JPH04129214A - Cvd equipment - Google Patents
Cvd equipmentInfo
- Publication number
- JPH04129214A JPH04129214A JP25057490A JP25057490A JPH04129214A JP H04129214 A JPH04129214 A JP H04129214A JP 25057490 A JP25057490 A JP 25057490A JP 25057490 A JP25057490 A JP 25057490A JP H04129214 A JPH04129214 A JP H04129214A
- Authority
- JP
- Japan
- Prior art keywords
- friction member
- cylindrical
- reaction tube
- cylindrical pipe
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006243 chemical reaction Methods 0.000 claims abstract description 31
- 239000007795 chemical reaction product Substances 0.000 abstract description 18
- 238000004140 cleaning Methods 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はＣＶＤ装置に関し、特に反応管内でガスによる
化学反応時に生成される反応生成物の円筒配管への堆積
防止を図った排気系の構造に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a CVD apparatus, and in particular to a structure of an exhaust system designed to prevent reaction products generated during a chemical reaction with gas in a reaction tube from being deposited on a cylindrical pipe. It is related to.
一般のＣＶＤ装置では第５図の一部を断面にした正面面
に示すように、基板１上に膜を化学成長させる反応管２
と、反応管２にガスを導入すべく設置したガス供給源３
と、基板１を加熱すべく設置した加熱源４と、前記反応
管２内のガスを排気すべく設置させた円筒配管５及び真
空ポンプ６により、基板１上に化学反応による膜を成長
させている。また基板１の上に化学成長されなかったガ
スは反応生成物として反応管２内に堆積したり、残り大
部分の反応生成物は反応管２の出口より排出され捕捉箱
７により捕捉されている。In a general CVD apparatus, as shown in the partially cross-sectional front view of FIG. 5, a reaction tube 2 is used to chemically grow a film on a substrate 1.
and a gas supply source 3 installed to introduce gas into the reaction tube 2.
Then, a film is grown on the substrate 1 by a chemical reaction using a heat source 4 installed to heat the substrate 1, a cylindrical pipe 5 and a vacuum pump 6 installed to exhaust the gas in the reaction tube 2. There is. Further, the gas that is not chemically grown on the substrate 1 is deposited as reaction products in the reaction tube 2, and most of the remaining reaction products are discharged from the outlet of the reaction tube 2 and captured by the trapping box 7. .
しかし実際、反応生成物は反応管２の後の円筒配管５の
内壁に堆積しやすい、これは円筒配管５が外気にさらさ
れる場所に設置されているため、反応管２内よりも円筒
配管５の温度のほうが低いためである。従来のＣＶＤ装
置における円筒配管５への反応生成物付着防止方法とし
て、円筒配管５を極力短くするか、円筒配管５の温度を
低下させないように加熱源４の熱が伝わり易くする等の
工夫をしてきた。However, in reality, reaction products tend to accumulate on the inner wall of the cylindrical pipe 5 after the reaction tube 2. This is because the cylindrical pipe 5 is installed in a place exposed to the outside air, so the reaction products are more likely to accumulate on the inner wall of the cylindrical pipe 5 than on the inside of the reaction tube 2. This is because the temperature is lower. As a method for preventing reaction products from adhering to the cylindrical pipe 5 in conventional CVD equipment, measures such as making the cylindrical pipe 5 as short as possible or making it easier for the heat of the heating source 4 to be transmitted so as not to lower the temperature of the cylindrical pipe 5 are taken. I've been doing it.
上述した従来のＣＶＤ装置において、円筒配管温度を低
下させないように工夫しても、反応管内と円筒配管の絶
対的な温度差をカバー出来ず、円筒配管内面への反応生
成物堆積防止に至っていない、従って堆積した反応生成
物により円筒配管の口径が少しずつ狭められ、真空ポン
プによる必要排気量の減少を招いたり、本来生成物を捕
捉すべき目的の場所への堆積でないため、排気の変動及
び震動等により反応生成物の破片が剥がれ、捕捉箱を通
過し、さらには真空ポンプに到着し、ポンプ過負荷を引
き起こすなどのトラブル要因となっていた。In the conventional CVD equipment described above, even if efforts are made to prevent the temperature of the cylindrical pipe from decreasing, the absolute temperature difference between the inside of the reaction tube and the cylindrical pipe cannot be covered, and the accumulation of reaction products on the inner surface of the cylindrical pipe cannot be prevented. Therefore, the diameter of the cylindrical pipe is gradually narrowed due to the accumulated reaction products, leading to a decrease in the displacement required by the vacuum pump, and because the products are not deposited in the intended place where they should be captured, fluctuations in exhaust and Fragments of reaction products were peeled off due to vibrations, passed through the trapping box, and even arrived at the vacuum pump, causing problems such as overloading the pump.
