JPH04285967A - Developer composition for flexographic printing plate - Google Patents
Developer composition for flexographic printing plateInfo
- Publication number
- JPH04285967A JPH04285967A JP7366591A JP7366591A JPH04285967A JP H04285967 A JPH04285967 A JP H04285967A JP 7366591 A JP7366591 A JP 7366591A JP 7366591 A JP7366591 A JP 7366591A JP H04285967 A JPH04285967 A JP H04285967A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- flexographic printing
- printing plate
- developer
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims description 20
- 229920002725 thermoplastic elastomer Polymers 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000003999 initiator Substances 0.000 claims abstract description 11
- 239000000178 monomer Substances 0.000 claims abstract description 10
- 239000004094 surface-active agent Substances 0.000 claims abstract description 7
- 239000003960 organic solvent Substances 0.000 claims description 13
- 239000011342 resin composition Substances 0.000 claims description 12
- 230000008961 swelling Effects 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 4
- 239000002904 solvent Substances 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- -1 methylene Halogenated hydrocarbons Chemical class 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229920006132 styrene block copolymer Polymers 0.000 description 5
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 4
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 4
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- MEBONNVPKOBPEA-UHFFFAOYSA-N 1,1,2-trimethylcyclohexane Chemical compound CC1CCCCC1(C)C MEBONNVPKOBPEA-UHFFFAOYSA-N 0.000 description 2
- QEGNUYASOUJEHD-UHFFFAOYSA-N 1,1-dimethylcyclohexane Chemical compound CC1(C)CCCCC1 QEGNUYASOUJEHD-UHFFFAOYSA-N 0.000 description 2
- WWRCMNKATXZARA-UHFFFAOYSA-N 1-Isopropyl-2-methylbenzene Chemical compound CC(C)C1=CC=CC=C1C WWRCMNKATXZARA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- GGBJHURWWWLEQH-UHFFFAOYSA-N butylcyclohexane Chemical compound CCCCC1CCCCC1 GGBJHURWWWLEQH-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- QNVRIHYSUZMSGM-UHFFFAOYSA-N hexan-2-ol Chemical compound CCCCC(C)O QNVRIHYSUZMSGM-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- PQLMXFQTAMDXIZ-UHFFFAOYSA-N isoamyl butyrate Chemical compound CCCC(=O)OCCC(C)C PQLMXFQTAMDXIZ-UHFFFAOYSA-N 0.000 description 2
- RGFNRWTWDWVHDD-UHFFFAOYSA-N isobutyl butyrate Chemical compound CCCC(=O)OCC(C)C RGFNRWTWDWVHDD-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- DEDZSLCZHWTGOR-UHFFFAOYSA-N propylcyclohexane Chemical compound CCCC1CCCCC1 DEDZSLCZHWTGOR-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- SEKSWDGNGZWLDU-UHFFFAOYSA-N 1,1,2,2-tetramethylcyclohexane Chemical compound CC1(C)CCCCC1(C)C SEKSWDGNGZWLDU-UHFFFAOYSA-N 0.000 description 1
- GCYUJISWSVALJD-UHFFFAOYSA-N 1,1-diethylcyclohexane Chemical compound CCC1(CC)CCCCC1 GCYUJISWSVALJD-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- YPJRYQGOKHKNKZ-UHFFFAOYSA-N 1-ethyl-1-methylcyclohexane Chemical compound CCC1(C)CCCCC1 YPJRYQGOKHKNKZ-UHFFFAOYSA-N 0.000 description 1
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 1
- WAPNOHKVXSQRPX-UHFFFAOYSA-N 1-phenylethanol Chemical compound CC(O)C1=CC=CC=C1 WAPNOHKVXSQRPX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- HIVFIUIKABOGIO-UHFFFAOYSA-N 2-ethyl-1,1-dimethylcyclohexane Chemical compound CCC1CCCCC1(C)C HIVFIUIKABOGIO-UHFFFAOYSA-N 0.000 description 1
