JPH04168439A - Sensitive material processing device - Google Patents
Sensitive material processing deviceInfo
- Publication number
- JPH04168439A JPH04168439A JP29621890A JP29621890A JPH04168439A JP H04168439 A JPH04168439 A JP H04168439A JP 29621890 A JP29621890 A JP 29621890A JP 29621890 A JP29621890 A JP 29621890A JP H04168439 A JPH04168439 A JP H04168439A
- Authority
- JP
- Japan
- Prior art keywords
- processing
- photosensitive material
- liquid
- processing solution
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 111
- 239000007788 liquid Substances 0.000 claims abstract description 99
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 49
- 239000003795 chemical substances by application Substances 0.000 claims description 33
- 239000000839 emulsion Substances 0.000 abstract description 32
- 238000006243 chemical reaction Methods 0.000 abstract description 12
- 108010010803 Gelatin Proteins 0.000 abstract description 8
- 229920000159 gelatin Polymers 0.000 abstract description 8
- 239000008273 gelatin Substances 0.000 abstract description 8
- 235000019322 gelatine Nutrition 0.000 abstract description 8
- 235000011852 gelatine desserts Nutrition 0.000 abstract description 8
- 238000007598 dipping method Methods 0.000 abstract description 4
- 230000002250 progressing effect Effects 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- -1 silver halide Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は、ハロゲン化銀写真感光材料の処理ムラを防
止する感光材料処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photosensitive material processing apparatus that prevents uneven processing of silver halide photographic light-sensitive materials.
［従来の技術］
ハロゲン化銀写真感光材料を現像処理する従来の感光材
料処理装置は、例えば多数の搬送ローラにより形成され
た搬送路を有し、この搬送路に沿って現像液槽、定着液
槽、水洗液槽等が配設されている。[Prior Art] A conventional photosensitive material processing apparatus for developing a silver halide photographic light-sensitive material has a conveyance path formed by, for example, a large number of conveyance rollers, and a developer tank, a fixer solution, etc. are routed along this conveyance path. Tanks, washing liquid tanks, etc. are installed.
これらの各処理液種には温度調節された所定量の処理液
が貯溜されており、順次これらの処理液に感光材料を所
定時間浸漬させて現像処理を行なっていた。A predetermined amount of temperature-controlled processing liquid is stored in each of these processing liquid types, and a photosensitive material is sequentially immersed in these processing liquids for a predetermined period of time to perform development processing.
この現像処理に用いる処理液は各種処理剤を熔解した水
溶液であり、この処理液が感光材料の乳剤層に接触する
と、先ず処理液が乳剤層を形成しているゼラチンを鷹潤
させる。このゼラチンが膨潤した状態で処理剤による化
学反応が進行し始めハロゲン化銀の還元反応が行なわれ
る。これにより潜像であった画像露光部に金属銀ができ
て顕像化される。The processing liquid used in this development process is an aqueous solution in which various processing agents are dissolved, and when this processing liquid comes into contact with the emulsion layer of the light-sensitive material, it first moistens the gelatin forming the emulsion layer. In a state where this gelatin is swollen, a chemical reaction by the processing agent begins to proceed, and a reduction reaction of silver halide is performed. As a result, metallic silver is formed in the exposed area of the image, which was a latent image, and becomes a visible image.
カラー感光材料の場合は更にこの銀が作用して発色し、
カラー画像を形成する。次に、漂白処理、定着処理を行
なって不要な銀を取り除き、っいで、水洗処理及び安定
化処理を行なって乳剤層に残る処理剤成分や汚れを除去
し、画像を安定化してその後の保存で変化しないように
している。In the case of color photosensitive materials, this silver acts further to develop color,
Form a color image. Next, bleaching and fixing are performed to remove unnecessary silver, and then washing and stabilization are performed to remove processing agent components and stains remaining in the emulsion layer, and the image is stabilized for subsequent storage. I'm trying to keep it from changing.
従って、従来の感光材料処理装置で現像処理を行なうに
は、感光材料に十分な処理液を供給してゼラチンを十分
に膨潤させ、現像処理に要する時間内は乳剤層の湿潤状
態を保ち続けなければならなかった。Therefore, in order to perform development processing using conventional photosensitive material processing equipment, it is necessary to supply sufficient processing liquid to the photosensitive material to sufficiently swell the gelatin, and to maintain the wet state of the emulsion layer during the time required for development processing. I had to.
［発明か解決しようとする課題］
ところ力釈処理液に浸漬して処理する従来の感光材料処
理装置では、使用中に感光材料が持ち込む汚れや使用済
みの処理液が混入することで処理液の性能が劣化すると
いう欠点を有していた。[Problems to be Solved by the Invention] However, in conventional photosensitive material processing equipment that processes by immersing it in a force-wash processing solution, the processing solution may deteriorate due to dirt carried by the photosensitive material or mixed with used processing solution during use. This had the disadvantage that performance deteriorated.
