JPH04216319A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH04216319A JPH04216319A JP40207090A JP40207090A JPH04216319A JP H04216319 A JPH04216319 A JP H04216319A JP 40207090 A JP40207090 A JP 40207090A JP 40207090 A JP40207090 A JP 40207090A JP H04216319 A JPH04216319 A JP H04216319A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- magnetic
- recording medium
- magnetic recording
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 60
- 239000011241 protective layer Substances 0.000 claims abstract description 38
- 238000004544 sputter deposition Methods 0.000 claims abstract description 12
- 230000003746 surface roughness Effects 0.000 claims abstract description 12
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 8
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 8
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 8
- 229910052802 copper Inorganic materials 0.000 claims abstract description 8
- 238000005520 cutting process Methods 0.000 claims abstract description 8
- 239000000654 additive Substances 0.000 claims abstract description 7
- 229910052737 gold Inorganic materials 0.000 claims abstract description 7
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 7
- 229910052709 silver Inorganic materials 0.000 claims abstract description 7
- 150000004767 nitrides Chemical class 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 25
- 239000010687 lubricating oil Substances 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 230000000996 additive effect Effects 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 230000005294 ferromagnetic effect Effects 0.000 claims description 4
- 239000010408 film Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 238000005461 lubrication Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 229910052681 coesite Inorganic materials 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- 235000019592 roughness Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 229910052682 stishovite Inorganic materials 0.000 description 4
- 229910052905 tridymite Inorganic materials 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018404 Al2 O3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910007277 Si3 N4 Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は固定磁気ディスク装置等
に用いられる磁気記録媒体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium used in fixed magnetic disk drives and the like.
【０００２】0002
【従来の技術】磁気記録媒体 （以下、単に媒体とも称
する） の強磁性合金薄膜磁性層の製造方法は、γ−Ｆ
ｅ２ Ｏ３ 系の磁性粒子を樹脂バインダに分散した塗
布膜を磁性層とする塗布法から、Ｃｏ系合金などの強磁
性合金の連続薄膜を磁性層とするメッキ法、さらにスパ
ッタ法へと移行してきた。これは、情報処理システムの
周辺記憶装置として主流を占める固定磁気ディスク装置
の大容量化，小型化に伴ない、これに搭載される媒体の
高記録密度化が近年ますます要望されているが、スパッ
タ法により製造される強磁性合金の連続薄膜を磁性層と
する薄膜媒体は高保磁力を付与することが可能であり、
また、磁気ヘッドと磁性層との距離を小さくすることも
可能となり、高密度記録の要望に応ずることができるか
らである。[Prior Art] A method for manufacturing a ferromagnetic alloy thin film magnetic layer of a magnetic recording medium (hereinafter also simply referred to as a medium) is a γ-F
There has been a shift from a coating method in which the magnetic layer is a coating film in which e2 O3-based magnetic particles are dispersed in a resin binder, to a plating method in which the magnetic layer is a continuous thin film of a ferromagnetic alloy such as a Co-based alloy, and then to a sputtering method. . This is due to the increasing capacity and miniaturization of fixed magnetic disk drives, which are the mainstream peripheral storage devices for information processing systems, and in recent years there has been an increasing demand for higher recording densities in the media installed in these drives. A thin film medium whose magnetic layer is a continuous thin film of a ferromagnetic alloy manufactured by sputtering can have a high coercive force.
Furthermore, it is also possible to reduce the distance between the magnetic head and the magnetic layer, meeting the demand for high-density recording.