- WOYWLLHHWAMFCB-UHFFFAOYSA-N 2-ethylhexyl acetate Chemical compound CCCCC(CC)COC(C)=O WOYWLLHHWAMFCB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- CUZKCNWZBXLAJX-UHFFFAOYSA-N 2-phenylmethoxyethanol Chemical compound OCCOCC1=CC=CC=C1 CUZKCNWZBXLAJX-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- ISBWNEKJSSLXOD-UHFFFAOYSA-N Butyl levulinate Chemical compound CCCCOC(=O)CCC(C)=O ISBWNEKJSSLXOD-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- GWESVXSMPKAFAS-UHFFFAOYSA-N Isopropylcyclohexane Natural products CC(C)C1CCCCC1 GWESVXSMPKAFAS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- XPNGNIFUDRPBFJ-UHFFFAOYSA-N alpha-methylbenzylalcohol Natural products CC1=CC=CC=C1CO XPNGNIFUDRPBFJ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- HJZGNWSIJASHMX-UHFFFAOYSA-N butyl acetate;ethane-1,2-diol Chemical compound OCCO.CCCCOC(C)=O HJZGNWSIJASHMX-UHFFFAOYSA-N 0.000 description 1
- 229940005460 butyl levulinate Drugs 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- PDXRQENMIVHKPI-UHFFFAOYSA-N cyclohexane-1,1-diol Chemical compound OC1(O)CCCCC1 PDXRQENMIVHKPI-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229940094941 isoamyl butyrate Drugs 0.000 description 1
- JSLCOZYBKYHZNL-UHFFFAOYSA-N isobutyric acid butyl ester Natural products CCCCOC(=O)C(C)C JSLCOZYBKYHZNL-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 238000001782 photodegradation Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 150000005691 triesters Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004636 vulcanized rubber Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は新規なフレキソ印刷版用
現像液組成物さらに詳しくは、特に再現性に優れたレリ
ーフを形成させることができるとともに、安全性が高く
、作業衛生上及び環境上好ましい、フレキソ印刷版の製
版の際に用いられる現像液組成物に関するものである。[Industrial Field of Application] The present invention provides a novel developer composition for flexographic printing plates. The present invention relates to a developer composition preferably used during plate making of a flexographic printing plate.
【０００２】0002
【従来の技術】フレキソ印刷版用の感光性樹脂組成物と
しては、熱可塑性エラストマー、光重合性不飽和単量体
及び光重合開始剤から成るものが多く知られている（例
えば、特公昭５１−４３３７４号公報、特公昭５９−２
２２１９号公報など）。[Prior Art] Many photosensitive resin compositions for flexographic printing plates are known, consisting of a thermoplastic elastomer, a photopolymerizable unsaturated monomer, and a photopolymerization initiator (for example, -43374 Publication, Special Publication No. 59-2
2219, etc.).
【０００３】これらの感光性樹脂組成物を用いてフレキ
ソ印刷版を作製する場合、所要のパターンを有するマス
クを介して活性光線を照射したのち、活性光線の未照射
部を現像液により溶解又は膨潤性させて除去することが
必要であるが、このような感光性樹脂組成物に用いられ
る現像液としては、従来クロロホルム、トリクロロエタ
ン、トリクロロエチレン、テトラクロロエチレンなどの
ハロゲン化炭化水素類やこれらとアルコール類との混合
物などが使用されている。[0003] When producing a flexographic printing plate using these photosensitive resin compositions, after irradiating actinic rays through a mask having a desired pattern, the areas not irradiated with actinic rays are dissolved or swollen by a developer. Conventionally, developers used for such photosensitive resin compositions include halogenated hydrocarbons such as chloroform, trichloroethane, trichloroethylene, and tetrachloroethylene, and combinations of these and alcohols. mixtures are used.
【０００４】しかしながら、これらの現像液は未露光部
のみでなく露光部も膨潤するために、再現性に優れたパ
ターンを得ることができない上、ハロゲン化炭化水素類
は衛生上及び環境上の安全性の点からも好ましくない。However, since these developers swell not only the unexposed areas but also the exposed areas, it is not possible to obtain patterns with excellent reproducibility, and halogenated hydrocarbons are not safe for hygiene and environment. It is also undesirable from a sexual point of view.
【０００５】[0005]
【発明が解決しようとする課題】本発明は、このような
従来のフレキソ印刷版用現像液が有する欠点を克服し、
再現性に優れ、かつ安全性が高く、作業衛生上及び環境
上も問題のないフレキソ印刷版用現像液組成物を提供す
ることを目的としてなされたものである。SUMMARY OF THE INVENTION The present invention overcomes the drawbacks of conventional flexo printing plate developers, and
The purpose of this invention is to provide a developer composition for flexographic printing plates that has excellent reproducibility, is highly safe, and poses no problems in terms of work hygiene and environment.
