JPH0419072A - Grinding wheel for precision polishing - Google Patents
Grinding wheel for precision polishingInfo
- Publication number
- JPH0419072A JPH0419072A JP12145290A JP12145290A JPH0419072A JP H0419072 A JPH0419072 A JP H0419072A JP 12145290 A JP12145290 A JP 12145290A JP 12145290 A JP12145290 A JP 12145290A JP H0419072 A JPH0419072 A JP H0419072A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- grinding wheel
- fiber
- whetstone
- grindstone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 68
- 229920002994 synthetic fiber Polymers 0.000 claims abstract description 8
- 239000012209 synthetic fiber Substances 0.000 claims abstract description 8
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 5
- 239000000057 synthetic resin Substances 0.000 claims abstract description 5
- 239000011230 binding agent Substances 0.000 claims abstract description 4
- 239000000835 fiber Substances 0.000 abstract description 15
- 239000000463 material Substances 0.000 abstract description 13
- 239000007788 liquid Substances 0.000 abstract description 11
- 230000006378 damage Effects 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 3
- 229920001778 nylon Polymers 0.000 description 12
- 238000001179 sorption measurement Methods 0.000 description 12
- 239000006061 abrasive grain Substances 0.000 description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004641 Diallyl-phthalate Substances 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 3
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- -1 etc. Substances 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 239000004579 marble Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000007494 plate polishing Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、石材、ガラス、セラミックス等の硬脆材料、
及び金属材料等の被研磨材を精密研磨仕上げする精密研
磨用砥石に関するものである。Detailed Description of the Invention (Industrial Application Field) The present invention is directed to hard and brittle materials such as stone, glass, and ceramics;
The present invention also relates to a precision polishing whetstone for precisely polishing a material to be polished such as a metal material.
（従来の技術）
石材、ガラス、セラミックス等の硬脆材料、及び金属材
料等の被研磨材を精密研磨仕上げする方法としては、不
織布やフェルト等をベースとしたポリッシングバットを
用い、砥粒をスラリーにして供給する方式と、砥粒を結
合剤で結合した研磨砥石による湿式研磨方式とが用いら
れている。研磨砥石による方式は、作業性が簡便で工程
管理がしやすいことから多くの分野で期待され利用され
ている。(Prior art) As a method for precision polishing finishing of hard brittle materials such as stone, glass, ceramics, etc., and materials to be polished such as metal materials, a polishing bat made of non-woven fabric, felt, etc. is used, and abrasive grains are slurried. A wet polishing method using a grinding wheel in which abrasive grains are bonded with a binder is used. The method using a grinding wheel is expected to be used in many fields because it is easy to work with and easy to control the process.
しかし、従来の精密研磨仕上げ用研磨砥石には、次のよ
うな問題があった。即ち、１０μｍ以下の極微粒の砥粒
で構成された砥石を用いた研磨作業においては、砥石と
被研磨材との研磨界面では異常な現象が生ずることが多
い。例えば、研磨液が研磨界面で液膜となり、すべり現
象が生じたり、逆に砥石面と被研磨材との研磨界面で吸
着現象が生じたりすることがある。これらの現象は、適
正な砥石回転数、研磨圧力、研磨液量等の研磨条件の選
定により、ある程度は防止することができるが、すべり
現象が生ずると、砥石面において砥粒の自生作用が働か
なくなり、精密研磨仕上げで求められる常に安定した砥
石面の状態が得られないため、要求仕上げ面が得られな
くなる。また、吸着現象が生ずると、過度の研磨抵抗と
摩擦熱による砥石の変形、破壊が生じ、当然に要求仕上
げ面が得られないのみならず被研磨材へも多大の損傷を
与えるという問題があった。However, conventional precision polishing grindstones have the following problems. That is, in polishing operations using a whetstone made of ultrafine abrasive grains of 10 μm or less, abnormal phenomena often occur at the polishing interface between the whetstone and the material to be polished. For example, the polishing liquid may become a liquid film at the polishing interface, causing a sliding phenomenon, or conversely, an adsorption phenomenon may occur at the polishing interface between the grinding wheel surface and the material to be polished. These phenomena can be prevented to some extent by selecting appropriate polishing conditions such as the rotation speed of the whetstone, polishing pressure, and amount of polishing liquid. However, when a slipping phenomenon occurs, the self-growth effect of the abrasive grains acts on the surface of the whetstone. As a result, the stable grinding wheel surface required for precision polishing cannot be obtained, making it impossible to obtain the required finished surface. Furthermore, when the adsorption phenomenon occurs, the grinding wheel is deformed and destroyed due to excessive polishing resistance and frictional heat, which naturally causes the problem of not only not being able to obtain the required finished surface but also causing great damage to the material to be polished. Ta.