【０００３】上述のようなスパッタ法で製造される媒体
では、合金薄膜である磁性層を腐食から保護する必要が
あり、固定磁気ディスク装置では一般にＣＳＳ方式が採
用されており、媒体表面を磁気ヘッドのＣＳＳによる摩
耗，摩擦係数の上昇もしくは磁気ヘッドの吸着から保護
するために、薄膜媒体では磁性層上に化学的に安定で、
しかも潤滑性が良く耐摩耗性の大きい良質の膜からなる
保護層が設けられている。従来、一般に炭素（Ｃ）保護
層を形成してあり、潤滑性能を高めるために、その上に
さらに液体潤滑剤を塗布して液体潤滑層を設けることが
行なわれている。また、磁性層上にスピンコート法でＳ
ｉＯ２ 保護層を形成し、その上に液体潤滑層を設ける
ことも行なわれている。In media manufactured by the above-mentioned sputtering method, it is necessary to protect the magnetic layer, which is a thin alloy film, from corrosion. Fixed magnetic disk drives generally employ the CSS method, which protects the media surface from the magnetic head. In thin film media, chemically stable,
Moreover, a protective layer made of a high-quality film with good lubricity and high wear resistance is provided. Conventionally, a carbon (C) protective layer is generally formed, and in order to improve the lubrication performance, a liquid lubricant is further applied thereon to provide a liquid lubricant layer. In addition, S is coated on the magnetic layer by spin coating.
It has also been practiced to form an iO2 protective layer and provide a liquid lubricant layer thereon.
【０００４】0004
【発明が解決しようとする課題】磁気ヘッドの材質は現
在硬質化の方向に進んでいる。Ｃ保護層やこれに液体潤
滑層を付加した保護層は、Ｍｎ−Ｚｎフェライトからな
るスライダーの磁気ヘッドに対しては有効であるが、セ
ラミック （例えばＡｌ２ ／ＴｉＣ） のような硬質
の材料からなるスライダーの磁気ヘッドに対しては、摩
耗が激しく保護層として適さず、しかも高密度記録を指
向して磁性層の薄膜化を進めると、保護層の摩耗の問題
も大きくなる。Problems to be Solved by the Invention Currently, materials for magnetic heads are becoming harder. A C protective layer or a protective layer with a liquid lubricant layer added thereto is effective for the magnetic head of a slider made of Mn-Zn ferrite, but it is not suitable for a magnetic head made of a hard material such as ceramic (e.g. Al2/TiC). The magnetic head of a slider suffers from severe wear and is not suitable as a protective layer.Moreover, as the magnetic layer is made thinner with the aim of high-density recording, the problem of wear of the protective layer increases.
【０００５】一方、液体潤滑層を付加したスピンコート
法によるＳｉＯ２ 保護層は、硬質スライダーの磁気ヘ
ッドに対しても十分な耐摩耗性を有するが、表面の突起
品質が良くないという欠点がある。保護層表面、即ち媒
体表面の突起品質が悪いと、磁気ヘッドの浮上走行時に
磁気ヘッドと媒体表面の突起とが接触する頻度が多くな
るという不具合が生じ、ヘッドクラッシュを引き起こす
原因にもなる。高密度記録のために磁気ヘッドの浮上量
を少なくする程、上述の不都合な現象が発生しやすくな
り、液体潤滑層を付加したスピンコート法によるＳｉＯ
２ 保護層は適用することができなくなる。On the other hand, a SiO2 protective layer formed by spin coating with a liquid lubricant layer has sufficient wear resistance even for a magnetic head of a hard slider, but has the disadvantage that the quality of the protrusions on the surface is not good. If the quality of the protrusions on the surface of the protective layer, that is, on the medium surface is poor, a problem arises in that the magnetic head comes into contact with the protrusions on the medium surface more frequently when the magnetic head flies, which may cause a head crash. The smaller the flying height of the magnetic head for high-density recording, the more likely the above-mentioned disadvantageous phenomenon will occur.
2 A protective layer can no longer be applied.
【０００６】また、磁気ヘッドが媒体表面で良好なＣＳ
Ｓ方式を繰り返すためには、媒体表面の潤滑性が良好で
、磁気ヘッドの吸着が生じないことが必要であり、媒体
表面が均一に粗され、適切な粗さを持つ表面形状となっ
ていなければならないが、スピンコート法により表面粗
さを適切に制御したＳｉＯ２ 保護層を形成することは
困難である。磁気ヘッドの浮上量を小さくしようとする
と、より精度高く表面粗さを制御して保護層を形成しな
ければならなくなり、さらに困難になってくる。[0006] Also, the magnetic head has good CS on the surface of the medium.