【０００６】[0006]
【課題を提供するための手段】本発明者らは、フレキソ
印刷版用の現像液組成物について種々研究を重ねた結果
、特定の有機溶媒、界面活性剤及び水を含有した現像液
は原版に忠実なパターンを与え、しかも作業上、環境上
の安全性にも問題がないことを見い出し、この知見に基
づいて本発明を完成するに至った。[Means for Providing the Problem] As a result of various studies on developer compositions for flexographic printing plates, the present inventors have discovered that a developer containing a specific organic solvent, a surfactant, and water can be applied to an original plate. It was discovered that the present invention provides a faithful pattern and also has no problems in terms of operational and environmental safety, and based on this knowledge, the present invention was completed.
【０００７】すなわち、本発明は、熱可塑性エラストマ
ー、光重合性不飽和単量体及び光重合開始剤から成る感
光性樹脂組成物を用いてフレキソ印刷版を製版する際に
使用される現像液組成物であって、２０℃の温度におけ
る水に対する溶解度が１０重量％以下の有機溶媒、界面
活性剤及び水を含有して成る前記組成物の未露光部を溶
解又は膨潤しうるフレキソ印刷版用現像液組成物を提供
するものである。That is, the present invention provides a developer composition used when making a flexographic printing plate using a photosensitive resin composition comprising a thermoplastic elastomer, a photopolymerizable unsaturated monomer, and a photopolymerization initiator. A developer for a flexographic printing plate, which is capable of dissolving or swelling the unexposed areas of the composition, which contains an organic solvent having a solubility in water of 10% by weight or less at a temperature of 20°C, a surfactant, and water. The present invention provides a liquid composition.
【０００８】本発明の現像液組成物が対象とする感光性
樹脂組成物は、熱可塑性エラストマー、光重合性不飽和
単量体及び光重合開始剤から成るものである。ここで、
熱可塑性エラストマーとは、常温では加硫ゴムと同様な
特性を有し、高温では普通の熱可塑性樹脂と同じ特性を
有する高分子材料であり、スチレン系、オレフイン系、
ポリエステル系、ポリウレタン系、ポリイソプレン系、
１，２−ポリブタジエン系、塩化ビニル系、ポリアミド
系など多種多様のものが知られている。これらの熱可塑
性エラストマーの中で、特に好ましいものは、スチレン
系熱可塑性エラストマーであり、具体的には、スチレン
／ブタジエン／スチレンブロック共重合体、スチレン／
イソプレン／スチレンブロック共重合体及びこれらの水
素添加物である。これらの熱可塑性エラストマーは感光
性樹脂組成物中に通常３０〜９５重量％、好ましくは５
０〜８５重量％の範囲で配合される。この配合量が３０
重量％未満ではゴム弾性に優れた感光性樹脂組成物が得
られないし、９５重量％を超えると再現性に優れたパタ
ーンが形成されにくくなる。The photosensitive resin composition targeted by the developer composition of the present invention comprises a thermoplastic elastomer, a photopolymerizable unsaturated monomer, and a photopolymerization initiator. here,
Thermoplastic elastomer is a polymeric material that has the same properties as vulcanized rubber at room temperature and the same properties as ordinary thermoplastic resin at high temperature.
Polyester, polyurethane, polyisoprene,
A wide variety of materials are known, such as 1,2-polybutadiene, vinyl chloride, and polyamide. Among these thermoplastic elastomers, particularly preferred are styrene thermoplastic elastomers, specifically styrene/butadiene/styrene block copolymers, styrene/butadiene/styrene block copolymers, and styrene/butadiene/styrene block copolymers.
Isoprene/styrene block copolymers and hydrogenated products thereof. These thermoplastic elastomers are usually contained in the photosensitive resin composition in an amount of 30 to 95% by weight, preferably 5% by weight.
It is blended in a range of 0 to 85% by weight. This amount is 30
If it is less than 95% by weight, a photosensitive resin composition with excellent rubber elasticity cannot be obtained, and if it exceeds 95% by weight, it becomes difficult to form a pattern with excellent reproducibility.
