JPH04116438A - Characteristic testing method of semiconductor pressure sensor - Google Patents

Characteristic testing method of semiconductor pressure sensor

Info

Publication number
JPH04116438A
JPH04116438A JP23771090A JP23771090A JPH04116438A JP H04116438 A JPH04116438 A JP H04116438A JP 23771090 A JP23771090 A JP 23771090A JP 23771090 A JP23771090 A JP 23771090A JP H04116438 A JPH04116438 A JP H04116438A
Authority
JP
Japan
Prior art keywords
pressure
chamber
semiconductor pressure
pressure sensor
sensors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23771090A
Other languages
Japanese (ja)
Inventor
Hisashi Sekiyama
関山 久
Motoumi Ichihashi
市橋 素海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP23771090A priority Critical patent/JPH04116438A/en
Publication of JPH04116438A publication Critical patent/JPH04116438A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To save labor for preparatory work and to test surely with high accuracy by providing many sensors in a closed chamber, and changing the operating pressure to the sensors in a batch by the change of the internal pressure of the chamber. CONSTITUTION:A closed chamber 2 is placed inside a constant temperature bath 5, and is connected to a pressure control device 3 and a data processor 4. Accordingly, the preparatory work for tests is completed if only many semiconductor pressure sensors 1 to be tested are put in the chamber 2. When a predetermined reference pressure is generated by the device 3, the internal pressure of the chamber 2 becomes equal to the reference pressure and added equally to each sensor 1. When the internal pressure of the chamber 2 is changed, it positively acts on each sensor. Therefore, the labor for preparatory work is saved, and highly accurate and positive tests are assured.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体圧力センサの特性試験方法に関し、更
に詳述すれば、多数個の半導体圧力センサの特性試験を
一括的に行う方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for testing the characteristics of semiconductor pressure sensors, and more specifically, to a method for simultaneously testing the characteristics of a large number of semiconductor pressure sensors.

〔従来の技術〕[Conventional technology]

半導体圧力センサは、小型化が容易であると共に廉価に
構成でき、また、耐熱性、耐湿性及び耐振動性に優れ、
劣悪な環境下においても使用可能なことから、近年、特
に自動車用の圧力センサとして脚光を浴びている。
Semiconductor pressure sensors are easy to miniaturize, can be constructed at low cost, and have excellent heat resistance, moisture resistance, and vibration resistance.
In recent years, pressure sensors have been in the spotlight, especially as pressure sensors for automobiles, because they can be used even in harsh environments.

第2図に示す如く半導体圧力センサ1は、外装ケース1
0内に立設された台座Il上にセンサチップ12を固設
してなり、外装ケース10の一部を内外に貫通して形成
された導圧口13を適宜の圧力測定位置に固定して用い
られる。センサチップ12は、半導体チップの中央部を
薄肉化して受圧用のダイアフラムを構成し、このダイア
フラムの表面上に複数の拡散抵抗を形成したものであり
、これらの夫々にピエゾ抵抗効果により生じる抵抗値の
変化を媒介として、前記ダイアフラムに作用する圧力、
即ち、前記導圧口13を経て導入される圧力を検出する
構成となっており、この検出に伴うセンサチップ12の
出力は、前記拡散抵抗により構成されたブリッジの出力
電圧として、リート14を経て外装ケース10の外部に
取出される。
As shown in FIG. 2, the semiconductor pressure sensor 1 has an outer case 1.
A sensor chip 12 is fixedly mounted on a pedestal Il that is set upright inside the sensor, and a pressure guiding port 13 formed by penetrating a part of the exterior case 10 inside and outside is fixed at an appropriate pressure measurement position. used. The sensor chip 12 consists of a pressure-receiving diaphragm made by thinning the central part of a semiconductor chip, and a plurality of diffused resistors formed on the surface of this diaphragm, each of which has a resistance value caused by a piezoresistance effect. the pressure acting on the diaphragm mediated by a change in;
That is, the configuration is such that the pressure introduced through the pressure guiding port 13 is detected, and the output of the sensor chip 12 accompanying this detection is passed through the REIT 14 as the output voltage of the bridge constituted by the diffusion resistor. It is taken out of the exterior case 10.