In order to repeat the S method, the media surface must have good lubricity and the magnetic head will not be attracted to it, and the media surface must be uniformly roughened and have a surface shape with appropriate roughness. However, it is difficult to form a SiO2 protective layer with appropriately controlled surface roughness by spin coating. In order to reduce the flying height of a magnetic head, it is necessary to form a protective layer by controlling the surface roughness with higher precision, which becomes even more difficult.
【０００７】本発明の目的は、上述の問題点を解消し、
高密度記録に対して好適に対応することができる保護層
を備えた磁気記録媒体を提供することにある。[0007] The purpose of the present invention is to solve the above-mentioned problems,
An object of the present invention is to provide a magnetic recording medium equipped with a protective layer that can suitably cope with high-density recording.
【０００８】[0008]
【課題を解決するための手段】上述の課題を解決するた
めに、本発明の磁気記録媒体は、保護層としてスパッタ
法で形成した酸化物または窒化物に、Ｃ，Ａｌ，Ｃｕ，
Ｃｒ，Ａｇ，Ｐｔ，Ａｕのうちの少なくとも一つを含み
、これら添加元素の総量を３〜２０原子％の範囲とし、
ヘッド・バニッシュ処理後の保護層の表面粗さＲａ を
２０〜６０Å， 最大高さＲｍａｘ を ５００〜８５
０ Å， 相対負荷曲線の相対負荷長さ１０％における
カッティング深さから相対負荷長さ１％におけるカッテ
ィング深さを差し引いた値ΔＣＶ （１０％−１％）
を８０〜１５０ Åに設定したものである。[Means for Solving the Problems] In order to solve the above-mentioned problems, the magnetic recording medium of the present invention has C, Al, Cu, C, Al, Cu, etc.
Contains at least one of Cr, Ag, Pt, and Au, with a total amount of these additive elements in the range of 3 to 20 at%,
The surface roughness Ra of the protective layer after head burnishing is 20 to 60 Å, and the maximum height Rmax is 500 to 85.
0 Å, ΔCV (10%-1%), which is the value obtained by subtracting the cutting depth at 1% relative load length from the cutting depth at 10% relative load length in the relative load curve.
was set at 80 to 150 Å.
【０００９】[0009]
【作用】本発明の磁気記録媒体は上記のように構成した
ために、硬質で耐摩耗性に優れた保護層を形成すること
ができ、セラミック等の硬質スライダーの磁気ヘッドに
対しても、十分な耐摩耗性を有する媒体となる。しかも
、この保護層はスパッタ法で薄膜として成膜されるので
、その表面は磁性層表面と同じく非磁性基板の表面粗さ
に対応する表面粗さとなる。また、この保護層は添加元
素としてＣ，Ａｌ，Ｃｕ，Ｃｒ，Ａｇ，Ｐｔ，Ａｕのう
ちの少なくとも一つを含むので、ヘッド・バニッシュ処
理の際、薄膜成長過程で薄膜表面に形成された異常突起
の除去が容易であり、保護層表面は適切な粗さで均一に
粗された表面形状を持ち、微小突起のみが存在するよう
になって突起品質も良好となる。さらに、添加元素は少
なくとも一つ保護層形成用ターゲット中に含まれるから
、酸化物， 窒化物の如何にかかわらずＤＣスパッタ法
による成膜が可能である。このため、磁性層， 保護層
を連続成膜しても、これら各層の安定した膜質を容易に
得ることができる。[Function] Since the magnetic recording medium of the present invention is constructed as described above, it is possible to form a protective layer that is hard and has excellent wear resistance. It becomes a medium with wear resistance. Furthermore, since this protective layer is formed as a thin film by sputtering, its surface has a surface roughness corresponding to that of the nonmagnetic substrate, similar to the surface of the magnetic layer. In addition, since this protective layer contains at least one of C, Al, Cu, Cr, Ag, Pt, and Au as an additive element, abnormalities formed on the thin film surface during the thin film growth process during the head burnishing process can be avoided. The protrusions can be easily removed, the surface of the protective layer has a uniformly roughened surface shape with appropriate roughness, and only minute protrusions are present, resulting in good protrusion quality. Furthermore, since at least one additional element is included in the target for forming the protective layer, it is possible to form a film by DC sputtering regardless of whether it is an oxide or a nitride. Therefore, even if the magnetic layer and the protective layer are successively deposited, stable film quality of each of these layers can be easily obtained.
