JPH037391Y2 - - Google Patents
Info
- Publication number
- JPH037391Y2 JPH037391Y2 JP17242184U JP17242184U JPH037391Y2 JP H037391 Y2 JPH037391 Y2 JP H037391Y2 JP 17242184 U JP17242184 U JP 17242184U JP 17242184 U JP17242184 U JP 17242184U JP H037391 Y2 JPH037391 Y2 JP H037391Y2
- Authority
- JP
- Japan
- Prior art keywords
- flat
- rotating
- recessed hole
- flat member
- plunger
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Description
【考案の詳細な説明】
（産業上の利用分野）
本考案は、スパツタリング装置、真空蒸着装
置、ドライエツチング装置等の真空処理装置に適
用される部材係着装置に関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a member fastening device that is applied to vacuum processing equipment such as sputtering equipment, vacuum evaporation equipment, and dry etching equipment.
（従来の技術）
従来、例えばスパツタリング装置に於ては、第
１図示のように、真空室ａ内に設けられた平板電
極から成る取付部材ｂの前面ｃに、処理されるべ
き基板ｆを設けた略平坦な基板ホルダｄを蝶番ｅ
とボルトｇとで取付け、基板ｆのスパツタ処理が
終ると該ボルトｇを取外し、基板ホルダｄを傾け
て基板ｆを取出すか又は基板ホルダをボルトのみ
で固定し、取外すときはボルトを取外して行なう
ことを一般とする。(Prior Art) Conventionally, in a sputtering apparatus, for example, a substrate f to be processed is placed on the front surface c of a mounting member b made of a flat plate electrode provided in a vacuum chamber a, as shown in the first diagram. A substantially flat substrate holder d is attached to a hinge e.
and bolts g, and when the sputtering process of the board f is completed, remove the bolt g, tilt the board holder d and take out the board f, or fix the board holder with only the bolts, and remove the bolts when removing. Generally speaking.
（考案が解決しようとする問題点）
前記した従来のものは機構が簡略ではあるがボ
ルトｇを取外す作業を伴い作業性が悪い欠点があ
り、処理を終えた基板を自動的に交換することが
出来ない不都合がある。またスパツタリング装置
のようにプラズマ放電を発生させる装置では取付
部材ｂとこれに取付けた基板ホルダｄは電界の不
均一を生じないように一体的な平坦面になるよう
にまた基板ホルダ及び取付部材内のすき間やギヤ
ツプを出来る限り少なくするように構成する必要
があり、把持個所の少ない平坦な基板ホルダｄを
平板状の取付部材ｂに自在に着脱することは困難
である。(Problems to be solved by the invention) Although the above-mentioned conventional method has a simple mechanism, it has the disadvantage of poor workability as it involves the work of removing the bolt g, and it is not possible to automatically replace the board after processing. There are some inconveniences that I can't do. In addition, in a device that generates plasma discharge such as a sputtering device, the mounting member b and the substrate holder d attached thereto are arranged so that they form an integral flat surface to prevent uneven electric fields. Therefore, it is difficult to freely attach and detach the flat substrate holder d, which has few gripping points, to the flat mounting member b.
本考案は上記欠点等を解消した着脱が容易で構
成が簡単な真空処理装置の係着装置を提供するこ
とを目的とするものである。 SUMMARY OF THE INVENTION An object of the present invention is to provide a fixing device for a vacuum processing apparatus that eliminates the above-mentioned drawbacks, is easy to attach and detach, and has a simple structure.
（問題点を解決するための手段）
本考案では、スパツタリング装置等の真空処理
装置に設けられた平板電極その他の平坦面を有す
る取付部材の前面に、トレー、基板ホルダ等の平
坦部材を係脱自在に取付けするようにしたものに
於いて、該平坦部材の周面に凹孔を形成し、該取
付部材に該平坦部材の周面に沿つて回転自在で且
つ前記凹孔と係合するスプリングプランジヤを備
えた回転部材を設け、該プランジヤが該平坦部材
の凹孔と係合する取付位置より前方へ該回転部材
が回転するを防止するストツパを設けるようにし
た。(Means for solving the problem) In the present invention, a flat member such as a tray or a substrate holder is attached to and detached from the front surface of a flat plate electrode or other mounting member having a flat surface provided in a vacuum processing apparatus such as a sputtering apparatus. A recessed hole is formed in the peripheral surface of the flat member, and a spring is provided in the mounting member that is rotatable along the peripheral surface of the flat member and engages with the recessed hole. A rotating member having a plunger is provided, and a stopper is provided to prevent the rotating member from rotating forward from a mounting position where the plunger engages with a recessed hole in the flat member.
