JPH0364457A - Electron gun for vapor deposition with electron beam - Google Patents
Electron gun for vapor deposition with electron beamInfo
- Publication number
- JPH0364457A JPH0364457A JP1200985A JP20098589A JPH0364457A JP H0364457 A JPH0364457 A JP H0364457A JP 1200985 A JP1200985 A JP 1200985A JP 20098589 A JP20098589 A JP 20098589A JP H0364457 A JPH0364457 A JP H0364457A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- electron beam
- coils
- electron beams
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 39
- 238000007740 vapor deposition Methods 0.000 title abstract 3
- 238000004804 winding Methods 0.000 claims abstract 2
- 238000005566 electron beam evaporation Methods 0.000 claims description 9
- 238000010408 sweeping Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 abstract description 3
- 238000002844 melting Methods 0.000 abstract description 3
- 230000008018 melting Effects 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract description 3
- 239000012212 insulator Substances 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 239000002994 raw material Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 240000005578 Rivina humilis Species 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- -1 quartz Chemical compound 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は、電子ビーム蒸着で用いられる電子銃に関す
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an electron gun used in electron beam evaporation.
（従来の扶術）
従来、真空中で原材料物質（例えばアルミニウム）に電
子ビームを照射することにより、原材料物質を加熱、蒸
発させ、半導体基板等の基板表面に前記原材料物質の薄
膜を堆積させる電子ビーム魚着が知られている。そして
、（）７ｉ記電子ビーム源と、原材料物質を収容するる
つぼとを備えた電子銃として、神々の構造のものが知ら
れている。(Conventional technology) Conventionally, electron beams have been used to heat and evaporate a raw material (for example, aluminum) by irradiating the raw material (for example, aluminum) with an electron beam in a vacuum, thereby depositing a thin film of the raw material on the surface of a substrate such as a semiconductor substrate. Beam fishing clothes are known. (7i) As an electron gun equipped with an electron beam source and a crucible containing a raw material, one having a divine structure is known.
多元系の薄膜を基板表面に堆積させる場合、複数の電子
銃を真空処理室内に設置し、複数の原材料物質を同時に
蒸発させて、基板表面に蒸発物を堆積させることが行な
われている。When depositing a multi-component thin film on a substrate surface, a plurality of electron guns are installed in a vacuum processing chamber to simultaneously evaporate a plurality of raw materials and deposit evaporated material on the substrate surface.
然し乍ら、このような方法では、真空処理室内に設置し
た複数の電子銃の夫々の電子ビーム偏向用磁場が、万い
に干渉し合って、各電子銃の電子ビームが、人りのるつ
ぼの中心に照射されなくなったり、電子ビーｌ＼に車が
牛じて、ビーム収束ヤ１が悪くなるという問題ｊ、’、
ｊが（１４じていた。However, in such a method, the electron beam deflection magnetic fields of each of the multiple electron guns installed in the vacuum processing chamber interfere with each other, and the electron beam of each electron gun is directed to the center of the crucible of people. The problem is that the beam convergence becomes worse because the beam is no longer irradiated, or when a car hits the e-beer.
j was (14).
この磁場の相互干渉を低減するｌｂに、複数の？Ｅ電子
銃、相互のが離な大きくする方法があったが、製置全体
が大型化する問題点があると共に、るつぼから蒸発する
蒸気の方向分イＩｉが、いわゆる余弘則に支配される為
に、薄膜の■１稍速度、均一＝ｌｊｌ″が損なわれるこ
ととなり、’Ｊ＝産川の用置では採用できなかった。Multiple lbs to reduce mutual interference of this magnetic field? There was a way to increase the size of the E-electron gun so that they were separated from each other, but this had the problem of increasing the size of the entire setup, and the direction of the vapor evaporating from the crucible was governed by the so-called Yohiro law. In addition, the thin film's speed and uniformity =ljl'' were impaired, and it could not be adopted in the 'J=Ubukawa' setting.
そこで発明者は、先に電子ビームのＧ＋ｊ ｌ’ｌの１
５の磁場を、平面環状の磁気１ＩＩｌ路て形１曳し、該
環状磁気回路にｔｆ）って複数のるつぼと止子ビーム源
を配置した電子ビーム蒸着用の徂ｒ−統を堤案じた（↑
、４開平１−１４９９５５）、。Therefore, the inventor first calculated 1 of G+j l'l of the electron beam.