又、使用中の処理液の劣化の度合は判定が難しいので定
期的にチエツクする必要があり、又処理液槽内の清掃も
定期的に行なわねばならず、メンテナンスか大変であっ
た。Further, since it is difficult to determine the degree of deterioration of the processing liquid during use, it is necessary to check it periodically, and the inside of the processing liquid tank must be cleaned periodically, making maintenance difficult.
従来の感光材料処理装置が有する上記の欠点を解消し、
請求項】又は２記載の発明は、処理液内に汚れか搬入す
ることを防止し、又未使用処理液内に使用済みの処理液
が混入することによる処理性能の劣化を防止し、メンテ
ナンスの軽減化を図ることを目的としている。更に、過
剰な処理液を供給しなくとも必要な水分を補給して処理
液の乾燥濃縮化による処理ムラを防ぐことも目的として
いる。Eliminates the above drawbacks of conventional photosensitive material processing equipment,
[Claim] Or the invention described in (2) prevents dirt from being carried into the processing solution, prevents deterioration of processing performance due to mixing of used processing solution into unused processing solution, and reduces maintenance costs. The purpose is to reduce the A further object is to replenish necessary moisture without supplying an excessive amount of processing liquid, thereby preventing uneven processing due to drying and concentration of the processing liquid.
又、請求項２記載の発明は、さらに感光材料に処理剤を
塗布してから水分を供給して反応処理することで、常に
処理剤熔融の初期状態を確保することを目的としている
。Further, the invention as claimed in claim 2 aims to always ensure the initial state of melting of the processing agent by applying the processing agent to the photosensitive material and then supplying moisture to carry out the reaction treatment.
［課題を解決するための手段］
前記課題を解決するため、請求項１記載の発明の感光材
料処理装置は、感光材料を処理液に浸漬せずに搬送路に
沿って搬送しながら、所定量の前記処理液を前記感光材
料に供給する処理液供給手段と、この処理液が供給され
た前記感光材料に水または水蒸気を供給する水分供給手
段とを有することを特徴としている。[Means for Solving the Problems] In order to solve the above problems, the photosensitive material processing apparatus of the invention according to claim 1 provides a method for processing a photosensitive material by a predetermined amount while transporting the photosensitive material along a transport path without immersing it in a processing liquid. The present invention is characterized by comprising a processing liquid supply means for supplying the processing liquid to the photosensitive material, and a moisture supply means for supplying water or water vapor to the photosensitive material to which the processing liquid has been supplied.
又、請求項２記載の発明の感光材料処理装置は、感光材
料を搬送路に沿って搬送しながら、所定量の処理剤を前
記感光材料に塗布する処理剤塗布手段と、この処理剤が
塗布された前記感光材料に水または水蒸気を供給する水
分供給手段とを有することを特徴としている。The photosensitive material processing apparatus according to the second aspect of the invention further includes a processing agent applying means for applying a predetermined amount of a processing agent to the photosensitive material while conveying the photosensitive material along a conveyance path; The photosensitive material is characterized by comprising a moisture supply means for supplying water or water vapor to the photosensitive material.
［作用］
この請求項１記載の発明の感光材１４幻埋装置は、感光
材料を処理液に浸漬せずに搬送路に沿って搬送しながら
、所定量の処理液を感光材料に供給し、これで感光材料
の処理か開始されるが、この処理液が供給された感光材
料に水または水蒸気を供給することで、感光材料の乳剤
層の湿潤状態を一定に保ち、処理ムラがなく処理性能か
向上する。[Function] The photosensitive material 14 phantom embedding device of the invention according to claim 1 supplies a predetermined amount of processing liquid to the photosensitive material while transporting the photosensitive material along the transport path without immersing the photosensitive material in the processing liquid, Processing of the photosensitive material now begins, but by supplying water or steam to the photosensitive material supplied with this processing liquid, the wet state of the emulsion layer of the photosensitive material is kept constant, ensuring even processing and improved processing performance. or improve.
又、請求項２記載の発明の感光材料処理装置は、感光材
料を搬送路に沿って搬送しながら、所定量の処理剤を感
光材料に！！！布する。この処理剤が塗布された感光材
料に水または水蒸気を供給することで、処理剤が熔解し
て感光材料の処理が行なわれ、しかも感光材料の乳剤層
の湿潤状態を一定に保ち、処理ムラがなく処理性能が向
上する。Further, the photosensitive material processing apparatus according to the second aspect of the invention applies a predetermined amount of processing agent to the photosensitive material while conveying the photosensitive material along the conveying path! ! ! to clothe By supplying water or steam to the photosensitive material coated with this processing agent, the processing agent is melted and the photosensitive material is processed. Moreover, the wet state of the emulsion layer of the photosensitive material is maintained constant, and processing unevenness is prevented. processing performance is improved.
