JPH04204903A - Dichroic coating optical thin film - Google Patents
Dichroic coating optical thin filmInfo
- Publication number
- JPH04204903A JPH04204903A JP33942690A JP33942690A JPH04204903A JP H04204903 A JPH04204903 A JP H04204903A JP 33942690 A JP33942690 A JP 33942690A JP 33942690 A JP33942690 A JP 33942690A JP H04204903 A JPH04204903 A JP H04204903A
- Authority
- JP
- Japan
- Prior art keywords
- layers
- layer
- thin film
- refractive index
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 40
- 239000010409 thin film Substances 0.000 title claims abstract description 27
- 238000000576 coating method Methods 0.000 title abstract description 17
- 239000011248 coating agent Substances 0.000 title abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 10
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 abstract description 20
- 229920005989 resin Polymers 0.000 abstract description 9
- 239000011347 resin Substances 0.000 abstract description 9
- 239000010408 film Substances 0.000 abstract description 5
- 230000008021 deposition Effects 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 74
- 238000010586 diagram Methods 0.000 description 10
- 239000012788 optical film Substances 0.000 description 10
- 238000000926 separation method Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000006121 base glass Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 239000004033 plastic Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000000411 transmission spectrum Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 description 2
- 229910003447 praseodymium oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- -1 BK-7 Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 241001269524 Dura Species 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 210000001951 dura mater Anatomy 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、カラー複写機の受像光学系や近年流行になっ
ている、テレビ画像投影装置や液晶画像投影装置に用い
る色分解プリズムやミラーやレンズ系において用いられ
る色分解機能を有するダイクロイックコート光学薄膜の
色ムラや光学特性変化の防止改良に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention is applicable to color separation prisms, mirrors, and This invention relates to improving the prevention of color unevenness and changes in optical properties of dichroic coated optical thin films with color separation functions used in lens systems.
色分解グイクロイックコート用光学薄膜として従来Ｔ１
０．と５ＩＯｔの積層構造やＭｇＦｔとＺｎＳの積層構
造等が用いられて来た。Conventional T1 as an optical thin film for color separation chromic coating
0. A stacked structure of MgFt and ZnS, a stacked structure of MgFt and ZnS, etc. have been used.
Ｔ１０．と８１０．系では、光学特性のカットオフ波長
の立ち上がりにおいて不十分であり、また、ＭｇＦｚと
ＺｎＳ系では真空蒸着槽の保守清掃の回数を多くしなけ
れば安定した膜質が得にくかった。T10. and 810. In the case of the MgFz and ZnS systems, the rise in the cutoff wavelength of the optical properties was insufficient, and in the case of the MgFz and ZnS systems, it was difficult to obtain stable film quality without increasing the number of times the vacuum deposition tank was maintained and cleaned.
さらに透明基体として、ガラス基体を用いた時、ガラス
表面の変質層（例えば、ヤケ）、又はキズが有ると、基
体上に光学薄膜例えば反射防止層、グイクロイックコー
ト等をコートすると色ムラが生じてしまう。その為に研
磨剤を用いて、基体表面をコート直前に数１００（人）
薄く研磨し、変質層又はキズを除去し、すみやかにコー
トを行っている。Furthermore, when a glass substrate is used as a transparent substrate, if there is a deteriorated layer (for example, discoloration) or scratches on the glass surface, color unevenness may occur if an optical thin film such as an anti-reflection layer, glaucroic coating, etc. is coated on the substrate. It will happen. For this purpose, several hundred people (people) use an abrasive to coat the substrate surface.
A thin layer is polished to remove any deteriorated layers or scratches, and a coating is applied immediately.
特に、波長分離を目的とした、ダイクロイックコートに
おいてガラス表面の変質層、キズの存在は、波長分離性
能の不均一が生じ、色ムラの問題が生じてしまう状態で
ある。In particular, in dichroic coating for the purpose of wavelength separation, the presence of altered layers or scratches on the glass surface causes non-uniformity in wavelength separation performance, resulting in color unevenness.