A similar system for electron beam evaporation was designed in which a magnetic field of 5 was passed through a planar annular magnetic path, and a plurality of crucibles and stopper beam sources were arranged in the annular magnetic circuit. (↑
, 4 Kaihei 1-149955).
（発明が解決しようとする課題）
行１１記の、環状磁気回路に沿ってるつぼと電ｒビム源
を配置７ｉシた電子銃は、Ｘ（ｉ ’ｌ’ビームの偏向
や収束性に対する問題点を解決できるものであったが、
谷るつぼに照射される電−ｒ−ビームをスイープ（電子
ビームの１（り抽・Ｉされるイ１°１１１″１°を移動
すること）できない問題点があった。。(Problem to be Solved by the Invention) The electron gun in which the crucible and the electron beam source are arranged along the annular magnetic circuit shown in line 11 has problems with the deflection and convergence of the X(i'l' beam). It was possible to solve the problem, but
There was a problem in that it was not possible to sweep the electron beam irradiated onto the valley crucible (move the electron beam 1° 111" 1°).
１ｉｉｊ ｉ＋４電子ビームのスイープは、アルミニウ
ム等で代表される、比１咬的低融点で、昇−ｉ＋’４１
’ｌ：でない金属を恭ｊりする場合には、必要とされな
い機能である。然し／１ら、タングステン、モリブデン
雰のｌＴ、ｉｌ融点金属や、石英などに代表される絶縁
物や、７１１１１゛〈性の物質を蒸着する場合には、電
子ビームをるつぼに収容された原材料物質の一点のみで
なく、広範囲に照射しなければ正常な蒸気流が得られな
いので、必要な機能である。1iij i+4 The sweep of the electron beam has a relatively low melting point, which is represented by aluminum, etc.
This function is not required when using metals that are not 'l:. However, when depositing melting point metals such as tungsten and molybdenum, insulators such as quartz, and 71111゛〈materials, the electron beam is applied to the raw material contained in the crucible. This is a necessary function because normal steam flow cannot be obtained unless a wide area is irradiated, not just one point.
（課題を解決する為の手段）
そこでこの発明は、前記複数のるつぼを設けた電子銃に
、更に電子ビームをスイープさせる機能を付加して、問
題点の解決を図ったのである。(Means for Solving the Problems) Therefore, the present invention aims to solve the problems by adding a function to sweep the electron beam to the electron gun provided with the plurality of crucibles.
即ちこの発明の電子ビーム蒸着用電子銃は、？Ｅ電子ビ
ーム偏向する為の磁場を平面環状の磁気回路にＪ：り形
成し、該環状磁気回路に沿って、複数のるつぼと電−ｒ
ビーム源を配、ｒ、 してなる１−ハ了ビム蒸着用電子
銃においで、前記環状磁気回路の外側に沿って、電子ビ
ームをスーで一ブさせるｌ）の電磁コイルが設着してあ
ることを特徴としている。That is, what is the electron gun for electron beam evaporation of this invention? A magnetic field for deflecting the electron beam is formed in a planar annular magnetic circuit, and a plurality of crucibles and an electric field are connected along the annular magnetic circuit.
In the electron gun for beam evaporation, a beam source is disposed, and an electromagnetic coil for directing the electron beam is installed along the outside of the annular magnetic circuit. It is characterized by certain things.
Ｆ）ＩＩ記スイープをさせるｌ′ｂの電磁コイルは、１
又は複数のヨークで構成した環状ヨークに２対以上のコ
イルを巻装して構成する場合と、複数配置ｔ’：ｌ’さ
れた組子ビーム源の夫勾に対向してヨークを設け、谷ヨ
ークに１個のコイルを衣装して構成する現今とがある。F) The electromagnetic coil l'b that performs the sweep described in II is 1
Alternatively, two or more pairs of coils are wound around an annular yoke made up of a plurality of yokes, and a yoke is provided facing the vertical direction of a muntin beam source arranged in multiple positions t':l'. There is a modern version that consists of a single coil attached to a yoke.
（作 用）
この発明の電子ビームＡ’Ａ ＲＩ Ｉ’ｌ ’電子銃
では、ｌ−シアービームをスイープさせる為の′ＩＵ、
磁コイムコイル磁界で、電子ビームの、原材料物質に対
する照射イ１７１ηをスイープすることができる、。(Function) In the electron beam A'ARI'l' electron gun of the present invention, 'IU' for sweeping the l-shear beam,
The irradiation 171η of the electron beam on the raw material can be swept by the magnetic coil magnetic field.