さて以上の如き構成の半導体圧力センサ1においては、
作用する圧力と得られる出力との関係、即ち出力特性が
、センーIJチップ12におりる受圧ダイアフラムの肉
厚値及び前記拡散砥抗の抵抗値等、個々の製造条件によ
って異なる値の影響を受iすることから、得られた製品
に対して夫々の出力特性を確認するための特性試験を実
施する必要がある。
Now, in the semiconductor pressure sensor 1 configured as above,
The relationship between the applied pressure and the output obtained, that is, the output characteristics, is affected by values that vary depending on individual manufacturing conditions, such as the wall thickness of the pressure receiving diaphragm passing through the sensor IJ chip 12 and the resistance value of the diffusion abrasive. Therefore, it is necessary to conduct characteristic tests on the obtained products to confirm their respective output characteristics.

第3図は、このような目的で行われる従来の特性試験方
法の実施状態を示す模式図である。本図に示す如〈従来
の特性試験は、恒温槽5内に配したテスl−トレー20
上に試験対象となる多数の半導体圧カセンザ1.1・・
・を載置し、ごれらの前記導圧口13を夫々、テストト
レー20の略全域に旬って引き回された圧力導入管21
の多数の支管’ 22.22・・の先端に締め付は固定
した後、前記圧力導入管21の基端に接続した圧力制御
装置3にて種々の基準圧力を発生し7、この圧力を全て
の半導体圧力センサ]、1・・・に−括的に導入して、
各圧力下における夫々の出力をデータ処理装置4にて処
理し、この結果から各半導体圧カセンザ1,1・・・の
出力特性を得る手順にて実施されており、更に温度に対
する出力特性の変化を確認する場合、恒温槽5の内部温
度を種々に変更1−2で、各温度下にて同様の手順が繰
り返される。
FIG. 3 is a schematic diagram showing the state of implementation of a conventional characteristic testing method performed for this purpose. As shown in this figure, in the conventional characteristic test, a test l-tray 20 placed in a constant temperature bath 5 is
Above are a number of semiconductor pressure sensors 1.1 to be tested.
A pressure introduction pipe 21 is placed on the test tray 20, and the pressure introduction ports 13 are routed over substantially the entire area of the test tray 20.
After tightening and fixing the ends of the numerous branch pipes 22, 22..., a pressure control device 3 connected to the base end of the pressure introducing pipe 21 generates various reference pressures 7, and all of these pressures are semiconductor pressure sensor], 1.
Each output under each pressure is processed by the data processing device 4, and the output characteristics of each semiconductor pressure sensor 1, 1, . . . are obtained from the results. To confirm this, the internal temperature of the constant temperature bath 5 is variously changed 1-2, and the same procedure is repeated at each temperature.

〔発明が解決しようとする課題] とごろか以上の如き従来の′[!J性試験の実施に際し
ては、試験対象となる多くの〉1′力休j」カセン゛す
1.1 ・を前記支管22.22・・に締め付り固定す
る繁雑な準備作業か要求され、多大の手間と時間とを要
する511点がある−1−8蹄めイ=t ’:I不足に
、Lり圧力洩れか/−1hした場合、所定の鵡?il町
力か導入されす、正しい出力時11が得られなくなる店
かあり、逆に過J度の締め(〈Jυかなされた場合、各
1′、 、f2体圧カーレンザ1,1・・・の出力にご
の締め(=1+:l応力の影響か仕して、同様に正しい
出カキ、冒牛が+Fjられ4Vりなる虞があって、多く
の゛1′勇体圧カセンリ1,1・・の特性試験を高村1
度にて行うことか難しいという問題があった。
[Problem to be solved by the invention] The conventional ′[! When conducting the J-ability test, a complicated preparation work is required to tighten and fix the many 1' power rests 1.1 to be tested to the branch pipes 22, 22, and so on. There are 511 points that require a lot of effort and time. If il town power is introduced, there are stores where 11 cannot be obtained when the output is correct, and conversely, excessive tightening (〈Jυ is done, each 1', , f2 body pressure car lens 1, 1... Due to the influence of stress (=1+:l), there is a possibility that the correct output and output will be +Fj and 4V, and many Takamura 1 conducted a characteristic test of...
There was a problem that it was difficult to do it at the same time.

