JPH04308696A - Beam position monitor for particle accelerator - Google Patents
Beam position monitor for particle acceleratorInfo
- Publication number
- JPH04308696A JPH04308696A JP9960091A JP9960091A JPH04308696A JP H04308696 A JPH04308696 A JP H04308696A JP 9960091 A JP9960091 A JP 9960091A JP 9960091 A JP9960091 A JP 9960091A JP H04308696 A JPH04308696 A JP H04308696A
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- JP
- Japan
- Prior art keywords
- electrodes
- vacuum chamber
- electrode
- electromotive force
- beam position
- Prior art date
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- 239000002245 particle Substances 0.000 title claims abstract description 16
- 238000010894 electron beam technology Methods 0.000 abstract description 15
- 238000001514 detection method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000005469 synchrotron radiation Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007479 molecular analysis Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
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- Particle Accelerators (AREA)
- Measurement Of Radiation (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】この発明は、電子シンクロトロン
等の粒子加速器において、真空チャンバー内の粒子ビー
ム位置を測定するビーム位置モニタに関し、簡易な演算
で正確にビームの水平方向中心位置を測定できるように
したものである。[Industrial Application Field] This invention relates to a beam position monitor that measures the position of a particle beam in a vacuum chamber in a particle accelerator such as an electron synchrotron, and is capable of accurately measuring the horizontal center position of the beam with simple calculations. This is how it was done.
【０００２】0002
【従来の技術】近年、電子シンクロトロンは、シンクロ
トロン放射光（ＳＯＲ）装置として、超々ＬＳＩ回路の
作成、医療分野における診断、分子解析、構造解析等様
々な分野への適用が期待されている。[Prior Art] In recent years, electron synchrotrons, as synchrotron radiation (SOR) devices, are expected to be applied to various fields such as the creation of ultra-super LSI circuits, diagnosis in the medical field, molecular analysis, and structural analysis. .
【０００３】ＳＯＲ光装置の概要を図２に示す。電子発
生装置（電子銃等）１０で発生した電子ビームは線型加
速装置（ライナック）１２で光速近くに加速され、入射
部１４の偏向電磁石１６で偏向されて、インフレクタ１
８を介してシンクロトロン２０の真空チャンバー２２内
に入射される。真空チャンバー２２に入射された電子ビ
ームは高周波加速空洞２１でエネルギを与えられながら
収束電磁石２３で収束され、偏向電磁石２４で偏向され
て真空チャンバー２２中を回り続ける。偏向電磁石２４
で偏向される時に発生するシンクロトロン放射光はビー
ムチャンネル２６を通して例えば露光装置２８に送られ
て超々ＬＳＩ回路作成用の光源等として利用される。FIG. 2 shows an outline of an SOR optical device. An electron beam generated by an electron generator (electron gun, etc.) 10 is accelerated to near the speed of light by a linear accelerator (linac) 12, deflected by a deflection electromagnet 16 in an input section 14, and then passed through an inflector 1.
8 into the vacuum chamber 22 of the synchrotron 20. The electron beam incident on the vacuum chamber 22 is energized by the high frequency acceleration cavity 21, focused by the focusing electromagnet 23, deflected by the deflection electromagnet 24, and continues to circulate in the vacuum chamber 22. Bending electromagnet 24
The synchrotron radiation generated when being deflected by the beam channel 26 is sent to, for example, an exposure device 28 through a beam channel 26, and is used as a light source for producing ultra-super LSI circuits.
【０００４】真空チャンバー２２の各直線部には、電極
式ビーム位置モニタ３０が２個ずつ全周で合計８個設け
られている。この電極式ビーム位置モニタ３０は真空チ
ャンバー２２内のビーム中心位置を検出するもので、そ
の検出に応じて各種電磁石の励磁量を制御することによ
り、電子ビームが真空チャンバー２２内の中心軌道を通
るようにして、真空チャンバー２２の内壁に衝突するこ
となく長時間周回できるようにしている。[0004] Two electrode type beam position monitors 30 are provided on each straight section of the vacuum chamber 22, for a total of eight electrode type beam position monitors 30 on the entire circumference. This electrode type beam position monitor 30 detects the beam center position within the vacuum chamber 22, and controls the amount of excitation of various electromagnets according to the detection, so that the electron beam passes through the center orbit within the vacuum chamber 22. In this way, it is possible to circulate for a long time without colliding with the inner wall of the vacuum chamber 22.