透明基体としてガラスを用いたとき、前述のようにガラ
ス表面にヤケと称する変質層やきずがあると、その基体
ガラス上に光学薄膜、例えば反射防止層とかダイクロイ
ックコート層とかをコートすると色むらが生じてしまう
。その為に研磨剤を用いて基体表面をコート直前に数百
オングストローム（λ）ｉ！＜研磨して変質層又はきす
を除去し、すみやかにコートを行っている。When glass is used as a transparent substrate, if there is a deteriorated layer or scratch called discoloration on the glass surface as described above, color unevenness will occur if an optical thin film such as an antireflection layer or dichroic coating layer is coated on the substrate glass. It will happen. For this reason, just before coating the substrate surface with an abrasive, several hundred angstroms (λ) i! <The damaged layer or scratches are removed by polishing, and the coating is immediately applied.
特に波長分離を目的としたダイクロイックコートにおい
て、ガラス表面の変質層やきずの存在は、波長分離性能
の不均一を生じ色むらを生ずる大きな問題をかかえるこ
とになる。Particularly in dichroic coatings for the purpose of wavelength separation, the presence of altered layers or scratches on the glass surface poses a major problem in that the wavelength separation performance becomes non-uniform and color unevenness occurs.
そして、前述のように変質層やきず除去のためのガラス
表面の研磨を行うことは微妙なむづかしさを伴う作業で
あり工数も増大する。As described above, polishing the glass surface to remove the deteriorated layer and scratches is a slightly difficult task and increases the number of man-hours.
また、ガラス基体又はプラスチック基体上にダイクロイ
ックコートを行い、そのコート面を紫外線硬化接着剤を
用いて他の基体へ接着するために紫外線光を照射したと
き、ダイクロイックコートの性能変化が生じてしまうこ
とがある。Furthermore, when dichroic coating is applied to a glass or plastic substrate and the coated surface is irradiated with ultraviolet light in order to adhere to another substrate using an ultraviolet curing adhesive, the performance of the dichroic coating may change. There is.
もし波長によって反射率が異なると、反射光又は透過光
は波長により偏りを持ち、色づきという現象が生じるこ
とになる。If the reflectance differs depending on the wavelength, the reflected light or transmitted light will be biased depending on the wavelength, resulting in a phenomenon called coloring.
本発明はこのようなダイクロイックコート光学薄膜の問
題点を解消し基体表面にやけやきずかあってもカットオ
フ波長の光学特性に影響を受けることがなく、また紫外
線硬化性樹脂を用い、ダイクロイックコートを他の透明
基体と接着するとき、ダイクロイックコートの光学特性
変化が防止でき、光学的にフラットな特性を安定して保
てるダイクロイックコート光学薄膜を提供することを課
題目的にする。The present invention solves these problems with dichroic coated optical thin films, does not affect the optical characteristics of the cut-off wavelength even if there are burns or scratches on the substrate surface, and uses a dichroic coated optical thin film using ultraviolet curable resin. An object of the present invention is to provide a dichroic coated optical thin film that can prevent changes in the optical properties of the dichroic coat and stably maintain optically flat properties when bonded to other transparent substrates.
この目的は次の技術手段（ａ）、（ｂ）のいずれかによ
って達成される。This objective is achieved by either of the following technical means (a) or (b).
（ａ）透明基体上に高屈折率材料層（Ｈ）と低屈折率材
料層（Ｌ）を交互に積層してなる光学薄膜において、該
光学薄膜の第１積層及び最終積層の少くとも一方の外側
に、酸化シリコンよりなる材料層を、その光学膜厚（ｎ
ｄ）がλ。を設計波長とするとき、
０．３５λ。≦ｎｄ≦０．６５λ。(a) In an optical thin film formed by alternately laminating high refractive index material layers (H) and low refractive index material layers (L) on a transparent substrate, at least one of the first laminated layer and the final laminated layer of the optical thin film A material layer made of silicon oxide is placed on the outside with an optical thickness (n
d) is λ. When is the design wavelength, 0.35λ. ≦nd≦0.65λ.