ここで、処理剤は固体、粉体、液体でもよく、固体の場
合には例えばクレヨン等のようにして感光材料に塗り付
けることで、粉体の場合には散布することで、液体の場
合には接触させることで塗布することができる。Here, the processing agent may be solid, powder, or liquid. In the case of a solid, it can be applied to the photosensitive material using a crayon, for example, in the case of a powder, it can be sprinkled, and in the case of a liquid, it can be applied to a photosensitive material. It can be applied by contact.
Ｅ実施仔Ｃ
以下、この発明の実施例を添付図面に基づいて詳細に説
明する。Embodiment C Hereinafter, embodiments of the present invention will be described in detail based on the accompanying drawings.
第１図は請求項１記載の発明の感光材料処理装置の現像
処理部の概略図である。FIG. 1 is a schematic diagram of a development processing section of a photosensitive material processing apparatus according to the first aspect of the invention.
感光材料処理装置の現像処理部１には人口ローラ２、搬
送ローラ３、絞りローラ４がそれぞれ配置され、これら
で感光材！！ＩＦ（７）搬送路５を形成している。感光
材料Ｆは入口ローラ２に挿入され、搬送路５に配置され
た搬送ガイド板６上を搬送される。このｆｊｌｊＭガイ
ド板６の上方には処理液供給手段７が配設され、搬送さ
れる感光材料１の乳剤層Ｆａに処理液８を供給する。In the development processing section 1 of the photosensitive material processing apparatus, a synthetic roller 2, a conveying roller 3, and an aperture roller 4 are arranged, and these are used to process the photosensitive material! ! An IF (7) conveyance path 5 is formed. The photosensitive material F is inserted into the entrance roller 2 and is conveyed on a conveyance guide plate 6 disposed on a conveyance path 5 . A processing liquid supply means 7 is disposed above the fjljM guide plate 6, and supplies a processing liquid 8 to the emulsion layer Fa of the photosensitive material 1 being transported.
処理液８が供給された感光材料Ｆの乳剤層Ｆａのゼラチ
ンは処理液８を吸収して膨潤する。この膨潤した感光材
料Ｆを搬送ローラ３により搬送ガイド板３６に沿フて絞
りローラ４に送る。The gelatin in the emulsion layer Fa of the photosensitive material F to which the processing liquid 8 has been supplied absorbs the processing liquid 8 and swells. The swollen photosensitive material F is conveyed by the conveyance roller 3 along the conveyance guide plate 36 to the squeezing roller 4.
この搬送ローラ３と絞りローラ４の間には搬送ガイド板
３６の上方に水分供給手段９が配設されており、水１０
を感光材料Ｆの乳剤層Ｆａに供給する。これによって、
感光材料Ｆの乳剤層Ｆａは絞りローラ４に到達するまで
は湿潤状態を保ち、この乳剤層Ｆａ上で生ずる化学反応
を終了させる。A moisture supply means 9 is disposed above the conveyance guide plate 36 between the conveyance roller 3 and the squeezing roller 4, and water 10 is provided between the conveyance roller 3 and the squeezing roller 4.
is supplied to the emulsion layer Fa of the photosensitive material F. by this,
The emulsion layer Fa of the photosensitive material F remains wet until it reaches the squeeze roller 4, and the chemical reaction occurring on the emulsion layer Fa is completed.
従って、処理液８が供給される位置Ａから絞りローラ４
の位置Ｂまでの距１ＩＩＤは、処理に必要な時間がとれ
るように搬送速度を考慮して決定する。Therefore, from the position A where the processing liquid 8 is supplied to the squeezing roller 4
The distance 1IID to position B is determined in consideration of the transport speed so that the time necessary for processing can be taken.
次に、処理液供給手段７の構成及び動作を説明する。Next, the configuration and operation of the processing liquid supply means 7 will be explained.
この処理液供給手段７は温度調節された処理液８を貯溜
している処理液タンク１１と、これに接続する配管１２
及びポンプ１３と、このポンプ１３て圧送される処理液
８を感光材料Ｆに供給する液供給部１４から構成されて
いる。The processing liquid supply means 7 includes a processing liquid tank 11 storing a temperature-controlled processing liquid 8, and a pipe 12 connected to the processing liquid tank 11.
, a pump 13, and a liquid supply section 14 that supplies the processing liquid 8 pumped by the pump 13 to the photosensitive material F.
このン夜供給部１４は、感光材料Ｆの幅に等しいか又は
それ以上の長さを有し搬送路５に直交して配設される外
管１５と、この外管１５内に配置される液溜１６からな
る。液溜１６は配管１２に接続しており、圧送される処
理液８を一旦その中に貯留する。貯溜された処理液８は
液溜１６に設けられたオーバーフロー開口部＋６ａから
外管１５内に流出する。外管１５の底面１５ａには液滴
下孔１５ｂが感光材料Ｆの幅全面にわたり均等に処理液
８を供給できるように複数穿設されている。The night supply unit 14 includes an outer tube 15 having a length equal to or longer than the width of the photosensitive material F and disposed perpendicular to the conveyance path 5, and an outer tube 15 disposed within the outer tube 15. It consists of a liquid reservoir 16. The liquid reservoir 16 is connected to the pipe 12, and temporarily stores the processing liquid 8 to be pumped therein. The stored processing liquid 8 flows into the outer tube 15 from an overflow opening +6a provided in the liquid reservoir 16. A plurality of liquid dropping holes 15b are formed in the bottom surface 15a of the outer tube 15 so that the processing liquid 8 can be uniformly supplied over the entire width of the photosensitive material F.