（発明が解決しようとする問題点）
従来の精密研磨仕上げ用研磨砥石を用いて研磨を行なう
場合において、砥石を構成する砥粒が１０μｍ以下の極
微粒になればなるほど、砥石と被研磨材との研磨界面で
は、研磨液が液膜となり、すべり現象が生じたり、逆に
、砥石面と被研磨材との研磨界面で吸着現象が生じたり
するという問題があった。そしてこれらの現象を砥石回
転数、研磨圧力、研磨液量等の研磨条件の選定のみて防
止することは、従来困難であった。(Problems to be Solved by the Invention) When polishing is performed using a conventional precision polishing grindstone, the more the abrasive grains constituting the grindstone become extremely fine particles of 10 μm or less, the more the relationship between the grindstone and the material to be polished increases. At the polishing interface, the polishing liquid becomes a liquid film, causing a sliding phenomenon, or conversely, an adsorption phenomenon occurs at the polishing interface between the grinding wheel surface and the material to be polished. Conventionally, it has been difficult to prevent these phenomena only by selecting polishing conditions such as the number of rotations of the grinding wheel, polishing pressure, and amount of polishing liquid.
本発明は上記の問題を解決するためになされたものであ
り、本発明は、合成繊維を砥石の構成要素とすることに
より、砥石と被研磨材との研磨界面でのすべり現象を防
止でき、過度の吸着現象を抑制でき、砥石の変形、破壊
を防止できる精密研磨用砥石を提供することを目的とす
る。The present invention has been made to solve the above problems, and by using synthetic fibers as a component of the grindstone, it is possible to prevent the sliding phenomenon at the polishing interface between the grindstone and the material to be polished, It is an object of the present invention to provide a precision polishing whetstone that can suppress excessive adsorption phenomena and prevent deformation and destruction of the whetstone.
（問題点を解決するための手段）
本発明の精密研磨用砥石は、合成樹脂を結合剤とする精
密研磨用砥石において、１，５〜１０体積％の合成繊維
を配合したことを特徴とするものである。(Means for Solving the Problems) The precision polishing whetstone of the present invention is characterized in that it contains 1.5 to 10% by volume of synthetic fibers in a precision polishing whetstone that uses synthetic resin as a binder. It is something.
砥石を構成する砥粒としては、研磨性を有する粒子なら
ば特に制限なく用いることができる。例えば、ダイヤモ
ンド、コランダム、エメリ、珪石、溶融アルミナ、炭化
ケイ素、炭化ホウ素、酸化鉄、焼成アルミナ、酸化クロ
ム、酸化ジルコニウム、酸化セリウム、酸化スズ、酸化
チタン、炭酸カルシウム、シリカ等を用いることができ
る。砥粒の粒径は、１０μｍ以下の微粒が好ましい。但
し、砥粒の粒径の選択は、基本的には要求される被研磨
材の仕上がり面粗さに依存する。As the abrasive grains constituting the whetstone, any particles having abrasive properties can be used without particular limitation. For example, diamond, corundum, emery, silica, fused alumina, silicon carbide, boron carbide, iron oxide, calcined alumina, chromium oxide, zirconium oxide, cerium oxide, tin oxide, titanium oxide, calcium carbonate, silica, etc. can be used. . The grain size of the abrasive grains is preferably fine grains of 10 μm or less. However, the selection of the grain size of the abrasive grains basically depends on the required finished surface roughness of the material to be polished.
