JPH0369163B2 - - Google Patents

Info

Publication number: JPH0369163B2
Authority: JP; Japan
Prior art keywords: positive temperature; metal; manufacturing; ozone; temperature coefficient
Prior art date: 1984-06-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP59114492A

Other languages

English (en)

Japanese (ja)

Other versions

JPS60258902A (ja

Inventor

Hitoshi Myake

Takafumi Ishida

Takashi Nakagawa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Idemitsu Kosan Co Ltd

Original Assignee

Idemitsu Kosan Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-06-06

Filing date

1984-06-06

Publication date

1991-10-31

1984-06-06 Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd

1984-06-06 Priority to JP11449284A priority Critical patent/JPS60258902A/ja

1985-12-20 Publication of JPS60258902A publication Critical patent/JPS60258902A/ja

1991-10-31 Publication of JPH0369163B2 publication Critical patent/JPH0369163B2/ja

Status Granted legal-status Critical Current

Links

239000002184 metal Substances 0.000 claims description 20
229910052751 metal Inorganic materials 0.000 claims description 20
229920000642 polymer Polymers 0.000 claims description 13
239000002245 particle Substances 0.000 claims description 12
239000000463 material Substances 0.000 claims description 10
CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 9
238000004519 manufacturing process Methods 0.000 claims description 9
230000003647 oxidation Effects 0.000 claims description 7
238000007254 oxidation reaction Methods 0.000 claims description 7
239000011888 foil Substances 0.000 claims description 4
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
239000011889 copper foil Substances 0.000 claims description 3
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 2
238000000034 method Methods 0.000 description 8
238000004898 kneading Methods 0.000 description 4
239000000203 mixture Substances 0.000 description 4
MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
239000006229 carbon black Substances 0.000 description 3
-1 polyethylene Polymers 0.000 description 3
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
239000004698 Polyethylene Substances 0.000 description 2
238000004132 cross linking Methods 0.000 description 2
239000003431 cross linking reagent Substances 0.000 description 2
230000006866 deterioration Effects 0.000 description 2
239000007789 gas Substances 0.000 description 2
230000000704 physical effect Effects 0.000 description 2
229920000573 polyethylene Polymers 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
239000004952 Polyamide Substances 0.000 description 1
239000004743 Polypropylene Substances 0.000 description 1
241000872198 Serjania polyphylla Species 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
229910052731 fluorine Inorganic materials 0.000 description 1
239000011737 fluorine Substances 0.000 description 1
230000004927 fusion Effects 0.000 description 1
239000011521 glass Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229920001903 high density polyethylene Polymers 0.000 description 1
229920006158 high molecular weight polymer Polymers 0.000 description 1
239000004700 high-density polyethylene Substances 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
238000002156 mixing Methods 0.000 description 1
238000000465 moulding Methods 0.000 description 1
150000001451 organic peroxides Chemical class 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
229920002647 polyamide Polymers 0.000 description 1
229920000098 polyolefin Polymers 0.000 description 1
229920001155 polypropylene Polymers 0.000 description 1
230000005855 radiation Effects 0.000 description 1
239000000523 sample Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
238000010301 surface-oxidation reaction Methods 0.000 description 1
238000003856 thermoforming Methods 0.000 description 1

Landscapes

Thermistors And Varistors (AREA)

JP11449284A 1984-06-06 1984-06-06 高分子正温度特性抵抗体の製造法 Granted JPS60258902A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP11449284A JPS60258902A (ja)	1984-06-06	1984-06-06	高分子正温度特性抵抗体の製造法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP11449284A JPS60258902A (ja)	1984-06-06	1984-06-06	高分子正温度特性抵抗体の製造法

Publications (2)

Publication Number	Publication Date
JPS60258902A JPS60258902A (ja)	1985-12-20
JPH0369163B2 true JPH0369163B2 (de)	1991-10-31

Family

ID=14639111

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP11449284A Granted JPS60258902A (ja)	1984-06-06	1984-06-06	高分子正温度特性抵抗体の製造法

Country Status (1)

Country	Link
JP (1)	JPS60258902A (de)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2009119430A1 (ja)	2008-03-25	2009-10-01	富士フイルム株式会社	平版印刷版の製版方法
EP2145772A2 (de)	2008-07-16	2010-01-20	FUJIFILM Corporation	Verfahren zur Herstellung einer Aluminiumlegierungsplatte für eine lithografische Druckplatte, Aluminiumlegierungsplatte für eine lithografische Druckplatte, lithographische Druckplattenträger und Druckplattenvorläufer
EP2163949A1 (de)	2008-09-12	2010-03-17	FUJIFILM Corporation	Entwickler für Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte
EP2165830A1 (de)	2008-09-22	2010-03-24	Fujifilm Corporation	Lithografiedruckplattenvorläufer und Druckverfahren damit
EP2168767A1 (de)	2008-09-24	2010-03-31	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2168766A1 (de)	2008-09-26	2010-03-31	FUJIFILM Corporation	Verfahren zur Herstellung einer Lithografiedruckplatte
EP2246741A1 (de)	2004-05-19	2010-11-03	Fujifilm Corporation	Bildaufzeichnungsverfahren
EP2295247A1 (de)	2003-07-07	2011-03-16	Fujifilm Corporation	Flachdruckplattenvorläufer und lithographisches Druckverfahren
EP2306246A1 (de)	2005-08-18	2011-04-06	Fujifilm Corporation	Verfahren zur Herstellung von Flachdruckplatten
EP2363748A1 (de)	2010-02-12	2011-09-07	Fujifilm Corporation	Lithographiedruckplattenvorläufer und Plattenherstellungsverfahren dafür
EP2380737A1 (de)	2007-10-29	2011-10-26	Fujifilm Corporation	Lithografiedruckplattenvorläufer
EP2447780A1 (de)	2007-01-17	2012-05-02	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2503393A1 (de)	2006-12-28	2012-09-26	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2592475A1 (de)	2007-02-06	2013-05-15	Fujifilm Corporation	Lichtempfindliche Zusammensetzung, Lithographiedruckplattenvorläufer, Lithographiedruckverfahren und neue Cyaninfarbstoffe