の関係を満たすように設けたことを特徴とするダイクロ
イックロート光学薄膜。A dichroic rotary optical thin film characterized by being provided so as to satisfy the following relationship.
（ｂ）前記ａ項における高屈折率材料層（Ｈ）を酸化チ
タン系材料とし、低屈折率材料層（Ｌ）を酸化アルミニ
ュームとしたことを特徴とするダイクロイックコート光
学薄膜。(b) A dichroic coated optical thin film characterized in that the high refractive index material layer (H) in the above item a is made of a titanium oxide-based material, and the low refractive index material layer (L) is made of aluminum oxide.
本発明の構成はまず第１図に示すような層によって構成
される。The structure of the present invention is first composed of layers as shown in FIG.
透明基体Ａは例えばＢＫ−７のようなガラス又は例えば
アクリル樹脂、ポリカーボネート系樹脂、ポリスチレン
系樹脂、ポリスルフォン系樹脂、アモルファスポリオレ
フィン系樹脂のようなプラスチックである。The transparent substrate A is, for example, glass such as BK-7, or plastic such as acrylic resin, polycarbonate resin, polystyrene resin, polysulfone resin, or amorphous polyolefin resin.
酸化シリコン層Ｂ、Ｄは光学的膜厚が０．３５λ。The silicon oxide layers B and D have an optical thickness of 0.35λ.
〜０．７λ。に設けられている。λ。は設計波長である
。Ｃは高屈折率材料層Ｈと低屈折率材料りが交互に配置
された積層薄膜体でありＨは酸化チタン又は酸化チタン
と酸化プラセオジウムの混合物の酸化チタン系材料で構
成され、Ｌは酸化アルミニウムを用いである。~0.7λ. It is set in. λ. is the design wavelength. C is a laminated thin film body in which high refractive index material layers H and low refractive index materials are alternately arranged, H is composed of titanium oxide or a titanium oxide-based material of a mixture of titanium oxide and praseodymium oxide, and L is aluminum oxide. is used.
そして、コート方法はガラス基体を用いたときは、真空
蒸着法で酸化シリコン層Ｂ、Ｄは蒸着源として酸化シリ
コンを用い基体温度を３００℃にし酸化ガス導入を２
Ｘ １０” Ｔｏｒで行い、電子銃加熱蒸着をしている
。When a glass substrate is used, the coating method is a vacuum evaporation method, and the silicon oxide layers B and D are made using silicon oxide as the evaporation source, the substrate temperature is 300°C, and the oxidizing gas is introduced for 2
The deposition was carried out using X 10" Tor, and electron gun heating evaporation was performed.
Ｃの高低屈折率材料層Ｈ，Ｌは酸素ガス導入をＩ Ｘ
１Ｏ−４７ｏｒで行い、基体温度はやはり３００°Ｃで
あり、Ｈの蒸着源は酸化チタン又は酸化プラセオジウム
であり、メルク社製のサブスタンス−■を用いる。The high and low refractive index material layers H and L of C are exposed to the introduction of oxygen gas.
The temperature of the substrate was 300° C., the H evaporation source was titanium oxide or praseodymium oxide, and Substance-■ manufactured by Merck & Co. was used.
また、Ｌの蒸着源は酸化アルミニウムである。Further, the vapor deposition source of L is aluminum oxide.
プラスチック基体を用いたときのコート方法は基体加熱
を行なわないだけで蒸着材料と導入ガス及びその圧力と
はガラス基体の場合と同様にしている。In the coating method when a plastic substrate is used, the substrate is not heated, and the vapor deposition material, introduced gas, and its pressure are the same as in the case of a glass substrate.
但し、特公昭５６−４０４４９号公報に示される高周波
反応蒸着を用いている。However, high frequency reactive vapor deposition as disclosed in Japanese Patent Publication No. 56-40449 is used.
このように構成し、第１図に示すＢ、Ｄの層を付与した
場合と除去した場合とにおいてダイクロイックコートの
特性バラツキを評価検討した。With this structure, variations in the characteristics of the dichroic coat were evaluated and studied when the layers B and D shown in FIG. 1 were applied and when they were removed.