【００１０】0010
【実施例】以下、本発明を実施例に基づき説明する。EXAMPLES The present invention will be explained below based on examples.
【００１１】Ｎｉ−Ｐめっきを施した直径３．５ イン
チのＡｌ合金基板の表面をポリッシングして平滑な状態
とし、その後研磨テープにより基板表面を粗面とした、
このとき、研磨条件を変えることにより種々の表面粗さ
の基板を作製した。これらの基板上にＤＣスパッタ法に
よりＣｒ，Ｃｏ−Ｎｉ−Ｃｒ合金，ＳｉＯ２ −Ｃの各
層をこの順に連続成膜した。スパッタ条件を下記に示す
。[0011] The surface of a 3.5-inch diameter Al alloy substrate plated with Ni-P was polished to a smooth state, and then the substrate surface was roughened using a polishing tape.
At this time, substrates with various surface roughnesses were produced by changing the polishing conditions. On these substrates, layers of Cr, Co--Ni--Cr alloy, and SiO2-C were successively formed in this order by DC sputtering. The sputtering conditions are shown below.
【００１２】
Ａｒガス圧
１０ｍＴｏｒｒ 基板加熱温度
２２０℃ 基板加熱時間
７分 各層膜厚
Ｃｒ：１５００Å
Ｃ
ｏ−Ｎｉ−Ｃｒ： ４５０Å
ＳｉＯ２ −Ｃ
： ２００ÅAr gas pressure
10mTorr Substrate heating temperature
220℃ substrate heating time
7 minutes Each layer thickness
Cr: 1500Å
C
o-Ni-Cr: 450Å
SiO2-C
: 200Å
【００１３】次に、このＳｉＯ２ −Ｃの
保護層表面をＡｌ２ Ｏ３ ／ＴｉＣからなる硬質スラ
イダーの磁気ヘッドを用い、０．１２５ μｍ浮上させ
てヘッド・パニッシュ処理を行なう。その後、このＳｉ
Ｏ２ −Ｃの保護層上にフロロカーボン系の液体潤滑剤
を浸漬法で塗布して、膜厚１５Åの液体潤滑層を形成し
て媒体とした。Next, the surface of this SiO2 --C protective layer is levitated by 0.125 μm using a hard slider magnetic head made of Al2 O3 /TiC to perform a head punishing process. After that, this Si
A fluorocarbon-based liquid lubricant was applied onto the O2-C protective layer by a dipping method to form a liquid lubricant layer with a thickness of 15 Å, thereby forming a medium.
【００１４】このようにして作製した媒体について、媒
体表面の潤滑性能および突起品質を評価した。表面粗さ
には種々の規定の仕方があり、次に示す評価量が媒体表
面としては有効であるが、それぞれが交絡しながら重要
な意味を持つため、一つの評価量のみで表面粗さを特定
するには無理がある。したがって、ここでは次の三つの
評価量の値を勘案している。The media thus produced were evaluated for their surface lubrication performance and protrusion quality. There are various ways to specify surface roughness, and the following evaluation quantities are effective for the media surface, but each has important meaning while being intertwined, so surface roughness cannot be determined with only one evaluation quantity. It's impossible to pinpoint it. Therefore, the following three evaluation quantities are considered here.
【００１５】
Ｒａ ：ＪＩＳに「中心線平均粗さ」として規定されて
いるもので、表面の平均的な粗さを示す一般的な量。[0015] Ra: This is defined as "center line average roughness" in JIS, and is a general amount that indicates the average roughness of the surface.
【００１６】
Ｒｍａｘ ：ＪＩＳに「最大高さ」として規定されてい
るもので、表面の突起品質に関係する量。[0016] Rmax: This is defined as the "maximum height" in JIS, and is a quantity related to the quality of the protrusions on the surface.