この液供給部１４から滴下する処理液８の量は感光材料
Ｆの処理に必要十分な量であり、望ましくは必要最小限
の量である。この滴下した処理液８は使い切りとし、余
剰の処理液８かでる場合には搬送ガイド板６の下部に設
けた液受１７で受けて、廃液タンク１８に廃棄する。The amount of the processing liquid 8 dripped from the liquid supply section 14 is a necessary and sufficient amount for processing the photosensitive material F, and is preferably the minimum necessary amount. This dropped processing liquid 8 is used up, and if excess processing liquid 8 is discharged, it is received by a liquid receiver 17 provided at the lower part of the conveyance guide plate 6 and disposed of in a waste liquid tank 18.
滴下した処理液８は感光材料Ｆの乳剤層Ｆａを構成する
ゼラチン内に侵入する。このゼラチンは処理液８を吸収
して膨潤し、処理液８に含まれる処理剤が引き起こす化
学反応の準備をする。The dropped processing liquid 8 penetrates into the gelatin constituting the emulsion layer Fa of the photosensitive material F. This gelatin absorbs the processing liquid 8, swells, and prepares for the chemical reaction caused by the processing agent contained in the processing liquid 8.
その後、感光材料Ｆは化学反応を進行させながら搬送ロ
ーラ３により搬送され、水分供給手段９の下部に送られ
る。Thereafter, the photosensitive material F is conveyed by the conveyance roller 3 while a chemical reaction is progressing, and is sent to the lower part of the moisture supply means 9.
この水分供給手段９は温調された水１０を貯溜している
水タンク２１と、これに接続する配管２２及びポンプ２
３と、このポンプ２３で圧送される水１０を感光材料Ｆ
に供給する水供給部１９とからなる。This water supply means 9 includes a water tank 21 storing temperature-controlled water 10, piping 22 connected to the water tank 21, and a pump 2.
3, and the water 10 pumped by this pump 23 is transferred to the photosensitive material F.
and a water supply section 19 that supplies water to the water supply section 19.
この水供給部１９は、搬送路５に直交して配設される感
光材料Ｆの幅に略等しいか又はそれ以上の長さを有する
管材２０で形成されており、搬送路５に対向する部分に
は複数の噴射孔２０ａが穿設されている。この管材２０
に圧送された水１０は噴射孔２０ａから感光材料Ｆの乳
剤層Ｆａの全面にわたって均一に噴射して供給される。This water supply section 19 is formed of a tube material 20 having a length that is approximately equal to or longer than the width of the photosensitive material F disposed perpendicularly to the conveyance path 5, and has a portion facing the conveyance path 5. A plurality of injection holes 20a are bored in the hole. This pipe material 20
The water 10 that has been force-fed is uniformly sprayed and supplied over the entire surface of the emulsion layer Fa of the photosensitive material F from the spray holes 20a.
この水１０の噴射により感光材料Ｆの乳剤層Ｆａは化学
反応完了までに必要な水分の補給を受けるとともに、不
要な反応生成物を洗い流す。By spraying this water 10, the emulsion layer Fa of the photosensitive material F is supplied with water necessary for the completion of the chemical reaction, and unnecessary reaction products are washed away.
噴射洗浄された水１０は搬送ガイド板３６の下部に設け
た液受２７で受けて、廃液タンク２８に廃棄する。The sprayed and washed water 10 is received by a liquid receiver 27 provided at the lower part of the conveyance guide plate 36 and is disposed of in a waste liquid tank 28.
なお、この実施例では水分供給手段９から水１０を噴射
したが、これに限定されるものではなく、水分補給及び
水洗機能が果たせればｎ状の微細な水滴又は水蒸気でも
よい。In this embodiment, the water 10 is injected from the water supply means 9, but the invention is not limited to this, and fine water droplets or water vapor in an n-shape may be used as long as the water replenishment and water washing functions can be achieved.
又、上述した化学反応が完了するまでに要する時間には
反応温度も大きく影響するため、最適な温度を設定維持
するために処理液８及び水タンク２１内の水１０の温度
を温調するほか、搬送ローラ３や搬送ガイド板６．３６
も適宜温調する。In addition, since the reaction temperature greatly affects the time required for the above-mentioned chemical reaction to complete, the temperature of the processing liquid 8 and the water 10 in the water tank 21 must be adjusted in order to set and maintain the optimum temperature. , conveyance roller 3 and conveyance guide plate 6.36
Adjust the temperature accordingly.