このトラブル発生を防止するため、定期的に捕捉箱及び
円筒配管を装置より取り外して清掃する必要があるため
、必然的に装置を停止させねばならず、清掃時間を費や
すことよる装置稼働率の低下というを問題を生じていた
。In order to prevent this problem from occurring, it is necessary to periodically remove the capture box and cylindrical piping from the equipment and clean it, which necessitates stopping the equipment and reducing the equipment operating rate due to increased cleaning time. That was causing a problem.
本発明のＣＶＤ装置は、反応管と、前記反応管内のガス
を排気すべく設置させた排気配管及び真空ポンプと、前
記排気配管内に前記反応管内の化学反応時に生成する反
応生成物を捕捉すべく設置させた捕捉箱とを有するＣＶ
Ｄ装置において、前記捕捉箱と前記反応管間に少なくと
も１つの円筒配管と、前記円筒配管内面にて円筒内壁面
を摩擦すべく配設させた１つの摩擦部材と、前記摩擦部
材を前記円筒配管の円筒中心軸を中心に回転させるべく
配設した駆動用モーターとを具備している。The CVD apparatus of the present invention includes a reaction tube, an exhaust pipe and a vacuum pump installed to exhaust gas in the reaction tube, and a reaction product that is generated during a chemical reaction in the reaction tube is captured in the exhaust pipe. A CV with a capture box installed in a
In apparatus D, at least one cylindrical pipe is provided between the capture box and the reaction tube, one friction member is disposed to rub the inner wall surface of the cylinder on the inner surface of the cylindrical pipe, and the friction member is connected to the cylindrical pipe. It is equipped with a drive motor arranged to rotate around the cylindrical central axis of the cylinder.
次に、本発明について、図面を参照して説明する。第１
図は一部を断面にした本発明の実施例１の正面図であり
、第２図は本発明の東部の拡大断面図、第３図は本発明
の要部の斜視図である。Next, the present invention will be explained with reference to the drawings. 1st
The figure is a partially sectional front view of Embodiment 1 of the present invention, FIG. 2 is an enlarged sectional view of the eastern part of the present invention, and FIG. 3 is a perspective view of the main part of the present invention.
本実施例は第１図のように、基板１上に膜を化学成長さ
せる反応管２と、反応管２にガスを導入すべく設置した
ガス供給源３と、基板１を加熱すべく設置した加熱源４
と、反応管２内のガスを排気すべく設置させた円筒配管
５及び真空ポンプ６と、円筒配管５の後に、反応管２内
の化学反応時に生成する反応生成物を捕捉すべく設置さ
せた捕捉箱７とで構成されたＣＶＤ装置において、捕捉
箱７と反応管２間に少なくとも１つの円筒配管５と、円
筒配管５内面にて、円筒配管５内壁面を摩擦すべく配設
させた少なくとも１つの摩擦部材８と、摩擦部材８を円
筒配管５の円筒中心軸を中心に回転させるべく配設した
駆動用モーター９で構成している０円筒配管５及び摩擦
部材８は金属で構成し、摩擦部材８は、第３図のように
棒材を組み合わせて構成する。In this embodiment, as shown in FIG. 1, there is a reaction tube 2 for chemically growing a film on a substrate 1, a gas supply source 3 installed to introduce gas into the reaction tube 2, and a gas supply source 3 installed for heating the substrate 1. heating source 4
A cylindrical pipe 5 and a vacuum pump 6 were installed to exhaust the gas inside the reaction tube 2, and a cylindrical pipe 5 and a vacuum pump 6 were installed after the cylindrical pipe 5 to capture reaction products generated during the chemical reaction inside the reaction tube 2. In a CVD apparatus configured with a capture box 7, at least one cylindrical pipe 5 is provided between the capture box 7 and the reaction tube 2, and at least one cylindrical pipe 5 is disposed on the inner surface of the cylindrical pipe 5 to rub the inner wall surface of the cylindrical pipe 5. The cylindrical pipe 5 and the friction member 8 are made of metal; The friction member 8 is constructed by combining bar materials as shown in FIG.