【０００５】従来の電極式ビーム位置モニタの構成を図
３に示す。これは、前記図２において真空チャンバー２
２を電極式ビーム位置モニタ３０の位置で輪切にした状
態を示すものである。真空チャンバー２２内には電子ビ
ーム３４（図はビーム中心位置を示す）が周回している
。電極式位置モニタ３０はボタン電極等で構成され、通
常１箇所に４個の電極３０ａ〜３０ｄをビーム３４の周
囲に配置して構成される。各電極３０ａ〜３０ｄにはビ
ーム３４の通過により起電力ａ〜ｄが誘起される。FIG. 3 shows the configuration of a conventional electrode type beam position monitor. This corresponds to the vacuum chamber 2 in FIG.
2 is cut into rings at the position of the electrode type beam position monitor 30. An electron beam 34 (the figure shows the beam center position) circulates within the vacuum chamber 22. The electrode type position monitor 30 is composed of button electrodes and the like, and is usually constructed by arranging four electrodes 30a to 30d at one location around the beam 34. Electromotive forces a to d are induced in each of the electrodes 30a to 30d by the passage of the beam 34.
【０００６】ビーム位置演算回路３６はこれら検出信号
ａ〜ｄに基づきビーム位置を検出する。すなわち、水平
方向ビーム位置Ｐｈは例えば、
で求められる。また垂直方向ビーム位置Ｐｖは、ｋｈ，
ｋｖ：比例係数
で求められる。The beam position calculation circuit 36 detects the beam position based on these detection signals a to d. That is, the horizontal direction beam position Ph can be obtained by, for example. Also, the vertical beam position Pv is kh,
kv: Determined by proportionality coefficient.
【０００７】[0007]
【発明が解決しようとする課題】前記演算式によりビー
ム位置を求める従来のビーム位置モニタでは、真空チャ
ンバー内の中心位置近くではビーム位置を正確に求める
ことができるが、真空チャンバー内の中心位置から外れ
るほど誤差が大きくなる欠点があった。特に、真空チャ
ンバーの断面形状が前記図３のように水平方向に幅が広
いレーストラック型では、水平方向の検出位置精度が低
かった。この発明は、前記従来の技術における問題点を
解決して、真空チャンバー内水平方向のビーム位置を正
確に検出することができる。ビーム位置モニタを提供し
ようとするものである。[Problem to be Solved by the Invention] With the conventional beam position monitor that calculates the beam position using the above calculation formula, the beam position can be accurately determined near the center position in the vacuum chamber, but There was a drawback that the further the error occurred, the greater the error. In particular, in a racetrack type vacuum chamber in which the cross-sectional shape of the vacuum chamber is wide in the horizontal direction as shown in FIG. 3, the detection position accuracy in the horizontal direction is low. The present invention solves the problems in the conventional techniques and can accurately detect the beam position in the horizontal direction within the vacuum chamber. It attempts to provide a beam position monitor.
【０００８】[0008]
【課題を解決するための手段】この発明は、内周面に水
平方向の平坦部を有する真空チャンバーを具えた粒子加
速器において、前記平坦部に略々同一ピッチで略々周方
向に並べて配設された複数の電極と、これら各電極の起
電力を比較して、粒子ビームの径方向中心位置を求める
演算部とを具備してなるものである。[Means for Solving the Problems] The present invention provides a particle accelerator equipped with a vacuum chamber having a flat portion in the horizontal direction on its inner circumferential surface, in which particles are arranged in a substantially circumferential direction at substantially the same pitch on the flat portion. The apparatus is equipped with a calculation unit that compares the electromotive forces of the plurality of electrodes and the electromotive force of each of these electrodes to determine the radial center position of the particle beam.