【００１７】
ΔＣｖ （１０ ％−１％） ：相対負荷曲線の相対負
荷長さ１０％におけるカッティング深さから、相対負荷
長さ１％におけるカッティング深さを差し引いた量で、
表面の凹凸の中でも突起品質に関係する量。ΔCv (10%-1%): The amount obtained by subtracting the cutting depth at a relative load length of 1% from the cutting depth at a relative load length of 10% in the relative load curve,
The amount of surface irregularities related to protrusion quality.
【００１８】潤滑性能は、磁気ヘッドが浮上しない程度
の低速で媒体を回転させ、一種の加速試験として磁気ヘ
ッドを媒体上で摺動させる摺動摩擦摩耗試験を行なった
ときの摩擦係数により評価した。このとき、磁気ヘッド
はＡｌ２ Ｏ３ ／ＴｉＣからなる硬質スライダーの磁
気ヘッドを用いた。また、突起品質はＧＨＴ （グライ
ド・ハイト・テスト） で突起個数をカウントすること
により評価した。磁気ヘッドの浮上量は０．１ μｍで
ある。The lubrication performance was evaluated by the friction coefficient when a sliding friction and wear test was conducted in which the medium was rotated at a low speed such that the magnetic head did not fly, and the magnetic head was slid on the medium as a type of acceleration test. At this time, a hard slider magnetic head made of Al2O3/TiC was used. In addition, the quality of the protrusions was evaluated by counting the number of protrusions using GHT (glide height test). The flying height of the magnetic head is 0.1 μm.
【００１９】以上による評価結果を表１に示す。表１は
ヘッド・バニッシュ処理前後の媒体各５個について、Ｓ
ｉＯ２ −Ｃ保護膜のＣ添加量を変えたときの媒体表面
粗さとともに、潤滑性能， 突起品質に対応するよう総
合的な評価を示す表として示してある。総合評価の○は
良好、Δは実用上問題なく、×は不可であることを表わ
す。Table 1 shows the results of the above evaluation. Table 1 shows the S
The table shows a comprehensive evaluation of media surface roughness, lubrication performance, and protrusion quality when the amount of C added to the iO2-C protective film is changed. In the overall evaluation, ○ means good, Δ means no practical problem, and × means bad.
【００２０】[0020]
【表１】[Table 1]
【００２１】表１からヘッド・バニッシュ処理後は、Ｃ
添加量が５〜２０原子％の範囲の媒体が好適であるが、
Ｃ添加量が３〜２０原子％の範囲で、実用上問題のない
潤滑性能， 突起品質が得られることがわかる。また、
ヘッド・バニッシュ処理後における媒体表面粗さは、Ｒ
ａ が２０〜４０Å， 最大高さＲｍａｘ が５００
〜７００ Å、ΔＣｖ （１０％−１％） が８０〜１
２０ Åのとき最も良好であるが、Ｒａ が２０〜６０
Å， Ｒｍａｘ が５００ 〜８５０ Å， ΔＣｖ
（１０ ％−１％） が８０〜１５０ Åであれば、実
用上問題のない潤滑性能， 突起品質が得られる。これ
らのことから、本発明により、良好な突起品質を持ち、
硬質スライダーの磁気ヘッドによるＣＳＳにおいて優れ
た耐摩耗性，潤滑性を発揮し、磁気ヘッドの低浮上走行
に対応して十分に高密度記録の可能な磁気記録媒体を得
ることができた。From Table 1, after head burnishing, C
A medium in which the amount added is in the range of 5 to 20 atomic % is preferable, but
It can be seen that practically acceptable lubrication performance and protrusion quality can be obtained when the amount of C added is in the range of 3 to 20 at.%. Also,
The media surface roughness after head burnishing is R
a is 20 to 40 Å, maximum height Rmax is 500
~700 Å, ΔCv (10%-1%) is 80~1
It is best when Ra is 20 Å, but when Ra is 20 to 60
Å, Rmax is 500 to 850 Å, ΔCv
If (10%-1%) is 80 to 150 Å, lubrication performance and protrusion quality with no practical problems can be obtained. For these reasons, the present invention has good protrusion quality,
It was possible to obtain a magnetic recording medium that exhibits excellent wear resistance and lubricity in CSS using a hard slider magnetic head, and is capable of sufficiently high-density recording in response to low flying motion of the magnetic head.