【０００９】また、光重合性不飽和単量体については、
前記熱可塑性エラストマーと相容性を有するか又は混合
可能なものであればよく特に制限はない。具体的には少
なくとも１個のビニル基をもつ光重合性不飽和単量体を
挙げることができ、このようなものとしては、炭素数２
〜１０、特に炭素数２〜６の脂肪族及び脂環式ジオール
、例えばエチレングリコール、トリエチレングリコール
、ヘキサンジオール、シクロヘキサンジオールなどと炭
素数３〜５のエチレン性不飽和カルボン酸、例えばアク
リル酸やメタクリル酸などとから誘導されるジエステル
やトリオールと前記不飽和カルボン酸とから誘導される
トリエステルやポリカルボン酸のビニルエステルなどを
挙げることができる。これらは単独で用いてもよいし、
２種以上を組み合わせて用いてもよい。これらの光重合
性不飽和単量体の配合量は、熱可塑性エラストマー１０
０重量部に対して、通常３〜８０重量部、好ましくは５
〜２０重量部の範囲で選ばれる。この量が３重量部未満
では再現性に優れたパターンが得られないし、８０重量
部を超えると良好なゴム弾性が得られない。Regarding photopolymerizable unsaturated monomers,
There is no particular restriction as long as it is compatible or mixable with the thermoplastic elastomer. Specifically, photopolymerizable unsaturated monomers having at least one vinyl group can be mentioned, and examples of such monomers include those having a carbon number of 2
~10, especially aliphatic and cycloaliphatic diols having 2 to 6 carbon atoms, such as ethylene glycol, triethylene glycol, hexanediol, cyclohexanediol, etc. and ethylenically unsaturated carboxylic acids having 3 to 5 carbon atoms, such as acrylic acid, etc. Examples include diesters derived from methacrylic acid, triesters derived from triols and the unsaturated carboxylic acids, and vinyl esters of polycarboxylic acids. These may be used alone or
You may use two or more types in combination. The blending amount of these photopolymerizable unsaturated monomers is 10% of the thermoplastic elastomer.
0 parts by weight, usually 3 to 80 parts by weight, preferably 5 parts by weight.
-20 parts by weight. If this amount is less than 3 parts by weight, a pattern with excellent reproducibility cannot be obtained, and if it exceeds 80 parts by weight, good rubber elasticity cannot be obtained.
【００１０】さらに、光重合開始剤については特に制限
はなく、従来この種の感光性樹脂に慣用されている公知
の光重合開始剤の中から任意のものを選択して用いるこ
とができるが、特にベンゾイン系、ベンゾフエノン系、
アントラキノン系のものが好ましい。これらの光重合開
始剤は単独でも、また２種以上混合して用いてもよい。
これらの光重合開始剤の配合量は熱可塑性エラストマー
１００重量部に対して、通常０．１〜５重量部、好まし
くは０．５〜２重量部の範囲で選ばれる。この量が０．
１重量部未満の場合には、実用的感度が得られないし、
５重量部を超えると良好なパターンが得られない。Furthermore, there are no particular restrictions on the photopolymerization initiator, and any photopolymerization initiator can be selected and used from among the known photopolymerization initiators conventionally used in this type of photosensitive resin. Especially benzoin series, benzophenone series,
Anthraquinone-based ones are preferred. These photopolymerization initiators may be used alone or in combination of two or more. The amount of these photopolymerization initiators to be blended is usually selected in the range of 0.1 to 5 parts by weight, preferably 0.5 to 2 parts by weight, based on 100 parts by weight of the thermoplastic elastomer. This amount is 0.
If it is less than 1 part by weight, practical sensitivity cannot be obtained;
If it exceeds 5 parts by weight, a good pattern cannot be obtained.
【００１１】該感光性樹脂組成物には、所望に応じ、ク
レゾール系、フエノール系、ヒドロキノン系などの熱重
合禁止剤、合成樹脂、顔料、染料、可塑剤、酸化防止剤
、光劣化防止剤などを適当量配合することができる。The photosensitive resin composition may optionally contain thermal polymerization inhibitors such as cresol, phenol, and hydroquinone, synthetic resins, pigments, dyes, plasticizers, antioxidants, photodegradation inhibitors, and the like. can be blended in an appropriate amount.
【００１２】本発明の現像液組成物が対象とする感光性
樹脂組成物は、公知の方法に従い、例えば前記の熱可塑
性エラストマー、光重合性不飽和単量体、光重合開始剤
及び所望に応じて用いられる各種添加成分を有機溶剤に
溶解し、そのままフイルム状又は板状に成形後、溶剤を
除去することにより、あるいはロールミキサーで混合し
たのち、熱プレスでフイルム状又は板状に成形すること
により、フレキソレリーフ製造用感光性樹脂層を形成す
ることができる。このようにして得られた感光性樹脂層
は、ポリエステル板、鋼板、アルミニウム板などに圧着
し、マスクを介して活性光線を選択的に照射したのち、
未照射部分を現像液により洗い去れば、ゴム弾性を有す
るフレキソ印刷用レリーフ版が得られる。The photosensitive resin composition targeted by the developer composition of the present invention can be prepared by adding, for example, the above-mentioned thermoplastic elastomer, a photopolymerizable unsaturated monomer, a photopolymerization initiator, and as desired, according to a known method. By dissolving various additive components used in organic solvents, forming them directly into a film or plate shape, removing the solvent, or mixing with a roll mixer, and then forming into a film or plate shape with a hot press. Accordingly, a photosensitive resin layer for producing a flexo relief can be formed. The photosensitive resin layer thus obtained is pressed onto a polyester plate, steel plate, aluminum plate, etc., and selectively irradiated with active light through a mask.