そして、基体としてガラスを用い、コート前の研磨は行
なわなかった。Glass was used as the substrate, and no polishing was performed before coating.
Ｂ、Ｄの層を付与した場合は第３図に示すような透過率
特性をもつ均一なダイクロイックコートができたのが、
付与しない場合は第４図に示すように本来、■で表わさ
れる特性が■で表わされる特性に変化してしまうような
カットオフ波長の異なる不均一なコートが生じ、実用上
問題となってしまった。When layers B and D were applied, a uniform dichroic coat with transmittance characteristics as shown in Figure 3 was created.
If it is not applied, as shown in Figure 4, a non-uniform coating with different cut-off wavelengths will occur, where the characteristics originally represented by ■ change to the characteristics represented by ■, which poses a practical problem. Ta.
これについては、更に実施例１と比較例１をかかげて後
述する。This will be further described later with reference to Example 1 and Comparative Example 1.
次に第２図に示すように、ダイクロイックコートを形成
されたガラスプリズム１１１をガラスプリズム１１６に
紫外線硬化樹脂１１５ （具体的にはノーランド社製Ｎ
［１６１を使用したが、これに限定されるものではない
）で接合した。Next, as shown in FIG.
[161 was used, but is not limited to this].
第１図で示した酸化シリコン層Ｂ、Ｄを付与したダイク
ロイックコートでは、紫外線照射１０ｍｗ／ｃｍ”によ
る仮硬化（照射時間５秒）と本効果（照射時間１０分間
）のカットオフ波長の変化は３ｒ＋ｍ以下であり、一方
、酸化シリコン層Ｂ、Ｄを付与してないダイクロイック
コートでは同し条件の硬化でカットオフ波長が約１０〜
２０ｎｍ変化し実用上問題となった。これについては更
に実施例２と比較例２を用いて後述する。In the dichroic coat with silicon oxide layers B and D shown in Figure 1, the change in cutoff wavelength between temporary curing (irradiation time 5 seconds) and main effect (irradiation time 10 minutes) by ultraviolet irradiation at 10 mw/cm'' is as follows. 3r+m or less, and on the other hand, the dichroic coat without silicon oxide layers B and D has a cutoff wavelength of about 10~10 when cured under the same conditions.
The change was 20 nm, which caused a practical problem. This will be further described later using Example 2 and Comparative Example 2.
さて、酸化シリコン層Ｂ、Ｄの膜厚と光学特性への影響
は、光学的膜厚が薄すぎる（ ０．３５λ。以下）とダ
イクロイックコートの色むらの発生及び紫外線硬化樹脂
を用いた接合時に仮硬化及び本硬化時のカットオフ波長
の変化が大きくなってしまい問題である。Now, the effect on the film thickness and optical properties of silicon oxide layers B and D is that if the optical film thickness is too thin (0.35λ or less), color unevenness will occur in the dichroic coating and when bonding using ultraviolet curable resin. This is a problem because the change in cutoff wavelength becomes large during temporary curing and main curing.
また、光学的硬膜が設計波長λ。に対して（０，５±０
．１５）λ。以内に設定することで酸化シリコン層Ｂ、
Ｄの光学的膜厚の変化に対する光透過率の変化は実用上
何ら問題とならないことがわかった。Also, the optical dura is at the design wavelength λ. for (0,5±0
．． 15) λ. By setting the silicon oxide layer B within
It was found that the change in light transmittance with respect to the change in optical film thickness of D does not pose any practical problem.
本発明の実施例について記÷す。 Examples of the present invention will be described below.
（実施例１）
基体ガラス（ＢＫ−７）上に設計波長（λ。）が６００
ｎｍ、屈折率ｎ、膜厚ｄとしたとき光学膜厚ｎｄの各薄
膜を第５図のように層！ｌｈｌ〜１８まで１８層蒸着さ
せである。(Example 1) The design wavelength (λ) was 600 on the substrate glass (BK-7).