【０００９】[0009]
【作用】この発明によれば、真空チャンバー内の水平方
向の平坦部に略々同一ピッチで略々周方向に複数の電極
を並べて配設したので、これら各電極の起電力はビーム
中心位置に近いところでは大きく、ビーム中心位置から
遠いところでは小さくなる。したがって、これら各電極
の起電力を比較することにより、その大小から粒子ビー
ムの中心位置を正確に検出することができる。[Operation] According to the present invention, a plurality of electrodes are arranged circumferentially at approximately the same pitch on a horizontally flat part of the vacuum chamber, so that the electromotive force of each of these electrodes is directed to the beam center position. It is large near the beam center and small when it is far from the beam center position. Therefore, by comparing the electromotive force of each of these electrodes, the center position of the particle beam can be accurately detected from the magnitude thereof.
【００１０】0010
【実施例】この発明の一実施例を以下説明する。図１は
シンクロトロン２０の真空チャンバー２２（図２）を電
極式ビーム位置モニタ３０の位置で輪切にして示したも
のである。この真空チャンバー２２は断面形状がレース
トラック型として形成されたもので、内部空間２２ａは
水平方向の幅が広く形成され、垂直方向の幅が狭く形成
されている。そして内周面４４の上下両面は水平でかつ
互いに平行な平坦部４４ａ，４４ｂとして形成されてい
る。この真空チャンバー２２は内部中心位置が電子ビー
ム３４の設計軌道とされている。[Embodiment] An embodiment of the present invention will be described below. FIG. 1 shows the vacuum chamber 22 (FIG. 2) of the synchrotron 20 cut into rings at the position of the electrode beam position monitor 30. The vacuum chamber 22 has a racetrack cross-sectional shape, and the internal space 22a has a wide width in the horizontal direction and a narrow width in the vertical direction. Both upper and lower surfaces of the inner circumferential surface 44 are formed as flat portions 44a and 44b that are horizontal and parallel to each other. The interior center of this vacuum chamber 22 is the designed trajectory of the electron beam 34.
【００１１】真空チャンバー２２の上側平坦部４４ａに
は、複数（３個以上。ここでは５個）の電極４０ａ〜４
０ｅが周方向に同一ピッチで並べて配設されている。ま
た、その位置の下側平坦部４４ｂにも複数の電極４２ａ
〜４２ｅが周方向に同一ピッチｄで上側の電極４０ａ〜
４０ｅとそれぞれ対向して配設されている。これら各電
極４０ａ〜４０ｅ、４２ａ〜４２ｅは、例えばボタン電
極で構成され、真空チャンバー内周面４４の上下平坦部
４４ａ，４４ｂの凹部４６に収容されて、電極面が平坦
部４４ａ，４４ｂと略々同一の高さでかつ真空チャンバ
ー２２と絶縁された状態で真空チャンバー２２の内部空
間２２ａに臨んでいる。The upper flat part 44a of the vacuum chamber 22 is provided with a plurality of (three or more, here five) electrodes 40a to 4.
0e are arranged side by side at the same pitch in the circumferential direction. Further, a plurality of electrodes 42a are also provided on the lower flat part 44b at that position.
~42e is the upper electrode 40a~ with the same pitch d in the circumferential direction
40e, and are arranged opposite to each other. Each of these electrodes 40a to 40e, 42a to 42e is constituted by, for example, a button electrode, and is housed in a recess 46 of the upper and lower flat parts 44a, 44b of the vacuum chamber inner circumferential surface 44, so that the electrode surface is approximately the same as the flat part 44a, 44b. They face the internal space 22a of the vacuum chamber 22 at the same height and insulated from the vacuum chamber 22.