本発明は斯かる事情に迄y]てなさ才+、 7;:もの
であり、iB備作業に要する手間及び時間が大幅に削減
されると共に、多くの半導体圧力センサの出力特性を高
精度にて確実に得ることか可能な半j、n体j「カセン
ザの特性試験方法を捉供することをfit的とする。
The present invention overcomes these circumstances, and greatly reduces the effort and time required for iB preparation work, and improves the output characteristics of many semiconductor pressure sensors with high precision. The purpose of this study is to provide a method for testing the properties of the half-j, n-body j "casenza" that can be reliably obtained using the following methods.

〔課題を解決するだめの手段〕[Failure to solve the problem]

本発明に係る半導体圧力センナの特性試験方法は、多数
個の半導体圧力センナを密閉チャンバ内に配し、この密
閉チャンバの内圧変更により各半導体圧カセンザへの作
用圧力を一括的に変更するものである。
The method for testing the characteristics of semiconductor pressure sensors according to the present invention involves arranging a large number of semiconductor pressure sensors in a closed chamber, and changing the internal pressure of the closed chamber to collectively change the pressure applied to each semiconductor pressure sensor. be.

[作用] 本発明においては、試験対象となる多くの半導体圧カセ
ンリを密閉−y−ヤンハ内に導入して所定位置に載置す
るだりで試験準備を実質的に完了することができ、その
後、前記密閉チャンバの内圧を変更した場合、この内圧
が前記半導体圧力センサ゛の夫々へ確実に作用するから
、この時の夫々の出力を処理するごとにより各半導体圧
カセンザの正確な出力特性か得られる。
[Function] In the present invention, test preparation can be substantially completed by introducing a number of semiconductor pressure sensors to be tested into a sealed Y-Yancha and placing them at predetermined positions. When the internal pressure of the sealed chamber is changed, this internal pressure reliably acts on each of the semiconductor pressure sensors, so that accurate output characteristics of each semiconductor pressure sensor can be obtained by processing each output at this time.

(実施例〕 以下本発明をその実施例を示す図面に基づいて詳述する
。第1図は本発明に係る半導体圧力センサの特性試験方
法(以下本発明方法という)の実施状態を示す模式図で
ある。
(Example) The present invention will be described in detail below based on drawings showing examples thereof. Fig. 1 is a schematic diagram showing the implementation state of the method for testing the characteristics of a semiconductor pressure sensor according to the present invention (hereinafter referred to as the method of the present invention). It is.

図示の如く本発明方法は、恒温槽5内に配設された密閉
チャンバ2、これに連通管6を介して接続された圧力制
御装置3、及びデータ処理装置4を備えてなる試験装置
を用いて行われる。そして試験対象となる多数個の半導
体圧力センサ1,1・・・は、前記密閉チャンバ2内に
図示しない導入口を経て導入されて夫々所定位置に載置
され、各載置位置に設りられた出力取出し用の図示し7
ない信号線を介して前記データ処理装置4に接続される
As shown in the figure, the method of the present invention uses a test apparatus comprising a closed chamber 2 disposed in a constant temperature bath 5, a pressure control device 3 connected to the closed chamber 2 via a communication pipe 6, and a data processing device 4. will be carried out. A large number of semiconductor pressure sensors 1, 1, . Figure 7 for output output
The data processing device 4 is connected to the data processing device 4 via a signal line.

このとき、各半導体圧力セン復1,1・・・の導圧I−
=113.13・・・(第2図参照)は、密閉チャンバ
2の内部に開放したままにしておけばよく、従来必要で
あったこれらの締め付は作業が不要であり、全ての半導
体圧カセンザ1,1・・・の配置後に前記導入口を閉止
することにより試験準備が完了するから、従来に比して
準備作業が大幅に簡素化され、これに要する手間及び時
間の削減が可能となる。
At this time, the guiding pressure I- of each semiconductor pressure sensor 1, 1...
=113.13... (see Figure 2) can be left open to the inside of the sealed chamber 2, and the tightening work that was previously required is unnecessary, and all semiconductor pressure is removed. Test preparation is completed by closing the introduction port after placing Kasenza 1, 1, etc., so the preparation work is greatly simplified compared to the past, and the effort and time required for this can be reduced. Become.

