JPH0350329U - - Google Patents
Info
- Publication number
- JPH0350329U JPH0350329U JP10972489U JP10972489U JPH0350329U JP H0350329 U JPH0350329 U JP H0350329U JP 10972489 U JP10972489 U JP 10972489U JP 10972489 U JP10972489 U JP 10972489U JP H0350329 U JPH0350329 U JP H0350329U
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- water washing
- wafer
- treatment
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 5
- 239000012498 ultrapure water Substances 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 4
- 238000012993 chemical processing Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は本考案の一実施例の半導体装置の製造
装置のウエハ処理装置の説明図、第２図はその装
置におけるカセツト交換部の説明図、第３図は従
来の半導体装置の製造装置のウエハ処理装置の説
明図、第４図はその装置に用いるカセツトの斜視
図である。
Ｂ……ウエハ処理装置、１……薬液槽、２……
通常水洗槽、３……高純度水洗槽、４……乾燥機
、６Ａ……薬液処理専用カセツト、６Ｂ……水洗
・乾燥専用カセツト、７……カセツト交換部、ｗ
……ウエハ。
FIG. 1 is an explanatory diagram of a wafer processing apparatus of a semiconductor device manufacturing apparatus according to an embodiment of the present invention, FIG. 2 is an explanatory diagram of a cassette exchange section in the apparatus, and FIG. 3 is an explanatory diagram of a conventional semiconductor device manufacturing apparatus. An explanatory diagram of the wafer processing apparatus, FIG. 4 is a perspective view of a cassette used in the apparatus. B...Wafer processing equipment, 1...Chemical solution tank, 2...
Normal washing tank, 3...High purity washing tank, 4...Dryer, 6A...Cassette for chemical processing only, 6B...Cassette for washing and drying only, 7...Cassette exchange part, w
...Wafer.
Claims (1)
で該ウエハに対し順次、薬液処理、通常水洗処理
、高純度水洗処理及び乾燥処理を行うウエハ処理
装置を備える半導体装置の製造装置において、 上記ウエハカセツトとして上記薬液処理及び上
記通常水洗処理に使用する第１のカセツトと、上
記高純度水洗処理及び上記乾燥処理に使用する第
２のカセツトを具備させたことを特徴とする半導
体装置の製造装置。 (2) 上記ウエハを上記第１のカセツトから上記
第２のカセツトに移すカセツト交換部を設けたこ
とを特徴とする実用新案登録請求の範囲第１項記
載の半導体装置の製造装置。[Scope of Claim for Utility Model Registration] (1) A semiconductor device equipped with a wafer processing apparatus that sequentially performs chemical treatment, normal water washing treatment, high purity water washing treatment, and drying treatment on wafers set in a wafer cassette. The manufacturing apparatus is characterized in that the wafer cassettes include a first cassette used for the chemical treatment and the normal water washing process, and a second cassette used for the high purity water washing process and the drying process. Manufacturing equipment for semiconductor devices. (2) The semiconductor device manufacturing apparatus according to claim 1, further comprising a cassette exchange section for transferring the wafer from the first cassette to the second cassette.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10972489U JPH0350329U (en) | 1989-09-21 | 1989-09-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10972489U JPH0350329U (en) | 1989-09-21 | 1989-09-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0350329U true JPH0350329U (en) | 1991-05-16 |
Family
ID=31658294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10972489U Pending JPH0350329U (en) | 1989-09-21 | 1989-09-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0350329U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170198929A1 (en) * | 2010-06-30 | 2017-07-13 | Koken Ltd. | Air blowing device |
-
1989
- 1989-09-21 JP JP10972489U patent/JPH0350329U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170198929A1 (en) * | 2010-06-30 | 2017-07-13 | Koken Ltd. | Air blowing device |
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