JPH04118510A - Fluorescent x-ray film thickness meter - Google Patents
Fluorescent x-ray film thickness meterInfo
- Publication number
- JPH04118510A JPH04118510A JP23866890A JP23866890A JPH04118510A JP H04118510 A JPH04118510 A JP H04118510A JP 23866890 A JP23866890 A JP 23866890A JP 23866890 A JP23866890 A JP 23866890A JP H04118510 A JPH04118510 A JP H04118510A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- fluorescent
- intensity
- rays
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 abstract description 3
- 238000010521 absorption reaction Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、金属メツキ等の膜厚を測定するケイ光Ｘ線を
用いた膜厚測定装夏に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a film thickness measuring device using fluorescent X-rays for measuring the film thickness of metal plating and the like.
試料にＸ線を照射すると、立体角３６０”でケイ光Ｘ線
が放出されるが、従来技術では検出器が１個であったた
めに、ごく限られた範囲のケイ光Ｘ線しか検出できなか
った。When a sample is irradiated with X-rays, fluorescent X-rays are emitted with a solid angle of 360'', but because conventional technology only had one detector, it was only possible to detect fluorescent X-rays in a very limited range. Ta.
多層膜からなる試料の各層の膜厚を測定するには、各測
定対象毎に、膜厚既知の多数の標Ｙ＄試料を必要とし、
実際にそれらの標準試料を用意するのは、困難であり現
実的でないと考えられていた。In order to measure the film thickness of each layer of a sample consisting of a multilayer film, a large number of standard Y$ samples with known film thicknesses are required for each measurement target.
It was considered difficult and impractical to actually prepare such standard samples.
本発明では、従来の技術では困難であった多層膜の測定
を、測定対象毎に標準試料を多数用意することなく行う
ことを目的としている。そのために、検出器を２個以上
用いて、試料から放出されるケイ光Ｘ線の情報を最大限
に利用することにより、容易かつ精度よく各層の膜厚を
求めることができるように構成したものである。The present invention aims to measure multilayer films, which has been difficult with conventional techniques, without having to prepare a large number of standard samples for each object to be measured. To this end, the system is designed to use two or more detectors and make maximum use of the information from fluorescent X-rays emitted from the sample, making it possible to easily and accurately determine the film thickness of each layer. It is.
試料に１次Ｘ線を照射すると、試料を構成する膜厚の物
質の違いによって、異なるケイ光Ｘ線を放射する。これ
を複数の検出器を検出し、これを演算処理し層毎の膜厚
を測定する。When a sample is irradiated with primary X-rays, different fluorescent X-rays are emitted depending on the thickness of the material that makes up the sample. This is detected by a plurality of detectors, and the results are processed and the film thickness of each layer is measured.
第１図は本実施例で２個の検出器を用いて、２層膜を測
定した場合について説明する模式図である。第１図の第
１の検出器４で観測される試料３の第１層１１からのケ
イ光Ｘ線強度をＩｌｌ、第２層からのケイ光Ｘ線強度を
１１□、第２の検出器５で観測される第１層１１からの
ケイ光ＸｖＡ強度をｉｚ＋、第２Ｎからのケイ光ＸＮＪ
Ａ強度をＩ２２とする。FIG. 1 is a schematic diagram illustrating a case where a two-layer film is measured using two detectors in this example. The fluorescent X-ray intensity from the first layer 11 of the sample 3 observed by the first detector 4 in FIG. 1 is Ill, the fluorescent X-ray intensity from the second layer is 11□, and the second detector 5, the fluorescence XvA intensity from the first layer 11 is iz+, and the fluorescence XNJ from the second layer 11 is
Let A intensity be I22.
ここで、１次Ｘ線１０の強度一定、検出器の位置を固定
としたとき、第１層１１がらのケイ光Ｘ線強度、及び第
２Ｎ１２からのケイ光Ｘ線強度が、試料３の第１層１１
、第２層１２のそれぞれの膜厚１．．１２と、物質固有
の吸収係数μｍ、Ｉ２により１意に決まるとすると、
第１検出器４について、
ｆ、（Ｉ、、、 、、、、 ｔ、、、、、μｍ、Ｉ２）
−〇 −（１）第２検出器５について
Ｌ（１２１，Ｉｔ□、１．．１２．μｍ、μｚ ） −
〇 （２１という関係式が成り立つ。弐（１１，＋２
１はそれぞれ、理論的、及び実験的に求めることが可能
なので、式＋１＋、 ＋２＋より１．．１２．を得るこ
とかできる。Here, when the intensity of the primary X-ray 10 is constant and the position of the detector is fixed, the fluorescent X-ray intensity from the first layer 11 and the fluorescent X-ray intensity from the second layer 12 are 1 layer 11
, the respective film thicknesses of the second layer 12 are 1. ．． 12 and the substance-specific absorption coefficient μm, I2. For the first detector 4, f, (I, , , , , t, , , μm, I2)
-〇 -(1) Regarding the second detector 5 L(121, It□, 1..12.μm, μz) -
〇 (The relational expression 21 holds true.2(11,+2
1 can be determined theoretically and experimentally, respectively, so from the formulas +1+ and +2+, 1. ．． 12. Can you get it?