電磁：］イルな、１又は複数のヨークで構成した環状ヨ
ークに２対以上のコイルを容袋して構成した場合には、
各コイルによって発生する磁界の＋１行作用にｊ：って
、電子ビームのスイープの為の磁界が複数の組子ビーム
に同時に作用する。Electromagnetic:] When two or more pairs of coils are encased in an annular yoke consisting of one or more yokes,
Due to the +1 row action of the magnetic field generated by each coil, the magnetic field for sweeping the electron beam acts on a plurality of muntin beams simultaneously.
・ノＪ、電子ビーム源と対向させて設ｉｌｌ： Ｌ／た
ヨクに、夫４１個のコイルを巻装して構成した場合には
、谷電磁二コイルを独１′１に動作させて、個／７の電
子ビームに独立に、スイープのＺ）の磁界を作用させる
ことができる。。・In the case where 41 coils are wound around L/T, which is installed facing the electron beam source, the two valley electromagnetic coils are operated at 1'1, A sweeping magnetic field of Z) can be applied independently to 1/7 electron beams. .
（夫 胤 例） 以下、この発明の実施例を図面を参照して説明する。(Example of husband and son) Embodiments of the present invention will be described below with reference to the drawings.
第１図乃至第３図は第１の実施例であって、因「１川が
水冷ハースである。水冷ハース１は゛１ε而略ノＪ形と
してあり、四隅部に永久磁石２１．２２゜・・・２４が
埋設してあり、該永久磁石２１．２２、・・・２４で平
面環状の磁気凹路３が形成しである、。Figures 1 to 3 show the first embodiment, in which the water-cooled hearth 1 is a water-cooled hearth.The water-cooled hearth 1 is J-shaped, with permanent magnets at the four corners of 21.22 degrees. . . 24 are buried therein, and the permanent magnets 21, 22, . . . 24 form a planar annular magnetic concave path 3.
そしてこの環状磁気回路３に沿うように、水冷ハースｌ
の各辺の中央上面に、るつぼ４ｉ、４２、・・・４４が
設けであると共に、各るつぼの外側に電子ビーム源５１
．５２、・・・５４が設けである。前記電子ビーム源５
１．５２、・・・５４は、夫４フィラメント６と電極７
で構成されている。第２図においで、８は水冷ハースｌ
に対する冷却水の循環路である。Then, along this annular magnetic circuit 3, a water-cooled hearth l
Crucibles 4i, 42, . . . , 44 are provided on the center upper surface of each side of the
．． 52, . . . 54 are provided. The electron beam source 5
1.52,...54 are the husband 4 filament 6 and the electrode 7
It consists of In Figure 2, 8 is a water-cooled hearth
This is the circulation path for cooling water.
上記は、先に提案した電子ビーム蒸着用電子銃と同様の
構成部分であり、この発明では更に、前記水冷ハース１
の外周に、ゝ１′１川形とした環状の′１１ｒｄ３ 二
１ イＬ ９ カ＋ｉＱ ＋−Ｊ テあル、、 ’＋１
ｉｌｉＵ ：］ イ）し９ Ｉマ第３図に小した土うに
、１（１・ｊ・ＩＱ）三ノーり１０で＋＋Ｘｌｉ成した
環状ヨーク１ｊに、４ （６５１のコイル＋２１．１２
２、・・・＋２４を巻装して桶成しであるもので、コイ
ル＋２＋、＋２２、・・・１２４は対ｔ；Ｉｌするコイ
ル量子で一対とされ、各村における二コイルによる磁力
線の）Ｊ向が反対のノｊ Ｉ＋’＋Ｊとへるようにしで
ある。、 １４１１ノ）、今、リート線１３１．１３２
を介してコイル１２１．１２３に電流を流すと、＝］イ
ル１２１（こよって磁力線１４１が発〈［する一方、コ
イル１２３によって磁力線１４３が光生ずるようにしで
ある１、コイル１２２．１２４の対に対してリート線Ｉ
３３．１３４を介して電流を流した場合も同様である１
゜
Ｌ記のように構成した束子ビーム蒸７′１川市ｒ銃にお
いては、電子ビーム源５１．５２、・・・５４から発射
された電ｒビームは、１）；１．、Ｌ！磁倶（回路３に
よる磁場によって、人々第２０中１５のような軌跡を描
いて、るつぼ４１．４２、・・・４４の略中火に１、’
、ｉＱ４−４− ’：１． ココテ１ｉｉｊ 、’、己
’１’ｆｉｍ ：］ イ）し９ ヲ動イ’ｉさ−すると
、二】イル＋２１．１２２、・・・１２４（こよる磁界
が作用するので、束子ビームのｊｊ／ｊ Ｑ・Ｎ１７置
を変化させることができる。The above components are the same as those of the previously proposed electron beam evaporation electron gun, and the present invention further includes the water-cooled hearth 1.