【００２２】以上の実施例では、保護層への添加元素と
してＣを用いた場合で説明したが、この添加元素はＣに
限ることなく、その他Ａｌ， Ｃｕ，Ｃｒ， Ａｇ，
Ｐｔ， Ａｕのうちの少なくとも一つを、添加量の合計
が３〜２０原子％の範囲となるように加えても、上記と
同様の結果を得ることが確認されている。また、保護層
の基材であるＳｉＯ２ についても、ＺｒＯ２ など他
の酸化物でもよく、保護層の基材としてはＳｉ３ Ｎ４
等の窒化物を使用しても有効であり、上記と同様の結
果が得られる。[0022] In the above embodiments, the case where C was used as an additive element to the protective layer was explained, but this additive element is not limited to C, and may also include Al, Cu, Cr, Ag,
It has been confirmed that the same results as above can be obtained even when at least one of Pt and Au is added so that the total addition amount is in the range of 3 to 20 atomic %. Further, SiO2, which is the base material of the protective layer, may be other oxides such as ZrO2, and Si3 N4 can be used as the base material of the protective layer.
It is also effective to use nitrides such as, and the same results as above can be obtained.
【００２３】さらに本発明では、Ｃ， Ａｌ， Ｃｕ，
Ｃｒ， Ａｇ， Ｐｔ， Ａｕのうちの少なくとも一
つの元素が、保護層形成時にターゲツト中に含まれるか
ら、保護層の基材が酸化物， 窒化物の如何にかかわら
ず、ＤＣスパッタ法により成膜が可能となる。したがっ
て、本発明の媒体は磁性層と保護層を連続成膜した場合
でも、安定な磁気特性を有する磁性層と、安定した膜組
成とヘッド・バニッシュ特性を持つ保護層が得られるこ
とから、高い量産性が実現されるという利点もある。Furthermore, in the present invention, C, Al, Cu,
Since at least one element among Cr, Ag, Pt, and Au is included in the target when forming the protective layer, the film can be formed by DC sputtering regardless of whether the base material of the protective layer is an oxide or nitride. becomes possible. Therefore, even when the magnetic layer and the protective layer are successively deposited, the medium of the present invention can provide a magnetic layer with stable magnetic properties and a protective layer with stable film composition and head vanishing characteristics. Another advantage is that mass production is possible.
【００２４】[0024]
【発明の効果】この発明によれば、強磁性合金薄膜磁性
層上に、スパッタ法で成膜したＣ， Ａｌ， Ｃｕ，
Ｃｒ， Ａｇ， Ｐｔ， Ａｕのうちの少なくとも一つ
の元素が適当な添加量で含まれる酸化膜または窒化膜の
保護層と、さらにその上に液体潤滑層を備え、ヘッド・
バニッシュ処理を施して適切な表面粗さを持つように磁
気記録媒体を構成したために、硬質スライダーの磁気ヘ
ッドによるＣＳＳにおいても優れた耐摩耗性， 潤滑性
を示し、また、突起品質も良好であり、磁気ヘッドの低
浮上走行にも対応することが可能な高密度記録媒体とし
ての有用性が大きい。この磁気記録媒体を用いることに
より、固定磁気ディスク装置の大容量化， 小型化が実
現される。[Effects of the Invention] According to the present invention, C, Al, Cu,
A protective layer of an oxide film or a nitride film containing at least one element selected from Cr, Ag, Pt, and Au in an appropriate amount, and a liquid lubricant layer thereon.
Because the magnetic recording medium is burnished to have an appropriate surface roughness, it exhibits excellent wear resistance and lubricity even in CSS using a hard slider magnetic head, and also has good protrusion quality. , it is highly useful as a high-density recording medium that can accommodate low flying motion of a magnetic head. By using this magnetic recording medium, fixed magnetic disk drives can be made larger in capacity and smaller in size.
