JPH0437574B2 - - Google Patents

Info

Publication number: JPH0437574B2
Authority: JP; Japan
Prior art keywords: substrate; image; original plate; optical system; photosensitive layer
Prior art date: 1987-05-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP62131077A

Other languages

English (en)

Japanese (ja)

Other versions

JPS63299122A (ja

Inventor

Takanaga Shiozawa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-05-29

Filing date

1987-05-29

Publication date

1992-06-19

1987-05-29 Application filed by Canon Inc filed Critical Canon Inc

1987-05-29 Priority to JP62131077A priority Critical patent/JPS63299122A/ja

1988-12-06 Publication of JPS63299122A publication Critical patent/JPS63299122A/ja

1991-08-08 Priority to US07/742,535 priority patent/US5140366A/en

1992-06-19 Publication of JPH0437574B2 publication Critical patent/JPH0437574B2/ja

Status Granted legal-status Critical Current

Links

230000003287 optical effect Effects 0.000 claims description 41
239000000758 substrate Substances 0.000 claims description 33
238000000034 method Methods 0.000 claims description 26
238000012546 transfer Methods 0.000 claims description 20
238000001514 detection method Methods 0.000 claims description 13
238000005259 measurement Methods 0.000 description 10
238000010586 diagram Methods 0.000 description 7
238000005286 illumination Methods 0.000 description 3
230000002159 abnormal effect Effects 0.000 description 2
238000012937 correction Methods 0.000 description 2
238000003384 imaging method Methods 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
230000004075 alteration Effects 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
230000000593 degrading effect Effects 0.000 description 1
230000000694 effects Effects 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
150000002367 halogens Chemical class 0.000 description 1
239000000463 material Substances 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1

Landscapes

Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

JP62131077A 1987-05-29 1987-05-29 露光装置の位置合せ方法 Granted JPS63299122A (ja)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
JP62131077A JPS63299122A (ja)	1987-05-29	1987-05-29	露光装置の位置合せ方法
US07/742,535 US5140366A (en)	1987-05-29	1991-08-08	Exposure apparatus with a function for controlling alignment by use of latent images

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP62131077A JPS63299122A (ja)	1987-05-29	1987-05-29	露光装置の位置合せ方法

Publications (2)

Publication Number	Publication Date
JPS63299122A JPS63299122A (ja)	1988-12-06
JPH0437574B2 true JPH0437574B2 (de)	1992-06-19

Family

ID=15049448

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP62131077A Granted JPS63299122A (ja)	1987-05-29	1987-05-29	露光装置の位置合せ方法

Country Status (1)

Country	Link
JP (1)	JPS63299122A (de)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6144429A (ja) *	1984-08-09	1986-03-04	Nippon Kogaku Kk <Nikon>	位置合わせ方法、及び位置合せ装置
JPS61201427A (ja) *	1985-03-04	1986-09-06	Nippon Kogaku Kk <Nikon>	位置ずれ検出方法

1987
- 1987-05-29 JP JP62131077A patent/JPS63299122A/ja active Granted

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6144429A (ja) *	1984-08-09	1986-03-04	Nippon Kogaku Kk <Nikon>	位置合わせ方法、及び位置合せ装置
JPS61201427A (ja) *	1985-03-04	1986-09-06	Nippon Kogaku Kk <Nikon>	位置ずれ検出方法

Also Published As

Publication number	Publication date
JPS63299122A (ja)	1988-12-06

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Legal Events

Date	Code	Title	Description
2007-05-29	EXPY	Cancellation because of completion of term