When nm, refractive index n, and film thickness d, each thin film with optical thickness nd is layered as shown in Figure 5! 18 layers were deposited from lhl to lhl18.
各層の蒸着材料、光学膜厚ｎｄｓ積層態様は第１第
１ 表
内、層嵐７〜１６は高屈折率層Ｈと低屈折率層りの各々
５層を交互に積層している。そして前者の層Ｈは酸化チ
タンの材質を用い、後者の層りは酸化アルミニウムを使
用している。The vapor deposition material and optical film thickness nds lamination mode of each layer are
1 In Table 1, Layer Arashi 7 to 16 each have five high refractive index layers H and five low refractive index layers alternately laminated. The former layer H uses titanium oxide material, and the latter layer uses aluminum oxide.
このような構成の光学薄膜の垂直入射光の透過率スペク
トルは第３図のグラフに示すようになる。The transmittance spectrum of the optical thin film having such a structure for vertically incident light is as shown in the graph of FIG.
即ち、透過率５０％の波長であるカットオフ波長は、５
６８ｎｍであり、基体ガラスを蒸着前に研磨せず、超音
波洗浄のみを行い用いたがカットオフ波長のばらつきは
２層ｍ以内で略々均一であり、実用上問題がなかった。That is, the cutoff wavelength, which is the wavelength at which the transmittance is 50%, is 5
Although the substrate glass was not polished before vapor deposition and only subjected to ultrasonic cleaning, the cutoff wavelength was almost uniform within 2 m, and there was no problem in practical use.
そして比較例として前記構成の薄膜から１層の酸化シリ
コン層を除いて同様に蒸着して作った薄膜の垂直入射光
透過率スペクトルは第４図に示すグラフのようにカット
オフ波長が５６３ｎｍ〜５８０ｎｍに変化してしまうば
らつきを生じている。As a comparative example, a normal incident light transmittance spectrum of a thin film with the above structure except for one silicon oxide layer and deposited in the same manner has a cutoff wavelength of 563 nm to 580 nm, as shown in the graph shown in Figure 4. This results in variations that change.
更にこの比較例では本発明本来の特性のに対して傷や変
質層のある基体ガラス上では■に示す透過率スペクトル
を生じてしまった。Furthermore, in this comparative example, a transmittance spectrum shown in (3) was produced on a substrate glass having scratches or a deteriorated layer, which was different from the original characteristics of the present invention.
その結果色むらも発生し実用上問題となった。As a result, color unevenness also occurred, which was a practical problem.
（実施例２）
基体ガラス（ＢＫ−７） 、設計波長６００ｎｍ、 Ｈ
は高屈折率酸化チタン、Ｌは低屈折率酸化チタン層とし
、光学膜厚ｎｄの各薄膜を第６図のようにｍｌ〜嵐３３
まで３３層形成してダイクロイックコートを構成し第３
３層目のコート表面には接着剤として紫外線硬化樹脂（
ノーランド社製＆６１）を塗布し別のＢＫ−７のガラス
基体に接合し第２図の形状のプリズムを作成した。(Example 2) Base glass (BK-7), design wavelength 600 nm, H
is a high-refractive-index titanium oxide layer, L is a low-refractive-index titanium oxide layer, and each thin film with an optical thickness nd is coated with ml to Arashi 33 as shown in Figure 6.
A dichroic coat is formed by forming 33 layers until the third layer is formed.
The surface of the third layer is coated with ultraviolet curing resin (
&61) manufactured by Norland Co., Ltd. was applied and bonded to another BK-7 glass substrate to create a prism having the shape shown in Fig. 2.
各層の蒸着材料、光学膜厚ｎｄ、積層懸様は第２表のよ
うになる。The vapor deposition material, optical film thickness nd, and lamination pattern of each layer are as shown in Table 2.
内、層Ｎ１１５〜１０は低屈折率層りと高屈折率層Ｈの
各々３層を交互に積層したものであり、層＆１５〜２８
は光学膜厚が同じ前記り層７層と別の光学膜厚の同じＨ
層７層とを交互に積層配列したものである。Among them, layers N115 to N10 are formed by alternately laminating three layers each of low refractive index layers and high refractive index layers H, and layers &15 to 28
The above 7 layers have the same optical film thickness and the same H layer has another optical film thickness.