Claims (4)
性合金薄膜磁性層と、この磁性層上に形成した保護層，
液体潤滑層を有する磁気記録媒体において、前記保護層
はスパッタ法で形成した酸化物または窒化物に、添加元
素としてＣ，Ａｌ，Ｃｕ，Ｃｒ，Ａｇ，Ｐｔ，Ａｕのう
ちの少なくとも一つを含むことを特徴とする磁気記録媒
体。Claim 1: A ferromagnetic alloy thin film magnetic layer formed by sputtering on a non-magnetic substrate, a protective layer formed on this magnetic layer,
In the magnetic recording medium having a liquid lubricant layer, the protective layer contains at least one of C, Al, Cu, Cr, Ag, Pt, and Au as an additive element in an oxide or nitride formed by a sputtering method. A magnetic recording medium characterized by:
護層に含まれる添加元素は総量で３〜２０原子％である
ことを特徴とする磁気記録媒体。2. The magnetic recording medium according to claim 1, wherein the total amount of additive elements contained in the protective layer is 3 to 20 atomic %.
いて、ヘッド・バニッシュ処理後の保護層の表面粗さＲ
ａ が２０〜６０Å， 最大高さＲｍａｘ が ５００
〜８５０Å， 相対負荷曲線の相対負荷長さ１０％にお
けるカッティング深さから相対負荷長さ１％におけるカ
ッティング深さを差し引いた値ΔＣｖ （１０ ％−１
％） が８０〜１５０ Åであることを特徴とする磁気
記録媒体。3. In the magnetic recording medium according to claim 1 or 2, the surface roughness R of the protective layer after head burnishing treatment is
a is 20 to 60 Å, maximum height Rmax is 500
~850 Å, the value obtained by subtracting the cutting depth at 1% relative load length from the cutting depth at 10% relative load length in the relative load curve ΔCv (10%-1
%) is 80 to 150 Å.
いて、磁性層と保護層とをいずれもＤＣスパッタ法を用
いて連続成膜したことを特徴とする磁気記録媒体。4. The magnetic recording medium according to claim 1, wherein the magnetic layer and the protective layer are both successively deposited using a DC sputtering method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP40207090A JPH04216319A (en) | 1990-12-14 | 1990-12-14 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP40207090A JPH04216319A (en) | 1990-12-14 | 1990-12-14 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04216319A true JPH04216319A (en) | 1992-08-06 |
Family
ID=18511878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP40207090A Pending JPH04216319A (en) | 1990-12-14 | 1990-12-14 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04216319A (en) |
-
1990
- 1990-12-14 JP JP40207090A patent/JPH04216319A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4820584A (en) | Magnetic recording medium and method of manufacturing the same | |
| JP3018762B2 (en) | Magnetic recording medium and method of manufacturing the same | |
| JPH04216319A (en) | Magnetic recording medium | |
| JP2546383B2 (en) | Magnetic disk | |
| JPS626425A (en) | Magnetic recording medium | |
| JPH0421930B2 (en) | ||
| JPH0371418A (en) | Magnetic recording medium | |
| JP3024769B2 (en) | Magnetic hard disk | |
| JP3962962B2 (en) | Magnetic recording medium | |
| JP2004342155A (en) | Perpendicular magnetic recording medium | |
| WO1988002168A1 (en) | Magnetic data storage media | |
| JPS61131224A (en) | Magnetic recording medium | |
| JPH0440626A (en) | Magnetic recording medium | |
| JPH0283803A (en) | Magnetic disk device | |
| JPH1196543A (en) | Magnetic recording medium | |
| JPH0268712A (en) | Thin film magnetic recording medium | |
| JPH04285727A (en) | Magnetic disk device | |
| JPH0775069B2 (en) | Magnetic disk | |
| JPH08227520A (en) | Magnetic recording medium its production | |
| JPH02162518A (en) | Magnetic recording medium and method for magnetic recording/reproduction | |
| JPH0528462A (en) | Magnetic recording medium | |
| JPH0464922A (en) | Magnetic recording medium | |
| JPH0770050B2 (en) | Magnetic recording medium | |
| JPH06342517A (en) | Magnetic recording medium | |
| JPH02108234A (en) | Magnetic disk |