【００１２】真空チャンバー２２内を電子ビーム３４（
図はベーム中心位置を示し、実際には電子ビーム３４は
広がりを持っている。）が通過すると、各電極４０ａ〜
４０ｅ、４２ａ〜４２ｅには、電子ビーム３４の中心位
置との距離に応じた起電力が生じる。すなわち、距離が
短くなるほど起電力は大きくなり、距離が長くなるほど
起電力は小さくなる。ビーム位置演算回路４８は、これ
ら起電力から水平方向および垂直方向のビーム位置を求
める。An electron beam 34 (
The figure shows the Boehm center position, and in reality the electron beam 34 has a spread. ) passes, each electrode 40a~
An electromotive force is generated in 40e, 42a to 42e depending on the distance from the center position of the electron beam 34. That is, the shorter the distance, the greater the electromotive force, and the longer the distance, the smaller the electromotive force. The beam position calculation circuit 48 determines the horizontal and vertical beam positions from these electromotive forces.
【００１３】ビーム位置演算回路４８によるビーム位置
の演算方法について説明する。なお、真空チャンバー２
２に電極式位置モニタ３０を組み込む場合、予め各電極
４０ａ〜４０ｅ、４２ａ〜４２ｅの検出感度を試験して
おき、これに応じてビーム位置演算回路４８における各
電極起電力検出値に対するゲインを設定しておき、全て
の電極４０ａ〜４０ｅ、４２ａ〜４２ｅが同一感度とな
るように補正しておく。The method of calculating the beam position by the beam position calculating circuit 48 will be explained. In addition, vacuum chamber 2
2, the detection sensitivity of each electrode 40a to 40e and 42a to 42e is tested in advance, and the gain for each electrode electromotive force detection value in the beam position calculation circuit 48 is set accordingly. Then, correction is made so that all the electrodes 40a to 40e and 42a to 42e have the same sensitivity.
【００１４】水平方向のビーム位置検出は、上下平坦部
４４ａ，４４ｂのうちの少なくとも一方の電極の起電力
検出値に基づいて行なうことができる。図４は下側平坦
部４４ｂの電極４２ａ〜４２ｅを用いて検出を行なう例
で、電子ビーム３４の中心位置が真空チャンバー２２内
の中心軌道（設計軌道）を通っている状態である。この
時の各電極４２ａ〜４２ｅの起電力は、同図下に示すよ
うに、中央位置の電極４２ｃで最も高く、そこから左右
にずれるに従い低くなる。ビーム位置演算回路４８は内
部の比較器でこれら各起電力の値を比較して、そのピー
クの起電力が生じる電極４２ｃの位置を水平方向のビー
ム中心位置として演算出力する。電子ビーム３４の中心
位置が図５のように中心軌道から右方向にずれると、各
電極４２ａ〜４２ｅの起電力は同図下に示すように変化
する。したがって、ビーム位置演算回路４８はピークの
起電力が生じる電極４２ｄの位置を水平方向のビーム中
心位置として演算出力する。The beam position in the horizontal direction can be detected based on the detected electromotive force of at least one electrode of the upper and lower flat portions 44a and 44b. FIG. 4 shows an example in which detection is performed using the electrodes 42a to 42e on the lower flat portion 44b, in which the center position of the electron beam 34 passes through the center orbit (designed orbit) within the vacuum chamber 22. At this time, the electromotive force of each of the electrodes 42a to 42e is highest at the central electrode 42c, and decreases as the electrodes 42c shift from there to the left and right, as shown in the lower part of the figure. The beam position calculation circuit 48 compares the values of each of these electromotive forces using an internal comparator, and calculates and outputs the position of the electrode 42c where the peak electromotive force occurs as the beam center position in the horizontal direction. When the center position of the electron beam 34 shifts to the right from the center orbit as shown in FIG. 5, the electromotive force of each electrode 42a to 42e changes as shown at the bottom of the figure. Therefore, the beam position calculation circuit 48 calculates and outputs the position of the electrode 42d where the peak electromotive force occurs as the beam center position in the horizontal direction.
