JPH0375529U - - Google Patents

Info

Publication number
JPH0375529U
JPH0375529U JP13535389U JP13535389U JPH0375529U JP H0375529 U JPH0375529 U JP H0375529U JP 13535389 U JP13535389 U JP 13535389U JP 13535389 U JP13535389 U JP 13535389U JP H0375529 U JPH0375529 U JP H0375529U
Authority
JP
Japan
Prior art keywords
wavelength
exposure
exposure apparatus
laminated lens
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13535389U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13535389U priority Critical patent/JPH0375529U/ja
Publication of JPH0375529U publication Critical patent/JPH0375529U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はこの考案の一実施例である露光装置の
概略構成を示す説明図、第２図は第１図に設けら
れたフイルタの波長−透過率の特性を示す特性曲
線図である。 図中、１……ランプ、２……楕円集光鏡、３，
６……平面鏡、４……フイルタ、５……インテグ
レータレンズ、７……コンデンサレンズ、８……
マスク、９……貼合わせレンズ、１０……ワーク
。 FIG. 1 is an explanatory diagram showing the schematic structure of an exposure apparatus which is an embodiment of the invention, and FIG. 2 is a characteristic curve diagram showing the wavelength-transmittance characteristic of the filter provided in FIG. 1. In the figure, 1... lamp, 2... elliptical condensing mirror, 3,
6...Plane mirror, 4...Filter, 5...Integrator lens, 7...Condenser lens, 8...
Mask, 9...Laminated lens, 10...Work.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 放射光成分に露光波長よりも短い遠紫外線を含
むランプと、貼合わせレンズとを具備した露光装
置において、前記ランプと貼合わせレンズとの間
の光路上に、露光波長よりも短い所定の波長以下
の光を反射または吸収するフイルタが設けられて
なることを特徴とする露光装置。 In an exposure apparatus equipped with a lamp whose emitted light component includes deep ultraviolet rays shorter than the exposure wavelength, and a laminated lens, an ultraviolet ray having a predetermined wavelength or less shorter than the exposure wavelength is placed on the optical path between the lamp and the laminated lens. An exposure apparatus comprising a filter that reflects or absorbs light.
JP13535389U 1989-11-24 1989-11-24 Pending JPH0375529U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13535389U JPH0375529U (en) 1989-11-24 1989-11-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13535389U JPH0375529U (en) 1989-11-24 1989-11-24

Publications (1)

Publication Number Publication Date
JPH0375529U true JPH0375529U (en) 1991-07-29

Family

ID=31682624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13535389U Pending JPH0375529U (en) 1989-11-24 1989-11-24

Country Status (1)

Country Link
JP (1) JPH0375529U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015018972A (en) * 2013-07-11 2015-01-29 キヤノン株式会社 Imprint apparatus and method for manufacturing article
JP2018205682A (en) * 2017-06-06 2018-12-27 株式会社オーク製作所 Exposure apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139517A (en) * 1984-07-30 1986-02-25 Hitachi Ltd Lighting device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139517A (en) * 1984-07-30 1986-02-25 Hitachi Ltd Lighting device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015018972A (en) * 2013-07-11 2015-01-29 キヤノン株式会社 Imprint apparatus and method for manufacturing article
US9625837B2 (en) 2013-07-11 2017-04-18 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP2018205682A (en) * 2017-06-06 2018-12-27 株式会社オーク製作所 Exposure apparatus

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