この構成によれば、駆動用モーター９にて摩擦部材８を
常時回転させることにより、円筒配管５の内壁に堆積し
ようとする反応生成物をかき落し、次段の捕捉箱７に捕
捉させるため、円筒配管５内に反応生成物が堆積するこ
とはない。このため円筒配管５内の清掃を必要せず、装
置稼働率の向上及び真空ポンプ６のトラブル防止を図る
ことができる。また摩擦部材８と駆動用モーター９は円
筒配管５から取り外せる構造となっているため、メンテ
ナンス等容易に行える。According to this configuration, by constantly rotating the friction member 8 with the drive motor 9, reaction products that are about to accumulate on the inner wall of the cylindrical pipe 5 are scraped off and captured in the next-stage capture box 7. No reaction products are deposited inside the cylindrical pipe 5. Therefore, it is not necessary to clean the inside of the cylindrical pipe 5, and it is possible to improve the device operating rate and prevent troubles with the vacuum pump 6. Furthermore, since the friction member 8 and the drive motor 9 are constructed to be detachable from the cylindrical pipe 5, maintenance can be easily performed.
第４図は本発明の実施例２を表わすもので一部を断面に
した正面図である。本実施例は駆動用モーター９に電流
監視箱１０を取り付けたもので、他は、実施例１と同様
である０本実施例によれば駆動用モーター９の消費電流
を常時監視し、もし摩擦部材８が反応生成物の影響で正
常に回転できなくなれば、消費電流は増加する為、これ
を異常とみなし、警告燈１１を点灯させ、作業者に点検
時期を知らせる利点を有するシステムとなる。FIG. 4 shows a second embodiment of the present invention, and is a partially sectional front view. In this embodiment, a current monitoring box 10 is attached to the drive motor 9, and other aspects are the same as in the first embodiment.According to this embodiment, the current consumption of the drive motor 9 is constantly monitored, and if friction If the member 8 cannot rotate normally due to the influence of the reaction product, the current consumption will increase, so the system has the advantage of treating this as an abnormality, turning on the warning light 11, and notifying the operator that it is time for inspection.
以上説明したように本発明は、円筒配管内で摩擦部材を
駆動用モーターにて常時回転させる構成としているので
、反応生成物の円筒配管内への堆積を防止し、これによ
り円筒配管内の清掃を必要とせず、装置稼働率の向上及
び真空ポンプトラブル防止を図ることができる。As explained above, the present invention has a structure in which the friction member is constantly rotated within the cylindrical pipe by the drive motor, so that it is possible to prevent reaction products from accumulating inside the cylindrical pipe, thereby cleaning the inside of the cylindrical pipe. It is possible to improve the device operating rate and prevent vacuum pump troubles without the need for
第１図は一部を断面にした本発明の実施例１の正面図、
第２図は本発明の要部の拡大断面図、第３図は本発明の
要部の斜視図、第４図は一部を断面にした実施例２の正
面図、第５図は一部を断面にした従来のＣＶＤ装置の正
面図である。
１・・・基板、２・・・反応管、３・・・ガス供給源、
４・・・加熱源、５・・・円筒配管、６・・・真空ポン
プ、７・・・捕捉箱、８・・・摩擦部材、９・・・駆動
用モーター １０・・・電流監視箱、１１・・・警告燈
。FIG. 1 is a partially sectional front view of Embodiment 1 of the present invention;
FIG. 2 is an enlarged sectional view of the main part of the present invention, FIG. 3 is a perspective view of the main part of the invention, FIG. 4 is a front view of Embodiment 2 with a part cut away, and FIG. FIG. 2 is a front view of a conventional CVD apparatus taken in cross section. 1... Substrate, 2... Reaction tube, 3... Gas supply source,
4... Heat source, 5... Cylindrical piping, 6... Vacuum pump, 7... Capture box, 8... Friction member, 9... Drive motor 10... Current monitoring box, 11...Warning light.