【００１５】なお、より正確に水平方向位置を求めるに
は、ビーム位置演算回路３６でピークの起電力が得られ
る上下の電極（図５の例では４０ｄ，４２ｄ）と、その
次に大きな起電力が得られる上下の電極（同４０ｃ，４
２ｃ）を比較演算により求めるとともに、これら４つの
電極４０の起電力を用いて例えば、
から電極４０ｃ，４０ｄ間（４２ｃ，４２ｄ間）の正確
なビーム水平方向中心位置を求めることができる。また
、電極を配置するピッチｄをより狭めて、より多くの電
極を配置することによってもビーム位置検出の分解能が
向上する。なお、各電極の起電力の値によりビーム分布
（図４、図５参照）を測定することもできる。In order to more accurately determine the horizontal position, the beam position calculation circuit 36 selects the upper and lower electrodes (40d and 42d in the example of FIG. 5) from which the peak electromotive force is obtained, and the next largest electromotive force. Upper and lower electrodes (40c, 4
2c) is determined by a comparison calculation, and by using the electromotive force of these four electrodes 40, for example, it is possible to determine the accurate horizontal beam center position between the electrodes 40c and 40d (between 42c and 42d). Furthermore, the resolution of beam position detection can also be improved by narrowing the pitch d of arranging the electrodes and arranging more electrodes. Note that the beam distribution (see FIGS. 4 and 5) can also be measured based on the value of the electromotive force of each electrode.
【００１６】次に、垂直方向のビーム位置は、ピークの
起電力が得られる位置の上下の電極（図５の例では４０
ｄ，４２ｄ）の起電力の比
から求めることができる。また、ピークの起電力が得ら
れる上下の電極（４０ｄ，４２ｄ）と、その次大きな起
電力が得られる上下の電極（４０ｃ，４２ｃ）の４つの
電極の起電力から
により垂直方向の起電力を求めることもできる。Next, the beam position in the vertical direction is set at the electrodes above and below the position where the peak electromotive force is obtained (in the example of FIG.
It can be determined from the ratio of the electromotive forces of d and 42d). In addition, the vertical electromotive force can be calculated from the electromotive force of the four electrodes: the upper and lower electrodes (40d, 42d) where the peak electromotive force is obtained, and the upper and lower electrodes (40c, 42c) where the next largest electromotive force is obtained. You can also ask for it.
【００１７】[0017]
【変更例】この発明は電子シンクロトロンのほか、陽子
その他各種荷電粒子のリング型、直線型等各種加速器に
適用することができる。[Modifications] In addition to electron synchrotrons, the present invention can be applied to various types of accelerators, such as ring type and linear type, for protons and other charged particles.
【００１８】[0018]
【発明の効果】以上説明したように、この発明によれば
、真空チャンバー内の水平方向の平坦部に略々同一ピッ
チで略々周方向に複数の電極を並べて配設したので、こ
れら各電極の起電力はビーム位置に近いところでは大き
く、ビーム位置から遠いところでは小さくなり、これら
各電極の起電力を比較することにより、その大小から粒
子ビームの中心位置を正確に検出することができる。As explained above, according to the present invention, a plurality of electrodes are arranged in parallel in the circumferential direction at substantially the same pitch on the horizontal flat part in the vacuum chamber, so that each of these electrodes The electromotive force is large near the beam position, and small when far from the beam position.By comparing the electromotive forces of these electrodes, it is possible to accurately detect the center position of the particle beam from the magnitude of the electromotive force.
【図１】 この発明の一実施例を示す電極の配置例お
よびビーム位置演算系統を示すブロック図である。FIG. 1 is a block diagram showing an example of electrode arrangement and a beam position calculation system according to an embodiment of the present invention.
【図２】 シンクロトロンの概要を示す平面図である
。FIG. 2 is a plan view showing an outline of a synchrotron.
【図３】 従来の電極式位置モニタを示す電極の配置
例およびビーム位置演算系統を示すブロック図である。FIG. 3 is a block diagram showing an example of electrode arrangement and a beam position calculation system of a conventional electrode-type position monitor.
【図４】 図１の装置において電子ビーム３４の中心
が中心軌道上にある場合の動作を示す図である。4 is a diagram showing the operation when the center of the electron beam 34 is on the central orbit in the apparatus of FIG. 1. FIG.