Seven layers are alternately stacked and arranged.
このような構成では第２図のプリズム形状で４５度入射
光透過率を測定すると第７図のグラフに示すようにカッ
トオフ波長は設計値と比較し２層ｍ以下の誤差となり実
用上良好であった。In such a configuration, when measuring the transmittance of incident light at 45 degrees with the prism shape shown in Figure 2, the cutoff wavelength has an error of less than 2 layers m compared to the design value, as shown in the graph of Figure 7, which is good for practical use. there were.
しかし、このような構成から層Ｎ１１ｌと層Ｎａ３３の
酸化シリコン層を除き３１層とし、実施例２と同様に紫
外線硬化樹脂でガラス基体を接合したとき、その仮硬化
時と本硬化時のカットオフ波長の相違は同様に測定する
と１５ｎｍ生じ実測値が長波長側にシフトしまっていた
。また、６０℃、９０層湿度で１週間放置したときその
相違はさらに増加し問題となった。However, when the silicon oxide layer of layer N11l and layer Na33 is removed from this structure to make 31 layers, and the glass substrate is bonded with an ultraviolet curing resin as in Example 2, the cutoff during temporary curing and main curing When similarly measured, the difference in wavelength was 15 nm, and the actual measured value was shifted to the longer wavelength side. Furthermore, when the samples were left at 60° C. and 90-layer humidity for one week, the difference further increased and became a problem.
（実施例３）
実施例１、及び実施例２において酸化シリコン層の光学
的膜厚ｎｄを０〜０．８λ。の範囲に変化させたときの
色むら発生度Ａ１紫外線硬化樹脂接着時のカットオフ波
長変化Ｂ１酸化シリコン層を設けたときに生ずるカット
オフ波長変化の割合Ｃをテストしたのが次の第３表であ
る。(Example 3) In Example 1 and Example 2, the optical thickness nd of the silicon oxide layer was 0 to 0.8λ. Table 3 below shows the results of testing of the occurrence of color unevenness in the range A1 change in cut-off wavelength when adhering ultraviolet curable resin B1 rate C of change in cut-off wavelength that occurs when a silicon oxide layer is provided It is.
ここにＡでは、×：色むら多し
０２色むらなし
Ｂでは、×二１０ｎｍ以上変化
０ ： １０ｎｍ未溝の変化
Ｃでは、Ｘ ： ｌＯｎｍ以上
△：５〜１ＯｎＩ１以内
○：５ｎｍ未満
これにより、酸化シリコンの光学膜厚ｎｄは０．３５λ
。≦ｎｄ＜０．５λ。が良好であることがわかる。Here, in A, ×: Lots of color unevenness 02 No color unevenness B: ×2 Change of 10 nm or more 0: 10 nm change with no grooves In C, The optical thickness nd of silicon oxide is 0.35λ
. ≦nd<0.5λ. It can be seen that the results are good.
（実施例４） 基体ガラスはＢＫ−７、設計波長λ。は６００ｎｍ。(Example 4) Base glass is BK-7, design wavelength λ. is 600nm.
Ｈは酸化チタンと酸化プロセオジウムの混合物である高
屈折率の蒸着物質（商品各、メルク社製サブスタンス−
Ｉ［）、Ｌは酸化アルミニウムの低屈折率蒸着物質とし
て第８図に示すようにＮＱｌ〜Ｎａ２９までの２９層を
基体ガラス上に蒸着させてＲｅｄ反射グイクロイックコ
ートを行った。H is a vapor-deposited substance with a high refractive index that is a mixture of titanium oxide and proseodymium oxide (for each product, Substance manufactured by Merck & Co.)
I[) and L are aluminum oxide low refractive index vapor deposited materials, and as shown in FIG. 8, 29 layers from NQl to Na29 were vapor deposited on a base glass to form a red reflective gyroic coating.