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5738162A (en) *	1980-08-20	1982-03-02	Ricoh Co Ltd	Ink jet recording device

1984
- 1984-06-06 JP JP11449284A patent/JPS60258902A/ja active Granted

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5738162A (en) *	1980-08-20	1982-03-02	Ricoh Co Ltd	Ink jet recording device

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP2295247A1 (de)	2003-07-07	2011-03-16	Fujifilm Corporation	Flachdruckplattenvorläufer und lithographisches Druckverfahren
EP2246741A1 (de)	2004-05-19	2010-11-03	Fujifilm Corporation	Bildaufzeichnungsverfahren
EP2306246A1 (de)	2005-08-18	2011-04-06	Fujifilm Corporation	Verfahren zur Herstellung von Flachdruckplatten
EP2503393A1 (de)	2006-12-28	2012-09-26	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2447780A1 (de)	2007-01-17	2012-05-02	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2447779A1 (de)	2007-01-17	2012-05-02	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2592475A1 (de)	2007-02-06	2013-05-15	Fujifilm Corporation	Lichtempfindliche Zusammensetzung, Lithographiedruckplattenvorläufer, Lithographiedruckverfahren und neue Cyaninfarbstoffe
EP2380737A1 (de)	2007-10-29	2011-10-26	Fujifilm Corporation	Lithografiedruckplattenvorläufer
WO2009119430A1 (ja)	2008-03-25	2009-10-01	富士フイルム株式会社	平版印刷版の製版方法
EP2145772A2 (de)	2008-07-16	2010-01-20	FUJIFILM Corporation	Verfahren zur Herstellung einer Aluminiumlegierungsplatte für eine lithografische Druckplatte, Aluminiumlegierungsplatte für eine lithografische Druckplatte, lithographische Druckplattenträger und Druckplattenvorläufer
EP2163949A1 (de)	2008-09-12	2010-03-17	FUJIFILM Corporation	Entwickler für Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte
EP2165830A1 (de)	2008-09-22	2010-03-24	Fujifilm Corporation	Lithografiedruckplattenvorläufer und Druckverfahren damit
EP2168767A1 (de)	2008-09-24	2010-03-31	Fujifilm Corporation	Verfahren zur Herstellung einer Lithographiedruckplatte
EP2168766A1 (de)	2008-09-26	2010-03-31	FUJIFILM Corporation	Verfahren zur Herstellung einer Lithografiedruckplatte
EP2363748A1 (de)	2010-02-12	2011-09-07	Fujifilm Corporation	Lithographiedruckplattenvorläufer und Plattenherstellungsverfahren dafür

Also Published As

Publication number	Publication date
JPS60258902A (ja)	1985-12-20

Publication	Publication Date	Title
JPH0369163B2 (de)	1991-10-31
US4534889A (en)	1985-08-13	PTC Compositions and devices comprising them
US4775778A (en)	1988-10-04	PTC compositions and devices comprising them
US4304987A (en)	1981-12-08	Electrical devices comprising conductive polymer compositions
GB1604735A (en)	1981-12-16	Ptc compositions and devices comprising them
EP0038718A1 (de)	1981-10-28	Leitfähige Polymer-Zusammensetzung mit Füllstoffen
JPH08512174A (ja)	1996-12-17	導電性ポリマー組成物
JPH0474383B2 (de)	1992-11-26
JPH03208628A (ja)	1991-09-11	正温度係数特性成形体の製造方法
US5817423A (en)	1998-10-06	PTC element and process for producing the same
JPH0342482B2 (de)	1991-06-27
JPS6143633A (ja)	1986-03-03	感熱抵抗性導電性組成物の製造方法
JPH0342483B2 (de)	1991-06-27
JPH0374002B2 (de)	1991-11-25
JPH0453904B2 (de)	1992-08-27
GB2033707A (en)	1980-05-21	Conductive polymer compositions of an electrical device
JPS6080201A (ja)	1985-05-08	感熱抵抗性導電性材料の製造法
KR100614608B1 (ko)	2006-08-21	오존처리된 탄소나노튜브를 함유한 ｐｔｃ 소자용 전도성중합체 조성물 및 이를 이용하여 제조된 ｐｔｃ 소자
JPS61260607A (ja)	1986-11-18	高分子正温度特性抵抗体
JPS6142902A (ja)	1986-03-01	感熱抵抗性導電性組成物の製造法
JPH03426B2 (de)	1991-01-08
JPH0799721B2 (ja)	1995-10-25	Ｐｔｃ組成物の製造法
JPH01186783A (ja)	1989-07-26	正温度特性発熱素子の製造方法
JPS63117401A (ja)	1988-05-21	Ｐｔｃ素子およびその製造法
JPH05175008A (ja)	1993-07-13	Ｐｔｃ抵抗体の製造方法