If the unirradiated areas are washed away with a developer, a relief plate for flexographic printing having rubber elasticity can be obtained.
【００１３】本発明の現像液組成物は、前記の感光性樹
脂組成物を用いたフレキソ印刷用レリーフ版の作製に使
用されるものであって、２０℃の温度における水に対す
る溶解度が１０重量％以下の有機溶媒、界面活性剤及び
水とから成る、前記感光性樹脂組成物の未露光部を溶解
又は膨潤しうるものである。The developer composition of the present invention is used for producing relief plates for flexographic printing using the photosensitive resin composition described above, and has a solubility in water of 10% by weight at a temperature of 20°C. It is composed of the following organic solvent, surfactant, and water and can dissolve or swell the unexposed areas of the photosensitive resin composition.
【００１４】該有機溶媒としては、例えば酢酸エチル、
酢酸プロピル、酢酸ブチル、酢酸アミル、酢酸ベンジル
、酢酸３−メトキシブチル、酢酸２−エチルヘキシル、
酢酸シクロヘキシル、酪酸エチル、酪酸イソブチル、酪
酸イソアミル、エチレングリコールモノブチルアセテー
ト、乳酸ブチル、レブリン酸ブチルなどのカルボン酸エ
ステル類、エチルブチルケトン、メチルイソブチルケト
ン、シクロヘキサノンなどのケトン類、エチレングリコ
ールモノブチルエーテル、エチレングリコールベンジル
エーテル、エチレングリコールモノフエニルエーテル、
ベンジルアルコール、メチルフエニルカルビノール、ｎ
−アミルアルコール、メチルアミルアルコールなどのア
ルコール類、トルエン、キシレン、トリメチルベンゼン
、メチルエチルベンゼン、テトラメチルベンゼン、イソ
プロピルメチルベンゼン、エチルベンゼン、ジエチルベ
ンゼン、メチルスチレン、エチルスチレンなどのアルキ
ル置換芳香族炭化水素類、メチレンジクロリド、エチレ
ンジクロリド、モノクロロベンゼンなどのハロゲン化炭
化水素類、ジメチルシクロヘキサン、トリメチルシクロ
ヘキサン、プロピルシクロヘキサン、メチルエチルシク
ロヘキサン、テトラメチルシクロヘキサン、ジエチルシ
クロヘキサン、ブチルシクロヘキサン、エチルジメチル
シクロヘキサンなどの環状脂肪族炭化水素類などを挙げ
ることができる。これらの有機溶媒は１種用いてもよい
し、２種以上を組み合わせて用いてもよい。[0014] Examples of the organic solvent include ethyl acetate,
Propyl acetate, butyl acetate, amyl acetate, benzyl acetate, 3-methoxybutyl acetate, 2-ethylhexyl acetate,
Carboxylic acid esters such as cyclohexyl acetate, ethyl butyrate, isobutyl butyrate, isoamyl butyrate, ethylene glycol monobutyl acetate, butyl lactate, butyl levulinate, ketones such as ethyl butyl ketone, methyl isobutyl ketone, cyclohexanone, ethylene glycol monobutyl ether, Ethylene glycol benzyl ether, ethylene glycol monophenyl ether,
benzyl alcohol, methylphenyl carbinol, n
-Alcohols such as amyl alcohol and methylamyl alcohol, alkyl-substituted aromatic hydrocarbons such as toluene, xylene, trimethylbenzene, methylethylbenzene, tetramethylbenzene, isopropylmethylbenzene, ethylbenzene, diethylbenzene, methylstyrene, and ethylstyrene, methylene Halogenated hydrocarbons such as dichloride, ethylene dichloride, and monochlorobenzene, cyclic aliphatic hydrocarbons such as dimethylcyclohexane, trimethylcyclohexane, propylcyclohexane, methylethylcyclohexane, tetramethylcyclohexane, diethylcyclohexane, butylcyclohexane, and ethyldimethylcyclohexane, etc. can be mentioned. These organic solvents may be used alone or in combination of two or more.
