JPH04116107A - Hot isostatic process - Google Patents
Hot isostatic processInfo
- Publication number
- JPH04116107A JPH04116107A JP2230536A JP23053690A JPH04116107A JP H04116107 A JPH04116107 A JP H04116107A JP 2230536 A JP2230536 A JP 2230536A JP 23053690 A JP23053690 A JP 23053690A JP H04116107 A JPH04116107 A JP H04116107A
- Authority
- JP
- Japan
- Prior art keywords
- coating layer
- plasma spraying
- film
- low
- mandrel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 15
- 238000007750 plasma spraying Methods 0.000 claims abstract description 15
- 239000011247 coating layer Substances 0.000 claims abstract description 14
- 239000011261 inert gas Substances 0.000 claims abstract description 5
- 239000013076 target substance Substances 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 8
- 229910045601 alloy Inorganic materials 0.000 abstract description 7
- 239000000956 alloy Substances 0.000 abstract description 7
- 239000000919 ceramic Substances 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- 239000002195 soluble material Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000005507 spraying Methods 0.000 description 5
- 239000000835 fiber Substances 0.000 description 4
- 238000007751 thermal spraying Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000001513 hot isostatic pressing Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000002775 capsule Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001141 propulsive effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、複雑な形状を有する成形体を熱間静水圧加圧
処理する方法(Hot l5ostatic Pres
singProcess、以下、HIP処理法という)
に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is a method for hot isostatic pressing a molded article having a complicated shape.
singProcess (hereinafter referred to as HIP processing method)
Regarding.
(従来の技術)
従来のHIP処理法は、アルミニウムマンドレルの上に
目的物質をプラズマ溶射してコーティング皮膜を形成し
、該アルミニウムマンドレルを10〜20%の苛性ソー
ダ水溶液により溶出除去して皮膜成形体を取り出し、ス
チール製の円筒状カプセルにS+Ot系ガラメガラス粉
末に詰め込み、真空排気してからカプセルを封止する。(Prior art) In the conventional HIP treatment method, a target substance is plasma-sprayed onto an aluminum mandrel to form a coating film, and the aluminum mandrel is eluted and removed with a 10 to 20% aqueous solution of caustic soda to form a coated body. It is taken out, packed in S+Ot glass powder into a cylindrical steel capsule, evacuated, and then sealed.
その後、例えば、温度1200℃、圧力1500Kgf
/am”で5時間保持して旧P処理する。カプセル内の
5ide系の圧力媒体は、加熱温度の上昇とともに、軟
化して半溶融状態となり、被HIP材を静水圧加圧を可
能にする。After that, for example, the temperature is 1200℃ and the pressure is 1500Kgf.
/am'' for 5 hours and perform old P treatment.The 5ide-based pressure medium inside the capsule softens and becomes semi-molten as the heating temperature rises, making it possible to apply hydrostatic pressure to the HIP material. .
しかし、圧力媒体の密度が不均一であったり、軟化領域
の温度より低い場合に圧力分布が不均一となり、被HI
P材の成形体を変形させたり、破損させたりする危険が
高い。それ故、この方法は温度と圧力の精確な制御が要
求される。被HIP材が例えばスラスタのような中空成
形体である場合には、特に、昇温・昇圧パターンをきめ
細かく精確に制御する必要がある。However, if the density of the pressure medium is non-uniform or the temperature is lower than the softening region, the pressure distribution becomes non-uniform and the HI
There is a high risk of deforming or damaging the molded P material. Therefore, this method requires precise control of temperature and pressure. When the material to be HIPed is a hollow molded body such as a thruster, it is particularly necessary to control the temperature and pressure increase patterns in a detailed and accurate manner.
また、圧力媒体として不活性ガスを用いる場合は、圧力
の伝達を確実にするために、ガスを透過しない皮膜で被
旧P材を被覆する必要があるが、適当な皮膜がないため
、不活性ガスによるHIP処理を行うことができなかっ
た。In addition, when using an inert gas as a pressure medium, it is necessary to cover the aged P material with a film that does not permeate the gas in order to ensure pressure transmission. HIP treatment using gas could not be performed.
そこで、本発明は、上記の問題点を解消して、ガス不透
過性皮膜により被旧P材を被覆し、不活性ガスによるH
IP処理を可能にする方法を提供しようとするものであ
る。Therefore, the present invention solves the above-mentioned problems by covering the aged P material with a gas-impermeable coating and
It attempts to provide a method that enables IP processing.