第２図は第１実施例の装置で、検出器を２個用いて構成
したケイ光Ｘ線膜厚計である。FIG. 2 shows the apparatus of the first embodiment, which is a fluorescent X-ray film thickness meter constructed using two detectors.
第３図は第２実施例の装置で１次元アレイ状の検出器を
用いて構成したケイ光Ｘ線膜厚計である。FIG. 3 shows a fluorescent X-ray film thickness meter constructed using the device of the second embodiment using a one-dimensional array of detectors.
本発明により、測定対象物質の種類、膜の層数に応して
、多数の標準試料がなければ、測定が困難であった試料
の測定を、容易に精度よく行うことができる。According to the present invention, it is possible to easily and accurately measure samples that would be difficult to measure without a large number of standard samples, depending on the type of substance to be measured and the number of layers of the membrane.
第１図は本実施例において、２層膜の試料を２つの検出
器を用いて測定する場合の模式図、第２図は本装置の第
１実施例の概略構造図、第３図は本装置の第２実施例の
概略構造図である。
１・・・１次Ｘ線発生系
２・・・コリメータ
３・・・試料
４・・・第１検出器
５・・・第２検出器
６ ・
７ ・ ・
８ ・ ・
９ ・ ・
１０ ・
１１ ・
１２ ・
１３ ・
１４ ・
・演算処理部
・１次元アレイ状検出器
・第１検出器の角度
・第２検出器の角度
・・１次Ｘ″ｄＡ
・・試料の第１層目の膜厚
・試料の第２層目の膜厚
・・第１層から放出されるケイ光Ｘ線
・第２層から放出されるケイ光Ｘ線
以上
出願人 セイコー電子工業株式会社
代理人 弁理士 林 敬 之 助
も
図
第
目
第
図Fig. 1 is a schematic diagram of the case where a two-layer film sample is measured using two detectors in this embodiment, Fig. 2 is a schematic structural diagram of the first embodiment of this device, and Fig. 3 is a schematic diagram of the present embodiment. FIG. 3 is a schematic structural diagram of a second embodiment of the device; 1... Primary X-ray generation system 2... Collimator 3... Sample 4... First detector 5... Second detector 6 ・ 7 ・ ・ 8 ・ ・ 9 ・ ・ 10 ・ 11・ 12 ・ 13 ・ 14 ・ ・ Arithmetic processing unit ・ One-dimensional array detector ・ Angle of first detector ・ Angle of second detector ・ 1st order X″dA ・ Thickness of first layer of sample・Film thickness of the second layer of the sample...Film X-rays emitted from the first layer ・Film X-rays emitted from the second layer or more Applicant Takayuki Hayashi, Patent Attorney, Seiko Electronic Industries Co., Ltd. Helpmo figure number figure number figure
Claims (1)
放出されるケイ光Ｘ線を検出する検出器と、前記検出器
からの信号を演算処理する演算処理部とからなるケイ光
Ｘ線膜厚計において、前記検出器を２個以上用いて、多
層膜の各膜厚を測定することを特徴とするケイ光Ｘ線膜
厚計。Fluorescence A fluorescent X-ray film thickness meter, characterized in that the thickness of each film of a multilayer film is measured using two or more of the detectors.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23866890A JPH04118510A (en) | 1990-09-07 | 1990-09-07 | Fluorescent x-ray film thickness meter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23866890A JPH04118510A (en) | 1990-09-07 | 1990-09-07 | Fluorescent x-ray film thickness meter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04118510A true JPH04118510A (en) | 1992-04-20 |
Family
ID=17033547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23866890A Pending JPH04118510A (en) | 1990-09-07 | 1990-09-07 | Fluorescent x-ray film thickness meter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04118510A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003506701A (en) * | 1999-08-10 | 2003-02-18 | コラス・アルミニウム・バルツプロドウクテ・ゲーエムベーハー | X-ray fluorescence sensor for measuring thickness of metal sheet |
-
1990
- 1990-09-07 JP JP23866890A patent/JPH04118510A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003506701A (en) * | 1999-08-10 | 2003-02-18 | コラス・アルミニウム・バルツプロドウクテ・ゲーエムベーハー | X-ray fluorescence sensor for measuring thickness of metal sheet |
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