又、雰囲気温調でもよい。Alternatively, the atmospheric temperature may be controlled.
次に、塗布ローラを用いて処理液を塗布する別の実施例
を第２図に基づき説明する。Next, another embodiment in which a treatment liquid is applied using an application roller will be described with reference to FIG.
第２図は塗布ローラを用いる現像処理部の側面図を示す
。FIG. 2 shows a side view of a development processing section using a coating roller.
この現像処理部１０】には入口ローラ１０２、搬送ロー
ラ１０３、絞りローラ１０４がそれぞれ配置されて、感
光材！Ｉ４Ｆの搬送路１０５を形成している。感光材料
Ｆは入口ローラ１０２に挿入され、搬送路１０５上に配
置される塗布ローラ２４と押えローラ２５との間に挿入
される。この塗布ローラ２４の下部は、浸漬バット２９
内に収容される処理液１０８に浸漬する浸漬ローラ３０
に接触している。これら一連のローラ２４．３０が感光
材料Ｆの搬送に合わせて回転し、挿入される感光材料Ｆ
の乳剤層Ｆａ１．：処理液１０８を塗布する。In this development processing section 10, an entrance roller 102, a conveyance roller 103, and a squeeze roller 104 are arranged. A transport path 105 of I4F is formed. The photosensitive material F is inserted into the entrance roller 102 and between the application roller 24 and the presser roller 25 arranged on the conveyance path 105 . The lower part of this application roller 24 is connected to a dipping vat 29.
A dipping roller 30 immersed in the processing liquid 108 contained therein.
is in contact with. These series of rollers 24 and 30 rotate as the photosensitive material F is conveyed, and the photosensitive material F to be inserted is
The emulsion layer Fa1. : Applying the treatment liquid 108.
処理液１０８が塗布され膨潤した感光材料Ｆは、搬送ロ
ーラ】０３と絞りローラ１０４との間に配設される水分
供給手段１０９により、水１１０をその乳剤層Ｆａに供
給する。これにより乳剤層Ｆａは絞りローラ１０４に到
達するまでは湿潤状態を保ち、この乳剤層Ｆａ上で生ず
る化学反応を終了させる。The swollen photosensitive material F coated with the processing liquid 108 is supplied with water 110 to its emulsion layer Fa by a moisture supply means 109 disposed between the transport roller 03 and the squeezing roller 104. As a result, the emulsion layer Fa remains wet until it reaches the squeezing roller 104, and the chemical reaction occurring on the emulsion layer Fa is completed.
次に、塗布ローラ２４への処理液１０８の供給動作を説
明する。浸漬バット２９の処理液１０８は、処理液タン
ク１１１と、これに接続する配管】１２及びポンプ１１
３により常時一定量に供給されている。浸漬ローラ３０
及び塗布ローラ２４は搬送路１０５に直交して配設され
、感光材料Ｆの幅に等しいか又はそれ以上の長さを有し
ている。塗布ローラ２４を介して乳剤層Ｆａに塗布され
る処理液１０８の量は感光材料Ｆの処理に必要十分な量
であり、望ましくは必要最小限の量である。Next, the operation of supplying the processing liquid 108 to the application roller 24 will be explained. The processing liquid 108 in the immersion vat 29 is supplied to a processing liquid tank 111, piping 12 connected thereto, and a pump 11.
3, a constant amount is always supplied. Dipping roller 30
The coating roller 24 is disposed perpendicular to the conveyance path 105 and has a length equal to or longer than the width of the photosensitive material F. The amount of the processing liquid 108 applied to the emulsion layer Fa via the application roller 24 is an amount necessary and sufficient for processing the photosensitive material F, and is preferably the minimum amount necessary.
次に、水分供給手段１０９について説明する。Next, the moisture supply means 109 will be explained.
この水分供給手段１０９も温調された水１１０を貯溜し
ている木タンク１２１と、これに接続する配管１２２、
ポンプ１２３及び水供給部１１９とからなる。This water supply means 109 also includes a wooden tank 121 storing temperature-controlled water 110, and piping 122 connected to this.
It consists of a pump 123 and a water supply section 119.
この水供給部１１９も、搬送路１０５に直交して配設さ
れる感光材料Ｆの幅に等しいか又はそれ以上の長さを有
する管材１２０で形成されており、搬送路１０５に対向
する部分には複数の噴射孔】２０ａが穿設されている。This water supply section 119 is also formed of a tube material 120 having a length equal to or longer than the width of the photosensitive material F disposed perpendicularly to the conveyance path 105, and has a portion facing the conveyance path 105. A plurality of injection holes [20a] are bored.
この管材１２０に圧送された水１１０は噴射孔１２０ａ
から乳剤層Ｆａを全面にわたって均一に噴射して洗浄す
る。The water 110 forced into this pipe material 120 is fed to the injection hole 120a.
The emulsion layer Fa is sprayed uniformly over the entire surface for cleaning.
