JPH0390430U - - Google Patents
Info
- Publication number
- JPH0390430U JPH0390430U JP15242889U JP15242889U JPH0390430U JP H0390430 U JPH0390430 U JP H0390430U JP 15242889 U JP15242889 U JP 15242889U JP 15242889 U JP15242889 U JP 15242889U JP H0390430 U JPH0390430 U JP H0390430U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- rotating shaft
- opening slot
- spinner device
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
Description
図面は本考案の実施例を示し、第１図は縦断正
面図、第２図は第１図の−視平断面図である
。
１……カバー槽、２……回転軸、２ａ……回転
軸の軸線、３……ウエハー、４……ウエハー装着
部、５……薬液供給管、６……外カバー体、７…
…排出口、８……開口溝孔。
The drawings show an embodiment of the present invention, and FIG. 1 is a longitudinal sectional front view, and FIG. 2 is a plan sectional view taken from - in FIG. 1. DESCRIPTION OF SYMBOLS 1... Cover tank, 2... Rotating shaft, 2a... Axis of rotating shaft, 3... Wafer, 4... Wafer attachment part, 5... Chemical solution supply pipe, 6... Outer cover body, 7...
...Discharge port, 8... Opening slot.
Claims (1)
りに回転するようにした回転軸を配設し、該回転
軸の上端に、ウエハーを水平の状態で装着するた
めの装着部を設けて成るスピンナー装置において
、前記カバー槽における内壁面のうち前記ウエハ
ーの周囲から飛散する薬液が当たる部位に、開口
溝孔を、ウエハーの円周方向に沿つて延びるよう
に穿設する一方、前記カバー槽の外周面に、前記
開口溝孔に対する外カバー体を設けたことを特徴
とするウエハーにおけるスピンナー装置。 A rotating shaft whose axis is vertical and rotates around this axis is disposed in the cover tank, and a mounting portion for mounting the wafer in a horizontal state is provided at the upper end of the rotating shaft. In the spinner device, an opening slot is formed extending along the circumferential direction of the wafer in a portion of the inner wall surface of the cover tank that is hit by a chemical liquid scattered from around the wafer, A spinner device for a wafer, characterized in that an outer cover body for the opening slot is provided on the outer peripheral surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15242889U JPH0390430U (en) | 1989-12-28 | 1989-12-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15242889U JPH0390430U (en) | 1989-12-28 | 1989-12-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0390430U true JPH0390430U (en) | 1991-09-13 |
Family
ID=31698694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15242889U Pending JPH0390430U (en) | 1989-12-28 | 1989-12-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0390430U (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4863709A (en) * | 1971-11-20 | 1973-09-04 | ||
| JPS525269A (en) * | 1975-07-02 | 1977-01-14 | Hitachi Ltd | Rotary coating device |
| JPS61176120A (en) * | 1985-01-31 | 1986-08-07 | Nec Corp | Developing device for photoresist |
-
1989
- 1989-12-28 JP JP15242889U patent/JPH0390430U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4863709A (en) * | 1971-11-20 | 1973-09-04 | ||
| JPS525269A (en) * | 1975-07-02 | 1977-01-14 | Hitachi Ltd | Rotary coating device |
| JPS61176120A (en) * | 1985-01-31 | 1986-08-07 | Nec Corp | Developing device for photoresist |