帽1を解決するための手段)
本発明は、溶解可能な金型の上に低圧プラズマ溶射法で
緻密なコーティング層を形成し、その上に目的物質の皮
膜を形成し、さらに、その上に低圧プラズマ溶射法で緻
密なコーティング層を形成した後、上記の金型を溶解し
て除去し、次いで、不活性ガスによる熱間静水圧加圧処
理を施すことを特徴とする熱間静水圧加圧処理法である
。Means for Solving Problem 1) The present invention forms a dense coating layer on a meltable mold using a low-pressure plasma spraying method, forms a film of a target substance on it, and then Hot isostatic pressing is characterized by forming a dense coating layer by low-pressure plasma spraying, then melting and removing the mold, and then subjecting it to hot isostatic pressing using an inert gas. This is a pressure treatment method.
なお、処理対象の使用目的によっては、HIP処理後に
緻密なコーティング層を取り除いて使用することもでき
る。Note that, depending on the intended use of the object to be treated, the dense coating layer may be removed after the HIP treatment.
(作用)
本発明のHIP処理方法を、第1図の手順に沿って説明
する。まず、アルミニウム等の溶解可能な物質で中子1
(マンドレル)を作製し、該マンドレルlを回転させな
がらトラバースさせて、その表面に低圧プラズマ溶射2
で緻密なコーティング層3を形成し、次いで、その上に
目的物質の皮膜、第1図においては、大気プラズマ溶射
4でセラミックス皮膜5及び大気プラズマ溶射6でNb
皮膜7を形成し、さらにその上に低圧プラズマ溶射2で
緻密なコーティング層3を形成してから、マンドレル1
を溶解除去して成形体を取り出し、該成形体を旧P処理
し、必要に応じて、上記緻密なコーティング層を溶解除
去して、製品を得るものである。(Operation) The HIP processing method of the present invention will be explained along the steps shown in FIG. First, a core 1 is made of a soluble material such as aluminum.
(mandrel) is made, the mandrel l is rotated and traversed, and its surface is coated with low-pressure plasma spray 2.
A dense coating layer 3 is formed thereon, and then a film of the target substance is formed on it. In FIG.
After forming the film 7 and further forming a dense coating layer 3 on it by low-pressure plasma spraying 2, the mandrel 1
The molded body is taken out by dissolving and removing it, the molded body is treated with old P, and if necessary, the dense coating layer is dissolved and removed to obtain a product.
なお、目的物質の皮膜としては、SiC,^l、05等
の連続繊維でスラスタをワインディングした後、金属を
溶射したFRM(Fiber Re1nforced
Metal)やZr0y等のセラミックスの上に上記の
連続繊維でワインディングした後、セラミックスを溶射
したFRC(Fiber Re1nforced Ce
ra+eic)で形成することも可能である。また、溶
射の代わりにメツキ法による(電鋳成形)することも可
能である。The film of the target substance is FRM (Fiber Reinforced), which is made by winding a thruster with continuous fibers such as SiC, ^l, 05, etc., and then thermally spraying metal.
FRC (Fiber Reinforced Ce) is made by winding the above continuous fibers onto ceramics such as Metal) or Zr0y, and then thermally spraying the ceramics.
ra+eic). Further, instead of thermal spraying, it is also possible to use a plating method (electroforming).
緻密なコーティング層の材質は、目的物質の品質を損な
うことがなければ、その種類を問わないが、例えば、C
r24vt%、A]8vt%、YO15wt%、残部F
eからなるFe基合金や、Cr22wt%、A110w
t%、Y 1.Ovt%、残部NiからなるNi基合
金などを使用することができ、その他、Mg合金やpb
金合金使用することができる。The material of the dense coating layer may be of any type as long as it does not impair the quality of the target substance, but for example, C.
r24vt%, A]8vt%, YO15wt%, remainder F
Fe-based alloy consisting of e, Cr22wt%, A110w
t%, Y1. Ni-based alloys consisting of Ovt% and the balance Ni can be used; in addition, Mg alloys and pb
Gold alloy can be used.
本発明は、このように低圧プラズマ溶射法で形成した、
緻密でガス不透過性のコーティング層で目的物質の成形
体表面を被覆するので、不活性ガスによるHIP処理に
おいても、均一なガス圧を成形体に付与することができ
、高品質のHIP処理成形体を得ることができるように
なった。また、プラズマ溶射法を用いることができるの
で、小さな穴径や湾曲した複雑な形状の成形体について
も、容易にHIP処理を施すことができるようになった
。According to the present invention, the film formed by the low-pressure plasma spraying method,
Since the surface of the molded object of the target material is covered with a dense, gas-impermeable coating layer, uniform gas pressure can be applied to the molded object even during HIP treatment with inert gas, resulting in high-quality HIP processing molding. Now you can get a body. Furthermore, since the plasma spraying method can be used, it has become possible to easily perform the HIP treatment even on molded bodies with small hole diameters and curved and complicated shapes.