さて以」二の如く試験準備を完了した後、前記圧力制御
装置3にて所定の基準圧力を発生させると、これに前記
連通管6を介して接続された密閉チャンバ2の内圧もま
た前記基準圧力となり、この内圧が夫々の導圧口13,
1.3・・・を介して半導体圧カセンザ1,1・・・内
に導入されて、夫々の内部に配されたセンサチップ12
.12・・・(第2図参照)に作用することになり、こ
れに応じて各半導体圧力センサ1,1・・・から前述の
如く発せられる出力がデータ処理装置4に与えられる。
Now, after completing the test preparations as described in Section 2, when a predetermined reference pressure is generated in the pressure control device 3, the internal pressure of the sealed chamber 2 connected to this via the communication pipe 6 is also adjusted to the reference pressure. pressure, and this internal pressure is applied to each pressure guiding port 13,
The sensor chips 12 are introduced into the semiconductor pressure sensors 1, 1... through 1.3... and arranged inside each of them.
.. 12... (see FIG. 2), and in response, the outputs emitted from the respective semiconductor pressure sensors 1, 1... as described above are given to the data processing device 4.

データ処理装置4は、各半導体圧カセンザ1,1・・・
からの入力を圧力制御装置3におけるそのときの発生圧
力に対応させて夫々取込み、圧力制御装置3での一連の
基準圧力の発生を終了した後、夫々の基準圧力における
各半導体圧力センサ1,1・・・からの取込め結果に基
づいて夫々における作用圧力と出力との関係、即ち出力
特性を求める動作をなし、試験に携わる作業者は、CR
Tデイスプレィ、プリンタ等の図示しない表示装置上に
てこの結果を視認し、各半導体圧力センサ1,1・・・
の出力特性を知ることができる。なお温度に対する出力
特性の変化を確認する場合、従来と同様、恒温槽5の内
部温度を種々に変更して、該恒温槽5内に配された密閉
チャンバ2の内部温度を変更し、各温度下にて同様の手
順を繰り返せばよい。
The data processing device 4 includes each semiconductor pressure sensor 1, 1...
After the pressure control device 3 has finished generating a series of reference pressures, each semiconductor pressure sensor 1, 1 at the respective reference pressure is The relationship between the working pressure and the output, that is, the output characteristics, is determined based on the results obtained from..., and the workers involved in the test
The results are visually confirmed on a display device (not shown) such as a T-display or a printer, and each semiconductor pressure sensor 1, 1...
You can know the output characteristics of. Note that when checking changes in output characteristics with respect to temperature, as in the past, the internal temperature of the thermostatic chamber 5 is varied, and the internal temperature of the closed chamber 2 disposed within the thermostatic chamber 5 is changed. You can repeat the same steps below.

即ち、以上の如き本発明方法によれば、圧力制御装置3
の動作による密閉チヤツク\2の内圧変更に応じて全て
の半導体圧力センサ1,1・・・への作用圧力が一括的
に変更されるに際し、各半導体圧力センサ1,1・・・
に圧力制御装置3の発生圧力を確実に作用させることが
できると共に、半導体圧カセンザ1,1・・・は密閉チ
ャンバ2内部の所定位置に単に載置されるのみであり、
これらの出力に作用圧力以外の力の影響が生じる虞がな
く、データ処理装置4における前述の処理により常に作
用圧力と出力との正しい対応関係が得られ、正しい出力
特性の決定が安定してなされる。
That is, according to the method of the present invention as described above, the pressure control device 3
When the working pressure on all the semiconductor pressure sensors 1, 1, . . . is changed at once in accordance with the change in the internal pressure of the sealed chuck \2 due to the operation of the semiconductor pressure sensors 1, 1, .
The pressure generated by the pressure control device 3 can be reliably applied to the semiconductor pressure sensor 1, 1, .
There is no possibility that these outputs will be influenced by forces other than the working pressure, and the above-described processing in the data processing device 4 always provides the correct correspondence between the working pressure and the output, and the correct output characteristics can be stably determined. Ru.