合成樹脂としては、粘着性を有するものを用いる。例え
ば、フェノール樹脂、エポキシ樹脂、アクリル樹脂、イ
ミド系樹脂、キシレン樹脂、メラミン樹脂、ジアリルフ
タレート樹脂、石油樹脂等を用いることができる。As the synthetic resin, one having adhesive properties is used. For example, phenol resin, epoxy resin, acrylic resin, imide resin, xylene resin, melamine resin, diallyl phthalate resin, petroleum resin, etc. can be used.
合成繊維としては、太さ１〜３デニール、繊維長０．５
〜ｌｌｌ１１１のナイロン系短繊維が好ましく用いられ
る。As a synthetic fiber, the thickness is 1 to 3 denier and the fiber length is 0.5
~1111 nylon short fibers are preferably used.
（作用）
本発明の砥石は、合成繊維、例えばナイロン系短繊維を
構成要素としている。このナイロン系短繊維は、耐熱性
、耐水性等の性質を具備しているので、研磨中は常に安
定した状態を維持している。(Function) The grindstone of the present invention uses synthetic fibers, for example, nylon short fibers as a constituent element. Since the nylon short fibers have properties such as heat resistance and water resistance, they always maintain a stable state during polishing.
繊維が配された砥石面には、配合割合により異なるが、
繊維の太さと長さに相当した突出量と高さとを有する繊
維からなる極微中の凸部が形成される。この極微中の凸
部により、砥石の回転数を比較的速くした場合に発生す
る研磨界面での液膜によるすべり現象は防止される。ま
た砥石の回転数が比較的低速の場合に発生する吸着現象
も、砥石面の繊維からなる極微中の凸部により抑制され
る。The grinding wheel surface on which the fibers are arranged varies depending on the blending ratio, but
Microscopic convex portions made of fibers are formed with a protrusion amount and height corresponding to the thickness and length of the fibers. These microscopic convex portions prevent the sliding phenomenon caused by the liquid film at the polishing interface that occurs when the rotation speed of the grindstone is relatively high. In addition, the adsorption phenomenon that occurs when the rotational speed of the grindstone is relatively low is also suppressed by the microscopic convex portions made of fibers on the surface of the grindstone.
なお、砥石中に占める繊維の体積％が大きいほど、すべ
りや吸着の現象が抑制される効果は増大するが、１０体
積％を超えると研磨能率と共に、研磨面精度も悪くなる
ので好ましくない。好ましくは、１．５〜１０体積％の
範囲である。It should be noted that the greater the volume percentage of fibers in the grindstone, the greater the effect of suppressing slipping and adsorption phenomena, but if it exceeds 10 volume%, polishing efficiency and precision of the polished surface will deteriorate, which is not preferable. Preferably, it is in the range of 1.5 to 10% by volume.
（発明の効果）
本発明の精密研磨用砥石によれば、合成繊維を１．５〜
１０体積％の割合で構成要素としたので、砥石と被研磨
材どの研磨界面でのすべり現象を防止でき、また過度の
吸着現象を抑制でき、砥石の変形、破壊を防止できる。(Effect of the invention) According to the precision polishing whetstone of the present invention, synthetic fibers can be
Since it is used as a component at a ratio of 10% by volume, it is possible to prevent a sliding phenomenon at the polishing interface between the grinding wheel and the material to be polished, as well as suppressing an excessive adsorption phenomenon, thereby preventing deformation and destruction of the grinding wheel.
（実施例）
実施例１
平均粒径１．２μｍの酸化第二スズの砥粒１００重量部
と、粉末状フェノール樹脂１０重量部と、太さ１．５デ
ニール、繊維長１龍のナイロン繊維３重量部とを混合機
により混合した。次に、温度１８０℃、加圧力２００ｋ
ｇ／ｃシでホットプレス成形して、直径２００＋ａｍ、
内径７０關、厚み１２１ＩＩ１１で、嵩密度２．８の円
板状の精密研磨用砥石を得た。得られた円板状の精密研
磨用砥石中のナイロン繊維の割合は、６，４体積２６で
あった。(Example) Example 1 100 parts by weight of stannic oxide abrasive grains with an average particle size of 1.2 μm, 10 parts by weight of powdered phenolic resin, and 3 nylon fibers with a thickness of 1.5 denier and a fiber length of 1 dragon. parts by weight were mixed using a mixer. Next, the temperature was 180℃ and the pressure was 200k.