（作用）
平板電極の取付部材の前面に、平坦な基板ホル
ダ等の平坦部材が蝶番により開閉自在に取付けら
れている場合、該平坦部材を該前面に沿わせるよ
うに揺動させることは第１図示の場合と同様であ
るが、本考案のものでは該平坦部材が該前面に接
近すると該平坦部材の周面が回転部材のスプリン
グプランジヤを押し上げ、該前面と平坦部材とが
当接したとき周面の凹孔にスプリングプランジヤ
が係合して平坦部材は取付部材に取付けされる。
該回転部材はストツパにより凹孔とスプリングプ
ランジヤが係合する位置から前方への回転が防止
されているので平坦部材は凹孔とスプリングプラ
ンジヤの係合力を越える力が作用しない限り外れ
ることがない。尚、回転部材は平坦部材の取付け
に際して人手又は機械的プツシヤー等により回転
しないように押えられる。該平坦部材を取付部材
から開くように揺動させるには回転部材を強制的
にストツパで制限される回転方向と逆の方向に回
転させることにより行なわれ、その回転によれ
ば、スプリングプランジヤが平坦部材の周面の凹
孔から乗り上げて係合が外れるので例えば該周面
に手を掛けて引けば該平坦部材を取付部材の前面
から外すことが出来る。人手の代わりに機械によ
り回転部材の回転を制御し、平坦部材に揺動等を
与え、自動化することも可能である。(Function) When a flat member such as a flat substrate holder is attached to the front surface of the flat plate electrode mounting member with a hinge so that it can be opened and closed, the first step is to swing the flat member along the front surface. The case is similar to that shown in the figure, but in the case of the present invention, when the flat member approaches the front surface, the peripheral surface of the flat member pushes up the spring plunger of the rotating member, and when the front surface and the flat member abut, the peripheral surface of the flat member pushes up the spring plunger of the rotating member. The flat member is attached to the mounting member by engaging the spring plunger in the recessed hole in the surface.
Since the rotating member is prevented from rotating forward from the position where the recessed hole and the spring plunger engage with each other by the stopper, the flat member will not come off unless a force exceeding the engagement force between the recessed hole and the spring plunger is applied. Incidentally, the rotating member is held down so as not to rotate by hand or mechanical pusher when the flat member is attached. The flat member is swung open from the mounting member by forcibly rotating the rotary member in a direction opposite to the direction of rotation limited by the stopper, and this rotation causes the spring plunger to become flat. Since the flat member rides on the recessed hole in the peripheral surface of the member and is disengaged, the flat member can be removed from the front surface of the mounting member by, for example, placing a hand on the peripheral surface and pulling it. It is also possible to automate the process by controlling the rotation of the rotary member by a machine instead of manually, giving swinging, etc. to the flat member.
（実施例） 本考案の実施例を図面につき説明する。(Example) Embodiments of the present invention will be described with reference to the drawings.
第２図乃至第４図に於いて、１はスパツタリン
グ装置等の真空処理装置の真空室内に設けられた
平板電極からなる取付部材、２は該取付部材１の
平坦な前面、３は該取付部材１に蝶番４で開閉自
在に取付けしたトレー又は基板ホルダ等の平坦部
材を示す。真空処理例えばスパツタリングされる
シリコンウエハ６は該平坦部材３に形成した開孔
５内に収められ、該前面２に該平坦部材３を重合
させたのち取付部材１に通電し、プラズマ放電に
より処理される。 In FIGS. 2 to 4, 1 is a mounting member made of a flat plate electrode provided in a vacuum chamber of a vacuum processing device such as a sputtering device, 2 is a flat front surface of the mounting member 1, and 3 is the mounting member. 1 shows a flat member such as a tray or a substrate holder attached with a hinge 4 so as to be openable and closable. A silicon wafer 6 to be subjected to vacuum treatment, for example sputtering, is placed in an opening 5 formed in the flat member 3, and after the flat member 3 is superimposed on the front surface 2, the mounting member 1 is energized and processed by plasma discharge. Ru.
