JPH0392775U - - Google Patents
Info
- Publication number
- JPH0392775U JPH0392775U JP77190U JP77190U JPH0392775U JP H0392775 U JPH0392775 U JP H0392775U JP 77190 U JP77190 U JP 77190U JP 77190 U JP77190 U JP 77190U JP H0392775 U JPH0392775 U JP H0392775U
- Authority
- JP
- Japan
- Prior art keywords
- chemical liquid
- vapor
- chemical
- carrier gas
- surface treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 12
- 238000004381 surface treatment Methods 0.000 claims description 6
- 239000012159 carrier gas Substances 0.000 claims description 5
- 230000008016 vaporization Effects 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 239000012071 phase Substances 0.000 claims description 4
- 239000012808 vapor phase Substances 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000006200 vaporizer Substances 0.000 claims 2
- 238000009834 vaporization Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
第１図ないし第５図は本考案の実施例に係り、
第１図は気相表面処理装置用の薬液気化装置の概
略構成を示した一部破断斜視図、第２図は第１図
の−矢視断面図、第３図ないし第４図は気流
発生構造の変形例を示した断面図、第５図は実施
例に係る薬液気化装置を用いた気相表面処理装置
の概略構成図である。第６図は従来の薬液気化装
置を用いた気相表面処理装置の概略構成図である
。
１０……薬液気化装置、１１……容器本体、１
２……ヒータ、１３……薬液流入部、１４……キ
ヤリアガス流入部、１５……薬液蒸気流出部、１
６……冷却機構。
1 to 5 relate to embodiments of the present invention,
Fig. 1 is a partially cutaway perspective view showing the schematic configuration of a chemical vaporization device for a gas phase surface treatment device, Fig. 2 is a sectional view taken along the - arrow in Fig. 1, and Figs. 3 and 4 show air flow generation. FIG. 5, which is a sectional view showing a modification of the structure, is a schematic configuration diagram of a vapor phase surface treatment apparatus using a chemical liquid vaporization apparatus according to an embodiment. FIG. 6 is a schematic diagram of a vapor phase surface treatment apparatus using a conventional chemical liquid vaporization apparatus. 10... Chemical liquid vaporization device, 11... Container body, 1
2... Heater, 13... Chemical liquid inflow part, 14... Carrier gas inflow part, 15... Chemical liquid vapor outflow part, 1
6... Cooling mechanism.
Claims (1)
とともに気相処理室へ供給し、 気相処理室内に収容した被処理基板に薬液の蒸
気を接触させることにより、 被処理基板に所要の気相表面処理を施す気相表
面処理装置用の薬液気化装置であつて、 薬液が流入される薬液流入部と、キヤリアガス
が流入されるキヤリアガス流入部と、キヤリアガ
スと混合された薬液蒸気が流出される薬液蒸気流
出部とを有する気密な内部空間を備えた容器本体
と、 前記容器本体に流入された薬液を加熱する加熱
手段と、 前記容器本体に流入されたキヤリアガスをその
流入された勢いで前記容器本体の内部空間で渦巻
状の気流に変える気流発生構造と、 前記容器本体の内部空間に連通する薬液流入部
の末端に配設された冷却手段と、 を備えたことを特徴とする気相表面処理装置用の
薬液気化装置。[Scope of Claim for Utility Model Registration] By vaporizing a chemical solution, supplying the vapor of the chemical solution together with a carrier gas to a vapor phase processing chamber, and bringing the vapor of the chemical solution into contact with a substrate to be processed housed in the vapor phase processing chamber, A chemical liquid vaporizer for a gas phase surface treatment apparatus that performs a required gas phase surface treatment on a substrate, which comprises a chemical liquid inlet into which a chemical liquid flows, a carrier gas inlet into which a carrier gas flows, and a chemical liquid mixed with the carrier gas. A container body having an airtight internal space having a chemical liquid vapor outlet portion through which vapor flows out; heating means for heating the chemical liquid that has flowed into the container body; and a cooling means disposed at an end of a chemical liquid inflow portion communicating with the internal space of the container body. Chemical vaporizer for gas phase surface treatment equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP77190U JPH0726365Y2 (en) | 1990-01-08 | 1990-01-08 | Chemical liquid vaporizer for vapor phase surface treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP77190U JPH0726365Y2 (en) | 1990-01-08 | 1990-01-08 | Chemical liquid vaporizer for vapor phase surface treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0392775U true JPH0392775U (en) | 1991-09-20 |
| JPH0726365Y2 JPH0726365Y2 (en) | 1995-06-14 |
Family
ID=31504713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP77190U Expired - Lifetime JPH0726365Y2 (en) | 1990-01-08 | 1990-01-08 | Chemical liquid vaporizer for vapor phase surface treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0726365Y2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007053186A (en) * | 2005-08-17 | 2007-03-01 | Sumitomo Chemical Co Ltd | Organic metal compound supplying vessel |
| JP2011124457A (en) * | 2009-12-14 | 2011-06-23 | Mitsubishi Electric Corp | Solder bonding device |
| JP2012169671A (en) * | 2012-05-28 | 2012-09-06 | Watanabe Shoko:Kk | Vaporizer |
| JP2018050040A (en) * | 2016-09-08 | 2018-03-29 | 東京エレクトロン株式会社 | Vortical atomization nozzle assembly, carburetor, and related method for substrate processing system |
| JP2022055313A (en) * | 2020-09-28 | 2022-04-07 | 株式会社Kokusai Electric | Vaporization system, substrate processing apparatus, and method for manufacturing semiconductor device |
-
1990
- 1990-01-08 JP JP77190U patent/JPH0726365Y2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007053186A (en) * | 2005-08-17 | 2007-03-01 | Sumitomo Chemical Co Ltd | Organic metal compound supplying vessel |
| JP4710481B2 (en) * | 2005-08-17 | 2011-06-29 | 住友化学株式会社 | Organometallic compound supply container |
| JP2011124457A (en) * | 2009-12-14 | 2011-06-23 | Mitsubishi Electric Corp | Solder bonding device |
| JP2012169671A (en) * | 2012-05-28 | 2012-09-06 | Watanabe Shoko:Kk | Vaporizer |
| JP2018050040A (en) * | 2016-09-08 | 2018-03-29 | 東京エレクトロン株式会社 | Vortical atomization nozzle assembly, carburetor, and related method for substrate processing system |
| JP2022055313A (en) * | 2020-09-28 | 2022-04-07 | 株式会社Kokusai Electric | Vaporization system, substrate processing apparatus, and method for manufacturing semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0726365Y2 (en) | 1995-06-14 |
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