Hot press molded with g/c, diameter 200+am,
A disc-shaped precision polishing whetstone with an inner diameter of 70mm, a thickness of 121II11, and a bulk density of 2.8 was obtained. The ratio of nylon fibers in the obtained disc-shaped precision polishing grindstone was 6.4 volume: 26.
この砥石を基盤に張り付け、竪軸平面研磨機により、研
磨液に水を用いて、大理石の研磨試験を行った。研磨試
験条件としては、大理石を固定し。This whetstone was attached to a base, and a marble polishing test was conducted using a vertical plane polisher using water as the polishing liquid. As for the polishing test conditions, the marble was fixed.
砥石回転数を７２０ｒｐｗ ｓ ３６０ｒｐｍとした。The rotational speed of the grinding wheel was 720 rpm and 360 rpm.
第１表に研磨性能を示す。なお、比較のためにナイロン
繊維を混合しない従来品砥石の研磨性能も示した。Table 1 shows the polishing performance. For comparison, the polishing performance of a conventional grindstone that does not contain nylon fibers is also shown.
７２０ｒｐｍ 、３−６０ｒｐｍとも１こ、すべり現象
も吸着現象もなく、従って良好な研磨状態を持続した。At both 720 rpm and 3-60 rpm, there was no slipping or adsorption phenomenon, and therefore a good polishing state was maintained.
しかし、従来品においては、７２０ｒｐｍで１虚、すべ
り現象が発生し、研磨作用１よ殆んどな力１つた。However, in the conventional product, a slip phenomenon occurred at 720 rpm, and the polishing force was almost 1.
３６０ ｒｐ■では吸着現象が発生し、研磨能力（よ高
いものの、砥石の異常摩耗、及び砥石の一部破壊が生じ
た。At 360 rp■, an adsorption phenomenon occurred, and although the polishing ability was higher, abnormal wear of the grinding wheel and partial destruction of the grinding wheel occurred.
実施例２
平均粒径１．３５μｍの酸化セ１ノウムの砥粒１００重
量部に、イミド系粉末樹脂７重量部をメチルエチルケト
ン８重量部に溶解させたものを加え、更に太さ１．５デ
ニール、繊維長０．５ｍｍのナイロン繊維１．２重量部
を加えて混合機により均一に混合した。次に、混合物を
６０〜８０℃で乾燥してメチルエチルケトンを蒸発させ
、温度２００℃、加圧力５００ｋｇ／ｃｊで、ホットプ
レス成形して、直径１２５ｍｍ、内径４０龍、厚み１５
＋ａｍで、嵩密度３．１の精密研磨用砥石を得た。得ら
れた円板状の精密研磨用砥石中のナイロン繊維の割合は
、３．０体積％であった。Example 2 To 100 parts by weight of cerium oxide abrasive grains having an average particle size of 1.35 μm, 7 parts by weight of imide-based powder resin dissolved in 8 parts by weight of methyl ethyl ketone was added. 1.2 parts by weight of nylon fibers with a fiber length of 0.5 mm were added and mixed uniformly using a mixer. Next, the mixture was dried at 60 to 80°C to evaporate methyl ethyl ketone, and hot press molded at a temperature of 200°C and a pressure of 500 kg/cj to a diameter of 125 mm, an inner diameter of 40 mm, and a thickness of 15 mm.
+am, a precision polishing whetstone with a bulk density of 3.1 was obtained. The proportion of nylon fibers in the obtained disc-shaped precision polishing grindstone was 3.0% by volume.