そしてその各層の蒸着材料、光学膜厚ｎｄｓ積層態様は
第４表のようになる。The evaporation materials, optical film thicknesses, and lamination modes of each layer are as shown in Table 4.
内、層嵐３〜８のＨ，Ｌ各間じ光学膜厚のもの３層ずつ
と層Ｎａ１ｌ〜２６のＨ，Ｌ各間じ光学膜厚の第 ４
表
これは色むらがなく第２図のプリズム形状に紫外線硬化
剤で接着し４５度入射光の反射率を測定すると、光学特
性変化即ち、カットオフ波長の変化は５層ｍ以下であり
良好であった。Of these, three layers each have an optical film thickness between H and L of layers 3 to 8, and 4th layer has an optical film thickness between each H and L of layers Na1l to 26.
This table shows that there is no color unevenness, and when the prism shape shown in Figure 2 is adhered with an ultraviolet curing agent and the reflectance of incident light at 45 degrees is measured, the change in optical properties, that is, the change in cutoff wavelength, is less than 5 layers, which is good. there were.
その時の反射率をプロットしたものが１１０図に示すよ
うなグラフになっている。The reflectance at that time is plotted in a graph as shown in Figure 110.
（実施例５）
基体ガラスはＢＫ−７、設計波長λ。は６００ｎｍであ
り、ＨｌＬの蒸着物質はそれぞれ実施例４と同じである
。そして、層Ｎａ４〜１９まではそれぞれ光学硬膜を０
．２３λ。と０，２０λ。にしたＨ、Ｌを８層ずつ交互
に繰り返して積層しである。(Example 5) Base glass was BK-7, design wavelength λ. is 600 nm, and the vapor deposition material of HIL is the same as in Example 4. For layers Na4 to Na19, the optical dura mater was set to 0.
．． 23λ. and 0,20λ. Eight layers of H and L are alternately stacked.
この構成はＢｌｕｅのダイクロイックコートを形成し第
９図に示すようなものであり、積層の態様は第５表に示
すようになる。This structure forms a blue dichroic coat as shown in FIG. 9, and the lamination mode is shown in Table 5.
この実施例５も実施例４同様色むらがな（第２図のプリ
ズム形状に紫外線硬化剤で他のガラス基体に接着し４５
度入射光の反射率を測定すると、光学特性（カットオフ
波長特性）の変化は５層ｍ以下であり大変良好であった
。Similar to Example 4, this Example 5 also has uneven color (the prism shape shown in Figure 2 is adhered to another glass substrate with an ultraviolet curing agent).
When the reflectance of incident light was measured, the change in optical properties (cutoff wavelength properties) was 5 layers or less, which was very good.
その時の反射率を測定してプロットしたものが第１１図
に示すようなグラフになっている。The reflectance at that time was measured and plotted, resulting in a graph as shown in FIG.
本発明のダイクロイック光学薄膜により光学ガラスまた
は光学樹脂材よりなる基体表面にやけやきすがあった場
合にその除去処理をすることなくその上に光学薄膜を通
常通り多層コートしても、そのためにカットオフ波長の
変化が起ることがなくなった。If there is a burn mark on the surface of a substrate made of optical glass or optical resin material using the dichroic optical thin film of the present invention, even if a multilayer optical film is normally coated on the surface without removing it, the film will be cut. Changes in off-wavelength no longer occur.
また、紫外線硬化性樹脂を用い、ダイクロイックコート
を他の透明基体と接着するとき、ダイクロイックコート
の光学特性変化が防止できるようになった。Furthermore, when a dichroic coat is bonded to another transparent substrate using an ultraviolet curable resin, changes in the optical properties of the dichroic coat can now be prevented.
このようにして光学的に安定で、色ムラの少ない高性能
の特性を安定して保てるダイクロイック光学薄膜を安価
に提供できるようになった。In this way, it has become possible to provide at a low cost a dichroic optical thin film that is optically stable and can stably maintain high performance characteristics with little color unevenness.