〔発明の効果〕〔Effect of the invention〕

以上詳述した如く本発明方法においては、試験対象とな
る多数個の半導体圧力センサを密閉チャンバ内に配し、
この密閉チャンバの内圧変更により各半導体圧力センサ
への作用圧力を一括的に変更するから、試験準備の段階
にて従来必要であった導圧口の締め付は固定作業が不要
であり、準備作業に要する手間及び時間の大幅な削減が
可能となる上、試験中の半導体圧力センサへの作用圧力
を安定的に維持することができ、また各半導体圧力セン
サの出力に作用圧力以外の力の影響が生しることがなく
、正しい出力特性を高精度にて得ることができる等、本
発明は優れた効果を奏する。
As detailed above, in the method of the present invention, a large number of semiconductor pressure sensors to be tested are arranged in a closed chamber,
By changing the internal pressure of this sealed chamber, the working pressure on each semiconductor pressure sensor is changed all at once, so there is no need to tighten the pressure guide ports, which was previously required at the test preparation stage. In addition to making it possible to significantly reduce the effort and time required for testing, it is possible to stably maintain the working pressure on the semiconductor pressure sensor during testing, and to prevent the influence of forces other than the working pressure on the output of each semiconductor pressure sensor. The present invention has excellent effects, such as being able to obtain correct output characteristics with high precision without causing any problems.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明方法の実施状態を示す模式図、第2図は
半導体圧力センサの一般的な内部構造を示す縦断面図、
第3図は従来の特性試験方法の実施状態を示す模式図で
ある。 1・・・半導体圧力センサ  2・・・密閉チヤツクz
3・・・圧力制御装置  4・・・データ処理装置なお
、図中、同一符号は同一、又は相当部分を示す。 代理人  大  岩  増  雄 ・データ処理装置 第 図 第 図
FIG. 1 is a schematic diagram showing the implementation state of the method of the present invention, FIG. 2 is a longitudinal sectional view showing the general internal structure of a semiconductor pressure sensor,
FIG. 3 is a schematic diagram showing the state of implementation of a conventional characteristic testing method. 1... Semiconductor pressure sensor 2... Sealed chuck z
3...Pressure control device 4...Data processing device In the drawings, the same reference numerals indicate the same or corresponding parts. Agent Masuo Oiwa/Data processing equipment diagram

Claims (1)

【特許請求の範囲】[Claims] (1)多数個の半導体圧力センサへの作用圧力を一括的
に変更しつつ夫々の出力を調べ、各半導体圧力センサの
出力特性を求める半導体圧力センサの特性試験方法にお
いて、 前記半導体圧力センサを密閉チャンバ内に 配し、前記作用圧力の変更を、該密閉チャンバの内圧変
更により行うことを特徴とする半導体圧力センサの特性
試験方法。
(1) In a semiconductor pressure sensor characteristic testing method for determining the output characteristics of each semiconductor pressure sensor by collectively changing the pressure applied to a large number of semiconductor pressure sensors and examining the output of each semiconductor pressure sensor, the semiconductor pressure sensor is sealed. A method for testing characteristics of a semiconductor pressure sensor, characterized in that the pressure sensor is placed in a chamber, and the working pressure is changed by changing the internal pressure of the sealed chamber.
JP23771090A 1990-09-06 1990-09-06 Characteristic testing method of semiconductor pressure sensor Pending JPH04116438A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23771090A JPH04116438A (en) 1990-09-06 1990-09-06 Characteristic testing method of semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23771090A JPH04116438A (en) 1990-09-06 1990-09-06 Characteristic testing method of semiconductor pressure sensor

Publications (1)

Publication Number Publication Date
JPH04116438A true JPH04116438A (en) 1992-04-16

Family

ID=17019356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23771090A Pending JPH04116438A (en) 1990-09-06 1990-09-06 Characteristic testing method of semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPH04116438A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002310838A (en) * 2001-04-19 2002-10-23 Akashi Corp Pressure test device and pressure test method
JP2006029944A (en) * 2004-07-15 2006-02-02 Toyoda Mach Works Ltd Electric trimming system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002310838A (en) * 2001-04-19 2002-10-23 Akashi Corp Pressure test device and pressure test method
JP2006029944A (en) * 2004-07-15 2006-02-02 Toyoda Mach Works Ltd Electric trimming system

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