JPH036914Y2 - - Google Patents
Info
- Publication number
- JPH036914Y2 JPH036914Y2 JP1985138591U JP13859185U JPH036914Y2 JP H036914 Y2 JPH036914 Y2 JP H036914Y2 JP 1985138591 U JP1985138591 U JP 1985138591U JP 13859185 U JP13859185 U JP 13859185U JP H036914 Y2 JPH036914 Y2 JP H036914Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- nozzle
- mask
- vacuum vessel
- compound vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 34
- 230000007547 defect Effects 0.000 claims description 19
- 230000005684 electric field Effects 0.000 claims description 12
- 230000008021 deposition Effects 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 2
- 150000002500 ions Chemical group 0.000 description 10
- 238000000151 deposition Methods 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000840 electrochemical analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985138591U JPH036914Y2 (de) | 1985-09-10 | 1985-09-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985138591U JPH036914Y2 (de) | 1985-09-10 | 1985-09-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62106238U JPS62106238U (de) | 1987-07-07 |
| JPH036914Y2 true JPH036914Y2 (de) | 1991-02-21 |
Family
ID=31043718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985138591U Expired JPH036914Y2 (de) | 1985-09-10 | 1985-09-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH036914Y2 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012008145A (ja) * | 1999-07-09 | 2012-01-12 | Fei Co | 二次イオンの収量を高める方法及び装置 |
-
1985
- 1985-09-10 JP JP1985138591U patent/JPH036914Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012008145A (ja) * | 1999-07-09 | 2012-01-12 | Fei Co | 二次イオンの収量を高める方法及び装置 |
| JP4863593B2 (ja) * | 1999-07-09 | 2012-01-25 | エフ イー アイ カンパニ | 二次イオンの収量を高める方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62106238U (de) | 1987-07-07 |
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