(実施例)
スラスタ(ジェットエンジン、ロケットエンジン等の推
進力を発生する装置)を本発明の方法で製造した。(Example) A thruster (a device that generates propulsive force such as a jet engine or a rocket engine) was manufactured by the method of the present invention.
まず、スラスタの中子をアルミニウムで形成し、該アル
ミニウムマンドレルの表面に低圧7’ラズマ溶射法で、
Cr24vt%、A18vt%、Y 0.5wt%、
残部FeからなるFe基合金粉末を溶射して0.05m
mの厚さの緻密な皮膜を形成し、次いで、大気プラズマ
溶射法で、セラミックス(ZrO,/Y、03=92/
8)の0、3nIeの熱障壁、及び、厚さ2.0nIe
のNbの強度部材皮膜を順次形成し、さらに、上記Fe
基合金粉末を同様に溶射して0.05+I1mの厚さの
緻密な皮膜を形成した。その際の、低圧プラズマ溶射法
の条件は、電流を90OA 、電圧を4[IVに調節し
てAr/Heのプラズマガスを発生させ、上記Fe基合
金粉末を2g /+einで供給し、100Torrの
圧力雰囲気の下でアルミニウムマンドレルを溶射距離2
00■の位置に保ち、トラバース速度を12m/sin
、アルミニウムマンドレルの回転速度を80Orpmで
回転して溶射した。また、セラミックスの大気プラズマ
溶射条件は、電流を500A、電圧を65Vに調節して
Ar/H2のプラズマガスを発生させ、上記のセラミッ
ク粉末を45g 7wt%で供給し、溶射距離を65m
+sに保持し、トラバース速度を12m/sin、アル
ミニウムマンドレルの回転速度を80Orpmで回転し
て溶射した。Nbの大気プラズマ溶射条件は、電流を5
0OA、電圧を65Vに調節してA r/H、のプラズ
マガスを発生させ、上記Nb粉末を30g /ll1n
で供給し、溶射距離を1001に保持し、トラバース速
度を124m園/1n1アルミニウムマンドレルの回転
速度を12Orpmで回転して溶射した。その後、スラ
スタ内部のアルミニウムマンドレルを苛性ソーダ水溶液
と硝酸水溶液で溶解して除去した。このようにして得タ
コーティング皮膜を有するスラスタは、温度1200℃
、圧力1500Kg/am’で5時間HIP処理を施し
た。First, the core of the thruster is formed of aluminum, and the surface of the aluminum mandrel is coated with a low-pressure 7' plasma spraying method.
Cr24vt%, A18vt%, Y 0.5wt%,
0.05m by thermal spraying Fe-based alloy powder consisting of balance Fe
A dense film with a thickness of m is formed, and then ceramics (ZrO, /Y, 03 = 92 /
8) Thermal barrier of 0.3 nIe and thickness 2.0 nIe
A strength member film of Nb is sequentially formed, and further the above Fe
The base alloy powder was similarly sprayed to form a dense film with a thickness of 0.05+I1 m. The conditions for the low-pressure plasma spraying method were to generate Ar/He plasma gas by adjusting the current to 90OA and the voltage to 4[IV], supplying the Fe-based alloy powder at 2g/+ein, and applying a pressure of 100Torr. Spraying distance 2 on aluminum mandrel under pressure atmosphere
Maintain the position at 00■ and set the traverse speed to 12m/sin.
Thermal spraying was carried out by rotating an aluminum mandrel at a rotation speed of 80 rpm. In addition, the atmospheric plasma spraying conditions for ceramics were to generate Ar/H2 plasma gas by adjusting the current to 500A and voltage to 65V, supplying the above ceramic powder at 45g 7wt%, and spraying distance to 65m.
+s, the traverse speed was 12 m/sin, and the aluminum mandrel was rotated at a rotation speed of 80 rpm for thermal spraying. The atmospheric plasma spraying conditions for Nb are as follows:
0OA, the voltage was adjusted to 65V to generate Ar/H plasma gas, and the above Nb powder was added at 30g/ll1n.
The spraying distance was maintained at 1001, and the traverse speed was 124 m/1n1, and the rotation speed of the 1n1 aluminum mandrel was rotated at 12 Orpm. Thereafter, the aluminum mandrel inside the thruster was dissolved and removed with a caustic soda aqueous solution and a nitric acid aqueous solution. The thruster with the coating obtained in this way can be heated to a temperature of 1200°C.