【００１５】これらの有機溶媒は、現像液組成物中に、
通常５〜９０重量％、好ましくは１０〜７０重量％の範
囲で配合される。この量が５重量％未満では現像時間が
長くなり、また現像疲労が早いなどの問題が生じて好ま
しくないし、９０重量％を超えると有機溶媒が主となり
、作業環境が悪くするなど実用上好ましくない。These organic solvents are included in the developer composition.
It is usually blended in an amount of 5 to 90% by weight, preferably 10 to 70% by weight. If this amount is less than 5% by weight, problems such as longer development time and rapid development fatigue occur, which is undesirable. If it exceeds 90% by weight, the organic solvent becomes the main component, which is undesirable from a practical point of view, such as worsening the working environment. .
【００１６】本発明の現像液組成物に用いられる界面活
性剤については、該有機溶媒を水に溶解又は分散する作
用の優れたものであればよく、特に制限されず、例えば
アニオン性、カチオン性、ノニオン性のいずれのタイプ
のものも用いることができる。具体的には高級アルコー
ル硫酸エステルナトリウム塩、脂肪族四級アンモニウム
塩、脂肪族アミン塩、ポリオキシエチレンアルキルエー
テル、ポリオキシエチレングリセリン脂肪酸エステル、
ポリエチレングリコール脂肪酸エステルなどが挙げられ
る。The surfactant used in the developer composition of the present invention is not particularly limited as long as it has an excellent ability to dissolve or disperse the organic solvent in water. Any nonionic type can be used. Specifically, higher alcohol sulfate ester sodium salt, aliphatic quaternary ammonium salt, aliphatic amine salt, polyoxyethylene alkyl ether, polyoxyethylene glycerin fatty acid ester,
Examples include polyethylene glycol fatty acid ester.
【００１７】これらの界面活性剤は１種用いてもよいし
、２種以上を組み合わせて用いてもよく、また、その配
合量は前記有機溶媒に対して、通常０．１〜２０重量％
、好ましくは０．５〜１０重量％の範囲で選ばれる。
この量が０．１重量％未満では該有機溶媒が水に均質に
分散又は溶解しにくいし、２０重量％を超えるとその量
の割には特性の向上が認められず、むしろ経済的に不利
となる。[0017] These surfactants may be used alone or in combination of two or more, and the blending amount is usually 0.1 to 20% by weight based on the organic solvent.
, preferably in the range of 0.5 to 10% by weight. If this amount is less than 0.1% by weight, it will be difficult for the organic solvent to disperse or dissolve homogeneously in water, and if it exceeds 20% by weight, no improvement in properties will be recognized for the amount, which is rather economically disadvantageous. becomes.
【００１８】[0018]
【発明の効果】本発明のフレキソ印刷版用現像液組成物
は、フレキソ印刷版の作製において、極めて再現性に優
れたレリーフを形成させることができるとともに、特定
の有機溶媒の水溶液を用いるため、従来の現像液に比べ
て作業環境を悪くすることがなく、安全性、衛生面にお
いても好ましいという効果を奏する。Effects of the Invention The developer composition for flexographic printing plates of the present invention can form reliefs with extremely excellent reproducibility in the production of flexographic printing plates, and since an aqueous solution of a specific organic solvent is used, Compared to conventional developing solutions, it does not make the working environment worse, and is also advantageous in terms of safety and hygiene.
【００１９】[0019]
【実施例】次に実施例により本発明をさらに詳細に説明
するが、本発明はこれらの例によってなんら限定される
ものではない。EXAMPLES Next, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to these examples in any way.
【００２０】実施例１
メチルエチルケトン２００重量部に、スチレン／ブタジ
エン／スチレンブロックコポリマーから成る熱可塑性エ
ラストマーであるＴＲＫＸ６５Ｓ（シエル化学社製、重
量平均分子量１４万、スチレン単位含有量２８重量％）
１００重量部、液状ポリブタジエンであるＮＩＳＳＯ−
ＰＢ Ｂ−１０００（日本曹達社製、重量平均分子量
１０５０、１，２−ビニル８５重量％以上）６０重量部
、トリメチロールプロパントリアクリレート６重量部、
ベンジルジメチルケタール２重量部及び２，６−ジ−ｔ
ｅｒｔ−ブチル−ｐ−クレゾール０．０１２重量部を加
え、フラスコ中、還流下で約２時間かきまぜながら溶解
して、光重合性組成物を得た。これを接着層を設けた１
００μｍ厚のＰＥＴフイルム上に乾燥後の膜厚が２．７
４ｍｍとなるように塗布したのち、６０℃で１２時間乾
燥した。Example 1 200 parts by weight of methyl ethyl ketone was added to TRKX65S, a thermoplastic elastomer consisting of a styrene/butadiene/styrene block copolymer (manufactured by Ciel Chemical Co., Ltd., weight average molecular weight 140,000, styrene unit content 28% by weight).