Claims (1)
排気配管及び真空ポンプと、前記排気配管内に前記反応
管内の化学反応時に生成する反応生物を捕捉すべく設置
させた捕捉箱とを有するＣＶＤ装置において、前記捕捉
箱と前記反応管間に少なくとも１つの円筒配管と、前記
円筒配管内面にて円筒内壁面を摩擦すべく配設させた少
なくとも１つの摩擦部材と、前記摩擦部材を前記円筒配
管の円筒中心軸を中心に回転させるべく配設した駆動用
モーターとを具備することを特徴とするＣＶＤ装置。A reaction tube, an exhaust pipe and a vacuum pump installed to exhaust gas in the reaction tube, and a capture box installed in the exhaust pipe to capture reaction organisms generated during a chemical reaction in the reaction tube. A CVD apparatus comprising: at least one cylindrical pipe between the capture box and the reaction tube; at least one friction member disposed to rub the inner wall surface of the cylinder on the inner surface of the cylindrical pipe; A CVD apparatus comprising a drive motor arranged to rotate a cylindrical pipe around a cylindrical central axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2250574A JP3057738B2 (en) | 1990-09-20 | 1990-09-20 | CVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2250574A JP3057738B2 (en) | 1990-09-20 | 1990-09-20 | CVD equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04129214A true JPH04129214A (en) | 1992-04-30 |
| JP3057738B2 JP3057738B2 (en) | 2000-07-04 |
Family
ID=17209917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2250574A Expired - Lifetime JP3057738B2 (en) | 1990-09-20 | 1990-09-20 | CVD equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3057738B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003527749A (en) * | 2000-03-14 | 2003-09-16 | アドバンスド．テクノロジー．マテリアルス．インコーポレイテッド | Chamber cleaning mechanism |
| CN106191812A (en) * | 2015-05-05 | 2016-12-07 | 中微半导体设备(上海)有限公司 | Chemical vapor deposition unit and the method cleaning its air vent |
-
1990
- 1990-09-20 JP JP2250574A patent/JP3057738B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003527749A (en) * | 2000-03-14 | 2003-09-16 | アドバンスド．テクノロジー．マテリアルス．インコーポレイテッド | Chamber cleaning mechanism |
| CN106191812A (en) * | 2015-05-05 | 2016-12-07 | 中微半导体设备(上海)有限公司 | Chemical vapor deposition unit and the method cleaning its air vent |
| CN106191812B (en) * | 2015-05-05 | 2019-01-22 | 中微半导体设备(上海)有限公司 | Chemical vapor deposition unit and the method for cleaning its exhaust outlet |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3057738B2 (en) | 2000-07-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0556369A1 (en) | Self-cleaning mechanism for oxidation chamber | |
| EP0026087B1 (en) | Bag-type filter apparatus | |
| JPS61192309A (en) | Hollow yarn type module | |
| US5362401A (en) | Method and apparatus for cleaning a filter apparatus | |
| JP2973490B2 (en) | Self-cleaning flow control orifice | |
| US3377780A (en) | Self-cleaning filter apparatus | |
| JPH04129214A (en) | Cvd equipment | |
| EP1414545B1 (en) | Apparatus for and method of trapping products in exhaust gas | |
| US4806242A (en) | Self-cleaning filter | |
| JP4575637B2 (en) | Pipe cleaning device | |
| US5109565A (en) | Vacuwipe | |
| JPH0642804A (en) | Duct equipped with self cleaning mechanism | |
| EP3889931A1 (en) | Self-cleaning aspirating smoke detector | |
| JPH01318231A (en) | Low pressure cvd device | |
| SU1001918A1 (en) | Vacuum suction cleaner | |
| JPH1161455A (en) | Monitoring and maintenance of vacuum treatment device | |
| JPH09186093A (en) | Method and apparatus for removing hazard of exhaust gas | |
| JPS62140617A (en) | Air filter device | |
| JPS6339960Y2 (en) | ||
| SU939041A1 (en) | Filter for cleaning gas | |
| JPH06302520A (en) | Processing method for reaction product | |
| JP3433998B2 (en) | Filtration apparatus and vacuum pump system protection method using the same | |
| JPH11123440A (en) | Wire drawing machine | |
| JPH10156111A (en) | Rotary screen filter | |
| SU856507A1 (en) | Apparatus for cleaning gases from dust |