, HIP treatment was performed for 5 hours at a pressure of 1500 kg/am'.
その後、Fe基合金コーティング皮膜を塩酸と硝酸の混
合溶液で溶解して除去し、溶射成形体の高品質のスラス
タ製品を得ることができた。Thereafter, the Fe-based alloy coating film was removed by dissolving it in a mixed solution of hydrochloric acid and nitric acid, and a high-quality thruster product of the thermally sprayed molded body could be obtained.
(発明の効果)
本発明は、上記の構成を採用することにより、小さな穴
径を有したり、湾曲した複雑な形状の成形体についても
容易に)IIP処理をすることができ、高品質の旧P処
理成形体を得ることができるようになった。(Effects of the Invention) By employing the above configuration, the present invention can easily perform IIP treatment even on molded bodies with small hole diameters or curved and complicated shapes, resulting in high quality. It is now possible to obtain former P-treated molded bodies.
第1図は本発明のHIP処理の手順を示した説明図であ
る。FIG. 1 is an explanatory diagram showing the procedure of HIP processing of the present invention.
Claims (1)
ーティング層を形成し、その上に目的物質の皮膜を形成
し、さらに、その上に低圧プラズマ溶射法で緻密なコー
ティング層を形成した後、上記の金型を溶解して除去し
、次いで、不活性ガスによる熱間静水圧加圧処理を施す
ことを特徴とする熱間静水圧加圧処理法。After forming a dense coating layer on the meltable mold using low-pressure plasma spraying, forming a film of the target substance on top of that, and then forming a dense coating layer on top of that using low-pressure plasma spraying, . A hot isostatic pressure treatment method, which comprises melting and removing the mold, and then subjecting it to hot isostatic pressure treatment using an inert gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2230536A JP2734484B2 (en) | 1990-09-03 | 1990-09-03 | Hot isostatic pressing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2230536A JP2734484B2 (en) | 1990-09-03 | 1990-09-03 | Hot isostatic pressing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04116107A true JPH04116107A (en) | 1992-04-16 |
JP2734484B2 JP2734484B2 (en) | 1998-03-30 |
Family
ID=16909293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2230536A Expired - Fee Related JP2734484B2 (en) | 1990-09-03 | 1990-09-03 | Hot isostatic pressing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2734484B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0693405A (en) * | 1992-07-24 | 1994-04-05 | Mitsubishi Materials Corp | Production of thin hollow metallic article |
WO1997048601A3 (en) * | 1996-06-06 | 1998-04-09 | Allied Signal Inc | Method for making a rhenium rocket nozzle |
WO2002060620A1 (en) * | 2001-01-31 | 2002-08-08 | G.T. Equipment Technologies Inc. | Method of producing shaped bodies of semiconductor materials |
US7553385B2 (en) | 2004-11-23 | 2009-06-30 | United Technologies Corporation | Cold gas dynamic spraying of high strength copper |
JP2009299185A (en) * | 2008-04-28 | 2009-12-24 | Boeing Co:The | Built-up composite structure with graded coefficient of thermal expansion for extreme environment application |
CN105458265A (en) * | 2015-11-14 | 2016-04-06 | 华中科技大学 | Recoverable and reusable molding control mold core for hot isostatic pressing, manufacturing method thereof and application thereof |
-
1990
- 1990-09-03 JP JP2230536A patent/JP2734484B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0693405A (en) * | 1992-07-24 | 1994-04-05 | Mitsubishi Materials Corp | Production of thin hollow metallic article |
WO1997048601A3 (en) * | 1996-06-06 | 1998-04-09 | Allied Signal Inc | Method for making a rhenium rocket nozzle |
WO2002060620A1 (en) * | 2001-01-31 | 2002-08-08 | G.T. Equipment Technologies Inc. | Method of producing shaped bodies of semiconductor materials |
US7553385B2 (en) | 2004-11-23 | 2009-06-30 | United Technologies Corporation | Cold gas dynamic spraying of high strength copper |
JP2009299185A (en) * | 2008-04-28 | 2009-12-24 | Boeing Co:The | Built-up composite structure with graded coefficient of thermal expansion for extreme environment application |
CN105458265A (en) * | 2015-11-14 | 2016-04-06 | 华中科技大学 | Recoverable and reusable molding control mold core for hot isostatic pressing, manufacturing method thereof and application thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2734484B2 (en) | 1998-03-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |