vacuum chamber is subjected to film formation and surface treatment in the vacuum chamber, the long substrate is provided in the differential pumping chamber and the vacuum chamber. A differential pumping device comprising a gas injection means for injecting dry gas into at least one of an inlet, an outlet, and a connecting portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9354990U JPH0453058U (en) | 1990-09-07 | 1990-09-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9354990U JPH0453058U (en) | 1990-09-07 | 1990-09-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0453058U true JPH0453058U (en) | 1992-05-06 |
Family
ID=31830855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9354990U Pending JPH0453058U (en) | 1990-09-07 | 1990-09-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0453058U (en) |
-
1990
- 1990-09-07 JP JP9354990U patent/JPH0453058U/ja active Pending