７は該平坦部材３の周面８に形成した凹孔、９
は支軸１０，１０で取付部材１に取付けられ且つ
該周面８に沿つて回転自在の回転部材、１１は該
回転部材９内のスプリング１２とこれに押されて
出没可能なボール１３とで構成されたスプリング
プランジヤで、図示の場合該回転部材９に取付部
材１と当接して回転を防止するストツパ１４を設
けるようにした。 7 is a concave hole formed in the peripheral surface 8 of the flat member 3;
1 is a rotating member that is attached to the mounting member 1 with support shafts 10 and 10 and is rotatable along the circumferential surface 8; 11 is a spring 12 in the rotating member 9 and a ball 13 that can be moved in and out by being pushed by the spring 12; In the illustrated spring plunger, the rotating member 9 is provided with a stopper 14 that comes into contact with the mounting member 1 to prevent rotation.
該平坦部材３には取付部材１から離した状態で
処理されるシリコンウエア６が収められ、取付部
材１の前面２に重合するように平坦部材３を閉じ
ることにより取付け、真空処理の用意がなされる
が、該平坦部材３を閉じる際に回転部材９が回転
しないように抑えておけば、周面８でスプリング
プランジヤ先端のボール１３を押し乍ら平坦部材
３は閉じ、該前面２と重合するに至るとスプリン
グプランジヤ１１と凹孔７が係合する。回転部材
９はストツパ１４により前方への回転が阻止され
ているので一旦取付けられた平坦部材３はスプリ
ングプランジヤ１１と凹孔７との係合力を越える
力が平坦部材３もしくは回転部材９に作用しない
限り、不用意外れることがない。 The flat member 3 houses the silicone ware 6 that is to be processed while being separated from the mounting member 1, and is mounted by closing the flat member 3 so as to overlap the front surface 2 of the mounting member 1, and is prepared for vacuum processing. However, if the rotating member 9 is prevented from rotating when the flat member 3 is closed, the flat member 3 will close while pressing the ball 13 at the tip of the spring plunger with the peripheral surface 8 and overlap with the front surface 2. When the spring plunger 11 reaches , the spring plunger 11 and the recessed hole 7 engage with each other. Since the rotating member 9 is prevented from rotating forward by the stopper 14, once the flat member 3 is attached, no force exceeding the engagement force between the spring plunger 11 and the recessed hole 7 will act on the flat member 3 or the rotating member 9. As long as it doesn't come off accidentally.
該平坦部材３を外す場合、第４図に矢印で示す
ように回転部材９にプランジヤ１１が後方に回転
するような力を与えれば凹孔７との係合からプラ
ンジヤ１１が外れ、平坦部材３に前方へ開くよう
に小さな力を与えて揺動させることが出来る。 When removing the flat member 3, if a force is applied to the rotary member 9 to rotate the plunger 11 backward as shown by the arrow in FIG. It is possible to apply a small amount of force to swing the door so that it opens forward.
該取付部材１から平坦部材３を取外す必要があ
る場合、蝶番４に代え第５図示のように取付部材
１と平坦部材３を溝１５と爪片１６で係止し、或
は第６図示のように、取付部材１に対称的に回転
部材９，９を配置し、各プランジヤ１１，１１を
平坦部材３の対応する凹孔７，７に係合させるよ
うに構成される。図面で１７は平坦部材３の周面
８に着脱可能に取付けたプランジヤ受けを示し、
プランジヤ１１との摩擦で損耗すると交換出来る
ようにした。 When it is necessary to remove the flat member 3 from the mounting member 1, instead of using the hinge 4, the mounting member 1 and the flat member 3 are engaged with the groove 15 and the claw piece 16 as shown in the fifth figure, or as shown in the sixth figure. The rotating members 9, 9 are arranged symmetrically on the mounting member 1, and each plunger 11, 11 is configured to engage with a corresponding recess 7, 7 of the flat member 3. In the drawing, 17 indicates a plunger receiver detachably attached to the peripheral surface 8 of the flat member 3,
It is designed so that it can be replaced when it wears out due to friction with the plunger 11.