噴射洗浄された水１１０は搬送路１０５の下部に設けた
液受１２７で受けて、廃液タンク１２８に廃棄する。The sprayed and washed water 110 is received by a liquid receiver 127 provided at the lower part of the conveyance path 105 and is disposed of in a waste liquid tank 128.
二の実施例のようにま布ローラ２４で処理液１０８を供
給する場合には、供給後に廃棄する処理？夜をほとんど
なくすことができる。When the processing liquid 108 is supplied by the cloth roller 24 as in the second embodiment, is there a process of discarding it after supply? It can eliminate most of the night.
次に、ノズルを用いて処理液及び水を供給する別の実施
例を第３図に基づき説明する。Next, another embodiment of supplying the processing liquid and water using a nozzle will be described with reference to FIG.
第３図はノズルを用いる現像処理部の側面図を示す。FIG. 3 shows a side view of a development processing section using nozzles.
この現像処理部２０１には人口ローラ２０２、搬送ロー
ラ２０３、絞りローラ２０４がそれぞれ配貨され、感光
材＊４Ｆのｔ１送路２０５を形成している。感光材料Ｆ
は入口ローラ２０２に挿入され、搬送路２０５に配置さ
れた搬送ガイド板２０６上を搬送される。この搬送ガイ
ド板２０６の上方には処理液供給手段２０７が配設され
、搬送される感光材料Ｆの乳剤層Ｆａに処理ｔｉ、２０
８を供給する。A synthetic roller 202, a conveyance roller 203, and a squeeze roller 204 are respectively distributed to the development processing section 201, and form a t1 feeding path 205 for the photosensitive material *4F. Photosensitive material F
is inserted into the entrance roller 202 and conveyed on a conveyance guide plate 206 disposed on a conveyance path 205. A processing liquid supply means 207 is disposed above the conveyance guide plate 206, and the emulsion layer Fa of the photosensitive material F to be conveyed is treated with
Supply 8.
処理液２０８が供給され膨潤した感光材料Ｆは、搬送ロ
ーラ２０３と絞りローラ２０４との間に配設される水分
供給手段２０９により、＊２】ＯをそのりＬ側層Ｆａに
供給する。The swollen photosensitive material F supplied with the processing liquid 208 is supplied with *2]O to the L side layer Fa by a moisture supply means 209 disposed between the conveying roller 203 and the squeezing roller 204.
次に、処理液供給手段２０７の構成及び動作を説明する
。Next, the configuration and operation of the processing liquid supply means 207 will be explained.
この処理液供給手段２０７は処理液タンク２ユゴと、こ
れに接続する配管２】２及びポンプ２１３と、このポン
プ２１３で圧送される処理液２０８を感光材料Ｆに供給
する処理液供給ノズル３１から構成されている。この処
理液供給ノズル３】の先端部には感光オΔ料Ｆの幅に等
しいか又はそれ以上の長さを有するスリット状の開口部
３】８を有しており、圧送されてくる処理ｔｉ２ ｏ
ｓを感光材料Ｆの乳剤層ＦＢ１．：連続的に吐出する。The processing liquid supply means 207 includes a processing liquid tank 2, a pipe 2 connected thereto, a pump 213, and a processing liquid supply nozzle 31 that supplies the processing liquid 208 pumped by the pump 213 to the photosensitive material F. It is configured. The processing liquid supply nozzle 3] has a slit-shaped opening 3]8 having a length equal to or longer than the width of the photosensitive material F at the tip thereof, and the processing liquid supply nozzle 3] has a slit-shaped opening 3]8 having a length equal to or longer than the width of the photosensitive material F. o
s in the emulsion layer FB1.s of the light-sensitive material F. : Discharge continuously.
この吐出状況も、感光材料Ｆの搬送速度及び乳剤層Ｆａ
の吸液能力を勘案して、処理に必要かつ十分な量、望ま
しくは必要最小限の量を吐出する。この滴下した処理液
２０８は使い切りとし、余剰の処理液２０８がでる場合
には搬送ガイド板２０６の下部に設けた液受２１７で受
けて、廃液タンク２＋８に廃棄する。This discharge condition also depends on the transport speed of the photosensitive material F and the emulsion layer Fa.
The amount necessary and sufficient for the treatment, preferably the minimum amount necessary, is discharged by taking into account the liquid absorption capacity of the device. This dropped processing liquid 208 is used up, and if excess processing liquid 208 comes out, it is received by a liquid receiver 217 provided at the lower part of the conveyance guide plate 206 and disposed of in a waste liquid tank 2+8.
次に、水分供給手段２０９について説明する。Next, the moisture supply means 209 will be explained.