第１図は本発明の光学薄膜の層構成の概略図。
第２図はグイクロイックコートしたプリズムに他のプリ
ズムを接合した断面図。
第３図は本発明の作用を表わす透過率特性図。
第４図は従来技術の作用を表わす透過率特性図。
第５図は本発明の実施例１の層構成図。
第６図は本発明の実施例２の層構成図。
第７図は本発明の実施例２の透過率特性図。
第８図は本発明の実施例４の層構成図。
第９図は本発明の実施例５の層構成図。
第１０図は実施例４を用いたＲｅｄ反射ダイクロイック
コートプリズムとして使用する場合の反射率特性図。
第１１図は実施例５を用いてＢｌｕｅ反射グイクロイッ
クコートプリズムとして使用する場合の反射率特性図。
Ｉｌｌ・・・プリズム、−１１５・・・接着剤、１１６
・・プリズム。FIG. 1 is a schematic diagram of the layer structure of the optical thin film of the present invention. Figure 2 is a cross-sectional view of a guichroic coated prism joined to another prism. FIG. 3 is a transmittance characteristic diagram showing the effect of the present invention. FIG. 4 is a transmittance characteristic diagram showing the effect of the prior art. FIG. 5 is a layer configuration diagram of Example 1 of the present invention. FIG. 6 is a layer configuration diagram of Example 2 of the present invention. FIG. 7 is a transmittance characteristic diagram of Example 2 of the present invention. FIG. 8 is a layer configuration diagram of Example 4 of the present invention. FIG. 9 is a layer configuration diagram of Example 5 of the present invention. FIG. 10 is a reflectance characteristic diagram when Example 4 is used as a red reflective dichroic coat prism. FIG. 11 is a reflectance characteristic diagram when Example 5 is used as a blue reflection gichroic coat prism. Ill... Prism, -115... Adhesive, 116
··prism.
Claims (2)
料層（Ｌ）を交互に積層してなる光学薄膜において、該
光学薄膜の第１積層及び最終積層の少くとも一方の外側
に、酸化シリコンよりなる材料層を、その光学膜厚（ｎ
ｄ）がλ＿０を設計波長とするとき、 ０．３５λ＿０≦ｎｄ≦０．６５λ＿０ の関係を満たすように設けたことを特徴とするダイクロ
イックコート光学薄膜。(1) In an optical thin film formed by alternately laminating high refractive index material layers (H) and low refractive index material layers (L) on a transparent substrate, at least one of the first laminated layer and the final laminated layer of the optical thin film A material layer made of silicon oxide is placed on the outside with an optical thickness (n
A dichroic coated optical thin film characterized in that d) is provided so as to satisfy the following relationship: 0.35λ_0≦nd≦0.65λ_0 when λ_0 is the design wavelength.
タン系材料とし、低屈折率材料層（Ｌ）を酸化アルミニ
ュームとしたことを特徴とするダイクロイックコート光
学薄膜。(2) A dichroic coated optical thin film according to claim 1, characterized in that the high refractive index material layer (H) is made of a titanium oxide based material and the low refractive index material layer (L) is made of aluminum oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33942690A JPH04204903A (en) | 1990-11-30 | 1990-11-30 | Dichroic coating optical thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33942690A JPH04204903A (en) | 1990-11-30 | 1990-11-30 | Dichroic coating optical thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04204903A true JPH04204903A (en) | 1992-07-27 |
Family
ID=18327357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33942690A Pending JPH04204903A (en) | 1990-11-30 | 1990-11-30 | Dichroic coating optical thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04204903A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008166782A (en) * | 2006-12-26 | 2008-07-17 | Seoul Semiconductor Co Ltd | Light-emitting element |
-
1990
- 1990-11-30 JP JP33942690A patent/JPH04204903A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008166782A (en) * | 2006-12-26 | 2008-07-17 | Seoul Semiconductor Co Ltd | Light-emitting element |
| US8405304B2 (en) | 2006-12-26 | 2013-03-26 | Seoul Semiconductor Co., Ltd. | Light emtting device |
| US8569944B2 (en) | 2006-12-26 | 2013-10-29 | Seoul Semiconductor Co., Ltd. | Light emitting device |
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