この砥石を基盤に張り付け、竪軸平面研磨機により、研
磨液に水を用いて、ガラス板の研磨試験を行った。研磨
試験条件としては、ガラス板を固定し、砥石回転数を３
６０ｒｐｍ 、１８０ｒｐｍとした。第２表に研磨性能
を示す。なお、比較のためにナイロン繊維を混合しない
従来品砥石の研磨性能も示した。This grindstone was attached to a base, and a glass plate polishing test was conducted using a vertical plane polisher using water as the polishing liquid. As for the polishing test conditions, the glass plate was fixed and the number of rotations of the grinding wheel was 3.
The speeds were 60 rpm and 180 rpm. Table 2 shows the polishing performance. For comparison, the polishing performance of a conventional grindstone that does not contain nylon fibers is also shown.
〔第２表〕
第２表かられかるように、実施例２においては、３６０
ｒｐｍ 、 １８０ ｒｐｉ＋ともに、すべり現象も
吸着現象もなく、従って良好な研磨状態を持続した。[Table 2] As seen from Table 2, in Example 2, 360
At both rpm and 180 rpi+, there was no slippage or adsorption phenomenon, and therefore a good polishing state was maintained.
しかし、従来品においては、３６０ｒｐｍでは、すべり
現象が発生し、研磨作用は殆んどなかった。However, in the conventional product, a sliding phenomenon occurred at 360 rpm, and there was almost no polishing effect.
１８０ ｒｐｍでは、吸着現象が発生し、過度の研磨抵
抗による砥石の異常摩耗、及び砥石の一部破壊によりガ
ラス板にＩＲ傷を与えた。At 180 rpm, an adsorption phenomenon occurred, causing abnormal wear of the grindstone due to excessive polishing resistance, and partial destruction of the grindstone, which caused IR scratches on the glass plate.
実施例３
緑色炭化ケイ素（ＧＣ）＃３０００の砥粒１００重量部
と、粉末状ジアリルフタレート樹Ｊｌｌｉ１４重量部と
、反応開始剤を加えたジアリルフタレート樹脂モノマー
５重量部と、太さ２．０デニール、繊維長１璽ｌのナイ
ロン繊維４重量部とを混合機により混合した。次に、混
合物を温度１７０℃、加圧力２００ｋｇ／ｃｄでホット
プレス成形して、直径１２５ｍ、内径４０■１、厚み１
５ｍで、嵩密度１゜６の精密研磨用砥石を得た。得られ
た円板状の精密研磨用砥石中のナイロン繊維の割合は、
４．５体積％であった。Example 3 100 parts by weight of green silicon carbide (GC) #3000 abrasive grains, 14 parts by weight of powdered diallyl phthalate tree Jlli, 5 parts by weight of diallyl phthalate resin monomer added with a reaction initiator, and 2.0 denier in thickness. , and 4 parts by weight of nylon fibers having a fiber length of 1 liter were mixed in a mixer. Next, the mixture was hot press-molded at a temperature of 170°C and a pressure of 200 kg/cd, with a diameter of 125 m, an inner diameter of 40 cm, and a thickness of 1.
A precision polishing whetstone with a length of 5 m and a bulk density of 1°6 was obtained. The proportion of nylon fibers in the obtained disc-shaped precision polishing whetstone is:
It was 4.5% by volume.
この砥石を基盤に張り付け、竪軸平面研磨機により、研
磨液に水を用いて、セラミックスタイル板の研磨試験を
行った。研磨試験条件としては、セラミックスタイル板
を固定し、砥石回転数を７２０ｒｐ廊、３６０ ｒｐ＋
ｉとした。第３表に研磨性能を示す。なお、比較のため
にナイロン繊維を混合しない従来品砥石の研磨性能も示
した。This whetstone was attached to a base, and a ceramic style plate polishing test was conducted using a vertical plane polisher using water as the polishing liquid. As for the polishing test conditions, the ceramic style plate was fixed, and the whetstone rotation speed was 720 rpm, 360 rp+
It was set as i. Table 3 shows the polishing performance. For comparison, the polishing performance of a conventional grindstone that does not contain nylon fibers is also shown.