この水分供給手段２０９も水タンク２２１と、これに接
続する配管２２２及びポンプ２２３と、このポンプ２２
３で圧送されろ水２１０を乳剤１ｉｉＦａに供給する水
分供給ノズル３２から構成されている。この水分供給ノ
ズル３２の先端部にも処理液塗布ノズル３１と同様のス
リット状の開口部３２８を有しており、圧送された水２
１０はこの開口部３２ａから乳剤層Ｆａを全面にわたっ
て均一に噴射して洗浄する。噴射洗浄された水２１０は
搬送路２０５の下部に設けた液受２２７で受けて、廃液
タンク２２８に廃棄する。This water supply means 209 also includes a water tank 221, piping 222 and a pump 223 connected to this, and this pump 22
The emulsion 1iiFa is composed of a moisture supply nozzle 32 which supplies filtrate 210 under pressure to the emulsion 1iiFa. The tip of this water supply nozzle 32 also has a slit-shaped opening 328 similar to the treatment liquid application nozzle 31, and the water 2
10 uniformly sprays the emulsion layer Fa over the entire surface from this opening 32a for cleaning. The sprayed and washed water 210 is received by a liquid receiver 227 provided at the lower part of the conveyance path 205 and is disposed of in a waste liquid tank 228.
第４図は請求項２記載の発明の感光材料処理装置の現像
処理部の概略図である。FIG. 4 is a schematic diagram of the development processing section of the photosensitive material processing apparatus according to the second aspect of the invention.
この感光材料処理装置の現像処理部３０１の入口ローラ
３０２から搬入された感光材料Ｆは、搬送路３０５に配
置された搬送ガイド板３０６上を搬送される。この搬送
ガイド板３０６の上方には、搬送路上流側に処理剤塗布
手段３０７が、搬送路下流側に水分供給手段３０９が配
設される。The photosensitive material F carried in from the entrance roller 302 of the development processing section 301 of this photosensitive material processing apparatus is conveyed on a conveyance guide plate 306 arranged on a conveyance path 305. Above the conveyance guide plate 306, a processing agent application means 307 is provided on the upstream side of the conveyance path, and a moisture supply means 309 is provided on the downstream side of the conveyance path.
この処理剤塗布手段３０７は粉体の処理剤３３を収容す
る処理剤タンク３１１と、これに接続する配管３１２及
びポンプ３１３と、このポンプ３１３で圧送される処理
剤３３を感光材料Ｆに塗布する処理剤塗布ノズル３３１
から構成されている。この処理剤塗布ノズル３３１の先
端部には感光材料Ｆの幅に等しいか又はそれ以上の長さ
を有するスリット状の開口部３３１ａを有しており、圧
送されてくる処理剤３３を感光材料Ｆの乳剤層Ｆａに連
続的に吐出する。The processing agent application means 307 includes a processing agent tank 311 containing a powdered processing agent 33, a pipe 312 and a pump 313 connected thereto, and applies the processing agent 33 pumped by the pump 313 onto the photosensitive material F. Treatment agent application nozzle 331
It consists of The processing agent application nozzle 331 has a slit-shaped opening 331a at its tip with a length equal to or longer than the width of the photosensitive material F, and the processing agent 33 that is being pumped is transferred to the photosensitive material F. is continuously discharged onto the emulsion layer Fa.
この処理剤３３を供給された感光材ＩＦは続いて水分供
給手段３０９により水３１０を水分供給ノズル３３２か
ら供給され、乳剤層Ｆａての反応に必要な水分を全て補
給すると処理剤３３が熔解して処理液となる。その後、
反応が完了するまでの時間はこの乳剤層Ｆａの湿潤状態
を保つ。その後、図示しない洗浄ノズルて再度水又は水
蒸気を噴射して不要な反応生成物を洗浄する。The photosensitive material IF supplied with the processing agent 33 is then supplied with water 310 from the moisture supply nozzle 332 by the moisture supply means 309, and when all the moisture necessary for the reaction in the emulsion layer Fa is replenished, the processing agent 33 is melted. It becomes a processing liquid. after that,
The emulsion layer Fa remains wet until the reaction is completed. Thereafter, water or steam is again injected from a cleaning nozzle (not shown) to clean unnecessary reaction products.
このように粉体又は固体の処理剤３３を直接感光材料Ｆ
の乳剤層Ｆａに塗布する場合には、塗布後に供給される
水分を得て初めて処理液か乳剤層に浸透することになる
ので、常に処理剤熔融の初期状態を確保することができ
、処理液の場合に生しる経時的処理性能のバラツキが防
止できる。In this way, the powder or solid processing agent 33 is directly applied to the photosensitive material F.
When coating the emulsion layer Fa, the processing solution penetrates into the emulsion layer only after the water supplied after coating is obtained, so the initial state of melting of the processing agent can always be ensured, and the processing solution It is possible to prevent variations in processing performance over time that occur in the case of
［発明の効果］
以上説明したように、請求項１項記載の発明の感光材料
処理装置は、感光材料に所定量の処理液を浸漬せずに供
給することで、処理液内に汚れを搬入することが防止で
き、又未使用処理液内に使用済みの処理液が混入するこ
とが防止できるとともに処理性能の劣化を防止でき、又
メンテナンスの軽減化を図ることもできる。[Effects of the Invention] As explained above, the photosensitive material processing apparatus of the invention described in claim 1 supplies a predetermined amount of processing liquid to the photosensitive material without immersing it, thereby preventing dirt from being carried into the processing liquid. In addition, it is possible to prevent used processing liquid from being mixed into unused processing liquid, to prevent deterioration of processing performance, and to reduce maintenance.