On the outer periphery of , there is a ring shaped like a river.
iliU: ] A) 9 I Ma In the clay box shown in Figure 3, add 4 (651 coils + 21.12
The coils +2+, +22, . . . 124 are made into a pair of coil quanta that correspond to each other, and the lines of magnetic force due to the two coils in each village are The J direction is set to the opposite direction, i+'+J. , 1411 no), now Riet line 131.132
When a current is applied to the coils 121 and 123 through the coil 121, the magnetic field lines 141 are generated. On the other hand, Riet line I
The same is true when a current is passed through 33.1341
In the bundle beam evaporator 7'1 Kawaichi r gun configured as shown in ゜L, the electric beams emitted from the electron beam sources 51, 52, . . . , 54 are: 1); , L! Magnetic field (by the magnetic field of circuit 3, people draw a trajectory like 15 out of 20, 1, ' to approximately medium heat of crucible 41, 42,...
, iQ4-4-':1. kokote1iij ,',self'1'fim: ] a) and 9 wo motion i'i'i sa - then, 2] il +21.122,...124 (Since the magnetic field acts, the fluxion beam jj/ j Q・N17 position can be changed.
前記の如く、リート線１３１．１３２を介して二〕イル
１２１．＋２：３に′１１流を流した時の磁力線１４１
．１４３によって、電子ビームの飛行空間には、１５１
のような磁力線（×方向）を作用させることができ、
一方す−ト線１３３．１３４を介してコイル１２２．１
２４に電流を流せば、前記磁力線１５１と直立する方１
１″りの磁力線（Ｙ方向）を作用させることができる。As mentioned above, the two lines 121. Magnetic field lines 141 when flowing '11 flow in +2:3
．． 143, there are 151 in the flight space of the electron beam.
It is possible to make magnetic lines of force (x direction) act like this,
On the other hand, the coil 122.1 is connected to the coil 122.1 via the straight wire 133.134.
24, the direction 1 that is perpendicular to the magnetic field line 151
A line of magnetic force (in the Y direction) of 1" can be applied.
ｕ［ｊち、コイル１２１．１２２、・・・１２４におけ
る対面に流す電流の方向および大きさを調整することで
、あらゆる方向成分を持つ磁力線を作用させることが１
１Ｔ能で、結局、電子ビーム源５１．５２、・・・５４
から発射された重子ビームのるつぼ４１．４２、・・・
４４における照Ｑ＝１位置を１１１山にスイープさせる
ことができる。By adjusting the direction and magnitude of the current flowing between the coils 121, 122, .
With 1T power, in the end, the electron beam source 51.52,...54
Crucible of deuteron beams fired from 41.42,...
It is possible to sweep the light Q=1 position at 44 to 111 peaks.
尚、Ａｉｌ記実施例では、るつぼ４］、４２、・・・４
４と’ｉ’ｌｉ丁＝ビーム洗ｉ５１．５２、・・・５４
が４イ固ずつとした、いわゆる４運のものについて説明
したが、この数に制限はなく、３辿、５辿、６連（第（
３図参照）以ト専、同様のスイープがｕＪ能である。。In addition, in the embodiment described in Ail, the crucibles 4], 42, . . . 4
4 and 'i'li ding = beam washing i51.52,...54
I explained about the so-called 4-luck, in which there are 4 consecutive lucks, but there is no limit to this number, 3 consecutive, 5 consecutive, 6 consecutive (
(See Figure 3) A similar sweep is used in uJ Noh. .
次に、第４図および第５図は、電磁コイル９を複数のヨ
ークで？＋’７ｉ成した実施例である。Next, in FIGS. 4 and 5, the electromagnetic coil 9 is connected to a plurality of yokes. This is an example in which +'7i was achieved.
