JPH0410556Y2 - - Google Patents
Info
- Publication number
- JPH0410556Y2 JPH0410556Y2 JP5298989U JP5298989U JPH0410556Y2 JP H0410556 Y2 JPH0410556 Y2 JP H0410556Y2 JP 5298989 U JP5298989 U JP 5298989U JP 5298989 U JP5298989 U JP 5298989U JP H0410556 Y2 JPH0410556 Y2 JP H0410556Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- furnace
- electronic components
- shaped
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 36
- 230000007246 mechanism Effects 0.000 claims description 19
- 239000011810 insulating material Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 description 8
- 238000007789 sealing Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Tunnel Furnaces (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5298989U JPH0410556Y2 (ko) | 1989-05-10 | 1989-05-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5298989U JPH0410556Y2 (ko) | 1989-05-10 | 1989-05-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02144394U JPH02144394U (ko) | 1990-12-07 |
| JPH0410556Y2 true JPH0410556Y2 (ko) | 1992-03-16 |
Family
ID=31573778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5298989U Expired JPH0410556Y2 (ko) | 1989-05-10 | 1989-05-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0410556Y2 (ko) |
-
1989
- 1989-05-10 JP JP5298989U patent/JPH0410556Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02144394U (ko) | 1990-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0480181B1 (en) | Method and apparatus for batch processing of a semiconductor wafer | |
| KR100697426B1 (ko) | 열적 프로파일 향상 대류로 | |
| US8814563B2 (en) | Substrate heating apparatus and method and coating and developing system | |
| EP0908928B1 (en) | Baking furnace and control method therefor | |
| KR940701531A (ko) | 전자 부품이 설비된 리드프레임용 매거진을 열처리하기 위한 장치 | |
| KR950702087A (ko) | 고성능 수평 확산로 시스템(high performance horizontal diffusion furnacs system) | |
| US7935188B2 (en) | Vertical thermal processing apparatus and method of using the same | |
| JPH0410556Y2 (ko) | ||
| EP1029625A2 (en) | Muffle convection brazing and annealing system and method | |
| JPH0252197B2 (ko) | ||
| JP2000055564A (ja) | ロ―ラ―ハ―スキルン | |
| JP6491216B2 (ja) | 対流加熱及び放射加熱を用いた炉 | |
| JP3461434B2 (ja) | ガラス基板の冷却装置 | |
| US6715662B2 (en) | Waste energy recovery system for a controlled atmosphere system | |
| JP3987064B2 (ja) | 熱処理装置 | |
| CN1194594C (zh) | 软钎焊方法及其装置 | |
| JP6382321B2 (ja) | 密閉温度被制御部を備えた炉 | |
| JP3017786B2 (ja) | 熱処理装置 | |
| JPH0622358U (ja) | 焼鈍炉 | |
| JPH07161652A (ja) | 高温熱処理炉及び炉内搬送装置 | |
| JPH07159768A (ja) | 連続熱処理装置 | |
| US6306214B1 (en) | Molten metal immersion bath for wire fabrication | |
| JPH03213991A (ja) | 連続処理装置 | |
| JPH01239378A (ja) | 乾燥装置 | |
| JPH03247988A (ja) | 連続処理装置 |