100 parts by weight, liquid polybutadiene NISSO-
PB B-1000 (manufactured by Nippon Soda Co., Ltd., weight average molecular weight 1050, 1,2-vinyl 85% by weight or more) 60 parts by weight, trimethylolpropane triacrylate 6 parts by weight,
2 parts by weight of benzyl dimethyl ketal and 2,6-di-t
0.012 parts by weight of ert-butyl-p-cresol was added and dissolved in the flask under reflux with stirring for about 2 hours to obtain a photopolymerizable composition. 1 with an adhesive layer
The film thickness after drying is 2.7 on a PET film with a thickness of 00 μm.
After coating to a thickness of 4 mm, it was dried at 60° C. for 12 hours.
【００２１】次いで、ケミカルランプＦＬ−４０ＢＬ（
東芝社製）にて、支持体側から、活性光線を２分間全面
照射したのち、感光層にネガフイルムを減圧密着させ、
前記ケミカルランプにて活性光線を１５分間選択的に照
射した。Next, chemical lamp FL-40BL (
After irradiating the entire surface with actinic rays for 2 minutes from the support side (manufactured by Toshiba Corporation), a negative film was brought into close contact with the photosensitive layer under reduced pressure.
Active light was selectively irradiated with the chemical lamp for 15 minutes.
【００２２】次いで、トルエン１０ｋｇ、ラウリル硫酸
ナトリウム２ｋｇ及び水１０ｋｇから成る現像液と溶出
機Ｃｙｒｅｌ Ｐｒｏｃｅｓｓｏｒ（デュポン社製）
を用いて、４０℃で１０分間現像処理して、感光層の未
照射部分を溶解除去したのち、５０℃で３０分間乾燥さ
せ、前記ケミカルランプにて１５分間全面照射を行うこ
とでフレキソ印刷版を得た。Next, a developer consisting of 10 kg of toluene, 2 kg of sodium lauryl sulfate, and 10 kg of water and an eluent Cyrel Processor (manufactured by DuPont) were added.
The unirradiated portion of the photosensitive layer was dissolved and removed by developing at 40°C for 10 minutes using I got it.
【００２３】得られたフレキソ印刷版を観察し、６５線
／インチ部のハイライト再現性、最小独立線再現性及び
０．５ｍｍ白抜き幅深度を調べた。その結果を表１に示
す。また、比較のために、１，１，１−トリクロロエタ
ン９０ｋｇ及びｎ−ブチルアルコール１０ｋｇから成る
現像液を用いて、前記と同様に処理し、フレキソ印刷版
を得、同様の観察を行った。その結果も併せて表１に示
す。The obtained flexographic printing plate was observed, and the highlight reproducibility at 65 lines/inch section, minimum independent line reproducibility, and 0.5 mm white outline width depth were examined. The results are shown in Table 1. For comparison, a flexographic printing plate was obtained by processing in the same manner as above using a developer consisting of 90 kg of 1,1,1-trichloroethane and 10 kg of n-butyl alcohol, and the same observation was made. The results are also shown in Table 1.
【表１】[Table 1]
【００２４】注１）６５線／インチ部のハイライトが再
現される限界値を表わす
２）再現できる最小独立線幅を表わす
３）０．５ｍｍの白抜き幅部の製版後の深度を表わすNote 1) Represents the limit value for reproducing highlights in the 65 line/inch section 2) Represents the minimum independent line width that can be reproduced 3) Represents the depth of the 0.5 mm white outline width section after plate making
【
００２５】現像液として、スワンゾール１５０（トリメ
チルベンゼン、テトラメチルベンゼン、イソプロピルメ
チルベンゼン、ジエチルベンゼンなどのアルキル置換芳
香族炭化水素の混合物、丸善石油化学社製）８ｋｇ、ア
デカトールＮｐ６５０（非イオン性界面活性剤、旭電化
工業社製）０．２ｋｇ及び水１２ｋｇから成る現像液を
用いた以外は、実施例１と同様にしてフレキソ印刷版を
得た。このフレキソ印刷版を観察した結果、６５線／イ
ンチ部のハイライト再現性は２％、最小独立線幅再現性
は２００μｍ、０．５ｍｍ白抜き幅部の深度は１６０μ
ｍであった。[
As a developer, 8 kg of Swanzol 150 (a mixture of alkyl-substituted aromatic hydrocarbons such as trimethylbenzene, tetramethylbenzene, isopropylmethylbenzene, and diethylbenzene, manufactured by Maruzen Petrochemical Co., Ltd.), Adecatol Np650 (a nonionic surfactant, A flexographic printing plate was obtained in the same manner as in Example 1, except that a developer consisting of 0.2 kg (manufactured by Asahi Denka Kogyo Co., Ltd.) and 12 kg of water was used. As a result of observing this flexographic printing plate, the highlight reproducibility of the 65 line/inch section was 2%, the minimum independent line width reproducibility was 200 μm, and the depth of the 0.5 mm white width section was 160 μm.
It was m.
Claims (1)
和単量体及び光重合開始剤から成る感光性樹脂組成物を
用いてフレキソ印刷版を製版する際に使用される現像液
組成物であって、２０℃の温度における水に対する溶解
度が１０重量％以下の有機溶媒、界面活性剤及び水を含
有して成る前記組成物の未露光部を溶解又は膨潤しうる
フレキソ印刷版用現像液組成物。1. A developer composition used when making a flexographic printing plate using a photosensitive resin composition comprising a thermoplastic elastomer, a photopolymerizable unsaturated monomer, and a photopolymerization initiator, comprising: , a developer composition for a flexographic printing plate capable of dissolving or swelling the unexposed areas of the composition, comprising an organic solvent having a solubility in water of 10% by weight or less at a temperature of 20°C, a surfactant, and water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3073665A JP2692716B2 (en) | 1991-03-14 | 1991-03-14 | Flexographic printing plate developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3073665A JP2692716B2 (en) | 1991-03-14 | 1991-03-14 | Flexographic printing plate developer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04285967A true JPH04285967A (en) | 1992-10-12 |
| JP2692716B2 JP2692716B2 (en) | 1997-12-17 |
Family
ID=13524778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3073665A Expired - Fee Related JP2692716B2 (en) | 1991-03-14 | 1991-03-14 | Flexographic printing plate developer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2692716B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000137336A (en) * | 1998-10-30 | 2000-05-16 | Toagosei Co Ltd | Aqueous composition for elution of photosensitive flexographic plate and its application |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62160446A (en) * | 1986-01-04 | 1987-07-16 | バスフ アクチェン ゲゼルシャフト | Manufacture of releaf block body crosslinked by photopolymerization |
| JPS6385542A (en) * | 1986-09-29 | 1988-04-16 | Konica Corp | Developing solution composition for photosensitive material and developing method |
| JPS63271256A (en) * | 1987-04-28 | 1988-11-09 | Konica Corp | Developing solution composition of photosensitive material |
| JPH027056A (en) * | 1988-03-10 | 1990-01-11 | Basf Ag | Making of relief printing plate |
| JPH02267557A (en) * | 1989-03-17 | 1990-11-01 | Basf Ag | Liquidus cleaning composite for removing polymer material from surface by cleaning |
-
1991
- 1991-03-14 JP JP3073665A patent/JP2692716B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62160446A (en) * | 1986-01-04 | 1987-07-16 | バスフ アクチェン ゲゼルシャフト | Manufacture of releaf block body crosslinked by photopolymerization |
| JPS6385542A (en) * | 1986-09-29 | 1988-04-16 | Konica Corp | Developing solution composition for photosensitive material and developing method |
| JPS63271256A (en) * | 1987-04-28 | 1988-11-09 | Konica Corp | Developing solution composition of photosensitive material |
| JPH027056A (en) * | 1988-03-10 | 1990-01-11 | Basf Ag | Making of relief printing plate |
| JPH02267557A (en) * | 1989-03-17 | 1990-11-01 | Basf Ag | Liquidus cleaning composite for removing polymer material from surface by cleaning |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000137336A (en) * | 1998-10-30 | 2000-05-16 | Toagosei Co Ltd | Aqueous composition for elution of photosensitive flexographic plate and its application |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2692716B2 (en) | 1997-12-17 |
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