即ち第４図は、水玲ハース１の外側においで、各電子ビ
ーム源５１．５２、・・・５４と対向させた弧状のヨー
ク＋６１．１６２．１６４で−っの環状ヨーク１７を構
成し、谷ヨーク１６１．１６２、・・・１６４に、前記
実施例と同様に、対向するヨクＩｉｊで対をなすコイル
＋８１．１８２、・・・１８４を巻装して、スイープ用
の電磁コイルを構成しである。That is, in FIG. 4, an annular yoke 17 is formed by arc-shaped yokes +61, 162, and 164 facing each electron beam source 51, 52, . Similarly to the embodiment described above, the valley yokes 161, 162, . . . , 164 are wound with paired coils +81, 182, . It is.
第５図も同様であるが、ヨーク１６１，１６２゜・・・
１６４の配置される位置を、電子ビーム源と電子ビーム
源の間としたものである。The same is true for FIG. 5, but the yokes 161, 162°...
164 is arranged between the electron beam sources.
これらの実施例においても、゛電子ビームの飛１１する
空Ｆｊ１１に、スイープの１５の磁力線を作用すること
が可能であり、前記実施例と同様に、電ｒビｌ＼のｉｊ
／ｊ Ｑ、ｊ位置を白雨にスイープすることがてきる。In these embodiments as well, it is possible to apply 15 sweeping lines of magnetic force to the sky Fj11 where the electron beam travels, and similarly to the above embodiments, it is possible to apply 15 sweeping magnetic lines of force to
/j Q, it is possible to sweep position j in white rain.
。
また、第６図は、スイープのＺ５の′１ハ磁コイルを各
電子ビーム源毎に独＼７させた実施例である。. Further, FIG. 6 shows an embodiment in which the Z5 '1 magnetic coil of the sweep is set individually for each electron beam source.
即ち、各電子ビーム源５１．５２、・・・５６の外側に
夫々各別のヨーク＋９１．１９２、・・・１９６が設け
られ、大女のヨーク＋９＋、＋９２、・・・１９６に＝
］コイル２０１２０２、・・・２０６を春装して、電磁
コイル９１．９２、・・・９Ｇとしたものである。That is, separate yokes +91, 192, . . . 196 are provided outside each electron beam source 51, 52, .
] The coils 201, 202, . . . 206 are spring-fitted to form electromagnetic coils 91, 92, . . . 9G.
この実施例では、コイル２０＋、２０２、・・・２０６
は人〜独）“ｌとされており、従って、谷徂丁ビム源５
１．５２、・・・５６毎にスイープのｌｂの６μ界を作
用させて、個４のるつぼに最適のスイープを行なうこと
ができる。In this embodiment, coils 20+, 202, . . . 206
is said to be ``l'' (human ~ German), therefore,
By applying a 6 μ field of sweep lb every 1.52, . . . 56, an optimal sweep can be performed for 4 crucibles.
（発明の効果）
以トに説明した通り、この発明によれば、るつぼに収容
した原材料物質にｐ（ｊ ｒＪ、ｉされる電ｒ−ビーム
をスイープできるようにしたので、高融点金属、絶縁物
、界華件物質でも多元電γビーム蒸７ｔが可能にできる
効果がある。(Effects of the Invention) As explained above, according to the present invention, it is possible to sweep the electric r-beam applied to the raw material contained in the crucible. It has the effect of making it possible to evaporate 7t of multi-dimensional electric gamma beams even in matter and world matter.
第１図はこの発明の第１の犬１血例の下面図、第 ０
２因は同じく一部縦断Ｆ山図、第３１×１は第１の’Ｊ
Ｊｆｑ例の電磁コイルを説明する１×１、第４図はこ
の発明の第２の実施例の甲面図、第５図はこの発明の第
３の実施例の！ト面図、第６図はこの発明の第４の１χ
１血例の゛１′１因である。。
２１．２２、・・・２４ 永久磁石
３、 磁気回路
４１．４２、・・・４４ るつば
５１．５２、・＝ ５６ 、 、 、 、 ’Ｉｕ ｒ
ヒｂ ｄｊｌｊ６ 、フィラメント
９．９１．９２、・・・９６．、、、’１’ｌ４Ｂ＝コ
イルＯヨ − り
環状ヨーク
２＋ １２２、・・・１２４
６１．１６２、・・・１６４
８１．１８２、・・・１８４
２０ Ｉ 、 ２０２、 ・・・２０６．、、、：］
イ ル特Ｉ「出廓人 ロ電アネルバ株式会ン１代
即人 鈴木ＩＦ次Figure 1 is a bottom view of the first dog blood example of this invention, the second cause is also a partially longitudinal view of Mt.