（考案の効果）
このように本考案によるときは、平坦部材の周
面に形成した凹孔に、取付部材に回転自在に設け
た回転部材のスプリングプランジヤを係合させ、
該回転部材をストツパで平坦部材の取付位置から
前方に回転しないようにしたので、前面に引つ掛
りのない部材同士を簡単に係着出来、係着の自動
化も可能で作業性が向上する等の効果がある。(Effect of the invention) As described above, according to the invention, the spring plunger of the rotating member rotatably provided on the mounting member is engaged with the concave hole formed in the peripheral surface of the flat member,
Since the rotating member is prevented from rotating forward from the mounting position of the flat member with a stopper, members that do not get caught on the front can be easily engaged with each other, and the engagement can be automated, improving work efficiency, etc. There is an effect.
第１図は従来例の一部截断側面図、第２図は本
考案の実施例の正面図、第３図はその平面図、第
４図は第２図の−線部分の一部を省略した拡
大断面図、第５図及び第６図は本考案の他の実施
例の一部を省略した断面図である。
１……取付部材、２……前面、３……平坦部
材、７……凹孔、８……周面、９……回転部材、
１１……スプリングプランジヤ、１４……ストツ
パ。
Fig. 1 is a partially cut-away side view of the conventional example, Fig. 2 is a front view of the embodiment of the present invention, Fig. 3 is a plan view thereof, and Fig. 4 partially omits the - line part in Fig. 2. The enlarged sectional view, FIGS. 5 and 6 are sectional views with some parts omitted of other embodiments of the present invention. DESCRIPTION OF SYMBOLS 1...Mounting member, 2...Front surface, 3...Flat member, 7...Recessed hole, 8...Surrounding surface, 9...Rotating member,
11...Spring plunger, 14...Stopper.
Claims (1)
れた平板電極その他の平坦面を有する取付部材の
前面に、トレー、基板ホルダ等の平坦部材を係脱
自在に取付けするようにしたものに於いて、該平
坦部材の周面に凹孔を形成し、該取付部材に該平
坦部材の周面に沿つて回転自在で且つ前記凹孔と
係合するスプリングプランジヤを備えた回転部材
を設け、該プランジヤが該平坦部材の凹孔と係合
する取付位置より前方へ該回転部材が回転するを
防止するストツパを設けて成る真空処理装置に於
ける部材係着装置。 In a device in which a flat member such as a tray or a substrate holder is removably attached to the front surface of a flat plate electrode or other attachment member having a flat surface provided in a vacuum processing apparatus such as a sputtering apparatus, A recessed hole is formed in the circumferential surface of the member, and the mounting member is provided with a rotating member that is rotatable along the circumferential surface of the flat member and includes a spring plunger that engages with the recessed hole, and the plunger is attached to the flat member. A member fastening device for a vacuum processing apparatus, comprising a stopper that prevents the rotary member from rotating forward from a mounting position where it engages with a recessed hole in the member.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17242184U JPH037391Y2 (en) | 1984-11-15 | 1984-11-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17242184U JPH037391Y2 (en) | 1984-11-15 | 1984-11-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6190854U JPS6190854U (en) | 1986-06-12 |
| JPH037391Y2 true JPH037391Y2 (en) | 1991-02-25 |
Family
ID=30730087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17242184U Expired JPH037391Y2 (en) | 1984-11-15 | 1984-11-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH037391Y2 (en) |
-
1984
- 1984-11-15 JP JP17242184U patent/JPH037391Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6190854U (en) | 1986-06-12 |
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