〔第３表〕
第３表かられかるように、実施例３においては、７２０
ｒｐｍ 、３６０ ｒｐ−とも１こ、すべり現象も吸
着現象もなく、従って良好な研磨状態を持続した。[Table 3] As seen from Table 3, in Example 3, 720
rpm and 360 rp-, there was no slipping or adsorption phenomenon, and therefore a good polishing state was maintained.
しかし、従来品においては、７２０ｒｐｍ、３６０ｒｐ
ｌにおいて、ともにすべり現象が発生し、従って研磨作
用は殆んどなかった。However, in the conventional product, 720 rpm, 360 rpm
In both cases, a sliding phenomenon occurred, and therefore there was almost no polishing effect.
特許出願人 三和研磨工業株式会社Patent applicant: Sanwa Polishing Industry Co., Ltd.
Claims (1)
５〜１０体積％の合成繊維を配合したことを特徴とする
精密研磨用砥石。In a precision polishing whetstone using synthetic resin as a binder, 1.
A precision polishing whetstone characterized by containing 5 to 10% by volume of synthetic fiber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2121452A JP3011431B2 (en) | 1990-05-11 | 1990-05-11 | Whetstone for precision polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2121452A JP3011431B2 (en) | 1990-05-11 | 1990-05-11 | Whetstone for precision polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0419072A true JPH0419072A (en) | 1992-01-23 |
| JP3011431B2 JP3011431B2 (en) | 2000-02-21 |
Family
ID=14811486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2121452A Expired - Lifetime JP3011431B2 (en) | 1990-05-11 | 1990-05-11 | Whetstone for precision polishing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3011431B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6948581B2 (en) | 2002-02-22 | 2005-09-27 | Bombardier Recreational Products Inc | Three-wheel vehicle and concentric intermediate sprocket assembly therefor |
| US7003152B1 (en) | 1999-01-20 | 2006-02-21 | Konica Minolta Business Technologies, Inc. | Image processing apparatus |
| US8066937B2 (en) * | 2003-10-02 | 2011-11-29 | Nano Materials International Corporation | Method for making high thermal conductivity metal matrix composite |
| CN102922434A (en) * | 2012-10-09 | 2013-02-13 | 江苏耐锐特磨料磨具有限公司 | Composition and proportion of 100 meters/second high-temperature, hot-pressing and high-efficiency grinding wheel polishing abrasive material of die steel slab |
| CN103551972A (en) * | 2013-10-25 | 2014-02-05 | 沈阳一蒙砂轮有限公司 | Nuclear turbine special grinding wheel and manufacturing method thereof |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012002105A1 (en) * | 2012-02-06 | 2013-08-08 | Egon Evertz Kg (Gmbh & Co.) | Grinding wheel, in particular for longitudinal or transverse grinding |
-
1990
- 1990-05-11 JP JP2121452A patent/JP3011431B2/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7003152B1 (en) | 1999-01-20 | 2006-02-21 | Konica Minolta Business Technologies, Inc. | Image processing apparatus |
| US7206446B2 (en) | 1999-01-20 | 2007-04-17 | Minolta Co., Ltd. | Image processing apparatus |
| US6948581B2 (en) | 2002-02-22 | 2005-09-27 | Bombardier Recreational Products Inc | Three-wheel vehicle and concentric intermediate sprocket assembly therefor |
| US8066937B2 (en) * | 2003-10-02 | 2011-11-29 | Nano Materials International Corporation | Method for making high thermal conductivity metal matrix composite |
| US8673453B2 (en) | 2003-10-02 | 2014-03-18 | Nano Materials International Corporation | High thermal conductivity metal matrix composites |
| CN102922434A (en) * | 2012-10-09 | 2013-02-13 | 江苏耐锐特磨料磨具有限公司 | Composition and proportion of 100 meters/second high-temperature, hot-pressing and high-efficiency grinding wheel polishing abrasive material of die steel slab |
| CN103551972A (en) * | 2013-10-25 | 2014-02-05 | 沈阳一蒙砂轮有限公司 | Nuclear turbine special grinding wheel and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3011431B2 (en) | 2000-02-21 |
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