【図５】 図１の装置において電子ビーム３４がの中
心が中心軌道上から外れている場合の動作を示す図であ
る。5 is a diagram showing the operation of the apparatus shown in FIG. 1 when the center of the electron beam 34 is off the center orbit.
２０ シンクロトロン（粒子加速器）２２ 真空チ
ャンバー
３０ 電極式ビーム位置モニタ
３４ 電子ビーム（粒子ビーム）
４０ａ〜４０ｅ，４２ａ〜４２ｅ 電極４４ 内周
面20 synchrotron (particle accelerator) 22 vacuum chamber 30 electrode type beam position monitor 34 electron beam (particle beam) 40a to 40e, 42a to 42e electrode 44 inner peripheral surface
Claims (1)
ャンバーを具えた粒子加速器において、前記平坦部に略
々同一ピッチで略々周方向に並べて配設された複数の電
極と、これら各電極の起電力を比較して、粒子ビームの
径中心方向位置を求める演算部と を具備してなる粒
子加速器のビーム位置モニタ。1. A particle accelerator comprising a vacuum chamber having a flat portion in the horizontal direction on an inner circumferential surface, comprising: a plurality of electrodes disposed on the flat portion at substantially the same pitch in a substantially circumferential direction; A beam position monitor for a particle accelerator, comprising: an arithmetic unit that compares the electromotive force of each electrode and calculates the position in the radial center direction of the particle beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9960091A JPH04308696A (en) | 1991-04-04 | 1991-04-04 | Beam position monitor for particle accelerator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9960091A JPH04308696A (en) | 1991-04-04 | 1991-04-04 | Beam position monitor for particle accelerator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04308696A true JPH04308696A (en) | 1992-10-30 |
Family
ID=14251590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9960091A Pending JPH04308696A (en) | 1991-04-04 | 1991-04-04 | Beam position monitor for particle accelerator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04308696A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009089443A1 (en) | 2008-01-09 | 2009-07-16 | Passport Systems, Inc. | Diagnostic methods and apparatus for an accelerator using induction to generate an electric field with a localized curl |
| WO2010065702A3 (en) * | 2008-12-05 | 2010-08-26 | Cornell University | Electric field-guided particle accelerator, method, and applications |
| IT201800003379A1 (en) * | 2018-03-08 | 2019-09-08 | Enea Agenzia Naz Per Le Nuove Tecnologie Lenergia E Lo Sviluppo Economico Sostenibile | Device and method for determining the center of mass of a beam of electric charges |
-
1991
- 1991-04-04 JP JP9960091A patent/JPH04308696A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009089443A1 (en) | 2008-01-09 | 2009-07-16 | Passport Systems, Inc. | Diagnostic methods and apparatus for an accelerator using induction to generate an electric field with a localized curl |
| EP2232959A4 (en) * | 2008-01-09 | 2015-04-08 | Passport Systems Inc | Diagnostic methods and apparatus for an accelerator using induction to generate an electric field with a localized curl |
| WO2010065702A3 (en) * | 2008-12-05 | 2010-08-26 | Cornell University | Electric field-guided particle accelerator, method, and applications |
| US8575867B2 (en) | 2008-12-05 | 2013-11-05 | Cornell University | Electric field-guided particle accelerator, method, and applications |
| IT201800003379A1 (en) * | 2018-03-08 | 2019-09-08 | Enea Agenzia Naz Per Le Nuove Tecnologie Lenergia E Lo Sviluppo Economico Sostenibile | Device and method for determining the center of mass of a beam of electric charges |
| WO2019170721A1 (en) | 2018-03-08 | 2019-09-12 | ENEA - Agenzia nazionale per le nuove tecnologie, l'energia e lo sviluppo economico sostenibile | Device and method for detecting the mass centre of a beam of electric charges |
| US11360125B2 (en) | 2018-03-08 | 2022-06-14 | Enea—Agenzia Nazionale Per Le Nuove Tecnologie, L'energia E Lo Sviluppo Economico | Device and method for detecting the mass center of a beam of electric charges |
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