1×1 to explain the electromagnetic coil of the Jfq example, FIG. 4 is a top view of the second embodiment of this invention, and FIG. 5 is a top view of the third embodiment of this invention! The top view and FIG. 6 are the fourth 1χ of this invention.
This is the cause of 1 case of blood. . 21.22,...24 Permanent magnet 3, magnetic circuit 41.42,...44 Tsubasa 51.52,...=56 , , , , 'Iu r
hb djlj6, filament 9.91.92,...96. ,,,'1'l4B=coil O yoke annular yoke 2+ 122,...124 61.162,...164 81.182,...184 20 I, 202,...206. ,,,:]
Il Special I "Department person Roden Anelva Co., Ltd. 1st generation immediate employee Suzuki IF next
Claims (1)
路により形成し、該環状磁気回路に沿って複数のるつぼ
と電子ビーム源を配置してなる電子ビーム蒸着用電子銃
においで、前記環状磁気回路の外側に沿って電子ビーム
をスイープさせる為の電磁コイルが設置してあることを
特徴とした電子ビーム蒸着用電子銃 ２ スイープさせる為の電磁コイルは、１又は複数のヨ
ークで構成した環状ヨークに２対以上のコイルを巻装し
て構成した請求項１記載の電子ビーム蒸着用電子銃 ３ スイープさせる為の電磁コイルは、各電子ビーム源
と対向させて設置したヨークに、夫々１個のコイルを巻
装して構成した請求項１記載の電子ビーム蒸着用電子銃[Claims] 1. An electron gun for electron beam evaporation, in which a magnetic field for deflecting an electron beam is formed by a planar annular magnetic circuit, and a plurality of crucibles and electron beam sources are arranged along the annular magnetic circuit. Electron gun for electron beam evaporation 2, characterized in that an electromagnetic coil is installed for sweeping the electron beam along the outside of the annular magnetic circuit. 3. An electron gun for electron beam evaporation according to claim 1, wherein the electron gun for electron beam evaporation is constructed by winding two or more pairs of coils around an annular yoke. 2. The electron gun for electron beam evaporation according to claim 1, wherein one coil is wound around each of the two coils.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1200985A JPH0762240B2 (en) | 1989-08-02 | 1989-08-02 | Electron gun for electron beam evaporation |
| US07/557,095 US5034590A (en) | 1989-08-02 | 1990-07-25 | Electron gun arrangement for use in the electron beam evaporation process |
| EP19900114411 EP0411482A3 (en) | 1989-08-02 | 1990-07-27 | Electron gun arrangement for use in the electron beam evaporation process |
| KR1019900011706A KR960005808B1 (en) | 1989-08-02 | 1990-07-31 | Electron gun arrangement for use in the electron beam evaporation process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1200985A JPH0762240B2 (en) | 1989-08-02 | 1989-08-02 | Electron gun for electron beam evaporation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0364457A true JPH0364457A (en) | 1991-03-19 |
| JPH0762240B2 JPH0762240B2 (en) | 1995-07-05 |
Family
ID=16433590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1200985A Expired - Fee Related JPH0762240B2 (en) | 1989-08-02 | 1989-08-02 | Electron gun for electron beam evaporation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762240B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100363641B1 (en) * | 2000-10-09 | 2002-12-12 | 주식회사 수림 | Adapter for Bellows Pipe and Connecting Structure thereof |
| WO2007063259A1 (en) * | 2005-12-02 | 2007-06-07 | Riber | Large-capacity high-temperature effusion cell |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01149955A (en) * | 1987-12-07 | 1989-06-13 | Anelva Corp | Device for producing thin film |
-
1989
- 1989-08-02 JP JP1200985A patent/JPH0762240B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01149955A (en) * | 1987-12-07 | 1989-06-13 | Anelva Corp | Device for producing thin film |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100363641B1 (en) * | 2000-10-09 | 2002-12-12 | 주식회사 수림 | Adapter for Bellows Pipe and Connecting Structure thereof |
| WO2007063259A1 (en) * | 2005-12-02 | 2007-06-07 | Riber | Large-capacity high-temperature effusion cell |
| FR2894257A1 (en) * | 2005-12-02 | 2007-06-08 | Riber Sa | HIGH TEMPERATURE EFFUSION CELL WITH HIGH CAPACITY |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0762240B2 (en) | 1995-07-05 |
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