更に、このように所定量の処理液を感光材料に供給した
後に感光材料に水または水蒸気を供給することで、過剰
な処理液を供給しなくとも必要な水分を補給して処理液
の乾燥濃縮化による処理ムラを防ぐこともできる。Furthermore, by supplying water or steam to the photosensitive material after a predetermined amount of processing liquid is supplied to the photosensitive material in this way, the necessary moisture can be replenished and the processing liquid can be dried and concentrated without having to supply an excessive amount of processing liquid. It is also possible to prevent uneven processing due to oxidation.
又、請求項２記載の発明の感光材料処理装置は、感光材
料に処理剤を塗布してから水分を供給しており、この場
合水分を得て初めて処理剤が溶融するので、常に処理剤
溶融の初期状態を確保することができ、処理液の場合に
生じる経時的処理性能のバラツキが防止できる。Further, in the photosensitive material processing apparatus according to the second aspect of the invention, moisture is supplied after applying the processing agent to the photosensitive material, and in this case, the processing agent is melted only after moisture is obtained, so that the processing agent is always melted. The initial state of the process can be ensured, and variations in processing performance over time that occur in the case of processing liquids can be prevented.
第１図はこの発明の感光材料処理装置の現＠、ＩＡ理部
の概略図、第２図は別の実施例である塗布ローラを用い
て処理液を塗布する感光材料処理装置の現像処理部の概
略図、第３図はノズルを用いて処理液を供給する感光材
料処理装置の現像処理部の概略２、第４図はノズルを用
いて粉体の処理剤を塗布する感光材料処理装置の現像処
理部の概略図である。
図中符号Ｆは感光材料、５．１０５，２０５゜３０５は
搬送路、７．２０７は処理液供給手段、８．１０８，２
０８は処理液、９．＋０９．２０９．３０９は水分供給
手段、１０，１１０．２１０．３１０は水、２４は塗布
ローラ、３３は処理剤、３０７は処理剤塗布手段を示す
。FIG. 1 is a schematic diagram of the current IA laboratory of the photosensitive material processing apparatus of the present invention, and FIG. 2 is another embodiment of the development processing section of the photosensitive material processing apparatus which applies a processing solution using a coating roller. 3 is a schematic diagram of the development processing section of a photosensitive material processing apparatus that supplies a processing solution using a nozzle, and FIG. 4 is a schematic diagram of a photosensitive material processing apparatus that applies a powder processing agent using a nozzle. FIG. 3 is a schematic diagram of a development processing section. In the figure, F is a photosensitive material, 5.105, 205°, 305 is a transport path, 7.207 is a processing liquid supply means, 8.108, 2
08 is a treatment liquid; 9. +09.209.309 is a moisture supply means, 10, 110.210.310 is water, 24 is an application roller, 33 is a processing agent, and 307 is a processing agent application means.
Claims (1)
しながら、所定量の前記処理液を前記感光材料に供給す
る処理液供給手段と、この処理液が供給された前記感光
材料に水または水蒸気を供給する水分供給手段とを有す
ることを特徴とする感光材料処理装置。 ２、感光材料を搬送路に沿って搬送しながら、所定量の
処理剤を前記感光材料に塗布する処理剤塗布手段と、こ
の処理剤が塗布された前記感光材料に水または水蒸気を
供給する水分供給手段とを有することを特徴とする感光
材料処理装置。[Scope of Claims] 1. A processing liquid supply means for supplying a predetermined amount of the processing liquid to the photosensitive material while conveying the photosensitive material along a conveyance path without immersing the photosensitive material in the processing liquid; 1. A photosensitive material processing apparatus comprising: a moisture supply means for supplying water or water vapor to the supplied photosensitive material. 2. A processing agent applying means for applying a predetermined amount of a processing agent to the photosensitive material while conveying the photosensitive material along a conveyance path, and a moisture supply unit for supplying water or steam to the photosensitive material coated with the processing agent. 1. A photosensitive material processing apparatus comprising a supply means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29621890A JPH04168439A (en) | 1990-11-01 | 1990-11-01 | Sensitive material processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29621890A JPH04168439A (en) | 1990-11-01 | 1990-11-01 | Sensitive material processing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04168439A true JPH04168439A (en) | 1992-06-16 |
Family
ID=17830709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29621890A Pending JPH04168439A (en) | 1990-11-01 | 1990-11-01 | Sensitive material processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04168439A (en) |
-
1990
- 1990-11-01 JP JP29621890A patent/JPH04168439A/en active Pending
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